WO2008007596A1 - Lead-free low-melting glass - Google Patents

Lead-free low-melting glass Download PDF

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Publication number
WO2008007596A1
WO2008007596A1 PCT/JP2007/063418 JP2007063418W WO2008007596A1 WO 2008007596 A1 WO2008007596 A1 WO 2008007596A1 JP 2007063418 W JP2007063418 W JP 2007063418W WO 2008007596 A1 WO2008007596 A1 WO 2008007596A1
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WIPO (PCT)
Prior art keywords
glass
lead
free low
melting point
range
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PCT/JP2007/063418
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French (fr)
Japanese (ja)
Inventor
Nobuyuki Nakai
Taishin Shimooka
Original Assignee
Central Glass Company, Limited
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Publication of WO2008007596A1 publication Critical patent/WO2008007596A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/34Vessels, containers or parts thereof, e.g. substrates
    • H01J11/38Dielectric or insulating layers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/16Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/10AC-PDPs with at least one main electrode being out of contact with the plasma

Definitions

  • the present invention is for an electronic material substrate typified by a plasma display panel, a liquid crystal display panel, an electo-luminescence panel, a fluorescent display panel, an electo-chromic display panel, a light-emitting diode display panel, a gas discharge display panel, etc.
  • the present invention relates to a low melting glass used as an insulating coating material and a sealing material.
  • PDPs plasma display panels
  • An electrode for discharging plasma is formed on the front glass plate of the plasma display panel, and thin linear silver is often used as the electrode.
  • a highly transparent insulating material is arranged around the electrode. This insulating material is preferably excellent in plasma durability and transparent. For this reason, dielectric glass is often used as an insulating material.
  • dielectric glass is often used as an insulating material.
  • this dielectric glass is naturally required to have a lower melting point than that of the glass plate serving as the substrate in the process, a low-melting glass is used.
  • the dielectric glass and the silver of the bus electrode react with each other at a low temperature firing of 450 to 600 ° C, and the dielectric glass is colored yellow ( (Yellowing) occurred, and there was a big problem that high transmittance could not be obtained.
  • Patent Document 3 limited content of SiO, B 2 O, ZnO, Bi 2 O, BaO, Al 2 O
  • a material for plasma display (for example, see Patent Document 4) is disclosed.
  • Patent Document 1 Japanese Patent Laid-Open No. 2001-52621
  • Patent Document 2 Japanese Patent Laid-Open No. 2001-80934
  • Patent Document 3 Japanese Patent Laid-Open No. 2001-48577
  • Patent Document 4 Japanese Patent Laid-Open No. 2003-226549
  • a conventional dielectric material (insulating material) has a problem in that the glass layer and the silver electrode react with each other to cause the dielectric layer to be colored yellow (yellowing), resulting in a decrease in visible light transmittance. It is difficult to respond to this yellowing phenomenon, but it has not yet been achieved to the level desired by the market.
  • lead-based glass has been employed for low-melting glass, for example, low-melting glass for substrate coating.
  • the lead component is an important component for lowering the melting point of glass, it has a tendency to avoid its adoption in recent years because it has a great negative impact on the human body and the environment.
  • Lead-free electronic materials such as PDP are being studied. Being sung.
  • the 01-48577 gazette has the basic problem of containing lead, which is a significant improvement against yellowing. Furthermore, Japanese Patent Application Laid-Open No. 2003-226549 does not contain lead, and a considerable improvement against yellowing is recognized. However, as with lead, it contains bismuth that tends to be avoided from an environmental point of view. RU
  • the lead-free low-melting glass can be used as an insulating coating material and a sealing material for an electronic material substrate or a PDP panel.
  • Insulation for electronic material substrates typified by plasma display panels, liquid crystal display panels, electoric luminescence panels, fluorescent display panels, electoric chromic display panels, light emitting diode display panels, gas discharge display panels, etc.
  • a low melting point glass used as a coating material and a sealing material can reduce the phenomenon that the dielectric layer is colored yellow (yellowing) by the reaction between the glass and the silver electrode. .
  • SiO is a glass-forming component and coexists with another glass-forming component, B 2 O.
  • B 2 O is a glass forming component similar to SiO, facilitating glass melting, and thermal expansion of glass
  • the flowability of the glass becomes insufficient and the sinterability is impaired.
  • it exceeds 55% the stability of the glass is lowered. More preferably, it is 38 to 52% of range.
  • ZnO lowers the soft spot of the glass and adjusts the thermal expansion coefficient to an appropriate range, and is preferably contained in the glass in a range of 5 to 12%. If it is less than 5%, the above-mentioned action cannot be exhibited. On the other hand, if it exceeds 12%, the glass becomes unstable and devitrification tends to occur. More preferably, it is in the range of 6 to 11%.
  • R 2 O Li 0, Na 0, K 2 O
  • the coefficient is adjusted to an appropriate range, and it is preferably contained in the range of 10 to 18%. If it is less than 10%, the above-mentioned action cannot be exerted. On the other hand, if it exceeds 18%, the thermal expansion coefficient is excessively increased. More preferably, it is 11 to 17% of range.
  • BaO has an effect of imparting moderate fluidity to glass and increasing transparency, and has a content of 0.1 to 3%. It is contained in a box. If it exceeds 3%, the above effect cannot be exhibited. More preferably, it is in the range of 1 to 2%.
