WO2008075452A1 - 半導体素子の冷却に用いる熱交換器およびその製造方法 - Google Patents
半導体素子の冷却に用いる熱交換器およびその製造方法 Download PDFInfo
- Publication number
- WO2008075452A1 WO2008075452A1 PCT/JP2007/001339 JP2007001339W WO2008075452A1 WO 2008075452 A1 WO2008075452 A1 WO 2008075452A1 JP 2007001339 W JP2007001339 W JP 2007001339W WO 2008075452 A1 WO2008075452 A1 WO 2008075452A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- heat exchanger
- refrigerant
- microchannel
- flow
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/427—Cooling by change of state, e.g. use of heat pipes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/4935—Heat exchanger or boiler making
Definitions
- Heat exchanger used for cooling semiconductor element and method for manufacturing the same
- the present invention relates to a heat exchanger used for cooling a semiconductor using a micro flow path and a boiling phenomenon, and a method for manufacturing the same.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2 00 1 _ 2 8 4 15
- the present invention has been made under such a background, and by controlling the behavior of the generated boiling bubbles, stable operation and reliability of a phase change heat exchanger having a micro flow channel are achieved.
- a heat exchanger capable of improving the performance and a method for manufacturing the same are provided.
- the present invention is characterized by having a mechanism capable of positively managing the behavior of boiling bubbles in a microchannel.
- the flow path is manufactured in two layers, and a material that elastically deforms according to the pressure difference between the layers is used.
- the layers are connected to each other, and the connection portion has a certain resistance to the flow of the refrigerant flowing from the layer supplying the refrigerant into the layer having the micro flow path.
- Provide resistance means pores or barriers
- this layer is connected in the same way as the second mechanism, but the internal pressure of the layer portion on the side of supplying the refrigerant is kept lower than that in the micro flow path.
- the pressure on the back surface of the elastic material is almost equal to the pressure upstream of the microchannel, so that when the pressure in the microchannel is in a stable state, the pressure on the back surface becomes the pressure in the microchannel.
- This elastic material is pressed against the upper surface of the microchannel to isolate the microchannel.
- the secondary bubbles are generated in the micro flow channel, and the vapor bubbles that are about to stay are efficiently exhausted from the flow channel. That is, since the internal pressure of the layer on the refrigerant supply side is kept higher than the internal pressure of the layer on the side having the micro flow path, a nozzle is provided in a partition separating two adjacent layers. Thus, a part of the refrigerant flows from the layer supplying the refrigerant through the nozzle to the layer having the micro flow path.
- the liquid has a higher viscosity than the gas state, and the nozzle has an effect of selectively exhausting the vapor bubbles.
- the pressure inside the bubbles temporarily becomes higher than the surrounding liquid pressure, and in this case, the bubbles are also selectively discharged.
- the present invention is a heat exchanger used for cooling a semiconductor element, and the feature of the present invention is that a first layer having a plurality of micro flow channels through which a refrigerant flows, And a second layer having a supply path for supplying a refrigerant to be supplied to the micro flow path, and a resistance means against a flow of the refrigerant flowing into the micro flow path from the supply path. And the adjacent portion between the first layer and the second layer is formed by an elastic body (first and second mechanisms).
- the heat exchanger of the present invention includes a third layer having a plurality of micro flow channels through which the refrigerant flows, and a refrigerant that is provided adjacent to the third layer and is supplied to the micro flow channel.
- a fourth layer having a supply path to supply, and a nozzle for generating a leakage flow of the refrigerant flowing in the supply path in a direction to increase the flow rate of the refrigerant flowing in the micro flow path.
- Second mechanism ).
- the heat exchanger of the present invention includes a fifth layer having a plurality of micro flow passages through which a refrigerant flows, and a refrigerant provided adjacent to the fifth layer and supplied to the micro flow passages.
- the present invention can also be viewed from the viewpoint of a method of manufacturing a heat exchanger.
- the present invention is a method of manufacturing a heat exchanger used for cooling a semiconductor element
- a feature of the present invention is that a step of forming a first layer having a plurality of micro flow channels through which a refrigerant flows; Forming a second layer provided adjacent to the first layer and having a supply path for supplying a refrigerant to be supplied to the micro flow path; and a refrigerant flowing into the micro flow path from the supply path Forming a resistance means against flow, and forming an adjacent portion of the first layer and the second layer by an elastic body (first and second mechanisms)
- the method of manufacturing a heat exchanger according to the present invention includes a step of forming a third layer having a plurality of micro flow channels through which a refrigerant flows, and the micro flow provided adjacent to the third layer. Forming a fourth layer having a supply path for supplying a refrigerant to be supplied to the path; and increasing the flow rate of the refrigerant flowing through the microchannel. And a step of forming a nozzle that generates a refrigerant flow through the passage (second mechanism).
