WO2006031733A2 - Thin film interference filter and bootstrap method for interference filter thin film deposition process control - Google Patents

Thin film interference filter and bootstrap method for interference filter thin film deposition process control Download PDF

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Publication number
WO2006031733A2
WO2006031733A2 PCT/US2005/032420 US2005032420W WO2006031733A2 WO 2006031733 A2 WO2006031733 A2 WO 2006031733A2 US 2005032420 W US2005032420 W US 2005032420W WO 2006031733 A2 WO2006031733 A2 WO 2006031733A2
Authority
WO
WIPO (PCT)
Prior art keywords
reflectance
wavelength
phase
monitor
layer
Prior art date
Application number
PCT/US2005/032420
Other languages
English (en)
French (fr)
Other versions
WO2006031733A3 (en
Inventor
Michael L. Myrick
Original Assignee
The University Of South Carolina
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The University Of South Carolina filed Critical The University Of South Carolina
Priority to EP05816196A priority Critical patent/EP1789752A4/en
Priority to JP2007531424A priority patent/JP2008512730A/ja
Publication of WO2006031733A2 publication Critical patent/WO2006031733A2/en
Publication of WO2006031733A3 publication Critical patent/WO2006031733A3/en
Priority to US11/684,779 priority patent/US20070201136A1/en
Priority to US12/819,560 priority patent/US8184371B2/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
PCT/US2005/032420 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control WO2006031733A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP05816196A EP1789752A4 (en) 2004-09-13 2005-09-13 THIN-FILTER INTERFERENTIAL FILTER AND BOOTSTRAP METHOD OF CONTROLLING THE THIN FILM INTERFERENTIAL FILTER DEPOSITION PROCESS
JP2007531424A JP2008512730A (ja) 2004-09-13 2005-09-13 薄膜干渉フィルタ及び干渉フィルタの堆積工程制御のためのブートストラップ法
US11/684,779 US20070201136A1 (en) 2004-09-13 2007-03-12 Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
US12/819,560 US8184371B2 (en) 2005-09-13 2010-06-21 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60940604P 2004-09-13 2004-09-13
US60/609,406 2004-09-13

Publications (2)

Publication Number Publication Date
WO2006031733A2 true WO2006031733A2 (en) 2006-03-23
WO2006031733A3 WO2006031733A3 (en) 2007-02-22

Family

ID=36060610

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/032420 WO2006031733A2 (en) 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Country Status (3)

Country Link
EP (1) EP1789752A4 (ja)
JP (1) JP2008512730A (ja)
WO (1) WO2006031733A2 (ja)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8049881B2 (en) 2005-11-28 2011-11-01 Halliburton Energy Services, Inc. Optical analysis system and methods for operating multivariate optical elements in a normal incidence orientation
US8154726B2 (en) 2005-11-28 2012-04-10 Halliburton Energy Services, Inc. Optical analysis system and method for real time multivariate optical computing
US8184295B2 (en) 2007-03-30 2012-05-22 Halliburton Energy Services, Inc. Tablet analysis and measurement system
US8184371B2 (en) 2005-09-13 2012-05-22 Halliburton Energy Services, Inc. Thin film interference filter and bootstrap method for interference filter thin film deposition process control
US8208147B2 (en) 2005-11-28 2012-06-26 Halliburton Energy Services, Inc. Method of high-speed monitoring based on the use of multivariate optical elements
US8212213B2 (en) 2008-04-07 2012-07-03 Halliburton Energy Services, Inc. Chemically-selective detector and methods relating thereto
US8213006B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8212216B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. In-line process measurement systems and methods
US8283633B2 (en) 2007-11-30 2012-10-09 Halliburton Energy Services, Inc. Tuning D* with modified thermal detectors
US8345234B2 (en) 2005-11-28 2013-01-01 Halliburton Energy Services, Inc. Self calibration methods for optical analysis system
US8345251B2 (en) 2003-12-31 2013-01-01 Halliburton Energy Services, Inc. Thin-layer porous optical sensors for gases and other fluids
US9170154B2 (en) 2006-06-26 2015-10-27 Halliburton Energy Services, Inc. Data validation and classification in optical analysis systems
US9182282B2 (en) 2006-11-02 2015-11-10 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US9371577B2 (en) 2013-12-31 2016-06-21 Halliburton Energy Services, Inc. Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume
US9395721B2 (en) 2013-12-24 2016-07-19 Halliburton Energy Services, Inc. In-situ monitoring of fabrication of integrated computational elements
US9495505B2 (en) 2013-12-24 2016-11-15 Halliburton Energy Services, Inc. Adjusting fabrication of integrated computational elements
US9523786B2 (en) 2014-03-21 2016-12-20 Halliburton Energy Services, Inc. Monolithic band-limited integrated computational elements
US9708908B2 (en) 2014-06-13 2017-07-18 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces
US9727052B2 (en) 2014-02-14 2017-08-08 Halliburton Energy Services, Inc. In-situ spectroscopy for monitoring fabrication of integrated computational elements
US10247662B2 (en) 2013-07-09 2019-04-02 Halliburton Energy Services, Inc. Integrated computational elements with frequency selective surface
US10496776B2 (en) 2013-12-24 2019-12-03 Halliburton Energy Services, Inc. Fabrication of critical layers of integrated computational elements
US10718881B2 (en) 2013-07-09 2020-07-21 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
US10914863B2 (en) 2013-12-24 2021-02-09 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements
US11274365B2 (en) 2013-12-30 2022-03-15 Halliburton Energy Services, Inc. Determining temperature dependence of complex refractive indices of layer materials during fabrication of integrated computational elements

