WO2007010462A2 - Materiau optique hautement refractif ainsi que lampe electrique avec film interferentiel - Google Patents

Materiau optique hautement refractif ainsi que lampe electrique avec film interferentiel Download PDF

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Publication number
WO2007010462A2
WO2007010462A2 PCT/IB2006/052412 IB2006052412W WO2007010462A2 WO 2007010462 A2 WO2007010462 A2 WO 2007010462A2 IB 2006052412 W IB2006052412 W IB 2006052412W WO 2007010462 A2 WO2007010462 A2 WO 2007010462A2
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WO
WIPO (PCT)
Prior art keywords
refractive optical
optical material
refractive
mole
rutile
Prior art date
Application number
PCT/IB2006/052412
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English (en)
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WO2007010462A3 (fr
Inventor
Hans Van Sprang
Margot L. Van Grootel
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Koninklijke Philips Electronics N.V.
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Filing date
Publication date
Application filed by Koninklijke Philips Electronics N.V. filed Critical Koninklijke Philips Electronics N.V.
Publication of WO2007010462A2 publication Critical patent/WO2007010462A2/fr
Publication of WO2007010462A3 publication Critical patent/WO2007010462A3/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/34—Double-wall vessels or containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection

Definitions

  • the invention relates to a high-refractive optical material having a rutile structure.
  • the invention also relates to a substrate provided with an optical layer of such a high-refractive optical material.
  • the invention further relates to an electric lamp comprising a light- transmitting lamp vessel in which a light source is arranged, and an interference film comprising a plurality of high-refractive optical layers and low-refractive optical layers, wherein the high-refractive optical layer comprises such a high-refractive optical material.
  • Such high-refractive optical materials having a rutile structure are known per se. These materials are used, inter alia, in high-refractive optical layers in optical thin- film optical interference coatings. Such a (layer of a) high-refractive optical material can be used, for instance, as part of a further refractive or diffractive optical structure.
  • Thin- film optical interference coatings also known as interference filters, comprising a plurality of (alternating) layers of two or more materials of different refractive indices are well known in the art.
  • Optical interference filters are used, for example, in laser technology.
  • Optical filters are also used with incoherent light sources such as gas discharge lamps and halogen lamps for increasing the luminous efficacy of the lamps, as color filters or color-correction filters and also as reflectors.
  • interference films or coatings are employed to selectively reflect and/or transmit light radiation from various portions of the electromagnetic spectrum such as ultraviolet, visible and infrared (IR) radiation.
  • IR ultraviolet, visible and infrared
  • IR radiation infrared
  • filters can reflect the shorter wavelength portions of the spectrum, such as ultraviolet and visible light portions emitted by a filament or arc and transmit primarily the infrared portion in order to provide heat radiation with little or no visible light radiation.
  • Interference films or coatings are applied by means of evaporation or (reactive) sputtering techniques and also by chemical vapor deposition (CVD) and low- pressure chemical vapor deposition (LPCVD) processes. These deposition techniques generally produce relatively thick layers which tend to crack and severely limit the filter design.
  • CVD chemical vapor deposition
  • LPCVD low- pressure chemical vapor deposition
  • the phase stability, oxidation state, and thermal expansion mismatch of the high-refractive index layer materials with the (quartz glass) substrate at higher temperatures is a matter of concern. Changes herein may cause delamination of the interference film, for instance, due to thermal mismatch, or may introduce an undesirable degree of light scattering and/or light absorption in the interference film.
