WO2005101589A1 - Die for manufacturing anisotropic conductive sheet and method for manufacturing anisotropic conductive sheet - Google Patents
Die for manufacturing anisotropic conductive sheet and method for manufacturing anisotropic conductive sheet Download PDFInfo
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- WO2005101589A1 WO2005101589A1 PCT/JP2005/007035 JP2005007035W WO2005101589A1 WO 2005101589 A1 WO2005101589 A1 WO 2005101589A1 JP 2005007035 W JP2005007035 W JP 2005007035W WO 2005101589 A1 WO2005101589 A1 WO 2005101589A1
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- Prior art keywords
- conductive
- material layer
- anisotropic conductive
- magnetic field
- path forming
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R43/00—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/22—Contacts for co-operating by abutting
- H01R13/24—Contacts for co-operating by abutting resilient; resiliently-mounted
- H01R13/2407—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
- H01R13/2414—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means conductive elastomers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R11/00—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
- H01R11/01—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
Definitions
- the present invention relates to a mold for producing an anisotropic conductive sheet and a method for producing an anisotropic conductive sheet.
- the present invention relates to a mold for producing an anisotropic conductive sheet and a method for producing an anisotropic conductive sheet.
- an anisotropic device that can be suitably used for electrical inspection of circuit devices such as integrated circuits formed on a wafer, integrated circuits obtained by dicing the wafer, cage ICs, and printed circuit boards.
- the present invention relates to a mold for manufacturing an anisotropic conductive sheet for manufacturing a conductive sheet and a method for manufacturing an anisotropic conductive sheet.
- An anisotropic conductive elastomer sheet is a sheet having conductivity only in the thickness direction, or a sheet having a pressurized conductive portion which is conductive only in the thickness direction when pressed in the thickness direction.
- compact electrical connection can be achieved without using means such as soldering or mechanical fitting, and soft connection is possible by absorbing mechanical shock and strain.
- circuit devices such as printed circuit boards and leadless chip carriers, and liquid crystal panels can be used in fields such as electronic calculators, electronic digital watches, electronic cameras, and computer keyboards. It is widely used as a connector to achieve an electrical connection between them.
- a circuit device to be inspected has one surface.
- the test device electrode area of the circuit device to be tested and the test circuit board An anisotropic conductive elastomer sheet is interposed between the test electrode region and the test electrode region.
- Patent Document 1 and the like disclose thick conductive particles exhibiting magnetism in the elastomer.
- Patent Document 2 and the like disclose a non-uniform distribution of conductive particles exhibiting magnetism in an elastomer, thereby forming a large number of conductive path forming portions extending in the thickness direction and interconnecting these portions.
- An anisotropic conductive sheet (hereinafter referred to as a “distributed anisotropic conductive sheet”) in which an insulating portion to be insulated is formed is disclosed. Further, Patent Document 3 and the like disclose a conductive path forming portion. An unevenly distributed anisotropic conductive sheet in which a step is formed between a surface and an insulating portion is disclosed.
- the unevenly distributed anisotropic conductive sheet has a conductive path forming portion formed in accordance with a pattern corresponding to a pattern of an electrode to be connected, and a conductive path forming portion is formed between adjacent conductive path forming portions. Since the insulating portion is formed, high reliability and electrical connection can be achieved even when the electrodes to be connected are arranged at a small pitch as compared with the dispersion type anisotropic conductive sheet. In that respect, it is advantageous.
- a special anisotropically conductive sheet manufacturing die having a configuration shown in FIG. 10, for example, has been conventionally used.
- This mold for producing an anisotropic conductive sheet is composed of an upper mold 90 and a lower mold 95, which is a pair of the upper mold 90, arranged so that their molding surfaces face each other.
- the cavity is formed between the lower surface of the lower mold 95 and the molding surface of the lower mold 95 (the upper surface in FIG. 10).
- a ferromagnetic layer 92 is formed on the lower surface of the ferromagnetic substrate 91 according to a pattern opposite to the arrangement pattern of the conductive path forming portions of the anisotropic conductive sheet to be manufactured.
- a weak magnetic layer 93 is formed in a portion other than the body layer 92.
- a ferromagnetic layer 97 is formed on the upper surface of the ferromagnetic substrate 96 according to the same pattern as the arrangement pattern of the conductive path forming portions of the anisotropic conductive sheet to be manufactured.
- a weak magnetic layer 98 is formed in a portion other than the body layer 97.
