JP2008512688A - Method and apparatus for detecting and monitoring corrosion using nanostructures - Google Patents

Abstract

The present invention relates to a method and apparatus for detecting and monitoring corrosion using nanostructures. One embodiment of the present invention provides a method for detecting corrosion by nanostructures in a corrosive atmosphere. The method includes providing at least one nanostructure of at least one reactant and exposing a portion of the at least one reactant to a corrosive atmosphere. The method further includes detecting a reaction with the at least one reactant and determining an amount of corrosion associated with the at least one reactant based on at least a portion of the reaction.
[Selection] Figure 1

Description

  The present invention relates generally to the field of corrosion monitoring. More particularly, the present invention relates to a method and apparatus for detecting and monitoring corrosion using nanostructures.

Background Art Many metal-containing devices and metal-containing structures must function in corrosive atmospheres that cause deterioration over time. Corrosion takes the form of metal oxides resulting from reaction with oxygen in the air and compounds such as hydrogen sulfide that form upon exposure to many industrial processes.

  For example, in the electronics industry, about one third of all warranty repair work is believed to be due to corrosion. It is therefore most important for the industry to accurately monitor corrosion and take appropriate measures to avoid, reduce or prevent it.

  One way to monitor corrosion is to use a piezoelectric crystal as a corrosion monitor. A corrosive metal is applied to the crystal body, and the applied crystal body is attached to an oscillator. This attachment is performed before or after being placed in a corrosive atmosphere. As the corrosive metal corrodes, the vibration frequency of the coated crystal decreases. Read the frequency and convert it to a thickness corresponding to the selected corrosion thickness criteria. In general, this type of method and apparatus is suitable for measuring and detecting some degree of corrosion, but more precise corrosion measurements are often desired.

  Therefore, there is a need for an improved method and apparatus for detecting corrosion.

  Further, there is a need for improved methods and apparatus for monitoring corrosion.

  Furthermore, there is a need for improved apparatus and methods for manufacturing corrosion monitors.

SUMMARY OF THE INVENTION A method and apparatus for detecting and monitoring corrosion using nanostructures is provided. Furthermore, a method and apparatus for detecting and monitoring corrosion using a corrosion monitor is provided. In addition, a method of manufacturing a corrosion monitor is provided.

  Some or all of the above needs are met by the various embodiments of the present invention disclosed herein. Methods, apparatus, and corrosion monitors according to embodiments of the present invention include industrial process measurement control rooms, monitoring control centers, electrical rooms, semiconductor clean rooms, electronic assembly factories, precision parts warehouses, commercial data centers, museums, libraries, record keeping. Applicable to rooms and other environments. The methods, devices, and corrosion monitors disclosed herein can also be used to check the level of exhaustion of the filtration media used to protect such spatial environments. Another embodiment is useful for identifying pollutant gases that cause corrosion in a particular environment.

  Furthermore, the method, apparatus, and corrosion monitor according to embodiments of the present invention can be applied to any electronic device or processor-based device. For example, electronic chip, semiconductor chip, microelectronic chip, telephone, mobile phone, smartphone, personal communication device, personal digital assistant (PDA), tablet computer, computer, notebook computer, desktop computer, mainframe computer, MP3 player, CD / The present invention is applicable to DVD players, audio player devices, radios, televisions, etc., but is not limited to these.

  One embodiment of the present invention provides a method for detecting corrosion by nanostructures in a corrosive atmosphere. The method includes providing at least one nanostructure of at least one reactant and exposing a portion of the at least one reactant to a corrosive atmosphere. The method further includes detecting a reaction with the at least one reactant and determining an amount of corrosion associated with the at least one reactant based on at least a portion of the reaction.

  Another embodiment of the present invention provides an apparatus for detecting and monitoring corrosion. The apparatus comprises an electronic chip having at least one nanostructure made of at least one reactant. The at least one reactant is capable of reacting with a corrosive atmosphere. The electronic chip may further include a processor that receives a signal associated with the reaction of the at least one reactant and determines the amount of corrosion of the at least one reactant based on at least a portion of the signal. Can be determined. Further, the processor can generate an output signal associated with the amount of corrosion of the at least one reactant. The apparatus can further include an output device that can receive the output signal from the electronic chip and display an indicator associated with the amount of corrosion of the at least one reactant.

