WO2008038663A1 - Method for manufacturing printed wiring board - Google Patents

Method for manufacturing printed wiring board Download PDF

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Publication number
WO2008038663A1
WO2008038663A1 PCT/JP2007/068676 JP2007068676W WO2008038663A1 WO 2008038663 A1 WO2008038663 A1 WO 2008038663A1 JP 2007068676 W JP2007068676 W JP 2007068676W WO 2008038663 A1 WO2008038663 A1 WO 2008038663A1
Authority
WO
WIPO (PCT)
Prior art keywords
catalyst
printed wiring
wiring board
plating
substrate body
Prior art date
Application number
PCT/JP2007/068676
Other languages
French (fr)
Japanese (ja)
Inventor
Hajime Sato
Kazuo Obara
Yoshihiro Taguchi
Kunio Mori
Hidetoshi Murakami
Original Assignee
Alps Electric Co., Ltd.
Daisho Denshi Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co., Ltd., Daisho Denshi Co., Ltd. filed Critical Alps Electric Co., Ltd.
Priority to JP2008536392A priority Critical patent/JP4751933B2/en
Priority to KR1020097008478A priority patent/KR101127547B1/en
Priority to CN2007800353355A priority patent/CN101606445B/en
Publication of WO2008038663A1 publication Critical patent/WO2008038663A1/en

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/426Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates without metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/429Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4661Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor

Definitions

  • the present invention relates to a method for manufacturing a printed wiring board on which various electronic components are mounted.
  • printed wiring boards with through holes are generally manufactured by the following procedure.
  • a copper clad laminate 4 having a copper foil 3 provided on both main surfaces of a substrate portion (substrate body) 2 made of epoxy resin or the like is prepared. Then, as shown in FIG. 7, films 8 are provided on both surfaces of the copper foil 3.
  • pattern films 9 for forming a conductor pattern are provided on both surfaces of the film 8.
  • ultraviolet rays UV
  • Part of this ultraviolet light is blocked by the pattern film 9, and the other part reaches the film 8 through the transmission part 10.
  • the portion of the film 8 where the ultraviolet rays have reached is cured.
  • the pattern film 9 is removed.
  • reference numeral 12 denotes a cured portion that is a cured portion of the film 8.
  • the film 8 other than the cured portion 12 and the copper foil 3 other than the cured portion 12 are removed through a development process and an etching process. Further, as shown in FIG. 11, the hardened portion 12 is peeled off. Then, as shown in FIG. 12, a layer portion 14 made of an epoxy resin is provided on both main surfaces of the substrate portion 2 so as to cover the copper foil 3. Then, as shown in FIG. 13, copper foils 15 are provided on both surfaces of the layer portion 14.
  • the substrate portion 2 and the like are degreased to attach the catalyst.
  • the entire surface is plated with copper to provide a plating layer 18.
  • the clasp layer 18 is also provided on the inner wall of the through hole 17 so that the front and back surfaces are conductive.
  • a pattern layer 20 is provided on the entire front and back surfaces of the substrate portion 2 provided with the plating layer 18. Then, as shown in FIG. 17, a pattern film 21 for forming a conductor pattern is provided on the surface of the pattern layer 20. In the exposure step, ultraviolet rays (UV) are irradiated through the pattern film 21. Then, as shown in FIG. 18, when the pattern film 21 is removed, a cured portion 22 is generated in a part of the pattern layer 20 as described above.
  • UV ultraviolet rays
  • the pattern layer 20 other than the cured portion 22 and the plating layer 18 other than the cured portion 22 are removed. Further, as shown in FIG. 20, the hardened portion 22 is peeled off.
  • the printed wiring board 1 shown in FIG. 20 is obtained. Further, if necessary, the above series of steps is repeated to laminate each layer into several layers.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2003-338690
  • the present invention has been made in view of such circumstances, and an object of the present invention is to provide a method for manufacturing a printed wiring board capable of quickly and easily obtaining a printed wiring board.
  • the present invention has the following aspects, for example.
  • a first aspect is a method for manufacturing a printed wiring board, which includes a degreasing process for degreasing a board body, and a conductive pattern formed on the board body degreased by the degreasing process.
  • a plating process for plating is
  • the substrate body is degreased by the degreasing step, and the ultraviolet light is irradiated to the portion corresponding to the position where the conductor pattern of the substrate body is not formed, and the catalyst attaching step. As a result, the catalyst adheres to the substrate body. Furthermore, the substrate body is plated by a plating process.
  • the second aspect is a method for producing the printed wiring board, preferably the catalyst is a Sn-Pd colloid.
  • the catalyst can be reliably attached to the substrate body, and the nail can be easily provided via the catalyst.
  • the third aspect is a method for manufacturing the printed wiring board, and preferably, the plating force is electroless copper plating or electroless nickel plating.
  • the fourth aspect is a method for producing the printed wiring board, wherein the substrate body is preferably an epoxy substrate, polybutylene terephthalate, polyphenylene sulfide, polysulfone sulfide, polyethylene terephthalate, polyarylate. , Polyimide, polyamide, liquid crystal polymer, glass or ceramics.
  • the number of processes can be drastically reduced by irradiating ultraviolet rays onto the substrate body on which the pattern film is installed, and applying the plating with the force and catalyst attached thereto. Therefore, a printed wiring board can be obtained quickly and easily.
  • FIG. 1 is a diagram showing an embodiment of a method for producing a printed wiring board according to the present invention, and is a side cross-sectional view of a printed wiring board showing a state where a copper layer portion is removed by an etching process It is a figure.
  • Figure 2 shows a pattern film placed in the layered area of Figure 1 and It is a sectional side view of the printed wiring board which shows a mode that an ultraviolet-ray is irradiated.
  • FIG. 3 is a side sectional view of a printed wiring board showing a state where the pattern film of FIG. 2 is removed and plating is performed.
  • FIG. 4 is an explanatory diagram showing a state in which the coating layer disappears due to the irradiation of ultraviolet rays and the plating layer is not formed.
  • FIG. 5 is an explanatory view showing a state in which a plating layer is formed in a layer portion.
  • FIG. 6 is a view showing a conventional method for manufacturing a printed wiring board, and is a side sectional view showing a copper-clad laminate.
  • FIG. 7 is a side sectional view showing a state in which a film is provided on the surface of the copper foil of FIG.
  • FIG. 8 is a side sectional view showing a state in which a pattern film is placed on the surface of the film of FIG. 7, and ultraviolet rays are irradiated through the pattern finer.
  • FIG. 9 is a side sectional view showing a state where the pattern film of FIG. 8 is removed.
  • FIG. 10 is a side sectional view showing a state in which a predetermined portion of film and copper foil are removed from the substrate of FIG. 9 and the like by development and etching.
  • FIG. 11 is a side sectional view showing a state where the hardened portion of FIG. 10 is peeled off.
  • FIG. 12 is a side sectional view showing a state in which a layer portion is provided on the substrate of FIG.
  • FIG. 13 is a side sectional view showing a state in which a copper layer portion is provided on the surface of the layer portion in FIG.
  • FIG. 14 is a side sectional view showing a state in which through holes are formed in the substrate of FIG.
  • FIG. 15 is a side sectional view showing a state in which a plating layer is provided in the through hole of FIG.
  • FIG. 16 is a side sectional view showing a state in which pattern layers are provided on both surfaces of the plating layer in FIG.
  • FIG. 17 is a side sectional view showing a state in which a pattern film is placed on the surface of the pattern layer in FIG. 16, and ultraviolet rays are irradiated through the pattern film.
  • FIG. 18 is a side sectional view showing a state where the pattern film of FIG. 17 is removed!
  • FIG. 19 shows a pattern of a predetermined portion by development and etching on the substrate of FIG. It is a sectional side view which shows a mode that the layer and the plating layer were removed.
  • FIG. 20 is a side sectional view showing a state where the hardened portion in FIG. 19 is peeled off.
  • an etching process is provided as shown in FIG. 1 either before or after the through-hole forming process.
  • the copper foil 15 is removed by etching.
  • the whole is degreased.
  • a coating layer 27 made of an amine such as triethanolamine is provided on the surface of the layer portion 14.
  • the coating layer 27 is provided for attaching the catalyst.
  • the pattern film 26 is installed on the film layers 27 on both surfaces of the layer portion 14.
  • the coating layer 27 is omitted, but actually, the coating layer is provided on both surfaces of the layer portion 14 as shown in FIG.
  • the layer portion 14 is irradiated with ultraviolet rays (UV) through the pattern film 26. At this time, the ultraviolet rays do not reach the through hole 17 and its surroundings by the mask formed by the pattern film 26.
  • UV ultraviolet rays
  • the pattern film 26 is removed, and the entire substrate is immersed in a catalyst such as Sn—Pd colloid. Thereby, a catalyst adheres to a predetermined part. Furthermore, as shown in Fig. 3, electroless copper plating is applied to the entire substrate in the plating process. As a result, the plated layer 29 is formed in the portion not irradiated with the ultraviolet ray, and the printed wiring board 30 in which the conductive pattern is formed on the front and back surfaces is obtained.
  • a catalyst such as Sn—Pd colloid.
  • the action of forming the plating layer 29 in a predetermined portion by irradiating with ultraviolet rays is considered as follows.
  • the catalyst adheres on the coating layer 27, and in the part where the catalyst adheres, the plating layer 29 by electroless copper plating is provided, The catalyst does not adhere to the part where the coating layer 27 is not provided, so the plating Layer 29 is also not formed.
  • FIG. 4 is an explanatory view showing a state in which the coating layer 27 disappears due to ultraviolet irradiation.
  • the coating layer 27 is decomposed into carbon dioxide (C02) and water (H20) and disappears.
  • the catalyst S does not adhere to the surface of the layer portion 14. Therefore, even if electroless copper plating is applied in the plating step, the plating layer 29 is not formed in the portion where the catalyst S without the coating layer 27 does not adhere.
  • FIG. 5 is an explanatory view showing a state in which the plating layer 29 is formed.
  • the ultraviolet rays do not reach the other predetermined portion of the coating layer 27 provided by the degreasing process due to the mask of the pattern film 26. Therefore, the coating layer 27 is left on the layer portion 14.
  • the catalyst S adheres to the surface of the remaining coating layer 27. Accordingly, the electroless copper plating is applied in the plating process, whereby the plating layer 29 is formed on the coating layer 27 via the catalyst S.
  • the mask with the pattern film 26 prevents the ultraviolet rays from reaching the through hole 17 and its periphery, so that the through hole 17 and the surrounding coating layer 27 remain. Thus, the other coating layer 27 is lost. Therefore, in the catalyst adhesion process, the catalyst adheres to the through hole 17 and the surrounding coating layer 27, and the catalyst does not adhere to the other portions. Therefore, as shown in FIG. 3, in the plating process, the adhesion layer 29 is formed in the through hole 17 and its periphery via the catalyst, and is not formed in the other portions.
  • the printed wiring board 30 can be obtained quickly and easily.
  • the catalyst is a Sn—Pd colloid, the catalyst can be reliably attached to the coating layer 27, and the plating layer 29 can be easily provided.
  • the plating is electroless copper plating
  • the plating layer 29 can be reliably provided.
  • the substrate portion 2 in the present embodiment is made of at least one of an epoxy substrate, polybutylene terephthalate, polyphenylene sulfide, polysulfone sulfide, polyethylene terephthalate, polyarylate, polyimide, polyamide, liquid crystal polymer, glass, or ceramics. is there. Thereby, the printed wiring board 1 can be obtained reliably.
  • a printed wiring board can be obtained quickly and easily.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

Provided is a method for manufacturing printed wiring boards, by which the printed wiring boards can be quickly and easily obtained. The method is provided with a degreasing step of degreasing a substrate section; a step of irradiating the substrate section, which has been degreased in the degreasing step, with ultraviolet in an area equivalent to a position where no conductive pattern is to be formed; a catalyst adhering step of adhering a catalyst on the substrate section after ultraviolet irradiation; and a plating step of plating the substrate section whereupon the catalyst has been adhered in the catalyst adhering step.

