WO2006137849A1

WO2006137849A1 - Methods and apparatuses for detecting and monitoring corrosion using nanostructures

Info

Publication number: WO2006137849A1
Application number: PCT/US2005/032510
Authority: WO
Inventors: William G. England
Original assignee: Purafil, Inc.
Priority date: 2004-09-13
Filing date: 2005-09-13
Publication date: 2006-12-28
Also published as: WO2006137849A9; JP2008512688A; EP1792162A1; CA2583376C; CA2583376A1

Abstract

The present invention relates to methods and apparatuses for detecting and monitoring corrosion using nanostructures. One embodiment of the invention provides a method for detecting corrosion with a nanostructure in a corrosive atmosphere. The method includes providing at least one nanostructure comprising at least one reactive material, and exposing a portion of the at least one reactive material to a corrosive atmosphere. The method also includes detecting a reaction with the at least one reactive material, and based at least in part on the reaction, determining an amount of corrosion associated with the at least one reactive material.

Description

METHODS AND APPARATUSES FOR DETECTING AND MONITORING

CORROSION USING NANOSTRUCTURES

TECHNICAL FIELD

The invention relates generally to the field of corrosion monitoring. The

invention more particularly relates to methods and apparatuses for detecting and

monitoring corrosion using nanostructures.

BACKGROUND OF THE INVENTION

Many metal containing devices and structures must function in corrosive

atmospheres that can cause them to deteriorate over time. Corrosion may take the

form of metal oxides, resulting from reaction with oxygen in the air, or may be

compounds formed by exposure to the effluent of industrial processes, such as

hydrogen sulfide.

In the electronics industry, for example, approximately one-third of all

warranty repair work can be attributable to corrosion. Accordingly, the ability to

accurately monitor corrosion and take appropriate measures to avoid, deter, or prevent

it can be of utmost importance to the industry.

One method and apparatus for monitoring corrosion utilizes a piezoelectric

crystal as a corrosion monitor. The crystal is coated with a corrodible metal, and the

coated crystal is attached to an oscillator before or after placement in the corrosive

atmosphere. As the corrodible metal corrodes, the frequency of vibration of the

coated crystal decreases. The frequency reading is then converted to a thickness reading corresponding to a selected corrosion thickness standard. While this type of

method and apparatus is generally suitable for measuring and detecting certain

degrees of corrosion, in some instances more precise measurements of corrosion are

desired.

Therefore, a need exists for improved methods and apparatuses for detecting

corrosion.

A further need exists for improved methods and apparatuses for monitoring corrosion.

A further need exists for an improved apparatus and methods of manufacturing

a corrosion monitor.

SUMMARY OF THE INVENTION

Methods and apparatuses for detecting and monitoring corrosion using a

nanostructure are provided herein. In addition, methods and apparatuses for detecting

and monitoring corrosion using a corrosion monitor are provided herein. Also

provided are methods of manufacturing a corrosion monitor.

Some or all of the needs above are addressed by various embodiments of the invention described herein. The methods, apparatuses, and corrosion monitor

according to embodiments of the invention can find application in such environments

as industrial process measurement and control rooms, motor control centers, electrical

rooms, semiconductor clean rooms, electronic fabrication sites, critical parts storage,

commercial data centers, museums, libraries, and archival storage rooms. The methods, apparatuses, and corrosion monitor described herein can also be useful for

checking the exhaustion level of filtration media being used to protect the

environment of such spaces. Other embodiments are useful for identifying a

contaminant gas or gases that are causing or could cause corrosion in a particular

environment.

Furthermore, methods, apparatuses, and corrosion monitor according to

embodiments of the invention can also find application in any electronic device or

any processor-based device. Such devices can include, but are not limited to,

electronic chips, semiconductor chips, microelectronics chips, telephones, cell

phones, smart phones, personal communication devices, personal digital assistants

(PDAs), tablets, computers, notebooks, desktops, mainframe computers, MP3 players,

CD / DVD players, audio player devices, radios, televisions, etc.