  Yet another embodiment of the present invention provides an apparatus for detecting and monitoring corrosion. The device can include at least one nanostructure having at least one reactant adapted to be exposed to a corrosive atmosphere. Further, the apparatus can include detection means for detecting a reaction associated with the at least one reactant. Further, the apparatus can include a measuring means for determining a corrosion amount of the at least one reactant based at least in part on the reaction.

  Another embodiment of the invention can include a method of manufacturing a corrosion monitor. The method includes providing a nanostructure that includes at least one reactant. The at least one reactant is exposed to a corrosive atmosphere. The method further includes providing an electronic chip and mounting the nanostructure on a portion of the electronic chip. The method further includes providing a processor. The processor is capable of detecting a reaction associated with the at least one reactant and determining an amount of corrosion of the at least one reactant based on at least a portion of the reaction. The method further includes mounting the electronic chip on an output device, the output device being capable of receiving a signal associated with the amount of corrosion of the at least one reactant. Furthermore, the output device can display an indicator associated with the amount of corrosion of the at least one reactant.

  One aspect of an embodiment of the present invention can provide a sensitive and accurate method and apparatus for monitoring or detecting corrosion.

  Another aspect of an embodiment of the present invention can provide a method of manufacturing a corrosion monitor using nanostructures.

  According to still another aspect of an embodiment of the present invention, a manufacturing apparatus and a manufacturing method for mounting a nanostructure on a microelectronic chip can be provided.

  The foregoing and other aspects, features, and advantages of the present invention will become apparent upon review of the detailed description of the embodiments disclosed below and the claims.

Detailed Description of the Embodiments Each example of the present invention is designed to detect and monitor corrosion. As used herein, the term “nanostructure” refers to a type of object that is widely used in the field of nanotechnology. For example, relatively small objects and devices such as microcantilevers, nanotubes, carbon nanotubes, nanoballs, nanoparticles, microelectromechanical (MEMS) devices.

  The term “chip” as used herein refers broadly to any chip suitable for an electronic or processor environment, such as a microelectronic chip, semiconductor chip, computer chip, circuit chip, microprocessor, processor or the like.

  As used herein, the term “corrosive atmosphere” includes an atmosphere in an electronic device, an atmosphere in a processor-based device, an atmosphere in an enclosed space, an atmosphere in a room, an atmosphere in a building, and an atmosphere in a ventilation path. However, the present invention is not limited to these.

  The apparatus, methods, and other embodiments of the present invention are useful for detecting and monitoring corrosion in a variety of environments. Various environments include, but are not limited to, industrial process measurement control rooms, motor control centers, electrical rooms, semiconductor clean rooms, electronic assembly sites, commercial data centers, museums, libraries, and record storage rooms. These embodiments can also be used to check the exhaustion level of the filtration medium used to protect the spatial environment. Another embodiment is useful for identifying pollutant gases, especially those that cause metal corrosion in a given environment.

  Furthermore, the apparatus, method, and other embodiments of the present invention can be applied to all electronic devices and processor-based devices. For example, electronic chip, semiconductor chip, microelectronic chip, circuit chip, computer chip, telephone, mobile phone, smartphone, personal communication device, personal digital assistant (PDA), tablet computer, computer, notebook computer, desktop computer, mainframe computer It can be applied to MP3 players, CD / DVD players, audio player devices, radios, televisions, etc., but is not limited thereto.

  The environment of the embodiment shown in FIGS. 1 and 2 is, for example, an electrical chip. For example, microelectronic chips, semiconductor chips, computer chips, circuit chips, microprocessors, processors, and other suitable components in an electronic environment or a processor utilization environment.