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11726246B2 (en) * 2017-10-20 2023-08-15 3M Innovative Properties Company Optical film and polarizing beam splitter

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
JP3624476B2 (ja) * 1995-07-17 2005-03-02 セイコーエプソン株式会社 半導体レーザ装置の製造方法
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption
DE10227376B4 (de) * 2002-06-20 2005-03-31 Leica Microsystems Jena Gmbh Verfahren zur Bestimmung von Schichtdickenbereichen

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of EP1789752A4 *

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8345251B2 (en) 2003-12-31 2013-01-01 Halliburton Energy Services, Inc. Thin-layer porous optical sensors for gases and other fluids
US8184371B2 (en) 2005-09-13 2012-05-22 Halliburton Energy Services, Inc. Thin film interference filter and bootstrap method for interference filter thin film deposition process control
US8345234B2 (en) 2005-11-28 2013-01-01 Halliburton Energy Services, Inc. Self calibration methods for optical analysis system
US8154726B2 (en) 2005-11-28 2012-04-10 Halliburton Energy Services, Inc. Optical analysis system and method for real time multivariate optical computing
US8208147B2 (en) 2005-11-28 2012-06-26 Halliburton Energy Services, Inc. Method of high-speed monitoring based on the use of multivariate optical elements
US8049881B2 (en) 2005-11-28 2011-11-01 Halliburton Energy Services, Inc. Optical analysis system and methods for operating multivariate optical elements in a normal incidence orientation
US8358418B2 (en) 2005-11-28 2013-01-22 Halliburton Energy Services, Inc. Optical analysis system for dynamic real-time detection and measurement
US9170154B2 (en) 2006-06-26 2015-10-27 Halliburton Energy Services, Inc. Data validation and classification in optical analysis systems
US9182282B2 (en) 2006-11-02 2015-11-10 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8213006B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8212216B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. In-line process measurement systems and methods
US8184295B2 (en) 2007-03-30 2012-05-22 Halliburton Energy Services, Inc. Tablet analysis and measurement system
US8283633B2 (en) 2007-11-30 2012-10-09 Halliburton Energy Services, Inc. Tuning D* with modified thermal detectors
US8212213B2 (en) 2008-04-07 2012-07-03 Halliburton Energy Services, Inc. Chemically-selective detector and methods relating thereto
US10718881B2 (en) 2013-07-09 2020-07-21 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
US10247662B2 (en) 2013-07-09 2019-04-02 Halliburton Energy Services, Inc. Integrated computational elements with frequency selective surface
US10496776B2 (en) 2013-12-24 2019-12-03 Halliburton Energy Services, Inc. Fabrication of critical layers of integrated computational elements
US9395721B2 (en) 2013-12-24 2016-07-19 Halliburton Energy Services, Inc. In-situ monitoring of fabrication of integrated computational elements
US9495505B2 (en) 2013-12-24 2016-11-15 Halliburton Energy Services, Inc. Adjusting fabrication of integrated computational elements
US10914863B2 (en) 2013-12-24 2021-02-09 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements
US11274365B2 (en) 2013-12-30 2022-03-15 Halliburton Energy Services, Inc. Determining temperature dependence of complex refractive indices of layer materials during fabrication of integrated computational elements
US9371577B2 (en) 2013-12-31 2016-06-21 Halliburton Energy Services, Inc. Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume
US11066740B2 (en) 2013-12-31 2021-07-20 Halliburton Energy Services, Inc. Fabrication of integrated computational elements using cylindrical substrate support shaped to match a cross-section of a spatial profile of a deposition plume
US9727052B2 (en) 2014-02-14 2017-08-08 Halliburton Energy Services, Inc. In-situ spectroscopy for monitoring fabrication of integrated computational elements
US9523786B2 (en) 2014-03-21 2016-12-20 Halliburton Energy Services, Inc. Monolithic band-limited integrated computational elements
US9708908B2 (en) 2014-06-13 2017-07-18 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces

Also Published As

Publication number Publication date
EP1789752A4 (en) 2009-11-04
WO2006031733A3 (en) 2007-02-22
EP1789752A2 (en) 2007-05-30
JP2008512730A (ja) 2008-04-24

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