Description

明 細 書  Specification
プリント配線板の製造方法  Method for manufacturing printed wiring board
技術分野  Technical field
[0001] 本発明は、各種電子部品が実装されるプリント配線板の製造方法に関する。  The present invention relates to a method for manufacturing a printed wiring board on which various electronic components are mounted.
本願 (ま、 2006年 9月 26曰 ίこ出願された特願 2006— 260800号 ίこ対し優先権を 主張し、その内容をここに援用する。  This application (together, September 26, 2006, Japanese Patent Application No. 2006-260800 filed, claims priority, and the contents thereof are incorporated herein by reference.
背景技術  Background art
[0002] 従来より、各種電子部品が実装されて、電子機器などに設けられる種々のプリント 配線板が利用されて!/、る(例えば、特許文献 1参照)。  [0002] Conventionally, various printed wiring boards provided with various electronic components and provided in electronic devices and the like have been used! (See, for example, Patent Document 1).
これらプリント配線板のうち、スルーホールが存在するプリント配線板は一般に以下 の手順により、製造される。  Of these printed wiring boards, printed wiring boards with through holes are generally manufactured by the following procedure.
まず、図 6に示すように、エポキシ樹脂などからなる基板部(基板本体) 2の両主面 に銅箔 3が設けられた銅張積層板 4を用意する。そして、図 7に示すように、銅箔 3の 両表面に、フィルム 8を設ける。  First, as shown in FIG. 6, a copper clad laminate 4 having a copper foil 3 provided on both main surfaces of a substrate portion (substrate body) 2 made of epoxy resin or the like is prepared. Then, as shown in FIG. 7, films 8 are provided on both surfaces of the copper foil 3.
[0003] さらに、図 8に示すように、フィルム 8の両表面に、導体パターンを形成するための パターンフィルム 9を設ける。そして、露光工程において、パターンフィルム 9を介して 、紫外線 (UV)を照射する。この紫外線の一部は、パターンフィルム 9に遮られ、他の 一部は、透過部 10を通ってフィルム 8に到達する。そして、フィルム 8のうち、紫外線 が到達した部分は硬化する。それから、図 9に示すように、パターンフィルム 9を取り 除く。図 9において、符号 12は、フィルム 8のうちの硬化した部分である硬化部を示し ている。  Furthermore, as shown in FIG. 8, pattern films 9 for forming a conductor pattern are provided on both surfaces of the film 8. In the exposure step, ultraviolet rays (UV) are irradiated through the pattern film 9. Part of this ultraviolet light is blocked by the pattern film 9, and the other part reaches the film 8 through the transmission part 10. The portion of the film 8 where the ultraviolet rays have reached is cured. Then, as shown in Fig. 9, the pattern film 9 is removed. In FIG. 9, reference numeral 12 denotes a cured portion that is a cured portion of the film 8.
[0004] 次いで、図 10に示すように、現像工程及びエッチング工程を経て、硬化部 12以外 のフィルム 8と、硬化部 12以外の部分の銅箔 3とを取り除く。さらに、図 11に示すよう に、硬化部 12を剥離する。それから、図 12に示すように、基板部 2の両主面に、銅箔 3を覆うようにして、エポキシ樹脂からなる階層部 14を設ける。そして、図 13に示すよ うに、階層部 14の両表面に、銅箔 15を設ける。  Next, as shown in FIG. 10, the film 8 other than the cured portion 12 and the copper foil 3 other than the cured portion 12 are removed through a development process and an etching process. Further, as shown in FIG. 11, the hardened portion 12 is peeled off. Then, as shown in FIG. 12, a layer portion 14 made of an epoxy resin is provided on both main surfaces of the substrate portion 2 so as to cover the copper foil 3. Then, as shown in FIG. 13, copper foils 15 are provided on both surfaces of the layer portion 14.
[0005] それから、図 14に示すように、スルーホール形成工程において、基板部 2、銅箔 3、 階層部 14及び銅箔 15を、図 14における上下方向(厚さ方向)に貫通するスルーホ ール 17を形成する。そして、スルーホール 17を洗浄する。 [0005] Then, as shown in FIG. 14, in the through-hole forming process, the substrate portion 2, the copper foil 3, A through-hole 17 is formed that penetrates the layer portion 14 and the copper foil 15 in the vertical direction (thickness direction) in FIG. Then, the through hole 17 is washed.
次いで、基板部 2などを脱脂して、触媒を付着させる。それから、図 15に示すように 、全体に銅めつきを施してめっき層 18を設ける。これにより、スルーホール 17の内壁 にもめつき層 18が設けられ、表裏面が導通する。  Next, the substrate portion 2 and the like are degreased to attach the catalyst. Then, as shown in FIG. 15, the entire surface is plated with copper to provide a plating layer 18. As a result, the clasp layer 18 is also provided on the inner wall of the through hole 17 so that the front and back surfaces are conductive.
[0006] さらに、図 16に示すように、めっき層 18を設けた基板部 2の表裏面の全体に、パタ ーン層 20を設ける。そして、図 17に示すように、パターン層 20の表面に、導体バタ ーンを形成するためのパターンフィルム 21を設ける。そして、露光工程において、ノ ターンフィルム 21を介して、紫外線 (UV)を照射する。それから、図 18に示すように、 パターンフィルム 21を取り除くと、上記と同様に、パターン層 20の一部に硬化部 22 が生成される。 Further, as shown in FIG. 16, a pattern layer 20 is provided on the entire front and back surfaces of the substrate portion 2 provided with the plating layer 18. Then, as shown in FIG. 17, a pattern film 21 for forming a conductor pattern is provided on the surface of the pattern layer 20. In the exposure step, ultraviolet rays (UV) are irradiated through the pattern film 21. Then, as shown in FIG. 18, when the pattern film 21 is removed, a cured portion 22 is generated in a part of the pattern layer 20 as described above.
[0007] 次いで、図 19に示すように、現像工程及びエッチング工程において、硬化部 22以 外のパターン層 20と、硬化部 22以外の部分のめっき層 18とを取り除く。さらに、図 2 0に示すように、硬化部 22を剥離する。  Next, as shown in FIG. 19, in the development step and the etching step, the pattern layer 20 other than the cured portion 22 and the plating layer 18 other than the cured portion 22 are removed. Further, as shown in FIG. 20, the hardened portion 22 is peeled off.
