WO2007026553A1 - Low softening point phenol novolac resin, method for producing same, and epoxy resin cured product using same - Google Patents

Low softening point phenol novolac resin, method for producing same, and epoxy resin cured product using same Download PDF

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Publication number
WO2007026553A1
WO2007026553A1 PCT/JP2006/316247 JP2006316247W WO2007026553A1 WO 2007026553 A1 WO2007026553 A1 WO 2007026553A1 JP 2006316247 W JP2006316247 W JP 2006316247W WO 2007026553 A1 WO2007026553 A1 WO 2007026553A1
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Prior art keywords
group
low
resin
phenol
formula
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PCT/JP2006/316247
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French (fr)
Japanese (ja)
Inventor
Seiichirou Takabayashi
Kumi Mitsumoto
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Ube Industries, Ltd.
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Priority to KR1020087007621A priority Critical patent/KR101285422B1/en
Priority to JP2007533179A priority patent/JP5136055B2/en
Priority to CN2006800278970A priority patent/CN101233165B/en
Publication of WO2007026553A1 publication Critical patent/WO2007026553A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G14/00Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups C08G8/00 - C08G12/00
    • C08G14/02Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups C08G8/00 - C08G12/00 of aldehydes
    • C08G14/04Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups C08G8/00 - C08G12/00 of aldehydes with phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

Definitions

  • the present invention relates to a low soft-point phenol novolak resin useful for various binders, coating materials, laminates, molding materials, and the like, a production method thereof, and an epoxy resin cured product using the same.
  • Particularly suitable for epoxy resin hardeners for semiconductor encapsulation, printed circuit board insulation, etc., low melting viscosity, high glass transition temperature, low moisture absorption, high adhesion, heat resistance, and flame resistance The present invention relates to a soft soft-point phenol novolac resin, a method for producing the same, and a cured epoxy resin using the same. Background art
  • phenolic polymers such as phenol novolac resin, phenol alcohol resin, etc. are used as epoxy resin hardeners for electronic materials, particularly for semiconductor encapsulation and printed circuit board insulation.
  • phenol novolac resin phenol novolac resin
  • phenol alcohol resin etc.
  • epoxy resin hardeners for electronic materials, particularly for semiconductor encapsulation and printed circuit board insulation.
  • semiconductor packages have become smaller and thinner, more pins, and higher-density packaging, higher performance resin has been demanded.
  • low soft-point phenol novolac resin that combines low melt viscosity, high glass transition temperature, low moisture absorption, high adhesion, heat resistance, and flame retardancy.
  • the appearance of is strongly desired.
  • an epoxy resin composition having excellent water resistance and high adhesion at a high glass transition temperature is also desired for an interlayer insulating material for build-up substrates.
  • a phenolic curing agent having excellent storage stability and having low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, and flame retardancy is desired.
  • Epoxy resin is often used as a resin material for electronic materials, and various phenol novolak condensates, amines, and acid anhydrides are used as a hardener for the epoxy resin.
  • a phenolic nopolac condensate is mainly used from the viewpoint of heat resistance and reliability.
  • the sealing material has thermal shock resistance and soldering heat resistance during surface mounting work.
  • a major factor affecting the soldering heat resistance is the hygroscopicity of the sealing resin material.
  • the moisture-absorbing sealing material generates an internal pressure due to vaporization of water at a high temperature during the surface mounting operation, causing internal peeling and package cracks, resulting in poor soldering heat resistance. Therefore, the phenolic novolak condensate used as an epoxy resin hardener is particularly required to have low hygroscopicity.
  • the sealing material As a method of reducing the hygroscopicity of the sealing material, there is a method of increasing the amount of filler such as non-hygroscopic silica filled in the sealing resin material as the filler. In this case, if the viscosity of the base resin material is high, the high filling property of the filler is impaired. Therefore, it is desirable that the phenolic nopolac condensate used as the curing agent has a low viscosity.
  • the sealing material is required to have heat resistance, high strength, toughness, flame retardancy, adhesive strength, and the like. Conventional sealing resin materials that use phenol novolac condensates as curing agents for sealing epoxy resins are relatively high in hygroscopicity and are not sufficiently satisfactory in terms of other physical properties. I got it.
  • Patent Document 6 Japanese Patent Application Laid-Open No. 59-230017
  • Patent Document 2 Japanese Patent Laid-Open No. 05-0778437
  • Patent Document 3 Japanese Patent Laid-Open No. 05-086156
  • Patent Document 4 Japanese Patent Laid-Open No. 05-117350
  • Patent Document 5 Japanese Patent Laid-Open No. 08-143648
  • Patent Document 6 Japanese Patent Laid-Open No. 63-022284
  • Non-Patent Document 1 D. W. van Krevelen, Polymer, 16, 615 (1975)
  • the subject of the present invention is excellent in low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, flame retardancy, etc., especially for electrical and electronic industries, for sealing electronic parts ,
  • a novel phenol novolac resin suitably used for epoxy resin for laminated board materials, and an epoxidized phenol novolak condensate obtained by epoxidizing this phenol novolac resin and reacting it with a curing agent for epoxy resin It is in providing the obtained epoxy resin hardened
  • the present inventors have intensively studied to obtain a phenol-based curing agent having the low hygroscopicity, high adhesion, and heat-resistant physical properties of the phenol novolak resin having an aryl group-containing crosslinking group and having a low melt viscosity.
  • a phenol-based curing agent having the low hygroscopicity, high adhesion, and heat-resistant physical properties of the phenol novolak resin having an aryl group-containing crosslinking group and having a low melt viscosity.
  • R represents the following general formula (2)
  • the biphenol-xylene group and the xylylene group represented by formula (1) represent at least one divalent arylene group selected from the following general formula (3):
  • R 4 may be a hydroxyl group or an alkyl group having 1 to 6 carbon atoms, and may include a structural unit represented by: m and n are numbers that satisfy mZn of 0.04 to 20 Preferably, m / n is 0.05 to 9, and R 2 and R 3, which may be the same or different, are each a hydroxyl group or an alkyl group having 1 to 6 carbon atoms, and P, q, and r are each an integer of 0 to 2 ,
  • melt viscosity at 150 ° C. 20 to: L00 mPa ′s, preferably 25 to 90 mPa ′s.
  • the present invention also provides phenols, the following general formula (4):
  • X represents a halogen atom, a hydroxyl group or an alkoxyl group having 1 to 6 carbon atoms,
  • the low softness represented by the above formula (1) is characterized in that at least one of the substituted biphenyl-reny compound and substituted benzene compound represented by formula (II) and formaldehyde are condensed in the presence of an acid catalyst.
  • the present invention relates to a method for producing saddle point phenol novolac resin. In the production method of the present invention, in addition to the compound of the formula (4), the following general formula (5)
  • R 4 has the same meaning as above.
  • the present invention relates to an epoxy resin cured product containing the low soft spot phenol novolac resin represented by the general formula (1).
  • the low soft low point phenol novolak resin of the present invention has both polymer units of the aryl group-containing cross-linked type resin and the methylene group cross-linked phenol novolak resin in the molecule.
  • the ratio of the degree of polymerization is in a specific range, low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, and flame resistance suitable for epoxy resin curing agents are achieved. It is a cohesive oil. This makes it compatible with the latest semiconductor encapsulation materials such as BGA and can be used as an epoxy resin hardener.
  • the phenol novolac resin of the present invention is a polymerization unit of a phenol novolac resin containing n total methylene crosslinking units of a phenol novolac resin containing a phenol crosslinking group represented by the general formula (1) and a methylene crosslinking group. It is a copolymer type low softening point phenol novolac resin having a total of m, and there is no problem even if it is a block copolymer or a random copolymer.
  • the degree of polymerization of mZn is 0.04 to 20, preferably ⁇ or 0.05 to 9, more preferably ⁇ or 0.09 to 6, most preferably ⁇ or 0.1 to 2, and 150 °.
  • the glass transition temperature is lowered, and further, the flame retardancy tends to be reduced, which is not preferable.
  • mZn is less than 0.04, the melt viscosity increases and the fluidity deteriorates, which is preferable.
  • phenols used in the present invention having at least one hydro hexyl group on the benzene ring, optionally substituted with R ⁇ R 2 or R 3 phenol It is kind.
  • R 1 R 2 and R 3 may be the same or different, and a plurality of R 1 R 2 and R 3 may be the same or different, respectively.
  • 1 to 6 alkyl groups, and p, q and r are each a substituent group consisting of an integer of 0 to 2.
  • alkyl group examples include linear or branched alkyl groups having 1 to 6 carbon atoms such as methyl group, ethyl group, propyl group, butyl group, pentyl group, and hexyl group. Including body.
  • phenols can be used alone or in admixture of two or more.
  • Specific phenols include, for example, 0 to 2 carbon atoms such as phenol, cresol, ethyl phenol, propino enoenole, butino enoenole, hexeno enoenore, xylenenole, butino methenophenol, etc.
  • divalent phenol substituted with 2 hydroxyl groups such as catechol, resorcin, hydroquinone and the like.
  • the compound that forms a methylene crosslinking group in the present invention is preferably formaldehyde.
  • formaldehyde is not particularly limited, and a formaldehyde aqueous solution and a polymer that decomposes in the presence of an acid such as paraformaldehyde and trioxane to formaldehyde can also be used.
  • Preferred is an aqueous formaldehyde solution that is easy to handle, and a commercially available 42% aqueous formaldehyde solution can be used as it is.
  • the aryl group-containing crosslinking group R used in the present invention includes a divalent arylene group represented by the general formulas (2) and (3).
  • Such divalent arylene groups include, for example, 4, 4, bibiphenylene, 3, 3, 1 biphenylylene, 2, 2, 1 biphenylylene, 2, 4, 1 biphenylylene.
  • a 4,4, bibi-rylene group and a 1,4 xylylene group are particularly preferred.
  • Specific examples of the aryl group-containing crosslinking group-forming compound for leading to the substituent include, for example, the above general formula ( Examples thereof include compounds represented by 4) and (5).
  • X is a halogen atom, a hydroxyl group or an alkoxyl group having 1 to 6 carbon atoms
  • R 4 is a hydroxyl group or an alkyl group having 1 to 6 carbon atoms.
  • the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a chlorine atom is preferable.
  • alkoxyl group examples include linear or branched alkoxyl groups having 1 to 6 carbon atoms such as methoxyl group, ethoxyl group, propoxyl group, butoxyl group, pentyloxyl group, hexyloxyl group, and the like. Also includes various isomers. Examples of the alkyl group include those described above.
  • Specific compounds for leading to the above substituents include, for example, 4,4'-di (methoxymethyl) biphenyl, 2,2, -di (methoxymethyl) biphenyl, 2,4, di Di (alkoxymethyl) biphenyl compounds such as (methoxymethyl) biphenyl, 4.4, -di (chloromethyl) biphenyl, 2,2, -di (chloromethyl) biphenyl, 2, Di (Noguchigenomethyl) biphenyl compounds such as 4, -di (chloromethyl) biphenyl, 4, 4, -di (hydroxymethyl) biphenyl, 2, 2'-di (hydroxymethyl) biphenyl Di (hydroxymethyl) biphenyl compounds such as 2,4'-di (hydroxymethyl) biphenyl, 1,4-di (methoxymethyl) benzene, 1,3 di (methoxymethyl) benzene, Di (alkoxymethyl) benzene compounds such as 2-di (methoxymethyl)
  • it is an isomer mixture of a biphenol-renylene compound and a Z or xylylene compound.
  • the power is most preferable when 1,4 and 4,4 ′ monomers contain at least 50 mol%.
  • the mixture ratio is 4, 4'Bifueniriren groups 20 to 50 mol 0/0 relative to 1 mol 1, 4 is preferable to use a xylylene group.
  • the method for producing a low softening point phenol novolak resin represented by the general formula (1) is capable of forming n-fold moles of R, ie, an aryl group-containing crosslinking group, with respect to a certain amount of phenols in the presence of an acid catalyst. It can be carried out in a single-stage condensation reaction by simultaneously adding the compound for use and m-fold mol of formaldehyde.
  • the total amount of the aryl group-containing crosslinking group-forming compound and formaldehyde is preferably 1 mol, preferably 2 to 10 mol, more preferably 3 to 6 mol, and even more preferably 4 mol or more of phenols.