One embodiment of the present invention provides a method for detecting

corrosion with a nanostructure in a corrosive atmosphere. The method includes

providing at least one nanostructure comprising at least one reactive material, and

exposing a portion of the at least one reactive material to a corrosive atmosphere. The method also includes detecting a reaction with the at least one reactive material, and

based at least in part on the reaction, determining an amount of corrosion associated

with the at least one reactive material.

Another embodiment of the present invention provides an apparatus for

detecting and monitoring corrosion. The apparatus can include an electronic chip with at least one nanostructure comprising at least one reactive material, wherein the

at least one reactive material is capable of reacting with a corrosive atmosphere. The electronic chip can also include a processor capable of receiving a signal associated

with a reaction of the at least one reactive material, and based at least in part on the

signal, determining an amount of corrosion of the at least one reactive material. The

processor is further capable of generating an output signal associated with the amount

of corrosion of the at least one reactive material. The apparatus can also include an output device capable of receiving the output signal from the electronic chip, and

displaying an indicator associated with the amount of corrosion of the at least one

reactive material.

Yet another embodiment of the present invention can include an apparatus for

detecting and monitoring corrosion. The apparatus can include at least one

nanostructure with at least one reactive material adapted to be exposed to a corrosive

atmosphere. In addition, the apparatus can include a detection means for detecting a

reaction associated with the at least one reactive material. Furthermore, the apparatus

can include a measuring means for determining an amount of corrosion of the at least

one reactive material based in part on at least the reaction.

Another embodiment of the present invention can include a method of

manufacture for a corrosion monitor. The method can include providing a

nanostructure including at least one reactive material, wherein the at least one reactive

material is adapted to be exposed to a corrosive atmosphere. In addition, the method can include providing an electronic chip, and mounting the nanostracture to a portion

of the electronic chip. Furthermore, the method can include providing a processor, wherein the processor is capable of detecting a reaction associated with the at least

one reactive material, and based at least in part on the reaction, the processor is

capable of determining an amount of corrosion of the at least one reactive material.

The method can also include mounting the electronic chip to an output device capable

of receiving a signal associated with the amount of corrosion of the at least one

reactive material. In addition, the output device is capable of displaying an indicator

associated with the amount of corrosion of the at least one reactive material.

One aspect of an embodiment of the invention can provide methods and

apparatuses for monitoring or detecting corrosion that are highly sensitive and

precise.

Another aspect of an embodiment of the invention can provide methods for

manufacturing a corrosion monitor using nanostructures.

Yet another aspect of an embodiment of the invention can provide an

apparatus and methods of manufacture for mounting nanostructures on a

microelectronics chip.

These and other aspects, features and advantages of the invention will become

apparent after a review of the following detailed description of the disclosed

embodiments and the appended claims. BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is view of a schematic diagram of an apparatus in accordance with one

embodiment of the invention.

FIG. 2 is a detailed illustration of a microcantilever for the apparatus shown in

FIG. 1.

FIG. 3 is a flowchart illustrating a method in accordance with one embodiment

of the invention.

FIG. 4 is a flowchart illustrating another method in accordance with one

embodiment of the invention.

FIG. 5 is an example of a detection circuit with a nanostructure in accordance

with an embodiment of the invention.

DETAILED DESCRIPTION OF EMBODIMENTS

Embodiments of the invention are designed to detect and to monitor corrosion.

The term "nanostructure" used in this specification generally defines a class of objects

used in nanotechnology-related applications, such as a microcantilevers, nanotubes,

carbon nanotubes, nanoballs, nanoparticles, microelectromechanical (MEMS)-type

devices, and other relatively small objects and devices.

