WO2007060089A2 - Composes d'organo-silicium a fonction alpha-(beta-cetocarbonyle et leur preparation - Google Patents
Composes d'organo-silicium a fonction alpha-(beta-cetocarbonyle et leur preparation Download PDFInfo
- Publication number
- WO2007060089A2 WO2007060089A2 PCT/EP2006/068162 EP2006068162W WO2007060089A2 WO 2007060089 A2 WO2007060089 A2 WO 2007060089A2 EP 2006068162 W EP2006068162 W EP 2006068162W WO 2007060089 A2 WO2007060089 A2 WO 2007060089A2
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- WIPO (PCT)
- Prior art keywords
- radical
- ketocarbonyl
- organosilicon compounds
- hydrogen atom
- radicals
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title description 3
- -1 aralkyl radical Chemical class 0.000 claims description 73
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 43
- 150000003254 radicals Chemical class 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229920001296 polysiloxane Polymers 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 150000002894 organic compounds Chemical class 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- LLPNBWNKPILNSX-UHFFFAOYSA-N 4-methylideneoxetan-2-one propan-2-one Chemical compound CC(C)=O.C=C1CC(=O)O1 LLPNBWNKPILNSX-UHFFFAOYSA-N 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 claims 1
- 150000001412 amines Chemical class 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- WASQWSOJHCZDFK-UHFFFAOYSA-N diketene Chemical compound C=C1CC(=O)O1 WASQWSOJHCZDFK-UHFFFAOYSA-N 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 150000005840 aryl radicals Chemical class 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- SLRMQYXOBQWXCR-UHFFFAOYSA-N 2154-56-5 Chemical compound [CH2]C1=CC=CC=C1 SLRMQYXOBQWXCR-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 150000002081 enamines Chemical class 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- YUDRVAHLXDBKSR-UHFFFAOYSA-N [CH]1CCCCC1 Chemical compound [CH]1CCCCC1 YUDRVAHLXDBKSR-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N acetoacetic acid Chemical group CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229920013822 aminosilicone Polymers 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 230000009920 chelation Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 238000001212 derivatisation Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- QUPDWYMUPZLYJZ-UHFFFAOYSA-N ethyl Chemical compound C[CH2] QUPDWYMUPZLYJZ-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- REODOQPOCJZARG-UHFFFAOYSA-N n-[[diethoxy(methyl)silyl]methyl]cyclohexanamine Chemical compound CCO[Si](C)(OCC)CNC1CCCCC1 REODOQPOCJZARG-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- JKUYRAMKJLMYLO-UHFFFAOYSA-N tert-butyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC(C)(C)C JKUYRAMKJLMYLO-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
Definitions
- the invention relates to OC- ( ⁇ -ketocarbonyl) -functional organosilicon compounds and a process for their preparation.
- Polymeric ⁇ -ketoester siloxanes are known from US 4,808,649, as is a process for their preparation and their use as a stabilizer for polyvinyl chloride.
- Aminopolysiloxanes used for the production of elastomeric films.
- the object was to provide CC- ( ⁇ -ketocarbonyl) -functional organosilicon compounds which can be prepared selectively by a simple process and without obtaining any reclaimed products.
- the object is achieved by the invention.
- the invention provides CC- ( ⁇ -ketocarbonyl) -functional organosilicon compounds which have at least one Si-bonded radical B selected from the group of the general formulas
- Y is an oxygen atom or a radical of the formula -NR -, preferably a radical of the formula -NR 2 -,
- R 1 represents a hydrogen atom or an alkyl, cycloalkyl, aryl or aralkyl radical having 1 to 30 carbon atoms, preferably a hydrogen atom
- R 2 is a radical R 1 or an organic radical containing one or more heteroatoms selected from the group of B, N, O, P, S, Si, Ti, F, Cl, Br and J, preferably N, O and Si
- R 3 is a radical R 1 .
- the radicals of the formulas (I) and (II) are tautomeric groups.
- the CC- ( ⁇ -ketocarbonyl) -functional organosilicon compounds according to the invention preferably contain 1 to 20 radicals of the formulas (I) and / or (II) per molecule, where they are radicals of the formula (I) only radicals of the formula (II) or can contain both together. Since tautomeric groups are interconvertible, their respective content may change depending on external conditions. Their ratio can therefore vary within wide limits and quotients of about 1000: 1 to about 1: 1000 amount.
- the organosilicon compounds of the invention may be silanes or oligomeric or polymeric organopolysiloxanes.
- the organosilicon compounds according to the invention preferably contain 1 to 10 000 Si atoms, preferably 5 to 5000 Si Atoms, more preferably 60 to 3000 Si atoms.
