WO2007129830A1 - Semiconductor package having polymer coated copper wire and method for manufacturing the same - Google Patents

Semiconductor package having polymer coated copper wire and method for manufacturing the same Download PDF

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Publication number
WO2007129830A1
WO2007129830A1 PCT/KR2007/002173 KR2007002173W WO2007129830A1 WO 2007129830 A1 WO2007129830 A1 WO 2007129830A1 KR 2007002173 W KR2007002173 W KR 2007002173W WO 2007129830 A1 WO2007129830 A1 WO 2007129830A1
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WO
WIPO (PCT)
Prior art keywords
copper
wire
semiconductor chip
polymer
copper wire
Prior art date
Application number
PCT/KR2007/002173
Other languages
French (fr)
Inventor
Joo Seok Oh
Eui Deok Kim
Ki Suk Park
Seoung Whan Shin
Original Assignee
Hanwha Chemical Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hanwha Chemical Corporation filed Critical Hanwha Chemical Corporation
Priority to JP2008518053A priority Critical patent/JP2008544542A/en
Publication of WO2007129830A1 publication Critical patent/WO2007129830A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/002—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
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Definitions

  • the present invention relates to a semiconductor package and a method for manufacturing the same, and particularly, to a semiconductor package having a polymer coated copper wire and a method for manufacturing the same .
  • a plurality of pads for inputting/outputting the signal are provided on the semiconductor chip, and the pads are electrically connected with a lead frame by using a bonding wire .
  • the semiconductor chip is constructed of crystals like glass which is weak in external impact and the pad has a very small size, it is not possible that the semiconductor chip is directly connected with an external circuit to transfer the signal.
  • the lead frame is used as a terminal for inputting/outputting the signal.
  • small electric resistance material such as Au is used as a wiring material for transferring the signal between the pad of semiconductor chip and the lead frame .
  • the semiconductor chip, the lead frame and the bonding wire are packaged with resin or ceramic to protect from the external impact and foreign substances.
  • the semiconductor package is formed to be smaller and thinner in size.
  • the semiconductor chip is further downsized and a distance between the semiconductor chip and the lead frame becomes much shorter.
  • the bonding wires for electrically connecting the pads and the lead frames have to maintain a loop in the shortest distance while they are prevented from being shorted or opened, even though the ambient temperature is changed.
  • a chip pad of the semiconductor chip which is attached to a die pad of the lead frame, and an external terminal like an internal lead of the lead frame are electrically connected through a wire with each other.
  • the Au is mainly used for the wire.
  • the Au wire is very expensive and has a feature that its reliability is remarkably lowered in a high temperature. Further, since the Au wire is soft, it has a disadvantage of being easily deformed by external force.
  • a conventional boding wire in which a metallic material such as Be, Ca and the like is added or doped to high purity gold in the unit of ppm on a weight percent basis.
  • the conventional boding wire did not show an improved efficiency which completely changed a property of the gold.
  • the copper wire has a lower electric resistance than the Au wire, it is possible to increase an electric property like an operation speed of the semiconductor package, and the copper wire is moderated in price. Further, since the copper wire has a higher thermal conductivity than the Au wire, it has an advantage of facilely radiating heat.
  • a semiconductor package comprising a polymer coated copper wire.
  • the polymer coating film is formed from a polymer emulsion which is preferably selected from a group of polystyrenics and polyacrylics , and a thickness of a layer coasted with the polymer emulsion is 10-500nm.
  • a copper alloy wire may be used, which comprises at least one of a group including silver and gold, which is alloyed with copper.
  • a semiconductor package according to the present invention comprises a copper wire or a copper alloy wire coated with a polymer emulsion selected from a group of polystyrenics and polyacrylics, which is connected with a semiconductor chip pad and a terminal.
  • the polymer coating film is formed from a polymer emulsion which is preferably selected from a group of polystyrenics and polyacrylics, and a thickness of a layer coated with the polymer emulsion is 10-500nm.
  • a copper alloy wire may be used, which comprises at least one of a group including silver and gold, which is alloyed with copper.
  • the semiconductor package of the present invention further comprises a semiconductor chip having the semiconductor chip pad, a lead frame pad on which the semiconductor chip is attached and a molding material for completely wrapping the semiconductor chip, a part of the lead frame pad and a part of the lead.
  • method for fabricating a semiconductor package comprising the steps of providing a semiconductor chip pad and a terminal, and connecting the semiconductor chip pad and the terminal by a copper or copper alloy wire which is coated with a polymer emulsion selected from a group of polystyrenics and polyacrylics and of which one end is bonded to the semiconductor chip pad and the other end is bonded to the terminal .
  • the polymer coating film has a thickness of 10-500nm and also comprises a polymer emulsion selected from a group of polystyrenics and polyacrylics.
  • the copper alloy wire comprises at least one of a group including silver and gold, which is alloyed with copper.
  • the polymer coating film is formed from a polymer emulsion which is preferably selected from a group of polystyrenics and polyacrylics.
  • the polymer emulsion has a molecular weight from a hundred thousand to a million and also has a particle diameter of 10-200nm.