これにより、図 20に示すプリント配線板 1が得られる。更に、必要に応じて、上記一 連の工程を繰り返し、各層が何層かに積層される。  Thereby, the printed wiring board 1 shown in FIG. 20 is obtained. Further, if necessary, the above series of steps is repeated to laminate each layer into several layers.
[0008] しかしながら、上記のようなプリント配線板の製造方法では、スルーホールを形成し た後、さらに、脱脂、触媒付着、めっき、パターン層形成、パターンフィルム設置、露 光、現像、エッチング及びパターンフィルム剥離などの工程を必要とする。このため、 プリント配線板の製造に非常に手間力 Sかかってしまい、作業負担が増大してしまうと いう問題がある。  However, in the method for producing a printed wiring board as described above, after forming the through hole, degreasing, catalyst adhesion, plating, pattern layer formation, pattern film installation, exposure, development, etching and patterning are further performed. A process such as film peeling is required. For this reason, there is a problem that the manufacturing work of the printed wiring board is very troublesome and the work load increases.
特許文献 1 :特開 2003— 338690号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 2003-338690
発明の開示  Disclosure of the invention
[0009] 本発明は、このような事情に鑑みてなされたものであって、迅速かつ容易にプリント 配線板を得ることができるプリント配線板の製造方法を提供することを目的とする。  [0009] The present invention has been made in view of such circumstances, and an object of the present invention is to provide a method for manufacturing a printed wiring board capable of quickly and easily obtaining a printed wiring board.
[0010] 本発明は、上記課題を解決するために、例えば、以下の側面を有する。 In order to solve the above-described problems, the present invention has the following aspects, for example.
第 1の側面は、プリント配線板の製造方法であって、基板本体を脱脂する脱脂工程 と、前記脱脂工程によって脱脂された基板本体に、導体パターンを形成するため、導 体パターンを形成しなレ、位置に相当する箇所に紫外線を照射する工程と、紫外線照 射後の基板本体に触媒を付着させる触媒付着工程と、前記触媒付着工程によって 触媒が付着した基板本体にめっきを施すめっき工程とを順に含む。 A first aspect is a method for manufacturing a printed wiring board, which includes a degreasing process for degreasing a board body, and a conductive pattern formed on the board body degreased by the degreasing process. A step of irradiating ultraviolet rays to a position corresponding to the position where the body pattern is not formed, a catalyst attaching step of attaching a catalyst to the substrate body after the ultraviolet irradiation, and a substrate body on which the catalyst is attached by the catalyst attaching step And a plating process for plating.
[0011] 上記プリント配線板の製造方法において、脱脂工程により、基板本体が脱脂され、 紫外線照射工程によって、基板本体の導体パターンを形成しない位置に相当する箇 所に紫外線が照射され、触媒付着工程によって、基板本体に触媒が付着する。さら に、めっき工程によって、基板本体にめっきが施される。 [0011] In the method for producing a printed wiring board, the substrate body is degreased by the degreasing step, and the ultraviolet light is irradiated to the portion corresponding to the position where the conductor pattern of the substrate body is not formed, and the catalyst attaching step. As a result, the catalyst adheres to the substrate body. Furthermore, the substrate body is plated by a plating process.
これにより、従来よりも工程数を激減させることができ、そのため、迅速かつ容易に プリント配線板を得ることができる。  As a result, the number of processes can be drastically reduced as compared with the prior art, and therefore a printed wiring board can be obtained quickly and easily.
[0012] また、第 2の側面は上記プリント配線板の製造方法であって、好ましくは、前記触媒 、 Sn— Pdコロイドである。  [0012] The second aspect is a method for producing the printed wiring board, preferably the catalyst is a Sn-Pd colloid.
[0013] 上記プリント配線板の製造方法によれば、基板本体に触媒を確実に付着させること ができ、さらに触媒を介してめつきを容易に設けることができる。  [0013] According to the method for producing a printed wiring board, the catalyst can be reliably attached to the substrate body, and the nail can be easily provided via the catalyst.
[0014] また、第 3の側面は上記プリント配線板の製造方法であって、好ましくは、前記めつ き力 無電解銅めつきまたは無電解ニッケルめっきである。  [0014] Further, the third aspect is a method for manufacturing the printed wiring board, and preferably, the plating force is electroless copper plating or electroless nickel plating.
[0015] 上記プリント配線板の製造方法によれば、確実にめっきを設けることができる。  [0015] According to the method for manufacturing a printed wiring board, plating can be reliably provided.
[0016] また、第 4の側面は上記プリント配線板の製造方法であって、好ましくは、前記基板 本体が、エポキシ基板、ポリブチレンテレフタレート、ポリフエ二レンサルファイド、ポリ スルホンサルファイド、ポリエチレンテレフタレート、ポリアリレート、ポリイミド、ポリアミド 、液晶ポリマー、ガラス又はセラミックスの少なくとも一つからなる。  [0016] The fourth aspect is a method for producing the printed wiring board, wherein the substrate body is preferably an epoxy substrate, polybutylene terephthalate, polyphenylene sulfide, polysulfone sulfide, polyethylene terephthalate, polyarylate. , Polyimide, polyamide, liquid crystal polymer, glass or ceramics.
[0017] 本発明によれば、パターンフィルムが設置された基板本体に紫外線を照射し、それ 力、ら触媒を付着させてめっきを施すことにより、従来よりも工程数を激減させることが でき、そのため、迅速かつ容易にプリント配線板を得ることができる。  [0017] According to the present invention, the number of processes can be drastically reduced by irradiating ultraviolet rays onto the substrate body on which the pattern film is installed, and applying the plating with the force and catalyst attached thereto. Therefore, a printed wiring board can be obtained quickly and easily.
図面の簡単な説明  Brief Description of Drawings