- the organosilicon compounds of the invention may be linear, branched, dendrimeric or cyclic. Also included in the scope of the organosilicon compounds according to the invention are network structures of arbitrary size, to which neither a specific or average number of Si atoms can be assigned, provided they contain at least one Si-bonded functional group of the formula (I) and / or (II).
- the invention further provides a process for the preparation of CC- ( ⁇ -ketocarbonyl) -functional organosilicon compounds, wherein the diketenes (1) of the general formula
- organosilicon compounds (2) which contain at least one Si-bonded radical A of the general formula
- R 1 , R 3 and Y have the meaning given above, be implemented.
- diketenes (1) are also their derivatives, such as
- Acetoacetic acid tert. butyl ester or the diketene-acetone adduct can be used, wherein the reactive species by heating at temperatures of preferably 80 to 180 0 C, preferably 100 to 150 0 C, released.
- the reaction can be carried out without addition of further substances, but also diluted in solvents, such as heptane, toluene, xylene, THF, Take ethyl acetate.
- solvents such as heptane, toluene, xylene, THF, Take ethyl acetate.
- solvents such as heptane, toluene, xylene, THF, Take ethyl acetate.
- solvents such as heptane, toluene, xylene, THF, Take ethyl acetate.
- solvents such as heptane, toluene, xylene, THF, Take eth
- reaction can be carried out with the aid of one or more organic compounds (3) which delay or reversibly prevent the addition of the ⁇ -ketocarbonyl compounds to radicals A in (2), preferably amino radicals. Except in cases where too high an exotherm is to be expected due to high concentrations of the reactive groups (III) and (IV), the reaction without the addition of further substances is preferred.
- Examples of compounds (3) which can be used in the process according to the invention are those which can form more or less solid adducts with amines, such as aldehydes or ketones.
- Preferred examples are acetone, butanone, methyl isobutyl ketone and cyclohexanone.
- Adducts can be thermally split again and thus rest A slowly released.
- organosilicon compounds (2) which can be used in the process according to the invention can be silanes or oligomeric or polymeric organopolysiloxanes.
- organosilicon compounds (2) organopolysiloxanes from units of the general formula. 5
- 0 A is a radical of the general formula -CR 1 ⁇ -YH (IV), wherein R 1 and Y have the meaning given above, R is a monovalent, optionally substituted
- Hydrocarbon radical having 1 to 18 carbon atoms per radical, 5 R 4 is a hydrogen atom or an alkyl radical having 1 to 8
- organosilicon compounds (2) are organopolysiloxanes of the general formula
- A, R and R 4 have the meaning given above, g is 0 or 1, k is 0 or an integer from 1 to 30 and
- 1 is 0 or an integer from 1 to 1000
- m is an integer from 1 to 30
- n is 0 or an integer from 1 to 1000, provided that on average at least one residue A is contained per molecule.
- the organosilicon compounds (2) used in the process according to the invention preferably have a viscosity of from 1 mPa.s to 1,000,000 mPa.s at 25 ° C., preferably 100 mPa.s to 50,000 mPa.s at 25 ° C.
- radicals R are alkyl radicals, such as the methyl, ethyl, n-propyl, iso-propyl, 1-n-butyl, 2-n-butyl, iso-butyl, tert. Butyl, n-pentyl, iso-pentyl, neo-pentyl, tert.
- -Pentyl radical hexyl radicals such as the n-hexyl radical, heptyl radicals such as the n-heptyl radical, octyl radicals such as the n-octyl radical and iso-octyl radicals such as the 2, 2, 4-trimethylpentyl radical, nonyl radicals such as the n-nonyl radical, decyl radicals such as the n-decyl radical, dodecyl radicals such as the n-dodecyl radical, and octadecyl radicals such as the n-octadecyl radical; Cycloalkyl radicals such as cyclopentyl, cyclohexyl, cycloheptyl and methylcyclohexyl radicals; Alkenyl radicals such as the vinyl, 5-hexenyl, cyclohexenyl, 1-propenyl, allyl,
- radicals R 1 are, in addition to the preferred hydrogen, alkyl radicals, such as the methyl, ethyl, n-propyl, iso-propyl, 1-n-butyl, 2-n-butyl, iso-butyl, tert , Butyl, n-pentyl, iso-pentyl, neo-pentyl, tert.
- -Pentyl radical hexyl radicals, such as the n-hexyl radical, heptyl radicals, such as the n-heptyl radical, octyl radicals, such as the n-octyl radical and iso-octyl radicals, such as the 2,2,4-trimethylpentyl radical, nonyl radicals, such as the n-nonyl radical,
- Decyl radicals such as the n-decyl radical, dodecyl radicals, such as the n-dodecyl radical, and octadecyl radicals, such as the n-octadecyl radical; Cycloalkyl radicals such as cyclopentyl, cyclohexyl, cycloheptyl and methylcyclohexyl radicals; Aryl radicals, such as aryl radicals, such as the phenyl, naphthyl, anthryl and phenanthryl radicals; and aralkyl radicals, such as the benzyl radical, the CC and the ⁇ -phenylethyl radicals.