  • ZrO has the effect of increasing the water resistance of the glass, and is contained in the range of 0.1 to 7%.
  • it is in the range of 1% to 6%.
  • CuO has the effect of mitigating the coloration of silver colloid (yellowing) due to the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer. It is preferably contained in the range of ⁇ 2%. If the content is less than 1%, the above-mentioned effect cannot be exhibited. If the content exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is in the range of 0.1 to 1%.
  • MnO reacts with a silver electrode used as a bus electrode wire and a dielectric layer, and in the dielectric layer
  • It has the effect of mitigating silver diffusion and color development (yellowing) of silver colloid, and it is preferably contained in the range of 0 to 2%. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is in the range of 0 to 1%.
  • RO MgO + CaO + SrO
  • substantially not containing PbO By substantially not containing PbO, it is possible to eliminate the influence on the human body and the environment.
  • substantially free of PbO means that PbO may be contained up to an amount enough to be mixed as an impurity in the glass raw material. For example, if it is in the range of 0.3 wt% or less in the low-melting glass, the above-mentioned adverse effects, that is, the influence on the human body and the environment, the influence on the insulation characteristics, etc., are hardly affected by PbO. It becomes.
  • the thermal expansion coefficient of 65 at 30 ° C ⁇ 300 ° C X 10 " V ° C ⁇ 95 X 10- 7 Z ° C, further ⁇ I ⁇ is 500 ° It may be C or more and 630 ° C or less. If the tension coefficient is out of this range, problems such as film peeling and substrate warping may occur during thick film formation. Preferably, in the range of 75 X 10- 7 Z ° C ⁇ 85 X 10- 7 Z ° C. In addition, if the soft spot exceeds 630 ° C, problems such as soft deformation of the substrate may occur.
  • the temperature is preferably 500 ° C or higher and 590 ° C or lower.
  • the lead-free low melting point glass of the present invention can be used as an insulating coating material and a sealing material for a substrate for electronic materials. Thereby, it can be set as the board
  • the lead-free low-melting glass of the present invention can be used as an insulating coating material and a sealing material for PDP panels. As a result, a PDP panel in which yellowing is suppressed can be obtained.
  • the present invention is a disclosure of a low-melting-point glass corresponding to a yellowing phenomenon caused by a reaction with silver, and the object is not limited to a silver electrode.
  • the lead-free low melting point glass of the present invention can be used for, for example, both the front plate and the back plate of PDP glass.
  • a back plate When used as a back plate, it is often used as a sealing material or covering material, and is used in powder form.
  • This powdered glass is mixed with a low-expansion ceramics filler such as muraite or alumina, heat-resistant pigments, etc., if necessary, at a ratio of 0.6 ⁇ glass Z (glass + filler) weight ratio ⁇ or more. Then, it is generally kneaded with organic oil to form a paste.
  • the glass substrate is a transparent glass substrate, particularly soda-lime-silica glass, or similar glass (high strain point glass), or an alumino-lime borosilicate-based glass with little (or little) alkalinity. Glass is frequently used.
  • Acid zinc white as ZnO source
  • lithium carbonate as Li O source
  • sodium carbonate as Na O source
  • a part of the glass was poured into a mold and made into a block shape for use in measuring thermal properties (thermal expansion coefficient, softening point).
  • the remaining glass was flaked with a rapid cooling twin roll molding machine and sized with a pulverizer into a powder with an average particle size of 1 to 3 ⁇ m and a maximum particle size of less than 10 ⁇ m.
  • a paste oil composed of ⁇ -terpineol and butyl carbitol acetate is mixed with ethylcellulose as a binder and the above glass powder, and the viscosity is 300 ⁇ 50 parts.
  • a paste of the same size was prepared.
  • the thermal expansion coefficient was determined from the amount of elongation at 30 to 300 ° C when the temperature was raised at 5 ° C / min using a thermal dilatometer.
  • Tables 1 and 2 show the low melting point glass composition and various test results.
  • Comparative Examples 1 to 4 in Table 2 outside the composition range of the present invention show significant yellowing, or do not show favorable physical properties, and are suitable for coating substrates such as PDP Cannot be applied as low melting point glass.

Abstract

Provided is a transparent and insulating SiO2-B2O3-ZnO-R2O-BaO-ZrO2-CuO lead-free low-melting glass. The lead-free low-melting glass includes a SiO2 of 25-40wt%, a B2O3 of 35-55wt%, a ZnO of 5-12wt%, a R2O(Li2O+Na2O+K2O) of 10-18wt%, a BaO of 0.1-3wt%, a ZrO2 of 0.1-7wt%, and a CuO of 0.1-2wt%. Yellowing due to silver reaction can be suppressed and a high visible light transmissivity can be obtained by using the lead-free low-melting glass.

Description

明 細 書  Specification
無鉛低融点ガラス  Lead-free low melting point glass
技術分野  Technical field
[0001] 本発明は、プラズマディスプレイパネル、液晶表示パネル、エレクト口ルミネッセンス パネル、蛍光表示パネル、エレクト口クロミック表示パネル、発光ダイオード表示パネ ル、ガス放電式表示パネル等に代表される電子材料基板用の絶縁性被膜材料及び 封着材料として用いられる低融点ガラスに関する。  The present invention is for an electronic material substrate typified by a plasma display panel, a liquid crystal display panel, an electo-luminescence panel, a fluorescent display panel, an electo-chromic display panel, a light-emitting diode display panel, a gas discharge display panel, etc. The present invention relates to a low melting glass used as an insulating coating material and a sealing material.