[0018] [図 1]図 1は、本発明に係るプリント配線板の製造方法の実施形態を示す図であって 、エッチング工程により、銅層部を取り除いた様子を示すプリント配線板の側断面図 である。  FIG. 1 is a diagram showing an embodiment of a method for producing a printed wiring board according to the present invention, and is a side cross-sectional view of a printed wiring board showing a state where a copper layer portion is removed by an etching process It is a figure.
[図 2]図 2は、図 1の階層部にパターンフィルムを設置し、そのパターンフィルムを介し て紫外線を照射する様子を示すプリント配線板の側断面図である。 [Figure 2] Figure 2 shows a pattern film placed in the layered area of Figure 1 and It is a sectional side view of the printed wiring board which shows a mode that an ultraviolet-ray is irradiated.
[図 3]図 3は、図 2のパターンフィルムを取り除き、めっきを施した様子を示すプリント配 線板の側断面図である。  FIG. 3 is a side sectional view of a printed wiring board showing a state where the pattern film of FIG. 2 is removed and plating is performed.
園 4]図 4は、紫外線の照射により被膜層が無くなり、めっき層が形成されない様子を 示す説明図である。 4] FIG. 4 is an explanatory diagram showing a state in which the coating layer disappears due to the irradiation of ultraviolet rays and the plating layer is not formed.
[図 5]図 5は、階層部にめっき層が形成される様子を示す説明図である。  FIG. 5 is an explanatory view showing a state in which a plating layer is formed in a layer portion.
[図 6]図 6は、従来のプリント配線板の製造方法を示す図であって、銅張積層板を示 す側断面図である。  FIG. 6 is a view showing a conventional method for manufacturing a printed wiring board, and is a side sectional view showing a copper-clad laminate.
[図 7]図 7は、図 6の銅箔の表面にフィルムを設けた様子を示す側断面図である。  FIG. 7 is a side sectional view showing a state in which a film is provided on the surface of the copper foil of FIG.
[図 8]図 8は、図 7のフィルムの表面にパターンフィルムを設置し、そのパターンフィノレ ムを介して紫外線を照射する様子を示す側断面図である。  FIG. 8 is a side sectional view showing a state in which a pattern film is placed on the surface of the film of FIG. 7, and ultraviolet rays are irradiated through the pattern finer.
[図 9]図 9は、図 8のパターンフィルムを取り外した様子を示す側断面図である。  FIG. 9 is a side sectional view showing a state where the pattern film of FIG. 8 is removed.
[図 10]図 10は、図 9の基板などに、現像、エッチングにより、所定の部分のフィルムと 銅箔とを取り除いた様子を示す側断面図である。  FIG. 10 is a side sectional view showing a state in which a predetermined portion of film and copper foil are removed from the substrate of FIG. 9 and the like by development and etching.
[図 11]図 11は、図 10の硬化部を剥離した様子を示す側断面図である。  FIG. 11 is a side sectional view showing a state where the hardened portion of FIG. 10 is peeled off.
園 12]図 12は、図 11の基板に階層部を設けた様子を示す側断面図である。 12] FIG. 12 is a side sectional view showing a state in which a layer portion is provided on the substrate of FIG.
[図 13]図 13は、図 12の階層部の表面に銅層部を設けた様子を示す側断面図である  13 is a side sectional view showing a state in which a copper layer portion is provided on the surface of the layer portion in FIG.
[図 14]図 14は、図 13の基板などにスルーホールを形成した様子を示す側断面図で ある。 FIG. 14 is a side sectional view showing a state in which through holes are formed in the substrate of FIG.
[図 15]図 15は、図 14のスルーホールなどにめっき層を設けた様子を示す側断面図 である。  FIG. 15 is a side sectional view showing a state in which a plating layer is provided in the through hole of FIG.
[図 16]図 16は、図 15のめつき層の両表面にパターン層を設けた様子を示す側断面 図である。  FIG. 16 is a side sectional view showing a state in which pattern layers are provided on both surfaces of the plating layer in FIG.
[図 17]図 17は、図 16のパターン層の表面にパターンフィルムを設置し、そのパター ンフィルムを介して紫外線を照射する様子を示す側断面図である。  FIG. 17 is a side sectional view showing a state in which a pattern film is placed on the surface of the pattern layer in FIG. 16, and ultraviolet rays are irradiated through the pattern film.
[図 18]図 18は、図 17のパターンフィルムを取り除!/、た様子を示す側断面図である。 FIG. 18 is a side sectional view showing a state where the pattern film of FIG. 17 is removed!
[図 19]図 19は、図 18の基板などに、現像、エッチングにより、所定の部分のパターン 層とめっき層とを取り除いた様子を示す側断面図である。 [FIG. 19] FIG. 19 shows a pattern of a predetermined portion by development and etching on the substrate of FIG. It is a sectional side view which shows a mode that the layer and the plating layer were removed.
[図 20]図 20は、図 19の硬化部を剥離した様子を示す側断面図である。  FIG. 20 is a side sectional view showing a state where the hardened portion in FIG. 19 is peeled off.
符号の説明 Explanation of symbols
1·· 'プリント配線板  1 ... 'Printed wiring board
2·· •基板部(基板本体)  2 • Board part (board body)
3·· •銅箔  3. Copper foil
4·· •銅張積層板  4 ... Copper clad laminate
8·· 'フイノレム  8 '' Finorem
9·· 'パターンフィルム  9 ... 'Pattern film
10· ··透過部  10 ... Transparent part
12· ··硬化部  12 ... Hardening part
14· ··階層部  14 ··· Hierarchy
15· ··銅箔  15 ... Copper foil
17· • 'スノレ一ホーノレ  17 · • 'Snow and Honoré
18· ··めっき層  18 ... Plating layer
20· ··パターン層  20 ... Pattern layer
21· ..パターンフィルム  21 .. Pattern film
22· ··硬化部  22 ··· Hardened part
26· ..パターンフィルム  26 .. Pattern film
27· ··被膜層  27 ··· Coating layer
29· ··めっき層  29 ... Plating layer
30· ··プリント配線板  30 ... Printed wiring board
•触媒  • Catalyst
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
(実施形態) (Embodiment)