The term "chip" used in this specification generally defines a microelectronics

chip, semiconductor chip, computer chip, circuit chip, microprocessor, processor, or

any type of suitable chip in an electronics or processor-based platform. The term "corrosive atmosphere" used in this specification can include, but is

not limited to, an atmosphere within an electronic device, an atmosphere within a processor-based device, an atmosphere within an enclosed space, an atmosphere

within a room, an atmosphere within a building, and an atmosphere within an air duct.

The apparatus, methods, and other embodiments of the invention is useful for

detecting and monitoring corrosion in various environments including, but not limited

to, industrial process measurement and control rooms, motor control centers,

electrical rooms, semiconductor clean rooms, electronic fabrication sites, commercial

data centers, museums, libraries, and archival storage rooms. Such embodiments are

also useful for checking the exhaustion level of filtration media being used to protect

the environment of such spaces. Other embodiments are useful for identifying a

contaminant gas or gases, particularly a contaminant gas or gases in an environment,

which have caused or might cause corrosion of a metal in that environment.

Furthermore, the apparatus, methods, and other embodiments of the invention

may also find application in any electronic device or any processor-based device.

Such devices include, but are not limited to, electronic chips, semiconductor chips, microelectronic chips, circuit chips, computer chips, telephones, cell phones, smart

phones, personal communication devices, personal digital assistants (PDAs), tablets,

computers, notebooks, desktops, mainframe computers, MP3 players, CD / DVD players, audio player devices, radios, televisions, etc. An environment for the embodiment shown in FIGS. 1 and 2 can be an

electrical chip such as a microelectronics chip, semiconductor chip, computer chip,

circuit chip, microprocessor, processor, or any other suitable component in an

electronic or processor-based platform.

FIG. 1 is a schematic view of an apparatus in accordance with an embodiment

of the invention. The apparatus shown in FIG. 1 is a corrosion monitor 100 for detecting and monitoring corrosion in a corrosive atmosphere. The corrosion monitor

100 includes a nanostructure, such as a microcantilever 102. The nanostructure

includes at least one reactive material adapted to react with a corrosive atmosphere,

such as a metallic material 104. The nanostructure is in the form of, but is not limited

to, a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, a

nanocantilever, or any combination thereof. A suitable reactive material can include,

but is not limited to, a metallic material, copper (Cu), silver (Ag), aluminum (Al),

zinc (Zn), molybdenum (Mo), permalloy, or any combination thereof.

In the embodiment shown, providing a nanostructure such as a microcantilever

102 with a reactive material 104 can be accomplished by, for example, coating a

copper electrode onto a silicon wafer. Providing a nanostructure with at least one

reactive material, such as a microcantilever 102 with reactive material 104, can be

achieved by various methods including, but not limited to, integrating, bonding,

layering, etching, applying, attaching, connecting thin film deposition techniques, and

ion beam sputtering. Other examples of providing a nanostructure with a reactive material 104 can include coating a portion of a microcantilever with a metallic

material, coating a portion of a nanostructure with a metallic material, coating a

portion of a nanotube with a metallic material, or coating a portion of one or more

nanoballs with a metallic material. In this manner, at least a portion of the

nanostructure includes at least one reactive material.

Suitable nanostructures for the methods and apparatuses provided herein may

be obtained from commercial suppliers such as NanoDevices of Santa Barbara,

California. Suitable methods to coat or otherwise apply at least one reactive material

to a nanostructure may be performed by nanotechnology and/or nanoscience material

processors such as BioForce Nanosciences, Inc. of Ames, Iowa.

In at least one embodiment of the invention, multiple reactive materials can be

coated onto the nanostructure, and some or all of the reactive materials can be adapted

to react with a corrosive atmosphere, material, or substance. In one embodiment,

reactive materials can be adapted to react with different types of corrosive

atmospheres, materials, or substances.