  • the reaction between phenols and formaldehyde is preferentially performed at a low reaction temperature (for example, around 100 ° C) to mainly form a phenolic novolac resin containing a low molecular weight methylene crosslinking group,
  • a low reaction temperature for example, around 100 ° C
  • the acid catalyst to be used is not particularly limited, and known acids such as hydrochloric acid, succinic acid, sulfuric acid, phosphoric acid and the like, and organic acids such as paratoluenesulfonic acid may be used alone or in combination of two or more. Particularly preferred is sulfuric acid, succinic acid or paratoluenesulfonic acid.
  • the temperature of the condensation reaction is 50 to 120 ° C, preferably 80 to 110 ° C as a low temperature condition.
  • the reaction temperature at the time of raising the temperature is 130 to 230 ° C, preferably 150 to 200 ° C.
  • the time for the condensation reaction varies depending on the reaction temperature and the type and amount of catalyst used.
  • the reaction pressure is usually carried out under normal pressure, but there is no problem even if it is carried out under a slight pressure or reduced pressure.
  • the amount of phenol used is less than 2 moles per mole of total aryl group-containing crosslinking group-forming compound and formaldehyde, such as when the molecular weight is high, the melt viscosity is high. In some cases, phenol novolac resin cannot be obtained.
  • the low soft-point phenol novolac resin of the present invention condenses phenols and formaldehyde in the presence of an acid catalyst in advance, and then condenses by adding an R aryl group-containing cross-linking group forming compound. It can also be produced by a two-stage condensation reaction. In such a two-stage condensation reaction, phenols can be newly added in the second-stage reaction, and it is preferable to use excessive phenols in this case as well as in the first-stage reaction. Yes. For example, in the first stage reaction, phenols are present in an amount of 2.5 moles or more, more preferably 3.3 to 10 moles per mole of formaldehyde, and an aryl group-containing cross-linking group is added in the second stage reaction.
  • the total amount of phenols to be fed in 1 to 2 stages is 3 moles or more, compared to 1 mole in total of the aryl group-containing cross-linking group forming compound and formaldehyde that is charged in a total of 1 to 2 stages of reaction. More preferably, it is important to use in the range of 3.3 to 10 moles.
  • the degree of polymerization of each polymer unit of the aryl group-containing cross-linking group type phenol novolak resin and the methylene cross-linking group-containing phenol novolac resin that is, the distribution of n and m becomes narrow. It is preferable for the purpose of the present invention because the molecular weight can be easily controlled and a polymer having a desired melt viscosity can be easily obtained.
  • the two-stage condensation reaction can be carried out according to the one-stage condensation reaction conditions.
  • the amount of the acid catalyst used in the first-stage condensation reaction and the second-stage condensation reaction varies depending on the type, but in the case of oxalic acid, 0.1 to 2.0% by mass with respect to the phenols used.
  • sulfuric acid it is preferable to use about 0.05 to 0.5% by mass, and in the case of paratoluenesulfonic acid, about 0.02 to 0.1% by mass.
  • sulfuric acid or para-toluenesulfonic acid may be used when the second-stage aryl group-containing crosslinking group is reacted with phenols and methylene crosslinking group phenol novolac resin. I like it.
  • the reaction temperature is not particularly limited, but is preferably set in the range of about 60 to 160 ° C. More preferably, it is 80-140 degreeC.
  • the unreacted phenols and the acid catalyst are removed, whereby the low soft spot phenol novolac resin of the present invention can be obtained.
  • the method for removing phenols is generally a method in which heat is applied under reduced pressure or while blowing an inert gas to distill the phenols out of the system.
  • the acid catalyst can be removed by a method such as washing with water.
  • the amounts of raw material phenols, arylene-containing crosslinking group forming compounds and formaldehyde are controlled, and By setting the reaction conditions as described above, a resin having a desired melt viscosity at 150 ° C. can be obtained.
  • the low soft-point phenol novolak resin of the present invention is characterized by the polymerization units of the aryl group-crosslinked phenol novolac resin and the methylene-crosslinked phenol novolak resin in the molecule. It is a structure having both at a fixed ratio, and is suitable as a raw material for epoxy resin having low melt viscosity, high glass transition temperature, low moisture absorption, high adhesion, heat resistance, and flame retardancy.
  • the low soft-point phenol novolak resin of the present invention can be widely used for applications such as binders, coating materials, laminated materials, molding materials, etc., but particularly has a low melt viscosity and a high glass transition temperature. Since it has low hygroscopicity, high adhesion, heat resistance, and flame retardancy, it is particularly suitable for epoxy curing agents for semiconductor encapsulation and printed circuit board insulation.
  • the low soft spot phenol novolac resin of the present invention can be used as a curing agent for epoxy resin as an example.
  • the cured epoxy resin can be obtained by mixing a phenolic polymer, an epoxy resin and a curing accelerator and curing them in a temperature range of 100 to 250 ° C.
  • epoxy resin examples include bisphenol A type epoxy resin, bisphenol F type epoxy resin, cresol novolac type epoxy resin, phenol novolac type epoxy resin, triphenol methane type epoxy resin, Glycidyl ether type epoxy resin such as biphenol-epoxy type epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, halogenated epoxy resin, etc. have two or more epoxy groups in the molecule. And epoxy resin. These epoxy resins may be used alone or in combination of two or more.
  • a known curing accelerator for curing epoxy resin with a phenolic curing agent can be used.
  • curing accelerators include organic phosphine compounds and their boron salts, tertiary amines, quaternary ammonium salts, imidazoles and their tetraphenylpolone salts.
  • triphenylphosphine and 1,8-diazabicyclo (5.4.0) undecene-7 (DBU) are preferred.
  • tetraphenol phosphor derivatives such as tetraphenyl phosphate and tetraphenyl phosphate are preferred, which are heat-latent curing accelerators that exhibit activity when heated. preferable.
  • an inorganic filler In the epoxy resin composition of the present invention, an inorganic filler, a release agent, a colorant, a flame retardant, a low stress agent, or the like can be added or reacted in advance as necessary.
  • inorganic fillers include amorphous silica, crystalline silica, alumina, glass, calcium silicate, gypsum. Calcium carbonate, magnesite, clay, talc, my strength, magnesia, barium sulfate, etc. are preferable, but amorphous silica, crystalline silica, etc. are particularly preferable. It may be the same as the amount used in the epoxy resin composition for semiconductor encapsulation.
  • the alkyl type resin of the present invention has an appropriate amount of phenol novolac resin unit, and when used as an epoxy resin hardener, has a high glass transition temperature, low moisture absorption, high adhesion, heat resistance, In addition, the flame retardancy can be maintained and the viscosity can be reduced.
  • ICI cone plate viscometer MODEL CV—IS manufactured by TOA Kogyo Co., Ltd. was used. Set the ICI viscometer plate temperature to 150 ° C and weigh approximately 0.04 g of the sample. Place the weighed grease on the plate, press it with a cone from the top, and leave it for 90 seconds. Rotate the cone and read its torque value as ICI viscosity.
  • test tube Place the test tube on a gel timer (Toshiba hour meter SFO-304M) with the oil temperature set at 150 ° C, and stir at one rotation per second using a SUS stir bar.
  • a gel timer Toshiba hour meter SFO-304M
  • the viscosity is low and it is liquid, but after a certain period of time, the viscosity of the resin increases rapidly and becomes a gel. The time spent during this period is defined as gel time.
  • Phenolic novolak sachets (Examples and Comparative Examples) synthesized under the conditions shown in Table 1 were hardened.
  • the epoxy resin is epoxidized bi-phenol novolac resin of NC-3000 (softening point 60 ° C, epoxy equivalent 270 g / eq) manufactured by Nippon Yakuhin Co., Ltd.
  • Triphenylphosphine (sometimes abbreviated as TPP) was used as a curing accelerator.
  • the low-soft-point phenol novolak resin of the present invention and the above epoxy resin are blended so that the phenol hydroxyl equivalent ratio and the epoxy equivalent ratio are 1: 1, and the TPP catalyst contains the epoxy resin weight of the blend.
  • test methods for various physical properties of the obtained molded product (cured product) are as follows.
  • Tg TMA method (Thermal Mechanical Analysis) (heating rate 5 ° CZ min)
  • Residual carbon and the oxygen index are in a proportional relationship, and it is generally said that a highly flame-retardant resin has a high residual carbon ratio (see Non-Patent Document 1). Therefore, it was measured as an index of flame retardancy. (Measuring method)
  • the molded body cured with the above composition is cut into 1.5 cm squares and weighed.
  • Residual carbon ratio (%) (weight after calcination weight after ashing) Z sample weight X 100
  • reaction was carried out for 3.5 hours while maintaining the reaction temperature at 165 ° C. During that time, the generated Tanol was distilled off. After completion of the reaction, the obtained reaction solution was cooled and washed with water three times. The oil layer was separated, and unreacted phenol was removed by distillation under reduced pressure to obtain 340 g of phenol monovolak resin (150 ° C melt viscosity: 90 mPa ⁇ s).
  • Table 1 shows the physical properties of the molded novolac resin obtained by the above method.
  • Example 1 According to the method described in Example 1 except that the monomer composition shown in Table 1 was used, phenol nopolac rosin was obtained. The physical properties of each cured product are also shown in Table 1.
  • ICI viscometer plate temperature 150 ° C and weigh approximately 0.04 g of the sample. Place the weighed grease on the plate, press it with a cone from the top, and leave it for 90 seconds. Rotate the cone and read its torque value as ICI viscosity.
  • phenol novolac resin (Examples and Comparative Examples) synthesized under the conditions shown in Table 2 was used as a hardener
  • the epoxy resin used was NC-3000 manufactured by Nippon Gyaku Co., Ltd.
  • An epoxidized biphenyl novolac resin (softening point 60 ° C., epoxy equivalent 270 g / eq), and triphenylphosphine (sometimes abbreviated as TPP) was used as a curing accelerator.
  • the low soft spot phenol resin of the present invention and the above epoxy novolac resin are blended so that the phenol hydroxyl group equivalent ratio and the epoxy equivalent ratio are 1: 1, and the TPP catalyst contains the epoxy resin weight of the blend. ⁇ % Charged.
  • test methods for various physical properties of the obtained molded product (cured product) are as follows.
  • Tg TMA method (Thermal Mechanical Analysis) (heating rate 5 ° CZ min)
  • 2, -di (methoxymethyl) biphenyl (abbreviated as 2, 2, — BMMB) 48 g (0.20 mol), 42% formalin aqueous solution 3.6 g (0.05 mol), 50% sulfuric acid aqueous solution 0 22 g was charged and reacted at 100 ° C for 1 hour.
  • Phenolic novolac resin was synthesized according to the method described in Example 13, except that each monomer was used in the component ratio shown in Table 2. Further, a cured epoxy resin was obtained. Each physical property is shown together in Table 2.
  • a novel phenol novolak resin suitably used as an epoxy resin for laminated board materials, an epoxidized phenol novolak condensate obtained by epoxidizing this phenol novolac resin, and a reaction with a curing agent for epoxy resin.
  • the obtained epoxy resin cured product can be provided.
  • phenol novolac resin containing biphenol-rylene groups can be used as a flame retardant.

Abstract

Disclosed is a low softening point phenol novolac resin characterized by having a constitutional unit represented by the general formulae (1) below and a melt viscosity at 150°C of 20-100 mPa·s. Also disclosed is a method for producing such a low softening point phenol novolac resin. In the formulae (1), R represents at least one divalent arylene group selected from a biphenylene group and a xylylene group represented by the following general formulae (2): and may further contain a constitutional unit represented by the following general formula (3): (wherein R4 represents a hydroxyl group or an alkyl group having 1-6 carbon atoms); m and n represent numbers satisfying m/n = 0.04-20; R1, R2 and R3 may be the same as or different from one another and respectively represent a hydroxyl group or an alkyl group having 1-6 carbon atoms; and p, q and r respectively represent an integer of 0-2.