- a material layer 80 is formed.
- a pair of electromagnets (not shown) are arranged on the upper surface of the upper die 90 and the lower surface of the lower die 95 and actuated.
- a magnetic field having a larger intensity is applied to a portion located between the ferromagnetic layer 92 of the upper die 90 and the ferromagnetic layer 97 of the lower die 95.
- the conductive particles P dispersed in the conductive material layer 80 are located between the ferromagnetic layer 92 of the upper die 90 and the ferromagnetic layer 97 of the lower die 95, that is, a conductive path is formed. Assemble into the part that will be the part, and be aligned in the thickness direction. Then, by conducting a curing treatment of the conductive material layer 80 in this state, an unevenly distributed anisotropic conductive sheet is obtained.
- the ferromagnetic substrates 91 and 96 themselves function as magnetic poles, so that the portions of the conductive material layer 80 that become insulating portions also have weak magnetic properties. Since a magnetic field acts through the body layers 93 and 98, the conductive particles P present in the portion of the conductive material layer 80 that will become the insulating portion remain without moving toward the portion that becomes the conductive path forming portion. It's easy to do. As a result, an insulating portion having a required insulating property is not formed, and furthermore, a conductive path forming portion containing a required amount of the conductive particles P is not reliably formed. Is difficult to obtain. Such a phenomenon is more remarkable as the pitch of the conductive path forming portion is smaller.
- the thickness direction that is, the surface of the conductive material layer. It is important to form a chain of conductive particles in a direction perpendicular to.
- the magnetic field is applied in the thickness direction of the conductive material layer.
- the chain of the conductive particles P is formed not only in the thickness direction of the conductive material layer 80 but also in a direction inclined with respect to the thickness direction.
- the conductive force is also magnetodynamically stable, and the individual conductive particles are constrained by the magnetic force, so that the conductive particles form a chain in the thickness direction even when the action of the magnetic field is continued. None move as you do.
- the conductive material layer 80 is cured, whereby the obtained anisotropic conductive sheet is also formed in a direction in which the chain of the conductive particles is inclined with respect to the thickness direction. Therefore, high conductivity can be obtained with a small pressing force. It is difficult to obtain.
- the conductive particles P remaining in the portion to be the insulating portion are connected to the other conductive particles P, so that the upper die as shown in FIG. A chain of conductive particles P is formed between the ferromagnetic layer 92 of 90 and the ferromagnetic layer 97 adjacent to the ferromagnetic layer 97 of the lower mold 95 corresponding thereto, and as a result, the adjacent conductive layer P It is difficult to obtain an anisotropic conductive sheet having the required insulation between the path forming portions. Such a phenomenon is more remarkable as the pitch of the conductive path forming portion is smaller.
- the present applicant stops the action of the magnetic field on the conductive material layer in the step of applying the magnetic field to the conductive material layer, and then again performs the action on the conductive material layer.
- a method for producing an anisotropic conductive sheet in which a magnetic field whose direction of magnetic flux lines is opposite to that of a magnetic field is proposed (see Japanese Patent Application No. 2004-30180).
- the magnetic force generated when a magnetic field in which the direction of the magnetic flux lines is applied to the conductive material layer is opposite to that in the anisotropic conductive sheet manufacturing mold.
- Each of the ferromagnetic substrates of the mold and the lower mold moves, thereby causing a displacement between the upper mold and the lower mold as shown in FIG.
- a conductive path forming portion extending in a direction inclined with respect to the thickness direction is formed, so that it is difficult to obtain the desired conductivity.
- the ferromagnetic substrate of each of the upper mold and the lower mold moves, air enters the mold for producing an anisotropic conductive sheet, so that bubbles are easily generated in the obtained anisotropic conductive sheet. There is a problem.
- Patent Document 1 JP-A-51-93393
- Patent Document 2 JP-A-53-147772
- Patent Document 3 JP-A-61-250906 Disclosure of the invention
- the present invention has been made in view of the above circumstances, and a first object of the present invention is to provide a plurality of conductive path forming portions containing conductive particles, and a method for forming these conductive paths.
- a mold for manufacturing an anisotropic conductive sheet having an insulating part that insulates parts from each other, even if the pitch of the conductive path forming part to be formed is small A conductive path forming portion exhibiting the above-mentioned conductivity, and a mold for manufacturing an anisotropic conductive sheet capable of manufacturing an anisotropic conductive sheet that can reliably obtain required insulation between adjacent conductive path forming portions.