In another embodiment, at least one reactive material is coated onto multiple

nanostructures that are integrated or otherwise connected together such that some or

all of the nanostructures are monitored separately or as a single device. In one

embodiment, the nanostructures are monitored to react with particular corrosive

atmospheres, materials, or substances. Furthermore, the apparatus shown in FIG. 1 may optionally include a means

for detecting a reaction associated with the reactive material. A means for detecting a

reaction associated with the reactive material can be, for example, facilitated by a

processor 106 in operative communication with the nanostructure, such as the

microcantilever 102 shown in FIG. 1. The processor 106 may include or be capable

of executing a set of computer-executable instructions, such as instructions 108 stored on a computer-readable medium or in memory 110, for detecting a reaction associated

with a reactive material.

Such processors may comprise a microprocessor, an ASIC, and state

machines. Such processors comprise, or may be in communication with, media, for

example computer-readable media, which stores instructions that, when executed by

the processor, cause the processor to perform the steps described herein.

Embodiments of computer-readable media include, but are not limited to, an

electronic, optical, magnetic, or other storage or transmission device capable of

providing a processor, such as the processor 106, with computer-readable

instructions. Other examples of suitable media include, but are not limited to, a floppy disk, CD-ROM, DVD, magnetic disk, memory chip, ROM, RAM, an ASIC, a

configured processor, all optical media, all magnetic tape or other magnetic media, or

any other medium from which a computer processor can read instructions. Also, various other forms of computer-readable media may transmit or carry instructions to

a computer, including a router, private or public network, or other transmission device or channel, both wired and wireless. The instructions may comprise code from any

computer-programming language, including, for example, C, C++, C#, Visual Basic,

Java, Python, Perl, and JavaScript.

A reaction associated with a reactive material can include, but is not limited to,

a change in mass, displacement, vibration frequency, electrical resistance, electrical

voltage, a physical characteristic of the reactive material, an electrical characteristic

of the reactive material, a chemical characteristic of the reactive material, or any combination thereof.

For example, the processor 106 shown can include or is capable of executing a

set of instructions to detect a mass change in a reactive material associated with a

nanostracture. In most instances, a predefined mass of a particular reactive material

associated with a nanostructure is known or measured, and can be compared with a

subsequent mass, change in mass, or difference.

In another example, the processor 106 can include or is capable of executing a

set of instructions to detect a change in displacement in a reactive material associated

with a nanostructure. In most instances, a predefined position of a particular reactive material associated with a nanostracture is known or measured, and can be compared

with a subsequent position, change in position, or difference.

In another example, the processor 106 can include or is capable of executing a

set of instructions to detect a change in vibration frequency in a reactive material

associated with a nanostructure. In most instances, a predefined vibration frequency of a particular reactive material associated with a nanostructure is known or

measured, and can be compared with a subsequent vibration frequency, change in

vibration frequency, or difference.

By way of another example, the processor 106 can include or is capable of

executing a set of instructions to detect a change in electrical resistance in a reactive

material associated with a nanostructure. In most instances, a predefined electrical

resistance of a particular reactive material associated with a nanostructure is known or

measured, and can be compared with a subsequent electrical resistance, change in

electrical resistance, or difference.

In yet another example, the processor 106 can include or is capable of executing a set

of instructions to detect a change in electrical voltage in a reactive material associated

with a nanostructure. In most instances, a predefined electrical voltage of a particular

reactive material associated with a nanostructure is known or measured, and can be

compared with a subsequent electrical voltage, change in electrical voltage, or

difference.

Other examples of physical, electrical, and/or chemical characteristics

associated with a reactive material that can be detected and monitored for changes

and within the scope of the invention, will be recognized by those skilled in the art

upon reviewing this specification.

Further, the apparatus optionally also includes a measuring means for

determining an amount of corrosion of the at least one reactive material based at least in part on the reaction. In the embodiment shown in FIG. 1, the measuring means is

facilitated by the processor 106 in operative communication with a nanostructure, such as the microcantilever 102, as shown. The processor 106 can include or is

capable of executing a set of computer-executable instructions, such as instructions

stored on a computer-readable medium, for determining an amount of corrosion of the

reactive material based at least in part on the reaction. Generally, detection of a

reaction with a particular reactive material can be quantified or otherwise measured

depending on the type of reaction detected. A predefined correlation between a

quantitative measurement of the reaction and an amount of the reactive material

remaining can be used to determine an amount of corrosion of the reactive material.