  • the high-refractive index materials are normally deposited at temperatures relatively close to room temperature (typically below 250°C) and are deposited as amorphous or microcrystalline layers. Generally, most high- refractive index layers undergo crystallization at temperatures above 550°C, for instance, during life of the electric lamp (typically several thousands of hours). Crystallization involves crystal grain growth, which may disturb the optical transparency of the coating through light scattering. In addition, care has to be taken that the high-refractive index layer material should not become oxygen-deficient during the (physical) layer deposition process and during lamp operation at high temperatures, because this deficiency generally leads to undesirable light absorption.
  • Optical multilayer interference films comprising titanium oxide as a material for high-refractive optical layers and silicon oxide as a material for low-refractive optical layers are currently used by various companies, in particular, on so-termed cold-mirror reflectors and on small, low-wattage halogen lamps with an operation temperature below approximately 650°C. It is known that these interference films tend to become cloudy (scattering) at temperatures above 700°C.
  • infrared (IR) reflecting interference films based on titanium oxide as high-refractive optical layer and silicon oxide as low- refractive optical layer is preferred for cost-saving reasons, because the relatively large difference between the refractive indices of the respective layer materials allows use of a relatively small number of layers in the filter design and an overall thinner film stack for realizing adequate IR reflection, requiring less time during deposition of the interference film.
  • halogen electric lamps have been commercialized until now because of the above-mentioned problems with scattering, absorption and/or coating cracking/delamination phenomena when the TiO 2 ZSiO 2 interference film is exposed to temperatures exceeding 700°C.
  • these transitions affect the temperature-dependent mechanical stresses to which the multilayer stack is exposed, which may subsequently induce layer cracking and/or delamination.
  • US patent publication US-A 4,940,636 discloses an optical interference film assembled from alternating (amorphous) low-refractive optical silicon dioxide (SiO 2 ) layers and high-refractive optical layers made of mixed oxides chosen from a group consisting of 88-95 mole.% TiO 2 and 5-12 mole.% ZrO 2 , 88-95 mole.% TiO 2 and 5-12 mole.% of an oxide selected from the group HiO 2 , TiO 2 -ZrO 2 , TiO 2 -HiO 2 , TiO 2 -Nb 2 O 5 , TiO 2 Ta 2 O 5 and
  • the mixed oxides have a crystal structure which corresponds to the crystal structure obtained after a heat treatment between 700°C and HOO 0 C.
  • the optical interference filter is stable, also after a long period at elevated temperatures.
  • a drawback of the known high-refractive optical layer materials is that grain growth in such layers at temperatures above 550°C is not sufficiently suppressed.
  • this object is achieved by a high-refractive optical material having a rutile structure, the high-refractive optical material comprising a mixed oxide of 96-99 mole% titanium oxide and 1-4 mole% niobium oxide.
  • the inventors have observed that the grains in known (pure) rutile TiO 2 high- refractive optical materials tend to grow substantially when such layers are subjected to temperatures well above 700°C.
  • the separate grains of known rutile TiO 2 grow at the expense of each other and, as a result, the heated optical layers tend to show a milky appearance (diffuse scattering) when the TiO 2 grains exceed sizes of above approximately 100 nm.
  • the inventors have had the insight that the growth of the grain size is substantially hampered during the lifetime of the high-refractive optical material when relatively small amounts of niobium oxide are added to the high-refractive optical titanium oxide layer.
  • the rutile titanium oxide is doped with 1-4 mole% niobium oxide.
  • the resulting high-refractive optical material has a composition Ti ⁇ .X)Nb x O 2 , wherein 0.01 ⁇ x ⁇ 0.04.
  • Doping TiO 2 films with Nb 2 O 5 is found to delay the grain growth.
  • the presence of a dopant or a compound in a nano-grained structure has its effect on the rate of grain growth and the density of the rutile nucleation.
  • niobium is substitutional ⁇ present in the TiO 2 lattice.
  • a suitable method of doping TiO 2 is to deposit the titanium and the dopant simultaneously.
  • An example of such a method is (reactive) simultaneously sputtering from both a titanium target and from a target provided with the dopant material. This method is also referred to as co-sputtering.
  • phase transition from anatase to rutile TiO 2 has to be prevented.