- a second object of the present invention is to manufacture an anisotropic conductive sheet having a plurality of conductive path forming portions containing conductive particles, and an insulating portion for insulating these conductive path forming portions from each other.
- this method even if the pitch of the conductive path forming portion to be formed is small, the conductive path forming portion having the intended conductivity is provided, and the required insulation between the adjacent conductive path forming portions is ensured.
- the mold for producing an anisotropic conductive sheet according to the present invention includes a plurality of conductive path forming portions each containing a conductive particle exhibiting magnetism in a state of being oriented in a thickness direction in an insulating elastic polymer material. And an anisotropic conductive sheet manufacturing mold for manufacturing an anisotropic conductive sheet having an insulating portion made of an insulating elastic polymer material that insulates these conductive path forming portions from each other. And a ferromagnetic layer disposed on the substrate according to a pattern corresponding to the pattern of the conductive path forming portion,
- the substrate is made of a weak magnetic material.
- the mold for producing an anisotropic conductive sheet of the present invention has a conductive polymer in a liquid polymer-forming material which is cured to become an insulating elastic polymer substance in a mold for producing an anisotropic conductive sheet.
- a conductive material layer containing particles is formed, and the conductive material layer is formed on the conductive material layer in the thickness direction of the conductive material layer via the ferromagnetic layer in the anisotropic conductive sheet manufacturing mold.
- a step of assembling conductive particles in a portion to be the conductive path forming portion by applying a magnetic field and orienting the conductive particles in a thickness direction of the conductive material layer; After stopping the action of the magnetic field, the magnetic material is again applied to the conductive material layer.
- the method can be suitably used for a method for producing an anisotropic conductive sheet in which an operation for applying a field is performed at least once.
- the substrate is preferably linear thermal expansion coefficient is from 1 X 1 0 one 7 ⁇ 1 X ⁇ - 5 ⁇ - 1 of weak magnetic material .
- a metal film is formed on the surface of the substrate.
- the method for producing an anisotropic conductive sheet according to the present invention comprises a plurality of conductive path forming portions each comprising a conductive particle exhibiting magnetism in an insulating elastic polymer material oriented in a thickness direction.
- a conductive material layer containing conductive particles in a liquid polymer-forming material that is cured to become an insulating elastic polymer material is formed in the anisotropic conductive sheet manufacturing mold.
- the operation of applying the magnetic field to the conductive material layer is performed at least once again.
- the operation of applying the magnetic field to the conductive material layer again causes It is preferable that the direction of the magnetic flux lines of the magnetic field applied again to the conductive material layer is opposite to the direction of the magnetic flux lines of the magnetic field before the stop.
- the operation of applying the magnetic field to the conductive material layer again is performed.
- U which is preferably done repeatedly.
- the operation of applying the magnetic field to the conductive material layer be performed five or more times.
- the substrate is made of a weak magnetic material
- the conductive Since the strength of the magnetic field acting on the insulating portion in the material layer can be sufficiently reduced, the conductive particles existing in the insulating portion can be surely collected in the conductive path forming portion.
- the step of applying a magnetic field to the conductive material layer after the action of the magnetic field on the conductive material layer is stopped, the production of the anisotropic conductive sheet in which the magnetic field is applied to the conductive material layer is performed again.
- the ferromagnetic substrate does not move even when a magnetic field in which the direction of the magnetic flux lines is applied to the conductive material layer is opposite, so that a displacement may occur. Therefore, a conductive path forming portion extending in a direction faithful to the thickness direction can be formed, and therefore, an anisotropic conductive sheet having a conductive path forming portion exhibiting expected conductivity can be manufactured. . Further, since air is prevented from entering the mold for producing an anisotropic conductive sheet, the occurrence of defective products due to bubbles can be suppressed.
- the individual conductive particles in the conductive material layer are in this stopped state. Is released from the constraint by the magnetic force. Then, by applying a magnetic field again to the conductive material layer in the thickness direction, this operation is triggered, and the movement of the conductive particles starts again. A chain of conductive particles is formed in a more faithful direction.
- the formation of chains of conductive particles in a direction inclined with respect to the thickness direction can be suppressed, so that even if the pressure is applied with a small pressing force, the electric resistance value is low and the conductive property is stable. Can be produced.