- the method for manufacturing a heat exchanger of the present invention includes a step of forming a fifth layer having a plurality of micro flow passages through which a refrigerant flows, and the micro flow is provided adjacent to the fifth layer.
- the first effect of the present invention is to eliminate the phenomenon of hindering heat transfer due to the retention of bubbles by providing a mechanism that can positively divide and eliminate vapor bubbles by dividing into fine channels.
- the second effect is that, in a heat exchanger having a plurality of microchannels, by providing a structure that maintains a pressure balance between the microchannels, boiling is averaged in each microchannel. It is more stable and improves reliability as a heat exchanger.
- the above-mentioned effect can be obtained without increasing the installation area of the heat exchanger because the second-floor portion itself can be used as a manifold section due to the two-level structure. .
- FIG. 1 is a configuration diagram of a heat exchanger according to a first embodiment.
- FIG. 2 is a diagram showing a situation where steam bubbles are generated in the heat exchanger of the first embodiment.
- FIG. 3 is a configuration diagram of a heat exchanger according to a second embodiment.
- FIG. 4 is a configuration diagram of a heat exchanger according to a third embodiment.
- FIG. 1 shows a two-layer heat exchanger that uses a partition material that is elastically deformed based on the pressure between two layers.
- This heat exchanger has a heat receiving layer 16 with a staying layer 7 in the upper part and a microchannel 1 in the lower part.
- a barrier 17 is provided at the connection between the stagnant layer 7 and the heat receiving layer 16 so that the refrigerant supplied to the stagnant layer 7 from the fluid inlet 4 flows into the heat receiving layer 16 when the refrigerant flows. It becomes a resistance means against For this reason, the fluid velocity in the staying layer 7 is lower than that in the heat receiving layer 16, and the pressure in the staying layer 7 is higher than the pressure in the heat receiving layer 16.
- the fluid inlet 4 can be provided on the upper part of the staying layer 7, whereby the inlet manifold portion 5 can be reduced in size.
- the elastic partitioning surface 10 is characterized by using an elastic material for partitioning between layers.
- the elastic material for example, silicone rubber rubber material can be cited. It is also effective to use a metal material with low elasticity for the partition plate itself and hold the upper part with the rubber material as described above. In any case, the effect of alleviating the pressure difference between the adjacent flow paths can be obtained by raising and lowering the partition portion as the pressure of the heat receiving layer rises.
- FIG. 2 is a diagram showing a state in which the vapor bubbles 11 are generated in the microchannel 1 in the heat receiving layer 16.
- the internal pressure of the staying layer 7 is higher than the internal pressure of the heat receiving layer 16, and the elastic partitioning surface 10 functions to isolate a plurality of microchannels 1 from each other.
- the elastic partitioning surface 10 is pushed up by the pressure difference between the staying layer 7 and the heat receiving layer 16 and adjacent to it. Open the isolation state between the microchannels 1 and restore the pressure balance between the microchannels 1.
- the vapor bubble 11 that has grown is divided into adjacent microchannels 1 and exhausted, so that it is difficult for the vapor bubbles 11 to stay in the microchannel 1 that is the source of the vapor bubbles 11.
- FIG. 3 shows a second embodiment of the present invention, in which refrigerant is leaked from the staying layer 7 to the heat receiving layer 16 to receive heat.
- a two-layer heat exchanger with a mechanism to induce secondary flow in layer 16 is shown.
- an inelastic partition surface 12 is used as the partition surface.
- the characteristic secondary flow induction nozzle 1 3 is effective by creating an angle with respect to the refrigerant flow in the microchannel 1 and creating a forward flow with respect to the refrigerant flow. Secondary flow can be induced.
- the leak flow that flows from the stagnant layer 7 through the nozzle 13 to the heat receiving layer 16 causes a secondary flow in the heat receiving layer 16 to generate a fast flow rate generated in the heat receiving layer 16 Using this, the steam bubbles are quickly pushed toward the outlet manifold section 9.
- FIG. 4 shows a two-layer heat exchanger having a mechanism in which a saturated liquid outlet 15 and a steam outlet 8 are separated as a third embodiment of the present invention.
- the fluid inlet 4 is provided in the inlet manifold section 5, the effect of downsizing the inlet manifold section 5 compared to the conventional one is lost, but the heat exchanger block 2 is used for gas-liquid separation. Since the mechanism also has the effect, the installation area of the heat exchanger can be made smaller than the conventional type.
- the refrigerant supplied from the fluid inlet 4 is directly supplied to the heat receiving layer 16.