発明の背景  Background of the Invention
[0002] 近年の電子部品の発達に伴!、、プラズマディスプレイパネル、液晶表示パネル、ェ レクト口ルミネッセンスパネル、蛍光表示パネル、エレクト口クロミック表示パネル、発光 ダイオード表示パネル、ガス放電式表示パネル等、多くの種類の表示パネルが開発 されている。その中でも、プラズマディスプレイパネル(以下、 PDPと略す)が薄型か つ大型の平板型カラー表示装置として注目を集めている。 PDPにおいては、表示面 として使用される前面基板と背面基板の間に多くのセルを有し、そのセル中でプラズ マ放電させることにより画像が形成される。このセルは、隔壁で区画形成されており、 画像を形成する各画素での表示状態を制御するため、各画素単位に電極が形成さ れている。  [0002] With the recent development of electronic components !, plasma display panels, liquid crystal display panels, electoric luminescence panels, fluorescent display panels, electoric chromic display panels, light emitting diode display panels, gas discharge display panels, etc. Many types of display panels have been developed. Among them, plasma display panels (hereinafter abbreviated as PDPs) are attracting attention as thin and large flat color display devices. In a PDP, there are many cells between a front substrate and a rear substrate used as a display surface, and an image is formed by performing plasma discharge in the cells. This cell is partitioned by partition walls, and an electrode is formed for each pixel unit in order to control the display state of each pixel forming an image.
[0003] このプラズマディスプレイパネルの前面ガラス板には、プラズマを放電させるための 電極が形成され、電極として細い線状の銀が多く使われている。その電極の周りには 、透明度の高い絶縁材料が配されている。この絶縁材料は、プラズマ耐久性に優れ ており、かつ透明であることが好ましい。このため、絶縁材料としては誘電体ガラスが 使われていることが多い。またこの誘電体ガラスには、工程上、当然基体となるガラス 板より低い融点が求められるため、低融点ガラスが使用される。  [0003] An electrode for discharging plasma is formed on the front glass plate of the plasma display panel, and thin linear silver is often used as the electrode. Around the electrode, a highly transparent insulating material is arranged. This insulating material is preferably excellent in plasma durability and transparent. For this reason, dielectric glass is often used as an insulating material. In addition, since this dielectric glass is naturally required to have a lower melting point than that of the glass plate serving as the substrate in the process, a low-melting glass is used.
[0004] し力しながら、従来の低融点誘電体ガラスでは、 450〜600°Cと 、つた低温焼成で は、誘電体ガラスとバス電極の銀が反応して誘電体ガラスが黄色に着色 (黄変)する 現象が生じ、高透過率が得られな ヽと ヽぅ大きな問題があった。  [0004] However, in the conventional low melting point dielectric glass, the dielectric glass and the silver of the bus electrode react with each other at a low temperature firing of 450 to 600 ° C, and the dielectric glass is colored yellow ( (Yellowing) occurred, and there was a big problem that high transmittance could not be obtained.
[0005] この黄変に関しては、ガラス成分を調整することにより解決しょうとする種々の公知 技術が存在する。 SiO、 Al O等を必須成分とし、例えば、 PbOと CuOの含有量を [0005] Regarding this yellowing, there are various known methods to be solved by adjusting the glass component. Technology exists. SiO, AlO, etc. are essential components. For example, the content of PbO and CuO
2 2 3  2 2 3
限定し、 Cuによって銀の拡散を防ごうとしたプラズマディスプレイ用材料 (例えば、特 許文献 1参照)、また CuOの他にさらに SrOを加えることで同様の効果を得、 BaO + SrO + MgOの含有量を限定したプラズマディスプレイ用材料 (例えば、特許文献 2 参照)、 BaO + CaO + Bi Oの含有量を限定したプラズマディスプレイ用材料 (例え  The material for plasma display which tried to prevent diffusion of silver by Cu (for example, see Patent Document 1), and by adding SrO in addition to CuO, the same effect was obtained, and BaO + SrO + MgO Material for plasma display with limited content (for example, see Patent Document 2), Material for plasma display with limited content of BaO + CaO + Bi O (for example,
2 3  twenty three
ば、特許文献 3参照)、 SiO、 B O、 ZnO、 Bi O、 BaO、 Al Oの含有量を限定した  For example, see Patent Document 3), limited content of SiO, B 2 O, ZnO, Bi 2 O, BaO, Al 2 O
2 2 3 2 3 2 3  2 2 3 2 3 2 3
プラズマディスプレイ用材料 (例えば、特許文献 4参照)、が開示されている。  A material for plasma display (for example, see Patent Document 4) is disclosed.
