WO2005116771A3 - Wellenlängenselektor für den weichen röntgen- und den extremen ultraviolettbereich - Google Patents

Wellenlängenselektor für den weichen röntgen- und den extremen ultraviolettbereich Download PDF

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Publication number
WO2005116771A3
WO2005116771A3 PCT/DE2005/000973 DE2005000973W WO2005116771A3 WO 2005116771 A3 WO2005116771 A3 WO 2005116771A3 DE 2005000973 W DE2005000973 W DE 2005000973W WO 2005116771 A3 WO2005116771 A3 WO 2005116771A3
Authority
WO
WIPO (PCT)
Prior art keywords
range
wavelength
soft
ray
wavelength selector
Prior art date
Application number
PCT/DE2005/000973
Other languages
English (en)
French (fr)
Other versions
WO2005116771A2 (de
Inventor
Siegfried Schwarzl
Stefan Wurm
Original Assignee
Infineon Technologies Ag
Siegfried Schwarzl
Stefan Wurm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag, Siegfried Schwarzl, Stefan Wurm filed Critical Infineon Technologies Ag
Publication of WO2005116771A2 publication Critical patent/WO2005116771A2/de
Publication of WO2005116771A3 publication Critical patent/WO2005116771A3/de

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Die Erfindung betrifft einen Wellenlängenselektor für den weichen Röntgen und/oder extremen Ultraviolettbereich, wobei der Wellenlängenselektor mindestens zwei Reflektoren aufweist die derart optisch in Reihe geschaltet sind, dass ein auf den ersten Reflektor eintreffender Einfallsstrahl in einer im Wesentlichen festen Winkelbeziehung zu dem vom letzten Reflektor reflektierten Strahl verläuft, wobei mindestens einer der Reflektoren (M1, M2, M3, M4) einen wellenlängenselektiven Bereich aufweist und der Einfallswinkel (α, α+ϕ) von mindestens zwei der Reflektoren (M1, M2, M3, M4) zur Wellenlängenselektion veränderbar ist. Die Erfindung löst das Problem, einen im Laborbetrieb anwendbaren Wellenlängenselektor für den weichen Röntgenbereich anzugeben, der die Bereitstellung von durchstimmbarer weicher Röntgenstrahlung bzw. extremer UV Strahlung, insbesondere im Wellenlängenbereich von 10-15nm, preiswert ermöglicht und der sich in bestehenden Laboranlagen einfach einfügen lässt.
PCT/DE2005/000973 2004-05-27 2005-05-26 Wellenlängenselektor für den weichen röntgen- und den extremen ultraviolettbereich WO2005116771A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200410027347 DE102004027347B4 (de) 2004-05-27 2004-05-27 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich
DE102004027347.2 2004-05-27

Publications (2)

Publication Number Publication Date
WO2005116771A2 WO2005116771A2 (de) 2005-12-08
WO2005116771A3 true WO2005116771A3 (de) 2006-06-08

Family

ID=34971253

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2005/000973 WO2005116771A2 (de) 2004-05-27 2005-05-26 Wellenlängenselektor für den weichen röntgen- und den extremen ultraviolettbereich

Country Status (2)

Country Link
DE (1) DE102004027347B4 (de)
WO (1) WO2005116771A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015140924A1 (ja) * 2014-03-18 2015-09-24 エヌ・ティ・ティ・アドバンステクノロジ株式会社 多層膜反射鏡、分光装置、および高次高調波の分光方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02153520A (ja) * 1988-12-05 1990-06-13 Mitsubishi Electric Corp 露光装置
JPH0320712A (ja) * 1989-04-25 1991-01-29 Matsushita Electric Works Ltd 色彩調整装置
JPH03152426A (ja) * 1989-11-08 1991-06-28 Fujitsu Ltd 分光器
US5173930A (en) * 1991-11-22 1992-12-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration X-ray monochromator
JPH0627298A (ja) * 1992-07-09 1994-02-04 Ricoh Co Ltd 単色同位相ｘ線集光器
JPH06174897A (ja) * 1992-12-10 1994-06-24 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線ミラーおよび多層膜ｘ線光学系
WO1996037898A1 (en) * 1995-05-23 1996-11-28 Korytar Dusan The equipment for x-ray beam conditioning

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1007349A3 (nl) * 1993-07-19 1995-05-23 Philips Electronics Nv Asymmetrische 4-kristalmonochromator.
JP2003255089A (ja) * 2002-03-05 2003-09-10 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02153520A (ja) * 1988-12-05 1990-06-13 Mitsubishi Electric Corp 露光装置
JPH0320712A (ja) * 1989-04-25 1991-01-29 Matsushita Electric Works Ltd 色彩調整装置
JPH03152426A (ja) * 1989-11-08 1991-06-28 Fujitsu Ltd 分光器
US5173930A (en) * 1991-11-22 1992-12-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration X-ray monochromator
JPH0627298A (ja) * 1992-07-09 1994-02-04 Ricoh Co Ltd 単色同位相ｘ線集光器
JPH06174897A (ja) * 1992-12-10 1994-06-24 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線ミラーおよび多層膜ｘ線光学系
WO1996037898A1 (en) * 1995-05-23 1996-11-28 Korytar Dusan The equipment for x-ray beam conditioning

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 014, no. 408 (E - 0972) 4 September 1990 (1990-09-04) *
PATENT ABSTRACTS OF JAPAN vol. 015, no. 144 (P - 1189) 11 April 1991 (1991-04-11) *
PATENT ABSTRACTS OF JAPAN vol. 015, no. 382 (P - 1257) 26 September 1991 (1991-09-26) *
PATENT ABSTRACTS OF JAPAN vol. 018, no. 241 (P - 1733) 9 May 1994 (1994-05-09) *
PATENT ABSTRACTS OF JAPAN vol. 018, no. 510 (P - 1804) 26 September 1994 (1994-09-26) *

Also Published As

Publication number Publication date
WO2005116771A2 (de) 2005-12-08
DE102004027347A1 (de) 2005-12-22
DE102004027347B4 (de) 2008-12-24

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