  • the cost and the reliability are further improved comparing with a conventional coating process .
  • a method for fabricating the polymer emulsion according to the present invention comprises the steps: a) polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer; b) preparing a water-dispersible solution in which polymer fabricated in the step a) is water-dispersed; c) adding and emulsion-polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer in the water-dispersible solution.
  • Fig. 1 is a cross-sectional view of a semiconductor package having a polymer coated copper wire according to the present invention
  • Fig. 2 is a perspective view showing a cut portion of the copper wire of the semiconductor package of Fig. 1;
  • Figs. 3 and 4 are cross-sectional views respectively showing an Au wire and the copper wire bonded to a metallic electrode pad of the semiconductor chip; and Fig. 5 is a view explaining a wire bonding process in a method for fabricating the semiconductor package of Fig. 1.
  • Fig. 1 is a cross-sectional view of a semiconductor package having a polymer coated copper wire according to the present invention
  • Fig. 2 is a perspective view showing a cut portion of the copper wire of the semiconductor package of Fig. 1.
  • a semiconductor chip 120 is attached on a lead frame pad 110 by a bonding means like epoxy resin 130.
  • An aluminum electrode pad 122 is provided on a surface of the semiconductor chip 120, and a passivation film 124 is provided on other surface of the semiconductor chip 120 on which the aluminum electrode pad 122 is not provided.
  • the aluminum electrode pad 122 is electrically connected with an inner lead 140 of a lead frame via a polymer coated copper wire 150.
  • an upper portion of the lead frame pad 110, the semiconductor chip 120, the inner lead 140 of the lead frame and the polymer coated copper wire 150 are covered with an EMC (Epoxy Molding Compound) .
  • the polymer coated copper wire 150 is comprised of a copper wire 152 provided therein and a polymer coating film 154 wrapping round the copper wire 152.
  • a copper alloy wire in which copper is alloyed with other substances may be used.
  • the copper alloy wire in which the copper is alloyed with silver or gold or, if necessary, silver and gold can be used. Therefore, the description of the copper wire to be described below can be also applied to the copper alloy wire in the same manner.
  • the polymer coating film 154 is comprised of a polymer emulsion selected from a group of polystyrenics and polyacrylics .
  • the polymer coating film 154 has a thickness (di) of 10-50nm. If the polymer coating film 154 has a thickness of less than IOnm, the copper wire may be oxidized by external environment. However, if the polymer coating film 154 has a thickness of more than 500nm, since a performance of preventing the oxidation is no longer increased, it is not economical. Further, if the polymer coating film 154 has an excessive thickness, it may be not facile to form a ball by electric discharge at an end of a capillary. Therefore, the polymer coating film 154 has a thickness of preferably 10-500nm, more preferably, 80-300nm.
  • the copper wire has a larger Young's modulus of 13.6 X 10 10 N/m 2 comparing with the Au wire having a Young's modulus of 8.8 X 10 10 N/m 2 , which is a criterion of stiffness in the bonded status against external force.
  • the copper wire 152 is about 40-50% of the Au wire and the polymer coated copper wire 150 is about 50-60%.
  • Figs. 3 and 4 are cross-sectional views respectively showing an Au wire and the copper wire bonded to a metallic electrode pad of the semiconductor chip.
  • A in the drawing
  • a contact surface between the aluminum electrode pad 320 and the Au wire 330 is increased. If the contact surface is increased, a contact resistance between the aluminum electrode pad 320 and the gold wire 330 is increased, thereby deteriorating the electric property.
  • the higher a temperature is, the more a depressed thickness d 2 of the aluminum electrode pad 320 is increased, and an increase rate thereof is further increased when the temperature is more than a desired level.
  • a resistance value in the case of using the copper wire is less than that in the case of using the Au wire is caused by two following factors. Firstly, in the case of using the copper wire, the intermetallic growth between copper and aluminum or between copper and aluminum containing copper and silicone is less occurred. Secondly, the copper has a specific resistance of about 1.67 ⁇ cm at a temperature of 2O 0 C, but the Au has a specific resistance of about 2.4 ⁇ cra at the temperature of 2O 0 C.
  • Fig. 5 is a view explaining a wire bonding process in a method for fabricating the semiconductor package of Fig. 1.
  • the polymer (154 in Fig. 2) coated copper wire 150 is wound on a wire spool 410 disposed in an internal space defined by a cover 420 for a wire storage container.
  • the wire spool 410 is rotatably provided.
  • a nitrogen gas injection port so as to pass through the cover 420 so that nitrogen gas for suppressing the oxidation is supplied into the internal space in which the copper wire 150 is stored.
  • the nitrogen gas injection port is not necessary.
  • a part of the cover 420 is opened so that the polymer coated copper wire 150 can be supplied to the outside.
  • the polymer coated copper wire 150 is supplied from the wire storage container to a capillary 450 through a first roller 431, a second roller 432 and a supporting stand 440.
  • the polymer coated copper wire 150 supplied to the capillary 450 has a ball 155 formed by strong electric discharge at the outside of the capillary 450.