For example, the processor 106 can include or is capable of executing a set of

instructions to correlate an amount of a detected mass change in a reactive material to

the amount of the reactive material remaining and to determine an amount of

corrosion of the reactive material remaining. That is, if a mass change in a reactive

material associated with a nanostructure is detected, the mass change can be

correlated to an amount of corrosion of the reactive material. In this example, mass change of a particular reactive material is correlated to a remaining thickness (in

angstroms or other unit of thickness) of the reactive material, and the amount of

corrosion of the reactive material is determined.

In another example, if a displacement of a reactive material associated with a

nanostructure is detected, the displacement is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set

of instructions to correlate an amount of a detected displacement in a reactive material associated with a nanostracture to the amount of the reactive material remaining and

to determine an amount of corrosion of the reactive material.

In another example, if a change in vibration frequency of a reactive material

associated with a nanostructure is detected, the change in vibration frequency is

correlated to an amount of corrosion of the reactive material. The processor 106 can

include or is capable of executing a set of instructions to correlate an amount of a

detected change in vibration frequency in the reactive material to the amount of the

reactive material remaining and to determine an amount of corrosion of the reactive

material.

By way of another example, if a change in electrical resistance of a reactive

material associated with a nanostructure is detected, the change in electrical resistance

is correlated to an amount of corrosion of the reactive material. The processor 106

can include or is capable of executing a set of instructions to correlate an amount of a

detected change in electrical resistance in the reactive material to the amount of the

material.

In yet another example, if a change in electrical voltage of a reactive material

associated with a nanostructure is detected, the change in electrical voltage is

correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions correlate an amount of a

detected change in electrical voltage in the reactive material to the amount of the

material.

Other detected or otherwise monitored changes in physical, electrical, and/or

chemical characteristics associated with a reactive material associated with a nanostructure can be correlated to an amount of corrosion of the reactive material in

accordance with embodiments of the invention, and will be recognized by those

skilled in the art upon reviewing this specification. Various responses over time for

changes in physical, electrical, and/or chemical characteristics can be monitored and

correlated to determine amounts of corrosion of reactive materials.

In at least one embodiment, an apparatus can include an output device for

displaying the amount of corrosion. In the example shown in FIG. 1, the output

device is a display device 112 associated with the processor 106. The output device

can also include, but is not limited to, a meter, an indicator, an LED, an LCD, a

display, a plasma display, a touch screen device, a projector display, a monitor, or any

other suitable device for outputting an amount, measurement, determination, or result

associated with the processor 106. Those skilled in the art will recognize that an

output device can be integrated with components of an apparatus in accordance with

the invention, or can be a separate component in operative communication with the

other components of an apparatus in accordance with the invention. In at least one embodiment, some or all of the components of an apparatus

such as the corrosion monitor 100 shown in FIG. 1 can be adapted to mount to an

electronic chip, such as a semiconductor chip or a silicon wafer. Some or all of the

components of the apparatus can be integrated with or otherwise mounted to the

electronic chip. In another embodiment, some or all of the components of an

apparatus can be integrated with the electronic chip, while remaining components are operatively in communication with the chip-integrated components. For example, a

nanostructure such as the microcantilever 102, as shown and described above, and the

processor 106, as shown and described above, can each be integrated with an

electronic chip for an electronic device or processor-based platform. By way of

example, a diagram of a detection circuit with a nanostructure in accordance with an

embodiment of the invention is illustrated in FIG. 5. An output device, such as the

display device 108, as shown and described above, can be operatively in

communication with the processor 106, or can otherwise be in operative

communication with the electronic chip, or electronic device or processor-based

platform. In this manner, the apparatus for detecting and monitoring corrosion can be

implemented in accordance with various embodiments of the invention.