以下、本発明の一例である以下の実施形態について説明する。本実施形態にお いては、スルーホールが存在するプリント配線板の製造方法について、図面を参照し て説明を行う。 本実施形態におけるプリント配線板の製造方法においては、まず、図 6に示す従来 の銅張積層板 4を用意する。以降、図 14に示すスルーホール 17を形成する工程ま では、本実施形態と従来の工程とは同じであるので、説明を省略する。 Hereinafter, the following embodiment which is an example of the present invention will be described. In the present embodiment, a method for manufacturing a printed wiring board having a through hole will be described with reference to the drawings. In the method for manufacturing a printed wiring board in the present embodiment, first, a conventional copper-clad laminate 4 shown in FIG. 6 is prepared. Henceforth, since this embodiment and the conventional process are the same up to the process of forming the through hole 17 shown in FIG. 14, the description thereof is omitted.
[0021] なお、図 14に示すように、スノレーホ一ノレ 17は、スルーホール形成工程によって形 成されたものとして説明する。 Note that, as shown in FIG. 14, the explanation will be made assuming that the snorkel wheel 17 is formed by the through hole forming step.
本実施形態においては、スルーホール形成工程の前または後のいずれかで、図 1 に示すように、エッチング工程を設ける。このエッチング工程において、エッチングに より銅箔 15を取り除く。そして、脱脂工程において、全体を脱脂する。これにより、図 5 に示すように、階層部 14の表面に、例えば、トリエタノールァミンなどのアミン類から なる被膜層 27が設けられる。なお、この被膜層 27は、触媒を付着させるために設け られる。  In this embodiment, an etching process is provided as shown in FIG. 1 either before or after the through-hole forming process. In this etching process, the copper foil 15 is removed by etching. And in the degreasing process, the whole is degreased. Thus, as shown in FIG. 5, a coating layer 27 made of an amine such as triethanolamine is provided on the surface of the layer portion 14. The coating layer 27 is provided for attaching the catalyst.
[0022] それから、図 2に示すように、フィルム設置工程において、階層部 14の両表面の被 膜層 27上に、パターンフィルム 26を設置する。なお、図 2においては、被膜層 27を 省略しているが、実際には、図 5に示すように、階層部 14の両表面に被膜層が設け られている。次いで、紫外線照射工程において、パターンフィルム 26を介して、階層 部 14に紫外線(UV)を照射する。このとき、パターンフィルム 26によるマスクによって 、スルーホール 17とその周辺には、紫外線が到達しない。  Then, as shown in FIG. 2, in the film installation process, the pattern film 26 is installed on the film layers 27 on both surfaces of the layer portion 14. In FIG. 2, the coating layer 27 is omitted, but actually, the coating layer is provided on both surfaces of the layer portion 14 as shown in FIG. Next, in the ultraviolet irradiation step, the layer portion 14 is irradiated with ultraviolet rays (UV) through the pattern film 26. At this time, the ultraviolet rays do not reach the through hole 17 and its surroundings by the mask formed by the pattern film 26.
[0023] それから、パターンフィルム 26を取り除き、例えば Sn— Pdコロイドなどの触媒に基 板の全体を浸漬する。これにより、所定の部分に触媒が付着する。さらに、図 3に示 すように、めっき工程において、基板の全体に無電解銅めつきを施す。これにより、紫 外線が照射されなかった部分にめっき層 29が形成され、表裏面で導通したパターン が形成されたプリント配線板 30が得られる。  [0023] Then, the pattern film 26 is removed, and the entire substrate is immersed in a catalyst such as Sn—Pd colloid. Thereby, a catalyst adheres to a predetermined part. Furthermore, as shown in Fig. 3, electroless copper plating is applied to the entire substrate in the plating process. As a result, the plated layer 29 is formed in the portion not irradiated with the ultraviolet ray, and the printed wiring board 30 in which the conductive pattern is formed on the front and back surfaces is obtained.
[0024] ここで、紫外線を照射することにより、所定の部分にめっき層 29が形成される作用 は、以下のように考えられる。  Here, the action of forming the plating layer 29 in a predetermined portion by irradiating with ultraviolet rays is considered as follows.
すなわち、脱脂により被膜層 27が設けられた部分には、この被膜層 27の上に触媒 が付着し、この触媒が付着した部分に、無電解銅めつきによるめつき層 29が設けられ 一方、被膜層 27が設けられていない部分には、触媒が付着せず、そのため、めっき 層 29も形成されない。 That is, in the part where the coating layer 27 is provided by degreasing, the catalyst adheres on the coating layer 27, and in the part where the catalyst adheres, the plating layer 29 by electroless copper plating is provided, The catalyst does not adhere to the part where the coating layer 27 is not provided, so the plating Layer 29 is also not formed.
[0025] 図 4及び図 5はこれらの処理を説明する図である。 4 and 5 are diagrams for explaining these processes.
図 4は、紫外線の照射により被膜層 27が無くなる様子を示す説明図である。  FIG. 4 is an explanatory view showing a state in which the coating layer 27 disappears due to ultraviolet irradiation.
まず、脱脂工程によって設けられた被膜層 27の所定の部分に、紫外線が到達する と、その到達した部分では、紫外線のエネルギーと紫外線により発生したオゾン(03 First, when ultraviolet rays reach a predetermined portion of the coating layer 27 provided by the degreasing process, the ultraviolet energy and ozone generated by the ultraviolet rays (03
)などとの化学反応によって、被膜層 27が二酸化炭素(C02)や水 (H20)などに分 解されて無くなる。 ) Etc., the coating layer 27 is decomposed into carbon dioxide (C02) and water (H20) and disappears.
そのため、触媒付着工程において、基板部 2など全体を触媒に浸漬させても、階層 部 14の表面に触媒 Sが付着しない。したがって、めっき工程において、無電解銅め つきを施しても、被膜層 27の無い触媒 Sが付着しなかった部分には、めっき層 29が 形成されない。  Therefore, even if the entire substrate portion 2 and the like are immersed in the catalyst in the catalyst attaching step, the catalyst S does not adhere to the surface of the layer portion 14. Therefore, even if electroless copper plating is applied in the plating step, the plating layer 29 is not formed in the portion where the catalyst S without the coating layer 27 does not adhere.