  • This phase transition generally occurs in a known temperature range above 700°C and is regarded as being responsible for the change of appearance and performance of the high-refractive optical layer material, in particular when employed in an interference film provided on a lamp vessel operating at temperatures well above 700°C. It was found that a co-sputtered high-refractive optical layer comprising 96-99 mole% titanium oxide doped with 1-4 mole% niobium oxide already exhibited a rutile structure as deposited. When such an as-deposited layer is subjected to temperatures above 700°C, the anatase-rutile transition is prevented.
  • the high-refractive optical material according to the invention finds application as part of a further refractive or diffractive optical structure. For instance, by forming a 2D periodic grid of holes or lines in the high-refractive optical layer comprising a high-refractive optical material according to the invention, a 2D photonic band gap can be created for radiation in the plane of the high- refractive optical layer. In these types of diffractive, sub- wavelength structures, the performance is critically dependent on the index ratio between high and low- index materials.
  • a dopant concentration of less than 1 mole% niobium oxide does not have sufficient influence on the TiO 2 rutile layer structure to realize the desired effects.
  • a dopant concentration of more than 4% niobium oxide does not result in all the niobium being incorporated into the TiO 2 crystal structure.
  • amounts larger than 4 mole% of niobium oxide are incorporated into the TiO 2 layer, the optical properties will change and the refractive index will become smaller, which is undesirable.
  • higher amounts of niobium oxide require longer times to reach an equilibrium distribution and hence might cause undesirable grain growth in the rutile layer during the annealing step used for stress removal.
  • the high-refractive optical material preferably comprises a mixed oxide of 97-98 mole% titanium oxide and 2-3 mole% niobium oxide. In this preferred range of doping titanium oxide with niobium, the high-refractive optical material has a rutile crystal structure with the structural formula Ti( 1-x )Nb x O 2 , wherein 0.02 ⁇ x ⁇ 0.03).
  • a preferred embodiment of the high-refractive optical material according to the invention is characterized in that the average crystal size of the high-refractive optical layer is smaller than 100 nm.
  • Such crystal sizes are obtained after a heat treatment in the ambience at a temperature of at least 800°C for at least two hours.
  • the as-deposited high-refractive optical layer materials, i.e. before any heat treatment, were found to be nano-crystalline (average crystal size typically below 10 nm).
  • the average crystal size increased to around 25 nm when the high-refractive optical layer was heated to approximately 900°C. By maintaining the temperature at 900°C for more than 10 hours, the average crystal size gradually increased to approximately 50 nm.
  • a preferred embodiment of the high-refractive optical material according to the invention is characterized in that the principal lattice distances of the high-refractive optical material are between 1% and 2% larger than those of pure rutile titanium oxide. Such lattice distances are obtained after a heat treatment in the ambience at a temperature of at least 800°C for at least two hours. Evidence of the incorporation of niobium into the TiO 2 crystal lattice can be derived from electron diffraction measurements.
  • the lattice planes are denoted in a well-known manner by [hkl], while principal lattice distances can be derived from the lattice planes.
  • principal lattice planes are [100] [010], [001], [110], [101], [111], [200], [211] and [220]. It was observed that the principal lattice distances of as- deposited high-refractive optical material according to the invention substantially resemble those of the rutile lattice of pure TiO 2 , whereas the principal lattice distances of the high- refractive optical material according to the invention after heating to a temperature of approximately 900°C for more than 10 hours are substantially larger than those of the rutile lattice of pure TiO 2 .
  • the principal lattice distances of the high-refractive optical material are between 1% and 2% larger than those of pure rutile titanium oxide, thereby shifting in the direction of the rutile lattice of pure Nb 2 O 5 . It can be concluded from these results that the niobium is probably incorporated into the rutile lattice OfTiO 2 .
  • Substrates that are able to withstand temperatures of at least 600°C can be provided with a layer comprising any of said optical high-refractive materials.