  • the polymer coated copper wire 150 having the ball 155 is bonded on the surface of the aluminum electrode pad 122 formed on the semiconductor chip 120 by a typical way. Meanwhile, when the copper and the polymer coating film are melted by the electric discharge generated at the end of the capillary 450, a part of the copper may be oxidized. To prevent such the oxidation, a separated gas nozzle 460 is needed.
  • a mixture of styrene (10. Og), acrylic acid (10. Og) and alpha-methyl styrene (10. Og) and a mixture of t- butylperoxybenzoate (1.2g), dipropyleneglycol methylether (3.Og), 2-hydroxyethylacrylate (10. Og) and 2- hydroxyethylmetacrylate (10. Og) were mixed in a high pressure chemical reactor of 100ml having a stirrer and then heated to a temperature of 200 0 C. The reactant was stirred for 20 minutes at the temperature and cooled at a room temperature and then dried in a vacuum oven to obtain a final reactant.
  • the final reactant of 15g was dissolved in a mixture of 8Og of water and ammonia water. At this time, the dissolved reactant was heated to a temperature of about 9O 0 C, if necessary, and the solution ph was controlled at 9.0 by controlling an amount of ammonia water. After Potassium persulfate (1.5g) was added to the solution, a temperature of the solution was adjusted to 8O 0 C. Then, a mixture solution of styrene (2Og) and 2-ethylhexylacrylate (2Og) was slowly added to the solution over two hours, while the solution is stirred.
  • styrene (2Og) and 2-ethylhexylacrylate (2Og) was slowly added to the solution over two hours, while the solution is stirred.
  • a pH of the final reactant was controlled at 9.0 by controlling an amount of ammonia water.
  • ammonium persulfate (1.Og) was added to the solution, a temperature of the solution was adjusted to 8O 0 C.
  • a mixture solution of styrene (5Og) and methacrylic acid (2Og) was slowly added to the solution over one hour, while the solution is stirred.
  • the solution was further stirred for one hour at the same temperature, thereby obtaining a polymer resin emulsion in which particles of about 50nm are dispersed.
  • Aqueous solution of the resin emulsion obtained in the first fabrication example is coated to the copper wire having a diameter of 50 ⁇ m, thereby obtaining polymer coated copper wire.
  • the coating process is as follows.
  • the resin emulsion for coating a polymer film is diluted with water so as to obtain a new resin emulsion having solid powder of 20%.
  • the new resin emulsion is put in a tank which is maintained at a temperature of 60 0 C.
  • the copper wire having the diameter of 50 ⁇ m is passed through the tank at a speed of about lOOm/sec.
  • the polymer coated copper wire is washed once with water and further once with a mixture solution of water and ethanol at the room temperature and at a speed of about 100m/sec so as to remove the resin particles which are not attached on a surface of the copper wire.
  • the polymer coated copper wire is dried at a temperature of 40 0 C in a status of being wound.
  • a measured thickness of the polymer coating film coated on the copper wire is 149nm.
  • a thickness of the polymer coating film is 119nm.
  • Second embodiment As shown in Table 1, the fabricating processes are the same as in the first embodiment, except for an amount of resin. An average thickness of the polymer coating film was 88nm, and in other experimental result repeated under the same conditions, a thickness of the polymer coating film is 84nm.
  • the fabricating processes are the same as in the first embodiment, except for an amount of resin and a kind of coating resin.
  • An average thickness of the polymer coating film was 228nm.
  • the measured resistance value is more than 10 4 ⁇ and less than 10 8 ⁇ after contacting with the copper wire one hundred times
  • X the measured resistance value is less than 10 4 ⁇ after contacting with the copper wire one hundred times
  • first to third embodiments and first and ninth comparison examples After the copper wires of first to third embodiments and first and ninth comparison examples are left for one month in a chamber having a humidity of 85% and a temperature of 85 0 C and then dried to obtain estimating samples. Then, the copper wires of first to third embodiments and first and ninth comparison examples are pressed with a pressure of 15mN using a micro-compression test machine enough to pill the polymer film off, each of the resistances was measured and than indicated in table 3.
  • the measured resistance value is more than 10 ⁇ after contacting with the copper wire one hundred times
  • the polymer coated copper wires in the first to third embodiments have more excellent insulation performance than other copper wires which are not coated with the polymer coating film, and the polymer coated copper wires also have more excellent oxidation preventing performance even though being held for a long period and thus increase in the ohmic resistance and the discoloration are not observed. Further, from the result of the third embodiments and first and ninth comparison examples, it can be ascertained that the polymer coated copper wires have a good insulation property when the polymer coating film has a thickness of more than IOnm, preferably, more than 80nm.
  • the semiconductor package and the method for fabricating the same have some advantages as follows:
  • the copper wire can provide an improved electric property by suppressing the oxidation, an increased bonding strenght and an improved reliability, comparing with the case of only using the copper wire .