[0026] 図 5は、めっき層 29が形成される様子を示す説明図である。  FIG. 5 is an explanatory view showing a state in which the plating layer 29 is formed.
脱脂工程によって設けられた被膜層 27の他の所定の部分には、パターンフィルム 26のマスクにより、紫外線が到達しない。そのため、被膜層 27が階層部 14上に残さ れた状態になる。  The ultraviolet rays do not reach the other predetermined portion of the coating layer 27 provided by the degreasing process due to the mask of the pattern film 26. Therefore, the coating layer 27 is left on the layer portion 14.
そのため、触媒付着工程において、基板部 2など全体を触媒に浸漬させると、残さ れた被膜層 27の表面に触媒 Sが付着する。したがって、めっき工程において、無電 解銅めつきを施すことにより、触媒 Sを介して被膜層 27にめつき層 29が形成される。  Therefore, when the entire substrate portion 2 and the like are immersed in the catalyst in the catalyst attaching step, the catalyst S adheres to the surface of the remaining coating layer 27. Accordingly, the electroless copper plating is applied in the plating process, whereby the plating layer 29 is formed on the coating layer 27 via the catalyst S.
[0027] 本実施形態においては、パターンフィルム 26によるマスクによって、スルーホール 1 7とその周辺には、紫外線を到達させないようにしていることから、スルーホール 17と その周辺の被膜層 27は残されて、それ以外の被膜層 27は無くなった状態になる。そ のため、触媒付着工程において、スルーホール 17とその周辺の被膜層 27に触媒が 付着し、それ以外の部分には触媒が付着しない。したがって、図 3に示すように、めつ き工程において、スルーホール 17とその周辺に、触媒を介してめつき層 29が形成さ れ、それ以外の部分には形成されない。  In the present embodiment, the mask with the pattern film 26 prevents the ultraviolet rays from reaching the through hole 17 and its periphery, so that the through hole 17 and the surrounding coating layer 27 remain. Thus, the other coating layer 27 is lost. Therefore, in the catalyst adhesion process, the catalyst adheres to the through hole 17 and the surrounding coating layer 27, and the catalyst does not adhere to the other portions. Therefore, as shown in FIG. 3, in the plating process, the adhesion layer 29 is formed in the through hole 17 and its periphery via the catalyst, and is not formed in the other portions.
[0028] 以上より、本実施形態におけるプリント配線板の製造方法によれば、脱脂工程及び フィルム設置工程の後、紫外線を照射して、それから触媒付着工程及びめつき工程 へと移行することから、従来よりも工程数を激減させることができる。すなわち、従来で あれば、スルーホール形成工程の後、 1)脱脂、 2)触媒付着、 3)めっき、 4)パターン 層形成、 5)パターンフィルム設置、 6)露光、 7)現像、 8)エッチング、 9)パターンフィ ルム剥離などの工程が必要であった。しかし、本実施形態におけるプリント配線板の 製造方法によれば、スルーホール形成工程の後、 1)エッチング工程、 2)脱脂工程、 3)パターンフィルム設置工程、 4)紫外線照射工程、 5)触媒付着工程、 6)めっきェ 程だけで済むことになる。そのため、迅速かつ容易にプリント配線板 30を得ることが できる。 [0028] As described above, according to the method for manufacturing a printed wiring board in the present embodiment, after the degreasing step and the film installation step, irradiation with ultraviolet rays is performed, and then the process proceeds to the catalyst attaching step and the mating step. The number of processes can be drastically reduced as compared with the prior art. That is, in the past If there is, after the through-hole formation process, 1) degreasing, 2) catalyst adhesion, 3) plating, 4) pattern layer formation, 5) pattern film installation, 6) exposure, 7) development, 8) etching, 9) pattern Processes such as film peeling were necessary. However, according to the method for manufacturing a printed wiring board in the present embodiment, after the through-hole forming step, 1) etching step, 2) degreasing step, 3) pattern film setting step, 4) ultraviolet irradiation step, 5) catalyst adhesion Process, 6) Only plating process is required. Therefore, the printed wiring board 30 can be obtained quickly and easily.
[0029] また、触媒が Sn— Pdコロイドであることから、被膜層 27に触媒を確実に付着させる ことができ、めっき層 29を容易に設けることができる。  In addition, since the catalyst is a Sn—Pd colloid, the catalyst can be reliably attached to the coating layer 27, and the plating layer 29 can be easily provided.
また、めっきが無電解銅めつきであることから、確実にめっき層 29を設けることがで きる。  In addition, since the plating is electroless copper plating, the plating layer 29 can be reliably provided.
また、本実施形態における基板部 2は、エポキシ基板、ポリブチレンテレフタレート、 ポリフエ二レンサルファイド、ポリスルホンサルファイド、ポリエチレンテレフタレート、ポ リアリレート、ポリイミド、ポリアミド、液晶ポリマー、ガラス又はセラミックスの少なくとも 一つからなるものである。これにより、確実にプリント配線板 1を得ることができる。  The substrate portion 2 in the present embodiment is made of at least one of an epoxy substrate, polybutylene terephthalate, polyphenylene sulfide, polysulfone sulfide, polyethylene terephthalate, polyarylate, polyimide, polyamide, liquid crystal polymer, glass, or ceramics. is there. Thereby, the printed wiring board 1 can be obtained reliably.
[0030] なお、上記はプリント配線板の製造方法についての説明であった力 上記の各ェ 程にて行われる処理を自動的に実行するプリント配線板製造装置を提供してもよ!/、。 なお、本発明の技術範囲は上記の実施形態に限定されるものではなぐ本発明の 趣旨を逸脱しない範囲において、種々の変更を加えることが可能である。  [0030] It should be noted that the above-described force was a description of the method of manufacturing a printed wiring board. A printed wiring board manufacturing apparatus that automatically executes the processes performed in the above steps may be provided! /, . The technical scope of the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention.
産業上の利用可能性  Industrial applicability
[0031] 本発明によれば、迅速かつ容易にプリント配線板を得ることができる。  [0031] According to the present invention, a printed wiring board can be obtained quickly and easily.