Description

明 細 書  Specification
低軟化点フエノールノボラック樹脂、その製造方法およびそれを用いたェ ポキシ樹脂硬化物  Low softening point phenol novolac resin, process for producing the same, and cured epoxy resin using the same
技術分野  Technical field
[0001] 本発明は、各種バインダー、コーティング材、積層材、成形材料等に有用な低軟ィ匕 点フエノールノボラック榭脂、その製造方法およびそれを用いたエポキシ榭脂硬化物 に関する。特に半導体封止用、プリント基板絶縁用などのエポキシ榭脂の硬化剤に 好適な、低溶融粘度、高ガラス転移温度、低吸湿性、高密着性、耐熱性、及び難燃 性を兼ね備えた低軟ィ匕点フエノールノボラック榭脂、その製造方法およびそれを用い たエポキシ榭脂硬化物に関する。 背景技術  [0001] The present invention relates to a low soft-point phenol novolak resin useful for various binders, coating materials, laminates, molding materials, and the like, a production method thereof, and an epoxy resin cured product using the same. Particularly suitable for epoxy resin hardeners for semiconductor encapsulation, printed circuit board insulation, etc., low melting viscosity, high glass transition temperature, low moisture absorption, high adhesion, heat resistance, and flame resistance The present invention relates to a soft soft-point phenol novolac resin, a method for producing the same, and a cured epoxy resin using the same. Background art
[0002] 電子材料、特に半導体封止用、プリント基板絶縁用などのエポキシ榭脂硬化剤とし て、各種のフエノール系重合体、例えばフエノールノボラック型榭脂、フエノールァラ ルキル樹脂等が使用されている。し力 近年、半導体パッケージの小型 ·薄型化、多 ピン化、高密度実装化に伴い、より高性能な榭脂が求められている。  [0002] Various phenolic polymers such as phenol novolac resin, phenol alcohol resin, etc. are used as epoxy resin hardeners for electronic materials, particularly for semiconductor encapsulation and printed circuit board insulation. In recent years, as semiconductor packages have become smaller and thinner, more pins, and higher-density packaging, higher performance resin has been demanded.
[0003] BGA (Ball Grid Array)などの片面封止パッケージに用いた場合、パッケージ の反りが小さいという優れた性能を有する。しかし最近の半導体パッケージでは、例 えば BGAの場合、さらなるファインピッチ化や一括封止タイプになり、反りが小さいこ との他に流動性が高 、こと、基板表面との密着性が良 、ことなどが求められて 、る。 また低溶融粘度であれば流動性や密着性が向上し、フィラーも多く配合できるので 半田耐熱性や耐水性の面でも有利になる。即ちこれら封止材への要求特性を満た すために、低溶融粘度、高ガラス転移温度、低吸湿性、高密着性、耐熱性、及び難 燃性を兼ね備えた低軟ィ匕点フエノールノボラック樹脂の出現が強く望まれている。  [0003] When used in a single-side sealed package such as a BGA (Ball Grid Array), it has an excellent performance that the warpage of the package is small. However, in recent semiconductor packages, for example, in the case of BGA, it has become a finer pitch and collective sealing type, and in addition to low warpage, it has high fluidity and good adhesion to the substrate surface. And so on. In addition, low melt viscosity improves fluidity and adhesion and is advantageous in terms of solder heat resistance and water resistance because a large amount of filler can be blended. In other words, in order to satisfy the required properties for these encapsulants, low soft-point phenol novolac resin that combines low melt viscosity, high glass transition temperature, low moisture absorption, high adhesion, heat resistance, and flame retardancy. The appearance of is strongly desired.
[0004] またビルドアップ基板の層間絶縁材にも、耐水性に優れ、高ガラス転移温度で接着 性のよいエポキシ榭脂組成物が望まれており、これを達成するために、元々耐水性 や保存安定性に優れたフエノール系硬化剤で、低溶融粘度、高ガラス転移温度、低 吸湿性、高密着性、耐熱性、及び難燃性を兼ね備えたものが望まれている。 [0005] 電子材料用榭脂材料にはエポキシ榭脂が多く用いられ、そのエポキシ榭脂の硬ィ匕 剤としては各種のフエノールノボラック縮合体、アミン類、酸無水物が使用される。特 に半導体 (IC)封止用エポキシ榭脂の硬化剤としては、耐熱性、信頼性の面からフエ ノ一ル性ノポラック縮合体が主に用いられる。近年、 ICの高集積化、ノ¾ケ一ジの小 型、薄型化、また表面実装方式の適用が進み、その封止用材料には耐熱衝撃性お よび表面実装作業時のソルダリング耐熱性を一層向上させることが要求されて 、る。 ソルダリング耐熱性を左右する大きな要因として、封止用榭脂材料の吸湿性が挙げ られる。すなわち、吸湿した封止用材料は表面実装作業時の高温下で水分の気化 による内圧が発生し、内部剥離やパッケ—ジクラックが発生してソルダリング耐熱性 が劣る。したがって、エポキシ榭脂硬化剤として使用されるフエノール性ノボラック縮 合体は低吸湿性であることが特に要求される。 [0004] In addition, an epoxy resin composition having excellent water resistance and high adhesion at a high glass transition temperature is also desired for an interlayer insulating material for build-up substrates. A phenolic curing agent having excellent storage stability and having low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, and flame retardancy is desired. [0005] Epoxy resin is often used as a resin material for electronic materials, and various phenol novolak condensates, amines, and acid anhydrides are used as a hardener for the epoxy resin. In particular, as a curing agent for epoxy resin for semiconductor (IC) sealing, a phenolic nopolac condensate is mainly used from the viewpoint of heat resistance and reliability. In recent years, high integration of ICs, small size and thinning of the packaging, and the application of surface mounting methods have progressed, and the sealing material has thermal shock resistance and soldering heat resistance during surface mounting work. There is a demand for further improvement. A major factor affecting the soldering heat resistance is the hygroscopicity of the sealing resin material. In other words, the moisture-absorbing sealing material generates an internal pressure due to vaporization of water at a high temperature during the surface mounting operation, causing internal peeling and package cracks, resulting in poor soldering heat resistance. Therefore, the phenolic novolak condensate used as an epoxy resin hardener is particularly required to have low hygroscopicity.
[0006] 封止用材料の吸湿性を低下する方法として、充填材として封止用榭脂材料に充填 される非吸湿性のシリカなどの充填材を増量する方法がある。この場合、ベースの榭 脂材料の粘度が高いと充填材の高充填性が損なわれるので、硬化剤として用いるフ エノール性ノポラック縮合体の粘度が低いことが望まれる。また、封止用材料には耐 熱性、高強度、強靱性、難燃性、接着強さなどが求められる。封止用エポキシ榭脂の 硬化剤としてフエノールノボラック縮合体を用いた従来の封止用榭脂材料では、吸湿 性が比較的高ぐまた他の物性の面からも十分に満足できるものではな力つた。  [0006] As a method of reducing the hygroscopicity of the sealing material, there is a method of increasing the amount of filler such as non-hygroscopic silica filled in the sealing resin material as the filler. In this case, if the viscosity of the base resin material is high, the high filling property of the filler is impaired. Therefore, it is desirable that the phenolic nopolac condensate used as the curing agent has a low viscosity. In addition, the sealing material is required to have heat resistance, high strength, toughness, flame retardancy, adhesive strength, and the like. Conventional sealing resin materials that use phenol novolac condensates as curing agents for sealing epoxy resins are relatively high in hygroscopicity and are not sufficiently satisfactory in terms of other physical properties. I got it.
[0007] そこで、吸湿性、耐熱性、接着性、難燃性などを向上させるために各種のフエノー ルノボラック縮合体が提案されている。例えば、 o クレゾ一ルなどのアルキルフエノ ル類を用いたノボラック縮合体、また、 1 ナフトールなどのナフトール類を用いた ノボラック縮合体がある(例えば、特許文献 1から 3参照)。また、フエノールの縮合剤 としてジ (ヒドロキシプロピル)ビフエ-ルを用いたフエノール性ィ匕合物が開示されてお り(特許文献 4参照)、ビス (メトキシメチル)ビフエ-ル混合物を用いたフエノールノボ ラック縮合体を提案している(特許文献 5参照)。さらに、ホルムアルデヒドを有効に利 用した電子部品封止用エポキシ榭脂成型材料 (特許文献 6参照)が開示されている。 しかし、さらに一層の吸湿性、耐熱性、接着特性、難燃性などが向上した材料が望 まれている。 [0008] 特許文献 1:特開昭 59— 230017号公報 [0007] Therefore, various phenol novolak condensates have been proposed in order to improve hygroscopicity, heat resistance, adhesion, flame retardancy, and the like. For example, there are novolak condensates using alkylphenols such as o cresol, and novolak condensates using naphthols such as 1 naphthol (see, for example, Patent Documents 1 to 3). Also, a phenolic compound using di (hydroxypropyl) biphenyl as a phenol condensing agent has been disclosed (see Patent Document 4), and phenol using a bis (methoxymethyl) biphenyl mixture. A novolak condensate has been proposed (see Patent Document 5). Furthermore, an epoxy resin molding material for electronic component sealing that effectively uses formaldehyde (see Patent Document 6) is disclosed. However, materials with further improved hygroscopicity, heat resistance, adhesive properties, flame retardancy, etc. are desired. [0008] Patent Document 1: Japanese Patent Application Laid-Open No. 59-230017
特許文献 2:特開平 05— 078437号公報  Patent Document 2: Japanese Patent Laid-Open No. 05-0778437
特許文献 3:特開平 05— 086156号公報  Patent Document 3: Japanese Patent Laid-Open No. 05-086156
特許文献 4:特開平 05 - 117350号公報  Patent Document 4: Japanese Patent Laid-Open No. 05-117350
特許文献 5:特開平 08 - 143648号公報  Patent Document 5: Japanese Patent Laid-Open No. 08-143648
特許文献 6:特開昭 63— 022824号公報  Patent Document 6: Japanese Patent Laid-Open No. 63-022284
非特許文献 1 : D. W. van Krevelen, Polymer, 16, 615 (1975)  Non-Patent Document 1: D. W. van Krevelen, Polymer, 16, 615 (1975)
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0009] 本発明の課題は、低溶融粘度、高ガラス転移温度、低吸湿性、高密着性、耐熱性 、及び難燃性などに優れ、特に電気および電子産業用、電子部品の封止用、積層 板材料用のエポキシ榭脂用として好適に用いられる新規なフエノールノボラック榭脂 およびこのフエノールノボラック榭脂をエポキシ化したエポキシ化フエノールノボラック 縮合体およびそれをエポキシ榭脂用硬化剤と反応して得られたエポキシ榭脂硬化物 を提供することにある。 The subject of the present invention is excellent in low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, flame retardancy, etc., especially for electrical and electronic industries, for sealing electronic parts , A novel phenol novolac resin suitably used for epoxy resin for laminated board materials, and an epoxidized phenol novolak condensate obtained by epoxidizing this phenol novolac resin and reacting it with a curing agent for epoxy resin It is in providing the obtained epoxy resin hardened | cured material.
[0010] しかし、低吸湿化のため OH当量を上げるために、ビフエ二ル基の導入率を上げる と、溶融粘度が上昇する。その結果、溶融粘度の上昇により流動性が悪ぐそのため 成形上のトラブルを引き起こす。溶融粘度を下げるために分子量を小さくしたりすると 、ガラス転移温度が下がるとともに成形時の硬化性が低下する。すなわち、低吸湿性 、低溶融粘度、硬化性と高ガラス転移温度の両立は原理的に難しいとされている。 課題を解決するための手段  [0010] However, if the introduction rate of the biphenyl group is increased in order to increase the OH equivalent to reduce moisture absorption, the melt viscosity increases. As a result, the fluidity is poor due to an increase in melt viscosity, causing molding problems. When the molecular weight is decreased to lower the melt viscosity, the glass transition temperature is lowered and the curability at the time of molding is lowered. That is, it is considered that it is difficult in principle to achieve both low hygroscopicity, low melt viscosity, curability and high glass transition temperature. Means for solving the problem
[0011] 本発明者らは、上記ァリール基含有架橋基を持つフエノールノボラック樹脂の低吸 湿性、高密着性、耐熱性物性を生かし、かつ溶融粘度が低いフエノール系硬化剤を 得るために鋭意検討した結果、分子内の架橋基にアルキレン型重合体単位と、フエ ノール'ホルムアルデヒド重合体単位を共に有し、両者の重合度の比を特定範囲に することにより、低溶融粘度で低吸湿性、高密着性、耐熱性の優れた低軟ィ匕点フエノ 一ルノボラック樹脂が得られることを見出し本発明を完成した。 [0011] The present inventors have intensively studied to obtain a phenol-based curing agent having the low hygroscopicity, high adhesion, and heat-resistant physical properties of the phenol novolak resin having an aryl group-containing crosslinking group and having a low melt viscosity. As a result, by having both an alkylene-type polymer unit and a phenol'formaldehyde polymer unit in the cross-linking group in the molecule, and setting the ratio of the degree of polymerization of both in a specific range, low melt viscosity and low hygroscopicity, The present invention was completed by finding that a low soft spot phenolic novolac resin having high adhesion and heat resistance was obtained.
