WO2007020008A3 - Dispositif de mise en mouvement a mouvement sinusoidal - Google Patents

Dispositif de mise en mouvement a mouvement sinusoidal Download PDF

Info

Publication number
WO2007020008A3
WO2007020008A3 PCT/EP2006/007916 EP2006007916W WO2007020008A3 WO 2007020008 A3 WO2007020008 A3 WO 2007020008A3 EP 2006007916 W EP2006007916 W EP 2006007916W WO 2007020008 A3 WO2007020008 A3 WO 2007020008A3
Authority
WO
WIPO (PCT)
Prior art keywords
motion device
suction bar
double
stepping
arm
Prior art date
Application number
PCT/EP2006/007916
Other languages
German (de)
English (en)
Other versions
WO2007020008A2 (fr
Inventor
Josef Moser
Original Assignee
Josef Moser
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE102005038976.7A external-priority patent/DE102005038976B4/de
Application filed by Josef Moser filed Critical Josef Moser
Priority to JP2008526414A priority Critical patent/JP2009505410A/ja
Publication of WO2007020008A2 publication Critical patent/WO2007020008A2/fr
Publication of WO2007020008A3 publication Critical patent/WO2007020008A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00—Gripping heads and other end effectors
    • B25J15/02—Gripping heads and other end effectors servo-actuated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00—Gripping heads and other end effectors
    • B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
    • B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices

Abstract

La présente invention concerne un dispositif de mise en mouvement à plusieurs axes qui imprime un mouvement dans une large mesure sinusoïdal, à un élément de préhension qui est monté à l'extrémité libre d'un bras entraîné sur plusieurs axes, un moteur d'entraînement pas à pas étant associé à chaque bras, les moteurs pas à pas destinés à entraîner les axes indépendants, fonctionnant indépendamment et de façon autonome, et aucune rétroaction d'un moteur pas à pas sur l'autre n'ayant lieu. L'invention se caractérise en ce que le dispositif de mise en mouvement présente une barre d'aspiration qui constitue des deux côtés un dispositif d'aspiration destiné à prendre en charge des cartes de circuits imprimés, des substrats, des tranches de semi-conducteur ou analogues, et qui présente un support rotatif qui exécute un mouvement de rotation d'au moins 180 à 360° autour de son axe de rotation orienté de façon axiale.
PCT/EP2006/007916 2005-08-16 2006-08-10 Dispositif de mise en mouvement a mouvement sinusoidal WO2007020008A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008526414A JP2009505410A (ja) 2005-08-16 2006-08-10 ２つの面を持つサクションバーを備える運動装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005038976.7A DE102005038976B4 (de) 2004-02-17 2005-08-16 Bewegungseinrichtung mit sinusförmigem Bewegungsablauf
DE102005038976.7 2005-08-16

Publications (2)

Publication Number Publication Date
WO2007020008A2 WO2007020008A2 (fr) 2007-02-22
WO2007020008A3 true WO2007020008A3 (fr) 2007-05-10

Family

ID=37574514

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2006/007916 WO2007020008A2 (fr) 2005-08-16 2006-08-10 Dispositif de mise en mouvement a mouvement sinusoidal

Country Status (5)

Country Link
JP (1) JP2009505410A (fr)
KR (1) KR20080037718A (fr)
CN (1) CN101304847A (fr)
TW (2) TW200714425A (fr)
WO (1) WO2007020008A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3084518B1 (fr) * 2018-07-25 2020-10-30 Commissariat Energie Atomique Dispositif de prehension d'une structure monocouche ou multicouche comportant un element de prehension rotatif et thermique
TWI829201B (zh) * 2022-06-17 2024-01-11 和淞科技股份有限公司 可調式負壓吸持模組

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135772A2 (fr) * 1983-08-29 1985-04-03 Hitachi, Ltd. Dispositif pour le contrôle de mouvements pour un robot
US5967578A (en) * 1998-05-29 1999-10-19 Sez North America, Inc. Tool for the contact-free support of plate-like substrates
WO2000078654A1 (fr) * 1999-06-17 2000-12-28 Speedfam-Ipec Corporation Appareil de maniement de plaquettes ameliore
EP1085558A2 (fr) * 1999-09-16 2001-03-21 Applied Materials, Inc. Lamelle de robot multiface pour un équipement de traitement des semiconducteurs
US6327517B1 (en) * 2000-07-27 2001-12-04 Applied Materials, Inc. Apparatus for on-the-fly center finding and notch aligning for wafer handling robots
EP1464455A1 (fr) * 2001-12-04 2004-10-06 Rorze Corporation Robot du type scalaire concu pour porter un objet du type plaque plane et systeme de traitement d'objet du type plaque plane
DE102004007558A1 (de) * 2004-02-17 2005-09-08 Josef Moser Bewegungseinrichtung mit sinusförmigen Bewegungsablauf

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06318628A (ja) * 1993-05-07 1994-11-15 Fujitsu Ltd 部品搬送方法とそのための装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135772A2 (fr) * 1983-08-29 1985-04-03 Hitachi, Ltd. Dispositif pour le contrôle de mouvements pour un robot
US5967578A (en) * 1998-05-29 1999-10-19 Sez North America, Inc. Tool for the contact-free support of plate-like substrates
WO2000078654A1 (fr) * 1999-06-17 2000-12-28 Speedfam-Ipec Corporation Appareil de maniement de plaquettes ameliore
EP1085558A2 (fr) * 1999-09-16 2001-03-21 Applied Materials, Inc. Lamelle de robot multiface pour un équipement de traitement des semiconducteurs
US6327517B1 (en) * 2000-07-27 2001-12-04 Applied Materials, Inc. Apparatus for on-the-fly center finding and notch aligning for wafer handling robots
EP1464455A1 (fr) * 2001-12-04 2004-10-06 Rorze Corporation Robot du type scalaire concu pour porter un objet du type plaque plane et systeme de traitement d'objet du type plaque plane
DE102004007558A1 (de) * 2004-02-17 2005-09-08 Josef Moser Bewegungseinrichtung mit sinusförmigen Bewegungsablauf

Also Published As

Publication number Publication date
WO2007020008A2 (fr) 2007-02-22
TW200714425A (en) 2007-04-16
JP2009505410A (ja) 2009-02-05
TWM464295U (zh) 2013-11-01
KR20080037718A (ko) 2008-04-30
CN101304847A (zh) 2008-11-12

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