WO2007125864A1 - Light blocking resin composition, color filter, and liquid crystal display - Google Patents

Light blocking resin composition, color filter, and liquid crystal display Download PDF

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Publication number
WO2007125864A1
WO2007125864A1 PCT/JP2007/058737 JP2007058737W WO2007125864A1 WO 2007125864 A1 WO2007125864 A1 WO 2007125864A1 JP 2007058737 W JP2007058737 W JP 2007058737W WO 2007125864 A1 WO2007125864 A1 WO 2007125864A1
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WIPO (PCT)
Prior art keywords
acid
resin composition
light
shielding resin
carbon black
Prior art date
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PCT/JP2007/058737
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French (fr)
Japanese (ja)
Inventor
Toshiya Naruto
Junji Mizukami
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Mitsubishi Chemical Corporation
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Publication date
Application filed by Mitsubishi Chemical Corporation filed Critical Mitsubishi Chemical Corporation
Priority to KR1020077021663A priority Critical patent/KR101439085B1/en
Priority to CN2007800001888A priority patent/CN101313032B/en
Publication of WO2007125864A1 publication Critical patent/WO2007125864A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/04Carbon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/66Additives characterised by particle size
    • C09D7/67Particle size smaller than 100 nm
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/48Stabilisers against degradation by oxygen, light or heat
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix

Definitions

  • Light-shielding resin composition Color filter, and liquid crystal display device
  • the present invention relates to a light-shielding resin composition, a color filter, and a liquid crystal display device. Specifically, it is a light-shielding oil that can form black pixels with excellent linearity and adhesion, suitable for the production of optical power filters used in color televisions, liquid crystal display devices, solid-state imaging devices, cameras, etc.
  • the present invention relates to a composition, a color filter using the light-shielding resin composition, and a liquid crystal display device including the color filter.
  • Color filters usually form black pixels (hereinafter sometimes referred to as "black matrix”) on the surface of a transparent substrate such as glass or plastic sheet, and then red, green, blue, etc. These three or more different colored pixels are sequentially formed in a striped or mosaic color pattern.
  • the pattern size varies depending on the use of the color filter and each color, but is usually about 5 to 700 ⁇ m. Further, the positional accuracy of the overlay is several ⁇ m to several tens of ⁇ m, and it is manufactured with high dimensional accuracy and a fine processing technique.
  • Typical methods for producing a color filter include a dyeing method, a printing method, a pigment dispersion method, and an electrodeposition method.
  • the pigment dispersion method in which a colored resin composition containing a color material is applied on a transparent substrate and image exposure, development, and curing as necessary is repeated to form a color filter image is a formation method.
  • the position of the color filter pixel, the accuracy of the film thickness, etc. are high. It has excellent durability such as light resistance and heat resistance, and has few defects such as pinholes, so it is widely used.
  • a color filter (Patent Document 3) using a black matrix with a light shielding material of carbon black in which the total content of Na and Ca is reduced to a certain value or less are disclosed. Speak.
  • Patent Document 1 Japanese Unexamined Patent Application Publication No. 2005-128483
  • Patent Document 2 Japanese Patent Laid-Open No. 7-271020
  • Patent Document 3 Japanese Patent Laid-Open No. 9-71733
  • the carbon black used in the light-shielding resin composition preferably has a relatively small structure.
  • Such carbon black is produced, for example, by burning heavy oil in a system to which an inorganic compound containing potassium element is added.
  • the obtained carbon black contains potassium ions.
  • potassium ions in the light-shielding resin composition are obtained from the pixels formed using the light-shielding resin composition. It has been found that it becomes a factor that impedes adhesion to the substrate, resolution, and strict developability.
  • the present invention has been made in view of the above-described conventional situation, and is a light-shielding property capable of forming a black matrix excellent in developability, resolution, adhesion, particularly linearity and adhesion.
  • An object of the present invention is to provide a resin composition, a color filter using the light-shielding resin composition, and a liquid crystal display device including the color filter.
  • the light-shielding resin composition of the first aspect is a light-shielding resin composition containing a binder resin, a monomer, a photopolymerization initiator, and carbon black, and the carbon black has an average particle size of 8 nm or more. 65 nm or less, the DBP oil absorption of carbon black is 90 mlZlO Og or less, and the potassium ion content of the light-shielding resin composition is 20 ppm or less based on the total solid content. is there.
  • the color filter of the second aspect has a pixel formed using the light-shielding resin composition of the first aspect.
  • the liquid crystal display device includes the color filter according to the second aspect.
  • the inventors of the present invention have disclosed a light-shielding film containing a noda resin, a monomer, a photopolymerization initiator, and carbon black having a specific average particle size and DBP oil absorption, and having a reduced potassium ion content. It has been found that the black matrix formed using the oil composition has an unprecedented effect that the conventional technical ability is excellent in developability, resolution, adhesion, especially linearity and adhesion. .
  • the light-shielding resin composition of the present invention it is possible to form a black matrix that is excellent in developability, resolution, adhesion, particularly linearity, adhesion, and thereby high quality.
  • a color filter and a liquid crystal display device can be provided.
  • the light-shielding resin composition of the present invention comprises, as essential components, binder resin, monomer, photopolymerization initiator, and power bon black having an average particle size of 8 nm to 65 nm and a DBP oil absorption of 90 mlZ 1 OOg or less. If necessary, other additives other than the above components It is a blended one. It is essential that the potassium ion content is 20 ppm or less based on the total solid content.
  • the use of the light-shielding resin composition of the present invention is not particularly limited, but is particularly preferably used as a composition for the purpose of forming black pixels (black matrix) of color filters.
  • (meth) acryl means “acryl and Z or methacryl”, “acrylate and Z or metatalate”, and the like.
  • (meth) acrylic acid means “acrylic acid and Z or methacrylic acid”.
  • total solids refers to all components of the light-shielding resin composition of the present invention other than the solvent components described later.
  • the binder resin used in the light-shielding resin composition of the present invention it is preferable to use an epoxy acrylate resin having a carboxyl group.
  • the epoxy acrylate resin is obtained by adding an ⁇ , ⁇ unsaturated monocarboxylic acid or an ⁇ , ⁇ unsaturated monocarboxylic acid ester having a carboxyl group to the ester moiety to the epoxy resin, and further adding a polybasic acid anhydride. It is synthesized by reacting.
  • a reaction product has substantially no epoxy group due to its chemical structure, and is not limited to “attalylate”, but epoxy resin is a raw material, and “attalylate” is a representative example. Therefore, it is named like this according to common usage.
  • the epoxy resin used as a raw material is, for example, bisphenol type epoxy resin (for example, “Epicoat 828”, “Epicoat 1001”, “Epicoat 1002”, “Epicoat 1004” manufactured by Yuka Shell Epoxy Co., Ltd.) , Epoxy resin obtained by reaction of alcoholic hydroxyl group of bisphenol A type epoxy resin with epichlorohydrin (for example “NE R-1302J (epoxy equivalent 323, softening point 76 ° C made by Nippon Kayaku Co., Ltd.) )), Bisphenol F type resin (for example, “Epicoat 807”, “EP—4001,” “EP—4002,” “EP 4004, etc.” manufactured by Yuka Shell Epoxy Co., Ltd.), Bisphenol F type epoxy resin Epoxy resin obtained by the reaction of alcoholic hydroxyl group and epichlorohydrin (eg “NER-7406” manufactured by Nippon Kayaku Co., Ltd.) (Epoxy equivalent 350, softening point 66 ° C
  • the epoxy resin is a copolymerized epoxy resin.
  • the copolymerized epoxy resin include glycidyl (meth) acrylate, (meth) attalyloylmethyl cyclohexene oxide, burcyclohexene oxide and the like (hereinafter referred to as “the first component of copolymerized epoxy resin).
  • second component of copolymer epoxy resin for example, methyl (meth) atari , Ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl (meth) acrylate, (meth) acrylic acid, styrene, phenoxychetyl (meth) acrylate , Benzyl (meth) acrylate, a -methylstyrene, glycerol mono (meth) acrylate, and one or more compounds selected by the compound represented by the following general formula (1). And copolymers.
  • R 61 represents hydrogen or an ethyl group
  • R 62 represents hydrogen or an alkyl group having 1 to 6 carbon atoms
  • r is an integer of 2 to 10.
  • the compound of the general formula (1) includes, for example, polyethylene glycol mono (meta) such as diethylene glycol mono (meth) acrylate, triethylene glycol mono (meth) acrylate, tetraethylene dallicol mono (meth) acrylate. ) Atarylate; Alkoxypolyethylene dallic (meth) acrylate, such as methoxydiethylene glycol mono (meth) acrylate, methoxytriethylene glycol mono (meth) acrylate, methoxytetraethylene glycol mono (meth) acrylate, etc. It is done.
  • polyethylene glycol mono (meta) such as diethylene glycol mono (meth) acrylate, triethylene glycol mono (meth) acrylate, tetraethylene dallicol mono (meth) acrylate.
  • Atarylate Alkoxypolyethylene dallic (meth) acrylate, such as methoxydiethylene glycol mono (meth) acrylate, methoxytriethylene
  • the weight-average molecular weight (Mw) in terms of polyethylene measured by GPC of the copolymerized epoxy resin is preferably about 1000 to 200,000.
  • the amount of the first component of the copolymerized epoxy resin used is preferably 10% by weight or more, particularly preferably 20% by weight or more, preferably with respect to the second component of the copolymerized epoxy resin. Is less than 70% by weight, particularly preferably less than 50% by weight.
  • copolymer type epoxy resins include “CP-15”, “CP-30”, “CP-50”, “CP-20SA”, “CP” manufactured by Nippon Oil & Fats Co., Ltd. — 510SA ”,“ CP-50S ”,“ CP-50M ”,“ CP-20MA ”and the like.
  • the molecular weight of the raw material epoxy resin is usually in the range of 200 to 200,000, preferably 300 to 100,000 as the weight average molecular weight in terms of polystyrene measured by GPC. On the contrary, if the weight average molecular weight is less than the above range, a problem may occur in the film forming property. In the case of a resin having a viscosity exceeding 50%, gelling is likely to occur during the addition reaction of ⁇ and ⁇ unsaturated monocarboxylic acids, and the production may be difficult.
  • Examples of the a, ⁇ -unsaturated monocarboxylic acid include itaconic acid, crotonic acid, cinnamic acid, acrylic acid, methacrylic acid, and the like, preferably acrylic acid and methacrylic acid, and particularly attalic acid is reacted. It is preferred because of its rich nature.
  • the ⁇ , j8-unsaturated monocarboxylic acid ester having a carboxyl group in the ester moiety includes 2-succinoyloxychetyl acrylate, 2-maleyloxychityl acrylate, 2-phthaloyl acrylate.
  • Examples include 2-methylhexallylmethacrylate 2-hexahydrophthaloyloxetyl, crotonic acid 2-succinoyloxyethyl, etc., preferably 2-acryloylethyl acrylate and 2-phthaloyl acrylate. It is chichetil, particularly 2-maleyloxychhetyl acrylate. These may be used alone or in combination of two or more.
  • the addition reaction of a, j8-unsaturated monocarboxylic acid or its ester and epoxy resin can be carried out using a known method, for example, at a temperature of 50 to 150 ° C in the presence of an esterification catalyst. It can implement by making it react.
  • an esterification catalyst tertiary amine such as triethylamine, trimethylamine, benzyldimethylamine, benzyljetylamine, etc .; tetramethylammonium chloride, tetraethylammonium chloride, dodecyltrimethylammonium chloride, etc.
  • Grade ammonium salt can be used.
  • the amount of the a, ⁇ -unsaturated monocarboxylic acid or ester thereof used is preferably in the range of 0.5 to 1.2 equivalents, more preferably 0.7 to 1 equivalent of epoxy group of the raw material epoxy resin. -1.1 equivalent range. If the amount of a, j8-unsaturated monocarboxylic acid or its ester is small, the amount of unsaturated group introduced is insufficient, and the subsequent reaction with polybasic acid anhydride is also insufficient. Also, it is not advantageous that a large amount of epoxy groups remain. On the other hand, if the amount used is large, ⁇ , ⁇ unsaturated monocarboxylic acid or ester thereof remains as an unreacted product. Exist. In the case of V deviation, the curing characteristics tend to deteriorate.
  • Polybasic acid anhydrides to be further added to epoxy resin attached with a, j8-unsaturated carboxylic acid or ester thereof include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride , Tetrahydrophthalic anhydride, hexahydrophthalic anhydride, pyromellitic anhydride, trimellitic anhydride, benzophenone tetracarboxylic dianhydride, methyl hexahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, chlorend Acid, methyltetrahydrophthalic anhydride, biphenyltetracarboxylic dianhydride, etc., preferably maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydrous Oxahydrophthalic acid, pyromellitic anhydride, trimelli
  • a known method can also be used for the addition reaction of polybasic acid anhydride, and the reaction is continued under the same conditions as the addition reaction of ⁇ , ⁇ -unsaturated carboxylic acid or ester thereof. be able to.
  • the addition amount of the polybasic acid anhydride is preferably an amount such that the acid value of the resulting epoxy attalylate resin is in the range of 10 to 15 Omg-KOHZg, and more preferably in the range of 20 to 140 mg-KOHZg. If the acid value of the resin is too small, the alkali developability is poor, and if the acid value of the resin is too large, the curing performance tends to be inferior.
  • epoxy acrylate resins having a carboxyl group include naphthalene-containing resins described in JP-A-6-49174; JP-A 2003-89716, JP-A 2003-165830, JP-A 2005-325331.
  • fluorene-containing coagulants described in JP-A No. 2001-354735; JP-A 2005-126674, JP-A 2005-55814, JP-A 2004-295084, and the like.
  • epoxy acrylate resins having a carboxyl group can be used, and examples of commercially available products include “ACA-200M” manufactured by Daicel Corporation.
  • the ratio of the binder resin to the total solid content in the light-shielding resin composition of the present invention is usually 1% by weight or more, preferably 5% by weight or more, more preferably 10% by weight or more. Usually, it is 50% by weight or less, preferably 40% by weight or less, more preferably 30% by weight or less. If the ratio of the noda resin is too small, the image formation becomes unstable and the shape is not controlled, and the durability to chemicals may be deteriorated. If the amount is too large, the light shielding property cannot be improved.
  • the monomer used in the light-shielding resin composition of the present invention is not particularly limited as long as it is a photopolymerizable and contains a polymerizable low molecular weight compound, but is a polyfunctional monomer having a functional group.
  • a compound capable of addition polymerization hereinafter referred to as “ethylenic compound” having at least one ethylenic double bond is more preferable.
  • the monomer may have an acid group.
  • the ethylenic compound is an ethylenic compound that undergoes addition polymerization and cures by the action of a photopolymerization initiator described later when the light-shielding resin composition of the present invention is irradiated with actinic rays. It is a compound having a double bond.
  • the “monomer” in the present invention means a concept opposite to a so-called high molecular substance, and in addition to “monomer” in a narrow sense, “dimer”, “trimer”, “oligomer”. ”Means a concept including“
  • Examples of the ethylenic compound having an acid group include unsaturated carboxylic acid, ester of unsaturated carboxylic acid and monohydroxy compound, aliphatic polyhydroxy compound and unsaturated force rubonic acid. Esters, aromatic polyhydroxy compounds and unsaturated carboxylic acids, unsaturated carboxylic acids and polyvalent carboxylic acids, and the aforementioned aliphatic polyhydroxy compounds, aromatic polyhydroxy compounds, etc.
  • Examples of the unsaturated carboxylic acid include (meth) acrylic acid, itaconic acid, ilotonic acid, maleic acid and the like.
  • ester of an aliphatic polyhydroxyl compound and an unsaturated carboxylic acid examples include ethylene diol diatalate, triethylene glycol diatalate, trimethylol propane tri Atalylate, trimethylolethane tritalylate, pentaerythritol diatalylate, pentaerythritol triatalylate, pentaerythritol tetratalariate, dipentaerythritol tetratalylate, dipentaerythritol pentaatalylate, dipentaerythritol hexatalylate, glycerol Acrylate esters such as acrylate.
  • acrylic acid part of these acrylates was replaced with a methacrylic acid ester substituted for the methacrylic acid part, an itaconic acid ester substituted for the itaconic acid part, a crotonic acid ester substituted for the crotonic acid part, or a maleic acid part.
  • Maleic acid esters are listed.
  • ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid examples include: Hyde mouth quinone diatalylate, Hyde mouth quinone dimetatalylate, Resorcin ditalarate, Resorcin dimetatalylate, Pyrogallol tritalylate Etc.
  • the ester obtained by the esterification reaction of an unsaturated carboxylic acid with a polyvalent carboxylic acid and a polyvalent hydroxy compound may not necessarily be a single substance but a mixture.
  • Typical examples are condensates of acrylic acid, phthalic acid and ethylene glycol, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and penterythritol, acrylic acid, adipic acid, butanediol.
  • glycerin condensates are condensates of acrylic acid, phthalic acid and ethylene glycol, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and penterythritol, acrylic acid, adipic acid, butanediol.
  • glycerin condensates are condensates of acrylic acid, phthalic acid and ethylene glycol
  • Examples of the ethylenic compound having a urethane skeleton obtained by reacting a polyisocyanate compound with a (meth) atallyloyl group-containing hydroxy compound include hexamethylene diisocyanate, trimethylhexamethyate.
  • Aliphatic diisocyanates such as diisocyanate; cycloaliphatic diisocyanates such as cyclohexane diisocyanate, isophorone diisocyanate; aromatic diisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, etc.
  • ethylenic compound used in the present invention include acrylamides such as ethylene bisacrylamide; allylic esters such as diallyl phthalate; Bulle group-containing compounds such as are also useful.
  • the monomer is a polyfunctional monomer and may have an acid group such as a carboxyl group, a sulfonic acid group, or a phosphoric acid group. Therefore, if the ethylenic compound has an unreacted carboxyl group as in the case of a mixture as described above, the above-described ethylenic property is required in order to be able to use this as it is. It is also possible to introduce an acid group by reacting the hydroxyl group of the compound with a non-aromatic carboxylic anhydride.
  • non-aromatic carboxylic acid anhydride examples include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, alkylated hexahydrophthalic anhydride, and succinic anhydride.
  • examples include acid and maleic anhydride.
  • the monomer having an acid value is an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and an unreacted hydroxy group of the aliphatic polyhydroxy compound.
  • a polyfunctional monomer having an acid group by reacting a non-aromatic carboxylic acid anhydride with a sil group is particularly preferred.
  • the aliphatic polyhydroxy compound is pentaerythritol and z or Dipentaerythritol.
  • epoxy acrylate resins described in the epoxy acrylate those having a carboxyl group can also be used as monomers.
  • These monomers may be used alone, but since it is difficult to use a single compound for production, two or more of them may be used in combination. If necessary, a polyfunctional monomer having no acid group and a polyfunctional monomer having an acid group may be used in combination.
  • a preferable acid value of the polyfunctional monomer having an acid group is 0.1 to 40 mg-KOHZg, and particularly preferably 5 to 30 mg-KOHZg. If the acid value of the polyfunctional monomer is too low, the development and dissolution characteristics may be lowered, and if it is too high, the production and handling will be difficult, and the photopolymerization performance will be degraded, and the curability such as the surface smoothness of the pixels will be inferior. Tend . Therefore, when two or more polyfunctional monomers having different acid groups are used in combination, or when a polyfunctional monomer having no acid group is used in combination, the acid groups as the entire polyfunctional monomer are within the above range. It is important to adjust.
  • a more preferred polyfunctional monomer having an acid group is T manufactured by Toagosei Co., Ltd. It is a mixture of dipentaerythritol hexatalylate, dipentaerythritol pentaatarylate, and dipentaerythritol pentaatalylate, which is commercially available as 01382, based on succinic acid ester.
  • This polyfunctional monomer can also be used in combination with other polyfunctional monomers.
  • the blending ratio of these polyfunctional monomers is usually 1 to 80% by weight, preferably 5 to 70% by weight, based on the total solid content of the light-shielding resin composition of the present invention.
  • the ratio to the material is 5 to 200% by weight, preferably 10 to: LOO% by weight, more preferably 15 to 80% by weight.
  • the blending ratio of the polyfunctional monomer is appropriately adjusted according to the type of color material containing carbon black in the light-shielding resin composition and the acid value of the polyfunctional monomer used.
  • a monofunctional monomer may be used instead of a part of the above-described polyfunctional monomer.
  • examples of the monofunctional monomer include those described in JP-A-7-325400.
  • the photopolymerization initiator contained in the light-shielding resin composition of the present invention is usually a mixture (photopolymerization initiator composition) of an accelerator and an additive such as a sensitizing dye added as necessary. Can be used.
  • the photopolymerization initiator is a component having a function of generating a polymerization active radical by directly absorbing light or being photosensitized to cause a decomposition reaction or a hydrogen abstraction reaction.
  • Examples of the photopolymerization initiator include meta-octane compounds containing titanocene compounds described in JP-A-59-152396 and JP-A-61-151197, 39 Hexalylbiimidazole derivatives, halomethyl-s-triazine derivatives, N-phenylglycine, etc. N-aryl-a-amino acids, N-aryl-a-amino acid salts, N-aryl-a-amino acid esters And oxime ester initiators described in JP-A 2000-80068, JP-A 2006-36750, and the like.
  • Benzoin alkyl ethers such as benzoin methyl ether, benzoin phenol ether, benzoin isobutyl ether, and benzoin isopropyl ether;
  • Anthraquinone derivatives such as 2-methylanthraquinone, 2-ethyl anthraquinone, 2-t butyl anthraquinone, and 1-mouth anthraquinone;
  • Benzophenones such as benzophenone, Michler's ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methenolebenzophenone, 2-clobenbenzophenone, 4-bromobenzophenone, 2 Derivatives;
  • Thioxanthone derivatives such as thixanthone, 2 ethylthioxanthone, 2 isopropyl thixanthone, 2 chlorothioxanthone, 2,4 dimethylthioxanthone, 2,4 jetylthioxanthone, 2,4 diisopropylthioxanthone;
  • Benzo such as ⁇ dimethylamino benzoate, ⁇ ethylamino benzoate Acid ester derivatives
  • Anthrone derivatives such as benzanthrone
  • Dicyclopentadiene Ti-dimonochloride dicyclopentadiene Ti—bis-monophenyl, di-cyclopentagenyl Ti-bis-1, 2, 4, 4, 5, 6 pentafluorophenyl 1 —Yl, dicyclopentagenyl Ti—bis-1,2,3,5,6-tetrafluorophenyl 1—yl, dicyclopentadienyl Ti—bis1,2,4,6 Trifluoropheny 1 —Yel, Dicyclopentadienyl Ti— 2, 6—Jepur Orofeny — 1—Yel, Dicyclopentagenyl Ti—2, 4 Difluorofluorophenyl 1—Yel, G Methylcyclopentadiene Ti-Bis 2, 3, 4, 5, 6 Pentafluorophenyl 1 yl, Dimethylcyclopentadiene Ti-Bis 2, 6 Difluorophenyl 1-inore, Dicyclopentageninore Ti 2, 6 Jif No
  • oxime ester-based compound compounds exemplified below are particularly preferably used.
  • an oxime ester type compound is especially preferable.
  • the accelerator constituting the photopolymerization initiator composition include N, N dialkylaminobenzoic acid alkyl esters such as N, N dimethylaminobenzoic acid ethyl ester, 2 mercaptobenzozothiazole, 2-mercaptobenzoxazole.
  • Mercapto compounds having a heterocyclic ring such as 2-mercaptobenzoimidazole or aliphatic polyfunctional mercapto compounds are used.
  • photopolymerization initiators and accelerators may be used singly or in combination of two or more.
  • the blending ratio of the photopolymerization initiator composition is usually 0.1 to 40% by weight, preferably 0.5 to 30% by weight in the total solid content in the light-shielding resin composition of the present invention. It is. If the blending ratio is extremely low, the sensitivity to the exposure light may be reduced. Conversely, if the blending ratio is extremely high, the solubility of the unexposed portion in the developing solution is lowered, and development failure may be induced.
  • a sensitizing dye corresponding to the wavelength of the image exposure light source can be added to the photopolymerization initiator composition for the purpose of increasing the sensitivity.
  • these sensitizing dyes include xanthene dyes described in JP-A-4 221958 and JP-A-4-219756, and coumarin dyes having a heterocyclic ring described in JP-A-3-239703 and JP-A-5-289335.
  • sensitizing dyes preferred are amino group-containing sensitizing dyes, and more preferred are compounds having an amino group and a phenyl group in the same molecule. Particularly preferred are, for example, 4, 4'-dimethylaminobenzophenone, 4,4'-jetilaminobenzofoenone, 2aminobenzofenone, 4-aminominobenzofoenone, 4,4'-aminoaminobenzofenone, 3,3'-diaminobe.
  • Benzophenone compounds such as nzophenone and 3, 4-diaminobenzophenone; 2- (p dimethylaminophenol) benzoxazole, 2- (p dimethylaminophenol) benzoxazole, 2- (p Dimethylaminophenol) benzo [4,5] benzoxazole, 2- (p dimethylaminophenol) benzo [6,7] benzoxazole, 2,5 bis (p jetylaminophenol) 1, 3, 4-Oxazole, 2- (p-dimethylaminophenol) benzothiazole, 2- (p-demethylaminophenol) benzothiazole, 2- (p dimethylaminophenol) ) Imidazole, 2- ( ⁇ jetylaminophenol) benzimidazole, 2,5 bis (p-jetylaminophenol) 1,3,4-thiadiazole, (p dimethylaminophenol) pyridine, ( (p dimethylaminophenol) pyridine, (p dimethylaminophenol) quinoline, (p di
  • the blending ratio of the sensitizing dye in the light-shielding resin composition of the present invention is usually 0 to 20% by weight, preferably 0 to 15% by weight, based on the total solid content in the light-shielding resin composition. More preferably 0
  • the light-shielding resin composition of the present invention contains carbon black having an average particle diameter of 8 nm or more and 65 nm or less and a DBP oil absorption of 90 mlZ100 g or less as an essential component.
  • the OD value (Optical Density: optical density) is 3.0 to 5.0, in addition to high developability, resolution and adhesion.
  • a color filter with high contrast can be provided.
  • carbon black having a DBP oil absorption of 90 mlZlOOg or less and a relatively small oil absorption the developability, resolution and adhesion can be further improved.
  • the lower limit of the average particle diameter of carbon black is preferably 17 nm, more preferably 21 nm, and the upper limit is preferably 40 nm, more preferably 32 nm or less. If the average particle size of carbon black is too large, the OD value will be low and thin film will be difficult, and if it is too small, it will be difficult to ensure dispersion stability.
  • the average particle size of carbon black in the present invention means the number average particle size.
  • the average particle diameter of carbon black is taken by several fields of view of photographs taken at tens of thousands of times by electron microscope observation, and particle image analysis is performed by measuring about 2000 to 3000 particles of these photographs with an image processing device. Desired.
  • the carbon black used in the present invention has a DBP oil absorption of usually 90 mlZlOOg or less, preferably 75 ml / 100 g or less, and usually 40 mlZl00g or more, preferably 50 ml / lOOg or more.
  • examples of the inorganic compound containing potassium element used for the production of carbon black include inorganic salts such as hydroxide, chloride, sulfate, carbonate, and organic acid salts including fatty acids. And organometallic compounds such as metal alkyls. Of these, potassium hydroxide and potassium salt are particularly preferably used. These inorganic compounds containing potassium element may be used singly or in combination of two or more.
  • These inorganic compounds containing potassium element are added in such an amount that the concentration of cadmium element in the atmosphere in the carbon black production process is usually 100 to 5000 ppm, more preferably ⁇ 100 to 3000 ppm. It is good to manufacture.
  • the pH of the surface of the carbon black used in the present invention is 5 or less, particularly 4 or less. And are preferred. When the pH of the surface of the carbon black exceeds 5, it is difficult for the dispersant to adhere to the surface, so that the dispersibility may be insufficient. The lower the pH of the carbon black surface, the better, but the lower limit is usually 2 or more.
  • the pH of the surface of carbon black is measured by dispersing carbon black powder in water and measuring the aqueous pH of the dispersion.
  • Examples of the carbon black used in the present invention include the following carbon black.
  • Colombian Carbon Corporation RAVEN11, RAVEN14, RAVEN15, RAVEN16, RAVEN22RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN760, RAVEN 780RAVEN850, RAVE N890H, RAVEN1000, RAVEN1020, RAVEN1060U, RAVEN1080U, R AVEN 11 OOURAVEN 1040, RAVEN1060U, RAVEN1080U, RAVEN117 0, VEN1080U, RAVEN117 0 , RAVEN2000, RAVEN2 500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVE N7000
  • the ratio of the carbon black to the total solid content in the light-shielding resin composition of the present invention is usually 1 to 90% by weight, preferably 5 to 80% by weight, more preferably 10 to 70% by weight, particularly preferably. Is 40 to 70% by weight. If the carbon black content is too small, the coloring power will be low, the film thickness will be too thick for the color density, and this will adversely affect the gap control during liquid crystal cell. On the other hand, if the content of carbon black is too large, the dispersion stability deteriorates and there is a risk of problems such as re-aggregation and thickening.
  • the light-shielding resin composition of the present invention may contain other colorant components to the extent that the effects of the present invention are not impaired in addition to the carbon black.
  • pigments are preferred from the viewpoint of heat resistance, light resistance, and the like.
  • the pigment is preferably used dispersed in an average particle size of 0.5 / z m or less, preferably 0.1 ⁇ m or less.
  • a black pigment may be used by mixing a color material such as red, green, or blue, which may be used alone. These pigments can be appropriately selected from inorganic or organic pigments.
  • black pigments examples include acetylene black, lamp black, bone black, graphite, iron black (acid-iron iron black pigment), alin black, cyanine black, and titanium black. It is done.
  • titanium black can be obtained by heating and reducing a mixture of titanium dioxide and metallic titanium in a reducing atmosphere (Japanese Patent Laid-Open No. 49-5432), and by high-temperature hydrolysis of tetrasalt titanium.
  • a reducing atmosphere containing hydrogen JP-A-57-205322
  • high-temperature reduction of titanium dioxide or titanium hydroxide in the presence of ammonia JP-A-60-65069, JP-A-61-201610
  • Examples thereof include a method in which a vanadium compound is attached to titanium dioxide dihydrate or titanium hydroxide hydroxide and reduced at high temperature in the presence of ammonia (Japanese Patent Laid-Open No. 61-201610). It ’s not limited to these! /
  • titanium black examples include Titanium Black 10S, 12S 13R 13M 13M-C, etc., manufactured by Mitsubishi Materials Corporation.
  • organic pigments of three colors, red, green, and blue can be mixed and used as black pigments.
  • Barium sulfate, lead sulfate, titanium oxide, yellow lead, red iron, chromium oxide, etc. can be used. Tochidaru.
  • Color materials that can be mixed to prepare a black pigment include Victoria Pure Blue (42595), Auramin 0 (41000), Catillon Brilliant Flavin (Basic 13), Rhodamine 6GCP (45160), Rhodamine B (45170), Safranin OK70: 100 (50240), Ellioglaucin X (42080), No.
  • pigments that can be used in combination are represented by CI numbers.
  • CI means the color index (CI).
  • Blue pigments include C. I. Pigment Benore 1, 1: 2, 9, 14, 15, 15: 1, 15: 2, 15:
  • C.I. pigment blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, and more preferably C.I. pigment blue 15: 6 can be mentioned.
  • green pigments examples include CI Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 1 8, 19, 26, 36, 45, 48, 50, 51, 54, You can raise 55 and have the power S.
  • CI pigment green 7 and 36 are preferable.
  • CI pigment yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185 is preferable, and CI pigment yellow 83, 138, 139, 150, 180 is more preferable. Force S is possible.
  • CI pigment range 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79 Among these, C.I. Pigment Orange 38 and 71 are preferable.
  • Purple pigments include CI pigment violet 1, 1: 1, 2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50.
  • C.I. pigment violet 19, 23 is preferable, and C.I. pigment violet 23 is more preferable.
  • dyes that can be used as colorants include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinonimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes. Etc.
  • Examples of azo dyes include CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Benolet 29, CI Direct Red 28, CI Direct Red 83, CI Direct Yellow 12 , CI direct orange 26, CI direct green 28, CI direct green 59, CI reac Tib Yellow 2, CI Reactive Red 17, CI Reactive Red 120, CI Reactive Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Disperse Blue 165, CI Basic Blue 41, CI Basic Red 18, CI Mordant Red 7, CI Mordant Yellow 5, CI Mordant Black 7 and the like.
  • anthraquinone dyes include CI Bat Blue 4, CI Acid Blue 40, CI Acid Green 25, CI Reactive Blue 19, CI Reactive Blue 49, CI Disperse Red 60, CI Disperse Blue 56 CI Days Purse Blue 60 etc.
  • phthalocyanine dyes for example, CI pad blue 5 isotropic quinone imine dyes, for example, CI basic blue 3, CI basic blue 9, etc.
  • quinoline dyes for example, CI solvent yellow 33 CI Acid Yellow 3
  • CI Disperse Yellow 64 Isotropic Nitro dyes include, for example, CI Acid Yellow 1, CI Acid Orange 3, CI Disperse Yellow 42, and the like.
  • the ratio of the other coloring material to the total solid content in the light-shielding rosin composition of the present invention is usually 0 to 8% by weight, preferably 0 to 4% by weight, more preferably 0 to 2% by weight. It is. If the content of the coloring material is too large, the dispersion stability deteriorates and there is a risk of problems such as reaggregation and thickening.
  • the light-shielding resin composition of the present invention since it is important for quality stability to finely disperse a pigment such as carbon black and stabilize the dispersion state, it is desirable to add a dispersant.
  • Examples of the dispersant include surfactants such as non-one, cation, and ar-on, and polymer dispersants.
  • polymer dispersants are particularly preferred, especially the first and second grades.
  • a polymer dispersant having a basic functional group such as a tertiary amino group, nitrogen-containing heterocycle such as pyridine, pyrimidine, pyrazine, etc. (in the present invention, a high molecular weight dispersant having such a basic functional group).
  • the molecular dispersant is referred to as “basic polymer dispersant.”) Is advantageously used.
  • Basic polymer dispersants include urethane-based dispersants, polyethyleneimine-based dispersants, Examples include urethane-based dispersants and acrylic dispersants.
  • Urethane-based dispersants are preferred, for example, polyisocyanate compounds and compounds having one or two hydroxyl groups in the same molecule.
  • Examples of the above polyisocyanate compounds include para-phenolic diisocyanate, 2,4 tolylene diisocyanate, 2,6 tolylene diisocyanate, 4, 4 ' Aromatic diisocyanates such as rumethane diisocyanate, naphthalene 1,5 diisocyanate, tolidine diisocyanate, hexamethylene diisocyanate, lysine methyl ester diisocyanate, 2, 4, 4 trimethylhexamethylene diisocyanate , Aliphatic diisocyanates such as dimer acid diisocyanate, isophorone diisocyanate, 4, 4'-methylenebis (cyclohexyl isocyanate), ⁇ , ⁇ '— diisocyanate dimethylcyclohexane, etc.
  • Aromatic diisocyanates such as rumethane diisocyanate, naphthalene 1,5 diisocyanate, tolidine diisocyanate, hexamethylene diiso
  • Xylylene diisocyanate a, a, a ', a'-tetramethylxylylene diiso
  • Aliphatic diisocyanates having an aromatic ring such as cyanate, lysine ester triisocyanate, 1,6,11-undecane triisocyanate, 1,8-diisocyanate 1-4-isocyanate methyloctane, 1, 3 , 6
  • Triisocyanates such as hexamethylene triisocyanate, bicycloheptane triisocyanate, tris (isocyanate phenol), tris (isocyanate phenol) thiophosphate, and trimers thereof , Water adducts, and these polyol adducts.
  • polyisocyanate are trimers of organic diisocyanate, and most preferred are trimer of tolylene diisocyanate and trimer of isophorone diisocyanate. These polyisocyanate compounds may be used alone or in combination of two or more.
  • the polyisocyanate trimer is produced by using a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, carboxylates and the like. After partial trimerization of the isocyanate group of cyanate was stopped and the trimer was stopped by adding catalyst poison, unreacted polyisocyanate was removed by solvent extraction and thin-film distillation. And a method for obtaining the desired isocyanurate group-containing polyisocyanate.