[0012] すなわち本発明は、下記一般式(1):
Figure imgf000006_0001
That is, the present invention provides the following general formula (1):
Figure imgf000006_0001
[0014] 式中、 Rは下記一般式(2)
Figure imgf000006_0002
で示されるビフエ-リレン基及びキシリレン基力 選択される少なくとも 1の 2価のァリ 一レン基を表し、更に下記一般式(3):
[0014] In the formula, R represents the following general formula (2)
Figure imgf000006_0002
The biphenol-xylene group and the xylylene group represented by formula (1) represent at least one divalent arylene group selected from the following general formula (3):
Figure imgf000006_0003
Figure imgf000006_0003
式中、 R4は、ヒドロキシル基又は炭素原子数 1〜6のアルキル基である、 で示される構成単位を含んでいてもよぐ m及び nは、 mZnが 0. 04〜20を満たす 数であり、好ましくは m/nが 0. 05〜9であり、また、
Figure imgf000006_0004
R2及び R3は、同一でも異な つていてもよぐそれぞれ、ヒドロキシル基又は炭素原子数 1から 6個のアルキル基で あり、 P、 q及び rは、それぞれ、 0〜2の整数である、
In the formula, R 4 may be a hydroxyl group or an alkyl group having 1 to 6 carbon atoms, and may include a structural unit represented by: m and n are numbers that satisfy mZn of 0.04 to 20 Preferably, m / n is 0.05 to 9, and
Figure imgf000006_0004
R 2 and R 3, which may be the same or different, are each a hydroxyl group or an alkyl group having 1 to 6 carbon atoms, and P, q, and r are each an integer of 0 to 2 ,
で示される構成単位を有し、 150°Cにおける溶融粘度が 20〜: L00mPa' s、好ましく は 25〜90mPa' sであるである低軟ィ匕点フエノールノボラック榭脂に関する。  And having a melt viscosity at 150 ° C. of 20 to: L00 mPa ′s, preferably 25 to 90 mPa ′s.
[0015] また、本発明は、フエノール類、下記一般式 (4):
Figure imgf000006_0005
式中、 Xはハロゲン原子、ヒドロキシル基又は炭素原子数 1〜6のアルコキシル基を 表す、
[0015] The present invention also provides phenols, the following general formula (4):
Figure imgf000006_0005
In the formula, X represents a halogen atom, a hydroxyl group or an alkoxyl group having 1 to 6 carbon atoms,
で示される置換ビフヱ-レンィ匕合物及び置換ベンゼンィ匕合物の少なくとも 1種、及び ホルムアルデヒドを、酸触媒の存在下で縮合させることを特徴とする上記式(1)で示 される低軟ィ匕点フエノールノボラック樹脂の製造方法に関する。 [0016] 本発明の製造方法においては、更に前記式 (4)の化合物に加え、下記一般式(5) The low softness represented by the above formula (1) is characterized in that at least one of the substituted biphenyl-reny compound and substituted benzene compound represented by formula (II) and formaldehyde are condensed in the presence of an acid catalyst. The present invention relates to a method for producing saddle point phenol novolac resin. In the production method of the present invention, in addition to the compound of the formula (4), the following general formula (5)
Figure imgf000007_0001
Figure imgf000007_0001
式中、 R4は、前記と同義である、 In the formula, R 4 has the same meaning as above.
で示されるベンズアルデヒド化合物を含んで 、てもよ 、。  It may contain a benzaldehyde compound represented by:
[0017] さらに本発明は、上記一般式(1)で示される低軟ィ匕点フ ノールノボラック榭脂を含 有するエポキシ榭脂硬化物に関する。 発明の効果 [0017] Further, the present invention relates to an epoxy resin cured product containing the low soft spot phenol novolac resin represented by the general formula (1). The invention's effect
[0018] 本発明の低軟ィ匕点フエノールノボラック榭脂は、分子内にァリール基含有架橋基型 榭脂及びメチレン基架橋フエノールノボラック樹脂の重合単位を共に有し、両者の重 合度及び両者の重合度の比が特定の範囲である構造とすることにより、エポキシ榭 脂硬化剤に好適な、低溶融粘度、高ガラス転移温度、低吸湿性、高密着性、耐熱性 、及び難燃性を兼ね備えた榭脂である。これにより BGA等、最新の半導体封止材料 に対応でき、エポキシ榭脂硬化剤として利用できる。  [0018] The low soft low point phenol novolak resin of the present invention has both polymer units of the aryl group-containing cross-linked type resin and the methylene group cross-linked phenol novolak resin in the molecule. By adopting a structure in which the ratio of the degree of polymerization is in a specific range, low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, and flame resistance suitable for epoxy resin curing agents are achieved. It is a cohesive oil. This makes it compatible with the latest semiconductor encapsulation materials such as BGA and can be used as an epoxy resin hardener.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0019] 本発明のフエノールノボラック榭脂は、上記一般式(1)で示されるァリール架橋基 含有フエノールノボラック樹脂の重合単位のトータルを n個、メチレン架橋基を含有す るフエノールノボラック樹脂の重合単位のトータルを m個有する共重合タイプの低軟 化点フ ノールノボラック榭脂であり、ブロック共重合体あるいはランダム共重合体で あっても何ら問題はなく、一般式(1)において各重合単位の重合度の mZnの値が 0 . 04〜20、好ましく ίま 0. 05〜9、更に好ましく ίま 0. 09〜6、最も好ましく ίま 0. 1〜2 の榭脂で、かつ、 150°Cにおける溶融粘度が 20〜: L00mPa' s、好ましくは 25〜98 mPa' sの榭脂である。また、上記構成単位(3)を含まない場合にも、各重合単位の 重合度の m/nの値力 ^0. 04〜20、好ましく ίま 0. 05〜9、更に好ましく ίま 0. 09〜6、 最も好ましくは 0. 1〜2の榭脂で、かつ、 150°Cにおける溶融粘度は 20〜: LOOmPa' sが好ましぐより好ましくは 25〜98mPa' s、更に好ましくは 30〜95mPa' sである。 [0020] 本発明の低軟ィ匕点フエノールノボラック榭脂においては、 mZnが 20を超えるとガラ ス転移温度が低くなり、さらに難燃性が低下する傾向が認められ好ましくない。一方、 mZnが 0. 04未満では溶融粘度が上昇し流動性が悪くなり好ましくな 、。 [0019] The phenol novolac resin of the present invention is a polymerization unit of a phenol novolac resin containing n total methylene crosslinking units of a phenol novolac resin containing a phenol crosslinking group represented by the general formula (1) and a methylene crosslinking group. It is a copolymer type low softening point phenol novolac resin having a total of m, and there is no problem even if it is a block copolymer or a random copolymer. The degree of polymerization of mZn is 0.04 to 20, preferably ί or 0.05 to 9, more preferably ί or 0.09 to 6, most preferably ί or 0.1 to 2, and 150 °. A resin having a melt viscosity in C of 20 to: L00 mPa's, preferably 25 to 98 mPa's. Even when the above structural unit (3) is not included, the m / n value of the degree of polymerization of each polymerization unit ^ 0.04 to 20, preferably ί or 0.05 to 9, more preferably ί or 0.00. 09 to 6, most preferably 0.1 to 2 and the melt viscosity at 150 ° C is 20 to: more preferably LOOmPa's, more preferably 25 to 98 mPa's, more preferably 30 to 95mPa's. In the low soft spot phenol novolac resin of the present invention, when mZn exceeds 20, the glass transition temperature is lowered, and further, the flame retardancy tends to be reduced, which is not preferable. On the other hand, if mZn is less than 0.04, the melt viscosity increases and the fluidity deteriorates, which is preferable.
[0021] 本発明で使用するフエノール類は、一般式(1)で記載のとおり、ベンゼン環にヒドロ キシル基を少なくとも 1個有し、 R\ R2または R3で置換されていてもよいフエノール類 である。ここで、 R1 R2及び R3は、同一でも異なっていてもよぐ複数の R1 R2及び R3 は、それぞれ、同一でも異なっていてもよぐそれぞれ、ヒドロキシル基または炭素原 子数 1から 6個のアルキル基であり、 p、 q及び rは、それぞれ、 0〜2の整数からなる置 換基群である。アルキル基としては、例えば、メチル基、ェチル基、プロピル基、ブチ ル基、ペンチル基、へキシル基等の直鎖又は分岐の炭素原子数 1〜6のアルキル基 が挙げられ、これらは各種異性体をも含む。 [0021] phenols used in the present invention, as described in the general formula (1), having at least one hydro hexyl group on the benzene ring, optionally substituted with R \ R 2 or R 3 phenol It is kind. Here, R 1 R 2 and R 3 may be the same or different, and a plurality of R 1 R 2 and R 3 may be the same or different, respectively. 1 to 6 alkyl groups, and p, q and r are each a substituent group consisting of an integer of 0 to 2. Examples of the alkyl group include linear or branched alkyl groups having 1 to 6 carbon atoms such as methyl group, ethyl group, propyl group, butyl group, pentyl group, and hexyl group. Including body.
これらのフエノール類は、単独でも 2種以上を混合して用いても何ら問題はな 、。 具体的なフエノール類としては、例えばフエノール、クレゾール、ェチルフエノール、 プロピノレフエノーノレ、ブチノレフエノーノレ、へキシノレフエノーノレ、キシレノーノレ、ブチノレメ チルフエノール等の 0〜2個の炭素原子数 1〜6のアルキル基で置換された 1価フエノ ールの他、カテコール、レゾルシン、ハイドロキノン等の 2個のヒドロキシル基で置換さ れた 2価フエノールも挙げられる力 特にフエノールが好ましい。  These phenols can be used alone or in admixture of two or more. Specific phenols include, for example, 0 to 2 carbon atoms such as phenol, cresol, ethyl phenol, propino enoenole, butino enoenole, hexeno enoenore, xylenenole, butino methenophenol, etc. In addition to monovalent phenol substituted with 6 alkyl groups, divalent phenol substituted with 2 hydroxyl groups such as catechol, resorcin, hydroquinone and the like.
[0022] 本発明でメチレン架橋基を形成する化合物としては、ホルムアルデヒドが好適に挙 げられる。さらにホルムアルデヒドの形態としては、特に制限はないが、ホルムアルデ ヒド水溶液、及びパラホルムアルデヒド、トリオキサンなど酸存在下で分解してホルム アルデヒドとなる重合物を用いることもできる。  [0022] The compound that forms a methylene crosslinking group in the present invention is preferably formaldehyde. Further, the form of formaldehyde is not particularly limited, and a formaldehyde aqueous solution and a polymer that decomposes in the presence of an acid such as paraformaldehyde and trioxane to formaldehyde can also be used.
好ましくは、取り扱いの容易なホルムアルデヒド水溶液であり、市販品の 42%ホル ムアルデヒド水溶液をそのまま使用することもできる。  Preferred is an aqueous formaldehyde solution that is easy to handle, and a commercially available 42% aqueous formaldehyde solution can be used as it is.
[0023] 本発明で使用するァリール基含有架橋基 Rは、前記一般式 (2)及び (3)で示される 2価のァリーレン基が挙げられる。  [0023] The aryl group-containing crosslinking group R used in the present invention includes a divalent arylene group represented by the general formulas (2) and (3).
このような 2価のァリーレン基としては、例えば、 4, 4,ービフエ-リレン基、 3, 3, 一 ビフエ-リレン基、 2, 2, 一ビフエ-リレン基、 2, 4, 一ビフエ-リレン基、 1, 4—キシリ レン基、 1, 3—キシリレン基、 1, 2—キシリレン基等が挙げられる。これらの中でも、 本発明においては、特に、 4, 4,ービフエ-リレン基、 1, 4 キシリレン基が好ましい 上記置換基に導くための具体的なァリール基含有架橋基形成用化合物としては、 例えば、前記一般式 (4)及び(5)で示される化合物が挙げられる。 Such divalent arylene groups include, for example, 4, 4, bibiphenylene, 3, 3, 1 biphenylylene, 2, 2, 1 biphenylylene, 2, 4, 1 biphenylylene. Group, 1,4-xylylene group, 1,3-xylylene group, 1,2-xylylene group and the like. Among these, In the present invention, a 4,4, bibi-rylene group and a 1,4 xylylene group are particularly preferred. Specific examples of the aryl group-containing crosslinking group-forming compound for leading to the substituent include, for example, the above general formula ( Examples thereof include compounds represented by 4) and (5).
