FR2907797B1 - Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif. - Google Patents

Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif.

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Publication number
FR2907797B1
FR2907797B1 FR0609392A FR0609392A FR2907797B1 FR 2907797 B1 FR2907797 B1 FR 2907797B1 FR 0609392 A FR0609392 A FR 0609392A FR 0609392 A FR0609392 A FR 0609392A FR 2907797 B1 FR2907797 B1 FR 2907797B1
Authority
FR
France
Prior art keywords
memory
same
alloy part
titanium nickel
ionic implantation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0609392A
Other languages
English (en)
Other versions
FR2907797A1 (fr
Inventor
Denis Busardo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ionics France SA
Original Assignee
Quertech Ingenierie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quertech Ingenierie SA filed Critical Quertech Ingenierie SA
Priority to FR0609392A priority Critical patent/FR2907797B1/fr
Priority to PCT/FR2007/052244 priority patent/WO2008050071A2/fr
Publication of FR2907797A1 publication Critical patent/FR2907797A1/fr
Application granted granted Critical
Publication of FR2907797B1 publication Critical patent/FR2907797B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0822—Multiple sources
    • H01J2237/0825—Multiple sources for producing different ions simultaneously

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Materials For Medical Uses (AREA)
FR0609392A 2006-10-26 2006-10-26 Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif. Active FR2907797B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0609392A FR2907797B1 (fr) 2006-10-26 2006-10-26 Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif.
PCT/FR2007/052244 WO2008050071A2 (fr) 2006-10-26 2007-10-25 Couche d ' alliage de nickel-titane comprenant des atomes d ' azote inseres, procede d ' implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0609392A FR2907797B1 (fr) 2006-10-26 2006-10-26 Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif.

Publications (2)

Publication Number Publication Date
FR2907797A1 FR2907797A1 (fr) 2008-05-02
FR2907797B1 true FR2907797B1 (fr) 2011-07-22

Family

ID=39272279

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0609392A Active FR2907797B1 (fr) 2006-10-26 2006-10-26 Dispositif de nitruration par implantation ionique d'une piece en alliage a memoire de forme en nickel titane et procede mettant en oeuvre un tel dispositif.

Country Status (2)

Country Link
FR (1) FR2907797B1 (fr)
WO (1) WO2008050071A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2942801B1 (fr) * 2009-03-05 2012-03-23 Quertech Ingenierie Procede de traitement d'une piece en elastomere par des ions multi-energies he+ et he2+ pour diminuer le frottement
CN101935824B (zh) 2009-07-03 2013-03-06 中芯国际集成电路制造(上海)有限公司 离子注入方法、设备及形成轻掺杂结构的方法
FR2949236B1 (fr) 2009-08-19 2011-10-28 Aircelle Sa Procede d'implantation ionique pour la realisation d'une surface hydrophobe
CN101914757B (zh) * 2010-07-21 2012-10-10 北京航空航天大学 一种表面注入金属元素的NiTi形状记忆合金及其制备方法
CN102828157B (zh) * 2012-07-30 2014-04-30 北京航空航天大学 一种Nb离子注入沉积对医用TiNi形状记忆合金进行表面改性的方法
WO2016055842A1 (fr) * 2014-08-15 2016-04-14 Universidad Eafit Matériau ternaire à base de titane, nickel et azote
CN114561623A (zh) * 2021-11-05 2022-05-31 杭州大和热磁电子有限公司 一种碲化铋材料表面处理方法
CN117512496B (zh) * 2024-01-05 2024-03-08 沈阳市口腔医院 一种镍钛合金矫治弓丝表面防护的处理方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2879625B1 (fr) * 2004-02-04 2007-04-27 Guernalec Frederic Dispositif de nitruration par implantation ionique d'une piece en alliage d'aluminium et procede mettant en oeuvre un tel dispositif
ATE485845T1 (de) * 2005-01-13 2010-11-15 Versitech Ltd Oberflächenbehandelte formspeichermaterialien und herstellungsverfahren dafür

Also Published As

Publication number Publication date
WO2008050071A2 (fr) 2008-05-02
FR2907797A1 (fr) 2008-05-02
WO2008050071A3 (fr) 2008-08-07

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