- the refrigerant as the liquid flows out from the heat receiving layer 16 through the pores 14 to the staying layer 7. Since the narrow hole 14 serves as a resistance means against the flow of the refrigerant, the internal pressure of the staying layer 7 is lower than the internal pressure of the heat receiving layer 16. As a result, the vapor bubbles grown on the upper part of the micro flow path 1 are sucked up by the pores 14 to the staying layer 7 on the upper part due to the pressure difference.
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/518,357 US20100025019A1 (en) | 2006-12-18 | 2007-12-03 | Heat exchanger for cooling semiconductor chip and method of manufacturing the same |
CN200780046650.8A CN101563775B (zh) | 2006-12-18 | 2007-12-03 | 用于冷却半导体芯片的热交换器和制造该热交换器的方法 |
JP2008550036A JP5277963B2 (ja) | 2006-12-18 | 2007-12-03 | 半導体素子の冷却に用いる熱交換器およびその製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-340007 | 2006-12-18 | ||
JP2006340007 | 2006-12-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008075452A1 true WO2008075452A1 (ja) | 2008-06-26 |
Family
ID=39536091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/001339 WO2008075452A1 (ja) | 2006-12-18 | 2007-12-03 | 半導体素子の冷却に用いる熱交換器およびその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20100025019A1 (ja) |
JP (1) | JP5277963B2 (ja) |
CN (1) | CN101563775B (ja) |
WO (1) | WO2008075452A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101752331B (zh) * | 2008-12-04 | 2013-04-24 | 富士通株式会社 | 冷却护套、冷却单元及电子设备 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101865864B (zh) * | 2010-06-08 | 2012-07-04 | 华东理工大学 | 电子元器件相变冷却效果的测试系统 |
CN103635771A (zh) | 2011-06-27 | 2014-03-12 | 开利公司 | 微孔壳管式换热器 |
CN108878388B (zh) * | 2018-06-21 | 2019-08-23 | 西安交通大学 | 一种强化沸腾表面气泡快速脱离的装置及其制造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09134983A (ja) * | 1995-11-09 | 1997-05-20 | Hitachi Ltd | 半導体装置 |
JP2005056951A (ja) * | 2003-07-31 | 2005-03-03 | Fuji Electric Systems Co Ltd | 放熱装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5077601A (en) * | 1988-09-09 | 1991-12-31 | Hitachi, Ltd. | Cooling system for cooling an electronic device and heat radiation fin for use in the cooling system |
JP2001028415A (ja) * | 1999-07-14 | 2001-01-30 | Denso Corp | 沸騰冷却装置 |
JP3815239B2 (ja) * | 2001-03-13 | 2006-08-30 | 日本電気株式会社 | 半導体素子の実装構造及びプリント配線基板 |
US6781834B2 (en) * | 2003-01-24 | 2004-08-24 | Hewlett-Packard Development Company, L.P. | Cooling device with air shower |
US6983790B2 (en) * | 2003-03-27 | 2006-01-10 | Mitsubishi Denki Kabushiki Kaisha | Heat transport device, semiconductor apparatus using the heat transport device and extra-atmospheric mobile unit using the heat transport device |
US7123479B2 (en) * | 2003-12-08 | 2006-10-17 | Intel Corporation | Enhanced flow channel for component cooling in computer systems |
JP2006156711A (ja) * | 2004-11-30 | 2006-06-15 | Mitsubishi Electric Corp | パワー半導体モジュールの冷却システム |
US20060137860A1 (en) * | 2004-12-29 | 2006-06-29 | Ravi Prasher | Heat flux based microchannel heat exchanger architecture for two phase and single phase flows |
-
2007
- 2007-12-03 WO PCT/JP2007/001339 patent/WO2008075452A1/ja active Application Filing
- 2007-12-03 US US12/518,357 patent/US20100025019A1/en not_active Abandoned
- 2007-12-03 CN CN200780046650.8A patent/CN101563775B/zh not_active Expired - Fee Related
- 2007-12-03 JP JP2008550036A patent/JP5277963B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09134983A (ja) * | 1995-11-09 | 1997-05-20 | Hitachi Ltd | 半導体装置 |
JP2005056951A (ja) * | 2003-07-31 | 2005-03-03 | Fuji Electric Systems Co Ltd | 放熱装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101752331B (zh) * | 2008-12-04 | 2013-04-24 | 富士通株式会社 | 冷却护套、冷却单元及电子设备 |
Also Published As
Publication number | Publication date |
---|---|
CN101563775B (zh) | 2011-10-05 |
CN101563775A (zh) | 2009-10-21 |
JPWO2008075452A1 (ja) | 2010-04-08 |
US20100025019A1 (en) | 2010-02-04 |
JP5277963B2 (ja) | 2013-08-28 |
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