前記一般式 (4)及び(5)において、 Xはハロゲン原子、ヒドロキシル基または炭素原 子数 1から 6のアルコキシル基であり、 R4はヒドロキシル基または炭素原子数 1から 6 個のアルキル基である。ここで、ハロゲン原子としては、例えば、フッ素原子、塩素原 子、臭素原子及びヨウ素原子が挙げられるが、塩素原子が好ましい。アルコキシル基 としては、例えば、メトキシル基、エトキシル基、プロポキシル基、ブトキシル基、ペン チルォキシル基、へキシルォキシル基等の直鎖又は分岐の炭素原子数 1〜6のアル コキシル基が挙げられ、これらは各種異性体をも含む。アルキル基としては、前記し たものが挙げられる。 In the general formulas (4) and (5), X is a halogen atom, a hydroxyl group or an alkoxyl group having 1 to 6 carbon atoms, and R 4 is a hydroxyl group or an alkyl group having 1 to 6 carbon atoms. is there. Here, examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a chlorine atom is preferable. Examples of the alkoxyl group include linear or branched alkoxyl groups having 1 to 6 carbon atoms such as methoxyl group, ethoxyl group, propoxyl group, butoxyl group, pentyloxyl group, hexyloxyl group, and the like. Also includes various isomers. Examples of the alkyl group include those described above.
上記置換基に導くための具体的な化合物としては、例えば、 4, 4'ージ (メトキシメ チル)ビフエ-ル、 2, 2,ージ (メトキシメチル)ビフエ-ル、 2, 4,ージ (メトキシメチル) ビフエ-ル等のジ(アルコキシメチル)ビフエ-ル化合物、 4. 4,ージ(クロロメチル)ビ フエ-ル、 2, 2,ージ(クロロメチル)ビフエ-ル、 2, 4,ージ(クロロメチル)ビフエ-ル 等のジ(ノヽ口ゲノメチル)ビフエ-ル化合物、 4, 4,ージ(ヒドロキシメチル)ビフエ-ル、 2, 2'—ジ(ヒドロキシメチル)ビフエ-ル、 2, 4'—ジ(ヒドロキシメチル)ビフエ-ル等 のジ(ヒドロキシメチル)ビフエ-ル化合物、 1, 4ージ (メトキシメチル)ベンゼン、 1, 3 ジ(メトキシメチル)ベンゼン、 1 , 2—ジ (メトキシメチル)ベンゼン等のジ(アルコキシ メチル)ベンゼン化合物、 1, 4 ジ(クロロメチル)ベンゼン、 1, 3 ジ(クロロメチル) ベンゼン、 1, 2—ジ(クロロメチル)ベンゼン等のジ(ノヽ口ゲノメチル)ベンゼン化合物、 1, 4ージ(ヒドロキシメチル)ベンゼン、 1, 3 ジ(ヒドロキシメチル)ベンゼン、 1, 2— ジ(ヒドロキシメチル)ベンゼン等のジ(ヒドロキシメチル)ベンゼン化合物、ベンズアル デヒド、 2 ヒドロキシベンズアルデヒド、 3 ヒドロキシベンズアルデヒド、 4ーヒドロキ シベンズアルデヒド等のヒドロキシベンズアルデヒド化合物、 2—メチルベンズアルデ ヒド、 3—メチルベンズアルデヒド、 4 メチルベンズアルデヒド等のアルキルべンズァ ルデヒド化合物等が挙げられる。 これら異性体においては、単独でも混合して使用することもできる力 好ましくは異 性体の混合物として使用した場合である。 Specific compounds for leading to the above substituents include, for example, 4,4'-di (methoxymethyl) biphenyl, 2,2, -di (methoxymethyl) biphenyl, 2,4, di Di (alkoxymethyl) biphenyl compounds such as (methoxymethyl) biphenyl, 4.4, -di (chloromethyl) biphenyl, 2,2, -di (chloromethyl) biphenyl, 2, Di (Noguchigenomethyl) biphenyl compounds such as 4, -di (chloromethyl) biphenyl, 4, 4, -di (hydroxymethyl) biphenyl, 2, 2'-di (hydroxymethyl) biphenyl Di (hydroxymethyl) biphenyl compounds such as 2,4'-di (hydroxymethyl) biphenyl, 1,4-di (methoxymethyl) benzene, 1,3 di (methoxymethyl) benzene, Di (alkoxymethyl) benzene compounds such as 2-di (methoxymethyl) benzene, 1,4 di Chloromethyl) benzene, 1,3 di (chloromethyl) benzene, 1,2-di (chloromethyl) benzene and other di (no-necked genomethyl) benzene compounds, 1,4-di (hydroxymethyl) benzene, 1, 3 Di (hydroxymethyl) benzene, 1, 2— Di (hydroxymethyl) benzene compounds such as di (hydroxymethyl) benzene, benzaldehyde, 2 hydroxybenzaldehyde, 3 hydroxybenzaldehyde, 4-hydroxybenzaldehyde compounds such as 4-hydroxybenzaldehyde, 2— Examples thereof include alkylbenzaldehyde compounds such as methylbenzaldehyde, 3-methylbenzaldehyde, and 4-methylbenzaldehyde. These isomers can be used alone or as a mixture, preferably when used as a mixture of different isomers.
さらに好ましくは、ビフエ-リレンィ匕合物および Zまたはキシリレンィ匕合物の異性体 混合物である。  More preferably, it is an isomer mixture of a biphenol-renylene compound and a Z or xylylene compound.
ビフエ-リレンィ匕合物および Zまたはキシリレンィ匕合物の異性体混合では、 1, 4 体と 4, 4'一体が、少なくとも 50モル%以上含む場合力 最も好ましい。  In the mixture of isomers of Bihue-Rylene compound and Z or Xylylene compound, the power is most preferable when 1,4 and 4,4 ′ monomers contain at least 50 mol%.
しかし、混合して使用する場合では、その混合比率は、 4, 4'—ビフエニリレン基 1 モルに対して 20〜50モル0 /0で 1, 4 キシリレン基を使用するのが好ましい。 However, in the case of using as a mixture, the mixture ratio is 4, 4'Bifueniriren groups 20 to 50 mol 0/0 relative to 1 mol 1, 4 is preferable to use a xylylene group.
[0024] [低軟ィ匕点フエノールノボラック樹脂の製造方法] [0024] [Method for producing low soft saddle point phenol novolac resin]
Figure imgf000010_0001
Figure imgf000010_0001
[0026] 一般式(1)で示される低軟化点フエノールノボラック樹脂の製造方法は、酸触媒存 在下、一定量のフエノール類に対して、 n倍モルの R、即ち、ァリール基含有架橋基 形成用化合物と、 m倍モルのホルムアルデヒドを同時に添加して 1段の縮合反応で 行うことができる。  [0026] The method for producing a low softening point phenol novolak resin represented by the general formula (1) is capable of forming n-fold moles of R, ie, an aryl group-containing crosslinking group, with respect to a certain amount of phenols in the presence of an acid catalyst. It can be carried out in a single-stage condensation reaction by simultaneously adding the compound for use and m-fold mol of formaldehyde.
この場合は、ァリール基含有架橋基形成用化合物及びホルムアルデヒドの合計 1モ ル〖こ対し、好ましくはフエノール類を 2〜 10倍モル、より好ましくは 3〜6倍モル、更に 好ましくは 4モル以上で使用すると共に、反応温度を低温 (例えば、 100°C前後)にて フエノール類とホルムアルデヒドの反応を優先的に行な 、、主として低分子量のメチ レン架橋基含有のフエノールノボラック榭脂を形成させ、次 、で昇温または触媒を増 量してメチレン架橋基含有フエノールノボラック榭脂、ァリール基含有架橋基形成用 化合物及びフエノール類を反応させる方式を採用するのが好ましい。  In this case, the total amount of the aryl group-containing crosslinking group-forming compound and formaldehyde is preferably 1 mol, preferably 2 to 10 mol, more preferably 3 to 6 mol, and even more preferably 4 mol or more of phenols. When used, the reaction between phenols and formaldehyde is preferentially performed at a low reaction temperature (for example, around 100 ° C) to mainly form a phenolic novolac resin containing a low molecular weight methylene crosslinking group, Next, it is preferable to employ a system in which the temperature is increased or the catalyst is increased to react the methylene crosslinking group-containing phenol novolak resin, the arylene-containing crosslinking group-forming compound, and the phenols.
用いる酸触媒としては、特に限定はなぐ塩酸、蓚酸、硫酸、リン酸等の無機酸、パ ラトルエンスルホン酸等の有機酸など、公知のものを単独であるいは 2種以上併用し て使用することができる力 硫酸、蓚酸又はパラトルエンスルホン酸が特に好ましい。 縮合反応の温度は、低温条件としては 50〜120°C、好ましくは 80〜110°Cであり、 昇温時での反応温度は 130〜230°C、好ましくは 150〜200°Cである。 The acid catalyst to be used is not particularly limited, and known acids such as hydrochloric acid, succinic acid, sulfuric acid, phosphoric acid and the like, and organic acids such as paratoluenesulfonic acid may be used alone or in combination of two or more. Particularly preferred is sulfuric acid, succinic acid or paratoluenesulfonic acid. The temperature of the condensation reaction is 50 to 120 ° C, preferably 80 to 110 ° C as a low temperature condition. The reaction temperature at the time of raising the temperature is 130 to 230 ° C, preferably 150 to 200 ° C.
縮合反応の時間は、反応温度や使用する触媒の種類および量により変動するが、 The time for the condensation reaction varies depending on the reaction temperature and the type and amount of catalyst used.
1〜24時間程度である。 About 1 to 24 hours.
反応圧力は、通常、常圧下にて行うが、若干の加圧下あるいは減圧下にて実施し ても何ら問題はない。  The reaction pressure is usually carried out under normal pressure, but there is no problem even if it is carried out under a slight pressure or reduced pressure.
ァリール基含有架橋基形成用化合物とホルムアルデヒドの合計 1モルに対しフエノ ール類の使用量を 2モル未満にするなど、上述の反応条件から大きく逸脱した場合 には高分子量で溶融粘度の高 、フエノールノボラック樹脂し力得られな 、場合があり 好ましくない。  If the amount of phenol used is less than 2 moles per mole of total aryl group-containing crosslinking group-forming compound and formaldehyde, such as when the molecular weight is high, the melt viscosity is high. In some cases, phenol novolac resin cannot be obtained.
そのため、本発明の低軟ィ匕点フエノールノボラック榭脂は、酸触媒の存在下で予め フエノール類とホルムアルデヒドを縮合させ、次 ヽで Rのァリール基含有架橋基形成 用化合物を添加して縮合させる 2段の縮合反応で製造することもできる。このような 2 段の縮合反応では、 2段目の反応において新たにフエノール類を添加することができ る.この場合も 1段反応の場合と同様にフエノール類を過剰に使用することが好まし い。例えば、 1段目の反応においてホルムアルデヒド 1モルに対してフエノール類を 2 . 5モル以上、より好ましくは 3. 3〜10モル存在させ、 2段目の反応において追加す るァリール基含有架橋基形成用化合物及びフエノール類は、 1〜2段反応のトータル で仕込むァリール基含有架橋基形成用化合物とホルムアルデヒドの合計 1モルに対 して、 1〜2段のトータルで仕込むフエノール類が 3モル以上、より好ましくは 3. 3〜1 0モルの範囲で使用することが重要である。  Therefore, the low soft-point phenol novolac resin of the present invention condenses phenols and formaldehyde in the presence of an acid catalyst in advance, and then condenses by adding an R aryl group-containing cross-linking group forming compound. It can also be produced by a two-stage condensation reaction. In such a two-stage condensation reaction, phenols can be newly added in the second-stage reaction, and it is preferable to use excessive phenols in this case as well as in the first-stage reaction. Yes. For example, in the first stage reaction, phenols are present in an amount of 2.5 moles or more, more preferably 3.3 to 10 moles per mole of formaldehyde, and an aryl group-containing cross-linking group is added in the second stage reaction. The total amount of phenols to be fed in 1 to 2 stages is 3 moles or more, compared to 1 mole in total of the aryl group-containing cross-linking group forming compound and formaldehyde that is charged in a total of 1 to 2 stages of reaction. More preferably, it is important to use in the range of 3.3 to 10 moles.
