WO2007070475A3 - Scanning electron microscope with crt-type electron optics - Google Patents
Scanning electron microscope with crt-type electron optics Download PDFInfo
- Publication number
- WO2007070475A3 WO2007070475A3 PCT/US2006/047227 US2006047227W WO2007070475A3 WO 2007070475 A3 WO2007070475 A3 WO 2007070475A3 US 2006047227 W US2006047227 W US 2006047227W WO 2007070475 A3 WO2007070475 A3 WO 2007070475A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electron beam
- crt
- substrate
- embodiment relates
- electron microscope
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
One embodiment relates to an apparatus, including a CRT-type gun (for example, 102, or 302, or 510, or 1002, or 1113) and deflectors to generate and scan the electron beam, which utilizes the electron beam for inspection or metrology of a substrate. The apparatus may comprise a portable scanning electron microscope. Another embodiment relates to a method of inspecting a substrate or measuring an aspect of the substrate, where an electron beam is focused using electrostatic lenses formed by metal plates (704) supported by and separated by fused glass beads (706) or other insulating material. Another embodiment relates to a method of obtaining an electron beam image of a surface of a bulk specimen where a portable SEM device is moved to the bulk specimen. Other embodiments and features are also disclosed.
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74986805P | 2005-12-12 | 2005-12-12 | |
US60/749,868 | 2005-12-12 | ||
US77215506P | 2006-02-10 | 2006-02-10 | |
US60/772,155 | 2006-02-10 | ||
US11/450,757 US20070145266A1 (en) | 2005-12-12 | 2006-06-09 | Electron microscope apparatus using CRT-type optics |
US11/450,758 | 2006-06-09 | ||
US11/450,757 | 2006-06-09 | ||
US11/450,758 US20070145267A1 (en) | 2005-12-12 | 2006-06-09 | Portable scanning electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007070475A2 WO2007070475A2 (en) | 2007-06-21 |
WO2007070475A3 true WO2007070475A3 (en) | 2008-04-10 |
Family
ID=38163457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/047227 WO2007070475A2 (en) | 2005-12-12 | 2006-12-11 | Scanning electron microscope with crt-type electron optics |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2007070475A2 (en) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2424791A (en) * | 1942-12-01 | 1947-07-29 | Gen Electric | Electron microscope apparatus |
US2982878A (en) * | 1954-11-23 | 1961-05-02 | Rca Corp | Electrode support |
US4516026A (en) * | 1981-02-04 | 1985-05-07 | Centre National De La Recherche Scientifique Cnrs | Scanning electron microscope assembly operating in situ |
US5892224A (en) * | 1996-05-13 | 1999-04-06 | Nikon Corporation | Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams |
US6282222B1 (en) * | 1996-06-12 | 2001-08-28 | Rutgers, The State University | Electron beam irradiation of gases and light source using the same |
US6552341B1 (en) * | 1999-04-09 | 2003-04-22 | Centre National D'etudes Spatiales | Installation and method for microscopic observation of a semiconductor electronic circuit |
US6740889B1 (en) * | 1998-09-28 | 2004-05-25 | Applied Materials, Inc. | Charged particle beam microscope with minicolumn |
US6897443B2 (en) * | 2003-06-02 | 2005-05-24 | Harald Gross | Portable scanning electron microscope |
-
2006
- 2006-12-11 WO PCT/US2006/047227 patent/WO2007070475A2/en active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2424791A (en) * | 1942-12-01 | 1947-07-29 | Gen Electric | Electron microscope apparatus |
US2982878A (en) * | 1954-11-23 | 1961-05-02 | Rca Corp | Electrode support |
US4516026A (en) * | 1981-02-04 | 1985-05-07 | Centre National De La Recherche Scientifique Cnrs | Scanning electron microscope assembly operating in situ |
US5892224A (en) * | 1996-05-13 | 1999-04-06 | Nikon Corporation | Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams |
US6282222B1 (en) * | 1996-06-12 | 2001-08-28 | Rutgers, The State University | Electron beam irradiation of gases and light source using the same |
US6740889B1 (en) * | 1998-09-28 | 2004-05-25 | Applied Materials, Inc. | Charged particle beam microscope with minicolumn |
US6552341B1 (en) * | 1999-04-09 | 2003-04-22 | Centre National D'etudes Spatiales | Installation and method for microscopic observation of a semiconductor electronic circuit |
US6897443B2 (en) * | 2003-06-02 | 2005-05-24 | Harald Gross | Portable scanning electron microscope |
Also Published As
Publication number | Publication date |
---|---|
WO2007070475A2 (en) | 2007-06-21 |
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