  • a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, carboxylates and the like.
  • the compound having one or two hydroxyl groups in the same molecule includes polyether glycol Lupoli, Poplarie Este Lug Grilicor, Lunar, Polypoli Carbobonate Toglylico Corle, Poplario Olef Fining Grilicor, etc.
  • the hydroxyl group at the terminal end of the chemical compound of these is an aralkoxyl group having 11 to 2255 carbon atoms and having been aralkoxylated. However, and more and more than 22 types of mixed compounds are listed. .
  • poplarie ether rugidiool it can be obtained by alone or co-polymerizing aralkylkilenlenoxydoxide alone.
  • poplarie ethylylene glycocorol poplar lip propyripe licoric corn poplar Alligatorium
  • poplario oxytite tetra la methicilleren gurico korul poplario oxychet hexanthame melylen licorice
  • Poplario oxysio A mixture of more than 22 of these and more can be enumerated. .
  • polyether glycol is polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol or a compound in which one hydroxyl group of these compounds is alkoxylated with an alkyl group having 1 to 25 carbon atoms. It is a compound.
  • Polyester glycols include dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or their anhydrides and glycols (ethylene glycolole, diethylene glycol, triethylene glycol).
  • 2-ethyl-1,3-propanediol 1,5-pentanediol, 1,6-hexanediol, 2-methyl-2,4-pentanediol, 2,2,4 trimethyl-1,3-pentanediol, 2-ethyl-1,3-hexane Diol, 2,5 Dimethyl-2,5 Hexanediol, 1,8 otatamethylene glycol, 2-methyl-1,8 otatamethylene
  • aliphatic glycols such as 1,9-nonanediol, alicyclic glycols such as bishydroxymethylcyclohexane, aromatic glycols such as xylylene glycol and bishydroxyethoxybenzene, N- such as N-methyljetanolamine Alkyl dialkanolamine, etc.), such as polyethylene adipate, polyethylene adipate, polyhexamethylene adipate, polyethylene Z-propylene adipate, etc.
  • Polycarbonate glycol includes poly (1,6-hexylene) carbonate, poly (3-methyl-1,5-pentylene) carbonate, etc.
  • Polyolefin glycol includes polybutadiene glycol, hydrogenated polybutadiene glycol, and hydrogenated polyisoprene glycol Etc.
  • the number average molecular weight of the compound having one or two hydroxyl groups in the same molecule is usually 300 to 10,000, preferably 500 to 6,000, and more preferably 1,000 to 4,000.
  • an active hydrogen that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a nitrogen atom includes a hydroxyl group, an amino group.
  • a hydrogen atom in a functional group such as a thiol group or a thiol group, among which a hydrogen atom of an amino group, particularly a primary amino group is preferred.
  • the tertiary amino group is not particularly limited.
  • the tertiary amino group includes an amino group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, and more specifically, an imidazole ring or a triazole ring.
  • Examples of compounds having an active hydrogen and a tertiary amino group in the same molecule are N, N-dimethyl-1,3 propanediamine, N, N jetyl-1,3 propanediamine, N, N dipropinoleyl 1,3 propanediamine N, N Dibutinoleol 1,3 Propanediamine, N, N Dimethylethylenediamine, N, N Jetylethylenediamine, N, N Dipropylethylenediamine, N, N-Dibutylethylenediamine, N, N Dimethyl-1,4 butanediamine, N, N Jetinore 1,4 butanediamin, N, N Dipropinore 1,4-butanediamine, N, N-dibutyl-1,4-butanediamine and the like.
  • tertiary amino group is an N-containing heterocycle, a pyrazole ring, an imidazole ring
  • Triazole ring Triazole ring, tetrazole ring, indole ring, force rubazole ring, indazole ring, benzimidazole ring, benzotriazole ring, benzoxazole ring, benzothiazol ring, benzothiadiazole ring, etc.
  • N-containing hetero ring pyridine Ring, pyridazine ring
  • N-containing hetero 6-membered ring such as pyrimidine ring, triazine ring, quinoline ring, atalidine ring, isoquinoline ring, and the like.
  • Preferred as these N-containing heterocycles are an imidazole ring or a triazole ring.
  • Examples include 3-aminopropyl) imidazole, histidine, 2-aminoimidazole, and 1- (2-aminoethyl) imidazole. Further, specific examples of a compound having a triazole ring and an amino group include 3-amino-1, 2, 4-triazole, 5- (2-amino-1,5).
  • N, N-dimethyl-1,3-propanediol, N, N-jetyl-1,3-propanediamine, 1- (3-aminopropyl) imidazole, 3-amino-1,2,4-triazole is preferred.
  • a preferable blending ratio of the dispersant raw material is a compound having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule with respect to 100 parts by weight of the polyisocyanate compound. ⁇ 200 parts by weight, preferably 20 to 190 parts by weight, more preferably 30 to 180 parts by weight, and the compound having active hydrogen and tertiary amino group in the same molecule is 0.2 to 25 parts by weight, preferably 0. 3 to 24 parts by weight.
  • the reaction is carried out according to a known method of producing polyurethane resin.
  • Solvents used for the reaction are usually ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, and isophorone, and esters such as ethyl acetate, butyl acetate, and cetosolve acetate.
  • Hydrocarbons such as benzene, toluene, xylene, hexane, Diacetone alcohol, isopropanol, sec-butanol, tert-butanol and other alcohols having a relatively high molecular weight substituent around the hydroxyl group, such as alcohols other than primary alcohol, methylene chloride, black mouth form, etc.
  • ethers such as chloride, tetrahydrofuran, jetyl ether and the like, and aprotic polar solvents such as dimethylformamide, N-methylpyrrolidone and dimethylsulfoxide are used.
  • a urethanization reaction catalyst is usually used.
  • the urethanization reaction catalyst used include tin-based compounds such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin diformateate, stanasoctoate, iron acetylethylacetonate, and ferric chloride.
  • tin-based compounds such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin diformateate, stanasoctoate, iron acetylethylacetonate, and ferric chloride.
  • tertiary amines such as iron, triethylamine and triethylenediamine are listed.
  • the introduction amount of the compound having active hydrogen and tertiary amino group in the same molecule is preferably controlled in the range of 1 to 100 mg-KOHZg in terms of the amine value after the reaction.
  • the amine value is more preferably in the range of 5 to 95 mg-KOH / g.
  • the amine value is a value expressed in mg of KOH corresponding to the acid value after neutralizing titration of a basic amino group with an acid. If the amine value is less than the above range, the dispersing ability tends to be lowered, and if it exceeds the above range, the developability tends to be lowered.
  • the weight average molecular weight of such a basic polymer dispersant is usually 1,000 to 200,000, preferably ⁇ is 2,000 to 100,000, more preferably ⁇ is 3,000 to 50,000. Range. When the weight average molecular weight is less than 1,000, the dispersibility and dispersion stability are poor, and when it exceeds 200,000, the solubility is lowered, and the dispersibility is poor and the reaction is difficult to control.
  • the weight average molecular weight is measured in terms of polystyrene by GPC (gel permeation chromatography).
  • the basic polymer dispersant commercially available ones can also be used.
  • the ratio of these dispersants to the total solid content in the light-shielding resin composition of the present invention is usually 0.05% by weight or more, preferably 0.1% by weight or more, and more preferably 0.5% by weight. %, Usually 10% by weight or less, preferably 6% by weight or less, more preferably 5% by weight or less. If the content of the dispersant is too small, the dispersion stability deteriorates, and problems such as reaggregation and thickening may occur. On the other hand, if the amount is too large, the ratio of the pigment is relatively reduced, so that the coloring power may be lowered or the sensitivity may be lowered in the crosslinking by exposure.
  • the light-shielding resin composition of the present invention may also contain a dispersion aid in addition to the dispersant.
  • Examples of the dispersion aid include pigment derivatives.
  • Examples of the pigment derivative include azo, phthalocyanine, quinacridone, benzimidazolone, quinophthalone, isoindolinone, di-xazine, anthraquinone, indanthrene, perylene, perinone, Examples include derivatives such as diketopyrrolopyrrole and dioxazine pigments.
  • substituents of pigment derivatives sulfonic acid groups, sulfonamide groups and their quaternary salts, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, amide groups, etc. are directly in the pigment skeleton or alkyl groups, aryl groups.
  • pigment derivatives include azo pigment sulfonic acid derivatives, phthalocyanine pigment sulfonic acid derivatives, quinophthalone pigment sulfonic acid derivatives, anthraquinone pigment sulfonic acid derivatives, quinacridone pigment sulfonic acid derivatives, and diketopyrrolopyrrole pigments. Examples thereof include sulfonic acid derivatives and sulfonic acid derivatives of dioxazine pigments.
  • the added amount of the pigment derivative is usually 0.01 to 4% by weight, preferably 0.05 to 3% by weight or less, more preferably 0 to the total solid content of the light-shielding resin composition of the present invention. . 1-2% by weight is there. If the amount of the pigment derivative added is small, dispersion stability deteriorates and problems such as reaggregation and thickening may occur. On the other hand, if the amount is too large, the contribution to dispersion stability is saturated, and on the contrary, the color purity may be lowered.
  • the light-shielding resin composition of the present invention may further contain an organic carboxylic acid and Z or an organic carboxylic acid anhydride.
  • Organic carboxylic acids include aliphatic carboxylic acids and Z or aromatic carboxylic acids.
  • Specific examples of the aliphatic carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, jetyl acetic acid, enanthic acid, strong prillic acid, glycolic acid, acrylic acid, and methacrylic acid.
  • Monocarboxylic acid such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassylic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid
  • dicarboxylic acids such as tetramethylsuccinic acid, cyclohexanedicarboxylic acid, cyclohexenedicarboxylic acid, itaconic acid, citraconic acid, maleic acid, and fumaric acid
  • tricarboxylic acids such as tricarnolic acid, aconitic acid, and camphoric acid.
  • aromatic carboxylic acids include benzoic acid, toluic acid, cumic acid, hemelic acid, mesitylene acid, phthalic acid, phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, and melophane.
  • malonic acid particularly preferred are malonic acid, glutaric acid and glycolic acid, among which monocarboxylic acid and dicarboxylic acid are preferred.
  • the molecular weight of the organic carboxylic acid is usually 1000 or less, and usually 50 or more. If the molecular weight of the organic carboxylic acid is too large, the effect of improving the soiling is insufficient, and if it is too small, the amount added may be reduced due to sublimation or volatilization, or process contamination may occur. [0155] [1 8-2] Organic carboxylic acid anhydride
  • organic carboxylic acid anhydrides include aliphatic carboxylic acid anhydrides and Z or aromatic carboxylic acid anhydrides.
  • Specific examples of aliphatic carboxylic acid anhydrides include acetic anhydride, anhydrous trichlorodiacetic acid, and trifluoroacetic anhydride.
  • aromatic rubonic acid anhydrides include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and naphthalic anhydride.
  • organic carboxylic acid anhydrides maleic anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, and citraconic anhydride are more preferable.
  • the molecular weight of the organic carboxylic acid anhydride is usually 800 or less, preferably 600 or less, more preferably 500 or less, and usually 50 or more. If the molecular weight of the above organic carboxylic acid anhydride is too large, the effect of improving soil stains will be insufficient, and if it is too small, there is a risk of reducing the amount of additives and process contamination due to sublimation and volatilization.
  • organic carboxylic acids and Z or organic carboxylic acid anhydrides may be used singly or as a mixture of two or more.
  • the amount of addition of these organic carboxylic acid and Z or organic carboxylic anhydride is usually 0.01% by weight or more, preferably 0 in the total solid content of the light-shielding resin composition of the present invention. .03% by weight or more, more preferably 0.05% by weight or more, and usually 10% by weight or less, preferably 5% by weight or less, more preferably 3% by weight or less. If the addition amount is too small, a sufficient addition effect cannot be obtained. If the addition amount is too large, surface smoothness and sensitivity may be deteriorated, and undissolved peeling pieces may be generated.
  • the light-shielding rosin composition of the present invention can further contain solids other than the above components as necessary.
  • solids other than the above components include surfactants, thermal polymerization inhibitors, plasticizers, storage stabilizers, surface protective agents, adhesion improvers, development improvers and the like.
  • surfactant As the surfactant, one or more of various types such as ionic, cationic, nonionic, and amphoteric surfactants can be used, but the possibility of adversely affecting various properties is low. Therefore, it is preferable to use a nonionic surfactant.
  • the amount of the surfactant added is generally 0.001 to 10 weight 0/0 of the total solid content of the light-shielding ⁇ composition of the present invention, preferably from 0.005 to 1 weight 0/0 More preferably, the content is 0.01 to 0.5% by weight, and most preferably 0.03 to 0.3% by weight. If the addition amount of the surfactant is less than the above range, the smoothness and uniformity of the coating film cannot be expressed, and if it is more, the smoothness and uniformity of the coating film cannot be expressed, and other characteristics are poor. There is a case to hesitate.
  • thermal polymerization inhibitor for example, one, two or more kinds such as rho, idroquinone, p-methoxyphenol, pyrogallol, catechol, 2,6-t-butyl-p-cresol, ⁇ -naphthol and the like are used.
  • the addition amount of the thermal polymerization inhibitor is preferably in the range of 0 to 3% by weight with respect to the total solid content of the light-shielding resin composition of the present invention.
  • plasticizer examples include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl dallicol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. Two or more types are used.
  • the amount of these plasticizers added is preferably 10% by weight or less based on the total solid content of the light-shielding resin composition of the present invention.
  • a storage stabilizer a surface protective agent, an adhesion improver, a development improver and the like can be added as necessary.
  • the amount of these components added is preferably 20% by weight or less in total with respect to the total solid content of the light-shielding resin composition of the present invention.
  • the light-shielding resin composition of the present invention is generally prepared by dissolving or dispersing the above-described solid content in a solvent.
  • the solvent comprises (i) a binder resin, (ii) a monomer, (C) a photopolymerization initiator, (D) carbon black and the above-mentioned other colorants, dispersants, and Further, it has a function of adjusting viscosity by dissolving or dispersing other components blended as necessary.
  • the solvent it is preferable to select a solvent which can dissolve or disperse each component constituting the composition and has a boiling point in the range of 100 to 200 ° C. More preferably, the solvent has a boiling point of 120 to 170 ° C.
  • solvents examples include the following.
  • Glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol jetyl ether, polyethylene glycol dimethyl ether, diethylene glycol jetyl ether, jetylene glycol dipropyl ether, diethylene glycol dibutyl ether;
  • Mono- or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, glycerin;
  • Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-xane, hexene, isoprene, dipentene, dodecane;
  • Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, bicyclohexyl;
  • Aromatic hydrocarbons such as benzene, toluene, xylene, cumene;
  • Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid
  • Halogenated hydrocarbons such as butyl chloride and milk mouthride
  • Ether ketones such as methoxymethylpentanone
  • Solvents applicable to the above include mineral spirits, Valsol # 2, Apco # 18 Solvent, Apco thinner, Soal Solvent No. 1 and No. 2, Solvesso # 150, Shell TS28 Solvent, Calvi Such as Toll, Ethyl Carbitol, Butyl Carbitol, Methylcele Solv, Ethinorecero Sonoreb, Ethylcele Solvate, Diglyme The commercial item of a brand name is mentioned.
  • the content of the solvent in the light-shielding resin composition of the present invention is not particularly limited. Power is usually 99% by weight or less, usually 50% by weight or more, preferably 55% by weight or more, and more preferably. Is more than 60% by weight. If the proportion of the solvent is too large, the solid content of the binder resin, monomer, carbon black and other coloring materials, and the dispersant is too small to be suitable for forming a light-shielding resin composition. On the other hand, if the proportion of the solvent is too small, the viscosity increases and it is not suitable for coating.
  • the light-shielding rosin composition of the present invention must have a potassium ion content of 20 ppm or less based on the total solid content.
  • the content of potassium ions is preferably 18 ppm or less, more preferably 10 ppm or less, based on the total solid content of the light-shielding resin composition.
  • the lower limit of the potassium ion content of the light-shielding resin composition of the present invention is preferably as small as possible, but is usually 0.1 ppm or more with respect to the total solid content. If there is too much content of force rhodium ion in the light-shielding resin composition, developability, resolution, adhesion, especially linearity and adhesion cannot be sufficiently secured.
  • the amount of water used is preferably 500 mL or more per lOOg of carbon black, more preferably 10 mL or more.
  • the potassium ion content in the light-shielding resin composition is, for example, extracted by adding 30 ml of pure water to 0.2 g (as solid content) of the light-shielding resin composition and extracting in an ultrasonic bath for 30 minutes. Then, it can be measured by ultracentrifugation (50,000 rpm X lhr) and analyzing the supernatant by ion chromatography. [0189] [2] Method for producing light-shielding resin composition
  • the light-shielding resin composition of the present invention is produced, for example, as follows by first dispersing and mixing carbon black, a solvent, and, if necessary, a dispersant and other components to produce a black pigment dispersion.
  • the black pigment dispersion can be produced by adding and mixing a binder resin, a monomer, a photopolymerization initiator, etc., but the method for producing the light-shielding resin composition of the present invention is not limited to this method. It ’s not something.
  • Carbon black, a solvent, and if necessary, a dispersant and other components are weighed in predetermined amounts, and in the dispersion treatment step, carbon black is dispersed to obtain a liquid black pigment dispersion.
  • a paint conditioner paint shaker
  • a sand grinder a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer and the like can be used. Since the colorant containing carbon black is finely divided by this dispersion treatment, the light-shielding resin composition using the black pigment dispersion prepared in this way has improved coating properties, and the product The light shielding ability of the color filter substrate is improved.
  • the binder resin or the dispersion aid may be used in combination as appropriate.
  • the dispersion treatment is performed using a sand grinder, it is preferable to use glass beads having a diameter of 0.1 to 8 mm or zircoyu beads.
  • the temperature during the dispersion treatment is usually set in the range of 0 ° C to 100 ° C, preferably in the range of room temperature to 80 ° C.
  • the appropriate dispersion time depends on the composition of the black pigment dispersion (pigment, solvent, dispersant, etc.), the size of the sand grinder apparatus, and the like, so it is necessary to adjust appropriately.
  • the standard of dispersion is to control the gloss of the black pigment dispersion so that the 20 ° specular gloss in JIS Z8741 is in the range of 100 to 200.
  • the dispersion treatment is not sufficient and rough, and pigment particles often remain, which is insufficient in terms of developability, adhesion, resolution, and the like. Further, when the dispersion treatment is carried out until the gloss value exceeds the above range, a large number of ultrafine particles are produced, so that the dispersion stability tends to be impaired.
  • the black pigment dispersion produced in this way is added with a binder resin when dispersing the pigment as described above, and the binder resin resin of the light-shielding resin composition of the present invention is added.
  • a binder resin when dispersing the pigment as described above
  • the binder resin resin of the light-shielding resin composition of the present invention is added.
  • the amount of the binder resin added is preferably 5 to: LOO wt%, particularly 10 to 80 wt% with respect to the pigment in the black pigment dispersion. If the amount of the binder resin added is too small, the effect of increasing the dispersion stability is insufficient, and if it is too large, the concentration of the colorant such as carbon black is lowered, so that sufficient light shielding properties cannot be obtained.
  • the solid content concentration in the black pigment dispersion is usually about 10 to 20% by weight.
  • concentrations of potassium ions and Z or potassium atoms are usually 10 ppm or less, preferably 95 ppm or less, more preferably 50 ppm or less, based on the total solid content in the black pigment dispersion.
  • total solid content refers to all components of the black pigment dispersion other than the solvent.
  • the light-shielding resin composition of the present invention is obtained by adding and mixing the black pigment dispersion obtained by the above process and other components necessary as components of the light-shielding resin composition into a uniform solution. Prepared.
  • a dispersion treatment with a solution in which all the components to be blended as a light-shielding resin composition are mixed at the same time is not preferable because a highly reactive component may be modified due to heat generated during dispersion.
  • fine dust is often mixed in the liquid during the production process, it is desirable to filter the obtained light-shielding resin composition with a filter or the like.
  • a color filter is usually manufactured by forming a black matrix on a transparent substrate and then sequentially forming pixel images of red, green, and blue colors.
  • the light-shielding resin composition of the present invention is particularly used as a coating liquid for forming a black matrix of a color filter.
  • red, green and blue color resists on transparent substrates.
  • a pixel image of each color is formed by applying, heating, drying, image exposure, developing and thermosetting, respectively.
  • the transparent substrate of the color filter is not particularly limited as long as it is transparent and has an appropriate strength.
  • Materials include, for example, polyester resin such as polyethylene terephthalate, polyolefin resin such as polypropylene and polyethylene, thermoplastic resin sheet such as polycarbonate, polymethyl methacrylate, and polysulfone, epoxy resin, Examples include unsaturated polyester resin, thermosetting resin sheets such as poly (meth) acrylic resin, and various glasses. Among these, glass and heat resistant resin are preferable from the viewpoint of heat resistance.
  • various resin such as corona discharge treatment, ozone treatment, silane coupling agent, and urethane-based resin are used as necessary to improve surface properties such as adhesion.
  • a thin film forming process or the like may be performed.
  • the thickness of the transparent substrate is usually in the range of 0.05 to: LOmm, preferably 0.1 to 7 mm.
  • the film thickness is usually in the range of 0.01 to 10 m, preferably 0.05 to 5 m.
  • the light-shielding resin composition of the present invention is coated on a transparent substrate and dried, and then a photomask is overlaid on the formed coating film, and image exposure is performed through this photomask. Development, heat curing or photocuring as necessary.
  • a colored composition containing a color material of one of red, green, and blue is applied on a transparent substrate provided with a black matrix, dried, and then formed on the formed coating film.
  • a photomask is overlaid, and a pixel image is formed through image exposure, development, and heat curing or photocuring as necessary through this photomask to form a colored layer of the pixel image.
  • a color filter image can be formed by performing this operation for each of the three colored compositions of red, green, and blue.
  • the shading resin composition and the coloring composition can be applied by a spinner method, a wire bar method, a flow coat method, a die coating method, a roll coating method, a spray coating method, or the like.
  • the die coating method significantly reduces the amount of coating solution used and suppresses the generation of foreign substances that are completely free from the effects of mist adhering to the spin coating method. I like it.
  • the thickness of the coating film is usually in the range of 0.2 to 20 111 as the film thickness after drying, more preferably in the range of 0.5 to 10 / ⁇ ⁇ , and more Preference is given to a range of 0.8 to 5 m.
  • Drying of the coating film formed by applying a light-shielding resin composition or coloring composition to a transparent substrate is preferably performed by a drying method using a hot plate, an IR oven, or a competition oven.
  • a drying method using a hot plate, an IR oven, or a competition oven usually, after preliminary drying, two-stage drying is performed by heating again and drying.
  • the conditions for the preliminary drying can be appropriately selected according to the type of the solvent component in the light-shielding resin composition or coloring composition, the performance of the dryer used, and the like.
  • the drying time is usually selected in the range of 40 to 80 ° C and 15 seconds to 5 minutes, preferably 50 to 70 ° C, depending on the type of solvent component and the performance of the dryer used. In the range of 30 seconds to 3 minutes.
  • the temperature condition for the reheating drying is 50 to 200 ° C higher than the predrying temperature, and preferably 70 to 160 ° C, particularly preferably 70 to 130 ° C.
  • the drying time is preferably 10 seconds to 10 minutes, and more preferably 15 seconds to 5 minutes, depending on the heating temperature. The higher the drying temperature, the better the adhesion of the coating film to the transparent substrate. However, if the drying temperature is too high, the binder resin is decomposed, and thermal polymerization may be induced to cause development failure.
  • the coating film may be dried by a reduced pressure drying method in which drying is performed in a reduced pressure chamber without increasing the temperature.
  • a negative matrix pattern is overlaid on the dried coating film of the light-shielding resin composition or coloring composition, and UV or visible light is passed through this mask pattern. Irradiate with a light source. At this time, if necessary, exposure may be performed after forming an oxygen blocking layer such as a polyvinyl alcohol layer on the coating film in order to prevent the sensitivity of the coating film from being lowered by oxygen.
  • an oxygen blocking layer such as a polyvinyl alcohol layer
  • the light source used for image exposure is not particularly limited.
  • a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp examples include lamp light sources such as carbon arc and fluorescent lamps, and laser light sources such as argon ion lasers, YAG lasers, excimer lasers, nitrogen lasers, helium cadmium lasers, and semiconductor lasers.
  • An optical filter can also be used when irradiating light of a specific wavelength.
  • Development can be performed after the image exposure using an organic solvent or an aqueous solution containing a surfactant and an alkaline compound.
  • This aqueous solution may further contain an organic solvent, a buffering agent, a complexing agent, a dye or a pigment.
  • Alkaline compounds include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, metasilicate.
  • Inorganic alkaline compounds such as sodium, sodium phosphate, potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide, — Or triethanolamine, mono'di or trimethylami, mono-di or triethylamine, mono- or diisopropylamine, n-butylamine, mono-di- or triisopropanolamine, ethyleneimine, ethylenedimine, tetramethyl Ammonium hydroxide (TMAH), collagen And organic alkaline I ⁇ of such.
  • TMAH tetramethyl Ammonium hydroxide
  • These alkaline compounds may be used alone or as a mixture of two or more.
  • Examples of the surfactant include non-ionic interfaces such as polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters, and the like.
  • Activators, alkyl benzene sulfonates, alkyl naphthalene sulfonates examples include cationic surfactants such as alkyl sulfates, alkyl sulfonates and sulfosuccinic acid ester salts, and amphoteric surfactants such as alkyl betaines and amino acids. These are used alone. You may mix and use 2 or more types.
  • organic solvent examples include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butylcetosolve, phenylsolvesolve, propylene glycol, diacetone alcohol and the like. These organic solvents may be used alone or in combination of two or more, or one or more may be used in combination with water.
  • the development conditions are not particularly limited. Usually, the development temperature is in the range of 10 to 50 ° C, particularly 15 to 45 ° C, particularly preferably 20 to 40 ° C.
  • the development method is immersion development. , Spray developing method, brush developing method, ultrasonic developing method and the like.
  • the color filter substrate after development is usually subjected to heat curing treatment or light curing treatment, preferably heat curing treatment.
  • thermosetting treatment conditions are selected such that the temperature ranges from 100 to 280 ° C, preferably from 150 to 250 ° C, and the time ranges from 5 to 60 minutes.
  • the pattern image formation for one color is completed. This process is repeated in sequence to pattern (black,) red, green, and blue to form a color filter. Note that the order of the three-color patterning of red, green, and blue is not limited to the order described above.
  • the color filter according to the present invention is used as a part of a component such as a color display or a liquid crystal display device by forming a transparent electrode such as ITO on the image as it is.
  • a top coat layer such as polyamide or polyimide can be provided on the image as necessary.
  • the transparent electrode may not be formed.
  • an alignment film is usually formed on the color filter of the present invention, and after a spacer is dispersed on the alignment film, a liquid crystal cell is formed by bonding to a counter substrate. Then, liquid crystal is injected into the formed liquid crystal cell and connected to the counter electrode.
  • the alignment film a resin film such as polyimide is preferable. Gravure printing and Z or flexographic printing are usually used to form the alignment film, and the thickness of the alignment film is usually several tens of nm.
  • the alignment film is cured by thermal baking, and then surface-treated by treatment with a UV-irradiated rubbing cloth to be processed into a surface state capable of adjusting the tilt of the liquid crystal.
  • spacer a spacer having a size corresponding to a gap (gap) with the counter substrate is used, and a spacer of 2 to 8 m is usually preferable.
  • a transparent resin film photospacer (PS) is formed on the color filter substrate by photolithography, and this is used in place of the spacer.
  • an array substrate is usually used, and a TFT (thin film transistor) substrate is particularly preferable.
  • the gap for bonding to the counter substrate varies depending on the use of the liquid crystal display device, but is usually selected in the range of 2 to 8 m.
  • the portions other than the liquid crystal injection port are sealed with a sealing material such as epoxy resin.
  • the sealing material is cured by ultraviolet (UV) irradiation and Z or heating, and the periphery of the liquid crystal cell is sealed.
  • the liquid crystal cell whose periphery is sealed is cut into panel units, and then the pressure is reduced in the vacuum chamber. After the liquid crystal inlet is immersed in the liquid crystal, the inside of the chamber leaks. Liquid crystal is injected into the liquid crystal cell. Decompression degree in the liquid crystal cell is usually a 1 X 10 _2 ⁇ 1 X 1 0 _7 Pa, preferably 1 X 10 _3 ⁇ 1 X 10 _6 Pa. In addition, it is preferable to heat the liquid crystal cell at the time of depressurization, and the heating temperature is usually 30 to 100 ° C, more preferably 50 to 90 ° C. Heating during decompression is usually in the range of 10 to 60 minutes and then immersed in the liquid crystal. A liquid crystal cell filled with liquid crystal is completed by sealing the liquid crystal inlet with UV-cured resin cured.
  • liquid crystal such as aromatic, aliphatic, and polycyclic compounds.
  • Known liquid crystal is used, and any of lyotropic liquid crystal, thermopick liquid crystal and the like may be used.
  • Nematic liquid crystal, smectic liquid crystal, cholesteric liquid crystal, etc. are known as thermo-mouth pick liquid crystal.
  • Tolylene diisocyanate trimer (Mittech GP750A from Mitsubishi Chemical Co., Ltd., 50% by weight of rosin solids, butyl acetate solution) and 0.02g of dibutyltin dilaurate as a catalyst propylene glycol monomethyl ether acetate (PGMEA) Diluted with 47 g.
  • Carbon black for color (Mitsubishi Chemical “MA-8”, average particle size 24 ⁇ m, DBP oil absorption 58mlZlOOg, surface pH 3.0) lOOg in 2 shafts with ultrapure water 500ml The mixture was kneaded for 20 minutes, and ultrapure water was removed by filtration. Ultrapure water was added again to the filtered carbon black and kneaded, and filtration was repeated 4 times. Finally, the filtered carbon black was dried and washed to obtain a bonbon black. 50 parts by weight of washed carbon black, synthesis example—10 parts by weight of the polymer dispersant prepared in 1 as a solid, and carbon black and polymer dispersed so that the solids concentration is 30% by weight. Agent solution and PGMEA were added. The total weight of the dispersion was 50 g. This was stirred with a stirrer and premixed.
  • Ink 2 was prepared in the same manner as Ink 1 except that the number of washing, kneading and filtration operations with ultrapure water was changed to two. When this ink 2 was subjected to ion chromatographic analysis in the same manner as ink 1, the K + concentration was 45 ppm.
  • Ink 4 was prepared in the same manner as Ink 1 except that the number of washing, kneading and filtration operations with ultrapure water was one. When this ink 4 was subjected to ion chromatographic analysis in the same manner as ink 1, the K + concentration was 90 ppm.
  • Ink 5 was prepared in the same manner as ink 1 except that it was not washed with ultrapure water. This ink 5 was subjected to ion chromatographic analysis in the same manner as ink 1, and the K + concentration was 40 lppm.
  • the average particle size, DBP oil absorption, and surface pH of the carbon black used were the same as those before the cleaning, kneading, and filtration treatment with ultrapure water. .
  • each component was added so as to have the following blending ratio, and stirred and dissolved with a stirrer to prepare a black resist photosensitive solution.
  • Each black resist sensitizing solution prepared in i) was applied to a glass substrate (“7059” manufactured by Cowing Co., Ltd.) with a spin coater and dried on a hot plate at 80 ° C. for 1 minute.
  • the film thickness of the resist after drying was measured with a stylus type film thickness meter (“Hi-Step” manufactured by Tencor) and found to be 1 ⁇ m.
  • this sample was image-exposed through a mask while changing the exposure amount with a high-pressure mercury lamp.
  • a resist pattern was obtained by spray development at a temperature of 25 ° C. using an aqueous sodium carbonate solution having a concentration of 0.8% by weight.
  • the formed resist pattern was evaluated for sensitivity, resolving power, and light shielding property according to the following criteria. The results are shown in Table 1.
  • the appropriate exposure (mjZcm 2 ) that can form a mask pattern with a dimension of 20 ⁇ m is displayed.
  • a resist with a small exposure amount has high sensitivity because an image can be formed with a low exposure amount.
  • the minimum resist pattern size that can be resolved at an exposure that faithfully reproduces a mask pattern with a dimension of 20 ⁇ m was observed with a microscope at a magnification of 200 times.
  • Minimum pattern dimension is 10 m or less: ⁇
  • Minimum pattern dimension exceeds 10 / z m and 15 / z m or less: ⁇
  • the optical density (OD) of the image area is measured with a Macbeth reflection densitometer (Kolmorgun TR927). It was measured.
  • the OD value is a numerical value indicating the light shielding ability. The larger the numerical value, the higher the light shielding property.
  • the light-shielding resin composition of the present invention it is possible to form a black matrix having excellent developability, resolution, adhesion, particularly linearity and adhesion, thereby achieving high quality.
  • a color filter and a liquid crystal display device can be provided.
  • the present invention has very high industrial applicability in the fields of light-shielding resin composition, color filter, and liquid crystal display device.

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Abstract

Disclosed is a light blocking resin composition which enables to form a black matrix excellent in developability, resolution and adhesion, especially in linearity and adhesion. The light blocking resin composition contains a binder resin, a monomer, a photopolymerization initiator and a carbon black having an average particle diameter of not less than 8 nm but not more than 65 nm and a DBP oil absorption of not more than 90 ml/100 g. In addition, this light blocking resin composition contains not more than 20 ppm of potassium ions relative to the total solid content. Also disclosed are a color filter having a pixel formed by using this light blocking resin composition, and a liquid crystal display comprising such a color filter.

Description

明 細 書  Specification
遮光性樹脂組成物、カラーフィルタ、および液晶表示装置  Light-shielding resin composition, color filter, and liquid crystal display device
発明の分野  Field of Invention
[0001] 本発明は、遮光性榭脂組成物、カラーフィルタ、および液晶表示装置に関する。詳 しくは、カラーテレビ、液晶表示装置、固体撮像素子、カメラ等に使用される光学的力 ラーフィルタの製造に適した、直線性、密着性に優れた黒色画素を形成し得る遮光 性榭脂組成物と、この遮光性榭脂組成物を用いたカラーフィルタと、このカラーフィル タを備える液晶表示装置に関する。  [0001] The present invention relates to a light-shielding resin composition, a color filter, and a liquid crystal display device. Specifically, it is a light-shielding oil that can form black pixels with excellent linearity and adhesion, suitable for the production of optical power filters used in color televisions, liquid crystal display devices, solid-state imaging devices, cameras, etc. The present invention relates to a composition, a color filter using the light-shielding resin composition, and a liquid crystal display device including the color filter.
発明の背景  Background of the Invention
[0002] カラーフィルタは、通常、ガラス、プラスチックシート等の透明基板の表面に黒色画 素(以下、「ブラックマトリックス」と称することがある。)を形成し、続いて、赤、緑、青等 の 3種以上の異なる着色画素を順次、ストライプ状あるいはモザイク状等の色パター ンで形成してなるものである。  [0002] Color filters usually form black pixels (hereinafter sometimes referred to as "black matrix") on the surface of a transparent substrate such as glass or plastic sheet, and then red, green, blue, etc. These three or more different colored pixels are sequentially formed in a striped or mosaic color pattern.
[0003] パターンサイズはカラーフィルタの用途並びにそれぞれの色により異なるが通常 5 〜700 μ m程度である。また、重ね合わせの位置精度は数 μ m〜数十 μ mであり、 寸法精度の高 、微細加工技術により製造されて 、る。  [0003] The pattern size varies depending on the use of the color filter and each color, but is usually about 5 to 700 μm. Further, the positional accuracy of the overlay is several μm to several tens of μm, and it is manufactured with high dimensional accuracy and a fine processing technique.
[0004] カラーフィルタの代表的な製造方法としては、染色法、印刷法、顔料分散法、電着 法等がある。これらのうち、特に、色材料を含有する着色榭脂組成物を、透明基板上 に塗布し、画像露光、現像、必要により硬化を繰り返すことでカラーフィルタ画像を形 成する顔料分散法は、形成されるカラーフィルタ画素の位置、膜厚等の精度が高ぐ 耐光性'耐熱性等の耐久性に優れ、ピンホール等の欠陥が少ないため、広く採用さ れている。  [0004] Typical methods for producing a color filter include a dyeing method, a printing method, a pigment dispersion method, and an electrodeposition method. Among these, in particular, the pigment dispersion method in which a colored resin composition containing a color material is applied on a transparent substrate and image exposure, development, and curing as necessary is repeated to form a color filter image is a formation method. The position of the color filter pixel, the accuracy of the film thickness, etc. are high. It has excellent durability such as light resistance and heat resistance, and has few defects such as pinholes, so it is widely used.