- R 2 is an alkyl, cycloalkyl, aryl or aralkyl radical of 1 to 30 carbon atoms which may contain one or more heteroatoms selected from the group of N, O and Si, preferably an alkyl, cycloalkyl, aryl or Aralkyl radical having 1 to 30 carbon atoms.
- R 1 are also fully applicable to Examples R 2 .
- Preferred examples of R 2 are the methyl radical and the cyclohexyl radical.
- R 2 may also contain heteroatoms. Further examples of R 2 are therefore
- R 3 correspond to those for R 1 , hydrogen being preferred.
- CC ( ⁇ -ketocarbonyl) functional organosilicon compounds of the invention are provided.
- B, R, R 4, a, c and d have the meaning given above, with the proviso that the sum a + c + d ⁇ _ 3 and on average at least one radical B per molecule is included.
- ⁇ -ketocarbonyl-functional organosilicon compounds are organopolysiloxanes of the general formula
- B, R, R 4 , g, k, 1, m and n have the meaning given above, with the proviso that on average at least one radical B per molecule is contained.
- diketene (1) in amounts of preferably 0.5 to 2.0 mol, preferably 0.9 to 1.2 mol, depending Mol radical A of the general formula (IV) used in the organosilicon compound (2).
- the inventive method is preferably carried out at temperatures of 0 to 140 0 C, preferably 20 to 100 0 C, performed. Furthermore, the process of the invention is preferably carried out at the pressure of the surrounding atmosphere, but can also be carried out at higher and lower pressures.
- the CC- ( ⁇ -ketocarbonyl) -functional organosilicon compounds according to the invention preferably have a viscosity of from 5 mPa.s to 1,000,000 mPa.s at 25 ° C., preferably 100 mPa.s to 100,000 mPa.s at 25 ° C.
- ⁇ -ketocarbonyl-functional organosilicon compounds of the invention can be used:
- the condensation method is used: For this purpose, 1350 g of an ⁇ , ⁇ -Dihydroxypolydimethylsiloxans with a viscosity of 67 mm 2 / s (25 ° C) with 74g cyclohexylaminomethyl methyldiethoxysilane mixed. The mixture is heated to 80 0 C and stirred for 2 hours and applying a vacuum until a constant viscosity is reached. The split-off ethanol is continuously removed, whereupon a 2940 mm 2 / s (25 ° C) aminopolysiloxane is obtained.
- the colorless, clear oil has an amine value of 0.204 m.quad./g and thus contains on average one sec. Of amino group per 4902 g of polymer.
- the 1 H NMR spectrum shows only traces of Si-bonded ethoxy groups: the condensation has gone to 98%.
- the 29 Si NMR spectrum shows a sharp signal for the cyclohexylaminomethylmethylsiloxy group at -26.0 ppm relative to tetramethylsilane.
- the total yield deducted from the resulting ethanol is 1390g, which corresponds to 99% of theory.
- Ketocarbonyl and its tautomeric form formed, which are in the keto / enol ratio of 55/45.
- the viscosity of the aminopolysiloxane used has only increased by about 10%, which practically precludes a secondary reaction by enamine linkage.
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Abstract
La présente invention concerne de nouveaux composés d'organo-silicium à fonction a-(ß-cétocarbonyle), qui contiennent au moins un radical B à liaison Si sélectionné dans le groupe des radicaux de formules générales -CR<SUP>1</SUP>
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DE102005056050A DE102005056050A1 (de) | 2005-11-24 | 2005-11-24 | Alpha-(beta-Ketocarbonyl)-funktionelle Organosiliciumverbindungen und deren Herstellung |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1852456A1 (fr) * | 2006-05-04 | 2007-11-07 | Wacker Chemie AG | Procédé pour la préparation de composés organosiliciques ß-cetocarbonyl-fonctionnalisé |
WO2007128680A1 (fr) * | 2006-05-04 | 2007-11-15 | Wacker Chemie Ag | COMPOSÉS D'ORGANOSILICIUM CONTENANT DES GROUPES b-CÉTOAMIDE ET DES POLYMÈRES ORGANIQUES RELIÉS PAR DES LIAISONS ÉNAMINE ET PROCÉDÉ POUR LEUR PRÉPARATION |
