EP1789752A4 - Filtre interferentiel a couche mince et procede bootstrap de controle du processus de depot en couche mince de filtre interferentiel - Google Patents

Filtre interferentiel a couche mince et procede bootstrap de controle du processus de depot en couche mince de filtre interferentiel

Info

Publication number
EP1789752A4
EP1789752A4 EP05816196A EP05816196A EP1789752A4 EP 1789752 A4 EP1789752 A4 EP 1789752A4 EP 05816196 A EP05816196 A EP 05816196A EP 05816196 A EP05816196 A EP 05816196A EP 1789752 A4 EP1789752 A4 EP 1789752A4
Authority
EP
European Patent Office
Prior art keywords
thin film
interference filter
process control
deposition process
bootstrap method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05816196A
Other languages
German (de)
English (en)
Other versions
EP1789752A2 (fr
Inventor
Michael L Myrick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of South Carolina
Original Assignee
University of South Carolina
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of South Carolina filed Critical University of South Carolina
Publication of EP1789752A2 publication Critical patent/EP1789752A2/fr
Publication of EP1789752A4 publication Critical patent/EP1789752A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
EP05816196A 2004-09-13 2005-09-13 Filtre interferentiel a couche mince et procede bootstrap de controle du processus de depot en couche mince de filtre interferentiel Withdrawn EP1789752A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60940604P 2004-09-13 2004-09-13
PCT/US2005/032420 WO2006031733A2 (fr) 2004-09-13 2005-09-13 Filtre interferentiel a couche mince et procede « bootstrap » de controle du processus de depot en couche mince de filtre interferentiel

Publications (2)

Publication Number Publication Date
EP1789752A2 EP1789752A2 (fr) 2007-05-30
EP1789752A4 true EP1789752A4 (fr) 2009-11-04

Family

ID=36060610

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05816196A Withdrawn EP1789752A4 (fr) 2004-09-13 2005-09-13 Filtre interferentiel a couche mince et procede bootstrap de controle du processus de depot en couche mince de filtre interferentiel

Country Status (3)

Country Link
EP (1) EP1789752A4 (fr)
JP (1) JP2008512730A (fr)
WO (1) WO2006031733A2 (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1699422A4 (fr) 2003-12-31 2009-04-29 Univ South Carolina Capteurs optiques poreux a couche fine pour gaz et autres fluides
US20070201136A1 (en) 2004-09-13 2007-08-30 University Of South Carolina Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
EP1969326B1 (fr) 2005-11-28 2020-06-10 Ometric Corporation Systeme d'analyse optique et procede de calcul optique multivariant en temps reel
EP1974201A1 (fr) 2005-11-28 2008-10-01 University of South Carolina Système d'analyse optique permettant d'effectuer en temps réel une détection et une mesure dynamiques
WO2007061436A1 (fr) 2005-11-28 2007-05-31 University Of South Carolina Procédés d'étalonnage automatique pour système d'analyse optique
US20070166245A1 (en) 2005-11-28 2007-07-19 Leonard Mackles Propellant free foamable toothpaste composition
US9170154B2 (en) 2006-06-26 2015-10-27 Halliburton Energy Services, Inc. Data validation and classification in optical analysis systems
EP2078187A2 (fr) 2006-11-02 2009-07-15 University of South Carolina Systme informatique optique a analytes multiples
WO2008121715A1 (fr) 2007-03-30 2008-10-09 Ometric Corporation Systèmes et procédés de mesure de traitement en ligne
US8213006B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8184295B2 (en) 2007-03-30 2012-05-22 Halliburton Energy Services, Inc. Tablet analysis and measurement system
US8283633B2 (en) 2007-11-30 2012-10-09 Halliburton Energy Services, Inc. Tuning D* with modified thermal detectors
US8212213B2 (en) 2008-04-07 2012-07-03 Halliburton Energy Services, Inc. Chemically-selective detector and methods relating thereto
US10247662B2 (en) 2013-07-09 2019-04-02 Halliburton Energy Services, Inc. Integrated computational elements with frequency selective surface
AU2013393870B2 (en) 2013-07-09 2017-06-29 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
EP2909762B1 (fr) 2013-12-24 2016-12-21 Halliburton Energy Services, Inc. Fabrication de couches critiques d'éléments de calcul intégrés
WO2015099706A1 (fr) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Ajustement de la fabrication d'éléments de calcul intégrés
EP2901135B1 (fr) 2013-12-24 2016-08-24 Halliburton Energy Services, Inc. Surveillance en temps réel de la fabrication d'éléments de calcul intégrés
MX359911B (es) 2013-12-24 2018-10-16 Halliburton Energy Services Inc Monitorizacion in situ de la fabricacion de elementos computacionales integrados.
WO2015102586A1 (fr) 2013-12-30 2015-07-09 Halliburton Energy Services, Inc. Détermination de dépendance en température d'indices de réfraction complexes de matériaux de couches pendant la fabrication d'éléments de calcul intégrés
MX360943B (es) 2013-12-31 2018-11-13 Halliburton Energy Services Inc Fabricación de elementos informáticos integrados mediante el uso de un soporte de sustrato con forma que coincida con el perfil de la pluma de deposición.
MX359196B (es) 2014-02-14 2018-09-19 Halliburton Energy Services Inc Espectroscopía in situ para el monitoreo de la fabricación de elementos computacionales integrados.
EP2943774A4 (fr) 2014-03-21 2016-05-11 Halliburton Energy Services Inc Éléments de calcul à limitation de bande intégrés monolithiquement
US9708908B2 (en) 2014-06-13 2017-07-18 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces
US11726246B2 (en) * 2017-10-20 2023-08-15 3M Innovative Properties Company Optical film and polarizing beam splitter

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
EP0754932A2 (fr) * 1995-07-17 1997-01-22 Seiko Epson Corporation Procédé de mesure de l'épaisseur d'une couche optique, méthode de formation de la couche et méthode de fabrication d'un laser semi-conducteur
US20040130726A1 (en) * 2002-06-20 2004-07-08 Hakon Mikkelsen Method for determining layer thickness ranges

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
EP0754932A2 (fr) * 1995-07-17 1997-01-22 Seiko Epson Corporation Procédé de mesure de l'épaisseur d'une couche optique, méthode de formation de la couche et méthode de fabrication d'un laser semi-conducteur
US20040130726A1 (en) * 2002-06-20 2004-07-08 Hakon Mikkelsen Method for determining layer thickness ranges

Also Published As

Publication number Publication date
WO2006031733A3 (fr) 2007-02-22
WO2006031733A2 (fr) 2006-03-23
EP1789752A2 (fr) 2007-05-30
JP2008512730A (ja) 2008-04-24

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