[0005] カラーフィルタの製造には、上述の様に寸法精度の高い微細加工技術が要求され るため、用いられる着色榭脂組成物には、厳密な現像性、解像性、密着性が要求さ れる。特に、ブラックマトリックスの製造においては、遮光性榭脂組成物により形成さ れるために、より高性能な現像性、解像性、密着性が要求される上、後工程で重ねて 形成される赤、緑、青の着色画素の平坦性が損なわれないように、薄膜形成性も要 求されている。力かる要求に対して、例えば、光重合開始剤の改良によって感度を向 上させ、ブラックマトリックスにおける高性能な現像性、解像性、密着性を実現する技 術が開示されて!ヽる (特許文献 1)。 [0005] The production of color filters requires a fine processing technique with high dimensional accuracy as described above, and therefore, the colored resin composition used requires strict developability, resolution, and adhesion. It is done. In particular, in the production of a black matrix, since it is formed from a light-shielding resin composition, higher performance developability, resolution, and adhesion are required, and red is formed in a subsequent process. Thin film formation is also necessary so that the flatness of colored pixels of green and blue is not impaired. It is demanded. For example, a technology that improves sensitivity by improving the photopolymerization initiator and achieves high-performance developability, resolution, and adhesion in the black matrix is disclosed! Patent Document 1).
[0006] 一方、遮光性榭脂組成物によりブラックマトリックスが形成された場合、液晶表示装 置内で液晶と隣接する可能性があり、ブラックマトリックス形成用遮光性榭脂組成物 に由来する金属イオン等の良導性物質等が液晶側に流出すると、液晶の電圧保持 率が低下し、液晶表示装置の寿命を短くすることが知られている。力かる問題に対し て、着色画素およびブラックマトリックス中のナトリウム原子とナトリウムイオンの合計含 有量を一定の範囲に低減する技術、 1価の金属陽イオンの量が一定値以下のブラッ クマトリックス形成用感光性組成物(特許文献 2)、および Naと Caの合計含有量を一 定値以下に低減したカーボンブラックを遮光材としたブラックマトリックスを用いてなる カラーフィルタ (特許文献 3)等が開示されて ヽる。  [0006] On the other hand, when a black matrix is formed by the light-shielding resin composition, there is a possibility that it is adjacent to the liquid crystal in the liquid crystal display device, and metal ions derived from the light-shielding resin composition for forming the black matrix. It is known that when a good conductive material such as the above flows out to the liquid crystal side, the voltage holding ratio of the liquid crystal is lowered and the life of the liquid crystal display device is shortened. To solve the problem, a technology to reduce the total content of sodium atoms and sodium ions in the colored pixels and black matrix to a certain range, and formation of a black matrix in which the amount of monovalent metal cations is below a certain value And a color filter (Patent Document 3) using a black matrix with a light shielding material of carbon black in which the total content of Na and Ca is reduced to a certain value or less are disclosed. Speak.
特許文献 1 :特開 2005— 128483号公報  Patent Document 1: Japanese Unexamined Patent Application Publication No. 2005-128483
特許文献 2:特開平 7— 271020号公報  Patent Document 2: Japanese Patent Laid-Open No. 7-271020
特許文献 3:特開平 9 - 71733号公報  Patent Document 3: Japanese Patent Laid-Open No. 9-71733
[0007] 金属イオン含有量を低減する上記の従来技術は、液晶の電圧保持率の低下防止 を目的とするものであり、上記技術のみでは、現像性、解像性、密着性を達成するこ とは出来るものではな力つた。また、上記従来技術における光重合開始剤の改良等 によっても、厳密な現像性、解像性、密着性、特に直線性、密着性の向上に関する 点では不十分な面があった。  [0007] The above-described conventional technique for reducing the metal ion content is intended to prevent a decrease in the voltage holding ratio of the liquid crystal, and only with the above technique, developability, resolution, and adhesion can be achieved. I could n’t do anything. In addition, the improvement of the photopolymerization initiator in the prior art described above has been insufficient in terms of improving the strict developability, resolution, adhesion, particularly linearity and adhesion.
[0008] 遮光性榭脂組成物に使用されるカーボンブラックとしては、比較的ストラクチャーの 小さなものが好ましい。このようなカーボンブラックは、例えばカリウム元素を含む無機 化合物を添加した系内で、重油を燃焼させることにより製造される。得られたカーボン ブラックは、須らくカリウムイオンを含有するが、本発明者らの検討により、遮光性榭 脂組成物中のカリウムイオンは、その遮光性榭脂組成物を用いて形成された画素の 、基板との密着性、解像性、厳密な現像性などを阻害する要因となることが見出され た。  [0008] The carbon black used in the light-shielding resin composition preferably has a relatively small structure. Such carbon black is produced, for example, by burning heavy oil in a system to which an inorganic compound containing potassium element is added. The obtained carbon black contains potassium ions. However, according to the study by the present inventors, potassium ions in the light-shielding resin composition are obtained from the pixels formed using the light-shielding resin composition. It has been found that it becomes a factor that impedes adhesion to the substrate, resolution, and strict developability.
発明の概要 [0009] 本発明は、上記従来の実状に鑑みてなされたものであって、現像性、解像性、密着 性、特に直線性、密着性に優れたブラックマトリックスを形成することができる遮光性 榭脂組成物と、この遮光性榭脂組成物を用いたカラーフィルタと、このカラーフィルタ を備える液晶表示装置を提供することを目的とする。 Summary of the Invention [0009] The present invention has been made in view of the above-described conventional situation, and is a light-shielding property capable of forming a black matrix excellent in developability, resolution, adhesion, particularly linearity and adhesion. An object of the present invention is to provide a resin composition, a color filter using the light-shielding resin composition, and a liquid crystal display device including the color filter.
第 1態様の遮光性榭脂組成物は、バインダ榭脂、モノマー、光重合開始剤、および カーボンブラックを含有する遮光性榭脂組成物にぉ 、て、該カーボンブラックの平均 粒子径が 8nm以上 65nm以下であり、カーボンブラックの DBP吸油量が 90mlZlO Og以下であり、該遮光性榭脂組成物のカリウムイオンの含有量が、全固形分に対し て 20ppm以下であることを特徴とするものである。  The light-shielding resin composition of the first aspect is a light-shielding resin composition containing a binder resin, a monomer, a photopolymerization initiator, and carbon black, and the carbon black has an average particle size of 8 nm or more. 65 nm or less, the DBP oil absorption of carbon black is 90 mlZlO Og or less, and the potassium ion content of the light-shielding resin composition is 20 ppm or less based on the total solid content. is there.
第 2態様のカラーフィルタは、第 1態様の遮光性榭脂組成物を用いて形成された画 素を有する。  The color filter of the second aspect has a pixel formed using the light-shielding resin composition of the first aspect.
第 3態様の液晶表示装置は、第 2態様のカラーフィルタを備える。  The liquid crystal display device according to the third aspect includes the color filter according to the second aspect.
詳細な説明  Detailed description
[0010] 本発明者らは、ノ インダ榭脂、モノマー、光重合開始剤、および特定の平均粒子径 および DBP吸油量のカーボンブラックを含有し、且つカリウムイオン含有量を低減し た遮光性榭脂組成物を用いて形成されたブラックマトリックスは、現像性、解像性、密 着性、特に直線性、密着性に優れるという、従来技術力 は予想し得ない効果が得 られることを見出した。  [0010] The inventors of the present invention have disclosed a light-shielding film containing a noda resin, a monomer, a photopolymerization initiator, and carbon black having a specific average particle size and DBP oil absorption, and having a reduced potassium ion content. It has been found that the black matrix formed using the oil composition has an unprecedented effect that the conventional technical ability is excellent in developability, resolution, adhesion, especially linearity and adhesion. .
[0011] 本発明の遮光性榭脂組成物によれば、現像性、解像性、密着性、特に直線性、密 着性に優れるブラックマトリックスを形成することができ、これにより、高品質なカラーフ ィルタおよび液晶表示装置を提供することが出来る。  [0011] According to the light-shielding resin composition of the present invention, it is possible to form a black matrix that is excellent in developability, resolution, adhesion, particularly linearity, adhesion, and thereby high quality. A color filter and a liquid crystal display device can be provided.
[0012] 以下に本発明の実施の形態を詳細に説明するが、以下に記載する構成要件の説 明は、本発明の実施様態の一例 (代表例)であり、本発明はその要旨を超えない限り 、これらの内容に限定されるものではない。  [0012] Embodiments of the present invention will be described in detail below, but the description of the constituent elements described below is an example (representative example) of an embodiment of the present invention, and the present invention exceeds the gist thereof. As long as it is not limited to these contents.
[0013] [1]遮光性榭脂組成物  [0013] [1] Shading resin composition
本発明の遮光性榭脂組成物は、バインダ榭脂、モノマー、光重合開始剤、および 平均粒子径が 8nm以上 65nm以下で DBP吸油量が 90mlZ 1 OOg以下である力一 ボンブラックを必須成分とし、さらに必要に応じて、上記成分以外の他の添加物等が 配合されたものである。また、カリウムイオンの含有量力 全固形分に対して 20ppm 以下であることが必須である。 The light-shielding resin composition of the present invention comprises, as essential components, binder resin, monomer, photopolymerization initiator, and power bon black having an average particle size of 8 nm to 65 nm and a DBP oil absorption of 90 mlZ 1 OOg or less. If necessary, other additives other than the above components It is a blended one. It is essential that the potassium ion content is 20 ppm or less based on the total solid content.
[0014] 本発明の遮光性榭脂組成物の用途は特に制限はないが、中でもカラーフィルタの 黒色画素(ブラックマトリックス)形成等を目的とした組成物として好適に用いられる。 [0014] The use of the light-shielding resin composition of the present invention is not particularly limited, but is particularly preferably used as a composition for the purpose of forming black pixels (black matrix) of color filters.
[0015] 以下、本発明の遮光性榭脂組成物に含まれる各構成成分を説明する。 Hereinafter, each component contained in the light-shielding resin composition of the present invention will be described.
[0016] なお、本明細書にぉ 、て、「 (メタ)アクリル」、「 (メタ)アタリレート」等は、「アクリルお よび Zまたはメタクリル」、「アタリレートおよび Zまたはメタタリレート」等を意味するも のとし、例えば「(メタ)アクリル酸」は「アクリル酸および Zまたはメタクリル酸」を意味 するものとする。 In the present specification, “(meth) acryl”, “(meth) acrylate”, etc. mean “acryl and Z or methacryl”, “acrylate and Z or metatalate”, and the like. For example, “(meth) acrylic acid” means “acrylic acid and Z or methacrylic acid”.
[0017] また、 [1]の章において、「全固形分」とは、後記する溶剤成分以外の本発明の遮 光性榭脂組成物の全成分を指す。  [0017] In the section [1], "total solids" refers to all components of the light-shielding resin composition of the present invention other than the solvent components described later.
[0018] [1 1]バインダ榭脂 [0018] [1 1] Binder resin
本発明の遮光性榭脂組成物に用いられるバインダ榭脂としては、カルボキシル基 を有するエポキシアタリレート榭脂を用いることが好まし 、。  As the binder resin used in the light-shielding resin composition of the present invention, it is preferable to use an epoxy acrylate resin having a carboxyl group.
[0019] エポキシアタリレート榭脂は、エポキシ榭脂に α , β 不飽和モノカルボン酸または エステル部分にカルボキシル基を有する α , β 不飽和モノカルボン酸エステルを 付加させ、さらに、多塩基酸無水物を反応させることにより合成される。かかる反応生 成物は化学構造上、実質的にエポキシ基を有さず、かつ「アタリレート」に限定される ものではないが、エポキシ榭脂が原料であり、かつ「アタリレート」が代表例であるので 、慣用に従いこのように命名したものである。  [0019] The epoxy acrylate resin is obtained by adding an α, β unsaturated monocarboxylic acid or an α, β unsaturated monocarboxylic acid ester having a carboxyl group to the ester moiety to the epoxy resin, and further adding a polybasic acid anhydride. It is synthesized by reacting. Such a reaction product has substantially no epoxy group due to its chemical structure, and is not limited to “attalylate”, but epoxy resin is a raw material, and “attalylate” is a representative example. Therefore, it is named like this according to common usage.
[0020] 原料となるエポキシ榭脂として、例えばビスフエノール Α型エポキシ榭脂(例えば、 油化シェルエポキシ社製の「ェピコート 828」、「ェピコート 1001」、「ェピコート 1002」 、「ェピコート 1004」等)、ビスフエノール A型エポキシ榭脂のアルコール性水酸基と ェピクロルヒドリンの反応により得られるエポキシ榭脂(例えば、 日本化薬社製の「NE R- 1302J (エポキシ当量 323,軟化点 76°C) )、ビスフエノール F型榭脂(例えば、 油化シェルエポキシ社製の「ェピコート 807」、「EP— 4001」、「EP— 4002」、「EP 4004等」)、ビスフエノール F型エポキシ榭脂のアルコール性水酸基とェピクロルヒ ドリンの反応により得られるエポキシ榭脂(例えば、 日本化薬社製の「NER— 7406」 (エポキシ当量 350,軟化点 66°C) )、ビスフエノール S型エポキシ榭脂、ビフエニルダ リシジルエーテル(例えば、油化シェルエポキシ社製の「YX— 4000」)、フエノールノ ポラック型エポキシ榭脂(例えば、 日本ィ匕薬社製の ΓΕΡΡΝ— 201」、油化シェルェポ キシ社製の「ΕΡ— 152」、「ΕΡ— 154」、ダウケミカル社製の「DEN— 438」)、 (o, m , ρ—)クレゾ一ルノボラック型エポキシ榭脂(例えば、 日本ィ匕薬社製の「EOCN— 10 2S」、「EOCN— 1020」、「EOCN— 104S」)、トリグリシジルイソシァヌレート(例え ば、 日産化学社製の「TEPK」)、トリスフエノールメタン型エポキシ榭脂(例えば、 日 本化薬社製の「EPPN— 501」、「EPN— 502」、「EPPN— 503」)、フルオレンェポ キシ榭脂 (例えば、新日鐡ィ匕学社製の力ルドエポキシ榭脂「ESF— 300」 )、脂環式 エポキシ榭脂(ダイセルィ匕学工業社製の「セロキサイド 2021P」、「セロキサイド ΈΗΡ E」)、ジシクロペンタジェンとフエノールの反応によるフエノール榭脂をグリシジル化し たジシクロペンタジェン型エポキシ榭脂(例えば、 日本ィ匕薬社製の「XD— 1000」、大 日本インキ社製の「EXA— 7200」、 日本化薬社製の「NC— 3000」、「NC— 7300」 )、および下記構造式で示されるエポキシ榭脂 (特許第 2878486号公報参照)、等を 好適に用いることができる。 [0020] The epoxy resin used as a raw material is, for example, bisphenol type epoxy resin (for example, “Epicoat 828”, “Epicoat 1001”, “Epicoat 1002”, “Epicoat 1004” manufactured by Yuka Shell Epoxy Co., Ltd.) , Epoxy resin obtained by reaction of alcoholic hydroxyl group of bisphenol A type epoxy resin with epichlorohydrin (for example “NE R-1302J (epoxy equivalent 323, softening point 76 ° C made by Nippon Kayaku Co., Ltd.) )), Bisphenol F type resin (for example, “Epicoat 807”, “EP—4001,” “EP—4002,” “EP 4004, etc.” manufactured by Yuka Shell Epoxy Co., Ltd.), Bisphenol F type epoxy resin Epoxy resin obtained by the reaction of alcoholic hydroxyl group and epichlorohydrin (eg “NER-7406” manufactured by Nippon Kayaku Co., Ltd.) (Epoxy equivalent 350, softening point 66 ° C)), bisphenol S type epoxy resin, biphenyl daricidyl ether (for example, “YX-4000” manufactured by Yuka Shell Epoxy Co., Ltd.), phenol nopolak type epoxy resin (for example, , ΓΕΡΡΝ-201, manufactured by Nippon Kayaku Co., Ltd., “」 -152 ”,“ ΕΡ-154 ”manufactured by Yuka Shellepoxy,“ DEN-438 ”manufactured by Dow Chemical Co., Ltd.), (o, m, ρ —) Cresolol novolac-type epoxy resin (eg “EOCN-10 2S”, “EOCN-1020”, “EOCN-104S” manufactured by Nippon Kayaku Co., Ltd.), triglycidyl isocyanurate (eg Nissan Chemical) "TEPK"), trisphenol methane type epoxy resin (for example, "EPPN-501", "EPN-502", "EPPN-503" manufactured by Nippon Kayaku Co., Ltd.), fluorene epoxy resin (for example, , Nippon Steel Chemical Co., Ltd.'s power-based epoxy resin "ESF-300"), Cyclic epoxy resin (“Celoxide 2021P”, “Celoxide® E” manufactured by Daicel Chemical Industries, Ltd.), dicyclopentagen type epoxy resin obtained by glycidylation of phenol resin by reaction of dicyclopentagen and phenol ( For example, “XD-1000” manufactured by Nippon Gaiyaku Co., Ltd., “EXA-7200” manufactured by Dai Nippon Ink Co., Ltd., “NC-3000”, “NC-7300” manufactured by Nippon Kayaku Co., Ltd.), and the following structural formula (See Japanese Patent No. 2878486), etc. can be suitably used.
[0021] [化 1]  [0021] [Chemical 1]
Figure imgf000006_0001
Figure imgf000006_0001
[0022] これらは 1種を単独で用いてもよぐ 2種以上を併用してもよい。 [0022] These may be used alone or in combination of two or more.
[0023] エポキシ榭脂の他の例としては共重合型エポキシ榭脂が挙げられる。共重合型ェ ポキシ榭脂としては、例えば、グリシジル (メタ)アタリレート、(メタ)アタリロイルメチル シクロへキセンオキサイド、ビュルシクロへキセンオキサイドなど(以下「共重合型ェポ キシ榭脂の第 1成分」と称す。 )とこれら以外の 1官能エチレン性不飽和基含有化合 物(以下、「共重合型エポキシ榭脂の第 2成分」と称す。)、例えば、メチル (メタ)アタリ レート、ェチル (メタ)アタリレート、ブチル (メタ)アタリレート、 2—ヒドロキシェチルァク リレート、 2—ヒドロキシプロピル (メタ)アタリレート、 (メタ)アクリル酸、スチレン、フエノ キシェチル (メタ)アタリレート、ベンジル (メタ)アタリレート、 a—メチルスチレン、グリ セリンモノ (メタ)アタリレート、下記一般式(1)で表される化合物力も選ばれる 1種また は 2種以上、とを反応させて得られた共重合体が挙げられる。 [0023] Another example of the epoxy resin is a copolymerized epoxy resin. Examples of the copolymerized epoxy resin include glycidyl (meth) acrylate, (meth) attalyloylmethyl cyclohexene oxide, burcyclohexene oxide and the like (hereinafter referred to as “the first component of copolymerized epoxy resin). ) And other monofunctional ethylenically unsaturated group-containing compounds (hereinafter referred to as “second component of copolymer epoxy resin”), for example, methyl (meth) atari , Ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl (meth) acrylate, (meth) acrylic acid, styrene, phenoxychetyl (meth) acrylate , Benzyl (meth) acrylate, a -methylstyrene, glycerol mono (meth) acrylate, and one or more compounds selected by the compound represented by the following general formula (1). And copolymers.
[0024] [化 2]
Figure imgf000007_0001
式(1)中、 R61は水素またはェチル基、 R62は水素または炭素数 1〜6のアルキル基 を示し、 rは 2〜 10の整数である。
[0024] [Chemical 2]
Figure imgf000007_0001
In the formula (1), R 61 represents hydrogen or an ethyl group, R 62 represents hydrogen or an alkyl group having 1 to 6 carbon atoms, and r is an integer of 2 to 10.
[0025] 一般式(1)の化合物としては、例えば、ジエチレングリコールモノ (メタ)アタリレート 、トリエチレングリコールモノ (メタ)アタリレート、テトラエチレンダリコールモノ (メタ)ァ タリレート等のポリエチレングリコールモノ (メタ)アタリレート;メトキシジエチレングリコ ールモノ (メタ)アタリレート、メトキシトリエチレングリコールモノ (メタ)アタリレート、メト キシテトラエチレングリコールモノ (メタ)アタリレート、等のアルコキシポリエチレンダリ コール (メタ)アタリレート等が挙げられる。  [0025] The compound of the general formula (1) includes, for example, polyethylene glycol mono (meta) such as diethylene glycol mono (meth) acrylate, triethylene glycol mono (meth) acrylate, tetraethylene dallicol mono (meth) acrylate. ) Atarylate; Alkoxypolyethylene dallic (meth) acrylate, such as methoxydiethylene glycol mono (meth) acrylate, methoxytriethylene glycol mono (meth) acrylate, methoxytetraethylene glycol mono (meth) acrylate, etc. It is done.
[0026] 上記共重合型エポキシ榭脂の GPCで測定したポリエチレン換算の重量平均分子 量 (Mw)は約 1000〜200000力好ましい。また、上記共重合型エポキシ榭脂の第 1 成分の使用量は、上記共重合型エポキシ榭脂の第 2成分に対して好ましくは 10重量 %以上、特に好ましくは 20重量%以上であり、好ましくは 70重量%以下、特に好まし くは 50重量%以下である。  [0026] The weight-average molecular weight (Mw) in terms of polyethylene measured by GPC of the copolymerized epoxy resin is preferably about 1000 to 200,000. The amount of the first component of the copolymerized epoxy resin used is preferably 10% by weight or more, particularly preferably 20% by weight or more, preferably with respect to the second component of the copolymerized epoxy resin. Is less than 70% by weight, particularly preferably less than 50% by weight.
[0027] このような共重合型エポキシ榭脂としては、具体的には日本油脂社製の「CP— 15」 、「CP— 30」、「CP— 50」、「CP— 20SA」、「CP— 510SA」、「CP— 50S」、「CP— 50M」、「CP— 20MA」等が例示される。  [0027] Specific examples of such copolymer type epoxy resins include "CP-15", "CP-30", "CP-50", "CP-20SA", "CP" manufactured by Nippon Oil & Fats Co., Ltd. — 510SA ”,“ CP-50S ”,“ CP-50M ”,“ CP-20MA ”and the like.
[0028] 原料エポキシ榭脂の分子量は、 GPCで測定したポリスチレン換算の重量平均分子 量として、通常 200〜20万、好ましくは 300〜 100000の範囲である。重量平均分子 量が上記範囲未満であると被膜形成性に問題を生じる場合が多ぐ逆に、上記範囲 を超えた榭脂では α , β 不飽和モノカルボン酸の付加反応時にゲルィ匕が起こりや すく製造が困難となるおそれがある。 [0028] The molecular weight of the raw material epoxy resin is usually in the range of 200 to 200,000, preferably 300 to 100,000 as the weight average molecular weight in terms of polystyrene measured by GPC. On the contrary, if the weight average molecular weight is less than the above range, a problem may occur in the film forming property. In the case of a resin having a viscosity exceeding 50%, gelling is likely to occur during the addition reaction of α and β unsaturated monocarboxylic acids, and the production may be difficult.
[0029] a , β 不飽和モノカルボン酸としては、ィタコン酸、クロトン酸、桂皮酸、アクリル 酸、メタクリル酸等が挙げられ、好ましくは、アクリル酸、メタクリル酸であり、特にアタリ ル酸が反応性に富むため好まし 、。  [0029] Examples of the a, β-unsaturated monocarboxylic acid include itaconic acid, crotonic acid, cinnamic acid, acrylic acid, methacrylic acid, and the like, preferably acrylic acid and methacrylic acid, and particularly attalic acid is reacted. It is preferred because of its rich nature.
[0030] エステル部分にカルボキシル基を有する α , j8—不飽和モノカルボン酸エステルと しては、アクリル酸 2—サクシノィルォキシェチル、アクリル酸 2—マレイノィルォ キシェチル、アクリル酸 2—フタロイルォキシェチル、アクリル酸 2—へキサヒドロ フタロイルォキシェチル、メタクリル酸 2—サクシノィルォキシェチル、メタクリル酸 2—マレイノィルォキシェチル、メタクリル酸 2—フタロイルォキシェチル、メタタリ ル酸 2—へキサヒドロフタロイルォキシェチル、クロトン酸 2—サクシノィルォキシ ェチル等が挙げられ、好ましくは、アクリル酸 2—マレイノィルォキシェチルおよび アクリル酸 2—フタロイルォキシェチルであり、特にアクリル酸 2—マレイノィルォ キシェチルが好ましい。これらは 1種を単独で用いてもよぐ 2種以上を併用してもよ い。  [0030] The α, j8-unsaturated monocarboxylic acid ester having a carboxyl group in the ester moiety includes 2-succinoyloxychetyl acrylate, 2-maleyloxychityl acrylate, 2-phthaloyl acrylate. Xichetyl, 2-hexahydrophthaloyloxetyl acrylate, 2-succinoyloxychetyl methacrylate, 2-maleyloxychetyl methacrylate, 2-phthaloyloxychetyl methacrylate, Examples include 2-methylhexallylmethacrylate 2-hexahydrophthaloyloxetyl, crotonic acid 2-succinoyloxyethyl, etc., preferably 2-acryloylethyl acrylate and 2-phthaloyl acrylate. It is chichetil, particularly 2-maleyloxychhetyl acrylate. These may be used alone or in combination of two or more.
[0031] a , j8—不飽和モノカルボン酸またはそのエステルとエポキシ榭脂との付加反応は 、公知の手法を用いることができ、例えば、エステル化触媒の存在下、 50〜150°Cの 温度で反応させることにより実施することができる。ここで、エステルイ匕触媒としてはト リエチルァミン、トリメチルァミン、ベンジルジメチルァミン、ベンジルジェチルァミン等 の 3級ァミン;テトラメチルアンモ -ゥムクロライド、テトラエチルアンモ -ゥムクロライド、 ドデシルトリメチルアンモ -ゥムクロライド等の 4級アンモ-ゥム塩等を用いることがで きる。  [0031] The addition reaction of a, j8-unsaturated monocarboxylic acid or its ester and epoxy resin can be carried out using a known method, for example, at a temperature of 50 to 150 ° C in the presence of an esterification catalyst. It can implement by making it react. Here, as the ester catalyst, tertiary amine such as triethylamine, trimethylamine, benzyldimethylamine, benzyljetylamine, etc .; tetramethylammonium chloride, tetraethylammonium chloride, dodecyltrimethylammonium chloride, etc. Grade ammonium salt can be used.
[0032] a , β 不飽和モノカルボン酸またはそのエステルの使用量は、原料エポキシ榭 脂のエポキシ基 1当量に対し 0. 5〜1. 2当量の範囲が好ましぐさらに好ましくは 0. 7〜1. 1当量の範囲である。 a , j8—不飽和モノカルボン酸またはそのエステルの使 用量が少ないと不飽和基の導入量が不足し、引き続く多塩基酸無水物との反応も不 十分となる。また、多量のエポキシ基が残存することも有利ではない。一方、該使用 量が多いと α , β 不飽和モノカルボン酸またはそのエステルが未反応物として残 存する。 Vヽずれの場合も硬化特性が悪化する傾向が認められる。 [0032] The amount of the a, β-unsaturated monocarboxylic acid or ester thereof used is preferably in the range of 0.5 to 1.2 equivalents, more preferably 0.7 to 1 equivalent of epoxy group of the raw material epoxy resin. -1.1 equivalent range. If the amount of a, j8-unsaturated monocarboxylic acid or its ester is small, the amount of unsaturated group introduced is insufficient, and the subsequent reaction with polybasic acid anhydride is also insufficient. Also, it is not advantageous that a large amount of epoxy groups remain. On the other hand, if the amount used is large, α, β unsaturated monocarboxylic acid or ester thereof remains as an unreacted product. Exist. In the case of V deviation, the curing characteristics tend to deteriorate.
[0033] a , j8—不飽和カルボン酸またはそのエステルが付カ卩したエポキシ榭脂に、更に 付加させる多塩基酸無水物としては、無水マレイン酸、無水コハク酸、無水ィタコン 酸、無水フタル酸、無水テトラヒドロフタル酸、無水へキサヒドロフタル酸、無水ピロメリ ット酸、無水トリメリット酸、ベンゾフエノンテトラカルボン酸二無水物、無水メチルへキ サヒドロフタル酸、無水エンドメチレンテトラヒドロフタル酸、無水クロレンド酸、無水メ チルテトラヒドロフタル酸、ビフエニルテトラカルボン酸二無水物等が挙げられ、好まし くは、無水マレイン酸、無水コハク酸、無水ィタコン酸、無水フタル酸、無水テトラヒド ロフタル酸、無水へキサヒドロフタル酸、無水ピロメリット酸、無水トリメリット酸、ビフエ -ルテトラカルボン酸二無水物であり、特に好ましい化合物は、無水テトラヒドロフタ ル酸およびビフエニルテトラカルボン酸二無水物である。これらは 1種を単独で用い てもよく、 2種以上を併用してもよい。  [0033] Polybasic acid anhydrides to be further added to epoxy resin attached with a, j8-unsaturated carboxylic acid or ester thereof include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride , Tetrahydrophthalic anhydride, hexahydrophthalic anhydride, pyromellitic anhydride, trimellitic anhydride, benzophenone tetracarboxylic dianhydride, methyl hexahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, chlorend Acid, methyltetrahydrophthalic anhydride, biphenyltetracarboxylic dianhydride, etc., preferably maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydrous Oxahydrophthalic acid, pyromellitic anhydride, trimellitic anhydride, biphenyltetracarboxylic acid Particularly preferred compounds are dianhydrides, tetrahydrophthalic anhydride and biphenyltetracarboxylic dianhydride. These may be used alone or in combination of two or more.
[0034] 多塩基酸無水物の付加反応に関しても公知の手法を用いることができ、 α , β— 不飽和カルボン酸またはそのエステルの付加反応と同様な条件下で継続反応させる こと〖こより実施することができる。  [0034] A known method can also be used for the addition reaction of polybasic acid anhydride, and the reaction is continued under the same conditions as the addition reaction of α, β-unsaturated carboxylic acid or ester thereof. be able to.
多塩基酸無水物の付加量は、生成するエポキシアタリレート榭脂の酸価が 10〜 15 Omg— KOHZgの範囲となるような量が好ましぐ更に 20〜140mg— KOHZgの 範囲が特に好ましい。榭脂の酸価が小さすぎるとアルカリ現像性に乏しくなり、また、 榭脂の酸価が大きすぎると硬化性能に劣る傾向が認められる。  The addition amount of the polybasic acid anhydride is preferably an amount such that the acid value of the resulting epoxy attalylate resin is in the range of 10 to 15 Omg-KOHZg, and more preferably in the range of 20 to 140 mg-KOHZg. If the acid value of the resin is too small, the alkali developability is poor, and if the acid value of the resin is too large, the curing performance tends to be inferior.
[0035] その他、カルボキシル基を有するエポキシアタリレート榭脂としては、例えば特開平 6 -49174号公報記載のナフタレン含有榭脂;特開 2003— 89716、特開 2003 - 1 65830、特開 2005— 325331、特開 2001— 354735号公報記載のフルオレン含 有榭脂;特開 2005— 126674、特開 2005— 55814、特開 2004— 295084号公報 等に記載の榭脂を挙げることができる。  [0035] Other examples of epoxy acrylate resins having a carboxyl group include naphthalene-containing resins described in JP-A-6-49174; JP-A 2003-89716, JP-A 2003-165830, JP-A 2005-325331. Examples thereof include fluorene-containing coagulants described in JP-A No. 2001-354735; JP-A 2005-126674, JP-A 2005-55814, JP-A 2004-295084, and the like.
また、市販のカルボキシル基を有するエポキシアタリレート榭脂を用いることもでき、 市販品としては例えばダイセル社製の「ACA— 200M」等を挙げるが出来る。  In addition, commercially available epoxy acrylate resins having a carboxyl group can be used, and examples of commercially available products include “ACA-200M” manufactured by Daicel Corporation.
[0036] ノ インダ榭脂としては、また、例えば特開 2005— 154708号公報などに記載のァ クリル系のバインダーも用いることができる。 [0037] 本発明の遮光性榭脂組成物中の全固形分量に対するバインダ榭脂の割合は、通 常 1重量%以上、好ましくは 5重量%以上、更に好ましくは 10重量%以上であり、通 常 50重量%以下、好ましくは 40重量%以下、更に好ましくは 30重量%以下である。 ノ インダ榭脂の割合が少なすぎると画像形成が不安定となり、形状のコントロールが しに《なる他、薬品への耐久性が悪ィ匕するおそれがある。また、多すぎると遮光性を 高めることができない。 [0036] As the noda resin, acrylic binders described in, for example, JP-A-2005-154708 can also be used. [0037] The ratio of the binder resin to the total solid content in the light-shielding resin composition of the present invention is usually 1% by weight or more, preferably 5% by weight or more, more preferably 10% by weight or more. Usually, it is 50% by weight or less, preferably 40% by weight or less, more preferably 30% by weight or less. If the ratio of the noda resin is too small, the image formation becomes unstable and the shape is not controlled, and the durability to chemicals may be deteriorated. If the amount is too large, the light shielding property cannot be improved.
[0038] [1 2]モノマー  [0038] [1 2] Monomer
本発明の遮光性榭脂組成物に用いられるモノマーは、光重合性で、重合可能な低 分子化合物を含むものであれば良ぐ特に制限はないが、官能基を有する多官能モ ノマーであるのが好ましく、エチレン性二重結合を少なくとも 1つ有する付加重合可能 な化合物(以下、「エチレン性ィ匕合物」と称す。)が更に好ましい。また、モノマーは酸 基を有していても良い。  The monomer used in the light-shielding resin composition of the present invention is not particularly limited as long as it is a photopolymerizable and contains a polymerizable low molecular weight compound, but is a polyfunctional monomer having a functional group. A compound capable of addition polymerization (hereinafter referred to as “ethylenic compound”) having at least one ethylenic double bond is more preferable. The monomer may have an acid group.
[0039] エチレン性ィ匕合物とは、本発明の遮光性榭脂組成物が活性光線の照射を受けた 場合、後述の光重合開始剤の作用により付加重合し、硬化するようなエチレン性二 重結合を有する化合物である。なお、本発明における「モノマー」とは、いわゆる高分 子物質に相対する概念を意味し、狭義の「モノマー (単量体)」以外に「二量体」、「三 量体」、「オリゴマー」をも包含する概念を意味する。  [0039] The ethylenic compound is an ethylenic compound that undergoes addition polymerization and cures by the action of a photopolymerization initiator described later when the light-shielding resin composition of the present invention is irradiated with actinic rays. It is a compound having a double bond. The “monomer” in the present invention means a concept opposite to a so-called high molecular substance, and in addition to “monomer” in a narrow sense, “dimer”, “trimer”, “oligomer”. ”Means a concept including“
[0040] 酸基を有するエチレン性化合物としては、例えば、不飽和カルボン酸、不飽和カル ボン酸とモノヒドロキシィ匕合物とのエステル、脂肪族ポリヒドロキシィ匕合物と不飽和力 ルボン酸とのエステル、芳香族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル 、不飽和カルボン酸と多価カルボン酸および前述の脂肪族ポリヒドロキシィ匕合物、芳 香族ポリヒドロキシィ匕合物等の多価ヒドロキシィ匕合物とのエステルイ匕反応により得られ るエステル、ポリイソシァネートイ匕合物と (メタ)アタリロイル含有ヒドロキシィ匕合物とを反 応させたウレタン骨格を有するエチレン性ィ匕合物等が挙げられる。  [0040] Examples of the ethylenic compound having an acid group include unsaturated carboxylic acid, ester of unsaturated carboxylic acid and monohydroxy compound, aliphatic polyhydroxy compound and unsaturated force rubonic acid. Esters, aromatic polyhydroxy compounds and unsaturated carboxylic acids, unsaturated carboxylic acids and polyvalent carboxylic acids, and the aforementioned aliphatic polyhydroxy compounds, aromatic polyhydroxy compounds, etc. An ethylenic compound having a urethane skeleton obtained by reacting an ester or polyisocyanate compound obtained by an ester reaction with a polyvalent hydroxy compound and a (meth) atallyloyl-containing hydroxy compound. Examples include compounds.