特許文献 1 :特開 2001— 52621号公報  Patent Document 1: Japanese Patent Laid-Open No. 2001-52621
特許文献 2:特開 2001— 80934号公報  Patent Document 2: Japanese Patent Laid-Open No. 2001-80934
特許文献 3:特開 2001—48577号公報  Patent Document 3: Japanese Patent Laid-Open No. 2001-48577
特許文献 4:特開 2003 - 226549号公報  Patent Document 4: Japanese Patent Laid-Open No. 2003-226549
発明の概要  Summary of the Invention
[0006] 従来の誘電体材料 (絶縁材料)では、ガラスと銀電極が反応して誘電体層が黄色に 着色 (黄変)する現象が生じ、可視光透過率が低下するという問題がある。この黄変 現象に対する対応は難しぐまだ市場が望むレベルまでは対応できていない。  [0006] A conventional dielectric material (insulating material) has a problem in that the glass layer and the silver electrode react with each other to cause the dielectric layer to be colored yellow (yellowing), resulting in a decrease in visible light transmittance. It is difficult to respond to this yellowing phenomenon, but it has not yet been achieved to the level desired by the market.
[0007] また従来、低融点ガラス、例えば基板被覆用低融点ガラスには鉛系のガラスが採 用されてきた。鉛成分はガラスを低融点とするうえで重要な成分ではあるものの、人 体や環境に与える弊害が大きぐ近年その採用を避ける趨勢にあり、 PDPを始めとす る電子材料では無鉛化が検討されて ヽる。  [0007] Conventionally, lead-based glass has been employed for low-melting glass, for example, low-melting glass for substrate coating. Although the lead component is an important component for lowering the melting point of glass, it has a tendency to avoid its adoption in recent years because it has a great negative impact on the human body and the environment. Lead-free electronic materials such as PDP are being studied. Being sung.
[0008] すなわち、特開 2001— 52621号公報、特開 2001— 80934号公報、及び特開 20 [0008] That is, JP 2001-52121 A, JP 2001-80934 A, and JP 20
01— 48577号公報は、黄変に対してはかなりの改良が認められる力 鉛を含んでい るという基本的な問題がある。さらに、特開 2003— 226549号公報は、鉛を含んで おらず、黄変に対してかなりの改良が認められるが、鉛と同様に環境の見地から採用 を避けられる趨勢のあるビスマスを含んで 、る。 The 01-48577 gazette has the basic problem of containing lead, which is a significant improvement against yellowing. Furthermore, Japanese Patent Application Laid-Open No. 2003-226549 does not contain lead, and a considerable improvement against yellowing is recognized. However, as with lead, it contains bismuth that tends to be avoided from an environmental point of view. RU
[0009] 本発明に依れば、 SiOを 25〜40重量0 /0、 B Oを 35〜55重量0 /0、 ZnOを 5〜12 [0009] According to the present invention, 25 to 40 weight SiO 0/0, BO 35 to 55 weight 0/0, ZnO 5-12
2 2 3  2 2 3
重量%、 R O (Li O+Na O+K O)を 10〜18重量%、 BaOを 0. 1〜3重量%、 ZrO  Wt%, R 2 O (Li 2 O + Na 2 O + K 2 O) 10-18 wt%, BaO 0.1-3 wt%, ZrO
2 2 2 2  2 2 2 2
を 0. 1〜7重量%、 CuOを 0. 1〜2重量%含む、透明絶縁性の SiO—B O—ZnO Transparent insulating SiO—B 2 O—ZnO containing 0.1 to 7% by weight and 0.1 to 2% by weight of CuO
2 2 2 32 2 2 3
— R O- BaO -ZrO—CuO系無鉛低融点ガラスが提供される。 [0010] 上記の無鉛低融点ガラスを電子材料用基板又は PDP用パネルの絶縁性被膜材料 及び封着材料として使用できる。 — R 2 O—BaO 2 —ZrO—CuO-based lead-free low melting glass is provided. [0010] The lead-free low-melting glass can be used as an insulating coating material and a sealing material for an electronic material substrate or a PDP panel.
詳細な説明  Detailed description
[0011] プラズマディスプレイパネル、液晶表示パネル、エレクト口ルミネッセンスパネル、蛍 光表示パネル、エレクト口クロミック表示パネル、発光ダイオード表示パネル、ガス放 電式表示パネル等に代表される電子材料基板用の絶縁性被膜材料及び封着材料 として用いられる低融点ガラスにぉ ヽて、ガラスと銀電極が反応して誘電体層が黄色 に着色 (黄変)する現象を軽減するものを本発明によって得ることができる。  [0011] Insulation for electronic material substrates typified by plasma display panels, liquid crystal display panels, electoric luminescence panels, fluorescent display panels, electoric chromic display panels, light emitting diode display panels, gas discharge display panels, etc. A low melting point glass used as a coating material and a sealing material can reduce the phenomenon that the dielectric layer is colored yellow (yellowing) by the reaction between the glass and the silver electrode. .
[0012] 以下に、本発明の無鉛低融点ガラスを例示的に詳述する。  [0012] The lead-free low-melting glass of the present invention is illustratively described in detail below.
[0013] SiOはガラス形成成分であり、別のガラス形成成分である B Oと共存させることに  [0013] SiO is a glass-forming component and coexists with another glass-forming component, B 2 O.
2 2 3  2 2 3
より、安定したガラスを形成することができるもので、 25% (重量%、以下においても 同様である)以上で含有させる。 40%を越えると、ガラスの軟ィ匕点が上昇し、成形性、 作業性が困難となる。より好ましくは、 26〜38%の範囲である。  It can form a more stable glass, and is contained in an amount of 25% (wt% or less). If it exceeds 40%, the soft softness point of the glass will rise, making formability and workability difficult. More preferably, it is 26 to 38% of range.
