WO2008093808A1 - ヒートスプレッダモジュール、その製法及びヒートシンク - Google Patents

ヒートスプレッダモジュール、その製法及びヒートシンク Download PDF

Info

Publication number
WO2008093808A1
WO2008093808A1 PCT/JP2008/051583 JP2008051583W WO2008093808A1 WO 2008093808 A1 WO2008093808 A1 WO 2008093808A1 JP 2008051583 W JP2008051583 W JP 2008051583W WO 2008093808 A1 WO2008093808 A1 WO 2008093808A1
Authority
WO
WIPO (PCT)
Prior art keywords
spreader module
heat spreader
heat
manufacturing
boards
Prior art date
Application number
PCT/JP2008/051583
Other languages
English (en)
French (fr)
Inventor
Yoshihiro Tanaka
Takahiro Ishikawa
Yumihiko Kuno
Shuhei Ishikawa
Original Assignee
Ngk Insulators, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ngk Insulators, Ltd. filed Critical Ngk Insulators, Ltd.
Publication of WO2008093808A1 publication Critical patent/WO2008093808A1/ja

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress

Abstract

 ヒートスプレッダモジュール10は、絶縁基板12の両面に第1及び第2の中間板14,20がそれぞれ配置されている。各中間板14,20は、ヤング率が絶縁基板12より小さい応力緩和板16,22の全面が金属膜18,24で覆われたものである。このため、半導体装置36が発熱したときには、各中間板14,20は絶縁基板12よりもヤング率が小さいため、発生した応力が各中間板14,20により緩和される。
PCT/JP2008/051583 2007-01-31 2008-01-31 ヒートスプレッダモジュール、その製法及びヒートシンク WO2008093808A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-021471 2007-01-31
JP2007021471 2007-01-31

Publications (1)

Publication Number Publication Date
WO2008093808A1 true WO2008093808A1 (ja) 2008-08-07

Family

ID=39674113

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2008/051583 WO2008093808A1 (ja) 2007-01-31 2008-01-31 ヒートスプレッダモジュール、その製法及びヒートシンク
PCT/JP2008/051584 WO2008093809A1 (ja) 2007-01-31 2008-01-31 鋳造品の製造方法及び鋳造品

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051584 WO2008093809A1 (ja) 2007-01-31 2008-01-31 鋳造品の製造方法及び鋳造品

Country Status (1)

Country Link
WO (2) WO2008093808A1 (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011176299A (ja) * 2010-01-27 2011-09-08 Kyocera Corp 回路基板およびこれを用いた電子装置
JP2013138267A (ja) * 2013-04-08 2013-07-11 Mitsubishi Materials Corp ヒートシンク付パワーモジュール用基板、ヒートシンク付パワーモジュール及び緩衝層付パワーモジュール用基板
DE102012104593A1 (de) * 2012-05-29 2013-12-05 Sma Solar Technology Ag Halbleiterbauelement
DE202013103599U1 (de) * 2013-08-09 2014-11-13 Trafomodern Transformatorengesellschaft M.B.H. Elektrisches Bauteil
JP2016149431A (ja) * 2015-02-12 2016-08-18 株式会社豊田中央研究所 半導体モジュール
JP2019096858A (ja) * 2017-11-20 2019-06-20 富士通化成株式会社 複合伝熱部材、及び複合伝熱部材の製造方法
CN111356544A (zh) * 2017-11-20 2020-06-30 三菱综合材料株式会社 复合传热部件及复合传热部件的制造方法
EP3660895A4 (en) * 2017-07-27 2020-08-19 BYD Company Limited HEAT DISSIPATION ELEMENT AND ITS PREPARATION PROCESS, AND IGBT MODULE
EP3968369A1 (en) 2020-09-15 2022-03-16 Dowa Metaltech Co., Ltd Heat radiation member and method for producing same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7157609B2 (ja) * 2018-09-27 2022-10-20 Dowaメタルテック株式会社 金属-セラミックス接合基板およびその製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003078086A (ja) * 2001-09-04 2003-03-14 Kubota Corp 半導体素子モジュール基板の積層構造
JP2005145746A (ja) * 2003-11-14 2005-06-09 Denki Kagaku Kogyo Kk セラミックス回路基板一体型アルミニウム−炭化珪素質複合体及びその製造方法
JP2005252159A (ja) * 2004-03-08 2005-09-15 Ngk Insulators Ltd 接合体の形状制御方法、接合体の製造方法、接合体、ヒートスプレッダモジュールの製造方法及びヒートスプレッダモジュール
JP2006351834A (ja) * 2005-06-16 2006-12-28 Hitachi Metals Ltd セラミックス回路基板およびそれを用いた半導体モジュール

