WO2008084660A1 - 高周波整合調整器 - Google Patents

高周波整合調整器 Download PDF

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Publication number
WO2008084660A1
WO2008084660A1 PCT/JP2007/074696 JP2007074696W WO2008084660A1 WO 2008084660 A1 WO2008084660 A1 WO 2008084660A1 JP 2007074696 W JP2007074696 W JP 2007074696W WO 2008084660 A1 WO2008084660 A1 WO 2008084660A1
Authority
WO
WIPO (PCT)
Prior art keywords
matching
regulator
frequency matching
electric component
frequency
Prior art date
Application number
PCT/JP2007/074696
Other languages
English (en)
French (fr)
Inventor
Akitoshi Okino
Hidekazu Miyahara
Taichi Kageyasu
Original Assignee
Tokyo Institute Of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Institute Of Technology filed Critical Tokyo Institute Of Technology
Priority to JP2008553049A priority Critical patent/JPWO2008084660A1/ja
Publication of WO2008084660A1 publication Critical patent/WO2008084660A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/383—Impedance-matching networks comprising distributed impedance elements together with lumped impedance elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Electrotherapy Devices (AREA)
  • Ac-Ac Conversion (AREA)

Abstract

　高周波整合調整器の信頼性の向上を得ることを目的として、高周波発生装置と負荷装置の整合を調整する整合調整回路を形成する高周波整合調整器において、筐体と、整合調整回路の電気部品と、電気部品の端子に接続する配線材と、を備え、電気部品を配線材により筐体から浮かせてある、高周波整合調整器にある。  
PCT/JP2007/074696 2007-01-10 2007-12-21 高周波整合調整器 WO2008084660A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008553049A JPWO2008084660A1 (ja) 2007-01-10 2007-12-21 高周波整合調整器

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007001926 2007-01-10
JP2007-001926 2007-01-10

Publications (1)

Publication Number Publication Date
WO2008084660A1 true WO2008084660A1 (ja) 2008-07-17

Family

ID=39608557

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/074696 WO2008084660A1 (ja) 2007-01-10 2007-12-21 高周波整合調整器

Country Status (3)

Country Link
JP (1) JPWO2008084660A1 (ja)
TW (1) TW200840132A (ja)
WO (1) WO2008084660A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180002814A (ko) * 2015-05-05 2018-01-08 트럼프 휴팅거 에스피 제트 오. 오. 플라즈마 임피던스 정합 유닛, 플라즈마 부하에 rf 전력을 공급하기 위한 시스템, 및 플라즈마 부하에 rf 전력을 공급하는 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0897086A (ja) * 1994-09-29 1996-04-12 Meidensha Corp 真空コンデンサ
JP2005142486A (ja) * 2003-11-10 2005-06-02 Pearl Kogyo Co Ltd 整合器
JP2005303215A (ja) * 2004-04-16 2005-10-27 Daihen Corp 可変容量コンデンサ及びこの可変容量コンデンサを備えたインピーダンス整合器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0897086A (ja) * 1994-09-29 1996-04-12 Meidensha Corp 真空コンデンサ
JP2005142486A (ja) * 2003-11-10 2005-06-02 Pearl Kogyo Co Ltd 整合器
JP2005303215A (ja) * 2004-04-16 2005-10-27 Daihen Corp 可変容量コンデンサ及びこの可変容量コンデンサを備えたインピーダンス整合器

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180002814A (ko) * 2015-05-05 2018-01-08 트럼프 휴팅거 에스피 제트 오. 오. 플라즈마 임피던스 정합 유닛, 플라즈마 부하에 rf 전력을 공급하기 위한 시스템, 및 플라즈마 부하에 rf 전력을 공급하는 방법
JP2018520457A (ja) * 2015-05-05 2018-07-26 トゥルンプフ ヒュッティンガー スプウカ ズ オグラニショナ オドポヴィヂャルノスツィアＴＲＵＭＰＦ Ｈｕｅｔｔｉｎｇｅｒ Ｓｐ． ｚ ｏ． ｏ． プラズマインピーダンス整合装置、ｒｆ電力をプラズマ負荷に供給するためのシステムおよびｒｆ電力をプラズマ負荷に供給する方法
US10410835B2 (en) 2015-05-05 2019-09-10 Trumpf Huettinger Sp. Z O. O. Plasma impedance matching for supplying RF power to a plasma load
KR102499938B1 (ko) 2015-05-05 2023-02-14 트럼프 휴팅거 에스피 제트 오.오. 플라즈마 임피던스 정합 유닛, 플라즈마 부하에 rf 전력을 공급하기 위한 시스템, 및 플라즈마 부하에 rf 전력을 공급하는 방법

Also Published As

Publication number Publication date
TW200840132A (en) 2008-10-01
JPWO2008084660A1 (ja) 2010-04-30

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