- the shape of the adjacent conductive path forming portion is small. It is possible to manufacture an anisotropic conductive sheet that ensures the required insulation between the components.Furthermore, since the substrate for the anisotropic conductive sheet manufacturing mold is made of a weak magnetic material, the conductive When a magnetic field in which the direction of the magnetic flux lines is opposite to the magnetic material layer acts on the ferromagnetic material layer, the ferromagnetic substrate does not move.
- the conductive path forming portion extending in any direction can be formed, and therefore, an anisotropic conductive sheet having the conductive path forming portion exhibiting the desired conductivity can be manufactured. Further, since air is prevented from entering the mold for producing an anisotropic conductive sheet, the occurrence of defective products due to bubbles can be suppressed.
- FIG. 1 is an explanatory cross-sectional view showing a configuration of an example of an anisotropic conductive sheet obtained by a mold for producing an anisotropic conductive sheet of the present invention.
- FIG. 2 is an enlarged cross-sectional view illustrating a main part of the anisotropic conductive sheet shown in FIG. 1.
- FIG. 3 is an explanatory cross-sectional view showing a configuration of a mold for manufacturing an anisotropic conductive sheet used for manufacturing the anisotropic conductive sheet shown in FIG. 1.
- FIG. 4 is an explanatory cross-sectional view showing a state where a conductive material is applied to molding surfaces of upper and lower dies in the mold for producing an anisotropic conductive sheet shown in FIG. 1.
- FIG. 5 is an explanatory cross-sectional view showing a state in which a conductive material layer is formed in a cavity of a mold for producing an anisotropic conductive sheet.
- FIG. 6 is an explanatory cross-sectional view showing a state where a mold for producing an anisotropic conductive sheet is set in an electromagnet device.
- FIG. 7 is an explanatory sectional view showing directions of magnetic flux lines in a magnetic field before stop.
- FIG. 8 is an explanatory cross-sectional view showing directions of magnetic flux lines in a magnetic field applied again.
- FIG. 9 is an explanatory cross-sectional view showing a state where conductive particles in a conductive material layer are gathered at a portion to be a conductive path forming portion and are aligned so as to be arranged in a thickness direction.
- FIG. 10 is an explanatory cross-sectional view showing a configuration of an example of a conventional anisotropic conductive sheet manufacturing mold.
- FIG. 11 The conductivity between the upper mold and the lower mold in the mold for producing an anisotropic conductive sheet shown in FIG. It is explanatory sectional drawing which shows the state in which the material layer was formed.
- FIG. 12 is an explanatory cross-sectional view showing a state in which a chain of conductive particles in a conductive material layer is formed in a direction inclined with respect to a thickness direction.
- FIG. 13 An explanatory cross-section showing a state in which a chain of conductive particles is formed between the upper ferromagnetic layer and the corresponding ferromagnetic layer adjacent to the lower ferromagnetic layer.
- FIG. 14 is an explanatory cross-sectional view showing a state in which a positional shift has occurred between an upper mold and a lower mold.
- FIG. 1 is an explanatory cross-sectional view showing a configuration of an example of an anisotropic conductive sheet obtained by a mold for producing an anisotropic conductive sheet of the present invention.
- the anisotropic conductive sheet 10 includes a plurality of conductive path forming portions 11 extending in the thickness direction, each of which is arranged according to a pattern corresponding to an electrode to be connected, for example, an electrode to be inspected of a circuit device to be inspected. And an insulating portion 12 that insulates the conductive path forming portions 11 from each other.
- Each of the conductive path forming portions 11 includes conductive particles P in an insulating elastic polymer material E in a state of being aligned in the thickness direction, as shown in an enlarged view in FIG. In addition, by applying pressure in the thickness direction, a conductive path formed by a chain of conductive particles P is formed in the thickness direction.
- each of the conductive path forming portions 11 is formed with protruding portions 13 and 14 protruding from both sides of the insulating portion 12.
- the insulating portion 12 is made of an insulating elastic polymer material, contains no or almost no conductive particles P, and has conductivity in the thickness direction and the plane direction. Not shown.
- a frame-shaped frame plate 15 is provided integrally with a peripheral portion of the insulating portion 12.
- the content ratio of the conductive particles P in the conductive path forming portion 11 is preferably 10 to 60% by volume, and more preferably 15 to 50%. If this ratio is less than 10%, the conductive path forming portion 11 having a sufficiently low electric resistance may not be obtained. On the other hand, if this ratio exceeds 60%, the resulting conductive path forming portion 11 may be fragile or may not immediately have the required elasticity as the conductive path forming portion 11.