  • Said substrates may be, for example, glass devices such as float glass or packaging such as bottles, or ceramic materials or metal objects such as reflectors.
  • Said substrates can be given desired properties by said layer, for example, a better reflection of a specific part of the UV, visible and/or IR-spectrum.
  • a UV-sensitive chemical compound contained in a glass bottle which is provided with a coating of said optical high-refractive material that reflects specifically in the UV region can be given a longer shelf life due to a delayed photochemical reaction.
  • an electric lamp comprising a light-transmitting lamp vessel accommodating a light source, at least a portion of the lamp vessel being provided with an interference film, the interference film comprising a plurality of high-refractive and low-refractive optical layers, the high-refractive optical layer comprising a high-refractive optical material having a rutile structure, the high- refractive optical material comprising a mixed oxide constituted by 96-99 mole% titanium oxide and 1-4 mole% niobium oxide.
  • the high-refractive optical material preferably comprises a mixed oxide of 97-98 mole% titanium oxide and 2-3 mole% niobium oxide.
  • the low-refractive optical layer preferably comprises silicon dioxide.
  • the interference film comprises Ti( 1-x )Nb x ⁇ 2 layers, wherein 0.02 ⁇ x ⁇ 0.03, as high-refractive index material and silicon oxide as low-refractive index material, said interference film exhibiting an improved performance at elevated temperatures.
  • the known interference films comprising (pure) titanium oxide relatively large grains tend to grow at elevated temperatures. The size of these grains is known to be limited in interference films by the thickness of the titanium oxide layer and generally does not exceed twice or three times the thickness of the titanium oxide layer when observed in the plane of the layer.
  • a preferred embodiment of the electric lamp according to the invention is characterized in that the lamp vessel is provided with an adhesion layer between the lamp vessel and the interference film having a geometrical thickness of at least 50 nm. This measure counteracts (sudden) cracking of the interference film and/or its delamination from the lamp vessel.
  • Another preferred embodiment of the electric lamp according to the invention is characterized in that the interference film at a side facing away from the lamp vessel is provided with a layer of silicon oxide having a geometrical thickness of at least 50 nm. Such a capping layer limits the deterioration of the interference film.
  • the silicon oxide "capping" layer on the air side of the interference film provides protection of the interference film, in particular at elevated temperatures.
  • Figure 1 is a cross-sectional view of an electric incandescent lamp provided with an interference film according to the invention
  • Figure 2 A is a light microscope picture of a TiO 2 layer after heating at 700°C for ten minutes;
  • Figure 2B is a light microscope picture of a Ti( 1-x )Nb x ⁇ 2 layer after heating at 700°C for ten minutes;
  • Figure 3 A is a TEM picture of a stack of Ti ⁇ .X)Nb x O 2 layers as-deposited by means of co-sputtering;
  • Figure 3B is a TEM picture of a stack of Ti( 1-x )Nb x ⁇ 2 layers after heating to 900°C;
  • Figure 3 C is a TEM picture of a stack of Ti( 1-x) Nb x ⁇ 2 layers after heating at 900°C for two hours;
  • Figure 3D is a TEM picture of a stack of Ti( ⁇ x )Nb x O 2 layers after heating at
  • Figure 3 E is a TEM picture of a stack of Ti( 1-x )Nb x ⁇ 2 layers after heating at 900°C for ten hours.
  • the electric lamp comprises a lamp vessel 1 of quartz glass accommodating an incandescent body as the light source 2.
  • Figure 1 is purely diagrammatic and not drawn to scale. Notably, some dimensions are shown in a strongly exaggerated form for the sake of clarity.
  • Current conductors 3 issuing from the lamp vessel 1 to the exterior are connected to the light source 2.
  • the lamp vessel 1 is filled with a gas containing halogen, for example, hydrogen bromide.
  • At least a part of the lamp vessel 1 is coated with an interference film 5 comprising a plurality of layers of at least silicon oxide and titanium oxide.
  • the suitable part of the lamp vessel 1 functions as substrate for depositing the interference film 5.
  • the interference film 5 allows passage of visible radiation and reflects infrared (IR) radiation.
  • the lamp vessel 1 is mounted in an outer bulb 4, which is supported by a lamp cap 6 with which the current conductors 3 are electrically connected.
  • the electric lamp shown in Figure 1 is a 60 W mains-operated lamp having a service life of at least 2500 hours.