FIG. 1. The microcantilever 102, as shown in FIG. 2, includes a silicon wafer 200

and a copper electrode 202. Other combinations of nanostructures and reactive

materials can be utilized in accordance with embodiments of the invention. As shown, the example dimensions of the microcantilever indicate that the sizes of

nanostructures and reactive materials utilized in accordance with embodiments of the

invention may be relatively small.

FIG. 3 is a flowchart illustrating a method in accordance with an embodiment

of the invention. The method 300 of FIG. 3 is a method for monitoring and detecting

corrosion with a nanostructure in a corrosive atmosphere. Other embodiments of the

method can have fewer or greater steps in accordance with the invention. The method

300 begins at block 302.

In block 302, a nanostructure comprising at least one reactive material is

provided. In one embodiment, a nanostructure can include one of the following: a

microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, or a

nanocantilever. In another embodiment, a reactive material can include one of the

following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn),

molybdenum (Mo), or permalloy. In yet another embodiment, providing at least one

nanostructure comprising at least one reactive material comprises coating a copper

electrode on a silicon wafer.

In one embodiment, providing a nanostructure comprising at least one reactive

material can include one of the following: mounting a nanostructure to a

microelectronics chip, mounting a nanostructure to a semiconductor chip, mounting a

nanostructure within an electronic device, or mounting a nanostructure within an

enclosure. Block 302 is followed by block 304, in which the at least one reactive material

is exposed to a corrosive atmosphere.

Block 304 is followed by block 306, in which a reaction with the at least one reactive material is detected. In embodiment, a reaction can include a change in one

of the following: mass, displacement, vibration frequency, electrical resistance,

electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive

material. In another embodiment, detecting a reaction with the at least one reactive

material comprises determining a difference between an initial characteristic and a

subsequent characteristic of the at least one reactive material.

Block 306 is followed by block 308, in which, based on at least the reaction,

an amount of corrosion associated with the at least one reactive material is

determined. In one embodiment, determining an amount of corrosion associated with

the at least one reactive material can include determining a difference between an

initial characteristic and a current characteristic of the at least one reactive material,

and associating the difference with an amount of corrosion. The method 300 ends at

block 308. In one embodiment, a reaction can include a change in one of the

following: mass, displacement, vibration frequency, electrical resistance, electrical

of the reactive material, or a chemical characteristic of the reactive material. The

method 300 ends at block 308. FIG. 4 is a flowchart illustrating another method in accordance with an

embodiment of the invention. The method 400 in FIG. 4 is a method for

manufacturing a corrosion monitor. Other embodiments of the method can have

fewer or greater steps in accordance with the invention. The method 400 begins at

block 402.

In block 402, a nanostructure comprising at least one reactive material is

provided, wherein the at least one reactive material is adapted to react with a

corrosive atmosphere.

Block 402 is followed by block 404, in which an electronic chip is provided,

wherein the electronic chip is adapted to mount a portion of the nanostructure.

Block 404 is followed by block 406, in which the nanostructure is mounted to

a portion of the electronic chip.

Block 406 is followed by block 408, in which a processor is provided, wherein

the processor is capable of detecting a reaction associated with the at least one reactive material, and further capable of determining an amount of corrosion of the at

least one reactive material based in part on at least the reaction. In one embodiment,

the processor is in operative communication with the nanostructure.

Block 408 is followed by block 410, in which the electronic chip is connected

to an output device, wherein the amount of corrosion of the at least one reactive

material can be displayed. The method 400 ends at block 410. FIG. 5 is a diagram of an example of a detection circuit with a nanostructure in

accordance with an embodiment of the invention. The detection circuit 500 can be

installed in a variety of electronic devices or processor-based devices, such as a

corrosion monitor.

