WO2008090921A1 - 光走査ミラーと、半導体構造及びその製造方法 - Google Patents

光走査ミラーと、半導体構造及びその製造方法 Download PDF

Info

Publication number
WO2008090921A1
WO2008090921A1 PCT/JP2008/050890 JP2008050890W WO2008090921A1 WO 2008090921 A1 WO2008090921 A1 WO 2008090921A1 JP 2008050890 W JP2008050890 W JP 2008050890W WO 2008090921 A1 WO2008090921 A1 WO 2008090921A1
Authority
WO
WIPO (PCT)
Prior art keywords
movable portion
support
silicon layer
semiconductor structure
optical scanning
Prior art date
Application number
PCT/JP2008/050890
Other languages
English (en)
French (fr)
Inventor
Yousuke Hagihara
Kiyohiko Kawano
Hiroshi Noge
Original Assignee
Panasonic Electric Works Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007015980A external-priority patent/JP5052148B2/ja
Priority claimed from JP2007015970A external-priority patent/JP5038732B2/ja
Application filed by Panasonic Electric Works Co., Ltd. filed Critical Panasonic Electric Works Co., Ltd.
Priority to KR1020097017698A priority Critical patent/KR101104598B1/ko
Priority to US12/524,375 priority patent/US8164812B2/en
Priority to CN2008800032240A priority patent/CN101611337B/zh
Priority to EP08710576A priority patent/EP2128681A4/en
Publication of WO2008090921A1 publication Critical patent/WO2008090921A1/ja

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/113—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using oscillating or rotating mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)

Abstract

　可動部中に絶縁分離構造を設けた半導体構造を容易に製造可能にする。光走査ミラー（半導体構造）１は、第１シリコン層１００ａ、酸化膜１２０、第２シリコン層１００ｂから成るＳＯＩ基板１００を加工することにより形成されている。第１シリコン層１００ａには、固定フレーム４に第１ヒンジ５を介して支持された可動部５０が形成されている。可動部５０は、トレンチ（絶縁分離構造）１０１ａが形成されることにより複数の部位に分かれている。トレンチ１０１ａの下方に、酸化膜１２０及び第２シリコン層１００ｂから成る支持体９が形成されている。支持体９にはトレンチ１０１ａにより分割された可動フレーム３の複数の部位が接合されており、可動部５０は支持体９と一体に揺動可能である。これにより、簡易なエッチングによる製造工程により支持体９を形成し、可動部５０の機械的強度を確保可能である。
PCT/JP2008/050890 2007-01-26 2008-01-23 光走査ミラーと、半導体構造及びその製造方法 WO2008090921A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020097017698A KR101104598B1 (ko) 2007-01-26 2008-01-23 광주사 미러와, 반도체 구조 및 그 제조방법
US12/524,375 US8164812B2 (en) 2007-01-26 2008-01-23 Optical scanning mirror, semiconductor structure and manufacturing method thereof
CN2008800032240A CN101611337B (zh) 2007-01-26 2008-01-23 光扫描镜、半导体结构及其制造方法
EP08710576A EP2128681A4 (en) 2007-01-26 2008-01-23 OPTICAL SCANNING MIRROR, SEMICONDUCTOR STRUCTURE, AND METHOD FOR MANUFACTURING SAME

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-015970 2007-01-26
JP2007-015980 2007-01-26
JP2007015980A JP5052148B2 (ja) 2007-01-26 2007-01-26 半導体構造及びその製造方法
JP2007015970A JP5038732B2 (ja) 2007-01-26 2007-01-26 光走査ミラー

Publications (1)

Publication Number Publication Date
WO2008090921A1 true WO2008090921A1 (ja) 2008-07-31

Family

ID=39644495

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050890 WO2008090921A1 (ja) 2007-01-26 2008-01-23 光走査ミラーと、半導体構造及びその製造方法

Country Status (5)