  • the method of coating the polymer film on the copper wire using the polymer emulsion is economical and stable and also has an advantage of precisely controlling a thickness of the polymer coating film by controlling particles of the emulsion when fabricating the polymer emulsion.

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)

Abstract

The present invention relates to a semiconductor package having a copper or copper alloy wire which maintains excellent reliability and characteristic of preventing electric property from being deteriorated. The semiconductor package comprises a semiconductor chip pad, a terminal and a polymer coated wire for connecting the semiconductor chip pad and the terminal. According to the present invention, the polymer coated copper or copper alloy wire can provide an improved efficiency of having lower electric resistance, structural stiffness, lower cost, increased durability at a high ambient temperature, higher thermal conductivity and lower heat generation, comparing with the Au wire.

Description

SEMICONDUCTOR PACKAGE HAVING POLYMER COATED COPPER WIRE AND METHOD FOR MANUFACTURING THE SMAE
[Technical Field]
The present invention relates to a semiconductor package and a method for manufacturing the same, and particularly, to a semiconductor package having a polymer coated copper wire and a method for manufacturing the same .
[Background Art]
Generally, in order to input/output a signal necessary for an integrated circuit of a semiconductor chip from/to the outside, a plurality of pads for inputting/outputting the signal are provided on the semiconductor chip, and the pads are electrically connected with a lead frame by using a bonding wire .
Since the semiconductor chip is constructed of crystals like glass which is weak in external impact and the pad has a very small size, it is not possible that the semiconductor chip is directly connected with an external circuit to transfer the signal. Thus, the lead frame is used as a terminal for inputting/outputting the signal.
For bonding wire, small electric resistance material such as Au is used as a wiring material for transferring the signal between the pad of semiconductor chip and the lead frame . Further, the semiconductor chip, the lead frame and the bonding wire are packaged with resin or ceramic to protect from the external impact and foreign substances.
According to a general tendency, the semiconductor package is formed to be smaller and thinner in size. Thus, the semiconductor chip is further downsized and a distance between the semiconductor chip and the lead frame becomes much shorter. However, the bonding wires for electrically connecting the pads and the lead frames have to maintain a loop in the shortest distance while they are prevented from being shorted or opened, even though the ambient temperature is changed.
In a general semiconductor package, a chip pad of the semiconductor chip, which is attached to a die pad of the lead frame, and an external terminal like an internal lead of the lead frame are electrically connected through a wire with each other. The Au is mainly used for the wire. As is well known in the art, however, the Au wire is very expensive and has a feature that its reliability is remarkably lowered in a high temperature. Further, since the Au wire is soft, it has a disadvantage of being easily deformed by external force.
To complement such the disadvantage, there was provided a conventional boding wire in which a metallic material such as Be, Ca and the like is added or doped to high purity gold in the unit of ppm on a weight percent basis. However, the conventional boding wire did not show an improved efficiency which completely changed a property of the gold.
Therefore, according to a recent tendency of requiring a semiconductor package which is capable of a high speed operation with low power consumption and manufactured with a low cost, there is carrying on a study of copper wire which has a better property than the Au wire. Since the copper wire has a lower electric resistance than the Au wire, it is possible to increase an electric property like an operation speed of the semiconductor package, and the copper wire is moderated in price. Further, since the copper wire has a higher thermal conductivity than the Au wire, it has an advantage of facilely radiating heat.
However, when the copper wire is exposed to external environment, for example, during a wire bonding process, there is a disadvantage that a surface of the copper wire is oxidized, thereby deteriorating the reliability and the electric property of the copper wire. That is, in case that the surface of the copper wire is oxidized, a resistance value is increased and thus the electric property is deteriorated. Further, a bonding strength is lowered and the reliability is also deteriorated. Particularly, if a ball forming portion of an end of a capillary is oxidized during the wire bonding process, electric discharge is not occurred at the at the end of the capillary, and thus the ball may be not formed into a circular shape. Further, although the ball is normally formed into the circular shape, an attaching force thereof may be remarkably reduced after the wire bonding process .
In order to overcome the above disadvantages, there has been proposed a method of coating a surface of copper wire with polymer in Japanese Patent Laid-Open No.2000-195892. However, in this method, since polymeric oligomer is coated on the surface of the copper wire and then hardened by a desire light-radiating process, an organic solvent is needed and a desired device for the hardening process is also needed. Therefore, there are problems that the above method is not economical and also not safe and it is difficult to uniformly and thinly coat the polymer film. [Disclosure] [Technical Problem]
It is an object of the present invention to provide a polymer coated copper wire which can maintain good properties and restrain oxidation thereof, thereby preventing the reliability and the electric property from being deteriorated. It is another object of the present invention to provide a semiconductor package having the polymer coated copper wire.
[Technical Solution]
It is yet another object of the present invention to provide a method for fabricating the semiconductor package. The foregoing and/or other aspects of the present invention can be achieved by providing a semiconductor package comprising a polymer coated copper wire. It is preferable that the polymer coating film is formed from a polymer emulsion which is preferably selected from a group of polystyrenics and polyacrylics , and a thickness of a layer coasted with the polymer emulsion is 10-500nm. Instead of the copper wire, a copper alloy wire may be used, which comprises at least one of a group including silver and gold, which is alloyed with copper.