[0014] B Oは SiO同様のガラス形成成分であり、ガラス溶融を容易とし、ガラスの熱膨張 [0014] B 2 O is a glass forming component similar to SiO, facilitating glass melting, and thermal expansion of glass
2 3 2  2 3 2
係数において過度の上昇を抑え、かつ、焼付け時にガラスに適度の流動性を与え、 SiOとともにガラスの誘電率を低下させるものである。ガラス中に 35〜55%で含有さ An excessive increase in the coefficient is suppressed, and an appropriate fluidity is imparted to the glass during baking, and the dielectric constant of the glass is lowered together with SiO. Contained in glass at 35-55%
2 2
せるのが好ましい。 35%未満ではガラスの流動性が不充分となり、焼結性が損なわ れる。他方 55%を越えるとガラスの安定性を低下させる。より好ましくは 38〜52%の 範囲である。  Is preferred. If it is less than 35%, the flowability of the glass becomes insufficient and the sinterability is impaired. On the other hand, if it exceeds 55%, the stability of the glass is lowered. More preferably, it is 38 to 52% of range.
[0015] ZnOはガラスの軟ィ匕点を下げ、熱膨張係数を適宜範囲に調整するもので、ガラス 中に 5〜 12%の範囲で含有させるのが好ま 、。 5%未満では上記作用を発揮し得 ず、他方 12%を越えるとガラスが不安定となり失透を生じ易い。より好ましくは 6〜11 %の範囲である。  [0015] ZnO lowers the soft spot of the glass and adjusts the thermal expansion coefficient to an appropriate range, and is preferably contained in the glass in a range of 5 to 12%. If it is less than 5%, the above-mentioned action cannot be exhibited. On the other hand, if it exceeds 12%, the glass becomes unstable and devitrification tends to occur. More preferably, it is in the range of 6 to 11%.
[0016] R O (Li 0、 Na 0、 K O)はガラスの軟ィ匕点を下げ、適度に流動性を与え、熱膨張  [0016] R 2 O (Li 0, Na 0, K 2 O) lowers the soft softness point of glass, gives moderate fluidity, and thermal expansion
2 2 2 2  2 2 2 2
係数を適宜範囲に調整するものであり、 10〜18%の範囲で含有させることが好まし い。 10%未満では上記作用を発揮し得ず、他方 18%を越えると熱膨張係数を過度 に上昇させる。より好ましくは 11〜17%の範囲である。  The coefficient is adjusted to an appropriate range, and it is preferably contained in the range of 10 to 18%. If it is less than 10%, the above-mentioned action cannot be exerted. On the other hand, if it exceeds 18%, the thermal expansion coefficient is excessively increased. More preferably, it is 11 to 17% of range.
[0017] BaOはガラスに適度に流動性を与え、透明性を上げる効果があり、 0. 1〜3%の範 囲で含有させる。 3%を越えると上記作用を発揮し得ない。より好ましくは、 1〜2%の 範囲である。 [0017] BaO has an effect of imparting moderate fluidity to glass and increasing transparency, and has a content of 0.1 to 3%. It is contained in a box. If it exceeds 3%, the above effect cannot be exhibited. More preferably, it is in the range of 1 to 2%.
[0018] ZrOは、ガラスの耐水性を上げる効果があり、 0. 1〜7%の範囲で含有させる。より  [0018] ZrO has the effect of increasing the water resistance of the glass, and is contained in the range of 0.1 to 7%. Than
2  2
好ましくは、 1%〜6%の範囲である。  Preferably, it is in the range of 1% to 6%.
[0019] CuOはバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀 が拡散して、銀コロイド発色 (黄変)するのを緩和させる効果があり、 0.1〜2%の範囲 で含有させることが好ましい。 0. 1%未満では上記作用を発揮し得ず、他方 2%を越 えるとガラスが着色し、透明性が低下する。より好ましくは 0. 1〜1%の範囲である。  [0019] CuO has the effect of mitigating the coloration of silver colloid (yellowing) due to the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer. It is preferably contained in the range of ˜2%. If the content is less than 1%, the above-mentioned effect cannot be exhibited. If the content exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is in the range of 0.1 to 1%.
[0020] MnOはバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に  [0020] MnO reacts with a silver electrode used as a bus electrode wire and a dielectric layer, and in the dielectric layer
2  2
銀が拡散して、銀コロイド発色 (黄変)するのを緩和させる効果があり、 0〜2%の範囲 で含有させることが好ましい。 2%を越えるとガラスが着色し、透明性が低下する。より 好ましくは 0〜 1 %の範囲である。  It has the effect of mitigating silver diffusion and color development (yellowing) of silver colloid, and it is preferably contained in the range of 0 to 2%. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is in the range of 0 to 1%.
[0021] RO (MgO + CaO + SrO)はガラスに適度に流動性を与え、熱膨張係数を適宜範 囲に調整するもので、 0〜10%の範囲で含有させる。 10%を越えると熱膨張係数が 過度に上昇する。より好ましくは、 0〜6%の範囲である。 [0021] RO (MgO + CaO + SrO) imparts moderate fluidity to glass and adjusts the thermal expansion coefficient to an appropriate range, and is contained in the range of 0 to 10%. If it exceeds 10%, the thermal expansion coefficient will rise excessively. More preferably, it is in the range of 0 to 6%.