  • pure TiO 2 was deposited on a substrate by reactive sputtering in an Ar/ ⁇ 2 atmosphere.
  • the TiO 2 layers as deposited by means of this well-known standard deposition method are in the anatase phase.
  • a small amount of rutile TiO 2 was detected.
  • the ratio of anatase and rutile TiO 2 could be influenced.
  • Figure 2A shows a light microscope picture of a TiO 2 layer after heating at 700°C for ten minutes. It is observed that the layer is cracked and delaminates. Doping TiO 2 films with Nb 2 O 5 is found to delay the grain growth. The presence of a dopant or a compound in a nano-grained structure has its effect on the rate of grain growth and the density of the rutile nucleation. Not wishing to be held to any particular theory, two basic mechanisms are involved: (1) segregation at the grain boundary of a phase takes place, lowering the surface energy of the grains; and (2) occupation of bulk lattice sites hampers surface ionic mobility. When small amounts of niobium are incorporated into the high-refractive optical TiO 2 layer, it is found that niobium is substitutional ⁇ present in the TiO 2 lattice.
  • Co-sputtered samples of Nb-doped TiO 2 on a substrate were prepared.
  • the Nb-dope was introduced by simultaneously reactive sputtering from a Ti target and a Nb target in an Ar/O 2 atmosphere.
  • Nb target material was attached to the Ti target.
  • a layer of approximately 200 nm was deposited on a SiO 2 substrate for a period of 3 hours.
  • XRF X-Ray Fluorescence spectroscopy
  • TEM Transmission Electron Microscope
  • Figure 3 A shows a TEM picture of a stack of Ti( ⁇ x )Nb x O 2 layers (0.02 ⁇ x ⁇ 0.03) as-deposited by means of co-sputtering. The (white) bar in the lower left corner of Figure 3 A depicts a distance of 250 nm. The as-deposited layers were found to be nano-crystalline with an average crystal size of approximately 20 nm.
  • Figure 3B shows a TEM picture of a stack of Ti ⁇ .X)Nb x O 2 layers immediately after heating to approximately 900°C.
  • the average crystal size has increased from approximately 20 nm to approximately 30 nm.
  • Figure 3 C shows a TEM picture of a stack Of Ti( ⁇ x )Nb x O 2 layers after heating at 900°C for two hours. Needle-like elongated crystals have become visible in this Figure 3C.
  • Figure 3D shows a TEM picture of a stack Of Ti( ⁇ x )Nb x O 2 layers after heating at 900°C for three hours.
  • the (black) rectangular box in Figure 3D indicates the same area as in Figure 3C and was taken within 1 hour from the TEM image of Figure 3C.
  • the rectangular box in Figure 3D indicates the same part of the sample as in Figure 3C; the sample has slightly moved in the TEM. It can be observed from Figure 3D that the amount of the elongated needle-like crystals has substantially decreased. In addition, the average crystal size has increased to approximately 40 nm.
  • Figure 3 E shows a TEM picture of a stack of Ti( ⁇ x )Nb x O 2 layers after heating at 900°C for 10 hours.
  • crystal lattice points corresponding to the diffraction from a periodic set of specific crystal lattice planes are indicated, using the standard index triple [hkl], known to the skilled person, wherein h, k, 1 are the Miller indices of the crystal lattice planes.
  • the electron diffraction data indicated that the orientation of the as-deposited high-refractive Ti( 1-x )Nb ⁇ O 2 optical layers (0.02 ⁇ x ⁇ 0.03) were typically rutile-like. Almost all of the measured values of the as-deposited samples were close to the values found in literature for pure rutile TiO 2 . However, the lattice distances of the high-refractive Ti (1-x) Nb x ⁇ 2 optical layers (0.02 ⁇ x ⁇ 0.03) after heating at 900°C for 10 hours shifted towards the literature values of rutile NbO 2 .
  • the electron diffraction data confirm that, after heating at 900°C for 10 hours, Nb-rich regions are no longer detected or visible.
  • the niobium is incorporated in the rutile TiO 2 crystals. This incorporation of niobium in the rutile TiO 2 crystals is reflected in the increase of the lattice distances by approximately 1-2%.
  • the observed values for the heat-treated Ti( 1-X )Nb ⁇ O 2 optical layers have shifted towards the known lattice distances of pure rutile NbO 2 , which are larger than the lattice distances of pure rutile TiO 2 .
  • the growth of the grain size is substantially hampered during the lifetime of the high-refractive Ti( 1-x )Nb x O 2 optical layer material according to the invention.
  • the phase transition from anatase to rutile in the high-refractive Ti( 1-x) Nb x O 2 optical material according to the invention is prevented.