A semiconductor package according to the present invention comprises a copper wire or a copper alloy wire coated with a polymer emulsion selected from a group of polystyrenics and polyacrylics, which is connected with a semiconductor chip pad and a terminal.
Preferably, the polymer coating film is formed from a polymer emulsion which is preferably selected from a group of polystyrenics and polyacrylics, and a thickness of a layer coated with the polymer emulsion is 10-500nm. Instead of the copper wire, a copper alloy wire may be used, which comprises at least one of a group including silver and gold, which is alloyed with copper. The semiconductor package of the present invention further comprises a semiconductor chip having the semiconductor chip pad, a lead frame pad on which the semiconductor chip is attached and a molding material for completely wrapping the semiconductor chip, a part of the lead frame pad and a part of the lead.
Further, according to other aspects of the present invention, there is provided method for fabricating a semiconductor package, comprising the steps of providing a semiconductor chip pad and a terminal, and connecting the semiconductor chip pad and the terminal by a copper or copper alloy wire which is coated with a polymer emulsion selected from a group of polystyrenics and polyacrylics and of which one end is bonded to the semiconductor chip pad and the other end is bonded to the terminal .
Preferably, the polymer coating film has a thickness of 10-500nm and also comprises a polymer emulsion selected from a group of polystyrenics and polyacrylics. Preferably, the copper alloy wire comprises at least one of a group including silver and gold, which is alloyed with copper.
In the copper or copper alloy wire which is coated with the polymer film, the polymer coating film is formed from a polymer emulsion which is preferably selected from a group of polystyrenics and polyacrylics. The polymer emulsion has a molecular weight from a hundred thousand to a million and also has a particle diameter of 10-200nm. By using the water as a solvent, the cost and the reliability are further improved comparing with a conventional coating process . It is also possible to easily form the polymer film by using a general drying process without a separate light radiation way like ultraviolet rays. Further, since it is possible to control a size of emulsion particle during aqueous emulsion polymerization, the thickness of the coated film can be controlled precisely.
A method for fabricating the polymer emulsion according to the present invention comprises the steps: a) polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer; b) preparing a water-dispersible solution in which polymer fabricated in the step a) is water-dispersed; c) adding and emulsion-polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer in the water-dispersible solution. [Description of Drawings]
Fig. 1 is a cross-sectional view of a semiconductor package having a polymer coated copper wire according to the present invention; Fig. 2 is a perspective view showing a cut portion of the copper wire of the semiconductor package of Fig. 1;
Figs. 3 and 4 are cross-sectional views respectively showing an Au wire and the copper wire bonded to a metallic electrode pad of the semiconductor chip; and Fig. 5 is a view explaining a wire bonding process in a method for fabricating the semiconductor package of Fig. 1.
[Detailed Description of Main Elements] 110: lead frame pad
120,310: semiconductor chip
130: epoxy resin
122,320,340: aluminum electrode pad
124.- passivation film 140: inner lead of lead frame
150: polymer coated copper wire
152,350: copper wire
154 : polymer coating film
155: copper ball 330 : Au wire
410: wire spool
420: cover for a wire storage container
431,432: roller
440: supporting stand 450: capillary
460: gas nozzle [Best Mode]
Now, the present invention will be described with reference to the drawings. Fig. 1 is a cross-sectional view of a semiconductor package having a polymer coated copper wire according to the present invention, and Fig. 2 is a perspective view showing a cut portion of the copper wire of the semiconductor package of Fig. 1.
Referring to Fig. 1, a semiconductor chip 120 is attached on a lead frame pad 110 by a bonding means like epoxy resin 130. An aluminum electrode pad 122 is provided on a surface of the semiconductor chip 120, and a passivation film 124 is provided on other surface of the semiconductor chip 120 on which the aluminum electrode pad 122 is not provided. The aluminum electrode pad 122 is electrically connected with an inner lead 140 of a lead frame via a polymer coated copper wire 150. Although not shown in the drawings, an upper portion of the lead frame pad 110, the semiconductor chip 120, the inner lead 140 of the lead frame and the polymer coated copper wire 150 are covered with an EMC (Epoxy Molding Compound) .
Referring to Fig. 2, the polymer coated copper wire 150 is comprised of a copper wire 152 provided therein and a polymer coating film 154 wrapping round the copper wire 152. Instead of the copper wire 152, a copper alloy wire in which copper is alloyed with other substances may be used. For example, the copper alloy wire in which the copper is alloyed with silver or gold or, if necessary, silver and gold can be used. Therefore, the description of the copper wire to be described below can be also applied to the copper alloy wire in the same manner. The polymer coating film 154 is comprised of a polymer emulsion selected from a group of polystyrenics and polyacrylics . It is preferred that the polymer coating film 154 has a thickness (di) of 10-50nm. If the polymer coating film 154 has a thickness of less than IOnm, the copper wire may be oxidized by external environment. However, if the polymer coating film 154 has a thickness of more than 500nm, since a performance of preventing the oxidation is no longer increased, it is not economical. Further, if the polymer coating film 154 has an excessive thickness, it may be not facile to form a ball by electric discharge at an end of a capillary. Therefore, the polymer coating film 154 has a thickness of preferably 10-500nm, more preferably, 80-300nm. In addition, the copper wire has a larger Young's modulus of 13.6 X 1010N/m2 comparing with the Au wire having a Young's modulus of 8.8 X 1010N/m2, which is a criterion of stiffness in the bonded status against external force. And in the aspect of price, the copper wire 152 is about 40-50% of the Au wire and the polymer coated copper wire 150 is about 50-60%.
