WO2008084660A1 - 高周波整合調整器 - Google Patents
高周波整合調整器 Download PDFInfo
- Publication number
- WO2008084660A1 WO2008084660A1 PCT/JP2007/074696 JP2007074696W WO2008084660A1 WO 2008084660 A1 WO2008084660 A1 WO 2008084660A1 JP 2007074696 W JP2007074696 W JP 2007074696W WO 2008084660 A1 WO2008084660 A1 WO 2008084660A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- matching
- regulator
- frequency matching
- electric component
- frequency
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
- H03H7/383—Impedance-matching networks comprising distributed impedance elements together with lumped impedance elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Electrotherapy Devices (AREA)
- Ac-Ac Conversion (AREA)
Abstract
高周波整合調整器の信頼性の向上を得ることを目的として、高周波発生装置と負荷装置の整合を調整する整合調整回路を形成する高周波整合調整器において、筐体と、整合調整回路の電気部品と、電気部品の端子に接続する配線材と、を備え、電気部品を配線材により筐体から浮かせてある、高周波整合調整器にある。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008553049A JPWO2008084660A1 (ja) | 2007-01-10 | 2007-12-21 | 高周波整合調整器 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007001926 | 2007-01-10 | ||
JP2007-001926 | 2007-01-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008084660A1 true WO2008084660A1 (ja) | 2008-07-17 |
Family
ID=39608557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/074696 WO2008084660A1 (ja) | 2007-01-10 | 2007-12-21 | 高周波整合調整器 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2008084660A1 (ja) |
TW (1) | TW200840132A (ja) |
WO (1) | WO2008084660A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180002814A (ko) * | 2015-05-05 | 2018-01-08 | 트럼프 휴팅거 에스피 제트 오. 오. | 플라즈마 임피던스 정합 유닛, 플라즈마 부하에 rf 전력을 공급하기 위한 시스템, 및 플라즈마 부하에 rf 전력을 공급하는 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0897086A (ja) * | 1994-09-29 | 1996-04-12 | Meidensha Corp | 真空コンデンサ |
JP2005142486A (ja) * | 2003-11-10 | 2005-06-02 | Pearl Kogyo Co Ltd | 整合器 |
JP2005303215A (ja) * | 2004-04-16 | 2005-10-27 | Daihen Corp | 可変容量コンデンサ及びこの可変容量コンデンサを備えたインピーダンス整合器 |
-
2007
- 2007-12-21 JP JP2008553049A patent/JPWO2008084660A1/ja active Pending
- 2007-12-21 WO PCT/JP2007/074696 patent/WO2008084660A1/ja active Application Filing
-
2008
- 2008-01-09 TW TW97100837A patent/TW200840132A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0897086A (ja) * | 1994-09-29 | 1996-04-12 | Meidensha Corp | 真空コンデンサ |
JP2005142486A (ja) * | 2003-11-10 | 2005-06-02 | Pearl Kogyo Co Ltd | 整合器 |
JP2005303215A (ja) * | 2004-04-16 | 2005-10-27 | Daihen Corp | 可変容量コンデンサ及びこの可変容量コンデンサを備えたインピーダンス整合器 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180002814A (ko) * | 2015-05-05 | 2018-01-08 | 트럼프 휴팅거 에스피 제트 오. 오. | 플라즈마 임피던스 정합 유닛, 플라즈마 부하에 rf 전력을 공급하기 위한 시스템, 및 플라즈마 부하에 rf 전력을 공급하는 방법 |
JP2018520457A (ja) * | 2015-05-05 | 2018-07-26 | トゥルンプフ ヒュッティンガー スプウカ ズ オグラニショナ オドポヴィヂャルノスツィアTRUMPF Huettinger Sp. z o. o. | プラズマインピーダンス整合装置、rf電力をプラズマ負荷に供給するためのシステムおよびrf電力をプラズマ負荷に供給する方法 |
US10410835B2 (en) | 2015-05-05 | 2019-09-10 | Trumpf Huettinger Sp. Z O. O. | Plasma impedance matching for supplying RF power to a plasma load |
KR102499938B1 (ko) | 2015-05-05 | 2023-02-14 | 트럼프 휴팅거 에스피 제트 오.오. | 플라즈마 임피던스 정합 유닛, 플라즈마 부하에 rf 전력을 공급하기 위한 시스템, 및 플라즈마 부하에 rf 전력을 공급하는 방법 |
Also Published As
Publication number | Publication date |
---|---|
TW200840132A (en) | 2008-10-01 |
JPWO2008084660A1 (ja) | 2010-04-30 |
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