[0022] B O ZZnOの重量比が 3以上 7以下である上記の無鉛低融点ガラスである。 3未 [0022] The lead-free low-melting glass described above, wherein the weight ratio of B 2 O 3 ZZnO is 3 or more and 7 or less. 3 not yet
2 3  twenty three
満であると黄変の発現が顕著になり、 7を越えると安定性が劣化する。より好ましくは、 4〜6の範囲である。  If it is full, yellowing will be prominent, and if it exceeds 7, the stability will deteriorate. More preferably, it is the range of 4-6.
[0023] この他にも、一般的な酸化物で表す In O、 TiO、 SnO、 TeOなどを加えてもよ!ヽ  [0023] In addition, In O, TiO, SnO, TeO and the like represented by general oxides may be added!
2 3 2 2 2  2 3 2 2 2
[0024] 実質的に PbOを含まないことにより、人体や環境に与える影響を皆無とすることが できる。ここで、実質的に PbOを含まないとは、 PbOがガラス原料中に不純物として 混入する程度の量までなら含んでいてもよいことを意味する。例えば、低融点ガラス 中における 0. 3wt%以下の範囲であれば、先述した弊害、すなわち人体、環境に対 する影響、絶縁特性等に与える影響は殆どなぐ実質的に PbOの影響を受けないこ とになる。 [0024] By substantially not containing PbO, it is possible to eliminate the influence on the human body and the environment. Here, “substantially free of PbO” means that PbO may be contained up to an amount enough to be mixed as an impurity in the glass raw material. For example, if it is in the range of 0.3 wt% or less in the low-melting glass, the above-mentioned adverse effects, that is, the influence on the human body and the environment, the influence on the insulation characteristics, etc., are hardly affected by PbO. It becomes.
[0025] 本発明の無鉛低融点ガラスは、 30°C〜300°Cにおける熱膨張係数が 65 X 10"V °C〜95 X 10— 7Z°C、さらに、軟ィ匕点が 500°C以上 630°C以下であってもよい。熱膨 張係数がこの範囲を外れると厚膜形成時に被膜の剥離、基板の反り等の問題が発 生する場合がある。好ましくは、 75 X 10— 7Z°C〜85 X 10— 7Z°Cの範囲である。また、 軟ィ匕点が 630°Cを越えると基板の軟ィ匕変形などの問題が発生することもある。好まし くは、 500°C以上 590°C以下である。 [0025] lead-free low-melting-point glass of the present invention, the thermal expansion coefficient of 65 at 30 ° C~300 ° C X 10 " V ° C~95 X 10- 7 Z ° C, further軟I匕点is 500 ° It may be C or more and 630 ° C or less. If the tension coefficient is out of this range, problems such as film peeling and substrate warping may occur during thick film formation. Preferably, in the range of 75 X 10- 7 Z ° C~85 X 10- 7 Z ° C. In addition, if the soft spot exceeds 630 ° C, problems such as soft deformation of the substrate may occur. The temperature is preferably 500 ° C or higher and 590 ° C or lower.
[0026] さらに、本発明の無鉛低融点ガラスを電子材料用基板の絶縁性被膜材料及び封 着材料として使用することができる。これにより、黄変が抑制された電子材料用基板と することができる。 Furthermore, the lead-free low melting point glass of the present invention can be used as an insulating coating material and a sealing material for a substrate for electronic materials. Thereby, it can be set as the board | substrate for electronic materials by which yellowing was suppressed.
[0027] さらに、本発明の無鉛低融点ガラスを PDP用パネルの絶縁性被膜材料及び封着 材料として使用することができる。これにより、黄変が抑制された PDP用パネルとする ことができる。  Furthermore, the lead-free low-melting glass of the present invention can be used as an insulating coating material and a sealing material for PDP panels. As a result, a PDP panel in which yellowing is suppressed can be obtained.
[0028] 本発明は銀との反応による黄変現象に対応する低融点ガラスの開示であり、その 対象を銀電極に限定して 、るわけではな 、。  [0028] The present invention is a disclosure of a low-melting-point glass corresponding to a yellowing phenomenon caused by a reaction with silver, and the object is not limited to a silver electrode.
[0029] なお、本発明の無鉛低融点ガラスは、例えば PDP用ガラスの前面板でも背面板で も使用することができる。背面板として使用するときは、封着材、被覆材として用いら れ、粉末化して使用されることが多い。この粉末ィ匕されたガラスは、必要に応じてムラ イトやアルミナに代表される低膨張セラミックスフイラ一、耐熱顔料等と 0. 6{ガラス Z( ガラス +フィラー)重量比 }以上で混合され、次に有機オイルと混練してペースト化さ れるのが一般的である。  [0029] It should be noted that the lead-free low melting point glass of the present invention can be used for, for example, both the front plate and the back plate of PDP glass. When used as a back plate, it is often used as a sealing material or covering material, and is used in powder form. This powdered glass is mixed with a low-expansion ceramics filler such as muraite or alumina, heat-resistant pigments, etc., if necessary, at a ratio of 0.6 {glass Z (glass + filler) weight ratio} or more. Then, it is generally kneaded with organic oil to form a paste.