Figs. 3 and 4 are cross-sectional views respectively showing an Au wire and the copper wire bonded to a metallic electrode pad of the semiconductor chip.
Referring to Fig. 3, if an Au wire 330 is bonded to an aluminum electrode pad 320 formed on the semiconductor chip 310, there occurs a phenomenon called intermetallic growth between aluminum and Au, and the aluminum in the aluminum electrode pad 320 grows into the Au wire 330. Thus, a part
("A" in the drawing) of the aluminum electrode pad 320 is depressed into the Au wire 330 and a contact surface between the aluminum electrode pad 320 and the Au wire 330 is increased. If the contact surface is increased, a contact resistance between the aluminum electrode pad 320 and the gold wire 330 is increased, thereby deteriorating the electric property. Particularly, the higher a temperature is, the more a depressed thickness d2 of the aluminum electrode pad 320 is increased, and an increase rate thereof is further increased when the temperature is more than a desired level.
Referring to Fig. 4, if a copper wire 350 is bonded to the aluminum electrode pad 340 formed on the semiconductor chip 310, the intermetallic growth between aluminum and copper is hardly occurred and thus an upper portion of the aluminum electrode pad 340 is hardly depressed into the copper wire 350. Therefore, a contact surface between the aluminum electrode pad 340 and the copper wire 330 is not increased abnormally.
The phenomenon that a resistance value in the case of using the copper wire is less than that in the case of using the Au wire is caused by two following factors. Firstly, in the case of using the copper wire, the intermetallic growth between copper and aluminum or between copper and aluminum containing copper and silicone is less occurred. Secondly, the copper has a specific resistance of about 1.67μΩcm at a temperature of 2O0C, but the Au has a specific resistance of about 2.4μΩcra at the temperature of 2O0C. Fig. 5 is a view explaining a wire bonding process in a method for fabricating the semiconductor package of Fig. 1.
Referring to Fig. 5, the polymer (154 in Fig. 2) coated copper wire 150 is wound on a wire spool 410 disposed in an internal space defined by a cover 420 for a wire storage container. The wire spool 410 is rotatably provided. In conventional wire storage container, there is provided a nitrogen gas injection port so as to pass through the cover 420 so that nitrogen gas for suppressing the oxidation is supplied into the internal space in which the copper wire 150 is stored. However, in the present invention, since the copper wire itself is wrapped with the polymer coating film, the nitrogen gas injection port is not necessary. Further, a part of the cover 420 is opened so that the polymer coated copper wire 150 can be supplied to the outside. The polymer coated copper wire 150 is supplied from the wire storage container to a capillary 450 through a first roller 431, a second roller 432 and a supporting stand 440. The polymer coated copper wire 150 supplied to the capillary 450 has a ball 155 formed by strong electric discharge at the outside of the capillary 450. The polymer coated copper wire 150 having the ball 155 is bonded on the surface of the aluminum electrode pad 122 formed on the semiconductor chip 120 by a typical way. Meanwhile, when the copper and the polymer coating film are melted by the electric discharge generated at the end of the capillary 450, a part of the copper may be oxidized. To prevent such the oxidation, a separated gas nozzle 460 is needed.
Hereinafter, some fabrication examples and embodiments according to the present invention will be described. However, the present invention is not limited to the fabrication examples and embodiments.
First fabrication example
A mixture of styrene (10. Og), acrylic acid (10. Og) and alpha-methyl styrene (10. Og) and a mixture of t- butylperoxybenzoate (1.2g), dipropyleneglycol methylether (3.Og), 2-hydroxyethylacrylate (10. Og) and 2- hydroxyethylmetacrylate (10. Og) were mixed in a high pressure chemical reactor of 100ml having a stirrer and then heated to a temperature of 2000C. The reactant was stirred for 20 minutes at the temperature and cooled at a room temperature and then dried in a vacuum oven to obtain a final reactant.
