WO2008081731A1 - ポジ型レジスト組成物およびレジストパターン形成方法 - Google Patents

ポジ型レジスト組成物およびレジストパターン形成方法 Download PDF

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Publication number
WO2008081731A1
WO2008081731A1 PCT/JP2007/074521 JP2007074521W WO2008081731A1 WO 2008081731 A1 WO2008081731 A1 WO 2008081731A1 JP 2007074521 W JP2007074521 W JP 2007074521W WO 2008081731 A1 WO2008081731 A1 WO 2008081731A1
Authority
WO
WIPO (PCT)
Prior art keywords
acid
phenol compound
positive
formation
resist composition
Prior art date
Application number
PCT/JP2007/074521
Other languages
English (en)
French (fr)
Inventor
Daiju Shiono
Takako Suzuki
Original Assignee
Tokyo Ohka Kogyo Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co., Ltd. filed Critical Tokyo Ohka Kogyo Co., Ltd.
Publication of WO2008081731A1 publication Critical patent/WO2008081731A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/02—Diaryl- or thriarylmethane dyes derived from diarylmethanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/06—Hydroxy derivatives of triarylmethanes in which at least one OH group is bound to an aryl nucleus and their ethers or esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/103—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a diaryl- or triarylmethane dye
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

　下記一般式（Ｉ）で表されるフェノール化合物またはその水酸基の水素原子の一部が炭素数１～１０のアルキル基で置換された置換フェノール化合物の水酸基の水素原子の一部または全部が酸解離性溶解抑制基で置換された（Ａ１）成分と、酸解離性溶解抑制基を有する構成単位（ａ１）を含有し、酸の作用によりアルカリ溶解性が増大する樹脂成分（Ａ２）と、放射線の照射により酸を発生する酸発生剤成分（Ｂ）とを含有するポジ型レジスト組成物。 　　[化１]
PCT/JP2007/074521 2006-12-28 2007-12-20 ポジ型レジスト組成物およびレジストパターン形成方法 WO2008081731A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-353933 2006-12-28
JP2006353933A JP2008164904A (ja) 2006-12-28 2006-12-28 ポジ型レジスト組成物およびレジストパターン形成方法

Publications (1)

Publication Number Publication Date
WO2008081731A1 true WO2008081731A1 (ja) 2008-07-10

Family

ID=39588416

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/074521 WO2008081731A1 (ja) 2006-12-28 2007-12-20 ポジ型レジスト組成物およびレジストパターン形成方法

Country Status (2)

Country Link
JP (1) JP2008164904A (ja)
WO (1) WO2008081731A1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10123703A (ja) * 1996-10-18 1998-05-15 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP2006078744A (ja) * 2004-09-09 2006-03-23 Tokyo Ohka Kogyo Co Ltd Ｅｕｖ用レジスト組成物およびレジストパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10123703A (ja) * 1996-10-18 1998-05-15 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP2006078744A (ja) * 2004-09-09 2006-03-23 Tokyo Ohka Kogyo Co Ltd Ｅｕｖ用レジスト組成物およびレジストパターン形成方法

Also Published As

Publication number Publication date
JP2008164904A (ja) 2008-07-17

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