Country Link
US (1) US8164812B2 (ja)
EP (1) EP2128681A4 (ja)
KR (1) KR101104598B1 (ja)
TW (1) TW200900732A (ja)
WO (1) WO2008090921A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102107844A (zh) * 2009-11-06 2011-06-29 先进微系统科技股份有限公司 具有多面梳状电极的双轴微机电致动器
US8335031B2 (en) 2009-01-26 2012-12-18 Hamamatsu Photonics K.K. Optical module
CN102981245A (zh) * 2012-12-25 2013-03-20 中国科学院长春光学精密机械与物理研究所 一种二维透射式快速反射镜
US8687254B2 (en) 2008-12-09 2014-04-01 Seiko Epson Corporation Optical filter and optical module having optical filter

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10551613B2 (en) * 2010-10-20 2020-02-04 Tiansheng ZHOU Micro-electro-mechanical systems micromirrors and micromirror arrays
DE102013209238B4 (de) * 2013-05-17 2017-10-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. MEMS-Struktur und Verfahren zum Herstellen derselben
DE102016111531B4 (de) 2016-06-23 2022-02-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optischer Scanner
US11796638B2 (en) 2020-06-18 2023-10-24 Beijing Voyager Technology Co., Ltd. Mirror assembly for light steering with flexible support structure
US11815627B2 (en) * 2020-06-18 2023-11-14 Beijing Voyager Technology Co., Ltd. Mirror assembly for light steering with reduced finger thickness
WO2022115932A1 (en) * 2020-12-01 2022-06-09 Sheba Microsystems Inc Mems electrostatic actuator for super resolution and autofocus in cameras

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006115683A (ja) * 2004-09-14 2006-04-27 Ricoh Co Ltd 静電アクチュエータ及び光走査装置
JP2006178408A (ja) * 2004-11-25 2006-07-06 Ricoh Co Ltd スキャナ素子、光走査装置および画像形成装置
JP2007015970A (ja) 2005-07-07 2007-01-25 Rohto Pharmaceut Co Ltd ビタミンａ類安定化製剤
JP2007015980A (ja) 2005-07-07 2007-01-25 Masaharu Aragaki 海水混合泥とその使用方法
WO2007034777A1 (ja) * 2005-09-21 2007-03-29 Matsushita Electric Industrial Co., Ltd. アクチュエータ

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000081589A (ja) 1998-07-09 2000-03-21 Olympus Optical Co Ltd 光偏向器
JP2001305472A (ja) 2000-04-24 2001-10-31 Olympus Optical Co Ltd 光偏向器
US6972883B2 (en) 2002-02-15 2005-12-06 Ricoh Company, Ltd. Vibration mirror, optical scanning device, and image forming using the same, method for making the same, and method for scanning image
JP3987382B2 (ja) 2002-06-11 2007-10-10 富士通株式会社 マイクロミラー素子およびその製造方法
KR100486716B1 (ko) * 2002-10-18 2005-05-03 삼성전자주식회사 2-ｄ 액튜에이터 및 그 제조방법
KR100707193B1 (ko) * 2005-05-31 2007-04-13 삼성전자주식회사 복층 구조의 콤전극을 구비한 광스캐너

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006115683A (ja) * 2004-09-14 2006-04-27 Ricoh Co Ltd 静電アクチュエータ及び光走査装置
JP2006178408A (ja) * 2004-11-25 2006-07-06 Ricoh Co Ltd スキャナ素子、光走査装置および画像形成装置
JP2007015970A (ja) 2005-07-07 2007-01-25 Rohto Pharmaceut Co Ltd ビタミンａ類安定化製剤
JP2007015980A (ja) 2005-07-07 2007-01-25 Masaharu Aragaki 海水混合泥とその使用方法
WO2007034777A1 (ja) * 2005-09-21 2007-03-29 Matsushita Electric Industrial Co., Ltd. アクチュエータ

