WO2006030240A3 - Novel resist material - Google Patents

Novel resist material Download PDF

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Publication number
WO2006030240A3
WO2006030240A3 PCT/GB2005/003606 GB2005003606W WO2006030240A3 WO 2006030240 A3 WO2006030240 A3 WO 2006030240A3 GB 2005003606 W GB2005003606 W GB 2005003606W WO 2006030240 A3 WO2006030240 A3 WO 2006030240A3
Authority
WO
WIPO (PCT)
Prior art keywords
resist material
novel resist
novel
fullerols
fullerol
Prior art date
Application number
PCT/GB2005/003606
Other languages
French (fr)
Other versions
WO2006030240A2 (en
Inventor
Alex Robinson
Richard Edward Palmer
Original Assignee
Univ Birmingham
Alex Robinson
Richard Edward Palmer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Birmingham, Alex Robinson, Richard Edward Palmer filed Critical Univ Birmingham
Publication of WO2006030240A2 publication Critical patent/WO2006030240A2/en
Publication of WO2006030240A3 publication Critical patent/WO2006030240A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

Abstract

The present invention relates to the use of fullerols having the formula C2x(OH)n where x is at least 10 and n is at least 2 as resist materials. The invention also includes within its scope methods of patterning a fullerol-based resist layer.
PCT/GB2005/003606 2004-09-17 2005-09-19 Novel resist material WO2006030240A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0420700.7 2004-09-17
GB0420700A GB0420700D0 (en) 2004-09-17 2004-09-17 Novel resist material

Publications (2)

Publication Number Publication Date
WO2006030240A2 WO2006030240A2 (en) 2006-03-23
WO2006030240A3 true WO2006030240A3 (en) 2006-07-06

Family

ID=33306752

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2005/003606 WO2006030240A2 (en) 2004-09-17 2005-09-19 Novel resist material

Country Status (2)

Country Link
GB (1) GB0420700D0 (en)
WO (1) WO2006030240A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0913919D0 (en) 2009-08-10 2009-09-16 Univ Birmingham Method of forming an electrical circuit using fullerene derivatives
RU2497751C2 (en) * 2011-12-28 2013-11-10 Евгений Александрович Козеев Fullerenol c60 and method of its obtaining from glycerin
US9256126B2 (en) 2012-11-14 2016-02-09 Irresistible Materials Ltd Methanofullerenes

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0540311A1 (en) * 1991-10-28 1993-05-05 Exxon Research And Engineering Company Polysubstituted fullerenes and their preparation
EP0903637A2 (en) * 1997-09-22 1999-03-24 JAPAN as represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY Electron beam resist
EP1354864A1 (en) * 2000-12-25 2003-10-22 Sony Corporation Method for fullerene derivative and the fullerene derivative, proton conductor and electrochemical device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0540311A1 (en) * 1991-10-28 1993-05-05 Exxon Research And Engineering Company Polysubstituted fullerenes and their preparation
EP0903637A2 (en) * 1997-09-22 1999-03-24 JAPAN as represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY Electron beam resist
EP1354864A1 (en) * 2000-12-25 2003-10-22 Sony Corporation Method for fullerene derivative and the fullerene derivative, proton conductor and electrochemical device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CAO T. ET AL.: "Novel C60-Containing Ultra-thin Film Based on Diazoresin", CHEMISTRY LETTERS, vol. 29, no. 12, 2000, XP002375390 *

Also Published As

Publication number Publication date
WO2006030240A2 (en) 2006-03-23
GB0420700D0 (en) 2004-10-20

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