[0041] 不飽和カルボン酸としては、(メタ)アクリル酸、ィタコン酸、イロトン酸、マレイン酸等 が挙げられる。  [0041] Examples of the unsaturated carboxylic acid include (meth) acrylic acid, itaconic acid, ilotonic acid, maleic acid and the like.
[0042] 脂肪族ポリヒドロキシィ匕合物と不飽和カルボン酸とのエステルとしては、エチレンダリ コールジアタリレート、トリエチレングリコールジアタリレート、トリメチロールプロパントリ アタリレート、トリメチロールェタントリアタリレート、ペンタエリスリトールジアタリレート、 ペンタエリスリトールトリアタリレート、ペンタエリスリトールテトラアタリレート、ジペンタ エリスリトールテトラアタリレート、ジペンタエリスリトールペンタアタリレート、ジペンタエ リスリトールへキサアタリレート、グリセロールアタリレート等のアクリル酸エステルが挙 げられる。また、これらアタリレートのアクリル酸部分を、メタクリル酸部分に代えたメタ クリル酸エステル、ィタコン酸部分に代えたィタコン酸エステル、クロトン酸部分に代 えたクロトン酸エステル、または、マレイン酸部分に代えたマレイン酸エステル等が挙 げられる。 [0042] Examples of the ester of an aliphatic polyhydroxyl compound and an unsaturated carboxylic acid include ethylene diol diatalate, triethylene glycol diatalate, trimethylol propane tri Atalylate, trimethylolethane tritalylate, pentaerythritol diatalylate, pentaerythritol triatalylate, pentaerythritol tetratalariate, dipentaerythritol tetratalylate, dipentaerythritol pentaatalylate, dipentaerythritol hexatalylate, glycerol Acrylate esters such as acrylate. In addition, the acrylic acid part of these acrylates was replaced with a methacrylic acid ester substituted for the methacrylic acid part, an itaconic acid ester substituted for the itaconic acid part, a crotonic acid ester substituted for the crotonic acid part, or a maleic acid part. Maleic acid esters are listed.
[0043] 芳香族ポリヒドロキシィ匕合物と不飽和カルボン酸とのエステルとしては、ハイド口キノ ンジアタリレート、ハイド口キノンジメタタリレート、レゾルシンジアタリレート、レゾルシン ジメタタリレート、ピロガロールトリアタリレート等が挙げられる。  [0043] Examples of the ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid include: Hyde mouth quinone diatalylate, Hyde mouth quinone dimetatalylate, Resorcin ditalarate, Resorcin dimetatalylate, Pyrogallol tritalylate Etc.
[0044] 不飽和カルボン酸と多価カルボン酸および多価ヒドロキシ化合物とのエステル化反 応により得られるエステルは、必ずしも単一物ではなぐ混合物であっても良い。代表 例としては、アクリル酸、フタル酸およびエチレングリコールの縮合物、アクリル酸、マ レイン酸およびジエチレングリコールの縮合物、メタクリル酸、テレフタル酸およびべ ンタエリスリトールの縮合物、アクリル酸、アジピン酸、ブタンジオールおよびグリセリン の縮合物等が挙げられる。  [0044] The ester obtained by the esterification reaction of an unsaturated carboxylic acid with a polyvalent carboxylic acid and a polyvalent hydroxy compound may not necessarily be a single substance but a mixture. Typical examples are condensates of acrylic acid, phthalic acid and ethylene glycol, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and penterythritol, acrylic acid, adipic acid, butanediol. And glycerin condensates.
[0045] ポリイソシァネートイ匕合物と (メタ)アタリロイル基含有ヒドロキシ化合物とを反応させ たウレタン骨格を有するエチレン性ィ匕合物としては、へキサメチレンジイソシァネート 、トリメチルへキサメチレンジイソシァネート等の脂肪族ジイソシァネート;シクロへキサ ンジイソシァネート、イソホロンジイソシァネート等の脂環式ジイソシァネート;トルエン ジイソシァネート、ジフエ-ルメタンジイソシァネート等の芳香族ジイソシァネート等と、 2—ヒドロキシェチルアタリレート、 2—ヒドロキシェチルメタタリレート、 3—ヒドロキシ(1 , 1, 1—トリアタリロイルォキシメチル)プロパン、 3—ヒドロキシ(1, 1, 1—トリメタクリロ ィルォキシメチル)プロパン等の (メタ)アタリロイル基含有ヒドロキシィ匕合物との反応物 が挙げられる。  [0045] Examples of the ethylenic compound having a urethane skeleton obtained by reacting a polyisocyanate compound with a (meth) atallyloyl group-containing hydroxy compound include hexamethylene diisocyanate, trimethylhexamethyate. Aliphatic diisocyanates such as diisocyanate; cycloaliphatic diisocyanates such as cyclohexane diisocyanate, isophorone diisocyanate; aromatic diisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, etc. —Hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 3-hydroxy (1,1,1-triatalylooxymethyl) propane, 3-hydroxy (1,1,1-trimethacryloyloxymethyl) propane, etc. Of (meth) atallyloyl group-containing hydroxy compounds It is.
[0046] その他本発明に用いられるエチレン性ィ匕合物の例としては、エチレンビスアクリルァ ミド等のアクリルアミド類;フタル酸ジァリル等のァリルエステル類;ジビュルフタレート 等のビュル基含有ィ匕合物等も有用である。 [0046] Other examples of the ethylenic compound used in the present invention include acrylamides such as ethylene bisacrylamide; allylic esters such as diallyl phthalate; Bulle group-containing compounds such as are also useful.
[0047] 本発明にお 、て、モノマーは、多官能モノマーであって、カルボキシル基、スルホン 酸基、リン酸基等の酸基を有していても良い。従って、ヱチレン性ィ匕合物が、上記の ように混合物である場合のように未反応のカルボキシル基を有するものであれば、こ れをそのまま利用することができる力 必要において、上述のエチレン性ィ匕合物のヒ ドロキシル基に非芳香族カルボン酸無水物を反応させて酸基を導入しても良 、。こ の場合、使用される非芳香族カルボン酸無水物の具体例としては、無水テトラヒドロ フタル酸、アルキル化無水テトラヒドロフタル酸、無水へキサヒドロフタル酸、アルキル 化無水へキサヒドロフタル酸、無水コハク酸、無水マレイン酸が挙げられる。  [0047] In the present invention, the monomer is a polyfunctional monomer and may have an acid group such as a carboxyl group, a sulfonic acid group, or a phosphoric acid group. Therefore, if the ethylenic compound has an unreacted carboxyl group as in the case of a mixture as described above, the above-described ethylenic property is required in order to be able to use this as it is. It is also possible to introduce an acid group by reacting the hydroxyl group of the compound with a non-aromatic carboxylic anhydride. In this case, specific examples of the non-aromatic carboxylic acid anhydride used include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, alkylated hexahydrophthalic anhydride, and succinic anhydride. Examples include acid and maleic anhydride.
[0048] 本発明にお 、て、酸価を有するモノマーとしては、脂肪族ポリヒドロキシィ匕合物と不 飽和カルボン酸とのエステルであり、脂肪族ポリヒドロキシィ匕合物の未反応のヒドロキ シル基に非芳香族カルボン酸無水物を反応させて酸基を持たせた多官能モノマー が好ましぐ特に好ましくは、このエステルにおいて、脂肪族ポリヒドロキシィ匕合物がぺ ンタエリスリトールおよび zまたはジペンタエリスリトールであるものである。 In the present invention, the monomer having an acid value is an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and an unreacted hydroxy group of the aliphatic polyhydroxy compound. A polyfunctional monomer having an acid group by reacting a non-aromatic carboxylic acid anhydride with a sil group is particularly preferred. In this ester, the aliphatic polyhydroxy compound is pentaerythritol and z or Dipentaerythritol.
[0049] また、前記エポキシアタリレート中に記載のエポキシアタリレート榭脂のうち、カルボ キシル基を有して ヽな 、ものもモノマーとして用いることができる。  [0049] Of the epoxy acrylate resins described in the epoxy acrylate, those having a carboxyl group can also be used as monomers.
[0050] これらのモノマーは 1種を単独で用いても良いが、製造上、単一の化合物を用いる ことは難しいことから、 2種以上を混合して用いても良い。また、必要に応じてモノマー として酸基を有しない多官能モノマーと酸基を有する多官能モノマーを併用しても良 い。  [0050] These monomers may be used alone, but since it is difficult to use a single compound for production, two or more of them may be used in combination. If necessary, a polyfunctional monomer having no acid group and a polyfunctional monomer having an acid group may be used in combination.
[0051] 酸基を有する多官能モノマーの好ましい酸価としては、 0. l〜40mg— KOHZg であり、特に好ましくは 5〜30mg— KOHZgである。多官能モノマーの酸価が低す ぎると現像溶解特性が落ちるおそれがあり、高すぎると製造や取扱いが困難になると 共に光重合性能が落ち、画素の表面平滑性等の硬化性が劣るものとなる傾向がある 。従って、異なる酸基の多官能モノマーを 2種以上併用する場合、或いは酸基を有し な 、多官能モノマーを併用する場合、全体の多官能モノマーとしての酸基が上記範 囲に入るように調整することが重要である。  [0051] A preferable acid value of the polyfunctional monomer having an acid group is 0.1 to 40 mg-KOHZg, and particularly preferably 5 to 30 mg-KOHZg. If the acid value of the polyfunctional monomer is too low, the development and dissolution characteristics may be lowered, and if it is too high, the production and handling will be difficult, and the photopolymerization performance will be degraded, and the curability such as the surface smoothness of the pixels will be inferior. Tend . Therefore, when two or more polyfunctional monomers having different acid groups are used in combination, or when a polyfunctional monomer having no acid group is used in combination, the acid groups as the entire polyfunctional monomer are within the above range. It is important to adjust.
[0052] 本発明において、より好ましい酸基を有する多官能モノマーは、東亞合成 (株)製 T 01382として市販されているジペンタエリスリトールへキサアタリレート、ジペンタエリ スリトールペンタアタリレート、ジペンタエリスリトールペンタアタリレートのコハク酸エス テルを主成分とする混合物である。この多官能モノマーは他の多官能モノマーを組 み合わせて使用することもできる。 [0052] In the present invention, a more preferred polyfunctional monomer having an acid group is T manufactured by Toagosei Co., Ltd. It is a mixture of dipentaerythritol hexatalylate, dipentaerythritol pentaatarylate, and dipentaerythritol pentaatalylate, which is commercially available as 01382, based on succinic acid ester. This polyfunctional monomer can also be used in combination with other polyfunctional monomers.
[0053] これらの多官能モノマーの配合割合は、本発明の遮光性榭脂組成物の全固形分 中、通常 1〜80重量%、好ましくは 5〜70重量%であり、カーボンブラックを含む色 材に対する比率として 5〜200重量%、好ましくは 10〜: LOO重量%、より好ましくは 1 5〜80重量%である。多官能モノマーの配合割合は、遮光性榭脂組成物のカーボン ブラックを含む色材の種類や用いる多官能モノマーの酸価に応じて適宜調整される [0053] The blending ratio of these polyfunctional monomers is usually 1 to 80% by weight, preferably 5 to 70% by weight, based on the total solid content of the light-shielding resin composition of the present invention. The ratio to the material is 5 to 200% by weight, preferably 10 to: LOO% by weight, more preferably 15 to 80% by weight. The blending ratio of the polyfunctional monomer is appropriately adjusted according to the type of color material containing carbon black in the light-shielding resin composition and the acid value of the polyfunctional monomer used.
[0054] なお、必要に応じて単官能モノマーを、上述した多官能モノマーのうち一部に替え て使用してもよい。この場合、単官能モノマーとしては、例えば特開平 7— 325400号 公報に記載されたもの等が挙げられる。 [0054] If necessary, a monofunctional monomer may be used instead of a part of the above-described polyfunctional monomer. In this case, examples of the monofunctional monomer include those described in JP-A-7-325400.
[0055] 具体的には、例えばイソブチル (メタ)アタリレート、 t—ブチル (メタ)アタリレート、ラ ゥリル (メタ)アタリレート、セチル (メタ)アタリレート、ステアリル (メタ)アタリレート、シク 口へキシル (メタ)アタリレート、イソボル-ル (メタ)アタリレート、ベンジル (メタ)アタリレ ート、 2—メトキシェチル (メタ)アタリレート、 3—メトキシプロピル (メタ)アタリレート、ェ チルカルビトール (メタ)アタリレート、フエノキシェチル (メタ)アタリレート、テトラヒドロ フリル (メタ)アタリレート、フエノキシポリエチレングリコール (メタ)アタリレート、メトキシ プロピレングリコール(メタ)アタリレート、 2—ヒドロキシェチル(メタ)アタリレート、 2—ヒ ドロキシプロピル (メタ)アタリレート、モノ一 2— (メタ)アタリロイルォキシェチルフタレ ート、モノ一 2— (メタ)アタリロイルォキシプロピルフタレート、モノ一 2— (メタ)アタリ口 ィルォキシプロピルテトラヒドロフタレート、モルホリノェチル (メタ)アタリレート、トリフ ルォロェチル (メタ)アタリレート、テトラフルォロプロピル (メタ)アタリレート、ォクタフル ォロペンチル (メタ)アタリレート、ヘプタデカフルォロドデシル (メタ)アタリレート、トリメ チルシロキシェチル (メタ)アタリレート、 1, 4—ブタンジオールジ (メタ)アタリレート、 1 , 6—へキサンジオールジ (メタ)アタリレート、 1, 9—ノナンジオールジ (メタ)アタリレ ート、ネオペンチルグリコールジ (メタ)アタリレート、テトラエチレングリコールジ (メタ) アタリレート、トリプロピレングリコールジ (メタ)アタリレート、プロピレングリコールジ (メ タ)アタリレート、グリセリンメタタリレートアタリレート、ビスフエノール A, EO付加物ジ( メタ)アタリレート、トリメチロールプロパントリ(メタ)アタリレート、ペンタエリスリトールトリ (メタ)アタリレート、ペンタエリスリトールテトラ (メタ)アタリレート、トリメチロールプロパ ン EO付加物トリ (メタ)アタリレート、グリセリン EO付加物トリ (メタ)アタリレート、トリス( メタ)アタリロイルォキシェチルフォスフェート、ジペンタエリスリトールへキサ(メタ)ァク リレート、ノボラックエポキシの(メタ)アクリル酸変性物、ノボラックエポキシの(メタ)ァ クリル酸及び酸無水物の変性物、 N—ビュルピロリドン、 N—ビュル力プロラタタム、( メタ)アクリル化イソシァヌレート、ジペンタエリスリトールモノヒドロキシペンタ(メタ)ァク リレート、ウレタン (メタ)アタリレート、不飽和ポリエステル (メタ)アタリレートなどが挙げ られる。 [0055] Specifically, for example, isobutyl (meth) acrylate, t-butyl (meth) acrylate, lauryl (meth) acrylate, cetyl (meth) acrylate, stearyl (meth) acrylate, to the mouth Xylyl (meth) acrylate, Isobornyl (meth) acrylate, Benzyl (meth) acrylate, 2-Methoxyethyl (meth) acrylate, 3-Methoxypropyl (meth) acrylate, Ethyl carbitol (Meta) Atalylate, phenoxychetyl (meth) acrylate, tetrahydrofuryl (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, methoxy propylene glycol (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2 —Hydroxypropyl (meth) atalylate, Mono 1— T) Ataliloyloxyshethyl phthalate, Mono 1— (Meth) Atalyloxypropyl phthalate, Mono 1— (Meth) Atyloxypropyl tetrahydrophthalate, Morpholinetyl (Meth) Atari Rate, Trifluoroethyl (meth) acrylate, Tetrafluoropropyl (meth) acrylate, Octafluoropentyl (meth) acrylate, Heptadecafluorododecyl (meth) acrylate, Trimethyl tyrosylkistil (meth) ate , 1,4-Butanediol di (meth) acrylate, 1, 6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, neopentyl glycol di (meth) Atalylate, tetraethylene glycol di (meth) Atallate, tripropylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, glycerine metatalyl acrylate, bisphenol A, EO adduct di (meth) acrylate, trimethylolpropane tri (meta) ) Atalylate, Pentaerythritol Tri (meth) Atalylate, Pentaerythritol Tetra (meth) Atalylate, Trimethylol Propane EO Adduct Tri (Meth) Atalylate, Glycerin EO Adduct Tri (Meth) Atallate, Tris (Metal ) Ataliloyloxetyl phosphate, dipentaerythritol hexa (meth) acrylate, (meth) acrylic acid modification of novolac epoxy, (meth) acrylic acid and acid anhydride modification of novolac epoxy, N—Bulpyrrolidone, N— Interview le force Puroratatamu, (meth) acrylated Isoshianureto, dipentaerythritol monohydroxy penta (meth) § click Relate, urethane (meth) Atari rate, unsaturated polyester (meth) Atari rate and the like.
[0056] [1 3]光重合開始剤  [0056] [1 3] Photopolymerization initiator
本発明の遮光性榭脂組成物に含まれる光重合開始剤は、通常、加速剤と、必要に 応じて添加される増感色素等の付加剤との混合物 (光重合開始剤組成物)として用 いられる。光重合開始剤は、光を直接吸収し、或いは光増感されて分解反応または 水素引き抜き反応を起こし、重合活性ラジカルを発生する機能を有する成分である。  The photopolymerization initiator contained in the light-shielding resin composition of the present invention is usually a mixture (photopolymerization initiator composition) of an accelerator and an additive such as a sensitizing dye added as necessary. Can be used. The photopolymerization initiator is a component having a function of generating a polymerization active radical by directly absorbing light or being photosensitized to cause a decomposition reaction or a hydrogen abstraction reaction.
[0057] 光重合開始剤としては、例えば、特開昭 59— 152396号公報、特開昭 61— 1511 97号各公報に記載のチタノセン化合物を含むメタ口センィ匕合物や、特開平 10— 39 503号公報記載のへキサァリールビイミダゾール誘導体、ハロメチルー s—トリァジン 誘導体、 N フエ-ルグリシン等の N ァリール— a—アミノ酸類、 N ァリール— a —アミノ酸塩類、 N ァリール一 a—アミノ酸エステル類等のラジカル活性剤、 a - ア アルキルフエノン系化合物、特開 2000— 80068号公報、特開 2006— 36750 号公報等に記載されているォキシムエステル系開始剤等が挙げられる。  [0057] Examples of the photopolymerization initiator include meta-octane compounds containing titanocene compounds described in JP-A-59-152396 and JP-A-61-151197, 39 Hexalylbiimidazole derivatives, halomethyl-s-triazine derivatives, N-phenylglycine, etc. N-aryl-a-amino acids, N-aryl-a-amino acid salts, N-aryl-a-amino acid esters And oxime ester initiators described in JP-A 2000-80068, JP-A 2006-36750, and the like.
[0058] 本発明で用いることができる光重合開始剤の具体的な例を以下に列挙する。  [0058] Specific examples of the photopolymerization initiator that can be used in the present invention are listed below.
[0059] 2- (4—メトキシフエ-ル) 4, 6 ビス(トリクロロメチル) s トリァジン、 2— (4— メトキシナフチル) 4, 6—ビス(トリクロロメチル) s トリァジン、 2— (4—エトキシ ナフチル)—4, 6 ビス(トリクロロメチル)—s トリァジン、 2— (4 エトキシカルボ- ルナフチル)—4, 6—ビス(トリクロロメチル)—s トリァジン等のハロメチル化トリアジ ン誘導体; [0059] 2- (4-Methoxyphenyl) 4,6 bis (trichloromethyl) s triazine, 2- (4-methoxynaphthyl) 4,6-bis (trichloromethyl) s triazine, 2- (4-ethoxy naphthyl) ) -4,6 bis (trichloromethyl) -s triazine, 2- (4 ethoxycarbo-naphthalyl) -4,6-bis (trichloromethyl) -s triazine, etc. Derivatives;
[0060] 2 トリクロロメチル— 5— (2' —ベンゾフリル)— 1, 3, 4—ォキサジァゾール、 2— トリクロロメチル一 5—〔 j8 (2' —ベンゾフリル)ビュル〕一 1, 3, 4—ォキサジァゾ一 ル、 2 トリクロロメチル一 5—〔j8— (2' - (6グ 一ベンゾフリル)ビュル)〕一 1, 3, 4 ーォキサジァゾーノレ、 2 トリクロロメチノレー 5—フリノレー 1, 3, 4 ォキサジァゾ一ノレ 等のハロメチル化ォキサジァゾール誘導体;  [0060] 2 Trichloromethyl-5- (2'-benzofuryl)-1, 3, 4-oxoxadiazole, 2-Trichloromethyl 5- 5- [j8 (2'-benzofuryl) bul] 1 1, 3, 4-Oxazazol 1, 2-trichloromethyl 5- (j8- (2 '-(6 benzofuryl) butyl)) 1, 1, 3, 4-oxadiazonole, 2 trichloromethinole 5-furinole 1, 3, 4 Halomethylated oxaziazole derivatives such as oxaziazo monoure;
[0061] 2— (2' —クロ口フエ-ル)一 4, 5 ジフエ-ルイミダソール 2量体、 2— (2' —クロ 口フエ-ル)— 4, 5 ビス(3' —メトキシフエ-ル)イミダゾール 2量体、 2— (2' —フ ルォロフエ-ル)—4, 5 ジフエ-ルイミダゾール 2量体、 2— {2' —メトキシフエ- ル) 4, 5 ジフエ-ルイミダゾール 2量体、(4' —メトキシフエ-ル)— 4, 5 ジフ ェ-ルイミダゾール 2量体等のイミダゾール誘導体;  [0061] 2— (2 '— Black Mouth-Fuel) 1, 4, 5 Diphenol-Limidasol Dimer, 2— (2' — Black Mouth-Fuel) — 4, 5 Bis (3 '— Methoxy-Fuel) ) Imidazole dimer, 2- (2 '-fluorophenol)-4,5 diphenol imidazole dimer, 2- (2'-methoxyphenol) 4, 5 diphenol imidazole dimer, (4′-methoxyphenol) —imidazole derivatives such as 4,5 diphenylimidazole dimer;
[0062] ベンゾインメチルエーテル、ベンゾインフエ-ルエーテル、ベンゾインイソブチルェ 一テル、ベンゾインイソプロピルエーテル等のベンゾインアルキルエーテル類;  [0062] Benzoin alkyl ethers such as benzoin methyl ether, benzoin phenol ether, benzoin isobutyl ether, and benzoin isopropyl ether;
[0063] 2—メチルアントラキノン、 2 ェチルアントラキノン、 2—t ブチルアントラキノン、 1 クロ口アントラキノン等のアントラキノン誘導体;  [0063] Anthraquinone derivatives such as 2-methylanthraquinone, 2-ethyl anthraquinone, 2-t butyl anthraquinone, and 1-mouth anthraquinone;
[0064] ベンゾフエノン、ミヒラーズケトン、 2 メチルベンゾフエノン、 3 メチルベンゾフエノ ン、 4—メチノレべンゾフエノン、 2 クロ口べンゾフエノン、 4 ブロモベンゾフエノン、 2 一力ノレボキシベンゾフエノン等のベンゾフエノン誘導体;  [0064] Benzophenones such as benzophenone, Michler's ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methenolebenzophenone, 2-clobenbenzophenone, 4-bromobenzophenone, 2 Derivatives;
[0065] 2, 2 ジメトキシ一 2 フエ-ルァセトフエノン、 2, 2 ジエトキシァセトフエノン、 1 ーヒドロキシシクロへキシルフェニルケトン、 α—ヒドロキシ 2—メチルフエニルプロ ノ《ノン、 1—ヒドロキシ一 1—メチルェチル一(ρ—イソプロピルフエ-ル)ケトン、 1—ヒ ドロキシ 1一(ρ ドデシルフエ-ル)ケトン、 2—メチルー(4' (メチルチオ)フエ -ル) 2—モルホリノ一 1—プロパノン、 1, 1, 1—トリクロロメチル一(ρ ブチルフエ -ル)ケトン等のァセトフヱノン誘導体;  [0065] 2,2 Dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, α-hydroxy 2-methylphenylpronone << 1-, 1-hydroxy-1- Methylethyl mono (ρ-isopropylphenol) ketone, 1-Hydroxy 1 mono (ρ dodecylphenol) ketone, 2-Methyl- (4 '(methylthio) phenol) 2-Morpholino 1-propanone, 1, 1 1, acetophenone derivatives such as 1-trichloromethyl mono (ρ butylphenol) ketone;
[0066] チォキサントン、 2 ェチルチオキサントン、 2 イソプロピルチォキサントン、 2 ク ロロチォキサントン、 2, 4 ジメチルチオキサントン、 2, 4 ジェチルチオキサントン、 2, 4 ジイソプロピルチオキサントン等のチォキサントン誘導体;  [0066] Thioxanthone derivatives such as thixanthone, 2 ethylthioxanthone, 2 isopropyl thixanthone, 2 chlorothioxanthone, 2,4 dimethylthioxanthone, 2,4 jetylthioxanthone, 2,4 diisopropylthioxanthone;
[0067] ρ ジメチルァミノ安息香酸ェチル、 ρ ジェチルァミノ安息香酸ェチル等の安息香 酸エステル誘導体; [0067] Benzo such as ρ dimethylamino benzoate, ρ ethylamino benzoate Acid ester derivatives;
[0068] 9 フエ-ルァクリジン、 9— (p—メトキシフエ-ル)アタリジン等のアタリジン誘導体; [0069] 9, 10 ジメチルベンズフエナジン等のフエナジン誘導体;  [0068] 9 Aphalidine derivatives such as 9- (p-methoxyphenol) ataridine; [0069] 9, 10 Phenylazine derivatives such as dimethylbenzphenazine;
[0070] ベンズアンスロン等のアンスロン誘導体; [0070] Anthrone derivatives such as benzanthrone;
[0071] ジーシクロペンタジェ-ルー Tiージ一クロライド、ジーシクロペンタジェ-ルー Ti— ビス一フエニル、ジ一シクロペンタジェニル一 Ti—ビス一 2, 3, 4, 5, 6 ペンタフル オロフェニル 1—ィル、ジ一シクロペンタジェニル一 Ti—ビス一 2, 3, 5, 6—テトラ フルオロフェニル 1—ィル、ジ一シクロペンタジェ二ルー Ti—ビス一 2, 4, 6 トリフ ルォロフェニー 1—ィル、ジ一シクロペンタジェ二ルー Ti— 2, 6—ジープルオロフェニ — 1—ィル、ジ一シクロペンタジェニル一 Ti— 2, 4 ジ一フルオロフェニ一 1—ィル、 ジーメチルシクロペンタジェ二ルー Ti—ビス 2, 3, 4, 5, 6 ペンタフルオロフェニ 1 ィル、ジーメチルシクロペンタジェ二ルー Ti—ビス 2, 6 ジ一フルオロフェニ 1ーィノレ、ジーシクロペンタジェニノレー Ti 2, 6 ジーフノレオロー 3 (ピノレー 1 ィル) フエ- 1ーィル等のチタノセン誘導体;  [0071] Dicyclopentadiene Ti-dimonochloride, dicyclopentadiene Ti—bis-monophenyl, di-cyclopentagenyl Ti-bis-1, 2, 4, 4, 5, 6 pentafluorophenyl 1 —Yl, dicyclopentagenyl Ti—bis-1,2,3,5,6-tetrafluorophenyl 1—yl, dicyclopentadienyl Ti—bis1,2,4,6 Trifluoropheny 1 —Yel, Dicyclopentadienyl Ti— 2, 6—Jepur Orofeny — 1—Yel, Dicyclopentagenyl Ti—2, 4 Difluorofluorophenyl 1—Yel, G Methylcyclopentadiene Ti-Bis 2, 3, 4, 5, 6 Pentafluorophenyl 1 yl, Dimethylcyclopentadiene Ti-Bis 2, 6 Difluorophenyl 1-inore, Dicyclopentageninore Ti 2, 6 Jif Noroleo 3 (Pinolei 1 Yil) titanocene derivatives such as Hue-1il;
[0072] 2—メチルー 1 [4 (メチルチオ)フエ-ル ] 2 モルフォリノプロパン 1 オン、 2—ベンジル一 2—ジメチルァミノ一 1— (4—モルフォリノフエ-ル)一ブタノン一 1、 2 -ベンジル - 2-ジメチルァミノ 1— (4 モルフォリノフエ-ル)ブタン一 1 オン、 4 ジメチルアミノエチルベンゾェート、 4 ジメチルァミノイソァミルべンゾェート、 4 —ジェチルアミノアセトフエノン、 4 ジメチルァミノプロピオフエノン、 2 ェチルへキ シル一 1, 4 ジメチルァミノべンゾエート、 2, 5 ビス(4 ジェチルァミノベンザル) シクロへキサノン、 7—ジェチルアミノー 3—(4ージェチルァミノべンゾィル)クマリン、 4 (ジェチルァミノ)カルコン等の aーァミノアルキルフエノン系化合物; [0072] 2-Methyl-1 [4 (Methylthio) phenol] 2 Morpholinopropane 1-one, 2-Benzyl-1-2-Dimethylamino-1- 1- (4-Morpholinol) 1-butanone 1, 2-Benzyl -2-dimethylamino 1- (4 morpholinophenol) butane 1-one, 4 dimethylaminoethyl benzoate, 4 dimethylaminoisoamyl benzoate, 4 — jetylaminoacetophenone, 4 dimethylaminopropi Ofenone, 2-ethyl hexyl 1,4 dimethylaminobenzoate, 2,5 bis (4 ethylaminobenzal) cyclohexanone, 7-jetylamino-3- (4-jetylaminobenzoyl) coumarin, 4 (jetylamino) a-§ aminoalkyl Hue-based compound of chalcone and the like;
[0073] 1, 2—オクタンジオン、 1— [4— (フエ-ルチオ)フエ-ル]— 2— (O ベンゾィルォ キシム)、エタノン、 1— [9 ェチル 6— (2—メチルベンゾィル) 9H—カルバゾー ルー 3—ィル ] 1一(O ァセチルォキシム)等のォキシムエステル系化合物。  [0073] 1, 2—Octanedione, 1— [4— (Ferulthio) phenol] — 2— (O Benzyloxime), Ethanone, 1— [9 Ethyl 6— (2-Methylbenzoyl) 9H—Carbazol [Lu 3-yl] 1) Oxime ester compounds such as 1 (O-acetyloxyme).
[0074] このォキシムエステル系化合物としては、特に以下に例示する化合物を好ましく用 いることがでさる。  [0074] As the oxime ester-based compound, compounds exemplified below are particularly preferably used.
[0075] [化 3] 剛 [9 00] [0075] [Chemical 3] Tsuyoshi [9 00]
Figure imgf000017_0001
Figure imgf000017_0001
Figure imgf000018_0001
これらは 1種を単独で用いてもよぐ 2種以上を併用してもよい。
Figure imgf000018_0001
These may be used alone or in combination of two or more.
なお、本発明における光重合開始剤としては、ォキシムエステル系化合物が特に 好ましい。 [0078] 光重合開始剤組成物を構成する加速剤としては、例えば、 N, N ジメチルァミノ安 息香酸ェチルエステル等の N, N ジアルキルアミノ安息香酸アルキルエステル、 2 メルカプトべンゾチアゾール、 2—メルカプトべンゾォキサゾール、 2—メルカプトべ ンゾイミダゾール等の複素環を有するメルカプト化合物または脂肪族多官能メルカプ ト化合物等が用いられる。 In addition, as a photoinitiator in this invention, an oxime ester type compound is especially preferable. [0078] Examples of the accelerator constituting the photopolymerization initiator composition include N, N dialkylaminobenzoic acid alkyl esters such as N, N dimethylaminobenzoic acid ethyl ester, 2 mercaptobenzozothiazole, 2-mercaptobenzoxazole. Mercapto compounds having a heterocyclic ring such as 2-mercaptobenzoimidazole or aliphatic polyfunctional mercapto compounds are used.
[0079] これら光重合開始剤および加速剤は、それぞれ 1種を単独で用いても良ぐ 2種以 上を混合して用いても良い。  [0079] These photopolymerization initiators and accelerators may be used singly or in combination of two or more.
[0080] 具体的な光重合開始剤組成物としては、例えば、「ファインケミカル」(1991年、 3 月 1曰号、 vol. 20、 No. 4)の第 16〜26頁【こ記載されて!ヽる、ジァノレキノレアセ卜フエ ノン系、ベンゾイン、チォキサントン誘導体等のほか、特開昭 58— 403023号公報、 特公昭 45 - 37377号公報等に記載されて 、る、へキサァリールビイミダゾール系、 S トリノヽロメチルトリアジン系、特開平 4— 221958号公報、特開平 4— 219756号 公報等に記載されている、チタノセンとキサンテン色素、アミノ基またはウレタン基を 有する付加重合可能なエチレン性飽和二重結合含有ィヒ合物を組み合わせた系、等 が挙げられる。  [0080] As a specific photopolymerization initiator composition, for example, "Fine Chemical" (1991, March 1 issue, vol. 20, No. 4), pages 16-26 In addition to the diolenoquinoline phenone series, benzoin, thixanthone derivatives, etc., as described in JP-A-58-403023, JP-B-45-37377, etc. Addition polymerization having a titanocene and a xanthene dye, an amino group or a urethane group described in biimidazole series, S-trinouromethyltriazine series, JP-A-4-221958, JP-A-4-219756, etc. And a system combining ethylenic saturated double bond-containing compounds.
[0081] 上記光重合開始剤組成物の配合割合は、本発明の遮光性榭脂組成物中の全固 形分中、通常 0. 1〜40重量%、好ましくは 0. 5〜30重量%である。この配合割合が 著しく低いと露光光線に対する感度が低下する原因となることがあり、反対に著しく高 いと未露光部分の現像液に対する溶解性が低下し、現像不良を誘起させることがあ る。  [0081] The blending ratio of the photopolymerization initiator composition is usually 0.1 to 40% by weight, preferably 0.5 to 30% by weight in the total solid content in the light-shielding resin composition of the present invention. It is. If the blending ratio is extremely low, the sensitivity to the exposure light may be reduced. Conversely, if the blending ratio is extremely high, the solubility of the unexposed portion in the developing solution is lowered, and development failure may be induced.
[0082] 光重合開始剤組成物には、必要に応じて、感応感度を高める目的で、画像露光光 源の波長に応じた増感色素を配合させることができる。これら増感色素としては、特 開平 4 221958号、同 4— 219756号公報に記載のキサンテン色素、特開平 3— 2 39703号、同 5— 289335号公報に記載の複素環を有するクマリン色素、特開平 3 239703号、同 5— 289335号に記載の 3 ケトクマリンィ匕合物、特開平 6— 1924 0号公報に記載のピロメテン色素、その他、特開昭 47— 2528号、同 54— 155292 号、特公昭 45— 37377号、特開昭 48— 84183号、同 52— 112681号、同 58— 15 503号、同 60— 88005号、同 59— 56403号、特開平 2— 69号、特開昭 57— 1680 88号、特開平 5— 107761号、特開平 5— 210240号、特開平 4— 288818号公報 に記載のジアルキルァミノベンゼン骨格を有する色素等を挙げることができる。 [0082] If necessary, a sensitizing dye corresponding to the wavelength of the image exposure light source can be added to the photopolymerization initiator composition for the purpose of increasing the sensitivity. Examples of these sensitizing dyes include xanthene dyes described in JP-A-4 221958 and JP-A-4-219756, and coumarin dyes having a heterocyclic ring described in JP-A-3-239703 and JP-A-5-289335. Kaihei 3 239703, 3-ketocoumariny compound described in 5-289335, pyromethene dye described in JP 6-19240 A, and others, JP 47-2528, 54-155292, Kosho 45-37377, JP-A-48-84183, JP-A-52-112681, JP-A-58-15503, JP-A-60-88005, JP-A-59-56403, JP-A-2-69, JP-A-57. — 1680 Examples thereof include dyes having a dialkylaminobenzene skeleton described in JP-A No. 88, JP-A-5-107761, JP-A-5-210240, and JP-A-4-288818.
[0083] これらの増感色素のうち好ましいものは、アミノ基含有増感色素であり、更に好まし いものは、アミノ基およびフエ二ル基を同一分子内に有する化合物である。特に、好 ましいのは、例えば、 4, 4'ージメチルァミノべンゾフエノン、 4, 4'ージェチルァミノべ ンゾフエノン、 2 ァミノべンゾフエノン、 4ーァミノべンゾフエノン、 4, 4'ージァミノベン ゾフエノン、 3, 3'—ジァミノべンゾフエノン、 3, 4—ジァミノべンゾフエノン等のベンゾ フエノン系化合物; 2—(p ジメチルァミノフエ-ル)ベンゾォキサゾール、 2—(p ジ ェチルァミノフエ-ル)ベンゾォキサゾール、 2—(p ジメチルァミノフエ-ル)ベンゾ[ 4, 5]ベンゾォキサゾール、 2—(p ジメチルァミノフエ-ル)ベンゾ [6, 7]ベンゾォ キサゾール、 2, 5 ビス(p ジェチルァミノフエ-ル) 1, 3, 4—ォキサゾール、 2— ( p -ジメチルァミノフエ-ル)ベンゾチアゾール、 2— (p ジェチルァミノフエ-ル)ベ ンゾチアゾール、 2- (p ジメチルァミノフエ-ル)ベンズイミダゾール、 2— (ρ ジェ チルァミノフエ-ル)ベンズイミダゾール、 2, 5 ビス(p -ジェチルァミノフエ-ル) 1 , 3, 4ーチアジアゾール、(p ジメチルァミノフエ-ル)ピリジン、(p ジェチルアミノフ ェ -ル)ピリジン、 (p ジメチルァミノフエ-ル)キノリン、 (p ジェチルァミノフエ-ル) キノリン、(p ジメチルァミノフエ-ル)ピリミジン、(p ジェチルァミノフエ-ル)ピリミ ジン等の p ジアルキルアミノフエ-ル基含有ィ匕合物等である。このうち最も好ましい ものは、 4, 4'ージアルキルァミノべンゾフエノンである。増感色素もまた 1種を単独で 用いても良ぐ 2種以上を混合して用いても良い。 [0083] Among these sensitizing dyes, preferred are amino group-containing sensitizing dyes, and more preferred are compounds having an amino group and a phenyl group in the same molecule. Particularly preferred are, for example, 4, 4'-dimethylaminobenzophenone, 4,4'-jetilaminobenzofoenone, 2aminobenzofenone, 4-aminominobenzofoenone, 4,4'-aminoaminobenzofenone, 3,3'-diaminobe. Benzophenone compounds such as nzophenone and 3, 4-diaminobenzophenone; 2- (p dimethylaminophenol) benzoxazole, 2- (p dimethylaminophenol) benzoxazole, 2- (p Dimethylaminophenol) benzo [4,5] benzoxazole, 2- (p dimethylaminophenol) benzo [6,7] benzoxazole, 2,5 bis (p jetylaminophenol) 1, 3, 4-Oxazole, 2- (p-dimethylaminophenol) benzothiazole, 2- (p-demethylaminophenol) benzothiazole, 2- (p dimethylaminophenol) ) Imidazole, 2- (ρ jetylaminophenol) benzimidazole, 2,5 bis (p-jetylaminophenol) 1,3,4-thiadiazole, (p dimethylaminophenol) pyridine, ( (p dimethylaminophenol) pyridine, (p dimethylaminophenol) quinoline, (p dimethylaminophenol) quinoline, (p dimethylaminophenol) pyrimidine, (p cetylaminophenol) P) P-dialkylaminophenol-containing compounds such as pyrimidine. Of these, 4,4′-dialkylaminobenzophenone is most preferred. Sensitizing dyes may also be used alone or in combination of two or more.
[0084] 本発明の遮光性榭脂組成物中に占める増感色素の配合割合は遮光性榭脂組成 物中の全固形分中、通常 0〜20重量%、好ましくは 0〜15重量%、更に好ましくは 0[0084] The blending ratio of the sensitizing dye in the light-shielding resin composition of the present invention is usually 0 to 20% by weight, preferably 0 to 15% by weight, based on the total solid content in the light-shielding resin composition. More preferably 0
〜 10重量%である。 ~ 10% by weight.
[0085] [1 4]カーボンブラック [0085] [1 4] Carbon black
本発明の遮光性榭脂組成物は、平均粒子径が 8nm以上 65nm以下で DBP吸油 量が 90mlZl00g以下のカーボンブラックを必須成分とする。  The light-shielding resin composition of the present invention contains carbon black having an average particle diameter of 8 nm or more and 65 nm or less and a DBP oil absorption of 90 mlZ100 g or less as an essential component.
平均粒子径が上記範囲のカーボンブラックを用いることにより、 OD値(Optical D ensity:光学濃度)が 3. 0〜5. 0となり、高い現像性、解像性、及び密着性に加えて 、コントラストも高いカラーフィルターを提供することができる。また、 DBP吸油量が 90 mlZlOOg以下という、吸油量が比較的少ないカーボンブラックを用いることにより、 現像性、解像性、密着性をより一層向上させることが出来る。 By using carbon black with an average particle size in the above range, the OD value (Optical Density: optical density) is 3.0 to 5.0, in addition to high developability, resolution and adhesion. In addition, a color filter with high contrast can be provided. Further, by using carbon black having a DBP oil absorption of 90 mlZlOOg or less and a relatively small oil absorption, the developability, resolution and adhesion can be further improved.
[0086] カーボンブラックの平均粒子径の下限は、好ましくは 17nm、更に好ましくは 21nm であり、上限は、好ましくは 40nm、更に好ましくは 32nm以下である。カーボンブラッ クの平均粒子径が大きすぎると OD値が低くなり薄膜ィ匕が困難であり、小さすぎると分 散安定性を確保するのが困難である。 [0086] The lower limit of the average particle diameter of carbon black is preferably 17 nm, more preferably 21 nm, and the upper limit is preferably 40 nm, more preferably 32 nm or less. If the average particle size of carbon black is too large, the OD value will be low and thin film will be difficult, and if it is too small, it will be difficult to ensure dispersion stability.
[0087] 本発明におけるカーボンブラックの平均粒子径は数平均粒子径を意味する。 [0087] The average particle size of carbon black in the present invention means the number average particle size.
一般的にカーボンブラックの平均粒子径は電子顕微鏡観察により数万倍で撮影さ れた写真を数視野撮影し、これらの写真の粒子を画像処理装置により 2000〜3000 個程度計測する粒子画像解析により求められる。  In general, the average particle diameter of carbon black is taken by several fields of view of photographs taken at tens of thousands of times by electron microscope observation, and particle image analysis is performed by measuring about 2000 to 3000 particles of these photographs with an image processing device. Desired.
[0088] また、本発明に用いられるカーボンブラックは DBP吸油量は、通常 90mlZlOOg 以下、好ましくは 75ml/100g以下で、通常 40mlZl00g以上、好ましくは 50ml/ lOOg以上である。 [0088] The carbon black used in the present invention has a DBP oil absorption of usually 90 mlZlOOg or less, preferably 75 ml / 100 g or less, and usually 40 mlZl00g or more, preferably 50 ml / lOOg or more.
[0089] カーボンブラックの平均粒子径ゃ吸油量を上記範囲とするためには、例えば重油 を燃焼させてカーボンブラックを製造する際に、カリウム元素を含む無機化合物を系 内に添加するなどの方法を採用することが出来る。  [0089] In order to make the carbon black average particle size and the oil absorption amount within the above range, for example, when producing carbon black by burning heavy oil, a method of adding an inorganic compound containing potassium element into the system, etc. Can be adopted.
[0090] この場合、カーボンブラックの製造に用いられるカリウム元素を含む無機化合物とし ては、例えば、水酸化物、塩化物、硫酸塩、炭酸塩等の無機塩、脂肪酸も含めた有 機酸塩類、金属アルキルのような有機金属化合物が挙げられる。これらのうち、特に 、水酸ィ匕カリウム、塩ィ匕カリウムが好ましく用いられる。これらのカリウム元素を含む無 機化合物は、 1種を単独で用いても良ぐ 2種以上を混合して用いても良い。  [0090] In this case, examples of the inorganic compound containing potassium element used for the production of carbon black include inorganic salts such as hydroxide, chloride, sulfate, carbonate, and organic acid salts including fatty acids. And organometallic compounds such as metal alkyls. Of these, potassium hydroxide and potassium salt are particularly preferably used. These inorganic compounds containing potassium element may be used singly or in combination of two or more.
[0091] これらカリウム元素を含む無機化合物は、カーボンブラック製造工程における雰囲 気中のカジクム元素濃度力 通常 100〜5000ppm、より好まし <は 100〜3000ppm となるような量で添加してカーボンブラックを製造するのがよい。  [0091] These inorganic compounds containing potassium element are added in such an amount that the concentration of cadmium element in the atmosphere in the carbon black production process is usually 100 to 5000 ppm, more preferably <100 to 3000 ppm. It is good to manufacture.
[0092] このようなカリウム元素を含む無機化合物を添加するカーボンブラックの製造方法と しては、具体的には、特開 8— 41377号公報に記載の方法が挙げられる。  [0092] Specific examples of a method for producing carbon black to which an inorganic compound containing potassium element is added include the method described in JP-A-8-41377.
[0093] なお、本発明で用いるカーボンブラックの表面の pHは 5以下、特に 4以下であるこ とが好ましい。カーボンブラックの表面の pHが 5を超えるものでは分散剤が付着しに くいため、分散性が不十分となるおそれがある。カーボンブラックの表面の pHは低い ほど好ましいが、下限値は通常 2以上である。 [0093] The pH of the surface of the carbon black used in the present invention is 5 or less, particularly 4 or less. And are preferred. When the pH of the surface of the carbon black exceeds 5, it is difficult for the dispersant to adhere to the surface, so that the dispersibility may be insufficient. The lower the pH of the carbon black surface, the better, but the lower limit is usually 2 or more.
なお、カーボンブラックの表面の pHは、カーボンブラックの粉体を水に分散させ、 該分散液につき水系の pH測定を行うことにより測定される。  The pH of the surface of carbon black is measured by dispersing carbon black powder in water and measuring the aqueous pH of the dispersion.
[0094] 本発明で用いるカーボンブラックの例としては、以下のようなカーボンブラックが挙 げられる。 [0094] Examples of the carbon black used in the present invention include the following carbon black.
[0095] 三菱ィ匕学社製: MA7、 MA8、 MA11、 MA100、 MA100R、 MA220、 MA230、 MA600、 #20、 #25、 #30、 #32、 #33、 #40、 #44、 #45、 #47、 #50、 # 52、 #55、 #650、 #750、 #850、 #950、 #960、 #970、 #980、 #990、 #1 000、 #2200、 #2300、 #2350、 #2400、 #2600、 #3050、 #3150、 #325 0、 #3600、 #3750、 #3950、 #4000、 OIL7B, OIL9B, OIL11B, OIL30B, OIL31  [0095] Made by Mitsubishi Kaisha: MA7, MA8, MA11, MA100, MA100R, MA220, MA230, MA600, # 20, # 25, # 30, # 32, # 33, # 40, # 44, # 45, # 47, # 50, # 52, # 55, # 650, # 750, # 850, # 950, # 960, # 970, # 980, # 990, # 1 000, # 2200, # 2300, # 2350, # 2400, # 2600, # 3050, # 3150, # 325 0, # 3600, # 3750, # 3950, # 4000, OIL7B, OIL9B, OIL11B, OIL30B, OIL31
[0096] デグサ社製: Printex3、 Printex30P、 Printex30、 Printex30OP、 Printex40、 Printex45、 Printex55、 Printex60、 Printex75、 Printex80、 Printex85、 Prin tex90、 Printex A、 Printex L、 Printex G、 Printex P、 Printex U、 Printe x V、 PrintexG、 SpecialBlack550、 SpecialBlack350、 SpecialBlack250、 Sp ecialBlackl00、 SpecialBlack6、 SpecialBlack5、 SpecialBlack4、 Color Blac k FW1、 Color Black FW2、 Color Black FW2V、 Color Black FW18、 C olor Black FW18、 Color Black FW200、 Color Black S 160、 Color Bla ck S170  [0096] Degussa: Printex3, Printex30P, Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Prin tex90, Printex A, Printex L, Printex G, Printex P, Printex U, Printex V , PrintexG, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlackl00, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW18, Color Black FW200, Color Black S 160, Color Bla ck S170
[0097] キャボット社製: Monarchl20、 Monarch280、 Monarch460、 Monarch800、 M onarch880、 Monarch900、 MonarchlOOO, MonarchllOO, Monarchl300、 Monarchl400、 Monarch4630、 REGAL99、 REGAL99R、 REGAL415、 RE GAL415Rゝ REGAL250、 REGAL250Rゝ REGAL330、 REGAL400Rゝ REG AL55R0, REGAL660R、 BLACK PEARLS480、 PEARLS 130, VULCAN XC72Rゝ ELFTEX-8  [0097] Manufactured by Cabot: Monarchl20, Monarch280, Monarch460, Monarch800, Monarch880, Monarch900, MonarchlOOO, MonarchllOO, Monarchl300, Monarchl400, Monarch4630, REGAL99, REGAL99R, REGAL415, RE GAL415R 、 REGAL250, REGAL250RREGAL REGAL660R, BLACK PEARLS480, PEARLS 130, VULCAN XC72R ゝ ELFTEX-8
[0098] コロンビヤン カーボン社製: RAVEN11、RAVEN14、RAVEN15、RAVEN16、 RAVEN22RAVEN30, RAVEN35、 RAVEN40、 RAVEN410, RAVEN420 、 RAVEN450, RAVEN500, RAVEN760, RAVEN 780RAVEN850, RAVE N890H、 RAVEN1000, RAVEN1020, RAVEN1060U, RAVEN1080U, R AVEN 11 OOURAVEN 1040 , RAVEN1060U, RAVEN1080U, RAVEN117 0、 RAVEN 1190U, RAVEN1250, RAVEN 1500, RAVEN2000, RAVEN2 500U、 RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVE N7000 [0098] Colombian Carbon Corporation: RAVEN11, RAVEN14, RAVEN15, RAVEN16, RAVEN22RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN760, RAVEN 780RAVEN850, RAVE N890H, RAVEN1000, RAVEN1020, RAVEN1060U, RAVEN1080U, R AVEN 11 OOURAVEN 1040, RAVEN1060U, RAVEN1080U, RAVEN117 0, VEN1080U, RAVEN117 0 , RAVEN2000, RAVEN2 500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVE N7000
[0099] 本発明の遮光性榭脂組成物中の全固形分量に対するカーボンブラックの割合は、 通常 1〜90重量%、好ましくは 5〜80重量%、更に好ましくは 10〜70重量%、特に 好ましくは 40〜70重量%である。カーボンブラックの含有割合が少なすぎると、着色 力が低くなり、色濃度に対して膜厚が厚くなりすぎて、液晶セルィ匕の際のギャップ制 御などに悪影響を及ぼす。また、逆にカーボンブラックの含有割合が多すぎると、分 散安定性が悪ィ匕し、再凝集や増粘等の問題が起きる危険性がある。  [0099] The ratio of the carbon black to the total solid content in the light-shielding resin composition of the present invention is usually 1 to 90% by weight, preferably 5 to 80% by weight, more preferably 10 to 70% by weight, particularly preferably. Is 40 to 70% by weight. If the carbon black content is too small, the coloring power will be low, the film thickness will be too thick for the color density, and this will adversely affect the gap control during liquid crystal cell. On the other hand, if the content of carbon black is too large, the dispersion stability deteriorates and there is a risk of problems such as re-aggregation and thickening.
[0100] [1 5]その他の色材成分  [0100] [1 5] Other colorant ingredients
本発明の遮光性榭脂組成物は、上記カーボンブラックに加え、本発明の効果を損 なわな 、程度に、その他の色材成分を含有して 、てもよ 、。  The light-shielding resin composition of the present invention may contain other colorant components to the extent that the effects of the present invention are not impaired in addition to the carbon black.
[0101] その他の色材としては、染顔料が使用できるが、耐熱性、耐光性等の点から顔料が 好ましい。なお、顔料は、平均粒径 0. 5 /z m以下、好ましくは 0. 1 μ m以下に分散し て用いるのが好ましい。  [0101] As other colorants, dyes and pigments can be used, but pigments are preferred from the viewpoint of heat resistance, light resistance, and the like. The pigment is preferably used dispersed in an average particle size of 0.5 / z m or less, preferably 0.1 μm or less.
[0102] 顔料は、黒色顔料を単独で用いても良ぐ赤、緑、青等の色材を混合して黒色顔料 としたものを用いても良い。また、これら顔料は無機または有機の顔料から適宜選択 することができる。  [0102] As the pigment, a black pigment may be used by mixing a color material such as red, green, or blue, which may be used alone. These pigments can be appropriately selected from inorganic or organic pigments.
[0103] 単独使用可能な黒色顔料としては、アセチレンブラック、ランプブラック、ボーンブラ ック、黒鉛、鉄黒 (酸ィ匕鉄系黒色顔料)、ァ-リンブラック、シァニンブラック、チタンブ ラック等が挙げられる。  [0103] Examples of black pigments that can be used alone include acetylene black, lamp black, bone black, graphite, iron black (acid-iron iron black pigment), alin black, cyanine black, and titanium black. It is done.
[0104] 例えば、チタンブラックとしては、二酸化チタンと金属チタンの混合体を還元雰囲気 下で加熱し還元させる方法 (特開昭 49— 5432号公報)、四塩ィ匕チタンの高温加水 分解で得られた超微細二酸化チタンを水素を含む還元雰囲気中で還元する方法( 特開昭 57— 205322号公報)、二酸ィ匕チタンまたは水酸ィ匕チタンをアンモニア存在 下で高温還元する方法 (特開昭 60— 65069号公報、特開昭 61— 201610号公報) 、二酸ィ匕チタンまたは水酸ィ匕チタンにバナジウム化合物を付着させ、アンモニア存在 下で高温還元する方法 (特開昭 61— 201610号公報)、などの方法で製造されたも のが挙げられるが、これらに限定されるものではな!/、。 [0104] For example, titanium black can be obtained by heating and reducing a mixture of titanium dioxide and metallic titanium in a reducing atmosphere (Japanese Patent Laid-Open No. 49-5432), and by high-temperature hydrolysis of tetrasalt titanium. To reduce the obtained ultrafine titanium dioxide in a reducing atmosphere containing hydrogen ( JP-A-57-205322), high-temperature reduction of titanium dioxide or titanium hydroxide in the presence of ammonia (JP-A-60-65069, JP-A-61-201610), Examples thereof include a method in which a vanadium compound is attached to titanium dioxide dihydrate or titanium hydroxide hydroxide and reduced at high temperature in the presence of ammonia (Japanese Patent Laid-Open No. 61-201610). It ’s not limited to these! /
[0105] チタンブラックの市販品の例としては、三菱マテリアル社製チタンブラック 10S、 12 Sゝ 13Rゝ 13Mゝ 13M— C等力挙げられる。  [0105] Examples of commercially available titanium black include Titanium Black 10S, 12S 13R 13M 13M-C, etc., manufactured by Mitsubishi Materials Corporation.
[0106] また、赤色、緑色、青色の三色の有機顔料を混合して黒色顔料として用いることも でき、硫酸バリウム、硫酸鉛、酸化チタン、黄色鉛、ベンガラ、酸ィ匕クロム等を用いるこ とちでさる。  [0106] In addition, organic pigments of three colors, red, green, and blue, can be mixed and used as black pigments. Barium sulfate, lead sulfate, titanium oxide, yellow lead, red iron, chromium oxide, etc. can be used. Tochidaru.
[0107] 黒色顔料を調製するために混合使用可能な色材としては、ビクトリアピュアブルー( 42595)、オーラミン 0 (41000)、カチロンブリリアントフラビン(ベーシック 13)、ロー ダミン 6GCP (45160)、ローダミン B (45170)、サフラニン OK70 : 100 (50240)、ェ リオグラウシン X (42080)、 No. 120Zリオノールイェロー(21090)、リオノールイエ ロー GRO (21090)、シムラーファーストイェロー 8GF (21105)、ベンジジンイェロー 4T—564D (21095)、シムラーファーストレッド 4015 (12355)、リオノールレッド 7B 4401 (15850)、ファース卜ゲンブルー TGR—L (74160)、ジオノールブルー SM (2 6150)、リオノールブルー ES (ビグメントブルー 15 : 6)、リオノーゲンレッド GD (ビグメ ントレッド 168)、リオノールグリーン 2YS (ビグメントグリーン 36)等が挙げられる(なお 、上記の( )内の数字は、カラーインデックス (C. I. )を意味する)。  [0107] Color materials that can be mixed to prepare a black pigment include Victoria Pure Blue (42595), Auramin 0 (41000), Catillon Brilliant Flavin (Basic 13), Rhodamine 6GCP (45160), Rhodamine B (45170), Safranin OK70: 100 (50240), Ellioglaucin X (42080), No. 120Z Lionol Yellow (21090), Lionol Yellow GRO (21090), Shimla First Yellow 8GF (21105), Benzine Yellow 4T—564D ( 21095), Shimla First Red 4015 (12355), Lionol Red 7B 4401 (15850), Firth Gen Blue TGR—L (74160), Dionol Blue SM (2 6150), Lionol Blue ES (Vigment Blue 15: 6 ), Lionogen Red GD (Vigment Red 168), Lionol Green 2YS (Vigment Green 36), etc. (The numbers in parentheses above are Color index (C. I.) means).
[0108] また、更に他の混合使用可能な顔料について C. I.ナンバーにて示すと、例えば、 C. I.黄色顔料 20、 24, 86, 93, 109、 110、 117, 125, 137, 138, 147, 148, 1 53、 154、 166、 C. I.オレンジ顔料 36、 43、 51、 55、 59、 61、 C. I.赤色顔料 9、 9 7、 122、 123、 149、 168、 177、 180、 192、 215、 216、 217、 220、 223、 224、 2 26、 227、 228、 240、 C. I.ノィォレツ卜顔料 19、 23、 29、 30、 37、 40、 50、 C. I. 青色顔料 15、 15 : 1、 15 :4, 22、 60、 64, C. I.緑色顔料 7、 C. I.ブラウン顔料 23 、 25、 26等を挙げることができる。  [0108] Further, other pigments that can be used in combination are represented by CI numbers. For example, CI yellow pigments 20, 24, 86, 93, 109, 110, 117, 125, 137, 138, 147, 148, 1 53, 154, 166, CI orange pigment 36, 43, 51, 55, 59, 61, CI red pigment 9, 9 7, 122, 123, 149, 168, 177, 180, 192, 215, 216, 217, 220, 223, 224, 2 26, 227, 228, 240, CI Neolet Pigment 19, 23, 29, 30, 37, 40, 50, CI Blue Pigment 15, 15: 1, 15: 4, 22, 60, 64, CI green pigment 7, CI brown pigment 23, 25, 26 and the like.
[0109] 更に、その他の公知の青色顔料、緑色顔料、赤色顔料、黄色顔料、紫色顔料、ォ レンジ顔料、ブラウン顔料、黒色顔料等各種の色の顔料を使用することができる。ま た、その構造としてはァゾ系、フタロシアニン系、キナクリドン系、ベンズイミダゾロン系 、イソインドリノン系、ジォキサジン系、インダンスレン系、ペリレン系等の有機顔料の 他に種々の無機顔料等も利用可能である。以下に、使用できる顔料の具体例をビグ メントナンバーで示す。なお、以下に挙げる「C. I.」は、カラーインデックス (C. I. )を 意味する。 [0109] Further, other known blue pigments, green pigments, red pigments, yellow pigments, purple pigments, oranges, Various color pigments such as range pigments, brown pigments, and black pigments can be used. In addition to organic pigments such as azo, phthalocyanine, quinacridone, benzimidazolone, isoindolinone, dioxazine, indanthrene, and perylene, various inorganic pigments can be used. Is available. Specific examples of pigments that can be used are shown below as pigment numbers. The following “CI” means the color index (CI).
[0110] 赤色顔料としては、 C. I.ピグメントレッド 1、 2、 3、 4、 5、 6、 7、 8、 9、 12、 14、 15、 16、 17、 21、 22、 23、 31、 32、 37、 38、 41、 47、 48、 48:1、 48:2、 48:3、 48:4 、 49、 49:1、 49:2、 50:1、 52:1、 52:2、 53、 53:1、 53:2、 53:3、 57、 57:1、 57 :2、 58:4、 60、 63、 63:1、 63:2、 64、 64:1、 68、 69、 81、 81:1、 81:2、 81:3、 81:4、 83、 88、 90:1、 101、 101:1、 104、 108、 108:1、 109、 112、 113、 114、 122、 123、 144、 146、 147、 149、 151、 166、 168、 169、 170、 172、 173、 174 、 175、 176、 177、 178、 179、 181、 184、 185、 187、 188、 190、 193、 194、 20 0、 202、 206、 207、 208、 209、 210、 214、 216、 220、 221、 224、 230、 231、 2 32、 233、 235、 236、 237、 238、 239、 242、 243、 245、 247、 249、 250、 251、 253、 254、 255、 256、 257、 258、 259、 260、 262、 263、 264、 265、 266、 267 、 268、 269、 270、 271、 272、 273、 274、 275、 276を挙げ、ること力 Sできる。この中 でも、好ましくは C. I.ビグメントレッド 48:1、 122、 168、 177、 202、 206、 207、 20 9、 224、 242、 254、更に好ましく ίま C. I.ピグメントレッド 177、 209、 224、 254を挙 げることができる。  [0110] CI pigment red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37 , 38, 41, 47, 48, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 50: 1, 52: 1, 52: 2, 53, 53 : 1, 53: 2, 53: 3, 57, 57: 1, 57: 2, 58: 4, 60, 63, 63: 1, 63: 2, 64, 64: 1, 68, 69, 81, 81 : 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144 , 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 20 0, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247 , 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 26 7 268 269 270 271 272 273 274 275 Of these, CI CI Pigment Red 48: 1, 122, 168, 177, 202, 206, 207, 209, 224, 242, 254, more preferably ί CI Pigment Red 177, 209, 224, 254 are preferably used. I can list them.
[0111] 青色顔料としては、 C. I.ピグメントブノレ一 1、 1:2、 9、 14、 15、 15:1、 15:2、 15:  [0111] Blue pigments include C. I. Pigment Benore 1, 1: 2, 9, 14, 15, 15: 1, 15: 2, 15:
3、 15:4、 15:6、 16、 17、 19、 25、 27、 28、 29、 33、 35、 36、 56、 56:1、 60、 61 、61:1、 62、 63、 66、 67、 68、 71、 72、 73、 74、 75、 76、 78、 79を挙げ、ること力 Sで きる。この中でも、好ましくは C. I.ピグメントブノレ一 15、 15:1、 15:2、 15:3、 15:4、 15:6、更に好ましくは C. I.ビグメントブルー 15 :6を挙げることができる。  3, 15: 4, 15: 6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79. Among these, C.I. pigment blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, and more preferably C.I. pigment blue 15: 6 can be mentioned.
[0112] 緑色顔料としては、 C. I.ピグメントグリーン 1、 2、 4、 7、 8、 10、 13、 14、 15、 17、 1 8、 19、 26、 36、 45、 48、 50、 51、 54、 55を挙げ、ること力 Sできる。この中でも、好まし くは C. I.ビグメントグリーン 7、 36を挙げることができる。 [0113] 黄色顔料としては、 C. I.ピグメントイエロー 1、 1: 1、 2、 3、 4、 5、 6、 9、 10、 12、 13 、 14、 16、 17、 24、 31、 32、 34、 35、 35 : 1、 36、 36 : 1、 37、 37 : 1、 40、 41、 42、 43、 48、 53、 55、 61、 62、 62 : 1、 63、 65、 73、 74、 75, 81、 83、 87、 93、 94、 95 、 97、 100、 101、 104、 105、 108、 109、 110、 111、 116、 117、 119、 120、 126 、 127、 127 : 1、 128、 129、 133、 134、 136、 138、 139、 142、 147、 148、 150、 151、 153、 154 [0112] Examples of green pigments include CI Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 1 8, 19, 26, 36, 45, 48, 50, 51, 54, You can raise 55 and have the power S. Among these, CI pigment green 7 and 36 are preferable. [0113] CI pigment yellow 1, 1: 1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75, 81 , 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133 , 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154
、 155、 157、 158、 159、 160、 161、 162、 163、 164、 165、 166、 167、 168、 16 9、 170、 172、 173、 174、 175、 176、 180、 181、 182、 183、 184、 185、 188、 1 89、 190、 191、 191 : 1、 192、 193、 194、 195、 196、 197、 198、 199、 200、 20 2、 203、 204、 205、 206、 207、 208を挙げ、ること力 Sできる。この中でも、好ましくは C. I.ビグメントイエロー 83、 117、 129、 138、 139、 150、 154、 155、 180、 185、 更に好ましくは C. I.ビグメントイエロー 83、 138、 139、 150、 180を挙げ、ること力 Sで きる。  , 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 16 9, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 1 89, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 20 2, 203, 204, 205, 206, 207, 208 Speaking power is able to S. Among these, CI pigment yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185 is preferable, and CI pigment yellow 83, 138, 139, 150, 180 is more preferable. Force S is possible.
[0114] 才レンジ顔料としては、 C. I.ピグメント才レンジ 1、 2、 5、 13、 16、 17、 19、 20、 21 、 22、 23、 24、 34、 36、 38、 39、 43、 46、 48、 49、 61、 62、 64、 65、 67、 68、 69 、 70、 71、 72、 73、 74、 75、 77、 78、 79を挙げ、ること力 Sできる。この中でも、好ましく は、 C. I.ビグメントオレンジ 38、 71を挙げることができる。  [0114] CI pigment range 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79 Among these, C.I. Pigment Orange 38 and 71 are preferable.
[0115] 紫色顔料としては、 C. I.ビグメントバイオレット 1、 1 : 1、 2、 2 : 2、 3、 3 : 1、 3 : 3、 5、 5 : 1、 14、 15、 16、 19、 23、 25、 27、 29、 31、 32、 37、 39、 42、 44、 47、 49、 50 を挙げることができる。この中でも、好ましくは C. I.ビグメントバイオレット 19、 23、更 に好ましくは C. I.ビグメントバイオレット 23を挙げることができる。  [0115] Purple pigments include CI pigment violet 1, 1: 1, 2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. Among these, C.I. pigment violet 19, 23 is preferable, and C.I. pigment violet 23 is more preferable.
[0116] また、その他の色材として使用できる染料としては、ァゾ系染料、アントラキノン系染 料、フタロシアニン系染料、キノンィミン系染料、キノリン系染料、ニトロ系染料、カル ボニル系染料、メチン系染料等が挙げられる。  [0116] Other dyes that can be used as colorants include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinonimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes. Etc.
[0117] ァゾ系染料としては、例えば、 C. I.アシッドイェロー 11、 C. I.アシッドオレンジ 7、 C. I.アシッドレッド 37、 C. I.アシッドレッド 180、 C. I.アシッドブノレー 29、 C. I.ダ ィレクトレッド 28、 C. I.ダイレクトレッド 83、 C. I.ダイレクトイェロー 12、 C. I.ダイレ タトオレンジ 26、 C. I.ダイレクトグリーン 28、 C. I.ダイレクトグリーン 59、 C. I.リアク ティブイェロー 2、 C. I.リアクティブレッド 17、 C. I. リアクティブレッド 120、 C. I.リア クティブブラック 5、 C. I.デイスパースオレンジ 5、 C. I.デイスパースレッド 58、 C. I. デイスパースブルー 165、 C. I.ベーシックブルー 41、 C. I.ベーシックレッド 18、 C. I.モルダントレッド 7、 C. I.モルダントイエロー 5、 C. I.モルダントブラック 7等が挙げ られる。 [0117] Examples of azo dyes include CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Benolet 29, CI Direct Red 28, CI Direct Red 83, CI Direct Yellow 12 , CI direct orange 26, CI direct green 28, CI direct green 59, CI reac Tib Yellow 2, CI Reactive Red 17, CI Reactive Red 120, CI Reactive Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Disperse Blue 165, CI Basic Blue 41, CI Basic Red 18, CI Mordant Red 7, CI Mordant Yellow 5, CI Mordant Black 7 and the like.
[0118] アントラキノン系染料としては、例えば、 C. I.バットブルー 4、 C. I.アシッドブルー 40、 C. I.アシッドグリーン 25、 C. I.リアクティブブルー 19、 C. I. リアクティブブル 一 49、 C. I.デイスパースレッド 60、 C. I.デイスパースブルー 56、 C. I.デイスパー スブルー 60等が挙げられる。  [0118] Examples of anthraquinone dyes include CI Bat Blue 4, CI Acid Blue 40, CI Acid Green 25, CI Reactive Blue 19, CI Reactive Blue 49, CI Disperse Red 60, CI Disperse Blue 56 CI Days Purse Blue 60 etc.
[0119] この他、フタロシアニン系染料として、例えば、 C. I.パッドブルー 5等力 キノンイミ ン系染料として、例えば、 C. I.ベーシックブルー 3、 C. I.ベーシックブルー 9等が、 キノリン系染料として、例えば、 C. I.ソルベントイェロー 33、 C. I.アシッドイェロー 3 、 C. I.デイスパースィエロー 64等力 ニトロ系染料として、例えば、 C. I.アシッドィ エロー 1、 C. I.アシッドオレンジ 3、 C. I.デイスパースィエロー 42等が挙げられる。  In addition, as phthalocyanine dyes, for example, CI pad blue 5 isotropic quinone imine dyes, for example, CI basic blue 3, CI basic blue 9, etc., as quinoline dyes, for example, CI solvent yellow 33 CI Acid Yellow 3, CI Disperse Yellow 64 Isotropic Nitro dyes include, for example, CI Acid Yellow 1, CI Acid Orange 3, CI Disperse Yellow 42, and the like.
[0120] 本発明の遮光性榭脂組成物中の全固形分量に対するその他の色材の割合は、通 常 0〜8重量%、好ましくは 0〜4重量%、更に好ましくは 0〜2重量%である。色材の 含有割合が多すぎると、分散安定性が悪化し、再凝集や増粘等の問題が起きる危険 '性がある。  [0120] The ratio of the other coloring material to the total solid content in the light-shielding rosin composition of the present invention is usually 0 to 8% by weight, preferably 0 to 4% by weight, more preferably 0 to 2% by weight. It is. If the content of the coloring material is too large, the dispersion stability deteriorates and there is a risk of problems such as reaggregation and thickening.
[0121] [1 6]分散剤  [0121] [1 6] Dispersant
本発明の遮光性榭脂組成物は、カーボンブラック等の顔料を微細に分散させ、且 つ、その分散状態を安定化させることが品質安定上重要なため、分散剤を配合する のが望ましい。  In the light-shielding resin composition of the present invention, since it is important for quality stability to finely disperse a pigment such as carbon black and stabilize the dispersion state, it is desirable to add a dispersant.
[0122] 分散剤としては、ノ-オン、カチオン、ァ-オン等の界面活性剤、高分子分散剤等 が挙げられるが、なかでも、高分子分散剤が好ましぐ特に 1級、 2級、若しくは 3級ァ ミノ基、ピリジン、ピリミジン、ピラジン等の含窒素へテロ環等の塩基性官能基を有する 高分子分散剤 (本発明にお ヽて、このような塩基性官能基を有する高分子分散剤を 「塩基性高分子分散剤」と称す。 )が有利に使用される。  [0122] Examples of the dispersant include surfactants such as non-one, cation, and ar-on, and polymer dispersants. Among them, polymer dispersants are particularly preferred, especially the first and second grades. Or a polymer dispersant having a basic functional group such as a tertiary amino group, nitrogen-containing heterocycle such as pyridine, pyrimidine, pyrazine, etc. (in the present invention, a high molecular weight dispersant having such a basic functional group). The molecular dispersant is referred to as “basic polymer dispersant.”) Is advantageously used.
[0123] 塩基性高分子分散剤としては、ウレタン系分散剤、ポリエチレンイミン系分散剤、ポ リアリルアミン系分散剤、アクリル系分散剤などが挙げられるが、ウレタン系分散剤が 好ましぐ例えば、ポリイソシァネートイ匕合物と、同一分子内に水酸基を 1個または 2個 有する化合物と、同一分子内に活性水素と 3級アミノ基を有する化合物とを反応させ ることによって得られる高分子分散剤等が挙げられる。 [0123] Basic polymer dispersants include urethane-based dispersants, polyethyleneimine-based dispersants, Examples include urethane-based dispersants and acrylic dispersants. Urethane-based dispersants are preferred, for example, polyisocyanate compounds and compounds having one or two hydroxyl groups in the same molecule. And a polymer dispersant obtained by reacting an active hydrogen with a compound having a tertiary amino group in the same molecule.