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63180357A (ja) * 1987-01-21 1988-07-25 Nabeya:Kk 流体透過性鋳造品の製造方法
JP3286102B2 (ja) * 1995-02-10 2002-05-27 日本碍子株式会社 複合鋳造体及びその製造方法
JP2000265253A (ja) * 1999-03-16 2000-09-26 Mitsubishi Materials Corp 金属基複合材およびその製造方法
JP2000336438A (ja) * 1999-03-25 2000-12-05 Kubota Corp 金属−セラミックス複合材料およびその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003078086A (ja) * 2001-09-04 2003-03-14 Kubota Corp 半導体素子モジュール基板の積層構造
JP2005145746A (ja) * 2003-11-14 2005-06-09 Denki Kagaku Kogyo Kk セラミックス回路基板一体型アルミニウム−炭化珪素質複合体及びその製造方法
JP2005252159A (ja) * 2004-03-08 2005-09-15 Ngk Insulators Ltd 接合体の形状制御方法、接合体の製造方法、接合体、ヒートスプレッダモジュールの製造方法及びヒートスプレッダモジュール
JP2006351834A (ja) * 2005-06-16 2006-12-28 Hitachi Metals Ltd セラミックス回路基板およびそれを用いた半導体モジュール

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011176299A (ja) * 2010-01-27 2011-09-08 Kyocera Corp 回路基板およびこれを用いた電子装置
DE102012104593A1 (de) * 2012-05-29 2013-12-05 Sma Solar Technology Ag Halbleiterbauelement
DE102012104593B4 (de) * 2012-05-29 2016-02-25 Sma Solar Technology Ag Halbleiterbauelement
JP2013138267A (ja) * 2013-04-08 2013-07-11 Mitsubishi Materials Corp ヒートシンク付パワーモジュール用基板、ヒートシンク付パワーモジュール及び緩衝層付パワーモジュール用基板
DE202013103599U1 (de) * 2013-08-09 2014-11-13 Trafomodern Transformatorengesellschaft M.B.H. Elektrisches Bauteil
JP2016149431A (ja) * 2015-02-12 2016-08-18 株式会社豊田中央研究所 半導体モジュール
EP3660895A4 (en) * 2017-07-27 2020-08-19 BYD Company Limited HEAT DISSIPATION ELEMENT AND ITS PREPARATION PROCESS, AND IGBT MODULE
JP2019096858A (ja) * 2017-11-20 2019-06-20 富士通化成株式会社 複合伝熱部材、及び複合伝熱部材の製造方法
CN111356544A (zh) * 2017-11-20 2020-06-30 三菱综合材料株式会社 复合传热部件及复合传热部件的制造方法
EP3715014A4 (en) * 2017-11-20 2021-07-28 Mitsubishi Materials Corporation COMPOSITE HEAT TRANSFER ELEMENT AND METHOD FOR PRODUCING A COMPOSITE HEAT TRANSFER ELEMENT
JP7119671B2 (ja) 2017-11-20 2022-08-17 三菱マテリアル株式会社 複合伝熱部材、及び複合伝熱部材の製造方法
EP3968369A1 (en) 2020-09-15 2022-03-16 Dowa Metaltech Co., Ltd Heat radiation member and method for producing same
US11919288B2 (en) 2020-09-15 2024-03-05 Dowa Metaltech Co., Ltd. Method for producing heat radiation member

Also Published As

Publication number Publication date
WO2008093809A1 (ja) 2008-08-07

Similar Documents

Publication Publication Date Title
WO2008093808A1 (ja) ヒートスプレッダモジュール、その製法及びヒートシンク
WO2008005614A3 (en) Chip module for complete power train
TW200640325A (en) Wiring board manufacturing method
TW200631145A (en) A heat sink, an electronic component package, and a method of manufacturing a heat sink
TW200509337A (en) Semiconductor assembled heat sink structure for embedding electronic components
TW200709766A (en) Flexible circuit board with heat sink
TW200715708A (en) Electronic substrate, manufacturing method for electronic substrate, and electronic device
WO2007008342A3 (en) Thermal solution for portable electronic devices
TW200631491A (en) Sandwiched thermal solution
WO2008008140A3 (en) Methods and apparatus for passive attachment of components for integrated circuits
WO2007011511A3 (en) Die package with asymmetric leadframe connection
WO2005104314A3 (fr) Procede de fabrication de circuits electroniques et optoelectroniques
TW200711561A (en) Electronic apparatus and thermal dissipating module thereof
EP2301906A4 (en) SILICON NITRIDE CARD, METHOD FOR MANUFACTURING SILICON NITRIDE CARD, AND SILICON NITRIDE PRINTED CIRCUIT BOARD AND SEMICONDUCTOR MODULE USING SILICON NITRIDE CARD
WO2006132822A3 (en) Method for making electronic devices
EP1995775A3 (en) Semiconductor device with stress reducing element
WO2011154360A3 (fr) Circuit integre a dispositif de type fet sans jonction et a depletion
WO2008120705A1 (ja) 半導体装置
WO2007130643A3 (en) Die-on-leadframe (dol) with high voltage isolation
WO2007131095A3 (en) Thermal management device for a memory module
WO2004059728A3 (en) Method of fabricating an integrated circuit and semiconductor chip
TW200615107A (en) Release film for encapsulation of semiconductor chip
TW200802762A (en) Heat sink, electronic device, and tuner apparatus
SG171613A1 (en) Integrated circuit package system with array of external interconnects
SG128546A1 (en) Low cte substrates for use with low-k flip-chip package devices

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08710681

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08710681

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP