WO2007077691A1 - Photocurable resin composition - Google Patents

Photocurable resin composition Download PDF

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Publication number
WO2007077691A1
WO2007077691A1 PCT/JP2006/323491 JP2006323491W WO2007077691A1 WO 2007077691 A1 WO2007077691 A1 WO 2007077691A1 JP 2006323491 W JP2006323491 W JP 2006323491W WO 2007077691 A1 WO2007077691 A1 WO 2007077691A1
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Prior art keywords
group
photocurable resin
meth
resin composition
acrylate
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PCT/JP2006/323491
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French (fr)
Japanese (ja)
Inventor
Yoshitsugu Goto
Jun Watanabe
Norihiro Shimizu
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Denki Kagaku Kogyo Kabushiki Kaisha
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Application filed by Denki Kagaku Kogyo Kabushiki Kaisha filed Critical Denki Kagaku Kogyo Kabushiki Kaisha
Priority to JP2007552880A priority Critical patent/JP5348893B2/en
Priority to CN2006800503979A priority patent/CN101356204B/en
Publication of WO2007077691A1 publication Critical patent/WO2007077691A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/56Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
    • C08K5/57Organo-tin compounds

Definitions

  • the present invention relates to a photocurable resin composition and a cured product that can be cured by irradiation with light such as ultraviolet rays and visible light, and more specifically, a photocurable resin composition having excellent vibration fatigue durability. Product and cured product.
  • a composition that gives so-called rubber properties such as flexibility, stretchability, and elasticity is called an elastomer, and its fatigue durability against vibration is far superior to that of other polymer materials.
  • automobile parts such as tires, sealing members for structures such as civil engineering and construction, packing members such as O-rings, acoustic members such as speakers, sheet members such as mobile phone key sheets, vibration-proof materials, various types It is applied as a mechanism member.
  • Conventional elastomers include natural rubber, modified natural rubber, natural rubber, cyclized natural rubber, chlorinated natural rubber, styrene butadiene rubber, chloroprene rubber, acrylonitrile monobutadiene. Rubber, carboxylated nitrile rubber, nitrile rubber
  • a method of obtaining a molded product of elastomer (R) includes a kneading step in which an elastomer raw material containing a curing agent and other additives is sufficiently kneaded, and a kneaded dough is vacuum-formed.
  • Molding method, pressure forming method, molding using upper and lower molds hereinafter referred to as upper and lower molds
  • molding by pressure molding method, injection molding method, etc. and curing or curing by heating and pressurizing
  • the desired molded product is obtained! / Speak.
  • the molten resin is cooled immediately after coming into contact with a mold having a temperature difference, and the fluidity is extremely lowered. Therefore, it is difficult to obtain a thin molded body, and heating, Equipment is expensive due to the injection, pressure and other processes. Further, since the thermoplastic material is heated to near the melting point, the heating energy is enormous.
  • the molding material is formed by molding a planar material substantially larger than the target part dimensions and then cutting out the part portion. Therefore, a lot of waste is generated, which is unfavorable environmentally and economically.
  • the above-described constituent materials of the vacuum forming method, the pressure forming method, and the heating and press forming method using the upper and lower molds are generally uniform thickness materials. From the same material, it is difficult to change the thickness of each part.
  • Thickness that is produced industrially is limited, and it is usually difficult to obtain materials with other thicknesses.
  • a method of changing the thickness by a process such as stretching at the time of molding has also been proposed, but problems such as increased internal stress distortion after molding occur.
  • Patent Document 1 proposes a photocuring cast molding method.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2004-357020
  • At least one of a pair of molds including an upper mold and a lower mold is formed of a material that transmits light, and a mold is set by setting a resin that can be cured by light irradiation.
  • This is a method of closing the and irradiating light from the outside of the mold that transmits light to cure the resin and obtain a cured product of the desired shape.
  • Patent Document 2 and Patent Document 3 are for sealing materials
  • Patent Document 4 is for optical three-dimensional modeling.
  • a rosin composition is disclosed.
  • a resin composition suitable for the above-mentioned photo-curing cast molding method and satisfying vibration fatigue durability as required for a conventional elastomer has not been known.
  • Patent Document 2 Japanese Translation of Special Publication 2002-501109
  • Patent Document 3 Japanese Translation of Special Publication 2003-505525
  • Patent Document 4 Japanese Patent Laid-Open No. 2000-290328
  • the present invention has been made in view of the above-mentioned publicly known technology, and is a photocurable resin composition that can be cured by light irradiation and is suitable for a photocuring cast molding method, and vibration fatigue.
  • An object of the present invention is to provide a photocurable resin composition and a cured product excellent in durability.
  • the present invention has the following gist.
  • A At least one resin selected from the group consisting of a photoradical polymerizable resin, a photoradical addition polymerizable resin, and a photothion polymerizable resin, and (B) a photopolymerization initiator ( C) a photocurable resin composition containing an antioxidant and (D) a light stabilizer and / or a light stabilizer, the photocurable resin composition and a cured product of the photocurable resin thread and composition.
  • a photocurable resin composition having a tensile elastic modulus of 1 to 30 MPa and a tensile strength of 200% or more.
  • the rubber composition is a copolymer having at least one monomer power selected from (meth) acrylic acid ester compound, bulle compound, and olefinic hydrocarbon compound, and having a weight average molecular weight.
  • the photocurable resin composition according to the above 1 or 2 which is in the range of 500 to 50,000.
  • the rubber composition is a (meth) acrylic acid ester compound, a bure compound, and an olefinic hydrocarbon compound. (Ii) 20-90% by mass of a radically polymerizable monomer having a glass transition temperature of less than 25 ° C.
  • the component (c) wherein the monomer of the component has one or more groups selected from the group consisting of a hydroxyl group, a carboxylic acid group, a glycidyl group, an isocyanate group, an amino group, and an alkoxysilyl group.
  • the photocurable resin composition as described in any one of Claims.
  • the photoradically polymerizable resin is an acrylic resin.
  • a H-acrylyl saccharine has (a-1) one or more (meth) attalyloyl at the end or side chain of the molecule.
  • a urethane (meth) acrylate oligomer having at least one group and a content of R c R ⁇ ll is from 5,000 to 100,000, and (a-2) a monofunctional (meth) acrylate. 14.
  • R 1 is a hydrogen atom or a methyl group
  • R 2 is a straight or branched alkyl group having 1 to 22 carbon atoms, a cyclohexyl group, a straight or branched chain having 1 to 4 carbon atoms.
  • R 1 is a hydrogen atom or a methyl group
  • R 3 is a linear or branched alkyl group having 1 to 4 carbon atoms
  • R 4 is a linear or branched alkyl group having 1 to 4 carbon atoms.
  • a photoradical addition-polymerizable resin comprising a polyene compound having two or more carbon-carbon unsaturated double bonds in the molecule and a polythiol compound having two or more mercapto groups in the molecule.
  • the photocurable resin composition according to any one of 1 to 13 above
  • photocurable resin composition according to any one of 1 to 13 above, wherein the photopower thione polymerizable resin has an epoxy group, an oxetanyl group, or a vinyl ether group in the molecule.
  • the photocurable resin composition of the present invention has characteristics that it is instantly cured by irradiation with light such as ultraviolet rays or visible light, and that the cured product has excellent vibration fatigue durability. Therefore, automobile members such as tires, sealing members for structures such as civil engineering and construction, packing members such as o-rings, acoustic members such as speakers, sheet members such as key sheets for mobile phones, members, vibration-proof materials It can be suitably used for various mechanism members.
  • the photocurable resin composition of the present invention can also be applied to adhesives for structural and structural seals for civil engineering and construction, metals, magnets, ceramics, glass, and plastics.
  • molecular weight means a weight average molecular weight unless otherwise specified.
  • Tg means a glass transition temperature unless otherwise specified.
  • an “alkyl group” means a straight chain, a branched chain or a ring unless otherwise specified.
  • the photocurable resin composition of the present invention contains a photocurable resin that is a component (A) and forms a cured body upon irradiation with light.
  • the term “light” as used herein refers to an active energy ray typified by ultraviolet rays and visible rays.
  • the photocurable resin is a photo-radical polymerizable resin. It is possible to use at least one resin selected from the group consisting of a resin, a photo-radical addition polymerizable resin, and a light power thione polymerizable resin. Of these, the photo-radically polymerizable resin is preferably selected because it contains an acrylic resin rich in material selectivity.
  • the photoradical addition-polymerizable resin As the photoradical addition-polymerizable resin, a well-known thiol reaction in which a thiol group is added to a carbon-carbon unsaturated bond by radical generation is known.
  • a well-known thiol reaction in which a thiol group is added to a carbon-carbon unsaturated bond by radical generation is known.
  • an enthiol resin comprising a compound having at least two thiol groups in the molecule and a compound having at least two carbon-carbon unsaturated bonds in the molecule is excellent in photocurability. Is preferable.
  • Examples of the photopower thione-polymerizable resin include an epoxy group-containing resin, an oxetanyl group-containing resin, a vinyl ether group-containing resin, a spiro orthoester group-containing resin, and a bicycloorthoester group. And the like having a spiro orthocarbonate group.
  • a resin having an epoxy group, an oxetal group or a butyl ether group is preferred because of its photocurability and abundant selection of materials.
  • Examples of the photo-radically polymerizable resin include acrylic resin, styrene resin, vinyl resin, unsaturated polyester, polyolefin, etc. Among them, acrylic resin has photocurability and abundant selection of materials. ⁇ Preferred for reasons U ⁇ .
  • Acrylic resins include poly (meth) acrylate, (meth) acrylate monomer, (meth) acrylate dimer, polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) Examples thereof include acrylate, polyolefin (meth) acrylate, and silicone (meth) acrylate.
  • a resin composition comprising urethane (meth) acrylate and (meth) acrylate monomers is preferred.
  • (a-1) one kind of urethane (meth) acrylate oligomer having one or more (meth) attalyloyl groups at the end or side chain of the molecule and having a molecular weight of 5,000-100,000.
  • (a-2) monofunctional (meta) finished It is a rosin composition consisting of tartrate.
  • the urethane (meth) acrylate oligomer as the component (a-1) is a polyol compound.
  • Examples of powerful polyol compounds (X) include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, butylene glycol, 1,4 butanediol, polybutylene diol, 1,5 pentanediol, 1,6 hexanediol, 1,8 octanediol, 1,9-nonanediol, 3 methyl-1,5 pentanediol, 2,4 jetyl 1, 5 Pentanediol, 2, 2 Butylethyl-1,3 Propanediol, Neopentyl glycol, Cyclohexane dimethanol, Hydrogenated carbphenol A, Poly-strength prolatatone, Trimethylolethane, Trimethylololepropane, Polytrimethylolono Polyhydric alcohols such as pronone,
  • Polyester polyol that is a condensate with polybasic acid; force prolatatone modified polyol such as caprolatatone modified polytetramethylene polyol; polyolefin polyol; polycarbonate polyol; Examples thereof include polybutadiene-based polyols such as hydrogenated polybutadiene polyol; and silicone polyols such as polydimethylsiloxane polyol. Particularly preferred are polyether polyols and polyester polyols.
  • a molecular weight of 200 to 10,000 is particularly preferable, preferably 500 to 8,000, and more preferably 1,000 to 6,000. If the molecular weight to be applied is 200 or more, suitable vibration fatigue durability can be obtained, and if it is within 10,000, the curability is reduced. It is preferable.
  • the organic polyisocyanate compound (Y) is not particularly limited, and examples thereof include aromatic, aliphatic, cycloaliphatic, and alicyclic polyisocyanates. Can be mentioned. Among them, tolylene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), hydrogenated diphenylmethane diisocyanate (H—MDI), polyphenylmethane polyisocyanate ( Crude MDI), modified diphenylmethane diisocyanate (modified MDI), hydrogenated xylylene diisocyanate (H—XDI), xylylene diisocyanate (XDI), hexamethylene diisocyanate (HMDI), to trimethyl Xamethylene diisocyanate (TMXDI), tetramethylxylylene diisocyanate (m—TMXDI), isophorone diisocyanate (IPDI), norbornene diisocyanate (TDI),
  • H-XDI hydrogenated xylylene diisocyanate
  • IPDI isophorone diisocyanate
  • the molecular weight of the polyisocyanate compound (Y) is preferably 500 or less. If it is 500 or less, the reactivity with the diol does not decrease.
  • hydroxy (meth) acrylate (Z) examples include 2-hydroxyethyl (meth) ateryl
  • 2-Hydroxyethyl allyloyl phosphate 4-Butylhydroxy (meth) atrelate, 2— (Meth) atariloy cicchitil 1-hydroxypropyl phthalate, Glycerin di (meth) acrylate, 2-Hydroxy 1-Atari Leyloxypropyl (meth) acrylate, force Prolataton modified 2-hydroxyethyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, force prolatathone modified 2—Hydroxetil ( And (meth) acrylate.
  • 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate are preferably used.
  • the number of (meth) attaroyl groups in the molecule is 1 or more and 6 or less, more preferably 2 or more and 4 or less at the end or side chain of the molecule. Those having a (meth) atallyloyl group are preferred. If there is no (meth) atalyloyl group, then (B) Component (B) cannot be copolymerized with monofunctional (meth) acrylate, and if it is more than 6, the resulting molded product becomes too hard and excellent vibration fatigue durability cannot be obtained. There is.
  • the molecular weight of the urethane (meth) atarylate oligomer is 5,000 or more and 100,000 or less, and more preferably c Rc ⁇ ⁇ l l is 10,000 or more and 50,000 or less. If the molecular weight is 5,000 or more, the resulting molded o body will not be too hard. If it is 100,000 or less, the curability will be low.
  • Vibration that does not worsen 2 A cured product with excellent fatigue durability can be obtained.
  • the monofunctional (meth) acrylate which is the component (a-2) is not particularly limited as long as it contains one (meth) attayl group in the molecule.
  • a resin composition containing a monofunctional (meth) acrylate represented by the following formula [1] or [2] is particularly preferable because a cured product excellent in vibration fatigue durability can be obtained.
  • R 1 is a hydrogen atom or a methyl group
  • R 2 is a linear or branched alkyl group having 1 to 22 carbon atoms (preferably having 1 to 12 carbon atoms)
  • a cyclohexyl group a cyclohexyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms
  • a phenyl group a phenyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms
  • a dicyclo group A pental group, a dicyclopentayl group, a boryl group, an isobolyl group, an adamantyl group, a methyladamantyl group, and an aryl group.
  • R 1 is a hydrogen atom or a methyl group
  • R is a straight chain having 1 to 4 carbon atoms.
  • R 4 is a linear or branched alkyl group having 1 to 4 carbon atoms, a cyclohexyl group, or a cyclohexyl group substituted by a linear or branched alkyl group having 1 to 4 carbon atoms.
  • a phenyl group a phenyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclopental group, a dicyclopental group, a boryl group, an isobornyl group, an adamantyl group , A methyladamantyl group and an aryl group.
  • n is an integer of 1 to 12, preferably 1 to 10.
  • the monofunctional (meth) acrylate is preferably a monofunctional (meth) acrylate having a Tg of the homopolymer of 20 ° C or higher. More preferably, Tg is 50 ° C or higher, particularly preferably 80 ° C or higher. If the Tg is 20 ° C or higher, the resulting cured product will not be too flexible or harden.
  • the Tg of the photocurable resin composition of the present invention is measured. Although the method is not particularly limited, it is measured by a known method such as DSC or dynamic viscoelasticity, and DSC is preferably used.
  • the blending ratio of the components (a-1) and (a-2) is:
  • Cured products obtained by irradiation are particularly preferred because they have excellent vibration fatigue durability.
  • the photopolymerization initiator as the component (B) includes an ultraviolet polymerization initiator and a visible light polymerization initiator, both of which are used without limitation.
  • the radical photopolymerization initiator include benzoin-based, benzophenone-based, acetophenone-based, acyl-phosphine oxide-based, thixanthone-based, meta-octene-based, and quinone-based initiators.
  • photoinitiated thione polymerization initiators iodine salt compounds, sulfur salt compounds, phosphorium salt compounds, pyridinium salt compounds, iron arene complex compounds Etc.
  • the photopolymerization initiator is not particularly limited, and known ones can be used.
  • Examples of the anti-oxidation agent that is component (C) include ⁇ -naphthoquinone, 2-methoxy-1,4-naphthoquinone, methyl hydroquinone, hydroquinone, hydroquinone monomethyl ether, mono-tert butyl hydroquinone, 2, 5 G-tert butyl hydroquinone, p— Quinone compounds such as benzoquinone, 2,5 diphenyl mono-benzoquinone, 2,5 di-tert-butyl p-benzoquinone; phenothiazine, 2,2-methylene monobis (4-methyl-6-tert-butylenophenol) , Force teconole, tert-butinole force teconole, 2-butynole —4 hydroxyvaninol, 2, 6 di-tert-butyl p cresol, 2-tert-butyl 6- (3-tert-butyl 2-hydroxy-5-methylbenzyl) 4 Me
  • Examples of the light stabilizer that is component (D) include bis (2, 2, 6, 6-tetramethyl-4-piperidyl) sebacate and bis (1, 2, 2, 6, 6 pentamethyl-4-piperidyl) sebacate. 1 ⁇ 4 Benzyloxy-2,2,6,6-tetramethylpiperidine, 1- [2- [3-((3,5--di-tert-butyl-4-hydroxyphenol) propio-loxy] Ethyl] -4-4- [3 (3,5 di tert-butyl-4-hydroxyphenyl) propio-loxy] 2, 2, 6, 6-tetramethylpiperidine, 1, 2, 2, 6, 6 pentamethyl-4 piperizi -Lumethyl relay, bis (1,2,2,6,6 pentamethyl-4piberidyl) [[3,5 bis (1,1-dimethylethyl) 4-hydroxyphenyl] methyl] butyl malonate, decane Bis (2, 2, 6, 6-tetramethyl-1 (octyloxy)
  • Zoate compounds 2— (4, 6 Diphenyl— 1, 3, 5 Triazine— 2—yl) —5 — [( And triazine compounds such as (hexyl) oxy] phenol.
  • Particularly preferred are hindered amine compounds.
  • the component (A) when the total amount of the components (A) to (D) is 100% by mass, the component (A) is preferably 85.00- 99.99 mass 0/0, and particularly preferably contained from 90.0 to 99.9 wt%.
  • Component (B) is preferably contained in an amount of 0.01 to 15% by mass, particularly preferably 0.1 to 10% by mass.
  • the total of the component (C) and the component (D) is preferably 0.01 to 5% by mass, particularly preferably 0.05 to 3% by mass.
  • Component (C) and component (D) are preferably such that the content ratio of component (C) Z (D) is 0Z10 to 10Z0, particularly preferably 1Z9 to 9Zl.
  • a cured product obtained from the photocurable resin composition of the present invention is preferable because it has excellent vibration fatigue durability.
  • the photocurable resin composition of the present invention includes, in addition to the photocurable resin, (B) a photopolymerization initiator, (C) an acid-proofing agent, and (D) light.
  • the cured product of the photocurable resin composition containing either or both of the stabilizers has a tensile modulus when subjected to a tensile test measurement in accordance with JIS K7113 (plastic tensile test method). Is 1 to 30 MPa, preferably 1.5 to 28.5 MPa, and exhibits excellent vibration fatigue durability with a tensile elongation at break of 200% or more, preferably 201 to 1500%.
  • the tensile modulus of the cured product is IMPa or more, there will be no problem that the resulting cured product is too soft to maintain its shape! Further, if the cured product has a tensile modulus of 30 MPa or less and a tensile strength of 200% or more, excellent vibration fatigue durability can be obtained, and the effects of the invention can be reliably obtained.
  • the photocurable resin composition of the present invention it is preferable to include at least one rubber composition as the component (E) in order to obtain excellent vibration fatigue durability.
  • the molecular weight of the rubber composition is preferably 500 to 50,000, particularly preferably 750 to 20,000. It is 0, and more preferably in the range of 1,000 to 10,000.
  • a photocurable resin having a molecular weight of 500 or more is preferable because sufficient vibration fatigue durability can be obtained, and if it is 50,000 or less, the compatibility with the photocurable resin is excellent.
  • the molecular weight distribution of the rubber composition (MwZMn when the weight average molecular weight is Mw and the number average molecular weight is Mn) is 1.0 or more and 5.0 or less, particularly preferably 1.1 or more and 3.0 or less. It is preferable because it is compatible with the photocurable resin and gives excellent vibration fatigue durability.
  • the monomer constituting the rubber composition includes (i) a radically polymerizable monomer having a Tg of the homopolymer of less than 25 ° C, and (mouth) a Tg of the homopolymer of 25 ° C or more.
  • the rubber composition contains a certain radically polymerizable monomer and (c) a radically polymerizable monomer having at least one reactive group that is non-radically polymerizable in the molecule, the rubber composition has a photocurable property. This is particularly preferred because it provides excellent vibration fatigue durability with good compatibility with fats.
  • the monomer of component (i) imparts flexibility to the rubber composition.
  • the proportion of the component (ii) in the rubber composition is preferably 20 to 90% by mass, particularly preferably 30 to 80% by mass.
  • Component includes alkyl (meth) acrylate having 1 to 20 carbon atoms (for example, butyl acrylate, n-butyl methacrylate, ethyl acrylate, n-octyl acrylate, and 2-ethyl). Hexyl (meth) acrylate], gen monomers [for example, butadiene, isoprene], butyl acetate monomers and the like.
  • an alkyl (meth) acrylate having 1 to 20 carbon atoms is preferable, and an alkyl (meth) acrylate having 1 to 8 carbon atoms is particularly preferable. It is.
  • the monomer of the (mouth) component provides compatibility with the photocurable resin. Occupies in rubber composition
  • the proportion of the (mouth) component is preferably from 0.1 to 70% by mass, particularly preferably from 1 to 60% by mass.
  • (Mouth) components include methyl methacrylate, ethyl methacrylate, t-butyl methacrylate, cyclohexyl methacrylate, isobornyl (meth) acrylate, dicyclopental (meth) acrylate. Examples thereof include (meth) acrylic acid esters such as (meth) acrylonitrile, and butyl aromatic compounds such as styrene. Methyl methacrylate and styrene are particularly preferable from the viewpoint of the balance between compatibility and copolymerization.
  • the monomer of component (c) provides crosslinkability with the photocurable resin or crosslinkability between the rubber compositions.
  • the reactive group is preferably non-radical polymerizable. Radical polymerization This is because, if it is characteristic, it reacts simultaneously with radical polymerization of the rubber composition.
  • the non-radical polymerizable reactive group include a hydroxyl group, a carboxylic acid group, a glycidyl group, an isocyanate group, an amino group, and an alkoxysilyl group.
  • the proportion of the component (c) in the rubber composition is preferably 1 to 50% by mass, particularly preferably 5 to 40% by mass.
  • Photo-curing properties Particularly preferred in terms of reactivity with the resin are hydroxy compounds such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate. Alkyl (meth) acrylate and daricidyl (meth) acrylate.
  • radical polymerization known methods such as bulk polymerization, suspension polymerization, bulk-suspension polymerization, solution polymerization, emulsion polymerization, and continuous polymerization can be used. Further, a radical generator can be used as necessary.
  • the polymerization conditions such as the solvent used in the radical polymerization and the polymerization temperature are not particularly limited.
  • the polymerization can be carried out without solvent or in various solvents. Polymerization without solvent is preferred because the polymerization rate is high and productivity is improved.
  • the polymerization temperature is preferably in the temperature range of 50 to 500 ° C, and a high polymerization rate and a point that allows easy control of the polymerization rate are also preferred.
  • the polymerization temperature is 100 to 400 ° C.
  • the radical generator may be a compound capable of using various compounds, preferably a peroxide capable of generating radicals under polymerization temperature conditions.
  • peroxides include, but are not limited to, for example, benzoyl peroxide, acetylyl peroxide, isobutyroyl peroxide, otatanyl peroxide, decanol peroxide.
  • Di-silver oxides such as oxides, lauroyl peroxide, 3, 5, 5-trimethylhexanoyl peroxide, 2,4-dichlorobenzoyl peroxide, m-toluoyl peroxide; Butyl Tamil Peroxide, Diecyl Peroxide, ⁇ , ⁇ , Monobis (t-butylperoxyisopropyl) benzene, 2, 5 Dimethyl-2, 5 Di (t-butylperoxy) hexane, 2, 5 Dimethyl 2, 2, 2-di (t-butylperoxy) hexyne 3 and other dialkyl peroxides; 2, 2-bis (t-butylperoxy) butane, 2, 2-bis (t-butylperoxy) otatan, 1, 1-bis ( (t-Butylperoxy) 3, 3, 5 Trimethylcyclohexane, n-Butyl 4, 4 Bis (t-butylperoxy) Peroxyketals such as citrate; diisopropy
  • a radical-generating azo compound or the like can be used as a radical generator instead of peroxide.
  • examples of the radical-generating azoi compound include azobisisobutyl-tolyl.
  • a solvent for the purpose of adjusting the molecular weight, a solvent, a radical cabbing agent, a polymerization accelerator, a chain transfer agent, a reaction terminator and the like can be used in combination as necessary.
  • the rubber thread composition contains a polymer chain having at least one aromatic group in the molecule, and is excellent in compatibility with the photocurable resin and provides excellent vibration fatigue durability. Therefore, it is preferable.
  • the aromatic group may be any of a main chain, a side chain, and a chain end. In particular, when the chain end is an aromatic group, the aromatic group is excellent in compatibility and excellent in vibration fatigue durability. Good.
  • the proportion of the polymer chain having at least one aromatic group in the molecule in the rubber composition is preferably 1% by mass or more, particularly preferably 10% by mass or more, and further preferably 50% by mass or more. If it is 1% by mass or more, vibration fatigue durability can be imparted without impairing the compatibility with the photocurable resin.
  • the proportion of the polymer chain in the rubber composition is preferably 99.99% by mass or less, particularly preferably 99.9% by mass or less.
  • Means for introducing an aromatic group into the molecule include (1) a method of introducing by using a radically polymerizable monomer having an aromatic group such as styrene, and (2) a benzoyl peroxide or the like.
  • a method of introducing by using a radical generator having an aromatic group (3) a method of introducing by using an aromatic solvent such as toluene and xylene, and (4) aroma such as aromatic thiol such as benzenethiol and thiophenol. Examples thereof include a method of introduction by use of a chain transfer agent having a group.
  • the Tg of the rubber composition is preferably less than 25 ° C in order to give excellent vibration fatigue durability to the photocurable resin. More preferably, it is less than 0 ° C, and still more preferably less than 20 ° C.
  • the viscosity of the rubber composition at 25 ° C is preferably in the range of 100 to 100, OOOmPa's. Above lOOmPa 's, sufficient vibration fatigue durability can be given, and at 100, OOOm Pa's or less, compatibility with photocurable resin is obtained, and the photocurable resin itself thickens. This is preferable.
  • the viscosity measurement method is not particularly limited, but B type viscometer, E type It can be measured using a known viscometer such as a viscometer or a rheometer.
  • the proportion of the rubber composition in the photocurable resin composition is preferably 0.01 to 70% by mass, more preferably 0.05 to 50% by mass, and particularly preferably 0.1. -30 mass%.
  • the amount is less than 01% by mass, sufficient vibration fatigue durability cannot be obtained.
  • the amount is more than 70% by mass, the resulting photocurable resin is too soft, and the curable resin and curability are lowered. .
  • the cured product of the photocurable resin composition containing the rubber composition of the present invention has a tensile modulus when subjected to a tensile test measurement in accordance with JIS K7113 (plastic tensile test method). It is characterized by exhibiting excellent vibration fatigue durability with a tensile fracture elongation of 200% or more. If the tensile modulus of the cured product is IMPa or more, there will be no problem that the resulting cured product is too soft to maintain its shape. Moreover, if the cured body has a bow I tension elastic modulus of 30 MPa or less and a tensile elongation at break of 200% or more, excellent vibration fatigue durability can be obtained, and the effects of the invention can be reliably obtained.
  • a pigment titanium white, cyanine blue, watching red, bengara, carbon black, Ryoji phosphorus black, manganese blue, iron is used as long as the effect of the present invention is not impaired.
  • inorganic fillers calcium carbonate, kaolin, clay, talc, my strength, barium sulfate, lithobon, stone KO, zinc stearate, perlite, quartz, quartz Silica powder such as glass, fused silica, spherical silica, etc., spherical alumina, crushed alumina, oxides such as magnesium oxide, beryllium oxide, titanium oxide, nitrides such as boron nitride, silicon nitride, aluminum nitride , Carbides such as silicon carbide, hydroxide ⁇ aluminum, hydroxide ⁇ ⁇ ⁇ ⁇ ⁇ magnesium, etc.
  • Hydroxides metals such as copper, silver, iron, aluminum, nickel, titanium and alloys, carbon-based materials such as diamond and carbon), thermoplastic resins and thermosetting resins (high density) , Medium and low density polyethylene, polypropylene, polybutene, polypentene and other homopolymers, ethylene propylene copolymer, nylon 6, nylon-6, 6, etc.
  • the blending amount of the pigment is 0. . 0001-50 mass%
  • the amount of the inorganic filler is 0.0001 to 50 mass 0/0
  • the amount of leveling agent is 0.0001 to 5 mass 0/0
  • thermoplastic ⁇ butter and thermosetting The blending amount of greaves is 0.01-30% by weight
  • the blending amount of anti-sagging agent is 0.01-5% by weight
  • the blending amount of defrosting agent is 0.001-10% by weight
  • the amount of the internal mold release agent is 0.001 to 20% by mass.
  • an antifoaming agent a flame retardant, an antistatic agent, a plasticizer, a thermal polymerization initiator, a silane coupling agent, an adhesion imparting agent, and the like can be used in combination.
  • the molded article of the photocurable resin composition of the present invention when the molded article of the photocurable resin composition of the present invention is molded, various means can be adopted as the means. Particularly preferably, (1) at least one of a pair of molds composed of an upper mold and a lower mold is formed of a material that transmits light, and a predetermined amount of the photocurable resin composition before curing is formed. Dripping. Next, the upper mold and the lower mold are pressure-bonded, the mold is closed, light is irradiated from the outside of the mold made of a material that transmits light, and the resin is cured to obtain the desired cured body.
  • At least one of a pair of molds consisting of a mold and a lower mold is formed of a material that transmits light, and then the upper mold and the lower mold are crimped, the mold is closed, and then the mold is formed in advance.
  • a predetermined amount of the photocurable resin composition before curing is injected from the inlet. Then, light is irradiated from the outside of the mold made of a material that transmits light, and the resin is cured to obtain a desired cured body.
  • materials used for the mold that transmits light include glass materials such as quartz, quartz glass, borosilicate glass, and soda glass, acrylic resin, polycarbonate resin, polystyrene resin, polyester resin, and polyethylene.
  • the resin material examples include, but are not limited to, a resin, a polypropylene resin, a fluorine resin, a cellose resin, a styrene-butadiene copolymer, and a methyl methacrylate-styrene copolymer.
  • a resin such as polymethyl methacrylate.
  • the light source is selected depending on the reaction wavelength of the photopolymerization initiator. Natural light (sunlight) can also be a reaction initiation light source.
  • the above-mentioned light source can be directly irradiated, focused with a reflecting mirror, or focused with a fiber, etc., and can be a low wavelength cut filter, a heat ray cut filter, a cold mirror, etc. .
  • the curing shrinkage of the resin composition is preferably 10% or less. If it exceeds 10%, curing shrinkage causes a difference in mold accuracy and the cured product, making it difficult to obtain a cured product of the desired shape.
  • the viscosity of the photocurable resin composition is 100 to 100, OOOmPa-s, particularly preferably 3,000 to 90, OOOmPa's at 25 ° C. ⁇ . If it is less than lOOmPa's, liquid leakage may occur and a molded product with the desired shape may not be obtained. If it exceeds 100, OOOmPa's, it may be difficult to fill, and the mold may be pushed up, resulting in failure to obtain a cured product of the desired shape.
  • ERC A 3310 manufactured by ERM A
  • Sample injection volume 100 1 (sample solution concentration lmg / ml),
  • the nuclear magnetic resonance spectrum (hereinafter referred to as 3 ⁇ 4-NMR) of the composition was measured under the following conditions: Measuring device: ECP-300 (300 MHz) manufactured by JOEL
  • Viscometer E-type viscometer (cone plate type),
  • n-butyl acrylate (hereinafter referred to as MMA): 270g, gucidinoremethacrylate (hereinafter referred to as GMA): 60g, benzoyl peroxide (hereinafter referred to as BPO) ): 13.9 g was charged in a nitrogen gas atmosphere, sealed, heated in an oil bath to 130 ° C, and polymerized at 200 ° C for about 60 minutes. Thereafter, the polymerization reaction was stopped by rapidly cooling to room temperature. The residual volatile matter was dried under vacuum at 240 ° C. for 2 hours to obtain a solid content.
  • MMA methinoremethacrylate
  • GMA gucidinoremethacrylate
  • BPO benzoyl peroxide
  • the yield is 92%
  • the number average molecular weight Mn by GPC measurement is 1,170
  • the weight average molecular weight Mw is 2,350
  • the molecular weight distribution Mw / Mn is 2.01
  • the viscosity at 25 ° C is 5,5. It was OOOmPa's.
  • the content ratio of the constituent components of the obtained rubber composition (E-1) was calculated as an integral strength specific force of 1 H-NMR ⁇ vector.
  • nBA 44.7 mass%
  • MMA 45.4 mass %
  • GMA 9.9% by mass.
  • a rubber composition (E-2) was obtained in the same manner as in Polymerization Example 1, except that nBA was 420 g, MMA was 18 g, GMA was 162 g, and BPO was 6.95 g. Yield is 95%, number average molecular weight Mn by GPC measurement is 2,000, weight average molecular weight Mw is 4,710, molecular weight distribution MwZMn is 2.36, viscosity at 25 ° C is 9,500 mPa ' s.
  • the component ratio of the resulting rubber composition (E- 2) is, ⁇ -NMR ⁇ resulting vector, nBA: 68. 6 wt 0/0, MMA: 3. 1 mass 0/0, GMA: 28 It was found to be 3% by mass.
  • a rubber composition (E-3) was obtained in the same manner as in Polymerization Example 1, except that the amount of nBA was 480 g, styrene: 90 g, GMA: 30 g, and BPO: 3.475 g in the preparation of Polymerization Example 1. Yield is 96%, number average molecular weight Mn by GPC measurement is 4,500, weight average molecular weight Mw is 9,900, molecular weight distribution MwZMn is 2.20, viscosity at 25 ° C is 5,900 mPa ' s.
  • the resulting of the component ratio of the rubber composition (E- 3) is, iH-NMR ⁇ vectors result, nBA: 78. 4 wt 0/0, styrene: 16.1 mass 0/0, GMA: 5 . it was found that 5 mass 0/0
  • the resulting of the component ratio of the rubber composition (E-4) is, NMR ⁇ vector result, ⁇ : 37. 3 mass 0/0, MM A: 38. 9 mass 0/0, styrene: 19. 5 mass 0/0, 2-HEA: was found to be 4 3 mass 0/0.
  • 2-ethylhexyl acrylate hereinafter referred to as 2-EHA
  • a rubber composition (E-5) was obtained in the same manner as in Polymerization Example 1 except that 300 g, MMA: 30 g, GMA: 270 g, and BPO: l. 39 g were used. Yield is 98%, number average molecular weight by GPC measurement
  • Mn 10,000, weight average molecular weight Mw is 19,600, molecular weight distribution MwZMn is 1
  • composition (weight) of each component of the types shown in Table 11, 1, 12 and 13 is shown in the table.
  • a set of molds made of acrylic resin made of an upper mold and a lower mold, in the shape of the desired specimen The required amount was dropped onto the lower mold on which the photocurable rosin yarn and the composition before curing were set.
  • the upper mold was put on the lower mold, and the mold was crimped and closed, irradiated with light from the outside of the mold, and the resin was cured to obtain a desired cured specimen.
  • a curing device manufactured by Fusion Co., Ltd. equipped with an electrodeless discharge lamp (D bulb) was used, and the photocurable resin was cured under the condition that the integrated irradiation amount to 4000 mjZcm 2 (365 nm).
  • JIS K7113 plastic tensile test method
  • 2 mm (1Z2) dumbbell shape (12 mm distance between gauge points) and 1 mm thick test piece was prepared under the above conditions, temperature 23 ° C, humidity 50% The measurement was performed at a tensile speed of 50 mmZmin in the environment described above.
  • the values for tensile fracture strength, tensile modulus, and tensile elongation at break were determined according to JIS K7113.
  • test piece Prepare a test piece with a total length of 150mm X width 25mm X thickness lmm under the above conditions, and place it in the center of the test piece in advance by referring to JIS K62 60 (Dematia flex crack test method for vulcanized rubber and plastic rubber).
  • a specimen with a crack of about 2 mm is fixed to the upper and lower grips of a Demacia bending crack tester (manufactured by Ueshima Manufacturing Co., Ltd.) with a grip spacing of 75 mm, under conditions of room temperature atmosphere, amplitude 56 mm, 300 times Z And reciprocated.
  • the crack width was measured when the number of bendings was 0 (initial), 3,000, 54,000, and 144,000.
  • the number of flexing times is one reciprocating motion, and the number of flexing times is read with a counter.
  • the crack width was measured with the distance between grips set to 65 mm.
  • Tables 11, 12, and 13 summarize the results of the measurement of the resin tensile test and vibration fatigue endurance test of the cured product of the obtained photocurable resin composition.
  • the photocurable resin composition of the present invention has an excellent fatigue resistance, so that it is a sealing agent for structures such as civil engineering and construction, an adhesive for metals, magnets, ceramics, glass, plastics, and a plastic lens.
  • the present invention can also be applied to a molded resin product.

Abstract

Disclosed is a photocurable resin composition suitable for photocuring cast molding, particularly a photocurable resin composition having excellent vibration fatigue durability. The photocurable resin composition comprises (A) at least one resin selected from a photoradical-polymerizable resin, photoradical-addition-polymerizable resin and a photocation-polymerizable resin, (B) a photopolymerization initiator, and one or both of (C) an antioxidant and (D) a photostabilizer. When cured, the photocurable resin composition shows a tensile elastic modulus of 1-30 MPa and a tensile elongation at break of 200% or more. The photocurable resin composition may additionally comprise (E) a rubber composition.

Description

明 細 書  Specification
光硬化性樹脂組成物  Photocurable resin composition
技術分野  Technical field
[0001] 本発明は、紫外線、可視光線等の光照射により硬化可能な光硬化性榭脂組成物 および硬化体に関し、さら〖こ詳しくは、振動疲労耐久性に優れた光硬化性榭脂組成 物および硬化体に関する。  TECHNICAL FIELD [0001] The present invention relates to a photocurable resin composition and a cured product that can be cured by irradiation with light such as ultraviolet rays and visible light, and more specifically, a photocurable resin composition having excellent vibration fatigue durability. Product and cured product.
背景技術  Background art
[0002] 一般に柔軟性、伸縮性、弾性と!/ヽつた、所謂ゴム特性を与える組成物はエラストマ 一と呼ばれ、その振動に対する疲労耐久性が、他の高分子素材と比較し抜きんでて 優れている。したがって、タイヤ等の自動車部材、土木、建築等の構造物用シール部 材、 Oリング等のパッキング部材、スピーカ一等の音響用部材、携帯電話用キーシー ト等のシート部材、防振材料、各種機構部材等として適用されている。  [0002] In general, a composition that gives so-called rubber properties such as flexibility, stretchability, and elasticity is called an elastomer, and its fatigue durability against vibration is far superior to that of other polymer materials. ing. Therefore, automobile parts such as tires, sealing members for structures such as civil engineering and construction, packing members such as O-rings, acoustic members such as speakers, sheet members such as mobile phone key sheets, vibration-proof materials, various types It is applied as a mechanism member.
[0003] 従来のエラストマ一(以下、記号 Rで示す)としては、天然ゴム、変性天然ゴム、ダラ フト天然ゴム、環化天然ゴム、塩素化天然ゴム、スチレン ブタジエンゴム、クロロプ レンゴム、アクリロニトリル一ブタジエンゴム、カルボキシル化二トリルゴム、二トリルゴム [0003] Conventional elastomers (hereinafter referred to as R) include natural rubber, modified natural rubber, natural rubber, cyclized natural rubber, chlorinated natural rubber, styrene butadiene rubber, chloroprene rubber, acrylonitrile monobutadiene. Rubber, carboxylated nitrile rubber, nitrile rubber
Z塩化ビュル榭脂ブレンド、二トリルゴム ZEPDMゴムのブレンド、ブチルゴム、臭素 化ブチルゴム、塩素化ブチルゴム、エチレン 酢酸ビュルゴム、アクリルゴム、ェチレ ン一アクリルゴム、クロロスルホン化ポリエチレン、塩素化ポリエチレン、ェピクロルヒド リンゴム、ェピクロルヒドリン エチレンォキシドゴム、メチルシリコーンゴム、ビニルー メチルシリコーンゴム、フエ-ルーメチルシリコーンゴム、フッ化シリコーンゴム等のゴ ム材料;ポリスチレン系熱可塑性エラストマ一、ポリ塩化ビュル系熱可塑性エラストマ 一、ポリオレフイン系熱可塑性エラストマ一、ポリウレタン系熱可塑性エラストマ一、ポ リエステル系熱可塑性エラストマ一、ポリアミド系熱可塑性エラストマ一、塩化ビュル 系熱可塑性エラストマ一、フッ素ゴム系熱可塑性エラストマ一、塩素化ポリエチレン系 エラストマ一等の熱可塑性エラストマ一材料が知られている。 Z-Butyl chloride resin blend, nitrile rubber ZEPDM rubber blend, butyl rubber, brominated butyl rubber, chlorinated butyl rubber, ethylene acetate rubber, acrylic rubber, ethylene-acrylic rubber, chlorosulfonated polyethylene, chlorinated polyethylene, epichlorohydrin rubber, Rubber materials such as picrohydrin ethylene oxide rubber, methyl silicone rubber, vinyl-methyl silicone rubber, ferrumethyl silicone rubber, fluorosilicone rubber; polystyrene thermoplastic elastomer, polychlorinated bur thermoplastic elastomer Polyolefin thermoplastic elastomers, polyurethane thermoplastic elastomers, polyester thermoplastic elastomers, polyamide thermoplastic elastomers, chlorinated thermoplastic elastomers, fluoro rubber Thermoplastic elastomers of all, a thermoplastic elastomer first material of chlorinated polyethylene elastomers, First is known.
[0004] 一般にエラストマ一 (R)の成形体を得る方法としては、硬化剤および他の添加剤を 配合したエラストマ一原料を充分に混練する混練り工程、そして、練り生地を真空成 形法、圧空成形法、上型下型を一組とする成形型 (以下、上下型という)による加熱 加圧成形法、射出成形法等により成形し、加熱、加圧により加硫または硬化させる硬 化工程 (加硫工程)を経て、目的の成形体が得られて!/ヽる。 [0004] In general, a method of obtaining a molded product of elastomer (R) includes a kneading step in which an elastomer raw material containing a curing agent and other additives is sufficiently kneaded, and a kneaded dough is vacuum-formed. Molding method, pressure forming method, molding using upper and lower molds (hereinafter referred to as upper and lower molds), molding by pressure molding method, injection molding method, etc., and curing or curing by heating and pressurizing Through the curing process (vulcanization process), the desired molded product is obtained! / Speak.
[0005] し力しながら、前記の真空成形法、圧空成形法、上下型による加熱加圧成形法な どでは、材料の融点付近まで金型温度を上げる必要があり、加熱のために膨大なェ ネルギーを必要とする。また、金型を冷却して取り出す必要があるので、成形サイク ルに長時間費やすことになる。  [0005] However, in the vacuum forming method, the pressure forming method, and the heating and pressing forming method using the upper and lower molds, it is necessary to raise the mold temperature to near the melting point of the material. Requires energy. In addition, since it is necessary to cool and remove the mold, it takes a long time for the molding cycle.
[0006] 射出成形法では、溶融した榭脂が温度差のある金型に接触した直後に冷却され流 動性が極端に低下するので、薄肉の成形体を得ることが困難であり、加熱、射出、保 圧等の工程上、設備も高額となる。また、熱可塑性材料を融点近くまで加熱するので 、加熱エネルギーが膨大である。  [0006] In the injection molding method, the molten resin is cooled immediately after coming into contact with a mold having a temperature difference, and the fluidity is extremely lowered. Therefore, it is difficult to obtain a thin molded body, and heating, Equipment is expensive due to the injection, pressure and other processes. Further, since the thermoplastic material is heated to near the melting point, the heating energy is enormous.
[0007] 成形材料は、前記の真空成形法、圧空成形法、上下型による加熱加圧成形法など では、目的の部品寸法より略大きな平面材料を成形した後、部品部分を切り出して 使用することとなるため、廃棄物が多く発生し、環境的、経済的に好ましくない。  [0007] In the above-described vacuum forming method, pressure forming method, heating and press forming method using upper and lower molds, etc., the molding material is formed by molding a planar material substantially larger than the target part dimensions and then cutting out the part portion. Therefore, a lot of waste is generated, which is unfavorable environmentally and economically.
[0008] 真空成形法、圧空成形法、上下型による加熱加圧成形法の上記構成材料は、一 般的には均一な厚さの材料であるため、成形後は各部分で同じ厚さとなり、同一材 料からは各部分の厚さを変えることが困難である。  [0008] The above-described constituent materials of the vacuum forming method, the pressure forming method, and the heating and press forming method using the upper and lower molds are generally uniform thickness materials. From the same material, it is difficult to change the thickness of each part.
[0009] カロえて、工業的に製造されている厚さは限られており、それ以外の厚さの材料を得 ることは、通常困難である。成形時の延伸などの処理により、厚さを変える方法も提案 されているが、成形後の内部応力歪みが大きくなる等の問題が発生する。  [0009] Thickness that is produced industrially is limited, and it is usually difficult to obtain materials with other thicknesses. A method of changing the thickness by a process such as stretching at the time of molding has also been proposed, but problems such as increased internal stress distortion after molding occur.
[0010] 上記の様な成形法の課題を解決する手段として、上下型中に充填した光硬化性液 状物質に、紫外線、可視光線等の光を照射することにより硬化させ、成形体を形成 する光硬化注型成形法が特許文献 1で提案されている。  [0010] As a means for solving the problems of the molding method as described above, the photocurable liquid substance filled in the upper and lower molds is cured by irradiating with light such as ultraviolet rays and visible rays to form a molded body. Patent Document 1 proposes a photocuring cast molding method.
特許文献 1:特開 2004— 357020号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 2004-357020
[0011] より詳しくは、上型、下型よりなる一組の成形型の少なくともいずれか一方を光が透 過する材料にて形成し、かつ光照射により硬化可能な榭脂をセットして型を閉じ、光 を透過する型の外側から光を照射し、榭脂を硬化させて目的形状の硬化体を得る方 法である。この方法により、少ないエネルギーおよび少ない工数で、任意の厚みの成 形体を容易かつ安価に製造することが可能となる。 [0011] More specifically, at least one of a pair of molds including an upper mold and a lower mold is formed of a material that transmits light, and a mold is set by setting a resin that can be cured by light irradiation. This is a method of closing the and irradiating light from the outside of the mold that transmits light to cure the resin and obtain a cured product of the desired shape. By this method, it is possible to achieve an arbitrary thickness with less energy and less man-hours. The shape can be easily and inexpensively manufactured.
[0012] 一方で、光硬化可能なエラストマ一またはゴム弾性を示す榭脂組成物としては、特 許文献 2、特許文献 3にシーリング材用として、また、特許文献 4に光学的立体造形 用として榭脂組成物が開示されている。しかし、上記の光硬化注型成形法に適し、且 つ従来のエラストマ一に要求されるような振動疲労耐久性を満たす榭脂組成物は知 られていなかった。  On the other hand, as a photocurable elastomer or a resin composition exhibiting rubber elasticity, Patent Document 2 and Patent Document 3 are for sealing materials, and Patent Document 4 is for optical three-dimensional modeling. A rosin composition is disclosed. However, a resin composition suitable for the above-mentioned photo-curing cast molding method and satisfying vibration fatigue durability as required for a conventional elastomer has not been known.
特許文献 2:特表 2002 - 501109号公報  Patent Document 2: Japanese Translation of Special Publication 2002-501109
特許文献 3:特表 2003 - 505525号公報  Patent Document 3: Japanese Translation of Special Publication 2003-505525
特許文献 4:特開 2000 - 290328号公報  Patent Document 4: Japanese Patent Laid-Open No. 2000-290328
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0013] 本発明は、上記公知技術の事情に鑑みてなされたもので、光照射により硬化可能 な、光硬化注型成形法に好適な光硬化性榭脂組成物であり、かつ、振動疲労耐久 性に優れた光硬化性榭脂組成物および硬化体を提供することを目的とする。 [0013] The present invention has been made in view of the above-mentioned publicly known technology, and is a photocurable resin composition that can be cured by light irradiation and is suitable for a photocuring cast molding method, and vibration fatigue. An object of the present invention is to provide a photocurable resin composition and a cured product excellent in durability.
課題を解決するための手段  Means for solving the problem
[0014] すなわち、本発明は、以下の要旨を有する。 That is, the present invention has the following gist.
1. (A)光ラジカル重合性榭脂、光ラジカル付加重合性榭脂、及び光力チオン重合 性榭脂からなる群力 選ばれる少なくとも 1つの樹脂と、(B)光重合開始剤と、(C)酸 化防止剤及び (D)光安定剤の!/ヽずれか又は両方とを含有する光硬化性榭脂組成 物であって、当該光硬化性榭脂糸且成物の硬化体の引張弾性率が l〜30MPaであり 、し力も引張破壊伸びが 200%以上であることを特徴とする光硬化性榭脂組成物。  1. (A) At least one resin selected from the group consisting of a photoradical polymerizable resin, a photoradical addition polymerizable resin, and a photothion polymerizable resin, and (B) a photopolymerization initiator ( C) a photocurable resin composition containing an antioxidant and (D) a light stabilizer and / or a light stabilizer, the photocurable resin composition and a cured product of the photocurable resin thread and composition. A photocurable resin composition having a tensile elastic modulus of 1 to 30 MPa and a tensile strength of 200% or more.
2.更に (E)ゴム組成物を含有する、上記 1に記載の光硬化性榭脂組成物。  2. The photocurable resin composition according to the above 1, further comprising (E) a rubber composition.
3.ゴム組成物が、(メタ)アクリル酸エステル化合物、ビュル系化合物、及びォレフ イン系炭化水素化合物力 なる群力 選ばれる少なくとも一つの単量体力 なる共重 合体であって、重量平均分子量が 500〜50, 000の範囲である上記 1または 2に記 載の光硬化性榭脂組成物。  3. The rubber composition is a copolymer having at least one monomer power selected from (meth) acrylic acid ester compound, bulle compound, and olefinic hydrocarbon compound, and having a weight average molecular weight. The photocurable resin composition according to the above 1 or 2, which is in the range of 500 to 50,000.
[0015] 4.ゴム組成物が、(メタ)アクリル酸エステル化合物、ビュル系化合物、及びォレフ イン系炭化水素化合物力 なる群力 選ばれる 3種類以上の単量体力 なる共重合 (ィ)ホモポリマーのガラス転移温度が 25°C未満であるラジカル重合性単量体を 20〜 90質量%と、 [0015] 4. The rubber composition is a (meth) acrylic acid ester compound, a bure compound, and an olefinic hydrocarbon compound. (Ii) 20-90% by mass of a radically polymerizable monomer having a glass transition temperature of less than 25 ° C.
(口)ホモポリマーのガラス転移温度が 25°C以上であるラジカル重合性単量体を 0. 1 〜70質量%と、  (Mouth) 0.1 to 70% by mass of a radical polymerizable monomer having a glass transition temperature of 25 ° C. or higher of the homopolymer,
(ハ)分子内に非ラジカル重合性である反応性基を少なくとも一つ有するラジカル重 合性単量体を 1〜50質量%と、  (C) 1-50 mass% of a radically polymerizable monomer having at least one reactive group that is non-radically polymerizable in the molecule;
を含む上記 3に記載の光硬化性榭脂組成物。  4. The photocurable resin composition according to 3 above, comprising
[0016] 5. (ィ)成分の単量体力 炭素数が 1〜20のアルキル (メタ)アタリレートである上記 4に記載の光硬化性榭脂組成物。 [0016] 5. The monomeric power of component (i) The photocurable resin composition according to 4 above, which is an alkyl (meth) acrylate having 1 to 20 carbon atoms.
6. (ィ)成分の単量体が、炭素数が 1〜8のアルキル (メタ)アタリレートである上記 5 に記載の光硬化性榭脂組成物。  6. The photocurable resin composition according to 5 above, wherein the monomer of component (i) is an alkyl (meth) acrylate having 1 to 8 carbon atoms.
7. (口)成分の単量体が、メチルメタタリレート、及びスチレン力 なる群力 選ばれ る少なくとも 1種を含有する上記 4〜6のいずれか一項に記載の光硬化性榭脂組成 物。  7. The photocurable resin composition according to any one of 4 to 6 above, wherein the monomer of the (mouth) component contains at least one selected from the group strength of methyl metatalylate and styrene power object.
8. (ハ)成分の単量体が、水酸基、カルボン酸基、グリシジル基、イソシァネート基、 アミノ基、及びアルコキシシリル基からなる群から選ばれる一つ以上の基を有する上 記 4〜7のいずれか一項に記載の光硬化性榭脂組成物。  8. The component (c) wherein the monomer of the component has one or more groups selected from the group consisting of a hydroxyl group, a carboxylic acid group, a glycidyl group, an isocyanate group, an amino group, and an alkoxysilyl group. The photocurable resin composition as described in any one of Claims.
9. (ハ)成分の単量体が、グリシジル (メタ)アタリレートまたはヒドロキシアルキル (メ タ)アタリレートである上記 8に記載の光硬化性榭脂組成物。  9. The photocurable resin composition according to 8 above, wherein the monomer of component (c) is glycidyl (meth) acrylate or hydroxyalkyl (meth) acrylate.
[0017] 10.ゴム糸且成物力 分子内に少なくとも 1つの芳香族基を有する上記 1〜9のいず れか一項に記載の光硬化性榭脂組成物。  [0017] 10. Rubber yarn and composition strength The photocurable resin composition according to any one of 1 to 9, which has at least one aromatic group in a molecule.
11.ゴム組成物の 25°Cでの粘度が、 100〜100, OOOmPa' sの範囲にある、上記 1〜 10のいずれか一項に記載の光硬化性榭脂組成物。  11. The photocurable resin composition according to any one of 1 to 10 above, wherein the rubber composition has a viscosity at 25 ° C of 100 to 100, OOOmPa's.
12.ゴム組成物のガラス転移温度が 25°C未満である、上記 1〜: L 1のいずれか一項 に記載の光硬化性榭脂組成物。  12. The photocurable resin composition according to any one of the above 1 to L1, wherein the rubber composition has a glass transition temperature of less than 25 ° C.
13.光硬化性榭脂組成物中におけるゴム組成物の占める割合が 0. 01〜30質量 %である、上記 1〜12の 、ずれか一項に記載の光硬化性榭脂組成物。 14.光ラジカル重合性榭脂が、アクリル榭脂である上記 1〜13のいずれか一項に 記載の光硬化性榭脂組成物。 13. The photocurable resin composition according to any one of 1 to 12 above, wherein the proportion of the rubber composition in the photocurable resin composition is 0.01 to 30% by mass. 14. The photocurable resin composition according to any one of 1 to 13 above, wherein the photoradically polymerizable resin is an acrylic resin.
C  C
15.ア Hクリル榭脂が、(a— 1)分子の末端又は側鎖に 1個以上の (メタ)アタリロイル  15. A H-acrylyl saccharine has (a-1) one or more (meth) attalyloyl at the end or side chain of the molecule.
2  2
基を有し、分c RcΟ ΝΠ子 l l 量が 5, 000〜100, 000のウレタン (メタ)アタリレートオリゴマー 1種 以上と、(a— 2)単官能 (メタ)アタリレートとからなる、上記 14に記載の光硬化性榭脂 組成物。  A urethane (meth) acrylate oligomer having at least one group and a content of R c R Ο ll is from 5,000 to 100,000, and (a-2) a monofunctional (meth) acrylate. 14. The photocurable resin composition according to 14,
[0018] 16. (a— 2)単官能 (メタ)アタリレートが、下記式〔1〕または〔2〕で表される単官能( メタ)アタリレートである上記 15に記載の光硬化性榭脂組成物。  [0018] 16. (a-2) The photocurable cocoon according to 15 above, wherein the monofunctional (meth) acrylate is a monofunctional (meth) acrylate represented by the following formula [1] or [2]: Fat composition.
[化 1]  [Chemical 1]
(式中、 R1は水素原子またはメチル基であり、 R2は、炭素数 1〜22である直鎖もしく は分岐アルキル基、シクロへキシル基、炭素数 1〜4の直鎖もしくは分岐アルキル基 により置換されたシクロへキシル基、フエ-ル基、炭素数 1〜4の直鎖もしくは分岐ァ ルキル基により置換されたフエ-ル基、ジシクロペンタ-ル基、ジシクロペンテ-ル基 、ボルニル基、イソボル-ル基、ァダマンチル基、メチルァダマンチル基またはァリル 基である。 ) (In the formula, R 1 is a hydrogen atom or a methyl group, and R 2 is a straight or branched alkyl group having 1 to 22 carbon atoms, a cyclohexyl group, a straight or branched chain having 1 to 4 carbon atoms. A cyclohexyl group, a phenyl group, a phenyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclopental group, a dicyclopental group, or a bornyl group. , An isobornyl group, an adamantyl group, a methyladamantyl group or an aryl group.)
[0019] [化 2] [0019] [Chemical 2]
R
Figure imgf000006_0001
R
Figure imgf000006_0001
〔2〕  [2]
(式中、 R1は水素原子またはメチル基であり、 R3は、炭素数 1〜4である直鎖もしくは 分岐アルキル基、 R4は、炭素数 1〜4である直鎖もしくは分岐アルキル基、シクロへキ シル基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたシクロへキシル 基、フエ-ル基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたフエ- ル基、ジシクロペンタ-ル基、ジシクロペンテ-ル基、ボルニル基、イソボル-ル基、 ァダマンチル基、メチルァダマンチル基またはァリル基であり、 nは 1〜12の整数であ る。) (Wherein R 1 is a hydrogen atom or a methyl group, R 3 is a linear or branched alkyl group having 1 to 4 carbon atoms, and R 4 is a linear or branched alkyl group having 1 to 4 carbon atoms. Cyclohexyl substituted with a cyclohexyl group or a linear or branched alkyl group having 1 to 4 carbon atoms Group, a phenyl group, a phenyl group substituted by a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclopental group, a dicyclopental group, a bornyl group, an isobornyl group, an adamantyl group, methyl An adamantyl group or an aryl group, and n is an integer of 1 to 12. )
[0020] 17. (a— 2)単官能 (メタ)アタリレートが、当該ホモポリマーのガラス転移温度が 20 °C以上である、上記 15または 16に記載の光硬化性榭脂組成物。  [0020] 17. The photocurable resin composition according to the above 15 or 16, wherein (a-2) the monofunctional (meth) acrylate is a glass transition temperature of the homopolymer of 20 ° C or higher.
18.光ラジカル付加重合性榭脂が、分子内に 2つ以上の炭素 炭素不飽和二重 結合を有するポリェン化合物と、分子内に 2つ以上のメルカプト基を有するポリチォ 一ルイ匕合物とからなる、上記 1〜13のいずれか一項に記載の光硬化性榭脂組成物  18. A photoradical addition-polymerizable resin comprising a polyene compound having two or more carbon-carbon unsaturated double bonds in the molecule and a polythiol compound having two or more mercapto groups in the molecule. The photocurable resin composition according to any one of 1 to 13 above
19.光力チオン重合性榭脂が、分子内にエポキシ基、ォキセタニル基またはビニ ルエーテル基を有する上記 1〜13のいずれか一項に記載の光硬化性榭脂組成物。 19. The photocurable resin composition according to any one of 1 to 13 above, wherein the photopower thione polymerizable resin has an epoxy group, an oxetanyl group, or a vinyl ether group in the molecule.
20.硬化収縮率が 10%以下である、上記 1〜19のいずれか一項に記載の光硬化 性榭脂組成物。  20. The photocurable resin composition according to any one of 1 to 19 above, which has a curing shrinkage rate of 10% or less.
21.上記 1〜20のいずれか一項に記載の光硬化性榭脂組成物力もなる硬化体。 発明の効果  21. A cured product that also has the power of the photocurable resin composition according to any one of 1 to 20 above. The invention's effect
[0021] 本発明の光硬化性榭脂組成物は、紫外線または可視光線等の光照射により瞬時 に硬化し、し力もその硬化体は振動疲労耐久性に優れるという特性を有している。し たがって、タイヤ等の自動車部材、土木、建築等の構造物用シール部材、 oリング等 のパッキング部材、スピーカ一等の音響用、携帯電話用キーシート等のシート部材、 部材、防振材料、各種機構部材等に好適に使用できる。また、本発明の光硬化性榭 脂組成物は、その優れた疲労特性カゝら土木、建築等の構造用シーリング剤、金属、 マグネット、セラミックス、ガラス、プラスチック用の接着剤にも適用できる。  [0021] The photocurable resin composition of the present invention has characteristics that it is instantly cured by irradiation with light such as ultraviolet rays or visible light, and that the cured product has excellent vibration fatigue durability. Therefore, automobile members such as tires, sealing members for structures such as civil engineering and construction, packing members such as o-rings, acoustic members such as speakers, sheet members such as key sheets for mobile phones, members, vibration-proof materials It can be suitably used for various mechanism members. The photocurable resin composition of the present invention can also be applied to adhesives for structural and structural seals for civil engineering and construction, metals, magnets, ceramics, glass, and plastics.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0022] 本明細書において「分子量」とは、特に説明がない場合、重量平均分子量を意味 する。  In the present specification, “molecular weight” means a weight average molecular weight unless otherwise specified.
本明細書において「Tg」とは、特に説明がない場合、ガラス転移温度を意味する。 本明細書において「アルキル基」とは、特に説明がない場合、直鎖、分岐および環 状飽和炭化水素基を意味する。 In this specification, “Tg” means a glass transition temperature unless otherwise specified. In the present specification, an “alkyl group” means a straight chain, a branched chain or a ring unless otherwise specified. Mean saturated hydrocarbon group.
[0023] 本発明の光硬化性榭脂組成物に於いては、(A)成分である、光の照射を受けて硬 化体を形成する光硬化性榭脂が含有される。ここでいう光とは、紫外線、可視光線等 に代表される活性エネルギー線を ヽ、本発明の光硬化性榭脂組成物に於 ヽては 、光硬化性榭脂としては、光ラジカル重合性榭脂、光ラジカル付加重合性榭脂、及 び光力チオン重合性榭脂からなる群力も選ばれる少なくとも 1つの榭脂を用いること ができる。このうち、光ラジカル重合性榭脂が、材料選択性が豊富なアクリル榭脂を 含有することから好ましく選択される。  [0023] The photocurable resin composition of the present invention contains a photocurable resin that is a component (A) and forms a cured body upon irradiation with light. The term “light” as used herein refers to an active energy ray typified by ultraviolet rays and visible rays. In the photocurable resin composition of the present invention, the photocurable resin is a photo-radical polymerizable resin. It is possible to use at least one resin selected from the group consisting of a resin, a photo-radical addition polymerizable resin, and a light power thione polymerizable resin. Of these, the photo-radically polymerizable resin is preferably selected because it contains an acrylic resin rich in material selectivity.
[0024] 光ラジカル付加重合性榭脂としては、ラジカル発生によりチオール基が炭素 炭素 不飽和結合へ付加するェン 'チオール反応が公知として知られている。特に分子内 に少なくとも 2個以上のチオール基を有する化合物と分子内に 2個以上の炭素-炭 素不飽和結合を有する化合物とからなるェン 'チオール榭脂が光硬化性に優れると いう理由で好ましい。  [0024] As the photoradical addition-polymerizable resin, a well-known thiol reaction in which a thiol group is added to a carbon-carbon unsaturated bond by radical generation is known. In particular, the reason that an enthiol resin comprising a compound having at least two thiol groups in the molecule and a compound having at least two carbon-carbon unsaturated bonds in the molecule is excellent in photocurability. Is preferable.
[0025] 光力チオン重合性榭脂としては、分子内にエポキシ基を有する榭脂、ォキセタニル 基を有する榭脂、ビニルエーテル基を有する榭脂、スピロオルソエステル基を有する 榭脂、ビシクロオルソエステル基を有する榭脂、スピロオルソカーボネート基を有する 榭脂等が挙げられる。このうちエポキシ基、ォキセタ-ル基またはビュルエーテル基 を有する榭脂が光硬化性および材料選択の豊富さという理由で好ましい。  [0025] Examples of the photopower thione-polymerizable resin include an epoxy group-containing resin, an oxetanyl group-containing resin, a vinyl ether group-containing resin, a spiro orthoester group-containing resin, and a bicycloorthoester group. And the like having a spiro orthocarbonate group. Of these, a resin having an epoxy group, an oxetal group or a butyl ether group is preferred because of its photocurability and abundant selection of materials.
[0026] 光ラジカル重合性榭脂としては、アクリル榭脂、スチレン榭脂、ビニル榭脂、不飽和 ポリエステル、ポリオレフイン等が挙げられ、このうちアクリル榭脂が光硬化性および 材料選択の豊富さと ヽぅ理由で好ま U ヽ。 [0026] Examples of the photo-radically polymerizable resin include acrylic resin, styrene resin, vinyl resin, unsaturated polyester, polyolefin, etc. Among them, acrylic resin has photocurability and abundant selection of materials.で Preferred for reasons U ヽ.
[0027] アクリル榭脂としては、ポリ (メタ)アタリレート、(メタ)アタリレートモノマー、(メタ)ァク リレートダイマー、ポリエステル (メタ)アタリレート、ウレタン (メタ)アタリレート、ェポキ シ (メタ)アタリレート、ポリオレフイン (メタ)アタリレート、シリコーン (メタ)アタリレート等 が例示される。本発明の目的を達成するにあたっては、ウレタン (メタ)アタリレートと( メタ)アタリレートモノマーとからなる榭脂組成物が好ましい。特に好ましくは、(a— 1) 分子の末端又は側鎖に 1個以上の (メタ)アタリロイル基を有し、分子量が 5, 000-1 00, 000のウレタン (メタ)アタリレートオリゴマーの 1種以上と(a— 2)単官能 (メタ)了 タリレートとからなる榭脂組成物である。 [0027] Acrylic resins include poly (meth) acrylate, (meth) acrylate monomer, (meth) acrylate dimer, polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) Examples thereof include acrylate, polyolefin (meth) acrylate, and silicone (meth) acrylate. In achieving the object of the present invention, a resin composition comprising urethane (meth) acrylate and (meth) acrylate monomers is preferred. Particularly preferably, (a-1) one kind of urethane (meth) acrylate oligomer having one or more (meth) attalyloyl groups at the end or side chain of the molecule and having a molecular weight of 5,000-100,000. And (a-2) monofunctional (meta) finished It is a rosin composition consisting of tartrate.
[0028] 前記 (a— 1)成分である、ウレタン (メタ)アタリレートオリゴマーは、ポリオール化合物  [0028] The urethane (meth) acrylate oligomer as the component (a-1) is a polyol compound.
(以後、 Xで表す)と有機ポリイソシァネートイ匕合物(以後、 Yで表す)とヒドロキシ (メタ) アタリレート(以後、 Zで表す)とを反応させてなる、ウレタン (メタ)アタリレートオリゴマ 一をいう o  (Hereinafter referred to as X), an organic polyisocyanate compound (hereinafter referred to as Y), and a hydroxy (meth) acrylate (hereinafter referred to as Z). O for rate oligomer
[0029] 力かるポリオール化合物(X)としては、例えば、エチレングリコール、ジエチレンダリ コーノレ、トリエチレングリコール、テトラエチレンダリコール、ポリエチレングリコール、プ ロピレングリコール、ジプロピレングリコール、ポリプロピレングリコール、ブチレングリコ ール、 1, 4 ブタンジオール、ポリブチレンダリコール、 1, 5 ペンタンジオール、 1, 6 へキサンジオール、 1, 8 オクタンジオール、 1, 9ーノナンジオール、 3 メチル - 1, 5 ペンタンジオール、 2, 4 ジェチルー 1, 5 ペンタンジオール、 2, 2 ブ チルェチルー 1, 3 プロパンジオール、ネオペンチルグリコール、シクロへキサンジ メタノール、水素添カ卩ビスフエノール A、ポリ力プロラタトン、トリメチロールェタン、トリメ チローノレプロパン、ポリトリメチローノレプロノ ン、ペンタエリスリトーノレ、ポリペンタエリス リトール、ソルビトール、マンニトール、グリセリン、ポリグリセリン、ポリテトラメチレングリ コール等の多価アルコール;ポリエチレンオキサイド、ポリプロピレンオキサイド、ェチ レンオキサイド Zプロピレンオキサイドのブロック又はランダム共重合の少なくとも 1種 の構造を有するポリエーテルポリオール;該多価アルコール又はポリエーテルポリオ ールと無水マレイン酸、マレイン酸、フマール酸、無水ィタコン酸、ィタコン酸、アジピ ン酸、イソフタル酸等の多塩基酸との縮合物であるポリエステルポリオール;カプロラ タトン変性ポリテトラメチレンポリオール等の力プロラタトン変性ポリオール;ポリオレフ イン系ポリオール;ポリカーボネート系ポリオール;水添ポリブタジエンポリオール等の ポリブタジエン系ポリオール;ポリジメチルシロキサンポリオール等のシリコーンポリオ ール等が挙げられる。特に好ましくは、ポリエーテルポリオール、ポリエステルポリオ ールである。  [0029] Examples of powerful polyol compounds (X) include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, butylene glycol, 1,4 butanediol, polybutylene diol, 1,5 pentanediol, 1,6 hexanediol, 1,8 octanediol, 1,9-nonanediol, 3 methyl-1,5 pentanediol, 2,4 jetyl 1, 5 Pentanediol, 2, 2 Butylethyl-1,3 Propanediol, Neopentyl glycol, Cyclohexane dimethanol, Hydrogenated carbphenol A, Poly-strength prolatatone, Trimethylolethane, Trimethylololepropane, Polytrimethylolono Polyhydric alcohols such as pronone, pentaerythritol, polypentaerythritol, sorbitol, mannitol, glycerin, polyglycerin, polytetramethylene glycol; polyethylene oxide, polypropylene oxide, ethylene oxide Z propylene oxide block or random Polyether polyol having at least one structure of copolymerization; such polyhydric alcohol or polyether polyol and maleic anhydride, maleic acid, fumaric acid, itaconic anhydride, itaconic acid, adipic acid, isophthalic acid, etc. Polyester polyol that is a condensate with polybasic acid; force prolatatone modified polyol such as caprolatatone modified polytetramethylene polyol; polyolefin polyol; polycarbonate polyol; Examples thereof include polybutadiene-based polyols such as hydrogenated polybutadiene polyol; and silicone polyols such as polydimethylsiloxane polyol. Particularly preferred are polyether polyols and polyester polyols.
[0030] 中でも特に、分子量が 200〜10, 000であること力好ましく、好ましくは 500〜8, 0 00、更に好ましくは 1, 000-6, 000である。力かる分子量が 200以上ならば好適な 振動疲労耐久性を得ることができるし、 10, 000以内であれば硬化性が低下すること もなぐ好ましい。 [0030] Among these, a molecular weight of 200 to 10,000 is particularly preferable, preferably 500 to 8,000, and more preferably 1,000 to 6,000. If the molecular weight to be applied is 200 or more, suitable vibration fatigue durability can be obtained, and if it is within 10,000, the curability is reduced. It is preferable.
[0031] 有機ポリイソシァネートイ匕合物 (Y)としては、特に限定されることなぐ例えば芳香族 系、脂肪族系、環式脂肪族系、脂環式系等のポリイソシァネートが挙げられる。中で もトリレンジイソシァネート(TDI)、ジフエ-ルメタンジイソシァネート(MDI)、水添化 ジフエ-ルメタンジイソシァネート(H— MDI)、ポリフエ-ルメタンポリイソシァネート( クルード MDI)、変性ジフエ-ルメタンジイソシァネート(変性 MDI)、水添化キシリレ ンジイソシァネート(H—XDI)、キシリレンジイソシァネート(XDI)、へキサメチレンジ イソシァネート(HMDI)、トリメチルへキサメチレンジイソシァネート(TMXDI)、テトラ メチルキシリレンジイソシァネート(m— TMXDI)、イソホロンジイソシァネート(IPDI) 、ノルボルネンジイソシァネート(NBDI)、 1, 3—ビス(イソシアナトメチル)シクロへキ サン (H6XDI)等のポリイソシァネート或いはこれらポリイソシァネートの三量体化合 物、これらポリイソシァネートとポリオールの反応生成物等が好適に用いられる。中で も水添化キシリレンジイソシァネート(H—XDI)、イソホロンジイソシァネート(IPDI)が 好ましい。該ポリイソシァネートイ匕合物 (Y)の分子量は 500以下が好ましい。 500以 下であればジオールとの反応性が低下することもない。  [0031] The organic polyisocyanate compound (Y) is not particularly limited, and examples thereof include aromatic, aliphatic, cycloaliphatic, and alicyclic polyisocyanates. Can be mentioned. Among them, tolylene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), hydrogenated diphenylmethane diisocyanate (H—MDI), polyphenylmethane polyisocyanate ( Crude MDI), modified diphenylmethane diisocyanate (modified MDI), hydrogenated xylylene diisocyanate (H—XDI), xylylene diisocyanate (XDI), hexamethylene diisocyanate (HMDI), to trimethyl Xamethylene diisocyanate (TMXDI), tetramethylxylylene diisocyanate (m—TMXDI), isophorone diisocyanate (IPDI), norbornene diisocyanate (NBDI), 1,3-bis (isocyanatomethyl) ) Polyisocyanates such as cyclohexane (H6XDI), trimer compounds of these polyisocyanates, and reaction products of these polyisocyanates and polyols Etc. are preferably used. Of these, hydrogenated xylylene diisocyanate (H-XDI) and isophorone diisocyanate (IPDI) are preferred. The molecular weight of the polyisocyanate compound (Y) is preferably 500 or less. If it is 500 or less, the reactivity with the diol does not decrease.
[0032] ヒドロキシ (メタ)アタリレート(Z)としては、例えば、 2—ヒドロキシェチル (メタ)アタリレ  [0032] Examples of the hydroxy (meth) acrylate (Z) include 2-hydroxyethyl (meth) ateryl
、 2—ヒドロキシェチルアタリロイルホスフェート、 4—ブチルヒドロキシ(メタ)アタリレー ト、 2— (メタ)アタリロイ口キシェチル一 2—ヒドロキシプロピルフタレート、グリセリンジ( メタ)アタリレート、 2—ヒドロキシ一 3—アタリロイロキシプロピル (メタ)アタリレート、力 プロラタトン変性 2—ヒドロキシェチル (メタ)アタリレート、ペンタエリスリトールトリ(メタ) アタリレート、ジペンタエリスリトールペンタ(メタ)アタリレート、力プロラタトン変性 2—ヒ ドロキシェチル (メタ)アタリレート等が挙げられる。中でも 2—ヒドロキシェチル (メタ)ァ タリレート、 2—ヒドロキシプロピル (メタ)アタリレート、 2—ヒドロキシブチル (メタ)アタリ レートが好適に用いられる。 , 2-Hydroxyethyl allyloyl phosphate, 4-Butylhydroxy (meth) atrelate, 2— (Meth) atariloy cicchitil 1-hydroxypropyl phthalate, Glycerin di (meth) acrylate, 2-Hydroxy 1-Atari Leyloxypropyl (meth) acrylate, force Prolataton modified 2-hydroxyethyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, force prolatathone modified 2—Hydroxetil ( And (meth) acrylate. Of these, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate are preferably used.
[0033] 前記ウレタン (メタ)アタリレートオリゴマーにおいて、分子中の (メタ)アタリロイル基 の数は、分子の末端又は側鎖に 1個以上 6個以下、より好ましくは 2個以上 4個以下 の (メタ)アタリロイル基を有するものが好ま 、。 (メタ)アタリロイル基がな 、場合、前 記 (B)成分である単官能 (メタ)アタリレートと共重合できず、 6個より多い場合は、得ら れる成形体が硬くなりすぎて、優れた振動疲労耐久性が得られな 、ことがある。 [0033] In the urethane (meth) acrylate oligomer, the number of (meth) attaroyl groups in the molecule is 1 or more and 6 or less, more preferably 2 or more and 4 or less at the end or side chain of the molecule. Those having a (meth) atallyloyl group are preferred. If there is no (meth) atalyloyl group, then (B) Component (B) cannot be copolymerized with monofunctional (meth) acrylate, and if it is more than 6, the resulting molded product becomes too hard and excellent vibration fatigue durability cannot be obtained. There is.
c  c
[0034] 前記ウ Hレタン (メタ)アタリレートオリゴマーの分子量は、 5, 000以上 100, 000以下 、より好ましくc RcΟ ΝΠ l lは 10, 000以上 50, 000以下が選択される。分子量が 5, 000以上なら ば、得られる成形 o体が硬くなりすぎることもなぐ 100, 000以下であれば、硬化性が  [0034] The molecular weight of the urethane (meth) atarylate oligomer is 5,000 or more and 100,000 or less, and more preferably c RcΟ ΝΠ l l is 10,000 or more and 50,000 or less. If the molecular weight is 5,000 or more, the resulting molded o body will not be too hard. If it is 100,000 or less, the curability will be low.
R  R
悪くなることもなぐ振動 2疲労耐久性に優れる硬化体を得ることができる。  Vibration that does not worsen 2 A cured product with excellent fatigue durability can be obtained.
[0035] 前記 (a— 2)成分である単官能 (メタ)アタリレートは、分子内に 1つの (メタ)アタリ口 ィル基を含有するものであれば特に限定されない。中でも、下記式〔1〕または〔2〕で 表される単官能 (メタ)アタリレートを含有する榭脂組成物は振動疲労耐久性の優れ た硬化体を得ることができるため特に好ましい。  [0035] The monofunctional (meth) acrylate which is the component (a-2) is not particularly limited as long as it contains one (meth) attayl group in the molecule. Among these, a resin composition containing a monofunctional (meth) acrylate represented by the following formula [1] or [2] is particularly preferable because a cured product excellent in vibration fatigue durability can be obtained.
[化 3]  [Chemical 3]
C 1 式〔1〕中、 R1は水素原子またはメチル基であり、 R2は、炭素数 1〜22 (好ましくは、 炭素数 1〜12である。)である直鎖もしくは分岐アルキル基、シクロへキシル基、炭素 数 1〜4の直鎖もしくは分岐アルキル基により置換されたシクロへキシル基、フエニル 基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたフエニル基、ジシク 口ペンタ-ル基、ジシクロペンテ-ル基、ボル-ル基、イソボル-ル基、ァダマンチル 基、メチルァダマンチル基、ァリル基である。 In C 1 [1], R 1 is a hydrogen atom or a methyl group, R 2 is a linear or branched alkyl group having 1 to 22 carbon atoms (preferably having 1 to 12 carbon atoms), A cyclohexyl group, a cyclohexyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms, a phenyl group, a phenyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclo group A pental group, a dicyclopentayl group, a boryl group, an isobolyl group, an adamantyl group, a methyladamantyl group, and an aryl group.
[化 4]  [Chemical 4]
R1
Figure imgf000011_0001
R 1
Figure imgf000011_0001
〔2〕 式〔2〕中、 R1は水素原子またはメチル基であり、 Rは、炭素数 1〜4である直鎖もし くは分岐アルキル基、 R4は、炭素数 1〜4である直鎖もしくは分岐アルキル基、シクロ へキシル基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたシクロへキ シル基、フエ-ル基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたフ ェ-ル基、ジシクロペンタ-ル基、ジシクロペンテ-ル基、ボル-ル基、イソボル-ル 基、ァダマンチル基、メチルァダマンチル基、ァリル基である。 [2] In the formula [2], R 1 is a hydrogen atom or a methyl group, and R is a straight chain having 1 to 4 carbon atoms. Or a branched alkyl group, R 4 is a linear or branched alkyl group having 1 to 4 carbon atoms, a cyclohexyl group, or a cyclohexyl group substituted by a linear or branched alkyl group having 1 to 4 carbon atoms. , A phenyl group, a phenyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclopental group, a dicyclopental group, a boryl group, an isobornyl group, an adamantyl group , A methyladamantyl group and an aryl group.
nは 1〜 12の整数であり、好ましくは、 1〜10である。  n is an integer of 1 to 12, preferably 1 to 10.
[0036] 具体的には、メチル (メタ)アタリレート、ェチル (メタ)アタリレート、プロピル (メタ)ァ タリレート、 n—ブチル (メタ)アタリレート、イソブチル (メタ)アタリレート、 tert—ブチル (メタ)アタリレート、 2—ェチルへキシル (メタ)アタリレート、イソデシル (メタ)アタリレー ト、ラウリル (メタ)アタリレート、ステアリル (メタ)アタリレート、イソステアリル (メタ)アタリ レート、トリデシル (メタ)アタリレート、ベへ-ル (メタ)アタリレート、メトキシェチル (メタ )アタリレート、エトキシェチル (メタ)アタリレート、プロピオキシェチル (メタ)アタリレー ト、ブトキシェチル (メタ)アタリレート、メトキシジエチレングリコール (メタ)アタリレート、 メトキシトリエチレングリコール (メタ)アタリレート、メトキシテトラエチレン (メタ)アタリレ [0036] Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meta ) Atarylate, 2-Ethylhexyl (meth) acrylate, Isodecyl (meth) acrylate, Lauryl (meth) acrylate, Stearyl (meth) acrylate, Isostearyl (meth) acrylate, Tridecyl (meth) acrylate , Beryl (meth) acrylate, methoxyethyl (meth) acrylate, ethoxy ethyl (meth) acrylate, propoxyethyl (meth) acrylate, butoxetyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, Methoxytriethylene glycol (meth) acrylate, Butoxy tetraethylene (meth) Atarire
レート、フエノキシテトラエチレングリコール (メタ)アタリレート、フエノキシへキサェチレ ングリコール (メタ)アタリレート、メトキシジプロピレングリコール (メタ)アタリレート、メト キシトリプロピレングリコール (メタ)アタリレート、シクロへキシル (メタ)アタリレート、 ter t—ブチルシクロへキシル (メタ)アタリレート、ベンジル (メタ)アタリレート、フエノキシェ チル (メタ)アタリレート、ジシクロペンタ-ル (メタ)アタリレート、ジシクロペンテ-ル (メ タ)アタリレート、ボル-ル (メタ)アタリレート、イソボル-ル (メタ)アタリレート、 2—メチ ル— 2—ァダマンチル (メタ)アタリレート、ァリル (メタ)アタリレート等が例示できる。 尚 、アタリレートとメタタリレートとではメタタリレートの方がより好適な振動疲労耐久性に 優れた硬化体を与える。 Rate, phenoxytetraethylene glycol (meth) acrylate, phenoxyhexaethylene glycol (meth) acrylate, methoxydipropylene glycol (meth) acrylate, methoxytripropylene glycol (meth) acrylate, cyclohexyl ( (Meth) Atalylate, ter t-butylcyclohexyl (Meth) acrylate, Benzyl (Meth) acrylate, Phenoxetyl (Meth) acrylate, Dicyclopentayl (Meth) acrylate, Dicyclopentale (Meth) acrylate Boryl (meth) acrylate, isobornyl (meth) acrylate, 2-methyl-2-adamantyl (meth) acrylate, aryl (meth) acrylate, and the like can be exemplified. It should be noted that the talate and the metatalylate give a hardened body excellent in vibration fatigue durability, which is more suitable for the metatalate.
[0037] (a— 2)単官能 (メタ)アタリレートは、当該ホモポリマーの Tgが 20°C以上の単官能( メタ)アタリレートであることが好ましい。さらに好ましくは Tgが 50°C以上、特に好ましく は 80°C以上である。 Tgが 20°C以上であれば、得られる硬化体が柔軟すぎたり、硬 化性が悪くなつたりすることもない。尚、本発明の光硬化性榭脂組成物の Tgは測定 方法に特に制限はないが、 DSCや動的粘弾性等の公知の方法で測定され、好まし くは DSCが用いられる。 [0037] (a-2) The monofunctional (meth) acrylate is preferably a monofunctional (meth) acrylate having a Tg of the homopolymer of 20 ° C or higher. More preferably, Tg is 50 ° C or higher, particularly preferably 80 ° C or higher. If the Tg is 20 ° C or higher, the resulting cured product will not be too flexible or harden. The Tg of the photocurable resin composition of the present invention is measured. Although the method is not particularly limited, it is measured by a known method such as DSC or dynamic viscoelasticity, and DSC is preferably used.
[0038] 本発明の光硬化性榭脂組成物に於!、て、 (a- 1)成分と (a— 2)成分の配合比は、  [0038] In the photocurable resin composition of the present invention, the blending ratio of the components (a-1) and (a-2) is:
(a— 1)成分と (a— 2)成分の合計に対し、(a— 1)成分を 5〜95質量%、特に好まし くは 20〜85質量%含有する組成物とするとき、光照射により得られる硬化物は、優 れた振動疲労耐久性を有するので特に好ま U、。  When a composition containing 5 to 95% by mass, particularly preferably 20 to 85% by mass of the component (a-1) with respect to the total of the components (a-1) and (a-2), Cured products obtained by irradiation are particularly preferred because they have excellent vibration fatigue durability.
[0039] (B)成分である光重合開始剤は、紫外線重合開始剤や可視光重合開始剤等があ るが、どちらも制限無く用いられる。光ラジカル重合開始剤としては、ベンゾイン系、 ベンゾフエノン系、ァセトフエノン系、ァシルホスフィンオキサイド系、チォキサントン系 、メタ口セン系、キノン系等がある。光力チオン重合開始剤としては、ョードニゥム塩ィ匕 合物、スルフォ-ゥム塩ィ匕合物、ホスフォユウム塩ィ匕合物、ピリジ-ゥム塩ィ匕合物、鉄 アレーン錯体ィ匕合物等が挙げられる。  [0039] The photopolymerization initiator as the component (B) includes an ultraviolet polymerization initiator and a visible light polymerization initiator, both of which are used without limitation. Examples of the radical photopolymerization initiator include benzoin-based, benzophenone-based, acetophenone-based, acyl-phosphine oxide-based, thixanthone-based, meta-octene-based, and quinone-based initiators. As photoinitiated thione polymerization initiators, iodine salt compounds, sulfur salt compounds, phosphorium salt compounds, pyridinium salt compounds, iron arene complex compounds Etc.
[0040] 本発明に於いて、光重合開始剤としては、特に限定されずに公知のものが使用で きる。例えば、ベンゾフエノン、 4 フエ-ルペンゾフエノン、ベンゾィル安息香酸、 2, 2—ジェトキシァセトフエノン、ビスジェチルァミノべンゾフエノン、ベンジル,ベンゾィ ン、ベンゾィルイソプロピルエーテル、ベンジルジメチルケタール、 1ーヒドロキシシク 口へキシルフエ-ルケトン、チォキサントン、 1— (4—イソプロピルフエ-ル) 2 ヒドロ キシ一 2—メチルプロパン一 1—オン、 1— (4— (2 ヒドロキシエトキシ)一フエ-ル) — 2—ヒドロキシ一 2—メチル 1—プロパン一 1 オン、 2—ヒドロキシ一 2—メチル 1 フエニルプロパン 1 オン、カンファーキノン、 2, 4, 6 トリメチルベンゾィルジ フエ-ルホスフィンオキサイド、ビス(2, 4, 6 トリメチルベンゾィル)一フエ-ルホスフ インオキサイド、 2—メチルー 1一(4 (メチルチオ)フエ-ル) 2 モルフォリノプロ パン一 1—オン、 2 ベンジル一 2-ジメチルァミノ一 1— (4 モルフォリノフエ-ル) 1—ブタノン一 1、ビス(2, 6 ジメトキシベンゾィル)一2, 4, 4 トリメチル一ペンチ ルホスフィンオキサイド等が挙げられる。  In the present invention, the photopolymerization initiator is not particularly limited, and known ones can be used. For example, benzophenone, 4-phenol penzophenone, benzoyl benzoic acid, 2,2-jetoxyacetophenone, bisjetylaminobenzobenzoenone, benzyl, benzoin, benzoyl isopropyl ether, benzyl dimethyl ketal, 1-hydroxysic Xylphenol ketone, thixanthone, 1— (4-isopropylphenol) 2 hydroxy-2-methylpropane-1-one, 1- (4- (2-hydroxyethoxy) monophenyl) — 2-hydroxy-2- —Methyl 1-propane 1-one, 2-hydroxy 1 2-methyl 1 phenylpropane 1-one, camphorquinone, 2, 4, 6 trimethylbenzoyl phenylphosphine oxide, bis (2, 4, 6 trimethylbenzo 1) Phylphosphine oxide, 2-methyl-1 1 (4 (methylthio) 2) 2 Morpholinopropan 1-one, 2 benzyl 1-dimethylamino 1- (4 morpholinophenol) 1-butanone 1, 1, bis (2,6 dimethoxybenzoyl) 1, 2, 4, 4 trimethyl monopenti Examples include ruphosphine oxide.
[0041] (C)成分である酸ィ匕防止剤としては、例えば、 β—ナフトキノン、 2—メトキシ一 1, 4 ーノフトキノン、メチルハイドロキノン、ハイドロキノン、ハイドロキノンモノメチルエーテ ル、モノー tert ブチルハイドロキノン、 2, 5 ジー tert ブチルハイドロキノン、 p— ベンゾキノン、 2, 5 ジフエニル一 p ベンゾキノン、 2, 5 ジ一 tert—ブチル p— ベンゾキノン等のキノン系化合物;フエノチアジン、 2, 2—メチレン一ビス(4—メチル —6— tert ブチノレフエノーノレ)、力テコーノレ、 tert—ブチノレ力テコーノレ、 2—ブチノレ —4 ヒドロキシァ二ノール、 2, 6 ジ一 tert—ブチル p クレゾール、 2— tert— ブチル 6—( 3— tert ブチル 2 ヒドロキシ 5 メチルベンジル) 4 メチル フエ-ルアタリレート、 2—〔1— (2 ヒドロキシ一 3, 5 ジ一 tert ペンチルフエ-ル )ェチル〕 4, 6—ジ一 tert—ペンチルフエ-ルアタリレート、 4, 4' —ブチリデンビ ス(6— tert ブチルー 3—メチルフエノール)、 4, 4' ーチォビス(6— tert ブチル —3—メチルフエノール)、 3, 9 ビス〔2—〔3— (3— tert—ブチル 4 ヒドロキシ一 5 メチルフエ-ル)プロピオ-口キシ〕 1 , 1ージメチルェチル〕—2, 4, 8, 10—テ トラォキサスピロ〔5, 5〕ゥンデカン、ペンタエリスリトールテトラキス〔3— (3, 5—ジ一 t ert—ブチルー 4ーヒドロキシフエ-ル)プロピオネート〕、チオジェチレンビス〔3— (3 , 5—ジ—tert—ブチルー 4ーヒドロキシフエ-ル)プロピオネート〕、ォクタデシルー 3 — (3, 5—ジ— tert—ブチル—4—ヒドロキシフエ-ル)プロピオネート、 N, N' キサン— 1 , 6 ジィルビス〔3— (3, 5 ジ— tert—ブチル—4 ヒドロキシフエ-ル) プロピオンアミド〕、ベンゼンプロパン酸, 3, 5 ビス(1 , 1ージメチルェチル)ー4ーヒ ドロキシ, C7— C9側鎖アルキルエステル、 2, 4 ジメチルー 6— ( 1—メチルペンタ デシル)フエノール、ジェチル〔〔3, 5 ビス(1 , 1ージメチルェチル)ー4ーヒドロキシ フエ-ル〕メチル〕フォスフォネート、 3, 3' , 3" , 5, 5' , 5グ キサ一 tert—ブ チル一 a, a' , a" —(メシチレン一 2, 4, 6 トリル)トリ一 p—タレゾール、カルシウム ジェチルビス〔〔3, 5 ビス(1 , 1—ジメチルェチル)— 4 ヒドロキシフエ-ル〕メチル 〕フォスフォネート、 4, 6—ビス(オタチルチオメチル) o クレゾール、エチレンビス( ォキシエチレン)ビス〔 3—( 5— tert ブチル 4ーヒドロキシ m—トリル)プロピオ ネート〕、へキサメチレンビス〔3— (3, 5—ジ— tert—ブチル—4—ヒドロキシフエ-ル )プロピオネート、 1 , 3, 5 トリス(3, 5 ジ— tert—ブチル—4 ヒドロキシベンジル )— 1 , 3, 5 トリアジン— 2, 4, 6 ( 1H, 3H, 5H)—トリオン、 1 , 3, 5 トリス〔(4— t ert—ブチル 3 ヒドロキシ一 2, 6 キシリル)メチル〕 1 , 3, 5 トリァジン一 2, 4 , 6 ( 1H, 3H, 5H)—トリオン、 N—フエ-ルベンゼンァミンと 2, 4, 6 トリメチルペン テンとの反応生成物、 2, 6 ジー tert—ブチルー 4一(4, 6 ビス(ォクチルチオ)一 1, 3, 5 トリァジン一 2—ィルァミノ)フエノール、ピクリン酸、クェン酸等のフエノール 類;トリス(2, 4 ジ一 tert—ブチルフエ-ル)フォスファイト、トリス〔2—〔〔2, 4, 8, 10 ーテトラー tert—ブチルジベンゾ〔d, f〕〔1, 3, 2〕ジォキサフォスフエフィン 6—ィル 〕ォキシ〕ェチル〕ァミン、ビス(2, 4 ジ—tert ブチルフエ-ル)ペンタエリスリート ールジフォスファイト、ビス〔2, 4 ビス( 1 , 1 ジメチルェチル) - 6 メチルフエ-ル 〕ェチルエステル亜リン酸、テトラキス(2, 4 ジ—tert ブチルフエ-ル)〔1, 1ービ スフエ-ル〕 4, 4 '—ジィルビスホスフォナイト、 6—〔3— (3— tert—ブチル 4—ヒ ドロキシ 5 メチルフエ-ル)プロポキシ〕 2, 4, 8, 10—テトラー tert—ブチルジ ベンズ〔d、 f〕〔l, 3, 2〕ジォキサフォスフエフィン等のリン系化合物;ジラウリル 3, 3' チォジプロピオネート、ジミリスチノレ 3, 3' —チォジプロピオネート、ジステアリノレ 3 , 3'—チォジプロピオネート、ペンタエリスリチルテトラキス(3—ラウリルチオプロピオ ネート)、 2—メルカプトべンズイミダゾール等のィォゥ系化合物;フエノチアジン等の アミン系化合物;ラタトン系化合物;ビタミン E系化合物等が挙げられる。中でもフエノ ール系化合物が好適である。 [0041] Examples of the anti-oxidation agent that is component (C) include β-naphthoquinone, 2-methoxy-1,4-naphthoquinone, methyl hydroquinone, hydroquinone, hydroquinone monomethyl ether, mono-tert butyl hydroquinone, 2, 5 G-tert butyl hydroquinone, p— Quinone compounds such as benzoquinone, 2,5 diphenyl mono-benzoquinone, 2,5 di-tert-butyl p-benzoquinone; phenothiazine, 2,2-methylene monobis (4-methyl-6-tert-butylenophenol) , Force teconole, tert-butinole force teconole, 2-butynole —4 hydroxyvaninol, 2, 6 di-tert-butyl p cresol, 2-tert-butyl 6- (3-tert-butyl 2-hydroxy-5-methylbenzyl) 4 Methyl phenol acrylate, 2— [1— (2 hydroxy-1,3,5 di tert pentylphenol) ethyl] 4,6—di tert—pentyl phthalate, 4, 4 ′ —butylidenebis ( 6- tert-butyl-3-methylphenol), 4,4'-thiobis (6-tert-butyl-3-methylphenol), 3, 9 bis [2- [3- (3-tert-butyl 4-hydroxy-5-methylphenol) Propio-dioxy] 1,1-dimethylethyl] -2,4,8,10-tetraxaspiro [5,5] undecane, pentaerythritol tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenol) Propionate], Thiodethylenebis [3- (3,5-Di-tert-butyl-4-hydroxyphenol) propionate], Octadecyl-3— (3,5-Di-tert-butyl-4-hydroxyphenol) propionate , N, N 'xan-1,6 diylbis [3- (3,5 di-tert-butyl-4-hydroxyphenol) propionamide], benzenepropanoic acid, 3,5 bis (1,1-dimethylethyl) -4 -Hydroxy, C7-C9 side chain alkyl ester, 2,4 dimethyl-6- (1-methylpentadecyl) phenol, jetyl [[3,5 bis (1,1-dimethylethyl) -4-hydroxyphenol] me Phosphonate, 3, 3 ', 3 ", 5, 5', 5 gxa tert-butyl 1 a, a ', a" — (mesitylene 1, 2, 4, 6 tolyl) tri p- Talesol, calcium jetyl bis [[3,5 bis (1,1-dimethylethyl) -4 hydroxyphenol] methyl] phosphonate, 4,6-bis (octylthiomethyl) o cresol, ethylene bis (oxyethylene) bis [ 3- (5-tert-butyl 4-hydroxy m-tolyl) propionate], hexamethylenebis [3- (3,5-di-tert-butyl-4-hydroxyphenol) propionate, 1, 3, 5 tris (3,5 di-tert-butyl-4 hydroxybenzyl) — 1, 3, 5 triazine— 2, 4, 6 (1H, 3H, 5H) —trione, 1, 3, 5 tris [(4—t ert— (Butyl 3hydroxy-1,2,6xylyl) methyl] 1,3,5 Triazine 1,2,4,6 (1H, 3H, 5H) -trione N- Hue - Rubenzenamin and 2, 4, 6 Torimechirupen Reaction products with ten, 2, 6 di tert-butyl-4 (4,6 bis (octylthio) -1,3,5 triazine-1 2-ylamino) phenols such as phenol, picric acid, citrate; 2,4 Di-tert-butylphenol) phosphite, tris [2-[[2,4,8,10-tetra-tert-butyldibenzo [d, f] [1,3,2] dioxaphosphephine 6-yl] oxy] ethyl] amine, bis (2,4 di-tert-butylphenol) pentaerythritol diphosphite, bis [2,4 bis (1,1 dimethylethyl) -6 methylphenyl] ethyl ester Phosphorous acid, tetrakis (2,4 di-tert-butylphenol) [1,1-bisphenol] 4,4'-diylbisphosphonite, 6- [3- (3-tert-butyl 4- Hydroxy-5-methylphenol) propoxy] 2, 4, 8, 10-tetra-tert-butyl Phosphorus compounds such as Ruzi benz [d, f] [l, 3, 2] dioxaphosphephine; dilauryl 3, 3 'thiodipropionate, dimyristinole 3, 3' — thiodipropionate, distearinole 3, 3'-thiodipropionate, pentaerythrityltetrakis (3-laurylthiopropionate), 2-mercaptobenzimidazole and other amine compounds; phenothiazine and other amine compounds; rataton compounds; vitamin E compounds Is mentioned. Of these, phenol compounds are preferred.
(D)成分である光安定剤としては、例えば、ビス(2, 2, 6, 6—テトラメチル一 4 ピ ペリジル)セバケート、ビス(1, 2, 2, 6, 6 ペンタメチル一 4 ピペリジル)セバケ一 卜、 4 ベンゾィルォキシ—2, 2, 6, 6—テ卜ラメチルピペリジン、 1—〔2—〔3— (3, 5 —ジ— tert—ブチル—4—ヒドロキシフエ-ル)プロピオ-ルォキシ〕ェチル〕—4—〔3 一(3, 5 ジ tert—ブチルー 4ーヒドロキシフエ-ル)プロピオ-ルォキシ〕 2, 2, 6, 6—テトラメチルピペリジン、 1, 2, 2, 6, 6 ペンタメチル— 4 ピベリジ-ル―メ タァクリレー卜、ビス(1, 2, 2, 6, 6 ペンタメチル— 4 ピベリジ-ル)〔〔3, 5 ビス( 1, 1ージメチルェチル) 4ーヒドロキシフエ-ル〕メチル〕ブチルマロネート、デカン 二酸ビス(2, 2, 6, 6—テトラメチルー 1 (ォクチルォキシ)ー4ーピベリジ-ル)エステ ル, 1, 1ージメチルェチルヒドロペルォキシドとオクタンの反応生成物、 N, Ν' , N " , Ν,, ' —テトラキス一(4, 6 ビス一(ブチル一(Ν—メチル 2, 2, 6, 6—テトラ メチルビペリジン— 4—ィル)ァミノ)—トリァジン— 2—ィル)—4, 7 ジァザデカン— 1, 10 ジァミン、ジブチルァミン · 1, 3, 5 トリァジン ·Ν, N' —ビス(2, 2, 6, 6— テトラメチルー 4ーピベリジルー 1, 6 へキサメチレンジァミンと N—(2, 2, 6, 6—テ トラメチルー 4ーピペリジル)ブチルァミンの重縮合物、ポリ〔〔6—(l, 1, 3, 3—テトラ メチルブチル)アミノー 1, 3, 5 トリアジンー 2, 4 ジィノレ〕 [ (2, 2, 6, 6—テトラメチ ルー 4ーピペリジル)ィミノ〕へキサメチレン〔(2, 2, 6, 6—テトラメチルー 4ーピベリジ ル)ィミノ〕〕、コハク酸ジメチルと 4ーヒドロキシ 2, 2, 6, 6—テトラメチルー 1ーピペリ ジンエタノールの重合物、 2, 2, 4, 4ーテトラメチルー 20—(j8—ラウリルォキシカル ボ -ル)ェチル 7 ォキサ 3, 20 ジァザジスピロ〔 5 · 1 · 11 · 2〕へネィコサン 2 1—オン、 13—ァラニン, N, - (2, 2, 6, 6—テトラメチル一 4 ピベリジ-ル)一ドデ シルエステル Zテトラデシルエステル、 N ァセチルー 3 ドデシルー 1— (2, 2, 6, 6—テトラメチルー 4ーピペリジニル)ピロリジン 2, 5 ジオン、 2, 2, 4, 4ーテトラメ チル— 7—ォキサ—3, 20 ジァザジスピロ〔5, 1, 11, 2〕へネィコサン— 21—オン 、 2, 2, 4, 4—テトラメチル— 21—ォキサ—3, 20 ジァザジシクロ—〔5, 1, 11, 2] 一へネィコサン 20—プロパン酸ドデシルエステル Zテトラデシルエステル、プロパ ンジオイックアシッド, 〔(4—メトキシフエ-ル)一メチレン〕一ビス(1, 2, 2, 6, 6 ぺ ンタメチルー 4ーピペリジニル)エステル、 2, 2, 6, 6—テトラメチルー 4ーピペリジノ ールの高級脂肪酸エステル、 1, 3 ベンゼンジカルボキシアミド, N, N' —ビス(2, 2, 6, 6—テトラメチルー 4ーピベリジ-ル)等のヒンダートアミン系;ォクタベンゾン等 のべンゾフエノン系化合物; 2—(2H べンゾトリァゾールー 2—ィル)ー4ー(1, 1, 3 , 3—テトラメチルブチル)フエノール、 2—(2 ヒドロキシー5 メチルフエ-ル)ベン ゾトリァゾーノレ、 2—〔2 ヒドロキシ一 3— (3, 4, 5, 6—テトラヒドロフタルイミド一メチ ル) 5 メチルフエ-ル〕ベンゾトリァゾール、 2—(3— tert—ブチルー 2 ヒドロキ シ一 5—メチルフエ-ル)一 5 クロ口べンゾトリァゾール、 2— (2 ヒドロキシ一 3, 5 ージ—tert ペンチルフエ-ル)ベンゾトリァゾール、メチル 3—(3—(2H べンゾト リァゾール - 2-ィル)— 5— tert -ブチル— 4—ヒドロキシフエ-ル)プロピオネートと ポリエチレングリコールの反応生成物、 2—(2H べンゾトリァゾールー 2 ィル) 6 —ドデシル— 4—メチルフエノール等のベンゾトリアゾール系化合物; 2, 4 ジ— tert ブチルフエニル 3 , 5—ジー tert ブチル 4 ヒドロキシベンゾエート等のベン ゾエート系化合物; 2— (4, 6 ジフエ-ル— 1, 3, 5 トリァジン— 2—ィル)—5—〔( へキシル)ォキシ〕フエノール等のトリアジン系化合物等が挙げられる。特に好ましくは 、ヒンダートアミン系化合物である。 Examples of the light stabilizer that is component (D) include bis (2, 2, 6, 6-tetramethyl-4-piperidyl) sebacate and bis (1, 2, 2, 6, 6 pentamethyl-4-piperidyl) sebacate. 1、4 Benzyloxy-2,2,6,6-tetramethylpiperidine, 1- [2- [3-((3,5--di-tert-butyl-4-hydroxyphenol) propio-loxy] Ethyl] -4-4- [3 (3,5 di tert-butyl-4-hydroxyphenyl) propio-loxy] 2, 2, 6, 6-tetramethylpiperidine, 1, 2, 2, 6, 6 pentamethyl-4 piperizi -Lumethyl relay, bis (1,2,2,6,6 pentamethyl-4piberidyl) [[3,5 bis (1,1-dimethylethyl) 4-hydroxyphenyl] methyl] butyl malonate, decane Bis (2, 2, 6, 6-tetramethyl-1 (octyloxy) -4-piveridyl) ester, 1, 1- Reaction product of dimethylethyl hydroperoxide and octane, N, Ν ', N ", Ν ,,' —tetrakis (4, 6 bis ((butyl-1, (Ν-methyl 2, 2, 6, 6— Tetramethylbiperidine—4-yl) amino) —triazine—2-yl) —4, 7 Diazadecane— 1, 10 Diamine, dibutylamine • 1, 3, 5 Triazine • Ν, N ′ —bis (2, 2, 6 , 6— Polycondensate of tetramethyl-4-piveridyl 1, 6 hexamethylenediamine and N— (2, 2, 6, 6-tetramethyl-4-piperidyl) butyramine, poly [[6- (l, 1, 3, 3-tetra (Methylbutyl) amino-1,3,5 triazine-2,4-dinole] [(2,2,6,6-tetramethyl-4-piperidyl) imino] hexamethylene [(2,2,6,6-tetramethyl-4-piperidyl) imino] ), A polymer of dimethyl succinate and 4-hydroxy 2, 2, 6, 6-tetramethyl-1-piperidine ethanol, 2, 2, 4, 4-tetramethyl-20- (j8-lauryloxycarboxyl) ethyl 7 oxa3 , 20 Diazadispiro [5 · 1 · 11 · 2] Henicosone 2 1-one, 13-alanine, N,-(2, 2, 6, 6-tetramethyl-4-piberidyl) monododecyl ester Z-tetra Decyl ester, N-acetylyl 3 Dodecyl 1— (2, 2 , 6, 6-tetramethyl-4-piperidinyl) pyrrolidine 2,5 dione, 2, 2, 4, 4-tetramethyl-7-oxa-3,20 diazadispiro [5,1,11,2] neicosane-21-one, 2 , 2, 4, 4-tetramethyl-21-oxa-3, 20 diazadicyclo- [5, 1, 11, 2] monohenecosan 20-propanoic acid dodecyl ester Z tetradecyl ester, propandioic acid, [( 4-Methoxyphenyl) monomethylene] monobis (1, 2, 2, 6, 6 pentamethyl-4-piperidinyl) ester, 2, 2, 6, 6-tetramethyl-4-piperidinol higher fatty acid ester, 1, 3 benzene Hindered amines such as dicarboxamide, N, N '—bis (2, 2, 6, 6-tetramethyl-4-piberidyl); benzophenone compounds such as octabenzone; 2— (2H benzotriazole 2—4) (1, 1, 3 , 3-tetramethylbutyl) phenol, 2- (2 hydroxy-5 methylphenol) benzotriazolene, 2- (2-hydroxy-3- (3, 4, 5, 6-tetrahydrophthalimide monomethyl) 5 methylphenol] Benzotriazole, 2- (3-tert-butyl-2-hydroxy-5-methylphenol) -15-clobenzobenzolazole, 2- (2-hydroxy-1,3-di-tertpentylphenol) benzotriazole, Methyl 3- (3- (2H Benzotriazole-2-yl) -5- tert-Butyl-4-hydroxyphenol) Propionate and polyethylene glycol reaction product, 2- (2H Benzotriazole- 2-yl) 6-dodecyl-benzotriazole compounds such as 4-methylphenol; 2,4-di-tert-butylphenyl 3,5-di-tert-butyl 4-hydroxybenzoate, etc. Zoate compounds; 2— (4, 6 Diphenyl— 1, 3, 5 Triazine— 2—yl) —5 — [( And triazine compounds such as (hexyl) oxy] phenol. Particularly preferred are hindered amine compounds.
[0043] 本発明の光硬化性榭脂組成物に於!、て、 (A)〜 (D)成分の合計量を 100質量% とするときに、(A)成分が好ましくは 85. 00-99. 99質量0 /0、特に好ましくは 90. 0 〜99. 9質量%含有される。(B)成分は、好ましくは 0. 01〜15質量%、特に好ましく は 0. 1〜10質量%含有される。(C)成分および (D)成分の合計を好ましくは 0. 01 〜5質量%、特に好ましくは 0. 05〜3質量%含有される。(C)成分および (D)成分 は、(C)成分 Z(D)成分の含有比率が好ましくは 0Z10〜10Z0、特に好ましくは 1 Z9〜9Zlである。(A)〜(D)成分の含有量力かかる範囲の場合、本発明の光硬化 性榭脂組成物から得られる硬化物は、優れた振動疲労耐久性を有するので好まし ヽ [0043] In the photocurable resin composition of the present invention, when the total amount of the components (A) to (D) is 100% by mass, the component (A) is preferably 85.00- 99.99 mass 0/0, and particularly preferably contained from 90.0 to 99.9 wt%. Component (B) is preferably contained in an amount of 0.01 to 15% by mass, particularly preferably 0.1 to 10% by mass. The total of the component (C) and the component (D) is preferably 0.01 to 5% by mass, particularly preferably 0.05 to 3% by mass. Component (C) and component (D) are preferably such that the content ratio of component (C) Z (D) is 0Z10 to 10Z0, particularly preferably 1Z9 to 9Zl. In the case where the content of components (A) to (D) is high, a cured product obtained from the photocurable resin composition of the present invention is preferable because it has excellent vibration fatigue durability.
[0044] さらに、本発明の光硬化性榭脂組成物は、前記光硬化性榭脂に加えて、 (B)光重 合開始剤と、(C)酸ィ匕防止剤及び (D)光安定剤のいずれか又は両方とを含有し、当 該光硬化性榭脂組成物の硬化体は、 JIS K7113 (プラスチックの引張試験方法)に 準拠して引張試験測定を実施したとき、引張弾性率が l〜30MPa、好ましくは 1. 5 〜28. 5MPaであり、かつ引張破壊伸びが 200%以上、好ましくは 201〜1500%で ある優れた振動疲労耐久性を示すことを特徴とする。硬化体の引張弾性率が IMPa 以上であれば、得られる硬化体が柔らかすぎて形状を保持できな!、という問題を生じ ることもない。また、硬化体の引張弾性率が 30MPa以下で、し力も引張破壊伸びが 2 00%以上であれば、優れた振動疲労耐久性が得られ、発明の効果が確実に得るこ とがでさる。 [0044] Further, the photocurable resin composition of the present invention includes, in addition to the photocurable resin, (B) a photopolymerization initiator, (C) an acid-proofing agent, and (D) light. The cured product of the photocurable resin composition containing either or both of the stabilizers has a tensile modulus when subjected to a tensile test measurement in accordance with JIS K7113 (plastic tensile test method). Is 1 to 30 MPa, preferably 1.5 to 28.5 MPa, and exhibits excellent vibration fatigue durability with a tensile elongation at break of 200% or more, preferably 201 to 1500%. If the tensile modulus of the cured product is IMPa or more, there will be no problem that the resulting cured product is too soft to maintain its shape! Further, if the cured product has a tensile modulus of 30 MPa or less and a tensile strength of 200% or more, excellent vibration fatigue durability can be obtained, and the effects of the invention can be reliably obtained.
[0045] さらに、本発明の光硬化性榭脂組成物において、(E)成分であるゴム組成物を少 なくとも 1種類以上含むことが、優れた振動疲労耐久性を得るために好ましい。  [0045] Further, in the photocurable resin composition of the present invention, it is preferable to include at least one rubber composition as the component (E) in order to obtain excellent vibration fatigue durability.
ゴム組成物としては、前記のエラストマ一 (R)が例示できる力 その中でも光硬化性 榭脂への相溶性の面力 特に好ましくは、(メタ)アクリル酸エステルイ匕合物、ビニル 系化合物、及びォレフィン系炭化水素化合物力 なる群力 選ばれる少なくとも一つ の単量体力 なる共重合体であるゴム組成物が好ましい。  As the rubber composition, the power that can be exemplified by the above-mentioned elastomer (R), particularly, the surface power of compatibility with the photocurable resin, particularly preferably a (meth) acrylic acid ester compound, a vinyl compound, and A rubber composition which is a copolymer having at least one selected monomer force is preferable.
[0046] ゴム組成物の分子量は、好ましくは 500〜50, 000、特に好ましくは 750〜20, 00 0、さらに好ましくは 1, 000-10, 000の範囲である。分子量が 500以上で、光硬化 性榭脂は充分な振動疲労耐久性を得ることができ、 50, 000以下であれば、光硬化 性榭脂との相溶性にも優れるので好ま 、。 [0046] The molecular weight of the rubber composition is preferably 500 to 50,000, particularly preferably 750 to 20,000. It is 0, and more preferably in the range of 1,000 to 10,000. A photocurable resin having a molecular weight of 500 or more is preferable because sufficient vibration fatigue durability can be obtained, and if it is 50,000 or less, the compatibility with the photocurable resin is excellent.
ゴム組成物の分子量分布 (重量平均分子量を Mw、数平均分子量を Mnとしたとき の MwZMn)は 1. 0以上 5. 0以下、特に好ましくは 1. 1以上 3. 0以下であることが、 光硬化性榭脂に相溶し、且つ優れた振動疲労耐久性を与えるため好ましい。  The molecular weight distribution of the rubber composition (MwZMn when the weight average molecular weight is Mw and the number average molecular weight is Mn) is 1.0 or more and 5.0 or less, particularly preferably 1.1 or more and 3.0 or less. It is preferable because it is compatible with the photocurable resin and gives excellent vibration fatigue durability.
[0047] ゴム組成物を構成する単量体としては、(ィ)ホモポリマーの Tgが 25°C未満であるラ ジカル重合性単量体、(口)ホモポリマーの Tgが 25°C以上であるラジカル重合性単 量体、及び (ハ)分子内に非ラジカル重合性である反応性基を少なくとも一つ有する ラジカル重合性単量体、を含むときに、ゴム組成物が、光硬化性榭脂との相溶性が 良ぐ優れた振動疲労耐久性を与えるため特に好ましい。  [0047] The monomer constituting the rubber composition includes (i) a radically polymerizable monomer having a Tg of the homopolymer of less than 25 ° C, and (mouth) a Tg of the homopolymer of 25 ° C or more. When the rubber composition contains a certain radically polymerizable monomer and (c) a radically polymerizable monomer having at least one reactive group that is non-radically polymerizable in the molecule, the rubber composition has a photocurable property. This is particularly preferred because it provides excellent vibration fatigue durability with good compatibility with fats.
[0048] (ィ)成分の単量体は、ゴム組成物に柔軟性を与える。ゴム組成物中に占める (ィ) 成分の割合は 20〜90質量%が好ましぐ特に好ましくは 30〜80質量%である。  [0048] The monomer of component (i) imparts flexibility to the rubber composition. The proportion of the component (ii) in the rubber composition is preferably 20 to 90% by mass, particularly preferably 30 to 80% by mass.
(ィ)成分としては、炭素数 1〜20のアルキル (メタ)アタリレート〔例えば、ブチルァク リレート、 n—ブチルメタタリレート、ェチルアタリレート、 n—ォクチルアタリレート、およ び 2—ェチルへキシル (メタ)アタリレート〕、ジェンモノマー〔例えば、ブタジエン、イソ プレン〕、ビュルアセテートモノマー等が挙げられる。柔軟性且つ光および熱劣化に 対しての安定性を得るためには、炭素数 1〜20のアルキル (メタ)アタリレートが好まし ぐ特に好ましくは炭素数 1〜8のアルキル (メタ)アタリレートである。  (I) Component includes alkyl (meth) acrylate having 1 to 20 carbon atoms (for example, butyl acrylate, n-butyl methacrylate, ethyl acrylate, n-octyl acrylate, and 2-ethyl). Hexyl (meth) acrylate], gen monomers [for example, butadiene, isoprene], butyl acetate monomers and the like. In order to obtain flexibility and stability against light and heat deterioration, an alkyl (meth) acrylate having 1 to 20 carbon atoms is preferable, and an alkyl (meth) acrylate having 1 to 8 carbon atoms is particularly preferable. It is.
[0049] (口)成分の単量体は、光硬化性榭脂への相溶性を与える。ゴム組成物中に占める  [0049] The monomer of the (mouth) component provides compatibility with the photocurable resin. Occupies in rubber composition
(口)成分の割合は、 0. 1〜70質量%が好ましぐ特に好ましくは 1〜60質量%であ る。(口)成分としては、メチルメタタリレート、ェチルメタタリレート、 t—ブチルメタクリレ ート、シクロへキシルメタタリレート、イソボル-ル (メタ)アタリレート、ジシクロペンタ- ル (メタ)アタリレート等の (メタ)アクリル酸エステル、(メタ)アクリロニトリル、または、ス チレン等のビュル芳香族化合物等が例示できる。相溶性と共重合性のバランスの面 から、メチルメタタリレート、スチレンが特に好ましい。  The proportion of the (mouth) component is preferably from 0.1 to 70% by mass, particularly preferably from 1 to 60% by mass. (Mouth) components include methyl methacrylate, ethyl methacrylate, t-butyl methacrylate, cyclohexyl methacrylate, isobornyl (meth) acrylate, dicyclopental (meth) acrylate. Examples thereof include (meth) acrylic acid esters such as (meth) acrylonitrile, and butyl aromatic compounds such as styrene. Methyl methacrylate and styrene are particularly preferable from the viewpoint of the balance between compatibility and copolymerization.
[0050] (ハ)成分の単量体は、光硬化性榭脂との架橋性、またはゴム組成物同士に架橋性 を与える。反応性基としては、非ラジカル重合性であることが好ましい。ラジカル重合 性であると、ゴム組成物のラジカル重合と同時に反応してしまうためである。非ラジカ ル重合性の反応基としては水酸基、カルボン酸基、グリシジル基、イソシァネート基、 アミノ基、及びアルコキシシリル基等が挙げられる。ゴム組成物中に占める(ハ)成分 の割合は、 1〜50質量%が好ましぐ特に好ましくは 5〜40質量%であることが好まし い。 [0050] The monomer of component (c) provides crosslinkability with the photocurable resin or crosslinkability between the rubber compositions. The reactive group is preferably non-radical polymerizable. Radical polymerization This is because, if it is characteristic, it reacts simultaneously with radical polymerization of the rubber composition. Examples of the non-radical polymerizable reactive group include a hydroxyl group, a carboxylic acid group, a glycidyl group, an isocyanate group, an amino group, and an alkoxysilyl group. The proportion of the component (c) in the rubber composition is preferably 1 to 50% by mass, particularly preferably 5 to 40% by mass.
(ハ)成分としては、 2—ヒドロキシェチル (メタ)アタリレート、 2—ヒドロキシプロピル( メタ)アタリレート、グリシジル (メタ)アタリレート、(メタ)アクリル酸、 2— (メタ)アタリロイ 口キシェチルコハク酸、 2—(メタ)アタリロイルォキシェチルイソシァネート、 1, 1—(ビ ート、ジメチルァミノ (メタ)アタリレート、 3- (メタ)アタリロイロキシプロピルトリメトキシシ ラン、 3- (メタ)アタリロイロキシプロピルトリエトキシシラン等が例示できる。光硬化性 榭脂との反応性において特に好ましくは、 2—ヒドロキシェチル (メタ)アタリレート、 2 —ヒドロキシプロピル (メタ)アタリレート等のヒドロキシアルキル (メタ)アタリレート、ダリ シジル (メタ)アタリレートである。  As the component (c), 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, glycidyl (meth) acrylate, (meth) acrylic acid, 2- (meth) ateloy loyal succinic succinic acid , 2— (Meth) Ataryllooxychetyl isocyanate, 1, 1— (Beat, Dimethylamino (meth) Athalylate, 3- (Meth) Atalylyloxypropyltrimethoxysilane, 3- (Metal ) Atalylyloxypropyltriethoxysilane, etc. Photo-curing properties Particularly preferred in terms of reactivity with the resin are hydroxy compounds such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate. Alkyl (meth) acrylate and daricidyl (meth) acrylate.
[0051] ゴム組成物の重合方法としては、ラジカル重合およびァ-オン重合等公知の方法 を用いることができる。 [0051] As a method for polymerizing the rubber composition, known methods such as radical polymerization and ion polymerization can be used.
[0052] ラジカル重合としては、塊状重合、懸濁重合、塊状-懸濁重合、溶液重合、乳化重 合、連続重合等、公知の方法を用いることができる。また、必要に応じてラジカル発 生剤を用いることができる。  [0052] As the radical polymerization, known methods such as bulk polymerization, suspension polymerization, bulk-suspension polymerization, solution polymerization, emulsion polymerization, and continuous polymerization can be used. Further, a radical generator can be used as necessary.
[0053] ラジカル重合で用いられる溶媒、重合温度等の重合条件は、特に限定されるもの ではない。重合は無溶媒または各種の溶剤中で行うことができる。無溶媒で重合する ことが重合速度が高ぐ生産性が向上するので好ま 、。  [0053] The polymerization conditions such as the solvent used in the radical polymerization and the polymerization temperature are not particularly limited. The polymerization can be carried out without solvent or in various solvents. Polymerization without solvent is preferred because the polymerization rate is high and productivity is improved.
[0054] 重合温度は 50〜500°Cの温度範囲とすることが、高い重合速度及び重合速度の 制御が容易な点力も好ましぐ特に好まし ヽ重合温度は 100〜400°Cである。  [0054] The polymerization temperature is preferably in the temperature range of 50 to 500 ° C, and a high polymerization rate and a point that allows easy control of the polymerization rate are also preferred. The polymerization temperature is 100 to 400 ° C.
[0055] ラジカル発生剤としては、種々の化合物を用いることができる力 好ましくは、重合 温度条件下で、ラジカルを発生しうるパーオキサイドが挙げられる。パーオキサイドと しては、限定はされないが、例えば、ベンゾィルパーオキサイド、ァセチルパーォキサ イド、イソブチロイルパーオキサイド、オタタノィルパーオキサイド、デカノィルバーオ キサイド、ラウロイルパーオキサイド、 3、 5、 5—トリメチルへキサノィルパーオキサイド 、 2, 4ージクロ口ベンゾィルパーオキサイド、 m—トルオイルパーオキサイド等のジァ シルバーオキサイド類;ジー t ブチルパーオキサイド、 t ブチルタミルパーォキサイ ド、ジークミルパーオキサイド、 α、 α , 一ビス(t—ブチルパーォキシイソプロピル)ベ ンゼン、 2、 5 ジメチルー 2、 5 ジ(t—ブチルパーォキシ)へキサン、 2、 5 ジメチ ルー 2、 5—ジ(t—ブチルパーォキシ)へキシン 3等のジアルキルパーオキサイド類 ; 2、 2—ビス(t ブチルパーォキシ)ブタン、 2、 2—ビス(t ブチルパーォキシ)オタ タン、 1、 1—ビス(t—ブチルパーォキシ)3、 3、 5 トリメチルシクロへキサン、 n—ブ チル 4、 4 ビス(t ブチルパーォキシ)ノ リレート等のパーォキシケタール類;ジ イソプロピルパーォキシジカーボネート、ジー 2—ェチルへキシルバーォキシジカ ーボネート、ジー n プロピルパーォキシジカーボネート、ジー 3—メトキシブチルバ ーォキシジカーボネート、ジー 2—ェトキシェチノレパーォキシジカーボネート、ジーメ トキシイソプロピルパーォキシジカーボネート、ジ(3—メチルー 3—メトキシブチル)パ ーォキシジカーボネート、ビス(4 tーブチルシクロへキシル)パーォキシジカーボネ ート等のパーォキシカーボネート類; t ブチルパーォキシアセテート、 tーブチルバ 一ォキシイソブチレート、 t ブチルパーォキシピパレート、 t ブチルパーォキシネ ォデカノエート、タミルパーォキシネオデカノエート、 t ブチルパーォキシ 2—ェチル へキサノエート、 t ブチルパーォキシ 3、 5、 5—トリメチルへキサノエート、 t ブチル パーォキシラウレート、 t ブチルパーォキシベンゾエート、ジー tーブチルジバーオ キシイソフタレート、 2、 5—ジメチルー 2、 5—ジ(ベンゾィルパーォキシ)へキサン、 t ブチルパーォキシイソプロピルカーボネート等のパーォキシエステル類;ァセチル アセトンパーオキサイド、メチルェチルケトンパーオキサイド、シクロへキサノンバーオ キサイド、 3、 3、 5—トリメチルシクロへキサノンパーオキサイド、メチルシクロへキサノ ンパーオキサイド等のケトンパーオキサイド類;タメンノヽイド口パーオキサイド、ジーィ ソプロピルベンゼンハイド口パーオキサイド、 p—メンタンハイド口パーオキサイド、 2、 5 一ジメチルへキサン 2、 5—ジハイド口パーオキサイド、 1、 1、 3、 3—テトラメチルブチ ルハイド口パーオキサイド等のハイド口パーオキサイド類; 2塩基酸のポリアシルバー オキサイド類; 2塩基酸とポリオールとのポリパーォキシエステル類が挙げられる。この 中では、ベンゾィルパーオキサイドが好ましく用いられる。 [0055] The radical generator may be a compound capable of using various compounds, preferably a peroxide capable of generating radicals under polymerization temperature conditions. Examples of peroxides include, but are not limited to, for example, benzoyl peroxide, acetylyl peroxide, isobutyroyl peroxide, otatanyl peroxide, decanol peroxide. Di-silver oxides such as oxides, lauroyl peroxide, 3, 5, 5-trimethylhexanoyl peroxide, 2,4-dichlorobenzoyl peroxide, m-toluoyl peroxide; Butyl Tamil Peroxide, Diecyl Peroxide, α, α, Monobis (t-butylperoxyisopropyl) benzene, 2, 5 Dimethyl-2, 5 Di (t-butylperoxy) hexane, 2, 5 Dimethyl 2, 2, 2-di (t-butylperoxy) hexyne 3 and other dialkyl peroxides; 2, 2-bis (t-butylperoxy) butane, 2, 2-bis (t-butylperoxy) otatan, 1, 1-bis ( (t-Butylperoxy) 3, 3, 5 Trimethylcyclohexane, n-Butyl 4, 4 Bis (t-butylperoxy) Peroxyketals such as citrate; diisopropyl peroxydicarbonate, di-2-ethylhexyloxydicarbonate, di-n-propylperoxydicarbonate, di-3-methoxybutyl dicarboxylate , Di-2-ethoxy shechinol peroxydicarbonate, dimethyoxyisopropyl peroxydicarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, bis (4 tert-butylcyclohexyl) peroxy Peroxycarbonates such as dicarbonate; t- butyl peroxyacetate, t-butyl peroxyisobutyrate, t-butyl peroxypiparate, t-butyl peroxyne decanoate, tamil peroxyneo Decanoate, t-butylperoxy 2-ethyl hexanoate, t Butylperoxy 3, 5, 5--trimethylhexanoate, t-butyl peroxylaurate, t-butyl peroxybenzoate, di-t-butyl diveroxyisophthalate, 2, 5-dimethyl-2, 5-di (benzoylperoxy) Peroxyesters such as hexane, t-butylperoxyisopropyl carbonate; acetyl acetone peroxide, methyl ethyl ketone peroxide, cyclohexanone peroxide, 3, 3, 5-trimethylcyclohexanone peroxide, methylcyclo Ketone peroxides such as hexanone peroxide; Tamennoxide mouth peroxide, G-propylene hydride mouth peroxide, p-menthane hydride mouth peroxide, 2, 5 1-dimethyl hexane 2, 5-Dihydride mouth peroxide Iodide, 1, 1, 3, 3-Hide mouth peroxides such as tetramethylbutyl hydride peroxide; Polybasic oxides of dibasic acids; Polyperoxyesters of dibasic acids and polyols . this Among them, benzoyl peroxide is preferably used.
[0056] また、パーオキサイドの代わりにラジカル発生性ァゾィ匕合物等もラジカル発生剤とし て用いることが出来る。ラジカル発生性ァゾィ匕合物としては、例えばァゾビスイソプチ 口-トリル等が挙げられる。  [0056] Further, a radical-generating azo compound or the like can be used as a radical generator instead of peroxide. Examples of the radical-generating azoi compound include azobisisobutyl-tolyl.
[0057] 分子量を調整する等の目的で、必要に応じて、溶媒、ラジカルキヤッビング剤、重 合加速剤、連鎖移動剤、反応停止剤等を併用することができる。  [0057] For the purpose of adjusting the molecular weight, a solvent, a radical cabbing agent, a polymerization accelerator, a chain transfer agent, a reaction terminator and the like can be used in combination as necessary.
[0058] ゴム糸且成物は分子内に少なくとも 1つの芳香族基を有するポリマー鎖を含有するこ とが、光硬化性榭脂との相溶性に優れ、且つ優れた振動疲労耐久性を与えるため好 ましい。芳香族基は、主鎖、側鎖、鎖末端のいずれであっても構わないが、特に鎖末 端が芳香族基であると相溶性に優れ、優れた振動疲労耐久性を与えるために好まし い。分子内に少なくとも 1つの芳香族基を有するポリマー鎖のゴム組成物中に占める 割合は、 1質量%以上が好ましぐ特に好ましくは 10質量%以上、更に好ましくは 50 質量%以上である。 1質量%以上であれば、光硬化性榭脂との相溶性を損なわずに 振動疲労耐久性を与えることができる。なお、上記ポリマー鎖のゴム組成物中に占め る割合は好ましくは 99. 99質量%以下、特に好ましくは 99. 9質量%以下である。  [0058] The rubber thread composition contains a polymer chain having at least one aromatic group in the molecule, and is excellent in compatibility with the photocurable resin and provides excellent vibration fatigue durability. Therefore, it is preferable. The aromatic group may be any of a main chain, a side chain, and a chain end. In particular, when the chain end is an aromatic group, the aromatic group is excellent in compatibility and excellent in vibration fatigue durability. Good. The proportion of the polymer chain having at least one aromatic group in the molecule in the rubber composition is preferably 1% by mass or more, particularly preferably 10% by mass or more, and further preferably 50% by mass or more. If it is 1% by mass or more, vibration fatigue durability can be imparted without impairing the compatibility with the photocurable resin. The proportion of the polymer chain in the rubber composition is preferably 99.99% by mass or less, particularly preferably 99.9% by mass or less.
[0059] 芳香族基を分子内に導入する手段としては、(1)スチレン等の芳香族基を有するラ ジカル重合性単量体の使用により導入する方法、 (2)ベンゾィルパーオキサイド等の 芳香族基を有するラジカル発生剤の使用により導入する方法、(3)トルエン、キシレ ン等の芳香族溶媒の使用により導入する方法、(4)ベンゼンチオール、チォフエノー ル等の芳香族チオール等の芳香族基を有する連鎖移動剤の使用により導入する方 法、等が例示できる。  [0059] Means for introducing an aromatic group into the molecule include (1) a method of introducing by using a radically polymerizable monomer having an aromatic group such as styrene, and (2) a benzoyl peroxide or the like. A method of introducing by using a radical generator having an aromatic group, (3) a method of introducing by using an aromatic solvent such as toluene and xylene, and (4) aroma such as aromatic thiol such as benzenethiol and thiophenol. Examples thereof include a method of introduction by use of a chain transfer agent having a group.
[0060] ゴム組成物の Tgは、光硬化性榭脂に優れた振動疲労耐久性を与えるために、 25 °C未満であることが好ましい。より好ましくは 0°C未満であり、更により好ましくは 20 °C未満である。  [0060] The Tg of the rubber composition is preferably less than 25 ° C in order to give excellent vibration fatigue durability to the photocurable resin. More preferably, it is less than 0 ° C, and still more preferably less than 20 ° C.
[0061] ゴム組成物の 25°Cでの粘度は、 100〜100, OOOmPa' sの範囲であることが好ま しい。 lOOmPa' s以上で、充分な振動疲労耐久性を与えることができ、 100, OOOm Pa' s以下で光硬化性榭脂との相溶性が得られ、さらに光硬化性榭脂自体が増粘す ることがなく、好ましい。尚、粘度の測定方法に特に制限はないが、 B型粘度計、 E型 粘度計、レオメーター等の公知の粘度計を用いて測定できる。 [0061] The viscosity of the rubber composition at 25 ° C is preferably in the range of 100 to 100, OOOmPa's. Above lOOmPa 's, sufficient vibration fatigue durability can be given, and at 100, OOOm Pa's or less, compatibility with photocurable resin is obtained, and the photocurable resin itself thickens. This is preferable. The viscosity measurement method is not particularly limited, but B type viscometer, E type It can be measured using a known viscometer such as a viscometer or a rheometer.
[0062] 光硬化性榭脂組成物中におけるゴム組成物の占める割合は 0. 01〜70質量%が 好ましぐより好ましくは 0. 05〜50質量%が好ましぐ特に好ましくは 0. 1〜30質量 %である。 0. 01質量%より少ないと充分な振動疲労耐久性が得られず、 70質量% より多いと、得られる光硬化性榭脂が柔軟すぎ、さら〖こ、硬化性が低下するためであ る。  [0062] The proportion of the rubber composition in the photocurable resin composition is preferably 0.01 to 70% by mass, more preferably 0.05 to 50% by mass, and particularly preferably 0.1. -30 mass%. When the amount is less than 01% by mass, sufficient vibration fatigue durability cannot be obtained. When the amount is more than 70% by mass, the resulting photocurable resin is too soft, and the curable resin and curability are lowered. .
[0063] さらに、本発明のゴム組成物を含む光硬化性榭脂組成物の硬化体は、 JIS K711 3 (プラスチックの引張試験方法)に準拠して引張試験測定を実施したとき、引張弾性 率が l〜30MPaであり、し力も引張破壊伸びが 200%以上である優れた振動疲労耐 久性を示すことを特徴とする。硬化体の引張弾性率が IMPa以上であれば、得られ る硬化体が柔らかすぎて形状を保持できないという問題を生じることもない。また、硬 化体の弓 I張弾性率が 30MPa以下で、しかも引張破壊伸びが 200%以上であれば、 優れた振動疲労耐久性が得られ、発明の効果が確実に得ることができる。  [0063] Furthermore, the cured product of the photocurable resin composition containing the rubber composition of the present invention has a tensile modulus when subjected to a tensile test measurement in accordance with JIS K7113 (plastic tensile test method). It is characterized by exhibiting excellent vibration fatigue durability with a tensile fracture elongation of 200% or more. If the tensile modulus of the cured product is IMPa or more, there will be no problem that the resulting cured product is too soft to maintain its shape. Moreover, if the cured body has a bow I tension elastic modulus of 30 MPa or less and a tensile elongation at break of 200% or more, excellent vibration fatigue durability can be obtained, and the effects of the invention can be reliably obtained.
[0064] 本発明に於いては、必要に応じて、本発明の効果を阻害しない範囲において、顔 料(チタン白、シァニンブルー、ウォッチングレッド、ベンガラ、カーボンブラック、了二 リンブラック、マンガンブルー、鉄黒、ウルトラマリンブルー、ハンザレッド、クロームィ エロー、クロームグリーン等)、無機充填剤 (炭酸カルシウム、カオリン、クレー、タルク 、マイ力、硫酸バリウム、リトボン、石コゥ、ステアリン酸亜鉛、パーライト、石英、石英ガ ラス、溶融シリカ、球状シリカ等のシリカ粉等、球状アルミナ、破砕アルミナ、酸化マグ ネシゥム、酸ィ匕ベリリウム、酸化チタン等の酸化物類、窒化ホウ素、窒化ケィ素、窒化 アルミニウム等の窒化物類、炭化ケィ素等の炭化物類、水酸ィ匕アルミニウム、水酸ィ匕 マグネシウム等の水酸ィ匕物類、銅、銀、鉄、アルミニウム、ニッケル、チタン等の金属 類や合金類、ダイヤモンド、カーボン等の炭素系材料等)、熱可塑性榭脂および熱 硬化性榭脂(高密度、中密度、低密度の各種ポリエチレン、ポリプロピレン、ポリブテ ン、ポリペンテン等の単独重合体、エチレン プロピレン共重合体、ナイロン 6、ナ イロンー 6, 6等のポリアミド系榭脂、塩ィ匕ビュル系榭脂、ニトロセルロース系榭脂、塩 化ビ -リデン系榭脂、アクリル系榭脂、アクリルアミド系榭脂、スチレン系榭脂、ビニル エステル系榭脂、ポリエステル系榭脂、シリコーン系榭脂、フッ素系榭脂、アクリルゴ ム、ウレタンゴムなどの各種エラストマー榭脂、メタクリル酸メチルーブタジエンースチ レン系グラフト共重合体やアクリロニトリル ブタジエン スチレン系グラフト共重合体 などのグラフト共重合体等)、補強剤 (ガラス繊維、炭素繊維等)、垂れ止め剤 (水添ヒ マシ油、微粒子無水硅酸等)、艷消し剤 (微粉シリカ、パラフィンワックス等)、研削剤( ステアリン酸亜鉛等)、内部離型剤 (ステアリン酸等の脂肪酸、ステアリン酸カルシウム の脂肪酸金属塩、ステアリン酸アマイド等の脂肪酸アミド、脂肪酸エステル、ポリオレ フィンワックス、ノ《ラフィンワックス等)を配合することも可能である。 [0064] In the present invention, if necessary, a pigment (titanium white, cyanine blue, watching red, bengara, carbon black, Ryoji phosphorus black, manganese blue, iron is used as long as the effect of the present invention is not impaired. Black, ultramarine blue, hansa red, chrome yellow, chrome green, etc.), inorganic fillers (calcium carbonate, kaolin, clay, talc, my strength, barium sulfate, lithobon, stone KO, zinc stearate, perlite, quartz, quartz Silica powder such as glass, fused silica, spherical silica, etc., spherical alumina, crushed alumina, oxides such as magnesium oxide, beryllium oxide, titanium oxide, nitrides such as boron nitride, silicon nitride, aluminum nitride , Carbides such as silicon carbide, hydroxide 匕 aluminum, hydroxide マ グ ネ シ ウ ム magnesium, etc. Hydroxides, metals such as copper, silver, iron, aluminum, nickel, titanium and alloys, carbon-based materials such as diamond and carbon), thermoplastic resins and thermosetting resins (high density) , Medium and low density polyethylene, polypropylene, polybutene, polypentene and other homopolymers, ethylene propylene copolymer, nylon 6, nylon-6, 6, etc. , Nitrocellulose resin, vinylidene chloride resin, acrylic resin, acrylamide resin, styrene resin, vinyl ester resin, polyester resin, silicone resin, fluorine resin Fat, acrylic go Various types of elastomers such as rubber and urethane rubber, graft copolymers such as methyl methacrylate-butadiene styrene graft copolymers and acrylonitrile butadiene styrene graft copolymers), reinforcing agents (glass fibers, carbon fibers) ), Anti-sagging agents (hydrogenated castor oil, fine particulate succinic anhydride, etc.), matting agents (fine powder silica, paraffin wax, etc.), abrasives (such as zinc stearate), internal mold release agents (stearic acid, etc.) Fatty acid, fatty acid metal salts of calcium stearate, fatty acid amides such as stearic acid amide, fatty acid esters, polyolefin wax, and raffin wax may be added.
[0065] 本発明にお 、て、 (A)〜(D)成分の合計量、又は (A)〜 (E)成分の合計量を 100 質量%とするときに、顔料の配合量は、 0. 0001〜50質量%、無機充填剤の配合量 は 0. 0001〜50質量0 /0、レべリング剤の配合量は 0. 0001〜5質量0 /0、熱可塑性榭 脂および熱硬化性榭脂の配合量は 0. 01〜30質量%、垂れ止め剤の配合量は 0. 0 1〜5質量%、艷消し剤の配合量は 0. 001〜10質量%、研削剤の配合量は 0. 01 〜5質量%、内部離型剤の配合量は 0. 001〜20質量%の範囲より適宜選択される [0065] In the present invention, when the total amount of the components (A) to (D) or the total amount of the components (A) to (E) is 100% by mass, the blending amount of the pigment is 0. . 0001-50 mass%, the amount of the inorganic filler is 0.0001 to 50 mass 0/0, the amount of leveling agent is 0.0001 to 5 mass 0/0, thermoplastic榭butter and thermosetting The blending amount of greaves is 0.01-30% by weight, the blending amount of anti-sagging agent is 0.01-5% by weight, the blending amount of defrosting agent is 0.001-10% by weight, the blending amount of abrasive Is appropriately selected from the range of 0.01 to 5% by mass, and the amount of the internal mold release agent is 0.001 to 20% by mass.
[0066] また、上記の成分以外にも、消泡剤、難燃剤、帯電防止剤、可塑剤、熱重合開始 剤、シランカップリング剤、密着性付与剤等を併用することも可能である。 [0066] In addition to the above-described components, an antifoaming agent, a flame retardant, an antistatic agent, a plasticizer, a thermal polymerization initiator, a silane coupling agent, an adhesion imparting agent, and the like can be used in combination.
[0067] 以上の様にして得られる本発明の光硬化性榭脂組成物に、光照射をすることにより 、瞬時に硬化し、振動疲労耐久性に優れた硬化体を得ることができる。  [0067] By irradiating the photocurable resin composition of the present invention obtained as described above with light, a cured product excellent in vibration fatigue durability can be obtained.
[0068] また、本発明の光硬化性榭脂組成物の成形体を成形する場合、その手段は種々 の方法を採用することができる。特に好ましくは、(1)上型、下型よりなる一組の成形型 の少なくとも ヽずれか一方を光が透過する材料にて形成し、硬化前の該光硬化性榭 脂組成物を所定量滴下する。次に上型と下型を圧着して、型閉じし、光を透過する 材料からなる型の外側から光を照射し、榭脂を硬化させて目的の硬化体を得る方法 、(2)上型、下型よりなる一組の成形型の少なくともいずれか一方を光が透過する材料 にて形成し、次に上型と下型を圧着して、型閉じし、次に型に予め形成しておいた注 入口より、硬化前の該光硬化性榭脂組成物を所定量注入する。そして、光を透過す る材料からなる型の外側から光を照射し、榭脂を硬化させて目的の硬化体を得る方 法、である。 [0069] 光を透過する型に用いられる材料としては、例えば石英、石英ガラス、硼珪酸ガラ ス、ソーダガラス等のガラス材料、アクリル榭脂、ポリカーボネート榭脂、ポリスチレン 榭脂、ポリエステル榭脂、ポリエチレン榭脂、ポリプロピレン榭脂、フッ素榭脂、セル口 ース榭脂、スチレン ブタジエン共重合体、メタクリル酸メチルースチレン共重合体等 の榭脂材料が例示できるが、これらに限定されない。特に好ましくは、ポリメタクリル酸 メチル等のアクリル榭脂である。 [0068] In addition, when the molded article of the photocurable resin composition of the present invention is molded, various means can be adopted as the means. Particularly preferably, (1) at least one of a pair of molds composed of an upper mold and a lower mold is formed of a material that transmits light, and a predetermined amount of the photocurable resin composition before curing is formed. Dripping. Next, the upper mold and the lower mold are pressure-bonded, the mold is closed, light is irradiated from the outside of the mold made of a material that transmits light, and the resin is cured to obtain the desired cured body. (2) At least one of a pair of molds consisting of a mold and a lower mold is formed of a material that transmits light, and then the upper mold and the lower mold are crimped, the mold is closed, and then the mold is formed in advance. A predetermined amount of the photocurable resin composition before curing is injected from the inlet. Then, light is irradiated from the outside of the mold made of a material that transmits light, and the resin is cured to obtain a desired cured body. [0069] Examples of materials used for the mold that transmits light include glass materials such as quartz, quartz glass, borosilicate glass, and soda glass, acrylic resin, polycarbonate resin, polystyrene resin, polyester resin, and polyethylene. Examples of the resin material include, but are not limited to, a resin, a polypropylene resin, a fluorine resin, a cellose resin, a styrene-butadiene copolymer, and a methyl methacrylate-styrene copolymer. Particularly preferred is an acrylic resin such as polymethyl methacrylate.
[0070] 光源としてはハロゲンランプ、メタルハライドランプ、ハイパワーメタルハライドランプ  [0070] Halogen lamp, metal halide lamp, high power metal halide lamp as light source
(インジウム等を含有する)、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、 キセノンランプ、キセノンエキシマランプ、キセノンフラッシュランプ等が挙げられるが 特に限定されない。  (Including indium), low-pressure mercury lamp, high-pressure mercury lamp, ultra-high-pressure mercury lamp, xenon lamp, xenon excimer lamp, xenon flash lamp, and the like.
[0071] 各々放射波長、エネルギー分布が異なるため、上記光源は光重合開始剤の反応 波長などにより選択される。また、自然光 (太陽光)も反応開始光源になり得る。  [0071] Since the emission wavelength and energy distribution are different from each other, the light source is selected depending on the reaction wavelength of the photopolymerization initiator. Natural light (sunlight) can also be a reaction initiation light source.
[0072] 上記光源は、直接照射、反射鏡等により集光照射、ファイバ一等による集光照射を することができ、低波長カットフィルター、熱線カットフィルター、コールドミラー等も用 いることちでさる。  [0072] The above-mentioned light source can be directly irradiated, focused with a reflecting mirror, or focused with a fiber, etc., and can be a low wavelength cut filter, a heat ray cut filter, a cold mirror, etc. .
[0073] また、上記の成形方法により本発明の光硬化性榭脂組成物を成形する場合、榭脂 組成物の硬化収縮率は 10%以下であることが好ましい。 10%を越えると、硬化収縮 により、型精度と硬化物に差が生じるため目的形状の硬化体が得られ難いためであ る。  [0073] When the photocurable resin composition of the present invention is molded by the above molding method, the curing shrinkage of the resin composition is preferably 10% or less. If it exceeds 10%, curing shrinkage causes a difference in mold accuracy and the cured product, making it difficult to obtain a cured product of the desired shape.
[0074] また、光硬化性榭脂組成物の粘度は、 25°Cで 100〜100, OOOmPa- s,特に好ま しくは、 3, 000〜90, OOOmPa' sであること力 子まし!/ヽ。 lOOmPa' s未満であると、 液漏れ等を起こし目的の形状の成型体が得られないことがある。 100, OOOmPa' sを 越えると、充填しにくぐまた、型を押し上げてしまう等、 目的の形状の硬化体が得ら れなくなることがあるためである。  [0074] Further, the viscosity of the photocurable resin composition is 100 to 100, OOOmPa-s, particularly preferably 3,000 to 90, OOOmPa's at 25 ° C.ヽ. If it is less than lOOmPa's, liquid leakage may occur and a molded product with the desired shape may not be obtained. If it exceeds 100, OOOmPa's, it may be difficult to fill, and the mold may be pushed up, resulting in failure to obtain a cured product of the desired shape.
実施例  Example
[0075] 以下に実施例および比較例を用いて本発明をより詳細に説明するが、本発明はこ れらの実施例により限定されるものではない。尚、実施例および比較例において示 すデータは、下記方法に従って測定した。 [0076] 組成物の分子量および分子量分布は、 GPC法により、標準ポリスチレンで検量線 を作成することで、次の条件で測定した。 [0075] Hereinafter, the present invention will be described in more detail using examples and comparative examples, but the present invention is not limited to these examples. The data shown in the examples and comparative examples were measured according to the following method. [0076] The molecular weight and molecular weight distribution of the composition were measured under the following conditions by preparing a calibration curve with standard polystyrene by the GPC method.
溶媒 (移動相): THF、  Solvent (mobile phase): THF,
脱気装置: ERM A社製 ERC - 3310,  Deaerator: ERC A 3310, manufactured by ERM A
ポンプ:日本分光社製 PU— 980、  Pump: JASCO PU-980,
サンプル注入量: 100 1(試料液濃度 lmg/ml)、  Sample injection volume: 100 1 (sample solution concentration lmg / ml),