Claims

請求の範囲 The scope of the claims
[1] 基板本体を脱脂する脱脂工程と、 [1] a degreasing process for degreasing the substrate body;
前記脱脂工程によって脱脂された基板本体に、導体パターンを形成するため、導 体パターンを形成しない位置に相当する箇所に紫外線を照射する工程と、  Irradiating a portion corresponding to a position where the conductor pattern is not formed with ultraviolet rays to form a conductor pattern on the substrate body degreased by the degreasing step;
紫外線照射後の基板本体に触媒を付着させる触媒付着工程と、  A catalyst attachment step for attaching the catalyst to the substrate body after ultraviolet irradiation;
前記触媒付着工程によって触媒が付着した基板本体にめっきを施すめっき工程と 、を具備するプリント配線板の製造方法。  And a plating step of plating the substrate body to which the catalyst is adhered in the catalyst adhesion step.
[2] 前記触媒が、 Sn— Pdコロイドである請求項 1に記載のプリント配線板の製造方法。  [2] The method for producing a printed wiring board according to claim 1, wherein the catalyst is a Sn—Pd colloid.
[3] 前記めつきが、無電解銅めつき、または無電解ニッケルめっきである請求項 1に記 載のプリント配線板の製造方法。 [3] The method for producing a printed wiring board according to claim 1, wherein the plating is electroless copper plating or electroless nickel plating.
[4] 前記基板本体が、 [4] The substrate body is
エポキシ基板、ポリブチレンテレフタレート、ポリフエ二レンサルファイド、ポリスルホ ンサルファイド、ポリエチレンテレフタレート、ポリアリレート、ポリイミド、ポリアミド、液晶 ポリマー、ガラス又はセラミックスの少なくとも一つからなる請求項 1に記載のプリント 配線板の製造方法。  2. The method for producing a printed wiring board according to claim 1, comprising at least one of an epoxy substrate, polybutylene terephthalate, polyphenylene sulfide, polysulfonate sulfide, polyethylene terephthalate, polyarylate, polyimide, polyamide, liquid crystal polymer, glass, or ceramics. .
[5] 請求項 1に記載のプリント配線板の製造方法によって製造されたプリント配線板。  [5] A printed wiring board produced by the method for producing a printed wiring board according to claim 1.
[6] スルーホールが設けられた基板本体を脱脂する脱脂部と、 [6] a degreasing portion for degreasing the substrate body provided with the through hole;
前記脱脂部によって脱脂された基板本体の、導体パターンを形成しない位置に相 当する箇所に紫外線を照射する紫外線照射部と、  An ultraviolet irradiation unit that irradiates ultraviolet rays to a portion corresponding to a position where a conductor pattern is not formed on the substrate body degreased by the degreasing unit;
紫外線照射後の前記基板本体に触媒を付着させる触媒付着部と、  A catalyst adhering portion for adhering the catalyst to the substrate body after ultraviolet irradiation;
前記触媒付着部によって触媒が付着した前記基板本体にめっきを施すめっき部と 、を具備するプリント配線板の製造装置。  A printed wiring board manufacturing apparatus comprising: a plating unit that performs plating on the substrate body to which the catalyst is adhered by the catalyst adhesion unit.
PCT/JP2007/068676 2006-09-26 2007-09-26 Method for manufacturing printed wiring board WO2008038663A1 (en)

Priority Applications (3)

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JP2008536392A JP4751933B2 (en) 2006-09-26 2007-09-26 Printed wiring board manufacturing method, printed wiring board, and printed wiring board manufacturing apparatus
KR1020097008478A KR101127547B1 (en) 2006-09-26 2007-09-26 Method for manufacturing printed wiring board
CN2007800353355A CN101606445B (en) 2006-09-26 2007-09-26 Method for manufacturing printed wiring board

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JPH04326719A (en) * 1991-04-18 1992-11-16 Geo Centers Inc Method of forming high-resolution pattern to solid substrate
JPH07183659A (en) * 1993-12-22 1995-07-21 Toppan Printing Co Ltd Printed circuit board and manufacture thereof
JPH08253869A (en) * 1995-03-14 1996-10-01 Sharp Corp Method for electroless-plating resin

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JPH1088361A (en) * 1996-09-18 1998-04-07 Furukawa Electric Co Ltd:The Method for electroless-plating polymer molding
JP4064801B2 (en) * 2002-12-12 2008-03-19 新光電気工業株式会社 Metal film formation processing method, semiconductor device, and wiring board
JP3894327B2 (en) * 2004-02-04 2007-03-22 セイコーエプソン株式会社 Wiring board manufacturing method and electronic device manufacturing method
KR101117023B1 (en) * 2004-10-07 2012-03-15 신에쓰 가가꾸 고교 가부시끼가이샤 Polyimide-based photocurable resin composition and patterning process and substrate-protecting film
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JPH04326719A (en) * 1991-04-18 1992-11-16 Geo Centers Inc Method of forming high-resolution pattern to solid substrate
JPH07183659A (en) * 1993-12-22 1995-07-21 Toppan Printing Co Ltd Printed circuit board and manufacture thereof
JPH08253869A (en) * 1995-03-14 1996-10-01 Sharp Corp Method for electroless-plating resin

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KR20090099049A (en) 2009-09-21
JPWO2008038663A1 (en) 2010-01-28

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