[0124] 上記のポリイソシァネートイ匕合物の例としては、パラフエ-レンジイソシァネート、 2, 4 トリレンジイソシァネート、 2, 6 トリレンジイソシァネート、 4, 4' —ジフエ-ルメタ ンジイソシァネート、ナフタレン 1, 5 ジイソシァネート、トリジンジイソシァネート等 の芳香族ジイソシァネート、へキサメチレンジイソシァネート、リジンメチルエステルジ イソシァネート、 2, 4, 4 トリメチルへキサメチレンジイソシァネート、ダイマー酸ジィ ソシァネート等の脂肪族ジイソシァネート、イソホロンジイソシァネート、 4, 4' ーメチ レンビス(シクロへキシルイソシァネート)、 ω , ω ' —ジイソシネートジメチルシクロへ キサン等の脂環族ジイソシァネート、キシリレンジイソシァネート、 a , a , a ' , a ' ーテトラメチルキシリレンジイソシァネート等の芳香環を有する脂肪族ジイソシァネー ト、リジンエステルトリイソシァネート、 1, 6, 11—ゥンデカントリイソシァネート、 1, 8— ジイソシァネート一 4—イソシァネートメチルオクタン、 1, 3, 6 へキサメチレントリイソ シァネート、ビシクロヘプタントリイソシァネート、トリス(イソシァネートフエ-ルメタン)、 トリス (イソシァネートフエ-ル)チォホスフェート等のトリイソシァネート、およびこれら の三量体、水付加物、およびこれらのポリオール付加物等が挙げられる。ポリイソシァ ネートとして好ましいのは有機ジイソシァネートの三量体で、最も好ましいのはトリレン ジイソシァネートの三量体とイソホロンジイソシァネートの三量体である。これらのポリ イソシァネートイ匕合物は 1種を単独で用いても、 2種以上を併用してもよい。 [0124] Examples of the above polyisocyanate compounds include para-phenolic diisocyanate, 2,4 tolylene diisocyanate, 2,6 tolylene diisocyanate, 4, 4 ' Aromatic diisocyanates such as rumethane diisocyanate, naphthalene 1,5 diisocyanate, tolidine diisocyanate, hexamethylene diisocyanate, lysine methyl ester diisocyanate, 2, 4, 4 trimethylhexamethylene diisocyanate , Aliphatic diisocyanates such as dimer acid diisocyanate, isophorone diisocyanate, 4, 4'-methylenebis (cyclohexyl isocyanate), ω, ω '— diisocyanate dimethylcyclohexane, etc. , Xylylene diisocyanate, a, a, a ', a'-tetramethylxylylene diiso Aliphatic diisocyanates having an aromatic ring such as cyanate, lysine ester triisocyanate, 1,6,11-undecane triisocyanate, 1,8-diisocyanate 1-4-isocyanate methyloctane, 1, 3 , 6 Triisocyanates such as hexamethylene triisocyanate, bicycloheptane triisocyanate, tris (isocyanate phenol), tris (isocyanate phenol) thiophosphate, and trimers thereof , Water adducts, and these polyol adducts. Preferred as the polyisocyanate are trimers of organic diisocyanate, and most preferred are trimer of tolylene diisocyanate and trimer of isophorone diisocyanate. These polyisocyanate compounds may be used alone or in combination of two or more.
[0125] ポリイソシァネートの三量体の製造方法としては、適当な三量化触媒、例えば第 3 級ァミン類、ホスフィン類、アルコキシド類、金属酸化物、カルボン酸塩類等を用いて 上記ポリイソシァネート類のイソシァネート基の部分的な三量ィ匕を行 、、触媒毒の添 加により三量ィ匕を停止させた後、未反応のポリイソシァネートを溶剤抽出、薄膜蒸留 により除去して目的のイソシァヌレート基含有ポリイソシァネートを得る方法が挙げら れる。 [0125] The polyisocyanate trimer is produced by using a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, carboxylates and the like. After partial trimerization of the isocyanate group of cyanate was stopped and the trimer was stopped by adding catalyst poison, unreacted polyisocyanate was removed by solvent extraction and thin-film distillation. And a method for obtaining the desired isocyanurate group-containing polyisocyanate.
[0126] 同一分子内に水酸基を 1個または 2個有する化合物としては、ポリエーテルグリコー ルル、、ポポリリエエスステテルルググリリココーールル、、ポポリリカカーーボボネネーートトググリリココーールル、、ポポリリオオレレフフイインンググリリココーールル等等 、、おおよよびびここれれららのの化化合合物物のの片片末末端端水水酸酸基基がが炭炭素素数数 11〜〜2255ののアアルルキキルル基基ででアアルルココキキシシ 化化さされれたたもものの、、おおよよびびここれれらら 22種種類類以以上上のの混混合合物物がが挙挙げげらられれるる。。 [0126] The compound having one or two hydroxyl groups in the same molecule includes polyether glycol Lupoli, Poplarie Este Lug Grilicor, Lunar, Polypoli Carbobonate Toglylico Corle, Poplario Olef Fining Grilicor, etc. The hydroxyl group at the terminal end of the chemical compound of these is an aralkoxyl group having 11 to 2255 carbon atoms and having been aralkoxylated. However, and more and more than 22 types of mixed compounds are listed. .
[0127] ポポリリエエーーテテルルググリリココーールルととししててはは、、ポポリリエエーーテテルルジジオオーールル、、ポポリリエエーーテテルルエエスステテルルジジ オオーールル、、おおよよびびここれれらら 22種種類類以以上上のの混混合合物物がが挙挙げげらられれるる。。  [0127] As for Poplarie-Etter Lug Gryricoeur, Poplarie-Etélélé Giorgiaur, Pope-Polylier Ete-Terre-Estel-Lugegi-Oleur, and many more There are more than 22 kinds of mixed mixtures. .
[0128] ポポリリエエーーテテルルジジオオーールルととししててはは、、アアルルキキレレンンォォキキシシドドをを単単独独ままたたはは共共重重合合ささせせてて得得らら れれるるもものの、、例例ええばばポポリリエエチチレレンンググリリココーールル、、ポポリリププロロピピレレンンググリリココーールル、、ポポリリエエチチレレンンーーププ ロロピピレレンンググリリココーールル、、ポポリリオオキキシシテテトトララメメチチレレンンググリリココーールル、、ポポリリオオキキシシへへキキササメメチチレレンンググリリ ココーールル、、ポポリリオオキキシシオオタタタタメメチチレレンンググリリココーールル、、おおよよびびそそれれららのの 22種種以以上上のの混混合合物物がが挙挙 げげらられれるる。。 [0128] As for poplarie ether rugidiool, it can be obtained by alone or co-polymerizing aralkylkilenlenoxydoxide alone. For example, poplarie ethylylene glycocorol, poplar lip propyripe licoric corn poplar Alligatorium, poplario oxytite tetra la methicilleren gurico korul,, Poplario oxychet hexanthame melylen licorice,, Poplario oxysio A mixture of more than 22 of these and more can be enumerated. .
[0129] ポポリリエエーーテテルルエエスステテルルジジオオーールルととししててはは、、エエーーテテルル基基含含有有ジジオオーールルももししくくはは他他ののダダリリ ココーールルととのの混混合合物物ををジジカカルルボボンン酸酸ままたたははそそれれららのの無無水水物物とと反反応応ささせせるる力力、、ままたたははポポリリ エエスステテルルググリリココーールルににアアルルキキレレンンォォキキシシドドをを反反応応ささせせるるここととにによよっってて得得らられれるるもものの、、例例ええ
Figure imgf000029_0001
[0129] As for POPOLLIRIE ETTERRUL EST STELLU DIGIOORLE, it is also possible to use AETERELLU group-containing diGiorle or other mixed darling cocools. The power to react the object with didicacarbobonic acid or their anhydrous water, or the polypolyester. For example, it can be obtained by reacting guaricocorol with aralkylkilenlenoxyxidide.
Figure imgf000029_0001
[0130] ポリエーテルグリコールとして最も好ましいのはポリエチレングリコール、ポリプロピレ ングリコール、ポリオキシテトラメチレングリコールまたはこれらの化合物の片末端水 酸基が炭素数 1〜25のアルキル基でアルコキシィ匕されたィ匕合物である。  [0130] Most preferred as the polyether glycol is polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol or a compound in which one hydroxyl group of these compounds is alkoxylated with an alkyl group having 1 to 25 carbon atoms. It is a compound.
[0131] ポリエステルグリコールとしては、ジカルボン酸(コハク酸、グルタル酸、アジピン酸、 セバシン酸、フマル酸、マレイン酸、フタル酸等)またはそれらの無水物とグリコール( エチレングリコーノレ、ジエチレングリコール、トリエチレングリコール、プロピレングリコ ール、ジプロピレングリコール、トリプロピレングリコール、 1, 2—ブタンジオール、 1, 3 ブタンジオール、 1, 4 ブタンジオール、 2, 3 ブタンジオール、 3—メチルー 1 , 5 ペンタンジオール、ネオペンチルグリコール、 2—メチルー 1, 3 プロパンジォ ール、 2—メチルー 2 プロピル 1, 3 プロパンジオール、 2 ブチルー [0131] Polyester glycols include dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or their anhydrides and glycols (ethylene glycolole, diethylene glycol, triethylene glycol). , Propylene glycol, dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3 butanediol, 1,4 butanediol, 2,3 butanediol, 3-methyl-1,5 pentanediol, neopentyl Glycol, 2-methyl-1,3 propanediol, 2-methyl-2-propyl 1,3 propanediol, 2-butyl
2 ェチルー 1, 3 プロパンジーオル、 1, 5 ペンタンジオール、 1, 6 へキサンジ オール、 2—メチルー 2, 4 ペンタンジオール、 2, 2, 4 トリメチルー 1, 3 ペンタ ンジオール、 2 ェチルー 1, 3 へキサンジオール、 2, 5 ジメチルー 2, 5 へキ サンジオール、 1, 8 オタタメチレングリコール、 2—メチルー 1, 8 オタタメチレング リコール、 1, 9ーノナンジオール等の脂肪族グリコール、ビスヒドロキシメチルシクロへ キサン等の脂環族グリコール、キシリレングリコール、ビスヒドロキシエトキシベンゼン 等の芳香族グリコール、 N—メチルジェタノールァミン等の N—アルキルジアルカノー ルァミン等)とを重縮合させて得られたもの、例えばポリエチレンアジペート、ポリプチ レンアジペート、ポリへキサメチレンアジペート、ポリエチレン Zプロピレンアジペート 等、または前記ジオール類または炭素数 1〜25の 1価アルコールを開始剤として用 V、て得られるポリラタトンジオールまたはポリラタトンモノオール、例えばポリ力プロラタ トングリコール、ポリメチルバレロラタトンおよびこれらの 2種以上の混合物が挙げられ る。ポリエステルグリコールとして最も好まし ヽのはポリ力プロラタトングリコールまたは 炭素数 1〜25のアルコールを開始剤としたポリ力プロラタトンである。 2-ethyl-1,3-propanediol, 1,5-pentanediol, 1,6-hexanediol, 2-methyl-2,4-pentanediol, 2,2,4 trimethyl-1,3-pentanediol, 2-ethyl-1,3-hexane Diol, 2,5 Dimethyl-2,5 Hexanediol, 1,8 otatamethylene glycol, 2-methyl-1,8 otatamethylene Recall, aliphatic glycols such as 1,9-nonanediol, alicyclic glycols such as bishydroxymethylcyclohexane, aromatic glycols such as xylylene glycol and bishydroxyethoxybenzene, N- such as N-methyljetanolamine Alkyl dialkanolamine, etc.), such as polyethylene adipate, polyethylene adipate, polyhexamethylene adipate, polyethylene Z-propylene adipate, etc., or the above diols or monovalent valences of 1 to 25 carbon atoms Examples thereof include polylatatonediol or polylatathone monool obtained by using alcohol as an initiator V, such as polystrength prolatatone glycol, polymethylvalerolatatone, and mixtures of two or more thereof. The most preferred polyester glycol is poly-strength prolatatone glycol or poly-strength prolatatone starting with alcohol having 1 to 25 carbon atoms.
[0132] ポリカーボネートグリコールとしては、ポリ(1, 6 へキシレン)カーボネート、ポリ(3 ーメチルー 1, 5 ペンチレン)カーボネート等、ポリオレフイングリコールとしてはポリ ブタジエングリコール、水素添加型ポリブタジエングリコール、水素添加型ポリイソプ レンダリコール等が挙げられる。 [0132] Polycarbonate glycol includes poly (1,6-hexylene) carbonate, poly (3-methyl-1,5-pentylene) carbonate, etc. Polyolefin glycol includes polybutadiene glycol, hydrogenated polybutadiene glycol, and hydrogenated polyisoprene glycol Etc.
[0133] 同一分子内に水酸基を 1個または 2個有する化合物の数平均分子量は通常 300 〜10, 000、好ましくは 500〜6, 000、さらに好ましくは 1, 000〜4, 000である。  [0133] The number average molecular weight of the compound having one or two hydroxyl groups in the same molecule is usually 300 to 10,000, preferably 500 to 6,000, and more preferably 1,000 to 4,000.
[0134] 同一分子内に活性水素と 3級アミノ基を有する化合物において、活性水素、すなわ ち、酸素原子、窒素原子またはィォゥ原子に直接結合している水素原子としては、水 酸基、アミノ基、チオール基等の官能基中の水素原子が挙げられ、中でもァミノ基、 特に 1級ァミノ基の水素原子が好ましい。 3級アミノ基は特に限定されない。また、 3級 アミノ基としては、炭素数 1〜4のアルキル基を有するアミノ基、またはへテロ環構造、 より具体的には、イミダゾール環またはトリァゾール環が挙げられる。  [0134] In a compound having an active hydrogen and a tertiary amino group in the same molecule, an active hydrogen, that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a nitrogen atom includes a hydroxyl group, an amino group. A hydrogen atom in a functional group such as a thiol group or a thiol group, among which a hydrogen atom of an amino group, particularly a primary amino group is preferred. The tertiary amino group is not particularly limited. The tertiary amino group includes an amino group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, and more specifically, an imidazole ring or a triazole ring.
[0135] 同一分子内に活性水素と 3級アミノ基を有する化合物を例示するならば、 N, N- ジメチルー 1, 3 プロパンジァミン、 N, N ジェチルー 1, 3 プロパンジァミン、 N, N ジプロピノレー 1, 3 プロパンジァミン、 N, N ジブチノレー 1, 3 プロパンジアミ ン、 N, N ジメチルエチレンジァミン、 N, N ジェチルエチレンジァミン、 N, N ジ プロピルエチレンジァミン、 N, N—ジブチルエチレンジァミン、 N, N ジメチルー 1, 4 ブタンジァミン、 N, N ジェチノレー 1, 4 ブタンジァミン、 N, N ジプロピノレー 1, 4—ブタンジァミン、 N, N—ジブチル一 1, 4—ブタンジァミン等が挙げられる。 [0135] Examples of compounds having an active hydrogen and a tertiary amino group in the same molecule are N, N-dimethyl-1,3 propanediamine, N, N jetyl-1,3 propanediamine, N, N dipropinoleyl 1,3 propanediamine N, N Dibutinoleol 1,3 Propanediamine, N, N Dimethylethylenediamine, N, N Jetylethylenediamine, N, N Dipropylethylenediamine, N, N-Dibutylethylenediamine, N, N Dimethyl-1,4 butanediamine, N, N Jetinore 1,4 butanediamin, N, N Dipropinore 1,4-butanediamine, N, N-dibutyl-1,4-butanediamine and the like.
[0136] また、 3級ァミノ基が N含有へテロ環であるものとして、ピラゾール環、イミダゾール環 [0136] Further, as the tertiary amino group is an N-containing heterocycle, a pyrazole ring, an imidazole ring
、トリァゾール環、テトラゾール環、インドール環、力ルバゾール環、インダゾール環、 ベンズイミダゾール環、ベンゾトリアゾール環、ベンゾォキサゾール環、ベンゾチアゾ ール環、ベンゾチアジアゾール環等の N含有へテロ 5員環、ピリジン環、ピリダジン環, Triazole ring, tetrazole ring, indole ring, force rubazole ring, indazole ring, benzimidazole ring, benzotriazole ring, benzoxazole ring, benzothiazol ring, benzothiadiazole ring, etc. N-containing hetero ring, pyridine Ring, pyridazine ring
、ピリミジン環、トリアジン環、キノリン環、アタリジン環、イソキノリン環、等の N含有へ テロ 6員環が挙げられる。これらの N含有へテロ環として好ましいものはイミダゾール 環またはトリァゾール環である。 N-containing hetero 6-membered ring such as pyrimidine ring, triazine ring, quinoline ring, atalidine ring, isoquinoline ring, and the like. Preferred as these N-containing heterocycles are an imidazole ring or a triazole ring.
[0137] これらのイミダゾール環とアミノ基を有する化合物を具体的に例示するならば、 1一( [0137] Specific examples of these compounds having an imidazole ring and an amino group are as follows:
3—ァミノプロピル)イミダゾール、ヒスチジン、 2—ァミノイミダゾール、 1— (2—ァミノ ェチル)イミダゾール等が挙げられる。また、トリァゾール環とアミノ基を有する化合物 を具体的に例示するならば、 3—ァミノ一 1, 2, 4—トリァゾール、 5— (2—ァミノ一 5Examples include 3-aminopropyl) imidazole, histidine, 2-aminoimidazole, and 1- (2-aminoethyl) imidazole. Further, specific examples of a compound having a triazole ring and an amino group include 3-amino-1, 2, 4-triazole, 5- (2-amino-1,5).
—クロ口フエ二ノレ)一 3—フエ二ノレ一 1H—1, 2, 4—トリァゾーノレ、 4—アミノー 4H—11) —Huenore 1H—1, 2, 4—Triazore, 4—Amino 4H—1
, 2, 4—トリァゾール— 3, 5—ジオール、 3—ァミノ— 5—フエ-ル— 1H— 1, 3, 4— トリァゾ、一ノレ、 5—ァミノ—ェ, 4—ジフエ二ノレ—ェ, 2, 3—トリァゾ、一ノレ、 3—ァミノ—ェ , 2, 4—Triazole— 3, 5—Diol, 3—Amino— 5—Fel— 1H— 1, 3, 4— Triazol, Ignore, 5 —Amino—, 4 —Diphenylenore, 2 , 3 — Triazo, Ichinole, 3 — Amino
—ベンジル一 1H— 2, 4—トリァゾール等が挙げられる。 -Benzyl 1H-2, 4-triazole and the like.
[0138] なかでも、 N, N—ジメチル— 1, 3—プロパンジァミン、 N, N—ジェチル— 1, 3— プロパンジァミン、 1— (3—ァミノプロピル)イミダゾール、 3—アミノー 1, 2, 4—トリア ゾールが好ましい。 [0138] Among them, N, N-dimethyl-1,3-propanediol, N, N-jetyl-1,3-propanediamine, 1- (3-aminopropyl) imidazole, 3-amino-1,2,4-triazole Is preferred.
[0139] 分散剤原料の好ましい配合比率はポリイソシァネートイ匕合物 100重量部に対し、同 一分子内に水酸基を 1個または 2個有する数平均分子量 300〜10, 000の化合物 力 10〜200重量咅、好ましく ίま 20〜 190重量咅、さらに好ましく ίま 30〜180重量咅 、同一分子内に活性水素と 3級アミノ基を有する化合物が 0. 2〜25重量部、好ましく は 0. 3〜24重量部である。  [0139] A preferable blending ratio of the dispersant raw material is a compound having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule with respect to 100 parts by weight of the polyisocyanate compound. ~ 200 parts by weight, preferably 20 to 190 parts by weight, more preferably 30 to 180 parts by weight, and the compound having active hydrogen and tertiary amino group in the same molecule is 0.2 to 25 parts by weight, preferably 0. 3 to 24 parts by weight.
[0140] 反応は、ポリウレタン榭脂製造の公知の方法に従って行われる。反応を行う際の溶 媒としては、通常、アセトン、メチルェチルケトン、メチルイソブチルケトン、シクロペン タノン、シクロへキサノン、イソホロン等のケトン類、酢酸ェチル、酢酸ブチル、酢酸セ 口ソルブ等のエステル類、ベンゼン、トルエン、キシレン、へキサン等の炭化水素類、 ダイアセトンアルコール、イソプロパノール、第二ブタノール、第三ブタノール等の水 酸基周辺に比較的分子量の大きい置換基をもつアルコール類、例えば第一アルコ ール以外のアルコール類、塩化メチレン、クロ口ホルム等の塩化物、テトラヒドロフラン 、ジェチルエーテル等のエーテル類、ジメチルホルムアミド、 N—メチルピロリドン、ジ メチルスルホキサイド等の非プロトン性極性溶媒等の 1種または 2種以上が用いられ る。 [0140] The reaction is carried out according to a known method of producing polyurethane resin. Solvents used for the reaction are usually ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, and isophorone, and esters such as ethyl acetate, butyl acetate, and cetosolve acetate. , Hydrocarbons such as benzene, toluene, xylene, hexane, Diacetone alcohol, isopropanol, sec-butanol, tert-butanol and other alcohols having a relatively high molecular weight substituent around the hydroxyl group, such as alcohols other than primary alcohol, methylene chloride, black mouth form, etc. One kind or two or more kinds of ethers such as chloride, tetrahydrofuran, jetyl ether and the like, and aprotic polar solvents such as dimethylformamide, N-methylpyrrolidone and dimethylsulfoxide are used.
[0141] 上記反応に際して、通常、ウレタン化反応触媒が用いられる。使用されるウレタン化 反応触媒としては、例えば、ジブチルチンジラウレート、ジォクチルチンジラウレート、 ジブチルチンジォタトエート、スタナスォクトエート等の錫系、鉄ァセチルァセトナート 、塩化第二鉄等の鉄系、トリェチルァミン、トリエチレンジァミン等の 3級ァミン系等の 1 種または 2種以上が挙げられる。  [0141] In the above reaction, a urethanization reaction catalyst is usually used. Examples of the urethanization reaction catalyst used include tin-based compounds such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin diformateate, stanasoctoate, iron acetylethylacetonate, and ferric chloride. One type or two or more types of tertiary amines such as iron, triethylamine and triethylenediamine are listed.
[0142] なお、同一分子内に活性水素と 3級アミノ基を有する化合物の導入量は、反応後の ァミン価で l〜100mg—KOHZgの範囲に制御するのが好ましい。このアミン価は、 より好ましくは 5〜95mg— KOH/gの範囲である。ここで、アミン価は、塩基性ァミノ 基を酸により中和滴定し、酸価に対応させて KOHの mg数で表した値である。このァ ミン価が上記範囲未満であると分散能力が低下する傾向があり、また、上記範囲を超 えると現像性が低下しやすくなる。  [0142] The introduction amount of the compound having active hydrogen and tertiary amino group in the same molecule is preferably controlled in the range of 1 to 100 mg-KOHZg in terms of the amine value after the reaction. The amine value is more preferably in the range of 5 to 95 mg-KOH / g. Here, the amine value is a value expressed in mg of KOH corresponding to the acid value after neutralizing titration of a basic amino group with an acid. If the amine value is less than the above range, the dispersing ability tends to be lowered, and if it exceeds the above range, the developability tends to be lowered.
[0143] なお、以上の反応で作られる高分子分散剤にイソシァネート基が残存する場合に はさらに、アルコ一ルゃァミノ化合物で残存イソシァネート基を変性すると生成物の 経時安定性が高くなるので好まし 、。  [0143] In the case where the isocyanate group remains in the polymer dispersant produced by the above reaction, further modification of the remaining isocyanate group with an alcoholamine compound is preferable because the stability with time of the product becomes high. Better ,.
[0144] このような塩基性高分子分散剤の重量平均分子量は通常 1, 000〜200, 000、好 まし <は 2, 000〜100, 000、より好まし <は 3, 000〜50, 000の範囲である。重量 平均分子量が 1, 000未満では分散性および分散安定性が劣り、 200, 000を超え ると溶解性が低下し、分散性が劣ると同時に反応の制御が困難となる。  [0144] The weight average molecular weight of such a basic polymer dispersant is usually 1,000 to 200,000, preferably <is 2,000 to 100,000, more preferably <is 3,000 to 50,000. Range. When the weight average molecular weight is less than 1,000, the dispersibility and dispersion stability are poor, and when it exceeds 200,000, the solubility is lowered, and the dispersibility is poor and the reaction is difficult to control.
なお、重量平均分子量は、 GPC (ゲルパーミエーシヨンクロマトグラフィー)によって ポリスチレン換算により測定される。  The weight average molecular weight is measured in terms of polystyrene by GPC (gel permeation chromatography).
[0145] 塩基性高分子分散剤としては、市販のものを利用することもでき、例えば、商品名 で、 BYK社製 DB161、 DB162、 DB163、 DB164、 DB166、 DB182、 EFKA社 4046、ノレーブリ ノレ ソリスノ ース 38500、ソリスノ ース 20000、ソリスノ ー ス 24000、ソリスノ ース 27000、ソリスノ ース 28000等を挙げ、ること力できる。 [0145] As the basic polymer dispersant, commercially available ones can also be used. For example, by the trade name, BY161 DB161, DB162, DB163, DB164, DB166, DB182, EFKA 4046, Norrebri Norre Solis Nose 38500, Solisnose 20000, Solisnose 24000, Solisnose 27000, Solisnose 28000, etc.
[0146] これらの分散剤は 1種を単独で用いても良ぐ 2種以上を混合して用いても良い。 [0146] These dispersants may be used singly or in combination of two or more.
[0147] 本発明の遮光性榭脂組成物中の全固形分量に対するこれらの分散剤の割合は、 通常 0. 05重量%以上、好ましくは 0. 1重量%以上、更に好ましくは 0. 5重量%以 上であり、通常 10重量%以下、好ましくは 6重量%以下、更に好ましくは 5重量%以 下である。分散剤の含有割合が少なすぎると、分散安定性が悪化し、再凝集や増粘 等の問題が発生する場合がある。逆に多すぎると、相対的に顔料の割合が減るため 、着色力が低くなつたり、露光による架橋において感度が低下するおそれがある。 [0147] The ratio of these dispersants to the total solid content in the light-shielding resin composition of the present invention is usually 0.05% by weight or more, preferably 0.1% by weight or more, and more preferably 0.5% by weight. %, Usually 10% by weight or less, preferably 6% by weight or less, more preferably 5% by weight or less. If the content of the dispersant is too small, the dispersion stability deteriorates, and problems such as reaggregation and thickening may occur. On the other hand, if the amount is too large, the ratio of the pigment is relatively reduced, so that the coloring power may be lowered or the sensitivity may be lowered in the crosslinking by exposure.
[0148] [1 7]分散助剤 [0148] [1 7] Dispersion aid
本発明の遮光性榭脂組成物はまた、上記分散剤に加えて、分散助剤を含有してい てもよい。  The light-shielding resin composition of the present invention may also contain a dispersion aid in addition to the dispersant.
分散助剤としては、例えば顔料誘導体が挙げられる。  Examples of the dispersion aid include pigment derivatives.
[0149] 顔料誘導体としては、ァゾ系、フタロシアニン系、キナクリドン系、ベンツイミダゾロン 系、キノフタロン系、イソインドリノン系、ジ才キサジン系、アントラキノン系、インダンス レン系、ペリレン系、ペリノン系、ジケトピロロピロール系、ジォキサジン系顔料等の誘 導体が挙げられる。顔料誘導体の置換基としてはスルホン酸基、スルホンアミド基お よびその 4級塩、フタルイミドメチル基、ジアルキルアミノアルキル基、水酸基、カルボ キシル基、アミド基等が顔料骨格に直接またはアルキル基、ァリール基、複素環基等 を介して結合したものが挙げられ、好ましくはスルホンアミド基およびその 4級塩、ス ルホン酸基が挙げられ、より好ましくはスルホン酸基である。またこれら置換基は一つ の顔料骨格に複数置換していても良いし、置換数の異なる化合物の混合物でも良い 。顔料誘導体の具体例としてはァゾ顔料のスルホン酸誘導体、フタロシアニン顔料の スルホン酸誘導体、キノフタロン顔料のスルホン酸誘導体、アントラキノン顔料のスル ホン酸誘導体、キナクリドン顔料のスルホン酸誘導体、ジケトピロロピロール顔料のス ルホン酸誘導体、ジォキサジン顔料のスルホン酸誘導体等が挙げられる。  [0149] Examples of the pigment derivative include azo, phthalocyanine, quinacridone, benzimidazolone, quinophthalone, isoindolinone, di-xazine, anthraquinone, indanthrene, perylene, perinone, Examples include derivatives such as diketopyrrolopyrrole and dioxazine pigments. As substituents of pigment derivatives, sulfonic acid groups, sulfonamide groups and their quaternary salts, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, amide groups, etc. are directly in the pigment skeleton or alkyl groups, aryl groups. And a group bonded through a heterocyclic group, preferably a sulfonamide group, a quaternary salt thereof, and a sulfonic acid group, and more preferably a sulfonic acid group. In addition, a plurality of these substituents may be substituted on one pigment skeleton, or a mixture of compounds having different numbers of substitutions. Specific examples of pigment derivatives include azo pigment sulfonic acid derivatives, phthalocyanine pigment sulfonic acid derivatives, quinophthalone pigment sulfonic acid derivatives, anthraquinone pigment sulfonic acid derivatives, quinacridone pigment sulfonic acid derivatives, and diketopyrrolopyrrole pigments. Examples thereof include sulfonic acid derivatives and sulfonic acid derivatives of dioxazine pigments.
[0150] 顔料誘導体の添加量は、本発明の遮光性榭脂組成物の全固形分に対して通常 0 . 01〜4重量%、好ましくは 0. 05〜3重量%以下、更に好ましくは 0. 1〜2重量%で ある。顔料誘導体の添加量が少ないと分散安定性が悪化し、再凝集や増粘等の問 題が発生する場合がある。逆に多すぎても分散安定性への寄与は飽和し、却って色 純度の低下を招くことがある。 [0150] The added amount of the pigment derivative is usually 0.01 to 4% by weight, preferably 0.05 to 3% by weight or less, more preferably 0 to the total solid content of the light-shielding resin composition of the present invention. . 1-2% by weight is there. If the amount of the pigment derivative added is small, dispersion stability deteriorates and problems such as reaggregation and thickening may occur. On the other hand, if the amount is too large, the contribution to dispersion stability is saturated, and on the contrary, the color purity may be lowered.
[0151] [1 8]有機カルボン酸、有機カルボン酸無水物  [0151] [18] Organic carboxylic acid, organic carboxylic anhydride
本発明の遮光性榭脂組成物は、上記成分以外に、更に、有機カルボン酸および Z または有機カルボン酸無水物を含んで 、ても良 、。  In addition to the above components, the light-shielding resin composition of the present invention may further contain an organic carboxylic acid and Z or an organic carboxylic acid anhydride.
[0152] [1 8— 1]有機カルボン酸  [0152] [1 8— 1] Organic carboxylic acid
有機カルボン酸としては、脂肪族カルボン酸および Zまたは芳香族カルボン酸が 挙げられる。脂肪族カルボン酸としては、具体的には、ギ酸、酢酸、プロピオン酸、酪 酸、吉草酸、ピバル酸、カプロン酸、ジェチル酢酸、ェナント酸、力プリル酸、グリコー ル酸、アクリル酸、メタクリル酸などのモノカルボン酸、シユウ酸、マロン酸、コハク酸、 グルタル酸、アジピン酸、ピメリン酸、スベリン酸、ァゼライン酸、セバシン酸、ブラシル 酸、メチルマロン酸、ェチルマロン酸、ジメチルマロン酸、メチルコハク酸、テトラメチ ルコハク酸、シクロへキサンジカルボン酸、シクロへキセンジカルボン酸、ィタコン酸、 シトラコン酸、マレイン酸、フマル酸などのジカルボン酸、トリカルノ リル酸、アコニット 酸、カンホロン酸などのトリカルボン酸などが挙げられる。また、芳香族カルボン酸とし ては、具体的には、安息香酸、トルィル酸、クミン酸、ヘメリト酸、メシチレン酸、フタル 酸、フタル酸、イソフタル酸、テレフタル酸、トリメリット酸、トリメシン酸、メロファン酸、ピ ロメリット酸、フエ-ル酢酸、ヒドロアトロパ酸、ヒドロケィ皮酸、マンデル酸、フエ-ルコ ハク酸、アトロパ酸、ケィ皮酸、ケィ皮酸メチル、ケィ皮酸ベンジル、シンナミリデン酢 酸、タマル酸、ゥンベル酸などのフエ-ル基に直接カルボキシル基が結合したカルボ ン酸、およびフエ-ル基力 炭素結合を介してカルボキシル基が結合したカルボン酸 類等が挙げられる。  Organic carboxylic acids include aliphatic carboxylic acids and Z or aromatic carboxylic acids. Specific examples of the aliphatic carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, jetyl acetic acid, enanthic acid, strong prillic acid, glycolic acid, acrylic acid, and methacrylic acid. Monocarboxylic acid such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassylic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, Examples thereof include dicarboxylic acids such as tetramethylsuccinic acid, cyclohexanedicarboxylic acid, cyclohexenedicarboxylic acid, itaconic acid, citraconic acid, maleic acid, and fumaric acid, and tricarboxylic acids such as tricarnolic acid, aconitic acid, and camphoric acid. Specific examples of aromatic carboxylic acids include benzoic acid, toluic acid, cumic acid, hemelic acid, mesitylene acid, phthalic acid, phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, and melophane. Acid, pyromellitic acid, phenacetic acid, hydroacetropic acid, hydrocacinic acid, mandelic acid, succinic acid, atropic acid, kaynic acid, methyl kainate, benzyl cinnamate, cinnamylidene acetic acid, tamalic acid And carboxylic acids in which a carboxyl group is directly bonded to a phenyl group such as umbelic acid, and carboxylic acids in which a carboxyl group is bonded through a carbon atom having a phenyl group.
[0153] 上記有機カルボン酸の中では、モノカルボン酸、ジカルボン酸が好ましぐ中でもマ ロン酸、グルタル酸、グリコール酸が更に好ましぐマロン酸が特に好ましい。  [0153] Among the above organic carboxylic acids, malonic acid, particularly preferred are malonic acid, glutaric acid and glycolic acid, among which monocarboxylic acid and dicarboxylic acid are preferred.
[0154] 上記有機カルボン酸の分子量は、通常 1000以下であり、通常 50以上である。上 記有機カルボン酸の分子量が大きすぎると地汚れ改善効果が不十分であり、小さす ぎると昇華、揮発などにより添加量の減少やプロセス汚染を起こす恐れがある。 [0155] [1 8— 2]有機カルボン酸無水物 [0154] The molecular weight of the organic carboxylic acid is usually 1000 or less, and usually 50 or more. If the molecular weight of the organic carboxylic acid is too large, the effect of improving the soiling is insufficient, and if it is too small, the amount added may be reduced due to sublimation or volatilization, or process contamination may occur. [0155] [1 8-2] Organic carboxylic acid anhydride
有機カルボン酸無水物としては、脂肪族カルボン酸無水物および Zまたは芳香族 カルボン酸無水物が挙げられ、脂肪族カルボン酸無水物としては、具体的には無水 酢酸、無水トリクロ口酢酸、無水トリフルォロ酢酸、無水テトラヒドロフタル酸、無水コハ ク酸、無水マレイン酸、無水ィタコン酸、無水シトラコン酸、無水グルタル酸、無水 1, 2 シクロへキセンジカルボン酸、無水 n—ォクタデシルコハク酸、無水 5 ノルボル ネンー 2, 3 ジカルボン酸などの脂肪族カルボン酸無水物が挙げられる。芳香族力 ルボン酸無水物としては、具体的には無水フタル酸、トリメリット酸無水物、ピロメリット 酸無水物、無水ナフタル酸などが挙げられる。  Examples of organic carboxylic acid anhydrides include aliphatic carboxylic acid anhydrides and Z or aromatic carboxylic acid anhydrides. Specific examples of aliphatic carboxylic acid anhydrides include acetic anhydride, anhydrous trichlorodiacetic acid, and trifluoroacetic anhydride. Acetic acid, tetrahydrophthalic anhydride, succinic anhydride, maleic anhydride, itaconic anhydride, citraconic anhydride, glutaric anhydride, 1,2 cyclohexenedicarboxylic anhydride, n-octadecyl succinic anhydride, 5 norborn anhydride And aliphatic carboxylic acid anhydrides such as Nene-2,3 dicarboxylic acid. Specific examples of aromatic rubonic acid anhydrides include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and naphthalic anhydride.