流速: 1.0ml, mm、  Flow rate: 1.0ml, mm,
送液圧力: 39kg/cm2Fluid pressure: 39kg / cm 2
オートサンプラ:東ソ一社製 AS— 8020、  Autosampler: AS-8020 manufactured by Tosoh Corporation
カラムオーブン:日立製作所社製 L— 5030、  Column oven: Hitachi L-5030
設定温度: 40°C、  Set temperature: 40 ° C,
カラム構成:東ソ一社製 TSKguardcolumnMP ( X L) 6. 0mmID X 4. 0cm 1本、 および東ソ一社製 TSK— GEL MULTIPORE HXL— M 7. 8mmID X 30. 0c m2本、計 3本、  Column configuration: Tosoh TSKguardcolumnMP (XL) 6.0mmID X 4.0cm 1 and Tosoh TSK—GEL MULTIPORE HXL—M 7.8mmID X 30.0cm m2, 3 in total
検出器: RI 日立製作所社製 L— 3350、  Detector: RI Hitachi L 3350,
データ処理: SIC480データステーション。  Data processing: SIC480 data station.
[0077] 組成物の核磁気共鳴スペクトル(以下、 ¾— NMRと 、う)は、次の条件で測定した 測定装置: JOEL社製 ECP— 300 (300MHz)、 [0077] The nuclear magnetic resonance spectrum (hereinafter referred to as ¾-NMR) of the composition was measured under the following conditions: Measuring device: ECP-300 (300 MHz) manufactured by JOEL
溶媒:重水素クロ口ホルム、  Solvent: Deuterium black form,
試料濃度: 0. 48質量%、  Sample concentration: 0.48% by mass,
積算回数: 25, 000回。  Integration count: 25,000 times.
[0078] 組成物の粘度の測定は、次の条件で測定した。 [0078] The viscosity of the composition was measured under the following conditions.
粘度計: E型粘度計 (コーンプレート型)、  Viscometer: E-type viscometer (cone plate type),
測定温度: 25°C。  Measurement temperature: 25 ° C.
[0079] 〈ゴム組成物の重合例 1〜5〉 <Rubber composition polymerization examples 1 to 5>
〈ゴム組成物の重合例 1〉  <Example of polymerization of rubber composition 1>
1Lステンレス製オートクレーブを窒素置換した後、 n—ブチルアタリレート(以下、 n BAと!ヽう): 270g、メチノレメタクジレー卜(以下、 MMAと!ヽう): 270g、グジシジノレメタク リレート(以下、 GMAという):60g、過酸化ベンゾィル(以下、 BPOという): 13. 9gを 窒素ガス雰囲気下において仕込み、密封して、オイルバスを用いてバス温度を 130 °Cまで加熱し、 200°Cで約 60分間重合した。その後室温まで急冷して重合反応を停 止させた。残留揮発分を 240°C、 2時間真空下で乾燥することにより、固形分を得た 。これをゴム組成物 (E—1)とした。収率は 92%であり、 GPC測定による数平均分子 量 Mnは 1, 170、重量平均分子量 Mwは 2, 350であり、分子量分布 Mw/Mnは 2. 01で、 25°C粘度が 5, OOOmPa' sであった。また、得られたゴム組成物(E— 1)の構 成成分の含有割合は1 H— NMR ^ベクトルの積分強度比力 算出した結果、 nBA: 44. 7質量%、MMA:45. 4質量%、 GMA: 9. 9質量%であることが判った。 After replacing the 1L stainless steel autoclave with nitrogen, n-butyl acrylate (hereinafter n BA and!): 270g, methinoremethacrylate (hereinafter referred to as MMA): 270g, gucidinoremethacrylate (hereinafter referred to as GMA): 60g, benzoyl peroxide (hereinafter referred to as BPO) ): 13.9 g was charged in a nitrogen gas atmosphere, sealed, heated in an oil bath to 130 ° C, and polymerized at 200 ° C for about 60 minutes. Thereafter, the polymerization reaction was stopped by rapidly cooling to room temperature. The residual volatile matter was dried under vacuum at 240 ° C. for 2 hours to obtain a solid content. This was designated as a rubber composition (E-1). The yield is 92%, the number average molecular weight Mn by GPC measurement is 1,170, the weight average molecular weight Mw is 2,350, the molecular weight distribution Mw / Mn is 2.01, and the viscosity at 25 ° C is 5,5. It was OOOmPa's. In addition, the content ratio of the constituent components of the obtained rubber composition (E-1) was calculated as an integral strength specific force of 1 H-NMR ^ vector. As a result, nBA: 44.7 mass%, MMA: 45.4 mass %, GMA: 9.9% by mass.
[0080] 〈ゴム組成物の重合例 2〉  <Rubber composition polymerization example 2>
重合例 1の仕込みにおいて、 nBA:420g、 MMA: 18g、 GMA: 162g、 BPO : 6. 95gとした以外は、重合例 1と同様にして、ゴム組成物 (E— 2)を得た。収率は 95% であり、 GPC測定による数平均分子量 Mnは 2, 000、重量平均分子量 Mwは 4, 71 0であり、分子量分布 MwZMnは 2. 36で、 25°C粘度が 9, 500mPa' sであった。得 られたゴム組成物 (E— 2)の構成成分の含有割合は、 ^—NMR ^ベクトルの結果、 nBA: 68. 6質量0 /0、MMA: 3. 1質量0 /0、GMA: 28. 3質量%であることが判った。 A rubber composition (E-2) was obtained in the same manner as in Polymerization Example 1, except that nBA was 420 g, MMA was 18 g, GMA was 162 g, and BPO was 6.95 g. Yield is 95%, number average molecular weight Mn by GPC measurement is 2,000, weight average molecular weight Mw is 4,710, molecular weight distribution MwZMn is 2.36, viscosity at 25 ° C is 9,500 mPa ' s. Of the component ratio of the resulting rubber composition (E- 2) is, ^ -NMR ^ resulting vector, nBA: 68. 6 wt 0/0, MMA: 3. 1 mass 0/0, GMA: 28 It was found to be 3% by mass.
[0081] 〈ゴム組成物の重合例 3〉  <Rubber composition polymerization example 3>
重合例 1の仕込みにおいて、 nBA:480g、スチレン: 90g、 GMA: 30g、 BPO : 3. 475gとした以外は、重合例 1と同様にして、ゴム組成物 (E— 3)を得た。収率は 96% であり、 GPC測定による数平均分子量 Mnは 4, 500、重量平均分子量 Mwは 9, 90 0であり、分子量分布 MwZMnは 2. 20で、 25°C粘度が 5, 900mPa' sであった。得 られたゴム組成物 (E— 3)の構成成分の含有割合は、 iH—NMR ^ベクトルの結果、 nBA: 78. 4質量0 /0、スチレン: 16. 1質量0 /0、GMA: 5. 5質量0 /0であることが判った A rubber composition (E-3) was obtained in the same manner as in Polymerization Example 1, except that the amount of nBA was 480 g, styrene: 90 g, GMA: 30 g, and BPO: 3.475 g in the preparation of Polymerization Example 1. Yield is 96%, number average molecular weight Mn by GPC measurement is 4,500, weight average molecular weight Mw is 9,900, molecular weight distribution MwZMn is 2.20, viscosity at 25 ° C is 5,900 mPa ' s. The resulting of the component ratio of the rubber composition (E- 3) is, iH-NMR ^ vectors result, nBA: 78. 4 wt 0/0, styrene: 16.1 mass 0/0, GMA: 5 . it was found that 5 mass 0/0
[0082] 〈ゴム組成物の重合例 4〉 <Rubber composition polymerization example 4>
重合例 1の仕込みにおいて、 nBA: 228g、 MMA: 240g、スチレン: 90g、 2—ヒド ロキシェチルアタリレート(以下、 2—HEAという): 12g、 BPO : 13. 9gとした以外は、 重合例 1と同様にして、ゴム組成物 (E— 4)を得た。収率は 92%であり、 GPC測定に よる数平均分子量 Mnは 780、重量平均分子量 Mwは 1, 680であり、分子量分布 M wZMnは 2. 15、 25°C粘度が 1, 200mPa' sであった。得られたゴム組成物(E—4) の構成成分の含有割合は、 NMR ^ベクトルの結果、 ηΒΑ: 37. 3質量0 /0、 MM A: 38. 9質量0 /0、スチレン: 19. 5質量0 /0、 2— HEA:4. 3質量0 /0であることが判った In the preparation of Polymerization Example 1, except that nBA: 228 g, MMA: 240 g, styrene: 90 g, 2-hydroxyxetyl acrylate (hereinafter referred to as 2-HEA): 12 g, BPO: 13.9 g In the same manner as in Polymerization Example 1, a rubber composition (E-4) was obtained. The yield is 92%, the number average molecular weight Mn by GPC measurement is 780, the weight average molecular weight Mw is 1,680, the molecular weight distribution MwZMn is 2.15, and the viscosity at 25 ° C is 1,200 mPa's. there were. The resulting of the component ratio of the rubber composition (E-4) is, NMR ^ vector result, ηΒΑ: 37. 3 mass 0/0, MM A: 38. 9 mass 0/0, styrene: 19. 5 mass 0/0, 2-HEA: was found to be 4 3 mass 0/0.
[0083] 〈ゴム組成物の重合例 5〉 <Rubber composition polymerization example 5>
重合例 1の仕込みにおいて、 2—ェチルへキシルアタリレート(以下、 2—EHAという) In the preparation of polymerization example 1, 2-ethylhexyl acrylate (hereinafter referred to as 2-EHA)
: 300g、 MMA: 30g、 GMA: 270g、 BPO : l. 39gとした以外は、重合例 1と同様に して、ゴム組成物 (E— 5)を得た。収率は 98%であり、 GPC測定による数平均分子量: A rubber composition (E-5) was obtained in the same manner as in Polymerization Example 1 except that 300 g, MMA: 30 g, GMA: 270 g, and BPO: l. 39 g were used. Yield is 98%, number average molecular weight by GPC measurement
Mnは 10, 000、重量平均分子量 Mwは 19, 600であり、分子量分布 MwZMnは 1Mn is 10,000, weight average molecular weight Mw is 19,600, molecular weight distribution MwZMn is 1
. 96、 25°C粘度が 95, OOOmPa' sであった。得られたゴム組成物(E— 5)の構成成 分の含有割合は、 H— NMRスペクトルの結果、 2— EHA:49. 8質量0 /0、 MMA: 5The viscosity at 96, 25 ° C was 95, OOOmPa's. The resulting content structure Ingredients of the rubber composition (E- 5) is, H- NMR results of the spectrum, 2- EHA:. 49 8 Mass 0/0, MMA: 5
. 1質量0 /0、GMA:45. 1質量%であることが判った。 . 1 Mass 0/0, GMA:. 45 was found to be 1% by mass.
[0084] 〈実施例 1〜17、および比較例 1〜7〉 <Examples 1 to 17 and Comparative Examples 1 to 7>
次いで、表 1 1、表 1 2、表 1 3に示す種類の各成分を表中に示す組成 (重量 Next, the composition (weight) of each component of the types shown in Table 11, 1, 12 and 13 is shown in the table.
%)で混合して光硬化性榭脂組成物を調製した。 %) To prepare a photocurable resin composition.
尚、実施例および比較例に記載の配合組成物中の各成分には以下の化合物を選 択した。  In addition, the following compounds were selected for each component in the blend compositions described in Examples and Comparative Examples.
[0085] (A)成分として、 [0085] As the component (A),
(A- 1)ポリエステルポリオール系ウレタンアタリレート  (A-1) Polyester polyol urethane acrylate
(日本合成化学工業社製 商品名 UV— 3000B)  (Product name: UV-3000B, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)
(GPCによるポリスチレン換算の重量平均分子量 18000)  (GPC polystyrene equivalent weight average molecular weight 18000)
(A— 2)ポリエーテルポリオール系ウレタンアタリレート  (A-2) Polyether polyol urethane acrylate
(日本合成化学工業社製 商品名 UV— 3700B)  (Product name: UV-3700B, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)
(GPCによるポリスチレン換算の重量平均分子量 37000)  (GPC polystyrene equivalent weight average molecular weight 37000)
(A— 3)ポリエステルポリオール系ウレタンアタリレート  (A-3) Polyester polyol urethane acrylate
(根上工業社製 商品名 KHP— 11) (GPCによるポリスチレン換算の重量平均分子量 25000) (Negami Kogyo brand name KHP-11) (GPC polystyrene equivalent weight average molecular weight 25000)
(A-4)ポリエステルポリオール系ウレタンアタリレート  (A-4) Polyester polyol urethane acrylate
(根上工業社製 商品名 SD— 7)  (Product name SD—7, manufactured by Negami Kogyo Co., Ltd.)
(GPCによるポリスチレン換算の重量平均分子量 3500)  (GPC polystyrene equivalent weight average molecular weight 3500)
(A- 5) n—ブチルメタタリレート(共栄社ィ匕学社製 ライトエステル NB)  (A-5) n-Butylmetatalylate (Kyoeisha Co., Ltd. Light Ester NB)
(A-6) 2 ヒドロキシェチルメタタリレート(共栄社ィ匕学社製 ライトエステル HO) (A-6) 2-Hydroxyethyl metatalylate (Kyoeisha Co., Ltd., Light Ester HO)
(A- 7)イソブチルメタタリレート(共栄社ィ匕学社製 ライトエステル IB) (A-7) Isobutyl metatalylate (Light Ester IB, manufactured by Kyoeisha Co., Ltd.)
(A— 8) tert—ブチルメタタリレート(共栄社ィ匕学社製 ライトエステル TB)  (A— 8) tert-Butyl metatalylate (Kyoeisha Co., Ltd., Light Ester TB)
(A- 9)シクロへキシルメタタリレート(共栄社ィ匕学社製 ライトエステル CH)  (A-9) Cyclohexylmetatalylate (Light Ester CH manufactured by Kyoeisha Co., Ltd.)
(A- 10)イソボル-ルメタタリレート(共栄社ィ匕学社製 ライトエステル IB— X) (A-10) Isobornyl metatalylate (Kyoeisha Co., Ltd., Light Ester IB—X)
(A— 11)ジシクロペンタ-ルメタタリレート(日立化成工業社製 ファンクリル FA— 51(A—11) Dicyclopenta-methyl methacrylate (Hitakuri FA Co., Ltd.
3M) 3M)
(A— 12) 1, 9 ノナンジォールジメタタリレート(共栄社ィ匕学社製 ライトエステル 1, 9ND)  (A— 12) 1, 9 Nonane Dimethatalylate (Light Ester 1, 9ND manufactured by Kyoeisha Co., Ltd.)
(A— 13)ポリエチレングリコールジメタタリレート(エチレンオキサイドの繰り返し数 = 9 ) (共栄社ィ匕学社製 ライトエステル 9EG)  (A—13) Polyethylene glycol dimetatalylate (repeated number of ethylene oxide = 9) (Light Ester 9EG manufactured by Kyoeisha Co., Ltd.
(B)成分の光重合開始剤として、  As a photopolymerization initiator of component (B),
ビス(2, 4, 6 トリメチルベンゾィル)一フエ-ルホスフィンオキサイド(チノく'スぺシャ ルティ一'ケミカルズ社製 IRGACURE819)  Bis (2, 4, 6 trimethylbenzoyl) monophenylphosphine oxide (Chinoku 'Special 1' IRGACURE819)
(C)成分の酸化防止剤として、  As an antioxidant for component (C),
ォクタデシルー 3— (3, 5—ジ tert—ブチルー 4ーヒドロキシフエ-ル)プロビオネ ート(チノく'スペシャルティ一'ケミカルズ社製 IRGANOX1076)  Octadecyl 3-(3,5-Di-tert-butyl 4-hydroxyphenol) Probione (Chinoku 'Specialty I' Chemicals IRGANOX 1076)
(D)成分の光安定剤として  As a light stabilizer for component (D)
ビス(2, 2, 6, 6—テトラメチルー 4ーピペリジル)セバケート(三共ライフテック社製 サノーノレ LS— 770)  Bis (2, 2, 6, 6-tetramethyl-4-piperidyl) sebacate (Sannore LS-770, manufactured by Sankyo Lifetech Co., Ltd.)
[0086] 各種物性は、次のように測定した。 [0086] Various physical properties were measured as follows.
[0087] 〔硬化体試験片の調製〕 [Preparation of Cured Body Test Piece]
目的の試験片形状を象った、上型、下型よりなる一組のアクリル榭脂製の成形型を 用い、硬化前の光硬化性榭脂糸且成物をセットした下型に必要量滴下した。次に上型 を下型に被せて、圧着、型閉じし、型の外側から光を照射し、榭脂を硬化させて目的 の硬化体試験片を得た。 A set of molds made of acrylic resin made of an upper mold and a lower mold, in the shape of the desired specimen The required amount was dropped onto the lower mold on which the photocurable rosin yarn and the composition before curing were set. Next, the upper mold was put on the lower mold, and the mold was crimped and closed, irradiated with light from the outside of the mold, and the resin was cured to obtain a desired cured specimen.
[0088] 〔光照射条件〕  [0088] [Light irradiation conditions]
光照射に際しては、無電極放電ランプ (Dバルブ)を搭載したフュージョン社製硬化 装置を用い、光硬化性榭脂への積算照射量が 4000mjZcm2 (365nm)となる条件 にて硬化させた。 For light irradiation, a curing device manufactured by Fusion Co., Ltd. equipped with an electrodeless discharge lamp (D bulb) was used, and the photocurable resin was cured under the condition that the integrated irradiation amount to 4000 mjZcm 2 (365 nm).
[0089] 〔榭脂引張試験〕  [0089] [Fabric tensile test]
JIS K7113 (プラスチックの引張試験方法)に準拠し、 2 (1Z2)号ダンベル形状( 標点間距離 12mm)で lmm厚の試験片を上記の条件で調製し、温度 23°C、湿度 5 0%の環境下で、引張速度 50mmZminで測定した。引張破壊強さ、引張弾性率、 引張破壊伸びの各値については、 JIS K7113に準拠して求めた。  In accordance with JIS K7113 (plastic tensile test method), 2 mm (1Z2) dumbbell shape (12 mm distance between gauge points) and 1 mm thick test piece was prepared under the above conditions, temperature 23 ° C, humidity 50% The measurement was performed at a tensile speed of 50 mmZmin in the environment described above. The values for tensile fracture strength, tensile modulus, and tensile elongation at break were determined according to JIS K7113.
[0090] 〔振動疲労耐久試験〕  [0090] [Vibration fatigue endurance test]
全長 150mm X幅 25mm X厚さ lmmの試験片を上記の条件で調製し、 JIS K62 60 (加硫ゴム及び可塑性ゴムのデマチヤ屈曲き裂試験方法)を参考にして、予め試 験片中央部に約 2mmの亀裂を入れた試験片をデマチヤ屈曲き裂試験機 (上島製作 所社製)の上下つかみ具につかみ具間隔 75mmで固定し、室温雰囲気下、振幅 56 mm、 300回 Z分の条件で往復運動をさせた。測定は、屈曲回数が 0回 (初期)、 3, 000回、 54, 000回、 144, 000回の時点で亀裂幅を測定した。この場合、屈曲回数 とは、 1往復運動を 1回とし、屈曲回数は回数計で読みとつた。また亀裂幅の測定は つかみ具間隔を 65mmにして測定した。また、評価に関しては、 144, 000回時点で 亀裂幅が 25mm (=破断)に至らな力 たものを、振動疲労耐久性が良好とした。  Prepare a test piece with a total length of 150mm X width 25mm X thickness lmm under the above conditions, and place it in the center of the test piece in advance by referring to JIS K62 60 (Dematia flex crack test method for vulcanized rubber and plastic rubber). A specimen with a crack of about 2 mm is fixed to the upper and lower grips of a Demacia bending crack tester (manufactured by Ueshima Manufacturing Co., Ltd.) with a grip spacing of 75 mm, under conditions of room temperature atmosphere, amplitude 56 mm, 300 times Z And reciprocated. For the measurement, the crack width was measured when the number of bendings was 0 (initial), 3,000, 54,000, and 144,000. In this case, the number of flexing times is one reciprocating motion, and the number of flexing times is read with a counter. The crack width was measured with the distance between grips set to 65 mm. Regarding the evaluation, vibration fatigue durability was evaluated as good when the crack width reached 25 mm (= rupture) at 144,000 times.
[0091] 得られた光硬化性榭脂組成物の硬化体の榭脂引張試験の測定及び振動疲労耐 久試験の結果をまとめて表 1 1、表 1 2、表 1 3に示す。  [0091] Tables 11, 12, and 13 summarize the results of the measurement of the resin tensile test and vibration fatigue endurance test of the cured product of the obtained photocurable resin composition.
[0092] [表 1-1] 表 1 一 1
Figure imgf000030_0001
[0092] [Table 1-1] Table 1 1 1
Figure imgf000030_0001
Figure imgf000030_0002
Figure imgf000030_0002
表 1 2
Figure imgf000031_0001
Table 1 2
Figure imgf000031_0001
Figure imgf000031_0002
Figure imgf000031_0002
Figure imgf000032_0001
Figure imgf000032_0001
グ等のパッキング部材、スピーカ一等の音響用部材、携帯電話用キーシート等のシ ート部材、防振材料、各種機構部材等に好適に使用可能であり、産業上非常に有用 である。また、本発明の光硬化性榭脂組成物は、その優れた耐疲労特性から土木、 建築等の構造用シーリング剤、金属、マグネット、セラミックス、ガラス、プラスチック用 の接着剤、更には、プラスチックレンズ等の榭脂成形品にも適用できる。 なお、 2006年 1月 6曰〖こ出願された曰本特許出願 2006— 001360号及び 2006 年 2月 14日に出願された日本特許出願 2006— 036181号の明細書、特許請求の 範囲、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れ るものである。 It can be suitably used as a packing member such as a speaker, an acoustic member such as a speaker, a sheet member such as a key sheet for a mobile phone, an anti-vibration material, and various mechanism members, and is very useful in industry. In addition, the photocurable resin composition of the present invention has an excellent fatigue resistance, so that it is a sealing agent for structures such as civil engineering and construction, an adhesive for metals, magnets, ceramics, glass, plastics, and a plastic lens. The present invention can also be applied to a molded resin product. The specification, claims and abstract of Japanese Patent Application 2006-001360 filed on January 6, 2006 and Japanese Patent Application 2006-036181 filed on February 14, 2006 The entire contents of this document are hereby incorporated by reference as the disclosure of the specification of the present invention.