- the pitch of the conductive path forming portions 11 is, for example, a force of 60 to 500 m.
- the manufacturing method of the present invention is extremely effective. It is.
- FIG. 3 is an explanatory cross-sectional view showing a configuration of an example of the mold for producing an anisotropic conductive sheet of the present invention.
- This mold for producing an anisotropic conductive sheet is composed of an upper mold 50 and a lower mold 55 that is paired with the upper mold 50 such that their molding surfaces face each other.
- the cavity is formed between the lower surface of the lower mold 55 and the molding surface of the lower mold 55 (the upper surface in FIG. 3).
- a ferromagnetic layer 52 is formed on the lower surface of the substrate 51 according to a pattern opposite to the arrangement pattern of the conductive path forming portions 11 of the anisotropic conductive sheet 10 to be manufactured.
- a weak magnetic layer 53 having a thickness larger than the thickness of the ferromagnetic layer 52 is formed in a portion other than the layer 52, and thereby, the ferromagnetic layer 52 on the molding surface of the upper mold 50 is formed.
- a protruding portion concave portion 52a for forming the protruding portion 13 in the anisotropic conductive sheet 10 is formed at the position where it is located.
- a cavity recess 53a for forming a cavity is formed on the surface of the weak magnetic layer 53.
- a ferromagnetic layer 57 is formed on the upper surface of the substrate 56 according to the same pattern as the arrangement pattern of the conductive path forming portions 11 of the anisotropic conductive sheet 10 to be manufactured.
- a weak magnetic layer 58 having a thickness larger than the thickness of the ferromagnetic layer 57 is formed in a portion other than the body layer 57, and thereby the ferromagnetic layer 57 on the molding surface of the lower mold 55 is positioned.
- a protruding portion concave portion 57a for forming the protruding portion 14 in the anisotropic conductive sheet 10 is formed at the corresponding position.
- a cavity recess 58a for forming a cavity is formed on the surface of the weak magnetic layer 58.
- the weak magnetic material may be any of a paramagnetic material and a diamagnetic material.
- Specific examples of the weak magnetic material include ceramics such as alumina, beryllia, silicon carbide, aluminum nitride, and fluorophlogopite, glass materials such as blue plate glass, flint glass, and Pyrex (registered trademark) glass, copper, aluminum, and tungsten. And a weak magnetic material such as molybdenum.
- the anisotropic conductive sheet has high dimensional accuracy and a high position of the conductive path forming portion.
- the weak magnetic material constituting the substrate 51, 56 it is preferable that a coefficient of linear thermal expansion used as the 1 X 10- 7 ⁇ 1 X 10- 5 ⁇ - 1.
- the substrates 51 and 56 preferably have a thickness of 0.1 to 50 mm, have a smooth surface, are chemically degreased, and are mechanically polished. Better.
- a single metal film or a plurality of different types of metal films can easily form the ferromagnetic layers 52 and 57 by electrolytic plating. (Omitted) is preferably formed.
- the material for forming the metal film may be a weak magnetic material or a ferromagnetic material. Specific examples thereof include copper, nickel, cobalt, gold, silver, palladium, rhodium, and platinum. .
- the thickness of the metal film is preferably 30 m or less, more preferably 20 m or less.
- the thickness is excessively large, when a magnetic field having a direction of a magnetic flux line opposite to the conductive material layer is applied to the conductive material layer in a method for manufacturing an anisotropic conductive sheet described below, It is not preferable because the 51 and 56 move, which may cause a displacement between the upper mold 50 and the lower mold 55.
- the material forming the ferromagnetic layers 52 and 57 in each of the upper mold 50 and the lower mold 55 includes a strong material such as iron, iron-nickel alloy, iron-cobalt alloy, nickel, cono- tant, and nickel-cobalt alloy. Magnetic metals can be used.
- the ferromagnetic layers 52 and 57 preferably have a thickness force S of 10 ⁇ m or more. If the thickness is less than 10 ⁇ m, it becomes difficult to apply a magnetic field having a sufficient intensity distribution to the conductive material layer formed in the anisotropic conductive sheet manufacturing mold. As a result, it becomes difficult to aggregate the conductive particles at a high density in a portion of the conductive material layer where the conductive path forming portion is to be formed, so that a sheet having good anisotropic conductivity may not be obtained. .
- an electrolytic plating method can be used as a method for forming the ferromagnetic layers 52, 57 on the surfaces of the substrates 51, 56.
- a weak magnetic metal such as copper, a heat-resistant polymer substance, or the like may be used.