[0156] 上記有機カルボン酸無水物の中では、無水マレイン酸、無水コハク酸、無水イタコ ン酸、無水シトラコン酸が好ましぐ無水マレイン酸が更に好ましい。  [0156] Among the organic carboxylic acid anhydrides, maleic anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, and citraconic anhydride are more preferable.
[0157] 上記有機カルボン酸無水物の分子量は、通常 800以下、好ましくは 600以下、更 に好ましくは 500以下であり、通常 50以上である。上記有機カルボン酸無水物の分 子量が大きすぎると地汚れ改善効果が不十分であり、小さすぎると昇華、揮発などに より添カ卩量の減少やプロセス汚染を起こす恐れがある。  [0157] The molecular weight of the organic carboxylic acid anhydride is usually 800 or less, preferably 600 or less, more preferably 500 or less, and usually 50 or more. If the molecular weight of the above organic carboxylic acid anhydride is too large, the effect of improving soil stains will be insufficient, and if it is too small, there is a risk of reducing the amount of additives and process contamination due to sublimation and volatilization.
[0158] これらの有機カルボン酸および Zまたは有機カルボン酸無水物は、それぞれ 1種を 単独で用いても良ぐ 2種以上を混合して用 、ても良 、。  [0158] These organic carboxylic acids and Z or organic carboxylic acid anhydrides may be used singly or as a mixture of two or more.
[0159] これらの有機カルボン酸および Zまたは有機カルボン酸無水物の添カ卩量は、本発 明の遮光性榭脂組成物の全固形分中、通常 0. 01重量%以上、好ましくは 0. 03重 量%以上、更に好ましくは 0. 05重量%以上であり、通常 10重量%以下、好ましくは 5重量%以下、更に好ましくは 3重量%以下である。この添加量が少なすぎると十分 な添加効果が得られず、多すぎると表面平滑性や感度が悪ィ匕し、未溶解剥離片が 発生する場合がある。  [0159] The amount of addition of these organic carboxylic acid and Z or organic carboxylic anhydride is usually 0.01% by weight or more, preferably 0 in the total solid content of the light-shielding resin composition of the present invention. .03% by weight or more, more preferably 0.05% by weight or more, and usually 10% by weight or less, preferably 5% by weight or less, more preferably 3% by weight or less. If the addition amount is too small, a sufficient addition effect cannot be obtained. If the addition amount is too large, surface smoothness and sensitivity may be deteriorated, and undissolved peeling pieces may be generated.
[0160] [1 9]その他の固形分  [0160] [1 9] Other solids
本発明の遮光性榭脂組成物には、更に、必要に応じ上記成分以外の固形分を配 合できる。このような成分としては、界面活性剤、熱重合防止剤、可塑剤、保存安定 剤、表面保護剤、密着向上剤、現像改良剤等が挙げられる。  The light-shielding rosin composition of the present invention can further contain solids other than the above components as necessary. Examples of such components include surfactants, thermal polymerization inhibitors, plasticizers, storage stabilizers, surface protective agents, adhesion improvers, development improvers and the like.
[0161] [1 9 1]界面活性剤 界面活性剤としてはァ-オン系、カチオン系、非イオン系、両性界面活性剤等各種 のものの 1種または 2種以上を用いることができるが、諸特性に悪影響を及ぼす可能 性が低 、点で、非イオン系界面活性剤を用いるのが好ま 、。 [0161] [1 9 1] Surfactant As the surfactant, one or more of various types such as ionic, cationic, nonionic, and amphoteric surfactants can be used, but the possibility of adversely affecting various properties is low. Therefore, it is preferable to use a nonionic surfactant.
[0162] 界面活性剤の添加量は、本発明の遮光性榭脂組成物中の全固形分に対して通常 0. 001〜10重量0 /0、好ましくは 0. 005〜1重量0 /0、さらに好ましくは 0. 01〜0. 5重 量%、最も好ましくは 0. 03-0. 3重量%である。界面活性剤の添加量が上記範囲 よりも少ないど塗布膜の平滑性、均一性が発現できず、多いど塗布膜の平滑性、均 一性が発現できな 、他、他の特性が悪ィ匕する場合がある。 [0162] The amount of the surfactant added is generally 0.001 to 10 weight 0/0 of the total solid content of the light-shielding榭脂composition of the present invention, preferably from 0.005 to 1 weight 0/0 More preferably, the content is 0.01 to 0.5% by weight, and most preferably 0.03 to 0.3% by weight. If the addition amount of the surfactant is less than the above range, the smoothness and uniformity of the coating film cannot be expressed, and if it is more, the smoothness and uniformity of the coating film cannot be expressed, and other characteristics are poor. There is a case to hesitate.
[0163] [1 9 2]熱重合防止剤  [0163] [1 9 2] Thermal polymerization inhibitor
熱重合防止剤としては、例えば、ノ、イドロキノン、 p—メトキシフエノール、ピロガロー ル、カテコール、 2, 6—t—ブチルー p クレゾール、 β ナフトール等の 1種または 2種以上が用いられる。熱重合防止剤の添加量は、本発明の遮光性榭脂組成物の 全固形分に対し 0〜3重量%の範囲であることが好ましい。  As the thermal polymerization inhibitor, for example, one, two or more kinds such as rho, idroquinone, p-methoxyphenol, pyrogallol, catechol, 2,6-t-butyl-p-cresol, β-naphthol and the like are used. The addition amount of the thermal polymerization inhibitor is preferably in the range of 0 to 3% by weight with respect to the total solid content of the light-shielding resin composition of the present invention.
[0164] [1 9 3]可塑剤  [0164] [1 9 3] Plasticizer
可塑剤としては、例えば、ジォクチルフタレート、ジドデシルフタレート、トリエチレン グリコールジカプリレート、ジメチルダリコールフタレート、トリクレジルホスフェート、ジ ォクチルアジペート、ジブチルセバケート、トリァセチルグリセリン等の 1種または 2種 以上が用いられる。これら可塑剤の添加量は、本発明の遮光性榭脂組成物の全固 形分に対し 10重量%以下であることが好ま 、。  Examples of the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl dallicol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. Two or more types are used. The amount of these plasticizers added is preferably 10% by weight or less based on the total solid content of the light-shielding resin composition of the present invention.
[0165] [1 9 4]その他 [0165] [1 9 4] Other
その他、保存安定剤、表面保護剤、密着向上剤、現像改良剤等を必要に応じて添 加することが出来る。これら成分の添加量は、本発明の遮光性榭脂組成物の全固形 分に対し合計で 20重量%以下であることが好ましい。  In addition, a storage stabilizer, a surface protective agent, an adhesion improver, a development improver and the like can be added as necessary. The amount of these components added is preferably 20% by weight or less in total with respect to the total solid content of the light-shielding resin composition of the present invention.
[0166] [1 10]溶剤 [0166] [1 10] Solvent
本発明の遮光性榭脂組成物は、一般に上述の固形分を溶剤に溶解ないし分散さ せて調製される。  The light-shielding resin composition of the present invention is generally prepared by dissolving or dispersing the above-described solid content in a solvent.
溶剤は、本発明の遮光性榭脂組成物において、(Α)バインダ榭脂、(Β)モノマー、 (C)光重合開始剤、(D)カーボンブラックや前述のその他の色材、分散剤、および 更に必要に応じて配合されるその他の成分等を溶解または分散させ、粘度を調節す る機能を奏する。 In the light-shielding resin composition of the present invention, the solvent comprises (i) a binder resin, (ii) a monomer, (C) a photopolymerization initiator, (D) carbon black and the above-mentioned other colorants, dispersants, and Further, it has a function of adjusting viscosity by dissolving or dispersing other components blended as necessary.
[0167] 溶剤としては、組成物を構成する各成分を溶解または分散させることができるもの で、沸点が 100〜200°Cの範囲のものを選択するのが好ましい。溶剤は、 120〜17 0°Cの沸点をもつものがより好ましい。  [0167] As the solvent, it is preferable to select a solvent which can dissolve or disperse each component constituting the composition and has a boiling point in the range of 100 to 200 ° C. More preferably, the solvent has a boiling point of 120 to 170 ° C.
このような溶剤としては、例えば、次のようなものが挙げられる。  Examples of such solvents include the following.
[0168] エチレングリコーノレモノメチノレエーテル、エチレングリコーノレモノェチノレエーテル、 エチレングリコーノレモノプロピノレエーテノレ、エチレングリコーノレモノブチノレエーテノレ、 エチレングリコーノレモノブチノレエーテノレ、プロピレングリコーノレモノメチノレエーテノレ、 プロピレングリコーノレ tーブチノレエーテル、ジエチレングリコーノレモノメチノレエーテ ル、ジエチレングリコールモノェチルエーテル、メトキシメチルペンタノール、プロピレ ングリコーノレモノェチノレエーテノレ、ジプロピレングリコーノレモノェチノレエーテノレ、ジプ ロピレングリコールモノメチルエーテル、 3—メチルー 3—メトキシブタノール、トリプロ ピレングリコールメチルエーテルのようなグリコールモノアルキルエーテル類;  [0168] Ethylene Glycolanol Monomethinole Ether, Ethylene Glycolic Monomono Ethenole Ether, Ethylene Glyconore Monopropinoleetenore, Ethylene Glycolenomonomono Butenoreethenore, Ethylene Glycolenomonomono Butenoreetenore, Propylene Glyconore Monomethylenoateolene, Propylene glycolate tertbutinoleether, Diethyleneglycolanol monomethylol ether, Diethylene glycol monoethyl ether, Methoxymethyl pentanol, Propylene glycolenoleino ethinoleate, Dipropylene glycolate Glycol monoalkyl such as monoethylenoatenole, diplypropylene glycol monomethyl ether, 3-methyl-3-methoxybutanol, tripropylene glycol methyl ether Ethers;
[0169] エチレングリコールジメチルエーテル、エチレングリコールジェチルエーテル、ジェ チレングリコールジメチルエーテル、ジエチレングリコールジェチルエーテル、ジェチ レングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテルのような グリコールジアルキルエーテル類;  [0169] Glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol jetyl ether, polyethylene glycol dimethyl ether, diethylene glycol jetyl ether, jetylene glycol dipropyl ether, diethylene glycol dibutyl ether;
[0170] エチレングリコーノレモノメチノレエーテノレアセテート、エチレングリコーノレモノェチノレエ 一テルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレング リコーノレモノェチノレエーテノレアセテート、プロピレングリコーノレモノプロピノレエーテノレ アセテート、メトキシブチルアセテート、 3—メトキシブチルアセテート、メトキシペンチ ルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、 3—メチルー 3 ーメトキシブチルアセテートのようなグリコールアルキルエーテルアセテート類; [0171] ジェチルエーテル、ジプロピルエーテル、ジイソプロピルエーテル、ブチルエーテ ル、ジァミルエーテル、ェチルイソブチルエーテル、ジへキシルエーテルのようなェ ーテノレ類;  [0170] Ethylene glycol monomethino ethenore acetate, ethylene glycol mono methino acrylate, teracetate, propylene glycol monomethyl ether acetate, propylene glyceno mono ethino enoate acetate, propylene glycol eno mono ethino enoate Glycol alkyl ether acetates such as acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate, dipropylene glycol monomethyl ether acetate, 3-methyl-3-methoxybutyl acetate; [0171] jetyl ether, dipropyl Etheroles such as ether, diisopropyl ether, butyl ether, diamyl ether, ethyl isobutyl ether, dihexyl ether ;
[0172] アセトン、メチルェチルケトン、メチルアミルケトン、メチルイソプロピルケトン、メチル イソアミルケトン、ジイソプチルケトン、メチルイソブチルケトン、シクロへキサノン、ェチ ルアミルケトン、メチルブチルケトン、メチルへキシルケトン、メチルノニルケトンのよう なケトン類; [0172] Acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl Ketones such as isoamyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone;
[0173] エタノール、プロパノール、ブタノール、へキサノール、シクロへキサノール、ェチレ ングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール、 グリセリンのような 1価または多価アルコール類;  [0173] Mono- or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, glycerin;
[0174] n—ペンタン、 n—オクタン、ジイソブチレン、 n キサン、へキセン、イソプレン、ジ ペンテン、ドデカンのような脂肪族炭化水素類; [0174] Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-xane, hexene, isoprene, dipentene, dodecane;
[0175] シクロへキサン、メチルシクロへキサン、メチルシクロへキセン、ビシクロへキシルの ような脂環式炭化水素類; [0175] Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, bicyclohexyl;
[0176] ベンゼン、トルエン、キシレン、クメンのような芳香族炭化水素類; [0176] Aromatic hydrocarbons such as benzene, toluene, xylene, cumene;
[0177] ァミルホルメート、ェチルホルメート、酢酸ェチル、酢酸ブチル、酢酸プロピル、酢酸 ァミル、エチレングリコールアセテート、ェチルプロピオネート、プロピルプロピオネー ト、酪酸ブチル、酪酸イソブチル、イソ酪酸メチル、ェチルカプリレート、ブチルステア レート、ェチルベンゾエート、 3—エトキシプロピオン酸メチル、 3—エトキシプロピオン 酸ェチル、 3—メトキシプロピオン酸メチル、 3—エトキシプロピオン酸ェチル、 3—メト キシプロピオン酸メチル、 3—メトキシプロピオン酸ェチル、 3—メトキシプロピオン酸 プロピル、 3—メトキシプロピオン酸ブチル、 γ —ブチロラタトンのような鎖状または環 状エステル類; [0177] Amylformate, Ethylformate, Ethyl acetate, Butyl acetate, Propyl acetate, Amyl acetate, Ethylene glycol acetate, Ethyl propionate, Propyl propionate, Butyl butyrate, Isobutyl butyrate, Methyl isobutyrate, Ethyl caprylate, Butyl stearate Rate, Ethyl benzoate, Methyl 3-ethoxypropionate, Ethyl 3-ethoxypropionate, Methyl 3-methoxypropionate, Ethyl 3-ethoxypropionate, Methyl 3-methoxypropionate, Ethyl 3-methoxypropionate, 3 —Chain or cyclic esters such as propyl methoxypropionate, butyl 3-methoxypropionate, γ—butyroratatone;
[0178] 3—メトキシプロピオン酸、 3—エトキシプロピオン酸のようなアルコキシカルボン酸 類;  [0178] Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid;
[0179] ブチルクロライド、ァミルク口ライドのようなハロゲン化炭化水素類;  [0179] Halogenated hydrocarbons such as butyl chloride and milk mouthride;
[0180] メトキシメチルペンタノンのようなエーテルケトン類; [0180] Ether ketones such as methoxymethylpentanone;
[0181] ァセトニトリル、ベンゾ-トリルのような-トリル類; [0181] -Tolyls such as acetonitrile and benzo-tolyl;
[0182] 上記に該当する溶剤としては、ミネラルスピリット、バルソル # 2、ァプコ # 18ソルべ ント、ァプコシンナー、ソーカルソルベント No. 1および No. 2、ソルべッソ # 150、シ エル TS28 ソルベント、カルビトール、ェチルカルビトール、ブチルカルビトール、メ チルセ口ソルブ、ェチノレセロソノレブ、ェチルセ口ソルブアセテート、ジグライムのような 商品名の市販品が挙げられる。 [0182] Solvents applicable to the above include mineral spirits, Valsol # 2, Apco # 18 Solvent, Apco thinner, Soal Solvent No. 1 and No. 2, Solvesso # 150, Shell TS28 Solvent, Calvi Such as Toll, Ethyl Carbitol, Butyl Carbitol, Methylcele Solv, Ethinorecero Sonoreb, Ethylcele Solvate, Diglyme The commercial item of a brand name is mentioned.
[0183] これらの溶剤は、 1種を単独で用いても良ぐ 2種以上を併用して用いても良い。  [0183] These solvents may be used alone or in combination of two or more.
[0184] 本発明の遮光性榭脂組成物全体に占める、上記溶剤の含有量は特に制限はない 力 通常 99重量%以下であり、通常 50重量%以上、好ましくは 55重量%以上、更に 好ましくは 60重量%以上である。溶剤の割合が多すぎると、バインダ榭脂、モノマー 、カーボンブラック等の色材、分散剤等の固形分が少なすぎて遮光性榭脂組成物を 形成するには不適当である。一方、溶剤の割合が少なすぎると、粘性が高くなり、塗 布に適さない。  [0184] The content of the solvent in the light-shielding resin composition of the present invention is not particularly limited. Power is usually 99% by weight or less, usually 50% by weight or more, preferably 55% by weight or more, and more preferably. Is more than 60% by weight. If the proportion of the solvent is too large, the solid content of the binder resin, monomer, carbon black and other coloring materials, and the dispersant is too small to be suitable for forming a light-shielding resin composition. On the other hand, if the proportion of the solvent is too small, the viscosity increases and it is not suitable for coating.
[0185] [1 11]カリウムイオンの含有量  [0185] [1 11] Potassium ion content
本発明の遮光性榭脂組成物は、カリウムイオンの含有量が、全固形分に対して 20 ppm以下であることが必須である。カリウムイオンの含有量は、好ましくは遮光性榭脂 組成物の全固形分に対して 18ppm以下、より好ましくは lOppm以下である。  The light-shielding rosin composition of the present invention must have a potassium ion content of 20 ppm or less based on the total solid content. The content of potassium ions is preferably 18 ppm or less, more preferably 10 ppm or less, based on the total solid content of the light-shielding resin composition.
[0186] 本発明の遮光性榭脂組成物のカリウムイオンの含有量の下限は、小さいほど好まし いが、通常、全固形分に対して 0. lppm以上である。遮光性榭脂組成物中の力リウ ムイオンの含有量が多すぎると現像性、解像性、密着性、特に直線性、密着性を十 分担保できない。  [0186] The lower limit of the potassium ion content of the light-shielding resin composition of the present invention is preferably as small as possible, but is usually 0.1 ppm or more with respect to the total solid content. If there is too much content of force rhodium ion in the light-shielding resin composition, developability, resolution, adhesion, especially linearity and adhesion cannot be sufficiently secured.
[0187] カリウムイオンの含有量を上記範囲とするためには、例えば、 [1 4]章において力 リウム元素を添加する方法により得られたカーボンブラックの場合、これを水洗等によ り除去する方法が挙げられる。  [0187] In order to make the potassium ion content within the above range, for example, in the case of carbon black obtained by the method of adding a strong element in [14], this is removed by washing with water or the like. A method is mentioned.
水洗により除去する場合、カーボンブラックと水を効率良く接触させることが重要で ある。具体的には、カーボンブラックに純水をカ卩え、ホモミキサー、 2軸-一ダー、或 いは通常の攪拌機等の装置を用いて、水を換えつつ何度も混練ある!、は攪拌する 方法が挙げられる。水の使用量は、カーボンブラック lOOgあたり、のべ 500mL以上 が好ましぐ lOOOmL以上がより好ましい。  When removing by washing with water, it is important to bring carbon black into contact with water efficiently. Specifically, pure water is added to carbon black, and kneading is repeated many times while changing the water using a device such as a homomixer, two-shaft-one dander, or a normal stirrer. The method of doing is mentioned. The amount of water used is preferably 500 mL or more per lOOg of carbon black, more preferably 10 mL or more.
[0188] なお、遮光性榭脂組成物中のカリウムイオンの含有量は、例えば遮光性榭脂組成 物 0. 2g (固形分量として)に純水 9mLを添加して超音波浴で 30分抽出後、超遠心 分離(5万 rpm X lhr)し、上澄液をイオンクロマトグラフで分析することにより測定する ことができる。 [0189] [2]遮光性榭脂組成物の製造方法 [0188] The potassium ion content in the light-shielding resin composition is, for example, extracted by adding 30 ml of pure water to 0.2 g (as solid content) of the light-shielding resin composition and extracting in an ultrasonic bath for 30 minutes. Then, it can be measured by ultracentrifugation (50,000 rpm X lhr) and analyzing the supernatant by ion chromatography. [0189] [2] Method for producing light-shielding resin composition
本発明の遮光性榭脂組成物は、例えば、以下のようにして、まずカーボンブラック、 溶剤、および必要に応じて分散剤、その他の成分を分散混合して黒色顔料分散液を 製造し、この黒色顔料分散液にバインダ榭脂、モノマー、光重合開始剤などを添カロ 混合して製造することが出来るが、本発明の遮光性榭脂組成物の製造方法は、何ら この方法に限定されるものではな 、。  The light-shielding resin composition of the present invention is produced, for example, as follows by first dispersing and mixing carbon black, a solvent, and, if necessary, a dispersant and other components to produce a black pigment dispersion. The black pigment dispersion can be produced by adding and mixing a binder resin, a monomer, a photopolymerization initiator, etc., but the method for producing the light-shielding resin composition of the present invention is not limited to this method. It ’s not something.
[0190] [2— 1]黒色顔料分散液の製造方法  [0190] [2-1] Method for producing black pigment dispersion
カーボンブラック、溶剤、および必要に応じて分散剤、その他の成分を各々所定量 秤量し、分散処理工程において、カーボンブラックを分散させて液状の黒色顔料分 散液とする。この分散処理工程では、ペイントコンディショナー(ペイントシェーカー)、 サンドグラインダー、ボールミル、ロールミル、ストーンミル、ジェットミル、ホモジナイザ 一などを使用することができる。この分散処理を行うことによってカーボンブラックを含 む色材が微粒子化されるため、このようにして調製された黒色顔料分散液を用いた 遮光性榭脂組成物は塗布特性が向上し、製品のカラーフィルタ基板の遮光能力が 向上する。  Carbon black, a solvent, and if necessary, a dispersant and other components are weighed in predetermined amounts, and in the dispersion treatment step, carbon black is dispersed to obtain a liquid black pigment dispersion. In this dispersion treatment step, a paint conditioner (paint shaker), a sand grinder, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer and the like can be used. Since the colorant containing carbon black is finely divided by this dispersion treatment, the light-shielding resin composition using the black pigment dispersion prepared in this way has improved coating properties, and the product The light shielding ability of the color filter substrate is improved.
[0191] 顔料を分散処理する際には、前記のバインダ榭脂、または分散助剤などを適宜併 用してもよい。例えば、サンドグラインダーを用いて分散処理を行う場合は、 0. 1〜8 mm径のガラスビーズ、またはジルコユアビーズを用いるのが好ましい。分散処理す る際の温度は通常、 0°C〜100°Cの範囲、好ましくは室温〜 80°Cの範囲に設定する 。なお、分散時間は、黒色顔料分散液の組成 (顔料、溶剤、分散剤等)、およびサン ドグラインダーの装置の大きさなどにより適正時間が異なるため、適宜調整する必要 がある。  [0191] When the pigment is subjected to a dispersion treatment, the binder resin or the dispersion aid may be used in combination as appropriate. For example, when the dispersion treatment is performed using a sand grinder, it is preferable to use glass beads having a diameter of 0.1 to 8 mm or zircoyu beads. The temperature during the dispersion treatment is usually set in the range of 0 ° C to 100 ° C, preferably in the range of room temperature to 80 ° C. The appropriate dispersion time depends on the composition of the black pigment dispersion (pigment, solvent, dispersant, etc.), the size of the sand grinder apparatus, and the like, so it is necessary to adjust appropriately.
[0192] この場合、 JIS Z8741における 20度鏡面光沢度が 100〜200の範囲となるように 黒色顔料分散液の光沢を制御するのが分散の目安である。黒色顔料分散液の光沢 が低 、場合には分散処理が十分でなく荒 、顔料粒子が残って 、ることが多く、現像 性、密着性、解像性等の点で不十分である。また、光沢値を上記範囲を越えるまで 分散処理すると超微粒子が多数生じるために却って分散安定性が損なわれることに なりやすい。 [0193] このようにして製造される黒色顔料分散液は、上述の如ぐ顔料を分散処理する際 に、バインダ榭脂を添加して、本発明の遮光性榭脂組成物のバインダ榭脂の一部を 含むものであっても良ぐこのようなノインダ榭脂を含むことにより、黒色顔料分散液 を製造する際の分散安定性を高めることができる。 [0192] In this case, the standard of dispersion is to control the gloss of the black pigment dispersion so that the 20 ° specular gloss in JIS Z8741 is in the range of 100 to 200. In the case where the gloss of the black pigment dispersion is low, the dispersion treatment is not sufficient and rough, and pigment particles often remain, which is insufficient in terms of developability, adhesion, resolution, and the like. Further, when the dispersion treatment is carried out until the gloss value exceeds the above range, a large number of ultrafine particles are produced, so that the dispersion stability tends to be impaired. [0193] The black pigment dispersion produced in this way is added with a binder resin when dispersing the pigment as described above, and the binder resin resin of the light-shielding resin composition of the present invention is added. By including such noinda rosin which may be partially contained, it is possible to enhance the dispersion stability when producing a black pigment dispersion.
[0194] この場合、バインダ榭脂の添加量は、黒色顔料分散液中の顔料に対して、 5〜: LOO 重量%、特に 10〜80重量%とすることが好ましい。バインダ榭脂の添加量が少なす ぎると分散安定性を高める効果が不十分であり、多すぎるとカーボンブラック等色材 濃度が低下するため、十分な遮光性が得られない。  [0194] In this case, the amount of the binder resin added is preferably 5 to: LOO wt%, particularly 10 to 80 wt% with respect to the pigment in the black pigment dispersion. If the amount of the binder resin added is too small, the effect of increasing the dispersion stability is insufficient, and if it is too large, the concentration of the colorant such as carbon black is lowered, so that sufficient light shielding properties cannot be obtained.
[0195] なお、黒色顔料分散液中の固形分濃度は、通常 10〜20重量%程度である。また 、カリウムイオンおよび Zまたはカリウム原子の濃度は、黒色顔料分散液中の全固形 分に対し、通常 lOOppm以下、好ましくは 95ppm以下、より好ましくは 50ppm以下で ある。  [0195] The solid content concentration in the black pigment dispersion is usually about 10 to 20% by weight. The concentrations of potassium ions and Z or potassium atoms are usually 10 ppm or less, preferably 95 ppm or less, more preferably 50 ppm or less, based on the total solid content in the black pigment dispersion.
ここで、「全固形分」とは、溶剤以外の黒色顔料分散液の全成分を指す。  Here, “total solid content” refers to all components of the black pigment dispersion other than the solvent.
[0196] [2— 2]遮光性榭脂組成物 (レジスト)の製造方法 [2-2] Method for producing light-shielding resin composition (resist)
本発明の遮光性榭脂組成物は、上記工程により得られた黒色顔料分散液と遮光 性榭脂組成物の成分として必要な他の成分を添加、混合し均一な溶液とすること〖こ より調製される。この場合、遮光性榭脂組成物として配合する全成分を同時に混合し た液での分散処理は、分散時に生じる発熱のため高反応性の成分が変性するおそ れがあるので好ましくない。また、製造工程においては微細なゴミが液中に混じること が多 、ため、得られた遮光性榭脂組成物はフィルタ一等により濾過処理するのが望 ましい。  The light-shielding resin composition of the present invention is obtained by adding and mixing the black pigment dispersion obtained by the above process and other components necessary as components of the light-shielding resin composition into a uniform solution. Prepared. In this case, a dispersion treatment with a solution in which all the components to be blended as a light-shielding resin composition are mixed at the same time is not preferable because a highly reactive component may be modified due to heat generated during dispersion. In addition, since fine dust is often mixed in the liquid during the production process, it is desirable to filter the obtained light-shielding resin composition with a filter or the like.
[0197] [3]カラーフィルタの製造  [0197] [3] Manufacture of color filters
次に、本発明のカラーフィルタの製造方法の具体例について説明する。  Next, a specific example of the color filter manufacturing method of the present invention will be described.
[0198] カラーフィルタは、透明基板上に、ブラックマトリックスを設けた後、通常、赤色、緑 色、青色の各色の画素画像を順次形成することにより製造される。 [0198] A color filter is usually manufactured by forming a black matrix on a transparent substrate and then sequentially forming pixel images of red, green, and blue colors.
[0199] 本発明の遮光性榭脂組成物は、特に、カラーフィルタのブラックマトリックス形成用 塗布液として使用される。 [0199] The light-shielding resin composition of the present invention is particularly used as a coating liquid for forming a black matrix of a color filter.
ブラックレジストに関しては透明基板上に、赤色、緑色、青色のカラーレジストに関 しては透明基板上に形成された榭脂ブラックマトリックス形成面上に、それぞれ塗布 、加熱乾燥、画像露光、現像および熱硬化の各処理を行って各色の画素画像が形 成される。 Regarding black resists, red, green and blue color resists on transparent substrates. In this way, on the surface of the resin black matrix formed on the transparent substrate, a pixel image of each color is formed by applying, heating, drying, image exposure, developing and thermosetting, respectively.
[0200] [3— 1]透明基板 (支持体)  [0200] [3-1] Transparent substrate (support)
カラーフィルタの透明基板としては、透明で適度の強度があれば、その材質は特に 限定されるものではない。材質としては、例えば、ポリエチレンテレフタレートなどのポ リエステル系榭脂、ポリプロピレン、ポリエチレンなどのポリオレフイン系榭脂、ポリカー ボネート、ポリメチルメタタリレート、ポリスルホンなどの熱可塑性榭脂製シート、ェポキ シ榭脂、不飽和ポリエステル榭脂、ポリ (メタ)アクリル系榭脂などの熱硬化性榭脂シ ート、または各種ガラスなどが挙げられる。この中でも、耐熱性の観点からガラス、耐 熱性樹脂が好ましい。  The transparent substrate of the color filter is not particularly limited as long as it is transparent and has an appropriate strength. Materials include, for example, polyester resin such as polyethylene terephthalate, polyolefin resin such as polypropylene and polyethylene, thermoplastic resin sheet such as polycarbonate, polymethyl methacrylate, and polysulfone, epoxy resin, Examples include unsaturated polyester resin, thermosetting resin sheets such as poly (meth) acrylic resin, and various glasses. Among these, glass and heat resistant resin are preferable from the viewpoint of heat resistance.
[0201] 透明基板およびブラックマトリックス形成基板には、接着性などの表面物性の改良 のため、必要に応じ、コロナ放電処理、オゾン処理、シランカップリング剤や、ウレタン 系榭脂などの各種樹脂の薄膜形成処理などを行っても良い。  [0201] For transparent substrates and black matrix-formed substrates, various resin such as corona discharge treatment, ozone treatment, silane coupling agent, and urethane-based resin are used as necessary to improve surface properties such as adhesion. A thin film forming process or the like may be performed.
[0202] 透明基板の厚さは、通常 0. 05〜: LOmm、好ましくは 0. l〜7mmの範囲とされる。  [0202] The thickness of the transparent substrate is usually in the range of 0.05 to: LOmm, preferably 0.1 to 7 mm.
また各種樹脂の薄膜形成処理を行う場合、その膜厚は、通常 0. 01〜10 m、好ま しくは 0. 05〜5 mの範囲である。  When thin film forming treatment of various resins is performed, the film thickness is usually in the range of 0.01 to 10 m, preferably 0.05 to 5 m.
[0203] [3— 2]画素の形成  [0203] [3-2] Pixel formation
[3— 2— 1]塗布膜の形成  [3— 2— 1] Formation of coating film
ブラックマトリックスの形成にあたっては、本発明の遮光性榭脂組成物を透明基板 上に塗布、乾燥した後、形成された塗布膜の上にフォトマスクを重ね、このフォトマス クを介して画像露光、現像、必要に応じて熱硬化または光硬化を行う。また、画素の 形成にあたっては、ブラックマトリックスを設けた透明基板上に、赤色、緑色、青色のう ち一色の色材を含有する着色組成物を塗布、乾燥した後、形成された塗布膜の上に フォトマスクを重ね、このフォトマスクを介して画像露光、現像、必要に応じて熱硬化 または光硬化を行って画素画像を形成させ、画素画像の着色層を作成する。この操 作を、赤色、緑色、青色の三色の着色組成物について各々行うことによって、カラー フィルタ画像を形成することができる。 [0204] 遮光性榭脂組成物、着色組成物の塗布は、スピナ一法、ワイヤーバー法、フローコ ート法、ダイコート法、ロールコート法、スプレーコート法などによって行うことができる 。中でも、ダイコート法によれば、塗布液使用量が大幅に削減され、かつ、スピンコー ト法によった際に付着するミストなどの影響が全くなぐ異物発生が抑制されるなど、 総合的な観点力も好まし 、。 In forming the black matrix, the light-shielding resin composition of the present invention is coated on a transparent substrate and dried, and then a photomask is overlaid on the formed coating film, and image exposure is performed through this photomask. Development, heat curing or photocuring as necessary. In forming pixels, a colored composition containing a color material of one of red, green, and blue is applied on a transparent substrate provided with a black matrix, dried, and then formed on the formed coating film. A photomask is overlaid, and a pixel image is formed through image exposure, development, and heat curing or photocuring as necessary through this photomask to form a colored layer of the pixel image. A color filter image can be formed by performing this operation for each of the three colored compositions of red, green, and blue. [0204] The shading resin composition and the coloring composition can be applied by a spinner method, a wire bar method, a flow coat method, a die coating method, a roll coating method, a spray coating method, or the like. In particular, the die coating method significantly reduces the amount of coating solution used and suppresses the generation of foreign substances that are completely free from the effects of mist adhering to the spin coating method. I like it.
[0205] 塗布膜の厚さは、厚すぎると、ノターン現像が困難となると共に、液晶セル化工程 でのギャップ調整が困難となることがあり、薄すぎると色材濃度を高めることが困難と なり所望の色発現が不可能となることがある。塗布膜の厚さは、乾燥後の膜厚として、 通常 0. 2〜20 111の範囲とするのが好ましぐょり好ましぃのは0. 5〜10 /ζ πιの範 囲、さらに好ましいのは 0. 8〜5 mの範囲である。  [0205] If the thickness of the coating film is too thick, it will be difficult to develop a no-turn development, and it may be difficult to adjust the gap in the liquid crystal cell forming process, and if it is too thin, it will be difficult to increase the colorant density. Therefore, the desired color expression may not be possible. The thickness of the coating film is usually in the range of 0.2 to 20 111 as the film thickness after drying, more preferably in the range of 0.5 to 10 / ζ πι, and more Preference is given to a range of 0.8 to 5 m.
[0206] [3— 2— 2]塗布膜の乾燥  [0206] [3—2-2] Drying of coating film
透明基板に遮光性榭脂組成物または着色組成物を塗布して形成した塗布膜の乾 燥は、ホットプレート、 IRオーブン、コンペクシヨンオーブンを使用した乾燥法によるの が好ましい。通常は、予備乾燥の後、再度加熱させて乾燥させる 2段乾燥が行われる 。予備乾燥の条件は、遮光性榭脂組成物または着色組成物中の溶剤成分の種類、 使用する乾燥機の性能などに応じて適宜選択することができる。乾燥時間は、溶剤 成分の種類、使用する乾燥機の性能などに応じて、通常は 40〜80°Cの温度で 15 秒〜 5分間の範囲で選ばれ、好ましくは 50〜70°Cの温度で 30秒〜 3分間の範囲で 選ばれる。  Drying of the coating film formed by applying a light-shielding resin composition or coloring composition to a transparent substrate is preferably performed by a drying method using a hot plate, an IR oven, or a competition oven. Usually, after preliminary drying, two-stage drying is performed by heating again and drying. The conditions for the preliminary drying can be appropriately selected according to the type of the solvent component in the light-shielding resin composition or coloring composition, the performance of the dryer used, and the like. The drying time is usually selected in the range of 40 to 80 ° C and 15 seconds to 5 minutes, preferably 50 to 70 ° C, depending on the type of solvent component and the performance of the dryer used. In the range of 30 seconds to 3 minutes.
