WO2006005837A3 - Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique - Google Patents

Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique Download PDF

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Publication number
WO2006005837A3
WO2006005837A3 PCT/FR2005/001475 FR2005001475W WO2006005837A3 WO 2006005837 A3 WO2006005837 A3 WO 2006005837A3 FR 2005001475 W FR2005001475 W FR 2005001475W WO 2006005837 A3 WO2006005837 A3 WO 2006005837A3
Authority
WO
WIPO (PCT)
Prior art keywords
uhf
coating
container
thermoplastic container
microwave plasma
Prior art date
Application number
PCT/FR2005/001475
Other languages
English (en)
Other versions
WO2006005837A2 (fr
Inventor
Jean-Michel Rius
Original Assignee
Sidel Sa
Jean-Michel Rius
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel Sa, Jean-Michel Rius filed Critical Sidel Sa
Publication of WO2006005837A2 publication Critical patent/WO2006005837A2/fr
Publication of WO2006005837A3 publication Critical patent/WO2006005837A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)

Abstract

Dispositif (1) pour déposer un revêtement sur une face d'un récipient (10) en matériau thermoplastique à l'aide d'un plasma à basse pression par excitation d'un gaz précurseur par des ondes électromagnétiques UHF dans une cavité (2) circulaire sous vide recevant ce récipient, ce dispositif comprenant un générateur (3) UHF raccordé par un guide d'ondes (4) à une fenêtre (5) de la paroi latérale de la cavité renfermant une enveloppe (6) transparente aux ondes UHF et disposée coaxialement à un champ central, deux plateaux (14, 15) extérieurs respectivement inférieur et supérieur à positionnement vertical réglable pour le réglage d'impédance du champ de retour, et des colonnes (16, 17) respectives de support réglable des deux plateaux ; au moins la colonne (16) de support du plateau (14) supérieur est constituée en un matériau transparent aux ondes UHF.
PCT/FR2005/001475 2004-06-17 2005-06-14 Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique WO2006005837A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0406591A FR2871813B1 (fr) 2004-06-17 2004-06-17 Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique
FR0406591 2004-06-17

Publications (2)

Publication Number Publication Date
WO2006005837A2 WO2006005837A2 (fr) 2006-01-19
WO2006005837A3 true WO2006005837A3 (fr) 2006-05-04

Family

ID=34947152

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2005/001475 WO2006005837A2 (fr) 2004-06-17 2005-06-14 Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique

Country Status (2)

Country Link
FR (1) FR2871813B1 (fr)
WO (1) WO2006005837A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2903622B1 (fr) 2006-07-17 2008-10-03 Sidel Participations Dispositif pour le depot d'un revetement sur une face interne d'un recipient
FR2907036B1 (fr) 2006-10-11 2008-12-26 Sidel Participations Installation de depot, au moyen d'un plasma micro-ondes, d'un revetement barriere interne dans des recipients thermoplastiques

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2776540A1 (fr) * 1998-03-27 1999-10-01 Sidel Sa Recipient en matiere a effet barriere et procede et appareil pour sa fabrication
FR2792854A1 (fr) * 1999-04-29 2000-11-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
FR2847912A1 (fr) * 2002-11-28 2004-06-04 Sidel Sa Procede et dispositif pour deposer par plasma micro-ondes un revetement sur une face d'un recipient en materiau thermoplastique

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2776540A1 (fr) * 1998-03-27 1999-10-01 Sidel Sa Recipient en matiere a effet barriere et procede et appareil pour sa fabrication
US20020176947A1 (en) * 1998-03-27 2002-11-28 Sidel Container with a coating of barrier effect material, and method and apparatus for manufacturing the same
FR2792854A1 (fr) * 1999-04-29 2000-11-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
FR2847912A1 (fr) * 2002-11-28 2004-06-04 Sidel Sa Procede et dispositif pour deposer par plasma micro-ondes un revetement sur une face d'un recipient en materiau thermoplastique

Also Published As

Publication number Publication date
WO2006005837A2 (fr) 2006-01-19
FR2871813A1 (fr) 2005-12-23
FR2871813B1 (fr) 2006-09-29

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