- Able to use a polymer material that is hardened by electromagnetic waves because it is possible to easily form the weak magnetic layers 53 and 58 by a photolithographic method for example, acrylic Photoresists such as a system dry film resist, an epoxy system liquid resist, and a polyimide system liquid resist can be used.
- a conductive material layer in a mold for producing an anisotropic conductive sheet which contains conductive particles in a liquid polymer forming material which is cured to become an insulating elastic polymer material (a- 1) and by acting on the conductive material layer in the thickness direction of the conductive material layer via the ferromagnetic material layer in the anisotropic conductive sheet production mold, (B-1) a step of assembling conductive particles in a portion to be oriented in the thickness direction of the conductive material layer; Curing the conductive material layer after stopping the action of the magnetic field on the conductive material layer or while continuing the action of the magnetic field (c 1);
- the anisotropic conductive sheet 10 is manufactured.
- a conductive material is prepared by dispersing conductive particles in a liquid polymer-forming material which is cured to become an insulating elastic polymer material.
- Various materials can be used as the polymer substance forming material for preparing the conductive material, and specific examples thereof include silicone rubber, polybutadiene rubber, natural rubber, polyisoprene rubber, and styrene-butadiene copolymer.
- Rubber conjugated rubbers such as acrylonitrile-butadiene copolymer rubber and hydrogenated products thereof, and block copolymer rubbers such as styrene butagen-gen block copolymer rubber and styrene isoprene block copolymer;
- hydrogenated products include chloroprene rubber, urethane rubber, polyester rubber, epichlorohydrin rubber, ethylene-propylene copolymer rubber, ethylene-propylene copolymer rubber, and soft liquid epoxy rubber.
- silicone rubber is preferred from the viewpoints of durability, moldability and electrical properties.
- the silicone rubber is preferably one obtained by crosslinking or condensing a liquid silicone rubber.
- the liquid silicone rubber may be any of a condensation type, an addition type, and a compound having a bull group-hydroxyl group. Specific examples include raw dimethyl silicone rubber, raw methyl silicone rubber, raw methyl methyl silicone rubber and the like.
- the addition-type liquid silicone rubber is a one-pack type liquid silicone rubber which is cured by a reaction between a bullet group and a Si—H bond, and is a polysiloxanka containing both a bullet group and a Si—H bond.
- Both (one-component type) and two-component type (two-component type) having a vinyl group-containing polysiloxane and a Si-H bond-containing polysiloxane can be used.
- liquid silicone rubber containing a bullet group (polydimethylsiloxane containing a bullet group) is usually prepared by using dimethyldichlorosilane or dimethyldialkoxysilane in the presence of dimethylvinylchlorosilane or dimethylvinylalkoxysilane.
- hydrolysis and condensation reactions are performed, for example, followed by fractionation by repeated dissolution and precipitation.
- Liquid silicone rubbers containing vinyl groups at both ends are polymerized with a cyclic siloxane such as otatamethylcyclotetrasiloxane in the presence of a catalyst to form a polymerization terminator such as dimethyldibutyl. It can be obtained by using siloxane and appropriately selecting other reaction conditions (for example, the amount of the cyclic siloxane and the amount of the polymerization terminator).
- a catalyst for the aone polymerization alkalis such as tetramethylammonium hydroxide and n-butylphospho-hydroxymide or a silanolate solution thereof can be used. For example, 80 to 130 ° C.
- Such a vinyl group-containing polydimethylsiloxane preferably has a molecular weight Mw (referred to as a standard polystyrene-converted weight average molecular weight; the same applies hereinafter) of 10,000 to 40,000.
- Mw molecular weight
- the molecular weight distribution index refers to the value of the ratio MwZMn between the weight average molecular weight Mw in terms of standard polystyrene and the number average molecular weight Mn in terms of standard polystyrene; the same applies hereinafter). Is preferably 2 or less.
- liquid silicone rubber containing hydroxyl groups (hydroxyl-containing polydimethylsiloxane) is usually prepared by adding dimethyldichlorosilane or dimethyldialkoxysilane to dimethylhydrochlorosilane or dimethylhydroalkoxysilane in the presence of! / It can be obtained by carrying out hydrolysis and condensation reactions, for example, followed by fractionation by repeated dissolution and precipitation.