このような 2段の縮合反応で行うと、ァリール基含有架橋基型フエノールノボラック榭 脂及びメチレン架橋基含有フエノールノボラック樹脂の各重合単位の重合度、すなわ ち n及び mの分布が狭くなり、分子量のコントロールが容易となり、所望の溶融粘度の 重合体が得やすいので、本発明の目的のためには好ましい。  When such a two-stage condensation reaction is performed, the degree of polymerization of each polymer unit of the aryl group-containing cross-linking group type phenol novolak resin and the methylene cross-linking group-containing phenol novolac resin, that is, the distribution of n and m becomes narrow, It is preferable for the purpose of the present invention because the molecular weight can be easily controlled and a polymer having a desired melt viscosity can be easily obtained.
2段階の縮合反応の一例を次の反応式に示す。
Figure imgf000012_0001
An example of a two-stage condensation reaction is shown in the following reaction formula.
Figure imgf000012_0001
(A)  (A)
Figure imgf000012_0002
Figure imgf000012_0002
[0030] 2段階の縮合反応は、 1段の縮合反応条件に準じて実施することができる。 [0030] The two-stage condensation reaction can be carried out according to the one-stage condensation reaction conditions.
前記 1段縮合反応及び 2段縮合反応における酸触媒の使用量は、その種類によつ ても異なるが、使用するフエノール類に対して、蓚酸の場合は 0. 1〜2. 0質量%程 度、硫酸の場合は 0. 05〜0. 5質量%程度、またパラトルエンスルホン酸の場合は 0 . 02-0. 1質量%程度使用するのがよい。とくに 2段縮合反応を行なう場合では、 2 段目のァリール基含有架橋基をフエノール類及びメチレン架橋基フエノールノボラッ ク榭脂と反応させる際には、硫酸又はパラトルエンスルホン酸を使用することが好まし い。また、反応温度はとくに限定はないが、 60〜160°C程度の範囲に設定するのが 好ましい。より好ましくは、 80〜140°Cである。  The amount of the acid catalyst used in the first-stage condensation reaction and the second-stage condensation reaction varies depending on the type, but in the case of oxalic acid, 0.1 to 2.0% by mass with respect to the phenols used. In the case of sulfuric acid, it is preferable to use about 0.05 to 0.5% by mass, and in the case of paratoluenesulfonic acid, about 0.02 to 0.1% by mass. In particular, when a two-stage condensation reaction is performed, sulfuric acid or para-toluenesulfonic acid may be used when the second-stage aryl group-containing crosslinking group is reacted with phenols and methylene crosslinking group phenol novolac resin. I like it. The reaction temperature is not particularly limited, but is preferably set in the range of about 60 to 160 ° C. More preferably, it is 80-140 degreeC.
[0031] 酸触媒の存在下で縮合反応させた後、未反応のフエノール類及び酸触媒を除去 することにより、本発明の低軟ィ匕点フエノールノボラック榭脂を得ることができる。 フエノール類の除去方法は、減圧下あるいは不活性ガスを吹き込みながら熱をかけ 、フエノール類を蒸留し系外へ除去する方法が一般的である。酸触媒の除去は、水 洗などの洗浄による方法が挙げられる。  [0031] After the condensation reaction in the presence of an acid catalyst, the unreacted phenols and the acid catalyst are removed, whereby the low soft spot phenol novolac resin of the present invention can be obtained. The method for removing phenols is generally a method in which heat is applied under reduced pressure or while blowing an inert gas to distill the phenols out of the system. The acid catalyst can be removed by a method such as washing with water.
[0032] 本発明の低軟ィ匕点フエノールノボラック樹脂の製造方法にぉ 、て、原料のフエノー ル類、ァリール基含有架橋基形成用化合物及びホルムアルデヒドの使用量をコント口 ールするとともに、上記のように反応条件を設定することにより、所望の 150°Cにおけ る溶融粘度を有する榭脂を得ることができる。  [0032] In the method for producing the low soft point phenol novolak resin of the present invention, the amounts of raw material phenols, arylene-containing crosslinking group forming compounds and formaldehyde are controlled, and By setting the reaction conditions as described above, a resin having a desired melt viscosity at 150 ° C. can be obtained.
[0033] 本発明の低軟ィ匕点フエノールノボラック榭脂は、分子内にァリール基架橋型のフエ ノールノボラック榭脂及びメチレン架橋型のフエノールノボラック樹脂の重合単位を特 定の割合で共に有する構造であり、低溶融粘度、高ガラス転移温度、低吸湿性、高 密着性、耐熱性、及び難燃性を兼ね備えたエポキシ榭脂用の原料に適している。 [0033] The low soft-point phenol novolak resin of the present invention is characterized by the polymerization units of the aryl group-crosslinked phenol novolac resin and the methylene-crosslinked phenol novolak resin in the molecule. It is a structure having both at a fixed ratio, and is suitable as a raw material for epoxy resin having low melt viscosity, high glass transition temperature, low moisture absorption, high adhesion, heat resistance, and flame retardancy.
[0034] さらに、本発明の低軟ィ匕点フエノールノボラック榭脂は、バインダー、コーティング材 、積層材、成形材料等の用途に広く使用できるが、特に低溶融粘度で、しかも高ガラ ス転移温度、低吸湿性、高密着性、耐熱性、及び難燃性を有するところから、特に、 半導体封止用、プリント基板絶縁用などのエポキシ用硬化剤に好適である。  [0034] Further, the low soft-point phenol novolak resin of the present invention can be widely used for applications such as binders, coating materials, laminated materials, molding materials, etc., but particularly has a low melt viscosity and a high glass transition temperature. Since it has low hygroscopicity, high adhesion, heat resistance, and flame retardancy, it is particularly suitable for epoxy curing agents for semiconductor encapsulation and printed circuit board insulation.
[0035] [エポキシ榭脂硬化物]  [0035] [Epoxy resin hardened product]
本発明の低軟ィ匕点フエノールノボラック榭脂は、一例としてエポキシ榭脂用硬化剤 として用いることができる。エポキシ榭脂硬化物はフエノール系重合体とエポキシ榭 脂及び硬化促進剤を混合し、 100〜250°Cの温度範囲で硬化させることにより得ら れる。  The low soft spot phenol novolac resin of the present invention can be used as a curing agent for epoxy resin as an example. The cured epoxy resin can be obtained by mixing a phenolic polymer, an epoxy resin and a curing accelerator and curing them in a temperature range of 100 to 250 ° C.
[0036] エポキシ榭脂としては、例えばビスフエノール A型エポキシ榭脂、ビスフエノール F 型エポキシ榭脂、クレゾ一ルノボラック型エポキシ榭脂、フエノールノボラック型ェポキ シ榭脂、トリフエノールメタン型エポキシ榭脂、ビフエ-ノレ型エポキシ榭 S旨などのグリシ ジルエーテル型エポキシ榭脂、グリシジルエステル型エポキシ榭脂、グリシジルァミン 型エポキシ榭脂、ハロゲンィ匕エポキシ榭脂など、分子中にエポキシ基を二個以上有 するエポキシ榭脂が挙げられる。これらエポキシ榭脂は単独で使用しても、 2種類以 上を併用してもよい。  Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, cresol novolac type epoxy resin, phenol novolac type epoxy resin, triphenol methane type epoxy resin, Glycidyl ether type epoxy resin such as biphenol-epoxy type epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, halogenated epoxy resin, etc. have two or more epoxy groups in the molecule. And epoxy resin. These epoxy resins may be used alone or in combination of two or more.
[0037] (硬化促進剤) [0037] (Curing accelerator)
硬化促進剤としては、エポキシ榭脂をフエノール系硬化剤で硬化させるための公知 の硬化促進剤を用いることが出来る。このような硬化促進剤としては例えば有機ホス フィンィ匕合物およびそのボロン塩、 3級ァミン、 4級アンモ-ゥム塩、イミダゾール類及 びそのテトラフエ-ルポロン塩などを挙げることができる力 この中でも、硬化性ゃ耐 湿性の点から、トリフエ-ルホスフィン及び 1, 8—ジァザビシクロ(5. 4. 0)ゥンデセン — 7 (DBU)が好ましい。また、より高流動性にするためには、加熱により活性が発現 する熱潜在性の硬化促進剤がより好ましぐテトラフエ-ルホスフォ-ゥム 'テトラフエ -ルボレートなどのテトラフエ-ルホスフォ-ゥム誘導体が好ましい。  As the curing accelerator, a known curing accelerator for curing epoxy resin with a phenolic curing agent can be used. Examples of such curing accelerators include organic phosphine compounds and their boron salts, tertiary amines, quaternary ammonium salts, imidazoles and their tetraphenylpolone salts. From the viewpoint of curability and moisture resistance, triphenylphosphine and 1,8-diazabicyclo (5.4.0) undecene-7 (DBU) are preferred. In order to achieve higher fluidity, tetraphenol phosphor derivatives such as tetraphenyl phosphate and tetraphenyl phosphate are preferred, which are heat-latent curing accelerators that exhibit activity when heated. preferable.
[0038] (その他添加剤) 本発明のエポキシ榭脂組成物には、必要に応じて、無機充填剤、離型剤、着色剤 、難燃剤、低応力剤等を、添加または予め反応して用いることができる。とくに半導体 封止用に使用する場合は、無機充填剤の添カ卩は必須である.このような無機充填剤 の例として、非晶性シリカ、結晶性シリカ、アルミナ、ガラス、珪酸カルシウム、石膏、 炭酸カルシウム、マグネサイト、クレー、タルク、マイ力、マグネシア、硫酸バリウムなど を挙げることができるが、とくに非晶性シリカ、結晶性シリカなどが好ましい.これら添 加剤の使用量は、従来の半導体封止用エポキシ榭脂組成物における使用量と同様 でよい。 [0038] (Other additives) In the epoxy resin composition of the present invention, an inorganic filler, a release agent, a colorant, a flame retardant, a low stress agent, or the like can be added or reacted in advance as necessary. In particular, when used for semiconductor encapsulation, it is essential to add inorganic fillers. Examples of such inorganic fillers include amorphous silica, crystalline silica, alumina, glass, calcium silicate, gypsum. Calcium carbonate, magnesite, clay, talc, my strength, magnesia, barium sulfate, etc. are preferable, but amorphous silica, crystalline silica, etc. are particularly preferable. It may be the same as the amount used in the epoxy resin composition for semiconductor encapsulation.
[0039] 本発明のアルキル型榭脂は適当量のフエノールノボラック榭脂単位を有し、ェポキ シ榭脂硬化剤として用いた場合、高ガラス転移温度、低吸湿性、高密着性、耐熱性 、及び難燃性を維持し、しかも低粘度化を実現させることができる。  [0039] The alkyl type resin of the present invention has an appropriate amount of phenol novolac resin unit, and when used as an epoxy resin hardener, has a high glass transition temperature, low moisture absorption, high adhesion, heat resistance, In addition, the flame retardancy can be maintained and the viscosity can be reduced.
実施例  Example
[0040] 以下に実施例を挙げて、本発明を具体的に説明する。なお本発明で得られたフ ノールノボラック榭脂の評価方法を示す。  [0040] The present invention will be specifically described below with reference to examples. In addition, the evaluation method of the phenol novolak rosin obtained by this invention is shown.
[0041] (l) ICI粘度の測定 [0041] (l) Measurement of ICI viscosity
ICIコーンプレート粘度計: TOA工業 (株) MODEL CV— ISを使用した。 ICI粘度計のプレート温度を 150°Cに設定し、試料を約 0. 04g秤量する。 プレート部に秤量した榭脂を置き、上部よりコーンで押えつけ、 90sec放置する。 コーンを回転させて、そのトルク値を ICI粘度として読み取る。  ICI cone plate viscometer: MODEL CV—IS manufactured by TOA Kogyo Co., Ltd. was used. Set the ICI viscometer plate temperature to 150 ° C and weigh approximately 0.04 g of the sample. Place the weighed grease on the plate, press it with a cone from the top, and leave it for 90 seconds. Rotate the cone and read its torque value as ICI viscosity.
