WO2008050071A3 - Couche d ' alliage de nickel-titane comprenant des atomes d ' azote inseres, procede d ' implantation - Google Patents
Couche d ' alliage de nickel-titane comprenant des atomes d ' azote inseres, procede d ' implantation Download PDFInfo
- Publication number
- WO2008050071A3 WO2008050071A3 PCT/FR2007/052244 FR2007052244W WO2008050071A3 WO 2008050071 A3 WO2008050071 A3 WO 2008050071A3 FR 2007052244 W FR2007052244 W FR 2007052244W WO 2008050071 A3 WO2008050071 A3 WO 2008050071A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- nickel
- titanium alloy
- alloy containing
- nitrogen atoms
- Prior art date
Links
- 229910001000 nickel titanium Inorganic materials 0.000 title abstract 2
- 125000004433 nitrogen atom Chemical group N* 0.000 title abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0822—Multiple sources
- H01J2237/0825—Multiple sources for producing different ions simultaneously
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Materials For Medical Uses (AREA)
Abstract
Couche d'alliage de nickel-titane comprenant des atomes d'azote insérés sur une épaisseur supérieure ou égale à 0,05 μm, et où le profil de concentration de l'azote en fonction de l'épaisseur de la couche est une courbe résultant de la somme d'au moins deux courbes sensiblement gaussiennes. Les atomes d'azote sont insérés par implantation ionique multi-énergie. Procédé d'implantation associé.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0609392 | 2006-10-26 | ||
FR0609392A FR2907797B1 (fr) | 2006-10-26 | 2006-10-26 | Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif. |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008050071A2 WO2008050071A2 (fr) | 2008-05-02 |
WO2008050071A3 true WO2008050071A3 (fr) | 2008-08-07 |
Family
ID=39272279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2007/052244 WO2008050071A2 (fr) | 2006-10-26 | 2007-10-25 | Couche d ' alliage de nickel-titane comprenant des atomes d ' azote inseres, procede d ' implantation |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR2907797B1 (fr) |
WO (1) | WO2008050071A2 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102828157A (zh) * | 2012-07-30 | 2012-12-19 | 北京航空航天大学 | 一种Nb离子注入沉积对医用TiNi形状记忆合金进行表面改性的方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2942801B1 (fr) * | 2009-03-05 | 2012-03-23 | Quertech Ingenierie | Procede de traitement d'une piece en elastomere par des ions multi-energies he+ et he2+ pour diminuer le frottement |
CN101935824B (zh) | 2009-07-03 | 2013-03-06 | 中芯国际集成电路制造(上海)有限公司 | 离子注入方法、设备及形成轻掺杂结构的方法 |
FR2949236B1 (fr) | 2009-08-19 | 2011-10-28 | Aircelle Sa | Procede d'implantation ionique pour la realisation d'une surface hydrophobe |
CN101914757B (zh) * | 2010-07-21 | 2012-10-10 | 北京航空航天大学 | 一种表面注入金属元素的NiTi形状记忆合金及其制备方法 |
WO2016055842A1 (fr) * | 2014-08-15 | 2016-04-14 | Universidad Eafit | Matériau ternaire à base de titane, nickel et azote |
CN114561623A (zh) * | 2021-11-05 | 2022-05-31 | 杭州大和热磁电子有限公司 | 一种碲化铋材料表面处理方法 |
CN117512496B (zh) * | 2024-01-05 | 2024-03-08 | 沈阳市口腔医院 | 一种镍钛合金矫治弓丝表面防护的处理方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005085491A2 (fr) * | 2004-02-04 | 2005-09-15 | Societe Quertech Ingenierie (Qi) | Dispositif et procede d'implantation ionique d'une piece en alliage d'aluminium |
WO2006074604A1 (fr) * | 2005-01-13 | 2006-07-20 | Versitech Limited | Materiaux a memoire de forme traites en surface et procede de production associes |
-
2006
- 2006-10-26 FR FR0609392A patent/FR2907797B1/fr active Active
-
2007
- 2007-10-25 WO PCT/FR2007/052244 patent/WO2008050071A2/fr active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005085491A2 (fr) * | 2004-02-04 | 2005-09-15 | Societe Quertech Ingenierie (Qi) | Dispositif et procede d'implantation ionique d'une piece en alliage d'aluminium |
WO2006074604A1 (fr) * | 2005-01-13 | 2006-07-20 | Versitech Limited | Materiaux a memoire de forme traites en surface et procede de production associes |
Non-Patent Citations (1)
Title |
---|
FUKUMOTO S ET AL: "Corrosion resistance of nitrogen ion implanted titanium alloy for medical implants in physiological saline solution", ION IMPLANTATION TECHNOLOGY, 2000. CONFERENCE ON SEP. 17-22, 2000, PISCATAWAY, NJ, USA,IEEE, 17 September 2000 (2000-09-17), pages 777 - 780, XP010543189, ISBN: 978-0-7803-6462-2 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102828157A (zh) * | 2012-07-30 | 2012-12-19 | 北京航空航天大学 | 一种Nb离子注入沉积对医用TiNi形状记忆合金进行表面改性的方法 |
Also Published As
Publication number | Publication date |
---|---|
FR2907797A1 (fr) | 2008-05-02 |
WO2008050071A2 (fr) | 2008-05-02 |
FR2907797B1 (fr) | 2011-07-22 |
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