Claims

請求の範囲 The scope of the claims
[1] (A)光ラジカル重合性榭脂、光ラジカル付加重合性榭脂、及び光力チオン重合性 榭脂からなる群力 選ばれる少なくとも 1つの樹脂と、(B)光重合開始剤と、(C)酸化 防止剤又は(D)光安定剤の!/、ずれか又は両方とを含有する光硬化性榭脂組成物で あって、当該光硬化性榭脂糸且成物の硬化体の引張弾性率が l〜30MPaであり、し 力も引張破壊伸びが 200%以上であることを特徴とする光硬化性榭脂組成物。  [1] (A) At least one resin selected from the group consisting of a photoradical polymerizable resin, a photoradical addition polymerizable resin, and a photothion polymerizable resin; (B) a photopolymerization initiator; (C) an antioxidant or (D) a photocurable resin composition containing either or both of a light stabilizer and a cured product of the photocurable resin thread and the cured product. A photocurable resin composition having a tensile elastic modulus of 1 to 30 MPa and a tensile strength at breakage of 200% or more.
[2] 更に (E)ゴム組成物を含有する、請求項 1に記載の光硬化性榭脂組成物。  [2] The photocurable resin composition according to claim 1, further comprising (E) a rubber composition.
[3] ゴム組成物力 (メタ)アクリル酸エステルイ匕合物、ビュル系化合物、及びォレフィン 系炭化水素化合物からなる群力 選ばれる少なくとも一つの単量体力 なる共重合 体であって、重量平均分子量が 500〜50, 000の範囲である請求項 1または 2に記 載の光硬化性榭脂組成物。  [3] Rubber composition strength A copolymer consisting of (meth) acrylic ester compound, a bulle compound, and an olefinic hydrocarbon compound, a copolymer having at least one monomer strength selected, and having a weight average molecular weight. The photocurable resin composition according to claim 1 or 2, which is in the range of 500 to 50,000.
[4] ゴム組成物力 (メタ)アクリル酸エステルイ匕合物、ビュル系化合物、及びォレフィン 系炭化水素化合物からなる群力 選ばれる 3種類以上の単量体力 なる共重合体で あって、刖記単量体が、  [4] Rubber composition strength A copolymer consisting of (meth) acrylic acid ester compound, bur-based compound, and olefin-based hydrocarbon compound. The mass is
(ィ)ホモポリマーのガラス転移温度が 25°C未満であるラジカル重合性単量体を 20〜 90質量%と、  (Ii) 20-90% by mass of a radically polymerizable monomer having a glass transition temperature of less than 25 ° C.
(口)ホモポリマーのガラス転移温度が 25°C以上であるラジカル重合性単量体を 0. 1 〜70質量%と、  (Mouth) 0.1 to 70% by mass of a radical polymerizable monomer having a glass transition temperature of 25 ° C. or higher of the homopolymer,
(ハ)分子内に非ラジカル重合性である反応性基を少なくとも一つ有するラジカル重 合性単量体を 1〜50質量%と、  (C) 1-50 mass% of a radically polymerizable monomer having at least one reactive group that is non-radically polymerizable in the molecule;
を含む請求項 3に記載の光硬化性榭脂組成物。  The photocurable resin composition according to claim 3, comprising:
[5] (ィ)成分の単量体が、炭素数が 1〜20のアルキル (メタ)アタリレートである請求項 4 に記載の光硬化性榭脂組成物。 5. The photocurable resin composition according to claim 4, wherein the monomer of component (i) is an alkyl (meth) acrylate having 1 to 20 carbon atoms.
[6] (口)成分の単量体が、メチルメタタリレート、及びスチレン力 なる群力 選ばれる少 なくとも 1種を含有する請求項 4または 5に記載の光硬化性榭脂組成物。 [6] The photocurable resin composition according to [4] or [5], wherein the monomer of the (mouth) component contains at least one selected from the group strength of methyl metatalylate and styrene power.
[7] (ハ)成分の単量体が、水酸基、カルボン酸基、グリシジル基、イソシァネート基、ァ ミノ基、及びアルコキシシリル基力 なる群力 選ばれる一つ以上の基を有する請求 項 4〜6のいずれか一項に記載の光硬化性榭脂組成物。 [7] The monomer of component (c) has one or more groups selected from a group force consisting of a hydroxyl group, a carboxylic acid group, a glycidyl group, an isocyanate group, an amino group, and an alkoxysilyl group. 6. The photocurable resin composition according to any one of 6 above.
[8] ゴム組成物の 25°Cでの粘度が、 100〜100, OOOmPa' sの範囲にある、請求項 1[8] The viscosity of the rubber composition at 25 ° C is in the range of 100 to 100, OOOmPa's.
〜7のいずれか一項に記載の光硬化性榭脂組成物。 The photocurable resin composition as described in any one of -7.
C  C
[9] 光ラジ Hカル重合性榭脂がアクリル榭脂であって、アクリル榭脂が、(a— 1)分子の末  [9] Optical Radical H-polymerizable resin is acrylic resin, and acrylic resin is (a-1) molecular end
2  2
端又は側鎖cに RcΟ ΝΠ l l 1個以上の(メタ)アタリロイル基を有し、分子量が 5, 000-100, 000 のウレタン (メタ)アタリレートオリゴマー 1種以上と、 (a - 2)単官能 (メタ)アタリレートと カゝらなる、請求項 1〜8の ヽずれか一項に記載の光硬化性榭脂組成物。  RcΟ ll ll at the end or side chain c One or more urethane (meth) acrylate oligomers having one or more (meth) atalyloyl groups and a molecular weight of 5,000-100,000, and (a-2) single The photocurable resin composition according to any one of claims 1 to 8, wherein the photocurable resin composition is composed of a functional (meth) acrylate.
[10] (a- 2)単官能 (メタ)アタリレートが、下記式〔1〕または〔2〕で表される単官能 (メタ) アタリレートである請求項 9に記載の光硬化性榭脂組成物。  [10] The photocurable resin according to claim 9, wherein the (a-2) monofunctional (meth) acrylate is a monofunctional (meth) acrylate represented by the following formula [1] or [2]: Composition.
[化 1]  [Chemical 1]
(式中、 R1は水素原子またはメチル基であり、 R2は、炭素数 1〜22である直鎖もしく は分岐アルキル基、シクロへキシル基、炭素数 1〜4の直鎖もしくは分岐アルキル基 により置換されたシクロへキシル基、フエ-ル基、炭素数 1〜4の直鎖もしくは分岐ァ ルキル基により置換されたフエ-ル基、ジシクロペンタ-ル基、ジシクロペンテ-ル基 、ボルニル基、イソボル-ル基、ァダマンチル基、メチルァダマンチル基またはァリル 基である。 ) (In the formula, R 1 is a hydrogen atom or a methyl group, and R 2 is a straight or branched alkyl group having 1 to 22 carbon atoms, a cyclohexyl group, a straight or branched chain having 1 to 4 carbon atoms. A cyclohexyl group, a phenyl group, a phenyl group substituted with a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclopental group, a dicyclopental group, or a bornyl group. , An isobornyl group, an adamantyl group, a methyladamantyl group or an aryl group.)
[化 2]  [Chemical 2]
R
Figure imgf000035_0001
R
Figure imgf000035_0001
〔2〕  [2]
(式中、 R1は水素原子またはメチル基であり、 R3は、炭素数 1〜4である直鎖もしくは 分岐アルキル基、 R4は、炭素数 1〜4である直鎖もしくは分岐アルキル基、シクロへキ シル基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたシクロへキシル 基、フエ-ル基、炭素数 1〜4の直鎖もしくは分岐アルキル基により置換されたフエ- ル基、ジシクロペンタ-ル基、ジシクロペンテ-ル基、ボルニル基、イソボル-ル基、 ァダマンチル基、メチルァダマンチル基またはァリル基であり、 nは 1〜12の整数であ る。) (Wherein R 1 is a hydrogen atom or a methyl group, R 3 is a linear or branched alkyl group having 1 to 4 carbon atoms, and R 4 is a linear or branched alkyl group having 1 to 4 carbon atoms. Cyclohexyl substituted with a cyclohexyl group or a linear or branched alkyl group having 1 to 4 carbon atoms Group, a phenyl group, a phenyl group substituted by a linear or branched alkyl group having 1 to 4 carbon atoms, a dicyclopental group, a dicyclopental group, a bornyl group, an isobornyl group, an adamantyl group, methyl An adamantyl group or an aryl group, and n is an integer of 1 to 12. )
[11] 光ラジカル付加重合性榭脂が、分子内に 2つ以上の炭素 炭素不飽和二重結合 を有するポリェン化合物と、分子内に 2つ以上のメルカプト基を有するポリチオール 化合物とからなる、請求項 1〜8の!、ずれか一項に記載の光硬化性榭脂組成物。  [11] The photoradical addition polymerizable resin comprises a polyene compound having two or more carbon-carbon unsaturated double bonds in the molecule and a polythiol compound having two or more mercapto groups in the molecule. Item 1-8! The photocurable rosin composition according to claim 1.
[12] 光力チオン重合性榭脂が、分子内にエポキシ基、ォキセタニル基またはビニルェ 一テル基を有する請求項 1〜8のいずれか一項に記載の光硬化性榭脂組成物。  [12] The photocurable resin composition according to any one of [1] to [8], wherein the light-powered thione polymerizable resin has an epoxy group, an oxetanyl group, or a vinyl ether group in the molecule.
[13] 請求項 1〜12の 、ずれか一項に記載の光硬化性榭脂組成物からなる硬化体。  [13] A cured product comprising the photocurable resin composition according to any one of claims 1 to 12.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012124475A1 (en) * 2011-03-11 2012-09-20 日立化成工業株式会社 Liquid curable resin composition, production method for image display device using same, and image display device
JP2012215872A (en) * 2011-03-28 2012-11-08 Hitachi Chem Co Ltd Photosensitive resin composition, photosensitive film, pattern forming method, forming method for hollow structure, and electronic component
WO2021000191A1 (en) * 2019-06-30 2021-01-07 瑞声声学科技(深圳)有限公司 Light-transmitting rubber composition, preparation method, and application in electroacoustic devices

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2011143809A (en) * 2009-03-31 2013-05-10 Акцо Нобель Коатингс Интернэшнл Б.В. RADIATION CURING OF COATINGS
TWI625340B (en) * 2011-04-15 2018-06-01 Denka Company Ltd Sclerosing composition
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Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6351402A (en) * 1986-08-20 1988-03-04 Nippon Paint Co Ltd Photo-setting resin composition
JPS6485209A (en) * 1987-09-25 1989-03-30 Kemitetsuku Kk Ultraviolet ray curable adhesive composition
JPH0210166B2 (en) * 1980-10-06 1990-03-07 Nippon Synthetic Chem Ind
JPH03296513A (en) * 1990-04-17 1991-12-27 Nippon Kayaku Co Ltd Ultraviolet-curable resin composition for optical lens and optical lens prepared therefrom
JPH0578507A (en) * 1991-09-24 1993-03-30 Nippon Kayaku Co Ltd Ultraviolet-curing resin composition for transmitting screen and cured object obtained therefrom
JPH05155944A (en) * 1991-12-04 1993-06-22 Nippon Kayaku Co Ltd Uv-curable resin composition for transmission screen and its cured product
JPH0621498A (en) * 1992-06-29 1994-01-28 Canon Inc Sealing resin composition and solar cell using the same
JPH0753664A (en) * 1993-08-12 1995-02-28 Nippon Synthetic Chem Ind Co Ltd:The Urethane-based oligomer and active energy ray-curable urethane-based resin composition containing the same oligomer as curing component
JPH0762056A (en) * 1993-08-23 1995-03-07 Nippon Synthetic Chem Ind Co Ltd:The Urethane oligomer and active energy beam-curing urethane resin composition with the same as curing component
JPH0762057A (en) * 1993-08-23 1995-03-07 Nippon Synthetic Chem Ind Co Ltd:The Urethane oligomer and active energy beam-curing urethane resin composition with the same as curing component

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5345832B2 (en) * 1972-01-17 1978-12-09
DE3879742D1 (en) * 1987-04-14 1993-05-06 Ciba Geigy Ag ADHESIVES.
AU659010B2 (en) * 1992-06-29 1995-05-04 Canon Kabushiki Kaisha Resin composition for sealing and semiconductor apparatus covered with the sealing resin composition
JP3956597B2 (en) * 2000-09-26 2007-08-08 三菱化学株式会社 Photocurable composition and cured product thereof
JP2003026715A (en) * 2001-05-11 2003-01-29 Shin Etsu Polymer Co Ltd Ultraviolet-curing molding material, weatherproof ultraviolet-curing molding material, methods for curing them and articles produced from them
JP2004277725A (en) * 2003-02-28 2004-10-07 Mitsubishi Rayon Co Ltd Photocurable resin composition, photocurable sheet and method for producing molding using the sheet
JP5037780B2 (en) * 2003-05-23 2012-10-03 三菱化学株式会社 Active energy ray-curable composition and hard coat film
JP4170861B2 (en) * 2003-09-04 2008-10-22 電気化学工業株式会社 Photocurable resin composition
JP2005154552A (en) * 2003-11-25 2005-06-16 Bridgestone Corp Photocurable sheet and optical information recording medium

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210166B2 (en) * 1980-10-06 1990-03-07 Nippon Synthetic Chem Ind
JPS6351402A (en) * 1986-08-20 1988-03-04 Nippon Paint Co Ltd Photo-setting resin composition
JPS6485209A (en) * 1987-09-25 1989-03-30 Kemitetsuku Kk Ultraviolet ray curable adhesive composition
JPH03296513A (en) * 1990-04-17 1991-12-27 Nippon Kayaku Co Ltd Ultraviolet-curable resin composition for optical lens and optical lens prepared therefrom
JPH0578507A (en) * 1991-09-24 1993-03-30 Nippon Kayaku Co Ltd Ultraviolet-curing resin composition for transmitting screen and cured object obtained therefrom
JPH05155944A (en) * 1991-12-04 1993-06-22 Nippon Kayaku Co Ltd Uv-curable resin composition for transmission screen and its cured product
JPH0621498A (en) * 1992-06-29 1994-01-28 Canon Inc Sealing resin composition and solar cell using the same
JPH0753664A (en) * 1993-08-12 1995-02-28 Nippon Synthetic Chem Ind Co Ltd:The Urethane-based oligomer and active energy ray-curable urethane-based resin composition containing the same oligomer as curing component
JPH0762056A (en) * 1993-08-23 1995-03-07 Nippon Synthetic Chem Ind Co Ltd:The Urethane oligomer and active energy beam-curing urethane resin composition with the same as curing component
JPH0762057A (en) * 1993-08-23 1995-03-07 Nippon Synthetic Chem Ind Co Ltd:The Urethane oligomer and active energy beam-curing urethane resin composition with the same as curing component

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012124475A1 (en) * 2011-03-11 2012-09-20 日立化成工業株式会社 Liquid curable resin composition, production method for image display device using same, and image display device
JPWO2012124475A1 (en) * 2011-03-11 2014-07-17 日立化成株式会社 Liquid curable resin composition, method for producing image display device using the same, and image display device
JP2016084478A (en) * 2011-03-11 2016-05-19 日立化成株式会社 Liquid curable resin composition, manufacturing method of image display unit using the same and device for displaying images
JP2012215872A (en) * 2011-03-28 2012-11-08 Hitachi Chem Co Ltd Photosensitive resin composition, photosensitive film, pattern forming method, forming method for hollow structure, and electronic component
JP2017083851A (en) * 2011-03-28 2017-05-18 日立化成株式会社 Photosensitive resin composition, photosensitive film, pattern forming method, hollow structure forming method, and electronic component
WO2021000191A1 (en) * 2019-06-30 2021-01-07 瑞声声学科技(深圳)有限公司 Light-transmitting rubber composition, preparation method, and application in electroacoustic devices

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