[0030] ガラス基板としては透明なガラス基板、特にソーダ石灰シリカ系ガラス、または、そ れに類似するガラス (高歪点ガラス)、あるいは、アルカリ分の少ない(又は殆ど無い) アルミノ石灰ホウ珪酸系ガラスが多用されている。  [0030] The glass substrate is a transparent glass substrate, particularly soda-lime-silica glass, or similar glass (high strain point glass), or an alumino-lime borosilicate-based glass with little (or little) alkalinity. Glass is frequently used.
[0031] 以下、本発明を、実施例に基づき、説明する。ただし、本発明は実施例に限定さ れるものではない。  Hereinafter, the present invention will be described based on examples. However, the present invention is not limited to the examples.
[0032] [実施例 1〜7及び比較例 1〜4]  [Examples 1 to 7 and Comparative Examples 1 to 4]
(低融点ガラス混合ペーストの作製) SiO源として微粉珪砂を、 B O源としてほう  (Preparation of low melting point glass mixed paste) Fine silica sand as SiO source and BO source
2 2 3  2 2 3
酸を、 ZnO源として亜鉛華を、 Li O源として炭酸リチウムを、 Na O源として炭酸ナトリ  Acid, zinc white as ZnO source, lithium carbonate as Li O source, sodium carbonate as Na O source
2 2  twenty two
ゥムを、 K O源として炭酸カリウムを、 CuO源として酸ィ匕第二銅を、 MnO源として二  , Potassium carbonate as the K 2 O source, cupric oxide as the CuO source, and 2 as the MnO source
2 2  twenty two
酸化マンガンを、 MgO源として炭酸マグネシウムを、 CaO源として炭酸カルシウムを 、 SrO源として炭酸ストロンチウムを、 BaO源として炭酸バリウムを要した。これらを所 望の低融点ガラス組成となるべく調合したうえで、白金ルツボに投入し、電気加熱炉 内で 1000〜1300°C、 1〜2時間で加熱溶融して表 1の実施例 1〜7、表 2の比較例 1〜4に示す組成のガラスを得た。 Manganese oxide, magnesium carbonate as MgO source, calcium carbonate as CaO source Strontium carbonate was required as the SrO source, and barium carbonate was required as the BaO source. After mixing these materials to the desired low melting point glass composition, they were put into a platinum crucible and heated and melted in an electric heating furnace at 1000 to 1300 ° C for 1 to 2 hours. Examples 1 to 7 in Table 1 The glasses having the compositions shown in Comparative Examples 1 to 4 in Table 2 were obtained.
[表 1]  [table 1]
ο ο
ο ο
Figure imgf000007_0001
Figure imgf000007_0001
100 100 100 100 100 100 100  100 100 100 100 100 100 100
[表 2][Table 2]
Figure imgf000007_0002
Figure imgf000007_0002
Zr02 Zr0 2
Mn02 Mn0 2
RO(MgO+CaO+SrO) 6.  RO (MgO + CaO + SrO) 6.
wt% B2O3 ZnO 1.0 0.9 1.5 0.7  wt% B2O3 ZnO 1.0 0.9 1.5 0.7
軟化点 (Dc) 570 550 655 483 Softening point ( D c) 570 550 655 483
熱膨張係数 ( X 10-7Z°C) 72 74 63 98  Thermal expansion coefficient (X 10-7Z ° C) 72 74 63 98
黄変抑制 X X 注 1 ) 注 1 )  Suppression of yellowing X X Note 1) Note 1)
注 1 )物性値不合格につき、未実施。  Note 1) Not implemented due to physical property value failure.
100.0 100.0 100.0 100.0  100.0 100.0 100.0 100.0
[0033] ガラスの一部は型に流し込み、ブロック状にして熱物性 (熱膨張係数、軟化点)測定 用に供した。残余のガラスは急冷双ロール成形機にてフレーク状とし、粉砕装置で平 均粒径 1〜3 μ m、最大粒径 10 μ m未満の粉末状に整粒した。 [0033] A part of the glass was poured into a mold and made into a block shape for use in measuring thermal properties (thermal expansion coefficient, softening point). The remaining glass was flaked with a rapid cooling twin roll molding machine and sized with a pulverizer into a powder with an average particle size of 1 to 3 μm and a maximum particle size of less than 10 μm.
[0034] 次!/、で、 αテルビネオールとブチルカルビトールアセテートからなるペーストオイル にバインダーとしてのェチルセルロースと上記ガラス粉を混合し、粘度、 300± 50ポ ィズ程度のペーストを調製した。 [0034] Next! /, A paste oil composed of α-terpineol and butyl carbitol acetate is mixed with ethylcellulose as a binder and the above glass powder, and the viscosity is 300 ± 50 parts. A paste of the same size was prepared.
[0035] (絶縁性被膜の形成) 厚み 2〜3mm、サイズ 100mm角のソーダ石灰系ガラス 基板に、焼付け後の膜厚が約 30 mとなるべく勘案して、アプリケーターを用いて前 記ペーストを塗布し、塗布層を形成した。 次 、で、乾燥後、軟ィ匕点より低 、550°C 以下で 10〜60分間焼成することにより、クリアな誘電体層を形成させた。  [0035] (Formation of insulating coating) Apply the above paste using an applicator to a soda-lime glass substrate with a thickness of 2 to 3 mm and a size of 100 mm square, taking into consideration that the film thickness after baking should be about 30 m. Then, a coating layer was formed. Next, after drying, a clear dielectric layer was formed by firing at 550 ° C. or lower for 10 to 60 minutes below the soft spot.