  FIG. 1 is a schematic diagram showing an apparatus according to an embodiment of the present invention. The apparatus shown in FIG. 1 is a corrosion monitor 100 that detects and monitors corrosion in a corrosive atmosphere. The corrosion monitor 100 includes nanostructures such as microcantilevers 102. The nanostructure includes at least one reactant that reacts with the corrosive atmosphere, such as a metallic material 104. The nanostructure may take the form of a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, a nanocantilever, or a combination thereof, but is not limited thereto. Suitable reactants include, but are not limited to, metallic materials, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), permalloy, or combinations thereof. It is not a thing.

  In the illustrated embodiment, providing the reactant 104 to a nanostructure such as the microcantilever 102 can be accomplished, for example, by applying a copper electrode to a silicon wafer. Providing at least one reactant to the nanostructure, such as the microcantilever 102 having the reactant 104, can be achieved by various methods. Examples include, but are not limited to, integration, adhesion, multilayering, etching, coating, attachment, connection thin film deposition techniques, and ion beam sputtering. Other examples of providing the reactant 104 to the nanostructure include applying a metallic material to a portion of the microcantilever, applying a metallic material to a portion of the nanostructure, and a metallic material to a portion of the nanotube. Applying a metallic material to a portion of the one or more nanoballs. Thus, at least a portion of the nanostructure includes at least one reactant.

  Suitable nanostructures for the methods and apparatus provided herein are available from commercial manufacturers such as nanodevices in Santa Barbara, California. A suitable method for applying or applying at least one reactant to the nanostructure can be performed by a nanotechnology and / or nanoscience materials processor such as Bioforce Nanoscience, Ames, Iowa.

  In at least one embodiment of the invention, a plurality of reactants can be applied to the nanostructure. Some or all of these reactants can be made to react with corrosive atmospheres, corrosive materials, and corrosive substances. In one embodiment, each reactant can react with a different type of corrosive atmosphere, corrosive material, or corrosive material.

  In another embodiment, at least one reactant is applied to a plurality of nanostructures, the nanostructures are integrated or connected together, and some or all nanostructures are monitored separately or as a single device. Also good. In one embodiment, the nanostructure is monitored for reaction with a particular corrosive atmosphere, corrosive material, or corrosive substance.

  Further, the apparatus shown in FIG. 1 can optionally include means for detecting a reaction involving the reactant. The means for detecting a reaction relating to the reactant can comprise, for example, a processor 106. The processor 106 is in operative communication with a nanostructure such as the microcantilever 102 shown in FIG. The processor 106 includes or can execute a computer-executable instruction set. This instruction set is, for example, the instruction 108 and is stored in a computer-readable medium or the memory 110 to detect a reaction relating to the reactant.

  The processor can comprise a microprocessor, an ASIC, and a state machine. Such processors comprise or can communicate with the medium. The medium is, for example, a computer readable medium and stores instructions. These instructions are executed by the processor to cause the processor to perform the following steps. Examples of computer readable media include, but are not limited to, electronic storage devices, optical storage devices, magnetic storage devices, other storage devices, or communication devices that can provide computer readable instructions to a processor such as processor 106. Not what you want. Other examples of suitable media are floppy disks, CD-ROMs, DVDs, magnetic disks, memory chips, ROM, RAM, ASICs, configured processors, all optical media, all magnetic tapes and other magnetic media Or any other medium on which a computer processor can read instructions, but is not limited to such. In addition, various other forms of computer readable media may transmit or convey instructions to the computer. For example, a router, a dedicated network, a public network, other transmission devices, wired and wireless lines, and the like. The instructions may be all computer programming language code including, for example, C, C ++, C #, Visual Basic, Java, Python, Pearl, Javascript, and the like.

  Reactions related to reactants may include changes in mass, displacement, vibration frequency, electrical resistance, voltage, physical properties of the reactants, electrical properties of the reactants, chemical properties of the reactants, or combinations thereof. However, it is not limited to these.

  For example, the illustrated processor 106 can include or execute a set of instructions that detect a change in mass of a reactant associated with the nanostructure. In many cases, the predefined mass of a particular reactant associated with the nanostructure is known or can be measured and compared to the resulting mass, mass change, or mass difference.