EP1889868A1 (fr) * | 2006-08-16 | 2008-02-20 | Wacker Chemie AG | Compositions contenant des polymères |
US20190309468A1 (en) * | 2016-11-16 | 2019-10-10 | Wacker Chemie Ag | Dispersions of beta-ketocarbonyl-functional organosilicon compounds |
CN111094526A (zh) * | 2017-12-06 | 2020-05-01 | 瓦克化学股份公司 | β-酮羰基官能化的有机硅化合物的乳液 |
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SU555104A1 (ru) * | 1975-07-21 | 1977-04-25 | Способ получени -кремнийзамещенных амидов оксикислот | |
EP0010130A1 (fr) * | 1978-08-28 | 1980-04-30 | Bayer Ag | Dérivés de 1,4-dihydropyridine, procédés pour leur préparation, compositions pharmaceutiques et procédé pour leur préparation |
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SU555104A1 (ru) * | 1975-07-21 | 1977-04-25 | Способ получени -кремнийзамещенных амидов оксикислот | |
EP0010130A1 (fr) * | 1978-08-28 | 1980-04-30 | Bayer Ag | Dérivés de 1,4-dihydropyridine, procédés pour leur préparation, compositions pharmaceutiques et procédé pour leur préparation |
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DATABASE BEILSTEIN [Online] BEILSTEIN INSTITUTE FOR ORGANIC CHEMISTRY, FRANKFURT-MAIN, DE; XP002432299 gefunden im XFIRE Database accession no. Reaction ID 1517264 -& TACKE R. ET AL.: "Sila-Analoga" ZEITSCHRIFT FÜR NATURFORSCHUNG B ANORG. CHEM., Bd. 35, Nr. 4, 1980, Seiten 494-501, XP009083303 * |
DATABASE BEILSTEIN [Online] BEILSTEIN INSTITUTE FOR ORGANIC CHEMISTRY, FRANKFURT-MAIN, DE; XP002432300 gefunden im XFIRE Database accession no. BRN 2414120 & MIRONOV, V.F. ET AL.: J. GEN. CHEM. USSR, Bd. 37, 1967, Seiten 1821-1823, * |
WEE A G H ET AL: "The rhodium(II)-catalyzed reaction of N-bis(trimethylsilylmethyl)diazoamides: steric, electronic and conformational effects" TETRAHEDRON LETTERS, ELSEVIER, AMSTERDAM, NL, Bd. 43, Nr. 35, 26. August 2002 (2002-08-26), Seiten 6173-6176, XP004373267 ISSN: 0040-4039 * |
WEE, A. ET AL.: "The Bis(trimethylsilyl)methyl Group as an Effective N-Protecting Group and Site-Selective Control Element in Rhodium(II)-Catalyzed Reaction of Diazoamides" J. ORG. CHEM., Bd. 70, Nr. 21, 14. Oktober 2005 (2005-10-14), Seiten 8372-8380, XP002432277 * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1852456A1 (fr) * | 2006-05-04 | 2007-11-07 | Wacker Chemie AG | Procédé pour la préparation de composés organosiliciques ß-cetocarbonyl-fonctionnalisé |
WO2007128680A1 (fr) * | 2006-05-04 | 2007-11-15 | Wacker Chemie Ag | COMPOSÉS D'ORGANOSILICIUM CONTENANT DES GROUPES b-CÉTOAMIDE ET DES POLYMÈRES ORGANIQUES RELIÉS PAR DES LIAISONS ÉNAMINE ET PROCÉDÉ POUR LEUR PRÉPARATION |
US7495119B2 (en) | 2006-05-04 | 2009-02-24 | Wacker Chemie Ag | Process for preparing β-Ketocarbonyl-functional organosilicon compounds |
KR101027182B1 (ko) * | 2006-05-04 | 2011-04-05 | 와커 헤미 아게 | 엔아민 결합에 의하여 결합된 유기 중합체 및 β-케토아미드기를 함유하는 유기규소 화합물 및 이의 제조방법 |
US7939619B2 (en) | 2006-05-04 | 2011-05-10 | Wacker Chemie Ag | Organosilicon compounds that contain β-ketoamide groups and organic polymers bound via enamine bonds, and method for producing them |
EP1889868A1 (fr) * | 2006-08-16 | 2008-02-20 | Wacker Chemie AG | Compositions contenant des polymères |
US20190309468A1 (en) * | 2016-11-16 | 2019-10-10 | Wacker Chemie Ag | Dispersions of beta-ketocarbonyl-functional organosilicon compounds |
US10920369B2 (en) * | 2016-11-16 | 2021-02-16 | Wacker Chemie Ag | Dispersions of β-ketocarbonyl-functional organosilicon compounds |
CN111094526A (zh) * | 2017-12-06 | 2020-05-01 | 瓦克化学股份公司 | β-酮羰基官能化的有机硅化合物的乳液 |
CN111094526B (zh) * | 2017-12-06 | 2021-08-06 | 瓦克化学股份公司 | β-酮羰基官能化的有机硅化合物的乳液 |
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WO2007060089A3 (fr) | 2007-08-02 |
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