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, vol. 6, no. 5, September 2000 (2000-09-01), pages 715
See also references of EP2128681A4

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8687254B2 (en) 2008-12-09 2014-04-01 Seiko Epson Corporation Optical filter and optical module having optical filter
CN102902061B (zh) * 2008-12-09 2015-04-01 精工爱普生株式会社 滤光器
US9195047B2 (en) 2008-12-09 2015-11-24 Seiko Epson Corporation Optical filter and optical module having optical filter
US8335031B2 (en) 2009-01-26 2012-12-18 Hamamatsu Photonics K.K. Optical module
CN102107844A (zh) * 2009-11-06 2011-06-29 先进微系统科技股份有限公司 具有多面梳状电极的双轴微机电致动器
CN102107844B (zh) * 2009-11-06 2012-09-19 先进微系统科技股份有限公司 具有多面梳状电极的双轴微机电致动器
CN102981245A (zh) * 2012-12-25 2013-03-20 中国科学院长春光学精密机械与物理研究所 一种二维透射式快速反射镜

Also Published As

Publication number Publication date
KR101104598B1 (ko) 2012-01-12
EP2128681A1 (en) 2009-12-02
US8164812B2 (en) 2012-04-24
US20100067084A1 (en) 2010-03-18
KR20090115166A (ko) 2009-11-04
TW200900732A (en) 2009-01-01
EP2128681A4 (en) 2010-05-19

Similar Documents

Publication Publication Date Title
WO2008090921A1 (ja) 光走査ミラーと、半導体構造及びその製造方法
US8212294B2 (en) Structure having silicon CMOS transistors with column III-V transistors on a common substrate
US20050020032A1 (en) Method for making thin film devices intended for solar cells or silicon-on-insulator (SOI) applications
WO2006015246A3 (en) Method and system for fabricating a strained semiconductor layer
TW571401B (en) Method of fabricating silicon devices on sapphire with wafer bonding
WO2007015951A3 (en) Semiconductor structures formed on substrates and methods of manufacturing the same
JP5890904B2 (ja) 機械的に柔軟なシリコン基板の製造方法
WO2001056085A1 (fr) Tranche a semi-conducteurs et son procede de production
TW200616141A (en) Strained silicon-on-insulator by anodization of a buried p+ silicon germanium layer
KR20120037874A (ko) 실리콘 및 글래스 기판의 분자 결합 방법
WO2006094313A3 (en) Forming method for polymeric laminated wafers comprising different film materials
KR20110105860A (ko) 열팽창 계수의 국부적 적응을 갖는 헤테로구조를 제조하는 방법
US7429504B2 (en) Heterogeneous group IV semiconductor substrates, integrated circuits formed on such substrates, and related methods
WO2007142865A3 (en) Thin film photovoltaic structure and fabrication
TW201447366A (zh) 具有分段電極之機電系統器件
JP2014153387A5 (ja)
US9580301B2 (en) MEMS chip and manufacturing method therefor
CN113053919A (zh) 一种多层绝缘体上硅晶圆及其制造方法
WO2006008746A3 (en) Integrated active pixel sensor and method of its fabrication
WO2008141863A3 (en) Backside contacting on thin layer photovoltaic cells
WO2008078404A1 (ja) シリコンエピタキシャルウェーハ及びその製造方法、並びに半導体デバイスの製造方法及びｓｏｉウェーハの製造方法
TW200713411A (en) Method of fabricating microphone device and thermal oxide layer and low-stress structural layer thereof
WO2007047186A3 (en) A method for fabricating a high performance pin focal plane structure using three handle wafers
CN108063112B (zh) 一种局部化soi区域制造方法
CN111129052A (zh) 一种cmos图像传感器结构及制造方法

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880003224.0

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08710576

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2008710576

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 12524375

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 2991/KOLNP/2009

Country of ref document: IN

WWE Wipo information: entry into national phase

Ref document number: 1020097017698

Country of ref document: KR