  In another example, the processor 106 can include or execute a set of instructions that detect displacements in the reactants associated with the nanostructures. In many cases, the predefined position of a particular reactant associated with the nanostructure is known or can be measured and compared to the resulting position, position change, or position difference.

  In another example, the processor 106 may include or execute a set of instructions that detect changes in vibration frequency in the reactants associated with the nanostructure. In many cases, the predefined vibration frequency of a particular reactant associated with the nanostructure is known or can be measured and compared to the resulting vibration frequency, vibration frequency change, or vibration frequency difference.

  In other examples, the processor 106 can include or execute a set of instructions that detect a change in electrical resistance in a reactant associated with the nanostructure. In many cases, the predefined electrical resistance of a particular reactant associated with the nanostructure is known or can be measured and compared to the resulting electrical resistance, electrical resistance change, or electrical resistance difference.

  In yet another example, the processor 106 can include or execute a set of instructions that detect voltage changes in the reactants associated with the nanostructure. In many cases, the predefined voltage of a particular reactant associated with the nanostructure is known or can be measured and compared to the resulting voltage, voltage change, or voltage difference.

  Other physical, electrical, and / or chemical properties associated with the reactant can also be detected and monitored for changes and are within the scope of the present invention. These will be apparent to those skilled in the art upon reading this specification.

  Further, the apparatus can optionally include a measuring means for determining a corrosion amount of the at least one reactant based on at least a part of the reaction. In the embodiment shown in FIG. 1, this measurement means is implemented by a processor 106 that is in operative communication with a nanostructure, such as the illustrated microcantilever 102. The processor 106 includes or can execute a computer-executable instruction set. These instructions are, for example, instructions stored in a computer readable medium, and determine the amount of corrosion of the reactant based on at least a portion of the reaction. In general, detection of a reaction with a specific reactant can be quantified or measured depending on the type of reaction detected. Using a predefined correlation between the quantitative measurement of the reaction and the remaining amount of reactant, the amount of corrosion of the reactant can be determined.

  For example, the processor 106 may include or execute a set of instructions that correlate the detected mass change to the reactant with the amount of reactant remaining to determine the amount of corrosion of the reactant remaining. That is, when a change in mass of a reactant associated with the nanostructure is detected, the change in mass can be correlated with the amount of corrosion of the reactant. In this example, the mass change of a specific reactant is correlated with the remaining thickness of the reactant (angstroms or other thickness units) to determine the amount of corrosion of the reactant.

  In another example, if a displacement of a reactant associated with the nanostructure is detected, the displacement is correlated with the amount of corrosion of the reactant. The processor 106 may include or execute an instruction set that determines the amount of corrosion of the reactant by correlating the displacement detected in the reactant associated with the nanostructure with the remaining amount of the reactant.

  In another example, if a change in vibration frequency of a reactant associated with the nanostructure is detected, the change in vibration frequency is correlated to the amount of corrosion of the reactant. The processor 106 may include or execute an instruction set that determines the amount of corrosion of the reactant by correlating the amount of change in the vibration frequency detected in the reactant with the remaining amount of the reactant.

  In another example, if a change in electrical resistance of a reactant associated with the nanostructure is detected, the change in electrical resistance is correlated to the amount of corrosion of the reactant. The processor 106 may include or execute an instruction set that determines the amount of corrosion of the reactant by correlating the amount of change in electrical resistance detected by the reactant with the remaining amount of the reactant.

  In yet another example, if a change in voltage of a reactant associated with the nanostructure is detected, the change in voltage is correlated to the amount of corrosion of the reactant. The processor 106 may include or execute an instruction set that determines the amount of corrosion of the reactant by correlating the amount of change in the voltage detected in the reactant with the remaining amount of the reactant.

  By reading this specification, it is understood that other physical, electrical, and / or chemical changes associated with a reactant can also be correlated to the amount of corrosion of the reactant based on embodiments of the present invention. It will be apparent to those skilled in the art. Various reactions over time with respect to physical, electrical, and / or chemical properties can be monitored and correlated to determine the amount of corrosion of the reactants.