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  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
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Abstract

La lampe électrique de cette invention possède un récipient de lampe transmettant la lumière (1) dans lequel est logée une source lumineuse (2) possédant un film interférentiel (5) lequel comprend plusieurs couches optiques hautement réfractives et faiblement réfractives. La couche optique hautement réfractive comprend un matériau hautement réfractif avec une structure de rutile et un oxyde mélangé de 96-99 mole % d'oxyde de titane et de 1-4 mole % d'oxyde de niobium. L'oxyde mélangé est de préférence constitué par 97-98 mole % d'oxyde de titane et de 2-3 mole % d'oxyde de niobium. L'invention concerne également un matériau optique hautement réfractif possédant une structure de rutile formée par un oxyde mélangé de 96-99 mole % d'oxyde de titane et 1-4 mole % d'oxyde de niobium. Dans le matériau optiquement réfractif de cette invention, la croissance de la taille de grain est sensiblement retardée durant la durée de vie et la transition de phase d'anatase à rutile est empêchée.
PCT/IB2006/052412 2005-07-20 2006-07-14 Materiau optique hautement refractif ainsi que lampe electrique avec film interferentiel WO2007010462A2 (fr)

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EP05106630 2005-07-20
EP05106630.6 2005-07-20

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WO2007010462A3 WO2007010462A3 (fr) 2007-05-10

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202009008919U1 (de) 2009-06-29 2009-09-10 Osram Gesellschaft mit beschränkter Haftung Halogenglühlampe
WO2009121404A1 (fr) * 2008-04-02 2009-10-08 Osram Gesellschaft mit beschränkter Haftung Système de projection à rendement élevé
DE202009012809U1 (de) 2009-09-22 2009-12-31 Osram Gesellschaft mit beschränkter Haftung Halogenglühlampe
WO2010011598A2 (fr) * 2008-07-25 2010-01-28 Ppg Industries Ohio, Inc. Suspension aqueuse pour un revêtement pyrolytique par pulvérisation
WO2010031808A1 (fr) * 2008-09-17 2010-03-25 Agc Flat Glass Europe Sa Vitrage a reflexion elevee
US8035285B2 (en) 2009-07-08 2011-10-11 General Electric Company Hybrid interference coatings, lamps, and methods
WO2013103678A1 (fr) * 2012-01-05 2013-07-11 Massachusetts Institute Of Technology Éclairage à incandescence à haut rendement
US9115864B2 (en) 2013-08-21 2015-08-25 General Electric Company Optical interference filters, and filament tubes and lamps provided therewith

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Publication number Priority date Publication date Assignee Title
EP0300579A2 (fr) * 1987-07-22 1989-01-25 Philips Patentverwaltung GmbH Filtre optique d'interférence
GB2238400A (en) * 1989-11-24 1991-05-29 Toshiba Lighting & Technology Optical interference film for a lamp
EP1043606A1 (fr) * 1999-04-06 2000-10-11 Nippon Sheet Glass Co. Ltd. Filtre à ondes électromagnétiques transmettant la lumière et procédé pour sa fabrication
US20030170504A1 (en) * 2001-03-19 2003-09-11 Nippon Sheet Glass Co., Ltd. Dielectric film having high refractive index and method for preparation thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0300579A2 (fr) * 1987-07-22 1989-01-25 Philips Patentverwaltung GmbH Filtre optique d'interférence
GB2238400A (en) * 1989-11-24 1991-05-29 Toshiba Lighting & Technology Optical interference film for a lamp
EP1043606A1 (fr) * 1999-04-06 2000-10-11 Nippon Sheet Glass Co. Ltd. Filtre à ondes électromagnétiques transmettant la lumière et procédé pour sa fabrication
US20030170504A1 (en) * 2001-03-19 2003-09-11 Nippon Sheet Glass Co., Ltd. Dielectric film having high refractive index and method for preparation thereof

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009121404A1 (fr) * 2008-04-02 2009-10-08 Osram Gesellschaft mit beschränkter Haftung Système de projection à rendement élevé
WO2010011598A2 (fr) * 2008-07-25 2010-01-28 Ppg Industries Ohio, Inc. Suspension aqueuse pour un revêtement pyrolytique par pulvérisation
WO2010011598A3 (fr) * 2008-07-25 2010-04-22 Ppg Industries Ohio, Inc. Suspension aqueuse pour un revêtement pyrolytique par pulvérisation
US8197940B2 (en) 2008-07-25 2012-06-12 Ppg Industries Ohio, Inc. Aqueous suspension for pyrolytic spray coating
WO2010031808A1 (fr) * 2008-09-17 2010-03-25 Agc Flat Glass Europe Sa Vitrage a reflexion elevee
US8663787B2 (en) 2008-09-17 2014-03-04 Agc Glass Europe High reflection glazing
DE202009008919U1 (de) 2009-06-29 2009-09-10 Osram Gesellschaft mit beschränkter Haftung Halogenglühlampe
US8035285B2 (en) 2009-07-08 2011-10-11 General Electric Company Hybrid interference coatings, lamps, and methods
DE202009012809U1 (de) 2009-09-22 2009-12-31 Osram Gesellschaft mit beschränkter Haftung Halogenglühlampe
WO2013103678A1 (fr) * 2012-01-05 2013-07-11 Massachusetts Institute Of Technology Éclairage à incandescence à haut rendement
US8823250B2 (en) 2012-01-05 2014-09-02 Massachusetts Institute Of Technology High efficiency incandescent lighting
US9115864B2 (en) 2013-08-21 2015-08-25 General Electric Company Optical interference filters, and filament tubes and lamps provided therewith

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