- cyclic siloxane is polymerized in the presence of a catalyst in the presence of a catalyst, and as a polymerization terminator, dimethinolehydrochlorosilane, methinoreshydrochlorosilane or dimethinolehydroalkoxysilane is used as a polymerization terminator, and other reaction conditions (for example, , The amount of the cyclic siloxane and the amount of the polymerization terminator).
- alkali such as tetramethylammonium hydroxide and ⁇ -butylphosphodium hydroxide or a silanolate solution thereof can be used.
- alkali such as tetramethylammonium hydroxide and ⁇ -butylphosphodium hydroxide or a silanolate solution thereof can be used.
- alkali such as tetramethylammonium hydroxide and ⁇ -butylphosphodium hydroxide or a silanolate solution thereof can be used.
- Example it is 80 to 130
- Such a hydroxyl group-containing polydimethylsiloxane preferably has a molecular weight Mw of 10,000 to 40,000. From the viewpoint of the heat resistance of the obtained anisotropic conductive sheet 10, those having a molecular weight distribution index of 2 or less are preferable.
- either one of the above-mentioned polydimethylsiloxane containing a butyl group and polydimethylsiloxane containing a hydroxyl group can be used, or both are used in combination.
- the cured product thereof has a compression set of 10% at 150 ° C. It is more preferable to use the following, more preferably 8% or less, and further preferably 6% or less. If the compression set exceeds 10%, the conductive path forming portion 11 is permanently set when the obtained anisotropic conductive sheet 10 is used repeatedly many times or repeatedly in a high temperature environment. Immediately after the distortion occurs, the chain of the conductive particles in the conductive path forming portion 11 is disturbed, so that it may be difficult to maintain the required conductivity.
- the compression set of the cured product of the liquid silicone rubber can be measured by a method based on JIS K 6249.
- the liquid silicone rubber preferably has a durometer A hardness of 10 to 60 at 23 ° C, more preferably 15 to 60, particularly preferably 20 to 60. Things. If the durometer A hardness is less than 10, the insulating part 12 that insulates the conductive path forming parts 11 from each other when pressurized may be excessively deformed or may have a required insulation property between the conductive path forming parts 11. May be difficult to maintain. On the other hand, if the durometer A hardness exceeds 60, a considerably large load is required to apply an appropriate strain to the conductive path forming portion 11, so that, for example, deformation or breakage of the inspection object may occur. It is easy to occur.
- the durometer A hardness of the cured liquid silicone rubber can be measured by a method based on JIS K 6249.
- the liquid silicone rubber has a cured product having a tear strength at 23 ° C. of 8 k. It is preferable to use one having NZm or more, more preferably at least 10 kN / m, more preferably at least 15 kN / m, particularly preferably at least 20 kN / m.
- the tear strength is less than 8 kNZm, the durability is likely to decrease when the anisotropic conductive sheet 10 is subjected to excessive strain.
- the tear strength of the cured product of the liquid silicone rubber can be measured by a method based on JIS K 6249.
- liquid silicone rubber it is preferable to use a liquid silicone rubber having a viscosity at 23 ° C. of 100 to 1,250 Pa ′s, more preferably 150 to 800 Pa ′s, and particularly preferably 250 to 500 Pa ′s. s.
- the viscosity is less than 100 Pa's, the resulting conductive material is liable to cause sedimentation of the conductive particles in the liquid silicone rubber, failing to obtain good storage stability, and a process described below.
- (b-1) when a magnetic field is applied to the conductive material layer in the thickness direction, the conductive particles are not aligned so as to be aligned in the thickness direction, and form a chain of conductive particles in a uniform state. It can be difficult.
- the resulting conductive material has a high viscosity, so that it is difficult to form a conductive material layer in the anisotropic conductive sheet manufacturing mold.
- the conductive particles do not move sufficiently, and therefore, the conductive particles may be oriented to be aligned in the thickness direction. It can be difficult.
- the viscosity of the liquid silicone rubber can be measured by a B-type viscometer.
- the polymer substance-forming material may contain a curing catalyst for curing the polymer substance-forming material.
- a curing catalyst an organic peroxide, a fatty acid azoide compound, a hydrosilylide catalyst, or the like can be used.
- organic peroxide used as the curing catalyst examples include benzoyl peroxide, bisdicyclobenzoyl peroxide, dicumyl peroxide, and ditertiary butyl peroxide.
- fatty acid azo compound used as a curing catalyst examples include azobisisobutyl nitrile.