  In at least one embodiment, the device may include an output device for indicating the amount of corrosion. In the example shown in FIG. 1, the output device is a display device 112 associated with the processor 106. This output device is a meter, indicator, LED, LCD, display, plasma display, touch screen device, projection device, monitor, and other suitable devices for outputting quantities, measurements, decisions, and results relating to the processor 106, It is not limited to these. As will be apparent to those skilled in the art, the output device may be integrated into the components of the device according to the present invention or may be a separate component that is in operative communication with the components of the device according to the present invention.

  In at least one embodiment, some or all of the components of an apparatus such as the corrosion monitor 100 shown in FIG. 1 can be mounted on an electronic chip such as a semiconductor chip or a silicon wafer. Some or all of the components of the device can be integrated or arranged on an electronic chip. In another embodiment, some or all of the device components may be integrated on an electronic chip, and the remaining components may be in operative communication with components integrated on the chip. For example, the illustrated nanostructure such as the microcantilever 102 and the illustrated processor 106 may be integrated on an electronic device or an electronic chip for a processor utilization apparatus. For example, a detection circuit with a nanostructure according to one embodiment of the present invention is shown in FIG. The output device, such as the display device 108 shown and described above, can be in operative communication with the processor 106, or can be in operative communication with an electronic chip, an electronic device, and a processor utilizing device. Thus, an apparatus for detecting and monitoring corrosion can be implemented based on various embodiments of the present invention.

  FIG. 2 is a detailed view showing a microcantilever for the apparatus shown in FIG. The micro cantilever 102 shown in FIG. 2 includes a silicon wafer 200 and a copper electrode 202. Other combinations of nanostructures and reactants can also be used based on embodiments of the present invention. In the figure, the exemplary dimensions of the microcantilever indicate that the dimensions of the nanostructures and reactants used in accordance with embodiments of the present invention are relatively small.

  FIG. 3 is a flowchart illustrating a method according to an embodiment of the present invention. The method 300 of FIG. 3 is a method for monitoring and detecting corrosion by nanostructures in a corrosive atmosphere. Other embodiments of the method may comprise fewer or more steps in accordance with the present invention. Method 300 begins at block 302.

  At block 302, a nanostructure comprising at least one reactant is provided. In one example, the nanostructure can include one of a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, and a nanocantilever. In another example, the reactant may include one of a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), permalloy. In yet another embodiment, providing at least one nanostructure of at least one reactant is applying a copper electrode to a silicon wafer.

  In one embodiment, providing a nanostructure comprising at least one reactant includes mounting the nanostructure on a microelectronic chip, mounting the nanostructure on a semiconductor chip, and placing the nanostructure in an electronic device. Or placing the nanostructure in a container.

  In block 304 following block 302, the at least one reactant is exposed to a corrosive atmosphere.

  In block 306 following block 304, a reaction with the at least one reactant is detected. In an embodiment, the reaction can include a change in any of mass, displacement, vibration frequency, electrical resistance, voltage, physical properties of the reactants, electrical properties of the reactants, and chemical properties of the reactants. In another embodiment, detecting a reaction with the at least one reactant is determining a difference between an initial characteristic and a subsequent characteristic of the at least one reactant.

  In block 308 following block 306, an amount of corrosion associated with the at least one reactant is determined based on at least the reaction. In one embodiment, determining the amount of corrosion associated with the at least one reactant comprises determining a difference between an initial property and a current property of the at least one reactant and associating the difference with the amount of corrosion. Can be included. The method 300 ends at block 308. In one embodiment, the reaction can include a change in one of mass, displacement, vibration frequency, electrical resistance, voltage, physical properties of the reactant, electrical properties of the reactant, chemical properties of the reactant. . The method 300 ends at block 308.

  FIG. 4 is a flowchart illustrating another method according to an embodiment of the present invention. The method 400 of FIG. 4 is a method of manufacturing a corrosion monitor. Other embodiments of the method can have fewer or more steps in accordance with the present invention. Method 400 begins at block 402.

  At block 402, a nanostructure with at least one reactant is provided. The at least one reactant reacts with the corrosive atmosphere.