The detection circuit 500 shown in FIG. 5 includes a nanostructure such as a

microcantilever 502. The detection circuit 500 shown also includes a power supply

504, a processor 506 and a memory such as an EEPROM 508, and an oscillator 510.

A detection circuit in accordance with other embodiments of the invention can have other configurations and arrangements of components.

In the detection circuit 500 shown, the power supply 504 can provide current

as needed to some or all of the components arranged in the circuit, including the

microcantilever 502, EEPROM 506, and oscillator 508. A suitable power supply can be a 3 - 5 VDC power supply manufactured by Bias Power Technologies, Inc.

In the detection circuit 500 shown, the microcantilever 502 can be exposed to,

for instance, a corrosive atmosphere, substance or material. In response to the

corrosive atmosphere, substance or material, the microcantilever 502 can, for instance, deflect or otherwise react to the corrosive atmosphere, substance or material.

In one embodiment, at least one reactive material coated, applied, or mounted to the

microcantilever 502 can react to the corrosive atmosphere, substance, or material. A

suitable microcantilever can be a DMASP series micro-actuated silicon active probe

manufactured by Veeco Instruments, Inc. In any instance, a signal associated with the reaction of the microcantilever 502 can be detected, transmitted to, or otherwise

received by the oscillator 510.

The oscillator 510 shown in FIG. 5 can detect, or receive a signal associated

with the reaction of the microcantilever to the corrosive atmosphere, substance, or

material. The oscillator 510 can generate a frequency output signal based at least in

part on the reaction of the microcantilever 502 to the corrosive atmosphere, substance,

or material. For example, the oscillator 510 can provide a relatively greater frequency

response signal based on a signal associated with a relatively large deflection of the

microcantilever 502. Likewise, the oscillator 510 can provide a relatively smaller

frequency response signal based on a signal associated with a relatively small

deflection of the microcantilever 502. A suitable oscillator can be a HA7210 series

10 kHz - 10 MHz, low power, crystal-type oscillator manufactured and distributed by

Intersil Corporation of Milpitas, California.

In one embodiment, a comparison between frequency response signals from an

oscillator 510 can be used to determine a difference in the frequency response based

at least in part on the signal received from the microcantilever 502 during a

predefined period of time, such as an initial time and a subsequent time. The

difference in the frequency response can be associated with an amount of corrosion of

the reactive material.

The processor 506 can provide or otherwise execute a set of instructions or

commands to control some or all of the components of the detection circuit 500. An associated memory such as the EEPROM 508 can provide data storage or a computer-

readable medium for storing a set of instructions or commands for execution by the

processor 506. For example, the processor 506 can execute a set of instructions for

detecting, measuring, and monitoring corrosion using a nanostructure such as a

microcantilever 502. A suitable processor can be a PIC18F1220 series

microcontroller manufactured by MircoChip Technology, Inc. A suitable memory

can be a serial flash-type memory chip manufactured by ATMEL Corporation.

It should be understood, of course, that the foregoing relates only to certain

embodiments of the present invention and that numerous modifications or alterations may be made therein without departing from the scope of the invention.

Claims

CLAIMSThe invention I claim is:

1. A method for detecting corrosion with a nanostructure in a corrosive

atmosphere, comprising:

providing at least one nanostructure comprising at least one reactive material;

exposing a portion of the at least one reactive material to a corrosive

atmosphere; detecting a reaction with the at least one reactive material; and

based at least in part on the reaction, determining an amount of corrosion

associated with the at least one reactive material.

2. The method of claim 1, wherein providing at least one nanostructure

comprising at least one reactive material comprises coating a copper electrode on a

silicon wafer.

3. The method of claim 1, wherein providing at least one nanostructure

comprising at least one reactive material comprises coating a nanostructure with a

plurality of reactive materials, wherein each reactive material is capable of reacting

with a different substance.