(2)ゲルタイムの測定  (2) Measurement of gel time
エポキシ榭脂とフエノール榭脂を 1: 1の当量になるように試験管に仕込み、さらに T ppをエポキシに対して 0. lwt%になるよう計量し、試験管に仕込む。  Add epoxy resin and phenol resin to the test tube so that the equivalent of 1: 1, and weigh T pp to 0.1 wt% with respect to the epoxy and add to the test tube.
油温を 150°Cに設定したゲルタイマー (東芝時間計 SFO— 304M)に試験管を設 置し、 SUS攪拌棒を使い、 1秒間に 1回転で攪拌する。  Place the test tube on a gel timer (Toshiba hour meter SFO-304M) with the oil temperature set at 150 ° C, and stir at one rotation per second using a SUS stir bar.
はじめは粘度が低く液状であるが、一定時間経過すると、榭脂の粘度が急激に上 昇し、ゲル状となる。この間にカゝかった時間をゲルタイムとする。  At first, the viscosity is low and it is liquid, but after a certain period of time, the viscosity of the resin increases rapidly and becomes a gel. The time spent during this period is defined as gel time.
この時間が短!、ほど、硬化性が良好と!/、う指標になる。  The shorter this time is, the better the curability is!
[0042] 表 1に示した条件で合成したフエノールノボラック榭脂(実施例および比較例)を硬 ィ匕剤として使用した場合、対するエポキシ榭脂は、日本ィ匕薬 (株)製 NC— 3000 (軟 化点 60°C、エポキシ等量 270g/eq)のエポキシ化ビフエ-ルノボラック榭脂であり、 硬化促進剤としてトリフエニルホスフィン (TPPと略記することもある。 )を使用した。 本発明の低軟ィ匕点フエノールノボラック榭脂および上記エポキシ榭脂を、フエノー ル水酸基当量とエポキシ当量比が 1: 1となるように配合し、 TPP触媒は、該配合のェ ポキシ榭脂重量に対して^%仕込んだ。これらを、 150°Cに加熱して溶融混合し、 真空脱泡した後に 150°Cの金型 (厚さ 4mm)に注型し、 150°C、 3時間で硬化させた 後、さらに 180°C、 5時間かけて硬化して成形体を試作した。 [0042] Phenolic novolak sachets (Examples and Comparative Examples) synthesized under the conditions shown in Table 1 were hardened. When used as a softener, the epoxy resin is epoxidized bi-phenol novolac resin of NC-3000 (softening point 60 ° C, epoxy equivalent 270 g / eq) manufactured by Nippon Yakuhin Co., Ltd. Triphenylphosphine (sometimes abbreviated as TPP) was used as a curing accelerator. The low-soft-point phenol novolak resin of the present invention and the above epoxy resin are blended so that the phenol hydroxyl equivalent ratio and the epoxy equivalent ratio are 1: 1, and the TPP catalyst contains the epoxy resin weight of the blend. ^% Charged. These are melt-mixed by heating to 150 ° C, vacuum degassed, cast into a 150 ° C mold (thickness 4 mm), cured at 150 ° C for 3 hours, and then further 180 ° C. Cured over 5 hours to make a molded product.
得られた成形体 (硬化物)の各種物性の試験方法は次の通り。  The test methods for various physical properties of the obtained molded product (cured product) are as follows.
(3) Tg :TMA法(Thermal Mechanical Analysis、熱機械分析法)(昇温速度 5 °CZ分)  (3) Tg: TMA method (Thermal Mechanical Analysis) (heating rate 5 ° CZ min)
(4)吸水率 : 24時間煮沸法、  (4) Water absorption rate: 24 hours boiling method,
(5)残炭率  (5) Residual coal rate
残炭素と酸素指数とは比例関係にあり、一般的に難燃性の高い榭脂は、残炭率が 高いと言われている (非特許文献 1参照)。よって、難燃性の指標として測定した。 (測定方法)  Residual carbon and the oxygen index are in a proportional relationship, and it is generally said that a highly flame-retardant resin has a high residual carbon ratio (see Non-Patent Document 1). Therefore, it was measured as an index of flame retardancy. (Measuring method)
上記の配合で硬化させた成形体を 1. 5cm角に切断し、重量を測定する。  The molded body cured with the above composition is cut into 1.5 cm squares and weighed.
切断したサンプルをルツボに入れ、 800°Cの電気炉で 60分還元焼成する。  Place the cut sample in a crucible and reduce and bake in an electric furnace at 800 ° C for 60 minutes.
冷却後、サンプルの重量を測定する。  After cooling, the sample is weighed.
さらに 800°Cの電気炉で 2時間かけ灰化させ、その重量を測定する。  In addition, incinerate for 2 hours in an electric furnace at 800 ° C and measure the weight.
下記式より残炭率 (%)を求める。  Obtain the remaining charcoal rate (%) from the following formula.
残炭率 (%) = (焼成後の重量 灰化後の重量) Z試料の重量 X 100 Residual carbon ratio (%) = (weight after calcination weight after ashing) Z sample weight X 100
実施例 1 Example 1
撹拌装置、コンデンサー、及び窒素ガス導入管を備えたガラス製反応釜に、フエノ ール 376g (4. 0モル)、 4, 4,—ジメトキシメチルビフエ-ル(4, 4,— BMMBと略記 する。) 226g (0. 95)、 42%ホルマリン水溶液 3. 6g (0. 05モル)、 50%硫酸水溶液 0. 22gを仕込み、 100°Cで 1時間反応させた。  In a glass reaction kettle equipped with a stirrer, condenser, and nitrogen gas inlet tube, 376 g (4.0 mol) of phenol, 4, 4, dimethoxymethyl biphenyl (4, 4, BMMB) is abbreviated. ) 226 g (0.95), 42% formalin aqueous solution 3.6 g (0.05 mol), 50% sulfuric acid aqueous solution 0.22 g were charged and reacted at 100 ° C. for 1 hour.
その後、反応温度を 165°Cに保ちながら 3. 5時間反応させた。その間、生成するメ タノールを留去した。反応終了後、得られた反応溶液を冷却し、水洗を 3回行った。 油層を分離し、減圧蒸留により未反応フエノールを留去することにより 340gのフエノ 一ルノボラック榭脂( 150°C溶融粘度: 90mPa · s)を得た。 Thereafter, the reaction was carried out for 3.5 hours while maintaining the reaction temperature at 165 ° C. During that time, the generated Tanol was distilled off. After completion of the reaction, the obtained reaction solution was cooled and washed with water three times. The oil layer was separated, and unreacted phenol was removed by distillation under reduced pressure to obtain 340 g of phenol monovolak resin (150 ° C melt viscosity: 90 mPa · s).
得られたフエノールノボラック榭脂を用いて、上記の方法で成形体にした物性を表 1 示す。  Table 1 shows the physical properties of the molded novolac resin obtained by the above method.
実施例 2〜12および比較例 1〜5 Examples 2-12 and Comparative Examples 1-5
表 1のモノマー組成にて使用した他は、実施例 1記載の方法に準じてフエノールノ ポラック榭脂を得た。また、それぞれの硬化物の物性を表 1に併せて示す。 According to the method described in Example 1 except that the monomer composition shown in Table 1 was used, phenol nopolac rosin was obtained. The physical properties of each cured product are also shown in Table 1.
()^i簦〔〕t w0046lICIQ () ^ i 簦 [] t w0046lICIQ
Figure imgf000017_0001
Figure imgf000017_0001
4, 4'一 ΒΜΜΒ:4, 4'—ジ(メトキシメチル)ビフエニル  4, 4 'ΒΜΜΒ: 4, 4'-di (methoxymethyl) biphenyl
4, 4'一 BCMB:4, 4'ージ(クロロメチル)ビフエニル  4, 4 'BCBC: 4, 4'-di (chloromethyl) biphenyl
1, 4一 PXDM:1, 4ージ(メトキシメチル)ベンゼン  1, 4 PXDM: 1, 4-di (methoxymethyl) benzene
* 〔u0045 ICIコーンプレート粘度計: TOA工業 (株) MODEL CV— ISを使用した。 * 〔U0045 ICI cone plate viscometer: MODEL CV—IS manufactured by TOA Kogyo Co., Ltd. was used.
ICI粘度計のプレート温度を 150°Cに設定し、試料を約 0. 04g秤量する。 プレート部に秤量した榭脂を置き、上部よりコーンで押えつけ、 90sec放置する。 コーンを回転させて、そのトルク値を ICI粘度として読み取る。  Set the ICI viscometer plate temperature to 150 ° C and weigh approximately 0.04 g of the sample. Place the weighed grease on the plate, press it with a cone from the top, and leave it for 90 seconds. Rotate the cone and read its torque value as ICI viscosity.
[0047] 表 2に示した条件で合成したフエノールノボラック榭脂(実施例および比較例)を硬 ィ匕剤として使用した場合、対するエポキシ榭脂は、 日本ィ匕薬 (株)製 NC— 3000 (軟 化点 60°C、エポキシ等量 270g/eq)のエポキシ化ビフエ-ルノボラック榭脂であり、 硬化促進剤としてトリフエニルホスフィン (TPPと略記することもある。 )を使用した。 本発明の低軟ィ匕点フエノール榭脂および上記エポキシノボラック榭脂を、フエノー ル水酸基当量とエポキシ当量比が 1: 1となるように配合し、 TPP触媒は、該配合のェ ポキシ榭脂重量に対して ^%仕込んだ。これらを、 150°Cに加熱して溶融混合し、 真空脱泡した後に 150°Cの金型 (厚さ 4mm)に注型し、 150°C、 3時間で硬化させた 後、さらに 180°C、 5時間かけて硬化して成形体を試作した。 [0047] When phenol novolac resin (Examples and Comparative Examples) synthesized under the conditions shown in Table 2 was used as a hardener, the epoxy resin used was NC-3000 manufactured by Nippon Gyaku Co., Ltd. An epoxidized biphenyl novolac resin (softening point 60 ° C., epoxy equivalent 270 g / eq), and triphenylphosphine (sometimes abbreviated as TPP) was used as a curing accelerator. The low soft spot phenol resin of the present invention and the above epoxy novolac resin are blended so that the phenol hydroxyl group equivalent ratio and the epoxy equivalent ratio are 1: 1, and the TPP catalyst contains the epoxy resin weight of the blend. ^% Charged. These are melt-mixed by heating to 150 ° C, vacuum degassed, cast into a 150 ° C mold (thickness 4 mm), cured at 150 ° C for 3 hours, and then further 180 ° C. Cured over 5 hours to make a molded product.
得られた成形体 (硬化物)の各種物性の試験方法は次の通り。  The test methods for various physical properties of the obtained molded product (cured product) are as follows.
(2) Tg :TMA法(Thermal Mechanical Analysis、熱機械分析法)(昇温速度 5 °CZ分)  (2) Tg: TMA method (Thermal Mechanical Analysis) (heating rate 5 ° CZ min)
(3)吸水率 : 24時間煮沸法、  (3) Water absorption rate: 24-hour boiling method,
[0048] 実施例 13 [0048] Example 13
撹拌装置、コンデンサー、及び窒素ガス導入管を備えたガラス製反応釜に、フエノ ール 376g (4. 0モル)、 4, 4,ージ(メトキシメチル)ビフエ-ル(以下 4, 4,—BMMB と略記する。 ) 143g (0. 60モル)、 2, 4,ージ (メトキシメチル)ビフエ-ル(2, 4,— B MMBと略記する。) 36g (0. 15モル)、 2. 2,ージ (メトキシメチル)ビフエ-ル(2, 2, — BMMBと略記する。)48g (0. 20モル)、 42%ホルマリン水溶液 3. 6g (0. 05モル ) , 50%硫酸水溶液 0. 22gを仕込み、 100°Cで 1時間反応させた。  Into a glass reaction kettle equipped with a stirrer, condenser and nitrogen gas inlet tube, 376 g (4.0 mol) of phenol, 4, 4, di- (methoxymethyl) biphenyl (hereinafter 4, 4, — Abbreviated as BMMB.) 143 g (0.60 mol), 2,4, -di (methoxymethyl) biphenyl (abbreviated as 2, 4, — B MMB) 36 g (0.15 mol), 2. 2, -di (methoxymethyl) biphenyl (abbreviated as 2, 2, — BMMB) 48 g (0.20 mol), 42% formalin aqueous solution 3.6 g (0.05 mol), 50% sulfuric acid aqueous solution 0 22 g was charged and reacted at 100 ° C for 1 hour.