[0036] 得られた試料について、肉眼および顕微鏡により観察し、従来よりも黄変現象が格 段に抑制されたと判断できたものについては〇を、それ以外については Xとした。  [0036] The obtained sample was observed with the naked eye and a microscope, and it was judged that the yellowing phenomenon was markedly suppressed as compared with the conventional sample, and the others were marked X.
[0037] なお、軟化点は、リトルトン粘度計を用い、粘度係数 r? = 107·6に達したときの温度と した。また、熱膨張係数は、熱膨張計を用い、 5°C/分で昇温したときの 30〜300°C での伸び量から求めた。 [0037] The softening point was the temperature at which the viscosity coefficient r? = 10 7 · 6 was reached using a Littleton viscometer. The thermal expansion coefficient was determined from the amount of elongation at 30 to 300 ° C when the temperature was raised at 5 ° C / min using a thermal dilatometer.
[0038] (結果) 低融点ガラス組成および、各種試験結果を表 1, 2に示す。  (Results) Tables 1 and 2 show the low melting point glass composition and various test results.
[0039] 表 1における実施例 1〜7に示すように、本発明の組成範囲内においては、黄変の 発現が従来と比べて格段に抑制されていた。  [0039] As shown in Examples 1 to 7 in Table 1, in the composition range of the present invention, the occurrence of yellowing was remarkably suppressed as compared with the conventional case.
[0040] 他方、本発明の組成範囲を外れる表 2における比較例 1〜4は、従来と同様、黄変 の発現が顕著である、或いは、好ましい物性値を示さず、 PDP等の基板被覆用低融 点ガラスとして適用し得な 、。  [0040] On the other hand, Comparative Examples 1 to 4 in Table 2 outside the composition range of the present invention, as in the prior art, show significant yellowing, or do not show favorable physical properties, and are suitable for coating substrates such as PDP Cannot be applied as low melting point glass.

Claims

請求の範囲 The scope of the claims
[1] SiOを 25〜40重量0 /0、 B Oを 35〜55重量0 /0、 ZnOを 5〜12重量0 /0、 R O (Li O [1] SiO the 25 to 40 weight 0/0, BO 35 to 55 weight 0/0, ZnO 5-12 wt 0/0, RO (Li O
2 2 3 2 2 2 2 3 2 2
+Na O+K Ο)を 10〜18重量%、 BaOを 0. 1〜3重量%、 ZrOを 0. 1〜7重量%+ Na O + K Ο) 10-18%, BaO 0.1-3%, ZrO 0.1-7%
2 2 2 2 2 2
、 CuOを 0. 1〜2重量0 /0含む、透明絶縁性の SiO— B O— ZnO— R O— BaO— Z The CuO comprises 0.1 to 2 wt 0/0, the transparent insulating SiO- BO- ZnO- RO- BaO- Z
2 2 3 2  2 2 3 2
rO CuO系無鉛低融点ガラス。  rO CuO lead-free low melting point glass.
2  2
[2] B O ZZnOの重量比が 3〜7の範囲内である、請求項 1に記載の無鉛低融点ガラス  [2] The lead-free low melting point glass according to claim 1, wherein the weight ratio of B 2 O 3 ZZnO is in the range of 3 to 7.
2 3  twenty three
[3] MnOを 0〜2重量%含む、請求項 1又は請求項 2に記載の無鉛低融点ガラス。 [3] The lead-free low melting point glass according to claim 1 or 2, comprising 0 to 2% by weight of MnO.
2  2
[4] RO (MgO + CaO + SrO)を0〜10重量%含む、請求項 1乃至 3のいずれ力 1項に記 載の無鉛低融点ガラス。  [4] The lead-free low-melting glass according to any one of claims 1 to 3, comprising 0 to 10% by weight of RO (MgO + CaO + SrO).
[5] 30°C〜300°Cにおける熱膨張係数が 65 X 10— 7Z°C〜95 X 10"V°C,軟化点が 50[5] 30 ° C~300 ° C coefficient of thermal expansion is 65 X 10- 7 Z ° C~95 X 10 "V ° C, softening point 50
0°C以上 630°C以下である、請求項 1乃至 4のいずれか 1項に記載の無鉛低融点ガラ ス。 The lead-free low-melting glass according to any one of claims 1 to 4, wherein the glass is 0 ° C or higher and 630 ° C or lower.
[6] 請求項 1乃至 5のいずれか 1項に記載の無鉛低融点ガラスを絶縁性被膜材料及び封 着材料として含んで!/、る電子材料用基板。  [6] A substrate for electronic materials comprising the lead-free low melting point glass according to any one of claims 1 to 5 as an insulating coating material and a sealing material.
[7] 請求項 1乃至 5のいずれか 1項に記載の無鉛低融点ガラスを絶縁性被膜材料及び封 着材料として含んで!/、る PDP用パネル。 [7] A PDP panel comprising the lead-free low melting point glass according to any one of claims 1 to 5 as an insulating coating material and a sealing material.
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