4. The method of claim 1, wherein providing at least one nanostructure

comprising at least one reactive material comprises coating a plurality of

nanostructures with a respective reactive material, wherein each respective reactive

material is capable of reacting with a different substance.

5. The method of claim 1, wherein the nanostructure comprises one of the

following: a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a

nanoball, or a nanocantilever.

6. The method of claim 1, wherein the at least one reactive material

comprises one of the following: a metallic material, copper (Cu), silver (Ag),

aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy.

7. The method of claim 1, wherein detecting a reaction with the at least

one reactive material comprises determining a difference between an initial

characteristic and a subsequent characteristic of the at least one reactive material.

8. The method of claim 1, wherein the reaction comprises a change in one

electrical voltage, a physical characteristic of the reactive material, an electrical

characteristic of the reactive material, or a chemical characteristic of the reactive

material.

9. The method of claim 1, wherein determining an amount of corrosion

associated with the at least one reactive material comprises determining a difference

between an initial characteristic and a current characteristic of the at least one reactive

material, and associating the difference with an amount of corrosion.

10. An apparatus for detecting and monitoring corrosion, comprising: an electronic chip comprising at least one nanostructure comprising at least one reactive material,

wherein the at least one reactive material is capable of reacting with a corrosive

atmosphere; a processor capable of

receiving a signal associated with a reaction of the at least one

reactive material, and based at least in part on the signal, determining an amount of

corrosion of the at least one reactive material; and

generating an output signal associated with the amount of

corrosion of the at least one reactive material; and

an output device capable of receiving the output signal from the electronic chip; and

displaying an indicator associated with the amount of corrosion of the

at least one reactive material.

11. The apparatus of claim 10, wherein the at least one reactive material is

coated on the nanostructure.

12. The apparatus of claim 10, wherein the at least one nanostructure

comprising at least one reactive material comprises a plurality of nanostructures with

a respective reactive material capable of reacting with a respective substance.

13. The apparatus of claim 10, wherein the at least one nanostructure comprises one of the following: a microcantilever, a nanotube, a carbon nanotube, a

nanoparticle, a nanoball, or a nanocantilever.

14. The apparatus of claim 10, wherein the at least one reactive material

comprises one of the following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy.

15. The apparatus of claim 10, wherein determining an amount of corrosion

of the at least one reactive material comprises determining a difference between an

initial signal associated with the at least one reactive material and a subsequent signal

associated with the reaction of the at least one reactive material.

16. The apparatus of claim 10, wherein the reaction comprises a change in

one of the following: mass, displacement, vibration frequency, electrical resistance,

characteristic of the reactive material, or a chemical characteristic of the reactive material.

17. An apparatus for detecting and monitoring corrosion, comprising:

at least one nanostructure with at least one reactive material adapted to be

exposed to a corrosive atmosphere;

a detection means for detecting a reaction associated with the at least one reactive material; and a measuring means for determining an amount of corrosion of the at least one

reactive material based in part on at least the reaction.

18. The apparatus of claim 17, wherein the at least one nanostructure comprises one of the following: a microcantilever, a nanotube, a carbon nanotube, a

nanoparticle, a nanoball, or a nanocantilever.

19. The apparatus of claim 17, wherein the at least one reactive material

comprises one of the following: a metallic material, copper (Cu), silver (Ag),

aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy

20. A method of manufacture for a corrosion monitor, comprising:

providing a nanostructure including at least one reactive material, wherein the

at least one reactive material is adapted to be exposed to a corrosive atmosphere:

providing an electronic chip, and mounting the nanostructure to a portion of

the electronic chip; providing a processor, wherein the processor is capable of

detecting a reaction associated with the at least one reactive material,

and

based at least in part on the reaction, determining an amount of

corrosion of the at least one reactive material; and

mounting the electronic chip to an output device capable of

receiving a signal associated with the amount of corrosion of the at

least one reactive material; and displaying an indicator associated with the amount of corrosion of the

ctive material.