  In block 404 following block 402, the electronic chip is provided. This electronic chip is for mounting a part of the nanostructure.

  In block 406 following block 404, the nanostructure is mounted on a portion of the electronic chip.

  In block 408 following block 406, a processor is provided. The processor can detect a reaction associated with the at least one reactant and determine a corrosion amount of the at least one reactant based at least in part on the reaction. In one embodiment, the processor is in operative communication with the nanostructure.

  In block 410 following block 408, the electronic chip is connected to an output device. The output device can display the amount of corrosion of the at least one reactant. Method 400 ends at block 410.

  FIG. 5 is a diagram illustrating an example of a detection circuit having a nanostructure according to an embodiment of the present invention. The detection circuit 500 can be installed in various electronic devices such as a corrosion monitor and a processor utilizing apparatus.

  A detection circuit 500 illustrated in FIG. 5 includes a nanostructure such as a microcantilever 502. The illustrated detection circuit 500 further includes a power source 504, a processor 506, a memory such as an EEPROM 508, and an oscillator 510. The detection circuit according to other embodiments of the present invention may have other configurations and other arrangement components.

  In the illustrated detection circuit 500, the power supply 504 can provide the necessary current to some or all of the circuit elements including the microcantilever 502, the EEPROM 506, and the oscillator 508. A suitable power source is a 3-5 VDC power source manufactured by Bias Power Technology.

  In the illustrated detection circuit 500, the microcantilever 502 can be exposed to, for example, a corrosive atmosphere, substance, or material. The micro cantilever 502 is deflected or reacts to the corrosive atmosphere, substance, or material, for example, depending on the corrosive atmosphere, substance, or material. In one embodiment, at least one reactant applied, applied, or mounted on the microcantilever 502 can react with the corrosive atmosphere, material, or material. A suitable microcantilever is the DMASP series, microactuated silicon active probe manufactured by Beecoin Instruments. In any case, a signal related to the reaction of the microcantilever 502 is detected, transmitted, and received by an oscillator.

  The oscillator 510 shown in FIG. 5 can detect or receive signals related to the reaction of the microcantilever to corrosive atmospheres, substances, and materials. The oscillator 510 can generate a frequency output signal based at least in part on the response of the microcantilever 502 to a corrosive atmosphere, substance, or material. For example, the oscillator 510 can provide a relatively large frequency response signal based on a signal associated with a relatively large deflection of the microcantilever 502. Similarly, the oscillator 510 can provide a relatively small frequency response signal based on a signal associated with a relatively small deflection of the microcantilever 502. A suitable oscillator is the HA7210 series, 10 kHz-10 MHz, low power crystal oscillator manufactured and sold by Intersil Corporation of Milpitas, California.

  In one embodiment, by comparing the frequency response signals from the oscillator 510, a frequency response difference based on at least a portion of the signal received from the microcantilever 502, for example, in a predetermined period of time between the initial time and the subsequent time can be determined. This frequency response difference can be related to the amount of corrosion of the reactant.

  The processor 506 can provide or execute an instruction set or command set for controlling some or all of the components of the detection circuit 500. Associated memory, such as EEPROM 508, can provide a data storage device or a computer-readable medium for storing an instruction set or command set that is executed by the processor 506. For example, the processor 506 can execute a set of instructions for detecting, measuring, and monitoring corrosion using nanostructures such as the microcantilever 502. A suitable processor is a PIC18F1220 series microcontroller manufactured by Microchip Technology. A suitable memory is a serial flash memory chip manufactured by ATMEL.

  The foregoing description relates only to some embodiments of the present invention, and it goes without saying that many changes and modifications can be made to the present invention without departing from the scope of the present invention.

1 is a schematic diagram showing an apparatus according to an embodiment of the present invention. It is detail drawing which shows the micro cantilever for apparatuses shown in FIG. 6 is a flowchart illustrating a method according to an embodiment of the present invention. 6 is a flowchart illustrating another method according to an embodiment of the present invention. 1 is an example of a detection circuit having a nanostructure according to an embodiment of the present invention.