[0207] 再加熱乾燥の温度条件は、予備乾燥温度より高い 50〜200°C、中でも 70〜160 °Cが好ましぐ特に 70〜130°Cが好ましい。また乾燥時間は、加熱温度にもよるが 10 秒〜 10分、中でも 15秒〜 5分の範囲とするのが好ましい。乾燥温度は、高いほど透 明基板に対する塗布膜の接着性が向上するが、高すぎるとバインダ榭脂が分解し、 熱重合を誘発して現像不良を生ずる場合がある。なお、この塗布膜の乾燥は、温度 を高めず、減圧チャンバ一内で乾燥を行う減圧乾燥法により行っても良い。  [0207] The temperature condition for the reheating drying is 50 to 200 ° C higher than the predrying temperature, and preferably 70 to 160 ° C, particularly preferably 70 to 130 ° C. The drying time is preferably 10 seconds to 10 minutes, and more preferably 15 seconds to 5 minutes, depending on the heating temperature. The higher the drying temperature, the better the adhesion of the coating film to the transparent substrate. However, if the drying temperature is too high, the binder resin is decomposed, and thermal polymerization may be induced to cause development failure. The coating film may be dried by a reduced pressure drying method in which drying is performed in a reduced pressure chamber without increasing the temperature.
[0208] [3— 2— 3]露光工程  [0208] [3—2-3] Exposure process
画像露光は、乾燥させた遮光性榭脂組成物または着色組成物の塗布膜上に、ネ ガのマトリクスパターンを重ね、このマスクパターンを介し、紫外線または可視光線の 光源を照射して行う。この際、必要に応じ、酸素による塗布膜の感度の低下を防ぐた め、塗布膜上にポリビニルアルコール層などの酸素遮断層を形成した後に露光を行 つても良い。 In image exposure, a negative matrix pattern is overlaid on the dried coating film of the light-shielding resin composition or coloring composition, and UV or visible light is passed through this mask pattern. Irradiate with a light source. At this time, if necessary, exposure may be performed after forming an oxygen blocking layer such as a polyvinyl alcohol layer on the coating film in order to prevent the sensitivity of the coating film from being lowered by oxygen.
[0209] 画像露光に使用される光源は、特に限定されるものではなぐ例えば、キセノンラン プ、ハロゲンランプ、タングステンランプ、高圧水銀灯、超高圧水銀灯、メタルノヽライド ランプ、中圧水銀灯、低圧水銀灯、カーボンアーク、蛍光ランプなどのランプ光源や 、アルゴンイオンレーザー、 YAGレーザー、エキシマレーザー、窒素レーザー、ヘリ ゥムカドミニゥムレーザー、半導体レーザーなどのレーザー光源などが挙げられる。 特定の波長の光を照射して使用する場合には、光学フィルタを利用することもできる  [0209] The light source used for image exposure is not particularly limited. For example, a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, Examples include lamp light sources such as carbon arc and fluorescent lamps, and laser light sources such as argon ion lasers, YAG lasers, excimer lasers, nitrogen lasers, helium cadmium lasers, and semiconductor lasers. An optical filter can also be used when irradiating light of a specific wavelength.
[0210] [3— 2—4]現像工程 [0210] [3—2-4] Development process
現像は、上記画像露光後、有機溶剤、或いは、界面活性剤とアルカリ性化合物とを 含む水溶液を用いて行うことができる。この水溶液には、さらに有機溶剤、緩衝剤、 錯化剤、染料または顔料を含ませることができる。  Development can be performed after the image exposure using an organic solvent or an aqueous solution containing a surfactant and an alkaline compound. This aqueous solution may further contain an organic solvent, a buffering agent, a complexing agent, a dye or a pigment.
[0211] アルカリ性ィ匕合物としては、水酸化ナトリウム、水酸ィ匕カリウム、水酸化リチウム、炭 酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム、ケィ酸ナトリウム、 ケィ酸カリウム、メタケイ酸ナトリウム、リン酸ナトリウム、リン酸カリウム、リン酸水素ナト リウム、リン酸水素カリウム、リン酸二水素ナトリウム、リン酸二水素カリウム、水酸化ァ ンモ -ゥムなどの無機アルカリ性化合物や、モノー 'ジ—またはトリエタノールァミン、 モノー 'ジ またはトリメチルアミ、モノー 'ジ またはトリェチルァミン、モノーまたはジ イソプロピルァミン、 n—ブチルァミン、モノ一 'ジ一またはトリイソプロパノールァミン、 エチレンィミン、エチレンジィミン、テトラメチルアンモ-ゥムヒドロキシド(TMAH)、コ リンなどの有機アルカリ性ィ匕合物が挙げられる。これらのアルカリ性ィ匕合物は、 1種を 単独で用いても良ぐ 2種以上を混合して用 、ても良 、。  [0211] Alkaline compounds include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, metasilicate. Inorganic alkaline compounds such as sodium, sodium phosphate, potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide, — Or triethanolamine, mono'di or trimethylami, mono-di or triethylamine, mono- or diisopropylamine, n-butylamine, mono-di- or triisopropanolamine, ethyleneimine, ethylenedimine, tetramethyl Ammonium hydroxide (TMAH), collagen And organic alkaline I 匕合 of such. These alkaline compounds may be used alone or as a mixture of two or more.
[0212] 界面活性剤としては、例えば、ポリオキシエチレンアルキルエーテル類、ポリオキシ エチレンアルキルァリールエーテル類、ポリオキシエチレンアルキルエステル類、ソル ビタンアルキルエステル類、モノグリセリドアルキルエステル類などのノ-オン系界面 活性剤、アルキルベンゼンスルホン酸塩類、アルキルナフタレンスルホン酸塩類、ァ ルキル硫酸塩類、アルキルスルホン酸塩類、スルホコハク酸エステル塩類などのァ- オン性界面活性剤、アルキルべタイン類、アミノ酸類などの両性界面活性剤が挙げら れ、これらは 1種を単独で用いても良ぐ 2種以上を混合して用いても良い。 [0212] Examples of the surfactant include non-ionic interfaces such as polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters, and the like. Activators, alkyl benzene sulfonates, alkyl naphthalene sulfonates, Examples include cationic surfactants such as alkyl sulfates, alkyl sulfonates and sulfosuccinic acid ester salts, and amphoteric surfactants such as alkyl betaines and amino acids. These are used alone. You may mix and use 2 or more types.
[0213] 有機溶剤としては、例えば、イソプロピルアルコール、ベンジルアルコール、ェチル セロソルブ、ブチルセ口ソルブ、フエ二ルセ口ソルブ、プロピレングリコール、ジァセト ンアルコールなどが挙げられる。これらの有機溶剤は、 1種を単独で使用しても、 2種 以上を混合して用いても良ぐまた、 1種または 2種以上を水と併用して使用しても良 い。 [0213] Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butylcetosolve, phenylsolvesolve, propylene glycol, diacetone alcohol and the like. These organic solvents may be used alone or in combination of two or more, or one or more may be used in combination with water.
[0214] 現像処理の条件は特に制限はなぐ通常、現像温度は 10〜50°Cの範囲、中でも 1 5〜45°C、特に好ましくは 20〜40°Cで、現像方法は、浸漬現像法、スプレー現像法 、ブラシ現像法、超音波現像法などのいずれかの方法によることができる。  [0214] The development conditions are not particularly limited. Usually, the development temperature is in the range of 10 to 50 ° C, particularly 15 to 45 ° C, particularly preferably 20 to 40 ° C. The development method is immersion development. , Spray developing method, brush developing method, ultrasonic developing method and the like.
[0215] [3— 2— 5]熱硬化処理  [0215] [3—2—5] Thermosetting treatment
現像後のカラーフィルタ基板には、通常熱硬化処理または光硬化処理、好ましくは 熱硬化処理を施す。  The color filter substrate after development is usually subjected to heat curing treatment or light curing treatment, preferably heat curing treatment.
[0216] 熱硬化処理条件は、温度は 100〜280°Cの範囲、好ましくは 150〜250°Cの範囲 で選ばれ、時間は 5〜60分間の範囲で選ばれる。  [0216] The thermosetting treatment conditions are selected such that the temperature ranges from 100 to 280 ° C, preferably from 150 to 250 ° C, and the time ranges from 5 to 60 minutes.
[0217] これら一連の工程を経て、一色のパター-ング画像形成は終了する。この工程を順 次繰り返し、(ブラック、)赤色、緑色、青色をパターユングし、カラーフィルタを形成す る。なお、赤色、緑色、青色の 3色のパターユングの順番は、上記した順番に限定さ れるものではない。 [0217] Through these series of steps, the pattern image formation for one color is completed. This process is repeated in sequence to pattern (black,) red, green, and blue to form a color filter. Note that the order of the three-color patterning of red, green, and blue is not limited to the order described above.
[0218] [3— 2— 6]透明電極の形成 [0218] [3—2-6] Formation of transparent electrode
本発明に係るカラーフィルタは、このままの状態で画像上に ITOなどの透明電極を 形成して、カラーディスプレー、液晶表示装置などの部品の一部として使用されるが The color filter according to the present invention is used as a part of a component such as a color display or a liquid crystal display device by forming a transparent electrode such as ITO on the image as it is.
、表面平滑性や耐久性を高めるため、必要に応じ、画像上にポリアミド、ポリイミドなど のトップコート層を設けることもできる。 In order to improve surface smoothness and durability, a top coat layer such as polyamide or polyimide can be provided on the image as necessary.
[0219] また一部、平面配向型駆動方式 (IPSモード)などの用途においては、透明電極を 形成しないこともある。  [0219] Further, in some applications such as the planar alignment type driving method (IPS mode), the transparent electrode may not be formed.
[0220] [4]液晶表示装置 (パネル) 次に、本発明の液晶表示装置 (パネル)の製造法の具体例について説明する。 [0220] [4] Liquid crystal display device (panel) Next, a specific example of the manufacturing method of the liquid crystal display device (panel) of the present invention will be described.
[0221] 本発明の液晶表示装置は、通常、上記本発明のカラーフィルタ上に配向膜を形成 し、この配向膜上にスぺーサーを散布した後、対向基板と貼り合わせて液晶セルを 形成し、形成した液晶セルに液晶を注入し、対向電極に結線して作製される。  [0221] In the liquid crystal display device of the present invention, an alignment film is usually formed on the color filter of the present invention, and after a spacer is dispersed on the alignment film, a liquid crystal cell is formed by bonding to a counter substrate. Then, liquid crystal is injected into the formed liquid crystal cell and connected to the counter electrode.
[0222] 配向膜としては、ポリイミド等の樹脂膜が好適である。配向膜の形成には、通常、グ ラビア印刷法および Zまたはフレキソ印刷法が採用され、配向膜の厚さは通常数 10 nmとされる。配向膜は熱焼成によって硬化処理された後、紫外線の照射ゃラビング 布による処理によって表面処理され、液晶の傾きを調整し得る表面状態に加工され る。  [0222] As the alignment film, a resin film such as polyimide is preferable. Gravure printing and Z or flexographic printing are usually used to form the alignment film, and the thickness of the alignment film is usually several tens of nm. The alignment film is cured by thermal baking, and then surface-treated by treatment with a UV-irradiated rubbing cloth to be processed into a surface state capable of adjusting the tilt of the liquid crystal.
[0223] スぺーサ一は、対向基板とのギャップ(隙間)に応じた大きさのものが用いられ、通 常 2〜8 mのものが好適である。カラーフィルタ基板上に、フォトリソグラフィ法によつ て透明榭脂膜のフォトスぺーサー (PS)を形成し、これをスぺーサ一の代わりに活用 することちでさる。  [0223] As the spacer, a spacer having a size corresponding to a gap (gap) with the counter substrate is used, and a spacer of 2 to 8 m is usually preferable. A transparent resin film photospacer (PS) is formed on the color filter substrate by photolithography, and this is used in place of the spacer.
[0224] 対向基板としては、通常、アレイ基板が用いられ、特に TFT (薄膜トランジスタ)基板 が好適である。  [0224] As the counter substrate, an array substrate is usually used, and a TFT (thin film transistor) substrate is particularly preferable.
[0225] 対向基板との貼り合わせのギャップは、液晶表示装置の用途によって異なるが、通 常 2〜8 mの範囲で選ばれる。対向基板と貼り合わせた後、液晶注入口以外の部 分は、エポキシ榭脂等のシール材によって封止する。シール材は、紫外線 (UV)照 射および Zまたは加熱することによって硬化させ、液晶セル周辺がシールされる。  [0225] The gap for bonding to the counter substrate varies depending on the use of the liquid crystal display device, but is usually selected in the range of 2 to 8 m. After bonding to the counter substrate, the portions other than the liquid crystal injection port are sealed with a sealing material such as epoxy resin. The sealing material is cured by ultraviolet (UV) irradiation and Z or heating, and the periphery of the liquid crystal cell is sealed.
[0226] 周辺をシールされた液晶セルは、パネル単位に切断した後、真空チャンバ一内で 減圧とし、上記液晶注入口を液晶に浸漬した後、チャンバ一内をリークすることによつ て、液晶を液晶セル内に注入する。液晶セル内の減圧度は、通常、 1 X 10_2〜1 X 1 0_7Paであるが、好ましくは 1 X 10_3〜1 X 10_6Paである。また、減圧時に液晶セル を加温するのが好ましぐ加温温度は通常 30〜100°Cであり、より好ましくは 50〜90 °Cである。減圧時の加温保持は、通常 10〜60分間の範囲とされ、その後液晶中に 浸漬される。液晶を注入した液晶セルは、液晶注入口を UV硬化榭脂を硬化させて 封止することによって、液晶表示装置 (パネル)が完成する。 [0226] The liquid crystal cell whose periphery is sealed is cut into panel units, and then the pressure is reduced in the vacuum chamber. After the liquid crystal inlet is immersed in the liquid crystal, the inside of the chamber leaks. Liquid crystal is injected into the liquid crystal cell. Decompression degree in the liquid crystal cell is usually a 1 X 10 _2 ~1 X 1 0 _7 Pa, preferably 1 X 10 _3 ~1 X 10 _6 Pa. In addition, it is preferable to heat the liquid crystal cell at the time of depressurization, and the heating temperature is usually 30 to 100 ° C, more preferably 50 to 90 ° C. Heating during decompression is usually in the range of 10 to 60 minutes and then immersed in the liquid crystal. A liquid crystal cell filled with liquid crystal is completed by sealing the liquid crystal inlet with UV-cured resin cured.
[0227] 液晶の種類には特に制限はなぐ芳香族系、脂肪族系、多環状化合物等、従来か ら知られている液晶が用いられ、リオトロピック液晶、サーモト口ピック液晶等のいずれ でも良い。サーモト口ピック液晶には、ネマティック液晶、スメスティック液晶およびコレ ステリック液晶等が知られて 、るが、 、ずれであっても良 、。 [0227] There are no particular restrictions on the type of liquid crystal, such as aromatic, aliphatic, and polycyclic compounds. Known liquid crystal is used, and any of lyotropic liquid crystal, thermopick liquid crystal and the like may be used. Nematic liquid crystal, smectic liquid crystal, cholesteric liquid crystal, etc. are known as thermo-mouth pick liquid crystal.
実施例  Example
[0228] 以下に、合成例、実施例および比較例を挙げて本発明をより具体的に説明するが 、本発明はその要旨を超えない限り、以下の実施例の記載に限定されるものではな い。  [0228] Hereinafter, the present invention will be described more specifically with reference to synthesis examples, examples and comparative examples. However, the present invention is not limited to the description of the following examples unless it exceeds the gist. Absent.
[0229] [合成例]  [0229] [Synthesis example]
合成例 1 (高分子分散剤溶液の調製)  Synthesis Example 1 (Preparation of polymer dispersant solution)
トリレンジイソシァネートの三量体 (三菱ィ匕学社製「マイテック GP750A」、榭脂固形 分 50重量%、酢酸ブチル溶液) 32gと触媒としてジブチルチンジラウレート 0. 02gを プロピレングリコールモノメチルエーテルアセテート(PGMEA) 47gで希釈溶解した 。攪拌下に、これに、片末端カ^トキシ基となっている数平均分子量 1, 000のポリエ チレングリコール(日本油脂社製「ュ-オックス M— 1000」) 14. 4gと数平均分子量 1 , 000のポリプロピレングリコール(三洋化成工業社製「サンニックス PP— 1000」) 9. 6gとの混合物を滴下した後、 70°Cでさらに 3時間反応させた。次に、 N, N ジメチ ルァミノ一 1, 3 プロパンジァミン lgを加え、 40°Cでさらに 1時間反応させた。このよ うにして得られた高分子分散剤を含有する溶液のアミン価を中和滴定により求めたと ころ 14mg— KOHZgであった。また、榭脂含有量をドライアップ法(150°Cで 30分 間、ホットプレート上で溶剤を除去し、重量変化量により榭脂濃度を算出)により求め たところ 40重量%であった。  Tolylene diisocyanate trimer (Mittech GP750A from Mitsubishi Chemical Co., Ltd., 50% by weight of rosin solids, butyl acetate solution) and 0.02g of dibutyltin dilaurate as a catalyst propylene glycol monomethyl ether acetate (PGMEA) Diluted with 47 g. Under stirring, this was mixed with a polyethylene glycol having a number average molecular weight of 1,000 at one end (“Oux M-1000” manufactured by NOF Corporation) and 14.4 g with a number average molecular weight of 1, 000 polypropylene glycol (“SANNICS PP-1000” manufactured by Sanyo Chemical Industries, Ltd.) 9.6 g of the mixture was added dropwise, and the mixture was further reacted at 70 ° C. for 3 hours. Next, N, N dimethylamino-1,3 propanediamine lg was added and reacted at 40 ° C. for an additional hour. The amine value of the solution containing the polymer dispersant thus obtained was determined by neutralization titration to be 14 mg-KOHZg. Further, the content of the resin was determined by the dry-up method (the solvent was removed on a hot plate at 150 ° C for 30 minutes, and the resin concentration was calculated from the weight change), and the content was 40% by weight.
[0230] 合成例 2 (バインダ榭脂の合成) Synthesis Example 2 (Synthesis of binder resin)
日本化薬 (株)製「XD1000」(ジシクロペンタジェン ·フエノール重合物のポリグリシ ジルエーテル、重量平均分子量 700、エポキシ当量 252) 300重量部、アクリル酸 87 重量部、 ρ—メトキシフエノール 0. 2重量部、トリフエ-ルホスフィン 5重量部、 PGME A255重量部を反応容器に仕込み、 100°Cで酸価が 3. Omg— KOHZgになるまで 撹拌した。酸価が目標に達するまで 9時間を要した (酸価 2. 5mg—KOH/g)。次 いで、更にテトラヒドロ無水フタル酸 145重量部を添加し、 120°Cで 4時間反応させ、 酸価 lOOmg— KOHZg、 GPCで測定したポリスチレン換算の重量平均分子量 260 0のバインダ榭脂 I溶液を得た。 “XD1000” manufactured by Nippon Kayaku Co., Ltd. (polyglycidyl ether of dicyclopentagen phenol polymer, weight average molecular weight 700, epoxy equivalent 252) 300 parts by weight, acrylic acid 87 parts by weight, ρ-methoxyphenol 0.2 Part by weight, 5 parts by weight of triphenylphosphine, and 255 parts by weight of PGME A were charged in a reaction vessel, and stirred at 100 ° C until the acid value became 3. Omg-KOHZg. It took 9 hours for the acid value to reach the target (acid value 2.5 mg—KOH / g). Next, add 145 parts by weight of tetrahydrophthalic anhydride and react at 120 ° C for 4 hours. A binder resin I solution having an acid value of lOOmg—KOHZg, polystyrene-equivalent weight average molecular weight of 260, measured by GPC was obtained.
[0231] 合成例 3 (インクの調製) [0231] Synthesis Example 3 (Preparation of ink)
〈実施例用インクの調製〉  <Preparation of ink for example>
インク 1の調製  Preparation of ink 1
カラー用カーボンブラック(三菱化学社製「MA—8」、平均粒子径 24 μ m、 DBP吸 油量 58mlZlOOg、表面の pH3. 0) lOOgを 2軸- ダ—内で超純水 500mlととも に 20分混練し、濾過により超純水を除去した。濾過されたカーボンブラックに再度超 純水を添加して混練し、濾過を 4回繰り返し行った。最後に濾過したカーボンブラック を乾燥して洗浄した力一ボンブラックを得た。洗浄したカーボンブラック 50重量部、合 成例— 1で作られた高分子分散剤を固形分として 10重量部の割合で、かつ固形分 濃度が 30重量%となるようにカーボンブラック、高分子分散剤溶液および PGMEA を加えた。分散液の全重量は 50gであった。これを攪拌機によりょく攪拌しプレミキシ ングを行った。  Carbon black for color (Mitsubishi Chemical “MA-8”, average particle size 24 μm, DBP oil absorption 58mlZlOOg, surface pH 3.0) lOOg in 2 shafts with ultrapure water 500ml The mixture was kneaded for 20 minutes, and ultrapure water was removed by filtration. Ultrapure water was added again to the filtered carbon black and kneaded, and filtration was repeated 4 times. Finally, the filtered carbon black was dried and washed to obtain a bonbon black. 50 parts by weight of washed carbon black, synthesis example—10 parts by weight of the polymer dispersant prepared in 1 as a solid, and carbon black and polymer dispersed so that the solids concentration is 30% by weight. Agent solution and PGMEA were added. The total weight of the dispersion was 50 g. This was stirred with a stirrer and premixed.
[0232] 次に、ペイントシェーカーにより 25〜45°Cの範囲で 6時間分散処理を行った。ビー ズは 0. 5mm φのジルコユアビーズを用い、分散液と同じ重量をカ卩えた。分散終了 後 (JIS Z8741における 20度鏡面光沢度 170)、フィルタ一によりビーズと分散液を 分離して、インク 1を調製した。  [0232] Next, a dispersion treatment was performed for 6 hours in the range of 25 to 45 ° C with a paint shaker. The beads used 0.5 mm diameter Zirco Your beads and had the same weight as the dispersion. After dispersion was completed (20-degree specular gloss 170 according to JIS Z8741), the beads and the dispersion were separated using a filter to prepare ink 1.
[0233] このインク 1につ 、て、インク試料 0. 2gに純水 9mLを添カ卩し、超音波浴で 30分抽 出後、超遠心分離(5万 rpm X lhr)し、上澄液をイオンクロマト分析したところ、インク 中の全固形分に対する K+イオン濃度 (以下同様)は 5ppm未満 (検出限界値以下) であった。  [0233] For this ink 1, add 0.2 mL of pure water to 0.2 g of the ink sample, extract in an ultrasonic bath for 30 minutes, then perform ultracentrifugation (50,000 rpm x lhr), and remove the supernatant. When the liquid was subjected to ion chromatography analysis, the K + ion concentration (hereinafter the same) with respect to the total solid content in the ink was less than 5 ppm (below the detection limit).
[0234] インク 2の調製  [0234] Preparation of Ink 2
超純水による洗浄 ·混練 ·濾過の作業回数を 2回とした以外はインク 1と同様にして インク 2を調製した。このインク 2について、インク 1と同様にイオンクロマト分析を行つ たところ、 K+濃度は 45ppmであった。  Ink 2 was prepared in the same manner as Ink 1 except that the number of washing, kneading and filtration operations with ultrapure water was changed to two. When this ink 2 was subjected to ion chromatographic analysis in the same manner as ink 1, the K + concentration was 45 ppm.
[0235] インク 3の調製  [0235] Preparation of Ink 3
超純水による洗浄 ·混練 ·濾過の作業回数を 3回とした以外はインク 1と同様にして インク 3を調製した。このインク 3について、インク 1と同様にイオンクロマト分析を行つ たところ、 K+濃度は 6ppmであった。 Wash with ultrapure water, kneading Ink 3 was prepared. When this ink 3 was subjected to ion chromatographic analysis in the same manner as ink 1, the K + concentration was 6 ppm.
[0236] インク 4の調製 [0236] Preparation of Ink 4
超純水による洗浄 ·混練 ·濾過の作業回数を 1回とした以外はインク 1と同様にして インク 4を調製した。このインク 4について、インク 1と同様にイオンクロマト分析を行つ たところ、 K+濃度は 90ppmであった。  Ink 4 was prepared in the same manner as Ink 1 except that the number of washing, kneading and filtration operations with ultrapure water was one. When this ink 4 was subjected to ion chromatographic analysis in the same manner as ink 1, the K + concentration was 90 ppm.
[0237] 〈比較例用インクの調製〉 <Preparation of Comparative Ink>
インク 5の調製  Preparation of ink 5
超純水による洗浄を行わな力つた以外はインク 1と同様にしてインク 5を調製した。こ のインク 5について、インク 1と同様にイオンクロマト分析を行ったところ、 K+濃度は 40 lppmであつに。  Ink 5 was prepared in the same manner as ink 1 except that it was not washed with ultrapure water. This ink 5 was subjected to ion chromatographic analysis in the same manner as ink 1, and the K + concentration was 40 lppm.
[0238] なお、用いたカーボンブラックの平均粒子径、 DBP吸油量、及び表面の pHは、上 述の超純水による洗浄 ·混練 ·濾過処理を行っても、その処理前と変わらな力つた。  [0238] The average particle size, DBP oil absorption, and surface pH of the carbon black used were the same as those before the cleaning, kneading, and filtration treatment with ultrapure water. .
[0239] [実施例 1〜4および比較例 1]  [Examples 1 to 4 and Comparative Example 1]
i)レジスト液の調合  i) Preparation of resist solution
合成例 3で調製したカーボンブラック分散インキを用いて、下記の配合割合とな るように各成分を加え、スターラーにより攪拌、溶解させて、各々、ブラックレジスト感 光液を調製した。  Using the carbon black dispersion ink prepared in Synthesis Example 3, each component was added so as to have the following blending ratio, and stirred and dissolved with a stirrer to prepare a black resist photosensitive solution.
[0240] 〈配合割合〉 [0240] <Combination ratio>
合成例— 3で調製したインク (表 1に示す):固形分として 50g  Synthesis Example-Ink prepared in 3 (shown in Table 1): 50g as solid content
合成例― 2で調製したバインダ榭脂 I溶液:固形分として 30g  Synthesis example-2 Binder resin prepared in 2 Solution: 30g as solid content
モノマー(エチレン性化合物:ジペンタエリスリトールへキサアタリレート): 10g 合成例 1で調製した塩基性高分子分散剤含有溶液:固形分として 5g 光重合開始剤 (チバスべシャリティケミカルズ社製「CGI242」下記構造式に示す化 合物): 5g  Monomer (Ethylene Compound: Dipentaerythritol Hexatalylate): 10g Basic Polymer Dispersant-Containing Solution Prepared in Synthesis Example 1: 5g as Solids Photopolymerization Initiator (Ciba242, Ciba Specialty Chemicals) Compound shown in the following structural formula): 5g
[化 5]
Figure imgf000050_0001
有機溶剤 (PGMEA): 300g
[Chemical 5]
Figure imgf000050_0001
Organic solvent (PGMEA): 300g
界面活性剤 (住友 3M社製「FC— 430」フッ素系界面活性剤):レジスト液中の濃度 力 SlOOppmとなる量  Surfactant (Sumitomo 3M “FC-430” fluorosurfactant): Concentration force in resist solution SlOOppm
[0241] ii)レジスト液の評価 [0241] ii) Evaluation of resist solution
i)で調製した各ブラックレジスト感光液をスピンコーターにてガラス基板 (コーユング 社製「7059」)に塗布し、ホットプレートで 80°Cにて 1分間乾燥した。乾燥後のレジス トの膜厚を触針式膜厚計 (テンコール社製「ひ—ステップ」)で測定したところ 1 μ mで あった。次に、このサンプルをマスクを通して高圧水銀灯で露光量を変えて像露光し た。その後、温度 25°Cで、濃度 0. 8重量%の炭酸ナトリウム水溶液を用いてスプレー 現像することによりレジストパターンを得た。  Each black resist sensitizing solution prepared in i) was applied to a glass substrate (“7059” manufactured by Cowing Co., Ltd.) with a spin coater and dried on a hot plate at 80 ° C. for 1 minute. The film thickness of the resist after drying was measured with a stylus type film thickness meter (“Hi-Step” manufactured by Tencor) and found to be 1 μm. Next, this sample was image-exposed through a mask while changing the exposure amount with a high-pressure mercury lamp. Then, a resist pattern was obtained by spray development at a temperature of 25 ° C. using an aqueous sodium carbonate solution having a concentration of 0.8% by weight.
形成されたレジストパターンについて、感度、解像力および遮光性を下記の基準で 評価し、結果を表 1に示した。  The formed resist pattern was evaluated for sensitivity, resolving power, and light shielding property according to the following criteria. The results are shown in Table 1.
[0242] 感度 [0242] Sensitivity
寸法が 20 μ mのマスクパターンを寸法通り形成できる適正露光量 (mjZcm2)をも つて表示した。すなわち、露光量の少ないレジストは低露光量で画像形成が可能で あるため高感度であることを示す。 The appropriate exposure (mjZcm 2 ) that can form a mask pattern with a dimension of 20 μm is displayed. In other words, a resist with a small exposure amount has high sensitivity because an image can be formed with a low exposure amount.
[0243] 解像力 [0243] Resolution
寸法が 20 μ mのマスクパターンを忠実に再現する露光量における解像可能なレジ スト最小パターン寸法を 200倍の倍率で顕微鏡観察した。  The minimum resist pattern size that can be resolved at an exposure that faithfully reproduces a mask pattern with a dimension of 20 μm was observed with a microscope at a magnification of 200 times.
最小パターン寸法が 10 m以下 : ◎  Minimum pattern dimension is 10 m or less: ◎
最小パターン寸法が 10 /z mを超え 15 /z m以下: 〇  Minimum pattern dimension exceeds 10 / z m and 15 / z m or less: 〇
最小パターン寸法が 15 mを超える : X  Minimum pattern dimension exceeds 15 m: X
[0244] 遮光性 [0244] Light shielding
画線部の光学濃度 (OD)をマクベス反射濃度計 (コルモルグン社製「TR927」 )で 測定した。なお、 OD値は遮光能力を示す数値であり数値が大きい程高遮光性であ ることを示す。 The optical density (OD) of the image area is measured with a Macbeth reflection densitometer (Kolmorgun TR927). It was measured. The OD value is a numerical value indicating the light shielding ability. The larger the numerical value, the higher the light shielding property.
[0245] また、 i)で調製した各ブラックレジスト感光液にっ 、て、下記方法で、 K+濃度を測 定し、レジスト感光液中の全固形分に対する割合を求め、結果を表 1に併記した。  [0245] Further, for each black resist photosensitive solution prepared in i), the K + concentration was measured by the following method to determine the ratio to the total solid content in the resist photosensitive solution, and the results are also shown in Table 1. did.
<κ+濃度測定方法 >  <K + concentration measurement method>
ブラックレジスト (遮光性榭脂組成物) 0. 2g (固形分量として)に純水 9mLを添加し て超音波浴で 30分抽出後、超遠心分離(5万 rpmZlhr)し、上澄液をイオンクロマト グラフで分析した。  Add 9 mL of pure water to 0.2 g (as solid content) of black resist (light-shielding rosin composition), extract in an ultrasonic bath for 30 minutes, then perform ultracentrifugation (50,000 rpmZlhr), and ionize the supernatant. Analyzed by chromatography.
[0246] [表 1] [0246] [Table 1]
Figure imgf000051_0001
産業上の利用可能性
Figure imgf000051_0001
Industrial applicability
[0247] 本発明の遮光性榭脂組成物によれば、現像性、解像性、密着性、特に直線性、密 着性に優れるブラックマトリックスを形成することができ、これにより、高品質なカラーフ ィルタおよび液晶表示装置を提供することが出来る。  [0247] According to the light-shielding resin composition of the present invention, it is possible to form a black matrix having excellent developability, resolution, adhesion, particularly linearity and adhesion, thereby achieving high quality. A color filter and a liquid crystal display device can be provided.
よって、本発明は、遮光性榭脂組成物、カラーフィルタ、液晶表示装置の各分野に おいて、産業上の利用可能性は極めて高い。  Therefore, the present invention has very high industrial applicability in the fields of light-shielding resin composition, color filter, and liquid crystal display device.
[0248] 本発明を特定の態様を用いて詳細に説明したが、本発明の意図と範囲を離れるこ となく様々な変更が可能であることは当業者に明らかである。 [0248] Although the present invention has been described in detail using specific embodiments, it will be apparent to those skilled in the art that various modifications can be made without departing from the spirit and scope of the invention.
なお、本出願は、 2006年 4月 28日付で出願された日本特許出願 (特願 2006— 1 This application is a Japanese patent application filed on April 28, 2006 (Japanese Patent Application No. 2006-1).
25635)及び 2007年 4月 20日付で出願された日本特許出願(特願 2007— 1119925635) and Japanese patent applications filed on April 20, 2007 (Japanese Patent Application No. 2007-11199)
1)に基づいており、その全体が引用により援用される。 Based on 1), which is incorporated by reference in its entirety.

Claims

請求の範囲  The scope of the claims
[I] ノインダ榭脂、モノマー、光重合開始剤、およびカーボンブラックを含有する遮光 性榭脂組成物において、  [I] In a light-shielding resin composition containing Noinda resin, a monomer, a photopolymerization initiator, and carbon black,
該カーボンブラックの平均粒子径が 8nm以上 65nm以下であり、  The carbon black has an average particle size of 8 nm or more and 65 nm or less,
カーボンブラックの DBP吸油量が 90mlZlOOg以下であり、  Carbon black has a DBP oil absorption of 90mlZlOOg or less,
該遮光性榭脂組成物のカリウムイオンの含有量が、全固形分に対して 20ppm以下 であることを特徴とする遮光性榭脂組成物。  The light-shielding resin composition, wherein the potassium ion content of the light-shielding resin composition is 20 ppm or less based on the total solid content.
[2] カリウムイオンの含有量が全固形分に対して lOppm以下である、請求項 1に記載 の遮光性榭脂組成物。 [2] The light-shielding resin composition according to claim 1, wherein the potassium ion content is 10 ppm or less with respect to the total solid content.
[3] カーボンブラックの DBP吸油量が 75mlZlOOg以下である、請求項 1に記載の遮 光性榭脂組成物。  [3] The light-shielding resin composition according to claim 1, wherein the carbon black has a DBP oil absorption of 75 mlZlOOg or less.
組成物。  Composition.
[4] カーボンブラックの含有量が、遮光性榭脂組成物の全固形分中 10〜70重量%で ある、請求項 1に記載の遮光性榭脂組成物。  [4] The light-shielding resin composition according to claim 1, wherein the content of carbon black is 10 to 70% by weight in the total solid content of the light-shielding resin composition.
[5] カーボンブラックの含有量が、遮光性榭脂組成物の全固形分中 40〜70重量%で ある、請求項 1に記載の遮光性榭脂組成物。 [5] The light-shielding resin composition according to claim 1, wherein the content of carbon black is 40 to 70% by weight based on the total solid content of the light-shielding resin composition.
[6] さらに塩基性高分子分散剤を含有する、請求項 1に記載の遮光性榭脂組成物。 [6] The light-shielding resin composition according to claim 1, further comprising a basic polymer dispersant.
[7] カーボンブラックの表面の pHが 5以下である、請求項 1に記載の遮光性榭脂組成 物。 [7] The light-shielding resin composition according to claim 1, wherein the surface of the carbon black has a pH of 5 or less.
[8] ノインダ榭脂が、カルボキシル基を有するエポキシアタリレート榭脂である、請求項 [8] The Noinda resin is an epoxy acrylate resin having a carboxyl group.
1に記載の遮光性榭脂組成物。 The light-shielding rosin composition according to 1.
[9] 光重合開始剤がォキシムエステル系化合物である、請求項 1に記載の遮光性榭脂 組成物。 [9] The light-shielding resin composition according to claim 1, wherein the photopolymerization initiator is an oxime ester compound.
[10] 請求項 1に記載の遮光性榭脂組成物を用いて形成された画素を有することを特徴 とするカラーフィルタ。  [10] A color filter comprising a pixel formed using the light-shielding resin composition according to claim 1.
[II] 請求項 10に記載のカラーフィルタを備えることを特徴とする液晶表示装置。  [II] A liquid crystal display device comprising the color filter according to claim 10.
PCT/JP2007/058737 2006-04-28 2007-04-23 Light blocking resin composition, color filter, and liquid crystal display WO2007125864A1 (en)

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