The final reactant of 15g was dissolved in a mixture of 8Og of water and ammonia water. At this time, the dissolved reactant was heated to a temperature of about 9O0C, if necessary, and the solution ph was controlled at 9.0 by controlling an amount of ammonia water. After Potassium persulfate (1.5g) was added to the solution, a temperature of the solution was adjusted to 8O0C. Then, a mixture solution of styrene (2Og) and 2-ethylhexylacrylate (2Og) was slowly added to the solution over two hours, while the solution is stirred. After the addition of the monomer mixture was completed, the solution was further stirred for one hour at the same temperature, thereby obtaining a polymer resin emulsion in which particles of about 70nm are dispersed. Second fabrication example Ammonium persulfate (1.Og) was added to a mixture of methacrylic acid (5.Og), acrylic acid (5.Og), ethyl acrylate
(20.Og) and acrylonitrile (3.Og). And the mixture was put in a high pressure chemical reactor of 100ml having a stirrer, and sodium dodecylbenzene sulfonate of 0.3g was further added. Then, the mixture was heated to a temperature of 800C. The reactant was stirred for 2hours at the temperature and then cooled at a room temperature to obtain a final reactant.
A pH of the final reactant was controlled at 9.0 by controlling an amount of ammonia water. After ammonium persulfate (1.Og) was added to the solution, a temperature of the solution was adjusted to 8O0C. Then, a mixture solution of styrene (5Og) and methacrylic acid (2Og) , in which nonylphenylether of 6g is further added, was slowly added to the solution over one hour, while the solution is stirred. After the addition of the monomer mixture was completed, the solution was further stirred for one hour at the same temperature, thereby obtaining a polymer resin emulsion in which particles of about 50nm are dispersed.
First embodiment Aqueous solution of the resin emulsion obtained in the first fabrication example is coated to the copper wire having a diameter of 50μm, thereby obtaining polymer coated copper wire. The coating process is as follows.
The resin emulsion for coating a polymer film is diluted with water so as to obtain a new resin emulsion having solid powder of 20%. The new resin emulsion is put in a tank which is maintained at a temperature of 600C. Then, the copper wire having the diameter of 50μm is passed through the tank at a speed of about lOOm/sec. And, the polymer coated copper wire is washed once with water and further once with a mixture solution of water and ethanol at the room temperature and at a speed of about 100m/sec so as to remove the resin particles which are not attached on a surface of the copper wire.
Then, the polymer coated copper wire is dried at a temperature of 400C in a status of being wound. A measured thickness of the polymer coating film coated on the copper wire is 149nm. In other experimental result repeated under the same conditions, a thickness of the polymer coating film is 119nm. Second embodiment As shown in Table 1, the fabricating processes are the same as in the first embodiment, except for an amount of resin. An average thickness of the polymer coating film was 88nm, and in other experimental result repeated under the same conditions, a thickness of the polymer coating film is 84nm.
Third embodiment
As shown in Table 1, the fabricating processes are the same as in the first embodiment, except for an amount of resin and a kind of coating resin. An average thickness of the polymer coating film was 228nm.
Table 1
Figure imgf000017_0001
Figure imgf000018_0001
Experiment example
There was performed an experiment on an insulation resistance, an ohmic resistance and a discoloration test with respect to five kinds of copper wires which are coated with the polymer film obtained in the embodiments and nine kinds of copper wires having a diameter of 50μm which are not coated with the polymer film.
1) Insulation resistance test After pressing the copper wires of first to third embodiments and first and ninth comparison examples with a pressure of ImN using a micro-compression test machine, each of the resistances was measured and than indicated in table 2.
Rank: estimation standards o: the measured resistance value is more than 108Ω after contacting with the copper wire one hundred times
Δ : the measured resistance value is more than 104Ω and less than 108Ω after contacting with the copper wire one hundred times X: the measured resistance value is less than 104Ω after contacting with the copper wire one hundred times
Table 2 Insulation resistance estimation of copper wire
Figure imgf000019_0001
2) Ohtnic resistance test
After the copper wires of first to third embodiments and first and ninth comparison examples are left for one month in a chamber having a humidity of 85% and a temperature of 850C and then dried to obtain estimating samples. Then, the copper wires of first to third embodiments and first and ninth comparison examples are pressed with a pressure of 15mN using a micro-compression test machine enough to pill the polymer film off, each of the resistances was measured and than indicated in table 3.
Rank: estimation standards o: the measured resistance value is less than 5Ω after contacting with the copper wire one hundred times Δ : the measured resistance value is more than 5Ω and less than 10Ω after contacting with the copper wire one hundred times
X: the measured resistance value is more than 10Ω after contacting with the copper wire one hundred times
Table 3 Ohmic resistance estimation of copper wire
Figure imgf000020_0001
3) Discoloration test After the copper wires of first to third embodiments and first and ninth comparison examples are left for one month in a chamber having a humidity of 85% and a temperature of 850C and then dried to obtain estimating samples. Then, the discoloration of the copper wires due to the oxidation was observed and the result was indicated in table 4 Rank: estimation standards o: the discoloration is not observed Δ : little discoloration is observed X: the discoloration is observed
Table 4 Discoloration estimation of copper wire
Figure imgf000021_0001
As indicated in Tables 1 to 4 , the polymer coated copper wires in the first to third embodiments have more excellent insulation performance than other copper wires which are not coated with the polymer coating film, and the polymer coated copper wires also have more excellent oxidation preventing performance even though being held for a long period and thus increase in the ohmic resistance and the discoloration are not observed. Further, from the result of the third embodiments and first and ninth comparison examples, it can be ascertained that the polymer coated copper wires have a good insulation property when the polymer coating film has a thickness of more than IOnm, preferably, more than 80nm.