Claims (20)

Providing at least one nanostructure comprising at least one reactant;
Exposing a portion of the at least one reactant to a corrosive atmosphere;
Detecting a reaction with the at least one reactant,
A method of detecting corrosion by nanostructures in a corrosive atmosphere comprising determining an amount of corrosion associated with the at least one reactant based on at least a portion of the reaction.   The method of claim 1, wherein providing at least one nanostructure of at least one reactant comprises applying a copper electrode to a silicon wafer.   2. The method of claim 1, wherein providing at least one nanostructure of at least one reactant comprises applying a plurality of reactants to the nanostructure, each reactant being capable of reacting with a different material.   2. The method of claim 1, wherein providing at least one nanostructure of at least one reactant comprises applying each reactant to a plurality of nanostructures, each reactant being capable of reacting with a different material. .   The method of claim 1, wherein the nanostructure comprises one of a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, and a nanocantilever.   The method of claim 1, wherein the at least one reactant comprises one of a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), and permalloy.   The method of claim 1, wherein detecting a reaction with the at least one reactant comprises determining a difference between an initial characteristic and a subsequent characteristic of the at least one reactant.   2. The method of claim 1, wherein the reaction comprises a change in one of mass, displacement, vibration frequency, electrical resistance, voltage, physical properties of the reactant, electrical properties of the reactant, and chemical properties of the reactant.   The determining the amount of corrosion associated with the at least one reactant comprises determining a difference between an initial property and a current property of the at least one reactant and correlating the difference to the amount of corrosion. the method of. An electronic chip,
At least one nanostructure comprising at least one reactant capable of reacting with a corrosive atmosphere;
A processor,
Receiving a signal associated with a reaction of the at least one reactant;
Determining an amount of corrosion of the at least one reactant based on at least a portion of the signal;
The electronic chip comprising: a processor capable of generating an output signal associated with the amount of corrosion of the at least one reactant;
An output device,
Receiving the output signal from the electronic chip;
An apparatus for detecting and monitoring corrosion comprising: an output device for displaying an indicator associated with the amount of corrosion of the at least one reactant.   The apparatus of claim 10, wherein the at least one reactant is applied to the nanostructure.   11. The apparatus of claim 10, wherein the at least one nanostructure comprising at least one reactant comprises a plurality of nanostructures, and each nanostructure reactant can react with the respective substance.   The apparatus of claim 10, wherein the at least one nanostructure comprises one of a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, and a nanocantilever.   11. The apparatus of claim 10, wherein the at least one reactant comprises one of a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), and permalloy.   Determining the amount of corrosion of the at least one reactant comprises determining a difference between an initial signal associated with the at least one reactant and a subsequent signal associated with the reaction of the at least one reactant. The apparatus of claim 10.   11. The apparatus of claim 10, wherein the reaction comprises a change in one of mass, displacement, vibration frequency, electrical resistance, voltage, physical properties of the reactant, electrical properties of the reactant, and chemical properties of the reactant. At least one nanostructure having at least one reactant adapted to be exposed to a corrosive atmosphere;
Detection means for detecting a reaction associated with the at least one reactant;
An apparatus for detecting and monitoring corrosion comprising: measuring means for determining a corrosion amount of the at least one reactant based at least in part on the reaction.   The apparatus of claim 17, wherein the at least one nanostructure comprises one of a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, and a nanocantilever.   The apparatus of claim 17, wherein the at least one reactant is one of a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), and permalloy. Providing a nanostructure comprising at least one reactant adapted to be exposed to a corrosive atmosphere;
Providing an electronic chip, placing the nanostructure on a portion of the electronic chip;
Providing a processor, the processor comprising:
Detecting a reaction associated with the at least one reactant;
Based on at least a portion of the reaction, the amount of corrosion of the at least one reactant can be determined;
The electronic chip is mounted on an output device, and the output device is
Receiving a signal associated with the amount of corrosion of the at least one reactant;
A method of manufacturing a corrosion monitor capable of displaying an indicator associated with the amount of corrosion of the at least one reactant.

Images