その後、反応温度を 165°Cに保ちながら、さらに 3. 5時間反応させた。その間、生 成するメタノールを留去した。反応終了後、得られた反応溶液を冷却し、水洗を 3回 行った。油層を分離し、減圧蒸留により未反応フエノールを留去することにより 335g のフエノールノボラック榭脂( 150°C溶融粘度: 29mPa · s)を得た。 得られたフエノールノボラック榭脂を用いて、上記の方法で成形体にした硬化物の 物性を表 1示す。 Thereafter, the reaction was further continued for 3.5 hours while maintaining the reaction temperature at 165 ° C. Meanwhile, the methanol formed was distilled off. After completion of the reaction, the obtained reaction solution was cooled and washed with water three times. The oil layer was separated, and unreacted phenol was distilled off by distillation under reduced pressure to obtain 335 g of phenol novolac resin (150 ° C melt viscosity: 29 mPa · s). Table 1 shows the physical properties of the cured product obtained by the above method using the resulting phenol novolac resin.
[0049] 実施例 14〜18および比較例 6〜9 [0049] Examples 14 to 18 and Comparative Examples 6 to 9
表 2の成分割合にて各モノマーを使用した他は、実施例 13記載の方法に準じてフ エノールノボラック榭脂を合成した。さらにエポキシ榭脂硬化物を得た。各物性を表 2 に併記して示す。  Phenolic novolac resin was synthesized according to the method described in Example 13, except that each monomer was used in the component ratio shown in Table 2. Further, a cured epoxy resin was obtained. Each physical property is shown together in Table 2.
[0050] * 2 [0050] * 2
Figure imgf000019_0001
Figure imgf000019_0001
4, 4' -ΒΜΜΒ:4, 4'ージ(メトキシメチル)ビフエニル  4,4'-ΒΜΜΒ: 4,4'-di (methoxymethyl) biphenyl
2, 4' -ΒΜΜΒ:2, 4'ージ(メトキシメチル)ビフエニル  2,4'-ΒΜΜΒ: 2,4'-di (methoxymethyl) biphenyl
2, 2.' -ΒΜΜΒ:2, 2'—ジ(メトキシメチル)ビフエニル  2, 2. '-ΒΜΜΒ: 2, 2'-di (methoxymethyl) biphenyl
4, 4' -BCMB:4, 4'—ジ(クロロメチノレ)ビフエニル  4,4'-BCMB: 4,4'—Di (chloromethinole) biphenyl
2, 4' -BCMB:2, A'—ジ(クロロメチル)ビフエニル  2, 4 '-BCMB: 2, A'—Di (chloromethyl) biphenyl
2, 2' -BCMB:2, 2'—ジ(クロロメチル)ビフエ二ル  2, 2 '-BCMB: 2, 2'-di (chloromethyl) biphenyl
1, 4— PXDM:1, 4—ジ(メトキシメチル)ベンゼン  1, 4-— PXDM: 1, 4--di (methoxymethyl) benzene
1, 2-PXDM:1, 2—ジ(メトキシメチル)ベンゼン  1, 2-PXDM: 1,2-Di (methoxymethyl) benzene
1, 3-PXDM:1, 3—ジ(メトキシメチル)ベンゼン  1, 3-PXDM: 1,3-Di (methoxymethyl) benzene
1, 4— PXDC:1, 4—ジ(クロロメチル)ベンゼン  1, 4— PXDC: 1, 4-Di (chloromethyl) benzene
1, -PXDC:1, 2—ジ(クロロメチル)ベンゼン  1, -PXDC: 1,2-Di (chloromethyl) benzene
1, 3-PXDC:1, 3—ジ(クロロメチル)ベンゼン  1, 3-PXDC: 1,3-Di (chloromethyl) benzene
2— HBA: 2—ヒドロキシベンズアルデヒド  2-— HBA: 2--hydroxybenzaldehyde
3— H BA: 3—ヒドロキシベンズアルデヒド [0051] 表 2から明らかなように、実施例 13〜18で得られたフエノールノボラック榭脂および 該榭脂を含む硬化物は、低溶融粘度、高ガラス転移温度、低吸湿性の全てをバラン ス良く兼ね備えて 、るが、比較例 6〜9では 、ずれかの物性値が低下して 、る。 産業上の利用可能性 3-HBA: 3-Hydroxybenzaldehyde As is clear from Table 2, the phenol novolac rosin obtained in Examples 13 to 18 and the cured product containing the aliphatic balun all have low melt viscosity, high glass transition temperature, and low hygroscopicity. However, in Comparative Examples 6 to 9, the physical property values of the deviations are reduced. Industrial applicability
[0052] 本発明によれば、低溶融粘度、高ガラス転移温度、低吸湿性、高密着性、耐熱性、 及び難燃性などに優れ、特に電気および電子産業用、電子部品の封止用、積層板 材料用のエポキシ榭脂用として好適に用いられる新規なフエノールノボラック樹脂お よびこのフエノールノボラック榭脂をエポキシ化したエポキシ化フエノールノボラック縮 合体およびそれをエポキシ榭脂用硬化剤と反応して得られたエポキシ榭脂硬化物を 提供することができる。また、ビフエ-リレン基を含有するフエノールノボラック榭脂は 難燃剤としても使用できる。 [0052] According to the present invention, it is excellent in low melt viscosity, high glass transition temperature, low hygroscopicity, high adhesion, heat resistance, flame retardancy, etc., especially for electrical and electronic industries, for sealing electronic components. A novel phenol novolak resin suitably used as an epoxy resin for laminated board materials, an epoxidized phenol novolak condensate obtained by epoxidizing this phenol novolac resin, and a reaction with a curing agent for epoxy resin. The obtained epoxy resin cured product can be provided. In addition, phenol novolac resin containing biphenol-rylene groups can be used as a flame retardant.

Claims

請求の範囲 The scope of the claims
下記一般式 (1) :  The following general formula (1):
Figure imgf000021_0001
Figure imgf000021_0001
式中、 Rは下記一般式(2)
Figure imgf000021_0002
In the formula, R is the following general formula (2)
Figure imgf000021_0002
で示されるビフエ-リレン基及びキシリレン基力 選択される少なくとも 1の 2価のァリ 一レン基を表し、更に下記一般式(3):  The biphenol-xylene group and the xylylene group represented by formula (1) represent at least one divalent arylene group selected from the following general formula (3):
Figure imgf000021_0003
Figure imgf000021_0003
式中、 R4は、ヒドロキシル基又は炭素原子数 1〜6のアルキル基である、 で示される構成単位を含んでいてもよぐ m及び nは、 mZnが 0. 04〜20を満たす 数であり、また、
Figure imgf000021_0004
R2及び R3は、同一でも異なっていてもよぐそれぞれ、ヒドロキシ ル基又は炭素原子数 1から 6個のアルキル基であり、 p、 q及び rは、それぞれ、 0〜2 の整数である、
In the formula, R 4 may be a hydroxyl group or an alkyl group having 1 to 6 carbon atoms, and may include a structural unit represented by: m and n are numbers that satisfy mZn of 0.04 to 20 Yes, and
Figure imgf000021_0004
R 2 and R 3, which may be the same or different, are each a hydroxyl group or an alkyl group having 1 to 6 carbon atoms, and p, q, and r are each an integer of 0-2. ,
で示される構成単位を有し、 150°Cにおける溶融粘度が 20〜 1 OOmPa · sであること を特徴とする低軟ィ匕点フエノールノボラック榭脂。  A low-soft-point phenol novolak resin having a structural unit represented by the formula (1) and having a melt viscosity at 150 ° C of 20 to 1 OOmPa · s.
[2] Rに、少なくとも 4, 4'ービフエ-リレン架橋基を含有する請求の範囲第 1項に記載 の低軟ィ匕点フエノールノボラック榭脂。  [2] The low soft-point phenol novolac resin according to claim 1, wherein R contains at least a 4,4′-biphenol-rylene crosslinking group.
[3] ビフ ニリレン架橋基が、各異性体の混合物である請求の範囲第 2項に記載の低 軟ィ匕点フエノールノボラック榭脂。  [3] The low soft-point phenol novolak resin according to claim 2, wherein the biphenylylene cross-linking group is a mixture of isomers.
[4] mZnが 0. 05〜9を満たす数である請求の範囲第 1項記載の低軟ィ匕点フエノール ノボラック樹月旨。 溶融粘度が 25〜90mPa' sである請求の範囲第 1項記載の低軟ィ匕点フエノールノ ポラック榭脂。 [4] The low-soft saddle point phenol novolak lunar effect according to claim 1, wherein mZn is a number satisfying 0.05 to 9. 2. The low soft spot phenol nopolac resin according to claim 1, which has a melt viscosity of 25 to 90 mPa's.
フエノール類、下記一般式 (4):  Phenols, following general formula (4):
X 2C^r- /=^CH2X XH,C^=^CH2X X 2 C ^ r- / = ^ CH 2 X XH, C ^ = ^ CH 2 X
, ( 式中、 Xはハロゲン原子、ヒドロキシル基又は炭素原子数 1〜6のアルコキシル基を 表す、  , (Wherein X represents a halogen atom, a hydroxyl group or an alkoxyl group having 1 to 6 carbon atoms,
で示される置換ビフヱ-レンィ匕合物及び置換ベンゼンィ匕合物の少なくとも 1種、及び ホルムアルデヒドを、酸触媒の存在下で縮合させることを特徴とする請求の範囲第 1 〜5項のいずれかに記載の低軟ィ匕点フエノールノボラック樹脂の製造方法。 6. The method according to claim 1, wherein at least one of a substituted biphenyl-reny compound and a substituted benzene compound represented by formula (II) and formaldehyde are condensed in the presence of an acid catalyst. A method for producing the described low soft spot phenol novolac resin.
更に前記式 (4)の化合物に加え、下記一般式(5):
Figure imgf000022_0001
Furthermore, in addition to the compound of the formula (4), the following general formula (5):
Figure imgf000022_0001
式中、 R4は、前記と同義である、 In the formula, R 4 has the same meaning as above.
で示されるベンズアルデヒドィ匕合物を含んでなる請求の範囲第 6項に記載の低軟ィ匕 点フエノールノボラック樹脂の製造方法。 The method for producing a low soft-point phenol novolak resin according to claim 6, comprising a benzaldehyde compound represented by the formula:
(1) Rを構成する架橋基とホルムアルデヒドの使用合計モル数に対して、  (1) With respect to the total number of moles of cross-linking groups and formaldehyde constituting R,
(2)フエノール類を 3モル倍以上で、  (2) More than 3 moles of phenol,
縮合させる工程を含むことを特徴とする請求の範囲第 6項または第 7項に記載の低 軟ィ匕点フエノールノボラック樹脂の製造方法。 8. The method for producing a low soft spot phenol novolak resin according to claim 6 or 7, further comprising a condensation step.
酸触媒が、硫酸、塩酸、蓚酸およびパラトルエンスルホン酸力 なる群力 選ばれる 少なくとも 1ィ匕合物であることを特徴とする請求の範囲第 8項に記載の低軟ィ匕点フエノ 一ルノボラック樹脂の製造方法。  9. The low softness-point phenol monovolak according to claim 8, wherein the acid catalyst is a compound selected from the group forces of sulfuric acid, hydrochloric acid, oxalic acid, and paratoluenesulfonic acid. Manufacturing method of resin.
請求の範囲第 1〜5項のいずれ力 1項に記載の低軟ィ匕点フエノールノボラック榭脂 、請求の範囲第 6〜9項の 、ずれか 1項に記載の製造方法で得られた低軟化点フエ ノールノボラック榭脂からなる群より選ばれる少なくとも 1榭脂成分を含有する硬化物 請求の範囲第 10項に記載の硬化物がエポキシ榭脂と反応させて得られるエポキシ 榭脂硬化物。 The low soft spot phenol novolac resin according to any one of claims 1 to 5 and the low obtained by the production method according to any one of claims 6 to 9. Hardened product containing at least one resin component selected from the group consisting of softening point phenol novolac resin An epoxy resin cured product obtained by reacting the cured product according to claim 10 with an epoxy resin.
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