[industrial Applicability]
According to the present invention as described above, the semiconductor package and the method for fabricating the same have some advantages as follows:
Firstly, it can provide an improved efficiency of having lower electric resistance, structural stiffness, lower cost, increased durability at a high ambient temperature, higher thermal conductivity and lower heat generation, comparing with the Au wire.
Secondly, while maintaining the advantages of the copper wire, it can provide an improved electric property by suppressing the oxidation, an increased bonding strenght and an improved reliability, comparing with the case of only using the copper wire .
Thirdly, the method of coating the polymer film on the copper wire using the polymer emulsion is economical and stable and also has an advantage of precisely controlling a thickness of the polymer coating film by controlling particles of the emulsion when fabricating the polymer emulsion. Those skilled in the art will appreciate that the conceptions and specific embodiments disclosed in the foregoing description may be readily utilized as a basis for modifying or designing other embodiments for carrying out the same purposes of the present invention. Those skilled in the art will also appreciate that such equivalent embodiments do not depart from the spirit and scope of the invention as set forth in the appended claims.

Claims

[CLAIMS]
[Claim l]
A semiconductor package comprising: a copper wire or a copper alloy wire which is connected with a semiconductor chip pad and a terminal and coated with a polymer emulsion selected from a group of polystyrenics and polyacrylics .
[Claim 2]
The semiconductor package as set forth in claim 1, wherein a thickness of a layer coated with the polymer emulsion is 10-500nm.
[Claim 3]
The semiconductor package as set forth in claim 1, further comprising: a semiconductor chip having the semiconductor chip pad; a lead frame pad on which the semiconductor chip is attached; and a molding material for completely wrapping the semiconductor chip, a part of the lead frame pad and a part of the lead.
[Claim 4]
The semiconductor package as set forth in claim 1, wherein the copper alloy wire comprises at least one of a group including silver and gold, which is alloyed with copper.
[Claim 5] The semiconductor package as set forth in any one of claims 1 to 4 , wherein the polymer emulsion is fabricated by a method comprising the steps of: a) polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer; b) preparing a water-dispersible solution in which polymer fabricated in the step a) is water-dispersed; c) adding and emulsion-polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer in the water-dispersible solution.
[Claim 6]
A method for fabricating a semiconductor package, comprising the steps of: providing a semiconductor chip pad and a terminal; and connecting the semiconductor chip pad and the terminal by a copper or copper alloy wire which is coated with a polymer emulsion selected from a group of polystyrenics and polyacrylics and of which one end is bonded to the semiconductor chip pad and the other end is bonded to the terminal .
[Claim 7]
The method as set forth in claim 6, wherein a thickness of a layer coated with the polymer emulsion is 10-500nm.
[Claim 8] The method as set forth in claim 6, wherein the copper alloy wire comprises at least one of a group including silver and gold, which is alloyed with copper. [Claim 9]
The method as set forth in any one of claims 6 to 8, wherein the polymer emulsion is fabricated by a method comprising the steps of: a) polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer; b) preparing a water-dispersible solution in which polymer fabricated in the step a) is water-dispersed; c) adding and emulsion-polymerizing at least one selected from styrenics, (metha) acrylic acid or (metha) acrylate-based monomer in the water-dispersible solution.
PCT/KR2007/002173 2006-05-04 2007-05-03 Semiconductor package having polymer coated copper wire and method for manufacturing the same WO2007129830A1 (en)

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Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2000195892A (en) * 1998-12-25 2000-07-14 Sumitomo Electric Ind Ltd Bonding wire
KR20010010858A (en) * 1999-07-23 2001-02-15 이수남 method of fabricating semiconductor package
KR20030002627A (en) * 2001-06-29 2003-01-09 주식회사 하이닉스반도체 Semiconductor package having air column

Family Cites Families (4)

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Publication number Priority date Publication date Assignee Title
JPH04218932A (en) * 1990-12-19 1992-08-10 Mitsubishi Materials Corp Copper alloy ultrathin wire for semiconductor device and semiconductor device
JPH05129357A (en) * 1991-11-01 1993-05-25 Tanaka Denshi Kogyo Kk Bonding wire
JPH07133461A (en) * 1993-11-12 1995-05-23 Toyo Ink Mfg Co Ltd Water-based coating resin composition with high storage stability
JP3237049B2 (en) * 1995-11-27 2001-12-10 三菱マテリアル株式会社 Method of manufacturing surface-coated bonding wire for semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000195892A (en) * 1998-12-25 2000-07-14 Sumitomo Electric Ind Ltd Bonding wire
KR20010010858A (en) * 1999-07-23 2001-02-15 이수남 method of fabricating semiconductor package
KR20030002627A (en) * 2001-06-29 2003-01-09 주식회사 하이닉스반도체 Semiconductor package having air column

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