WO2006031733A3 - Filtre interferentiel a couche mince et procede « bootstrap » de controle du processus de depot en couche mince de filtre interferentiel - Google Patents

Filtre interferentiel a couche mince et procede « bootstrap » de controle du processus de depot en couche mince de filtre interferentiel Download PDF

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Publication number
WO2006031733A3
WO2006031733A3 PCT/US2005/032420 US2005032420W WO2006031733A3 WO 2006031733 A3 WO2006031733 A3 WO 2006031733A3 US 2005032420 W US2005032420 W US 2005032420W WO 2006031733 A3 WO2006031733 A3 WO 2006031733A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
interference filter
process control
deposition process
bootstrap method
Prior art date
Application number
PCT/US2005/032420
Other languages
English (en)
Other versions
WO2006031733A2 (fr
Inventor
Michael L Myrick
Original Assignee
Univ South Carolina
Michael L Myrick
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ South Carolina, Michael L Myrick filed Critical Univ South Carolina
Priority to EP05816196A priority Critical patent/EP1789752A4/fr
Priority to JP2007531424A priority patent/JP2008512730A/ja
Publication of WO2006031733A2 publication Critical patent/WO2006031733A2/fr
Publication of WO2006031733A3 publication Critical patent/WO2006031733A3/fr
Priority to US11/684,779 priority patent/US20070201136A1/en
Priority to US12/819,560 priority patent/US8184371B2/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention porte sur un système de filtre interférentiel à couche mince comprenant une pluralité de couches minces empilées possédant une réflectance déterminée, une courbe de contrôle modélisée, et une couche supérieure formée pour produire une longueur d'onde correspondant à la réflectance déterminée et/ou à la courbe de contrôle modélisée. La couche supérieure est placée sur la pluralité de couches empilées et peut être une couche à indice bas du type silice ou une couche à indice élevé du type niobium.
PCT/US2005/032420 2004-09-13 2005-09-13 Filtre interferentiel a couche mince et procede « bootstrap » de controle du processus de depot en couche mince de filtre interferentiel WO2006031733A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP05816196A EP1789752A4 (fr) 2004-09-13 2005-09-13 Filtre interferentiel a couche mince et procede bootstrap de controle du processus de depot en couche mince de filtre interferentiel
JP2007531424A JP2008512730A (ja) 2004-09-13 2005-09-13 薄膜干渉フィルタ及び干渉フィルタの堆積工程制御のためのブートストラップ法
US11/684,779 US20070201136A1 (en) 2004-09-13 2007-03-12 Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
US12/819,560 US8184371B2 (en) 2005-09-13 2010-06-21 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60940604P 2004-09-13 2004-09-13
US60/609,406 2004-09-13

Publications (2)

Publication Number Publication Date
WO2006031733A2 WO2006031733A2 (fr) 2006-03-23
WO2006031733A3 true WO2006031733A3 (fr) 2007-02-22

Family

ID=36060610

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/032420 WO2006031733A2 (fr) 2004-09-13 2005-09-13 Filtre interferentiel a couche mince et procede « bootstrap » de controle du processus de depot en couche mince de filtre interferentiel

Country Status (3)

Country Link
EP (1) EP1789752A4 (fr)
JP (1) JP2008512730A (fr)
WO (1) WO2006031733A2 (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005062986A2 (fr) 2003-12-31 2005-07-14 The University Of South Carolina Capteurs optiques poreux a couche fine pour gaz et autres fluides
US20070201136A1 (en) 2004-09-13 2007-08-30 University Of South Carolina Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
US8358418B2 (en) 2005-11-28 2013-01-22 Halliburton Energy Services, Inc. Optical analysis system for dynamic real-time detection and measurement
US8154726B2 (en) 2005-11-28 2012-04-10 Halliburton Energy Services, Inc. Optical analysis system and method for real time multivariate optical computing
US20070166245A1 (en) 2005-11-28 2007-07-19 Leonard Mackles Propellant free foamable toothpaste composition
WO2007061436A1 (fr) 2005-11-28 2007-05-31 University Of South Carolina Procédés d'étalonnage automatique pour système d'analyse optique
US9170154B2 (en) 2006-06-26 2015-10-27 Halliburton Energy Services, Inc. Data validation and classification in optical analysis systems
US9182282B2 (en) 2006-11-02 2015-11-10 Halliburton Energy Services, Inc. Multi-analyte optical computing system
WO2008121692A1 (fr) 2007-03-30 2008-10-09 University Of South Carolina Système d'analyse et de mesure à tablette
WO2008121715A1 (fr) 2007-03-30 2008-10-09 Ometric Corporation Systèmes et procédés de mesure de traitement en ligne
US8213006B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8283633B2 (en) 2007-11-30 2012-10-09 Halliburton Energy Services, Inc. Tuning D* with modified thermal detectors
US8212213B2 (en) 2008-04-07 2012-07-03 Halliburton Energy Services, Inc. Chemically-selective detector and methods relating thereto
EP2989442A4 (fr) 2013-07-09 2016-12-28 Halliburton Energy Services Inc Éléments de calcul intégrés ayant une surface sélective en fréquence
WO2015005905A1 (fr) 2013-07-09 2015-01-15 Halliburton Energy Services, Inc. Éléments de calcul intégrés ayant des filtres spectraux répartis latéralement
BR112016011057A8 (pt) 2013-12-24 2020-04-22 Halliburton Energy Services Inc método e sistema
WO2015099707A1 (fr) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Fabrication de couches critiques d'éléments de calcul intégrés
WO2015099706A1 (fr) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Ajustement de la fabrication d'éléments de calcul intégrés
MX361644B (es) 2013-12-24 2018-12-13 Halliburton Energy Services Inc Monitorización en tiempo real de la fabricación de elementos computacionales integrados.
MX361204B (es) 2013-12-30 2018-11-30 Halliburton Energy Services Inc Determinación de la dependencia de temperatura de índices de refracción complejos de los materiales de capa durante la fabricación de elementos informáticos integrados.
MX360943B (es) 2013-12-31 2018-11-13 Halliburton Energy Services Inc Fabricación de elementos informáticos integrados mediante el uso de un soporte de sustrato con forma que coincida con el perfil de la pluma de deposición.
EP2946197A4 (fr) 2014-02-14 2016-12-21 Halliburton Energy Services Inc Spectroscopie in-situ de surveillance de la fabrication d'éléments de calcul intégrés
BR112016016251B1 (pt) 2014-03-21 2020-11-17 Halliburton Energy Services, Inc ferramenta de análise óptica e sistema de perfilagem do poço
US9708908B2 (en) 2014-06-13 2017-07-18 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces
WO2019077547A1 (fr) * 2017-10-20 2019-04-25 3M Innovative Properties Company Film optique et séparateur de faisceau de polarisation

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
JP3624476B2 (ja) * 1995-07-17 2005-03-02 セイコーエプソン株式会社 半導体レーザ装置の製造方法
DE10227376B4 (de) * 2002-06-20 2005-03-31 Leica Microsystems Jena Gmbh Verfahren zur Bestimmung von Schichtdickenbereichen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1789752A4 *

Also Published As

Publication number Publication date
EP1789752A2 (fr) 2007-05-30
JP2008512730A (ja) 2008-04-24
EP1789752A4 (fr) 2009-11-04
WO2006031733A2 (fr) 2006-03-23

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