- Specific examples of those which can be used as a catalyst for the hydrosilylation reaction include chloroplatinic acid and And its salts, siloxane complex containing platinum unsaturated group, complex of butylsiloxane and platinum, complex of platinum and 1,3 dibutyltetramethyldisiloxane, complex of triorganophosphine or phosphite and platinum, acetylacetate platinum
- siloxane complex containing platinum unsaturated group complex of butylsiloxane and platinum
- platinum and 1,3 dibutyltetramethyldisiloxane complex of triorganophosphine or phosphite and platinum
- acetylacetate platinum Known ones such as a chelate and a complex of a cyclic gen and platinum are exemplified.
- the amount of the curing catalyst used is appropriately selected in consideration of the type of the polymer-forming material, the type of the curing catalyst, and other curing conditions. 15 parts by weight.
- the polymer substance forming material may be a material containing an inorganic filler such as ordinary silica powder, colloidal silica, air-port gel silica, and alumina.
- an inorganic filler such as ordinary silica powder, colloidal silica, air-port gel silica, and alumina.
- the use amount of such an inorganic filler is not particularly limited. However, when used in a large amount, the movement of the conductive particles P due to the magnetic field in the step (b-1) described later is greatly inhibited. Therefore, it is not preferable.
- the conductive particles for preparing the conductive material those exhibiting magnetism are used, and specific examples thereof include particles of a metal exhibiting magnetism such as iron, nickel, and cobalt or alloys thereof. Particles or particles containing these metals, or those particles as core particles, and the surface of the core particles is subjected to plating of a metal having good conductivity such as gold, silver, nordium, rhodium, In some cases, inorganic particles or polymer particles such as weak magnetic metal particles or glass beads are used as core particles, and the surface of the core particles is coated with a conductive magnetic material such as nickel or cobalt. And those coated with both a conductive magnetic material and a metal having good conductivity.
- nickel particles as core particles, the surfaces of which are plated with a metal having good conductivity such as gold or silver.
- Means for coating the surface of the core particles with a conductive metal is not particularly limited, but may be, for example, an electroless plating.
- the coverage of the conductive metal on the particle surface is preferably 40% or more, more preferably 45% or more, and particularly preferably 47 to 95%.
- the coating amount of the conductive metal is preferably 2.5 to 50% by weight of the core particles, more preferably 3 to 30% by weight, still more preferably 3.5 to 25% by weight, and particularly preferably. Is from 4 to 20% by weight.
- the coating amount is preferably 3 to 30% by weight of the core particles, more preferably 3.5 to 25% by weight, still more preferably 4 to 25% by weight. 20% by weight.
- the coating amount is preferably 3 to 30% by weight of the core particles, more preferably 4 to 25% by weight, and even more preferably 5 to 25% by weight. -23% by weight, particularly preferably 6-20% by weight.
- the particle diameter of the conductive particles is preferably 1 to 500 ⁇ m, more preferably 2 to 300 m, further preferably 3 to 200 m, particularly preferably 5 to 500 ⁇ m. 150 m.
- the particle size distribution (DwZDn) of the conductive particles is preferably from 1 to LO, more preferably from 1 to 7, further preferably from 1 to 5, and particularly preferably from 1 to 4.
- the obtained anisotropic conductive sheet 10 can be easily deformed under pressure, and the conductive path forming portion 11 in the anisotropic conductive sheet 10 can be obtained. In addition, sufficient electrical contact between the conductive particles P can be obtained.
- the shape of the conductive particles is not particularly limited, but is spherical, star-shaped, or agglomerated because they can be easily dispersed in the polymer-forming material. It is preferably a lump formed by secondary particles.
- the water content of the conductive particles is preferably 5% or less, more preferably 3% or less, further preferably 2% or less, and particularly preferably 1% or less.
- FIG. 4 One of the molding surface of the upper mold 50 and the molding surface of the lower mold 55 in the mold for producing an anisotropic conductive sheet shown in FIG.
- the upper mold 50 coated with the conductive material is superimposed on the lower mold 55 coated with the conductive material via the frame plate 15 as shown in FIG.
- a conductive material layer 10A containing the conductive particles P in the polymer-forming material is formed in the cavity between the upper mold 50 and the lower mold 55 in the mold for producing an anisotropic conductive sheet.
- the conductive particles P are in a state of being dispersed in the conductive material layer 10A.
- various materials such as a metal material, a ceramic material, and a resin material can be used as a material of the frame plate 15, and specific examples thereof include iron, copper, and ⁇ .
- Metal materials such as nickel, chromium, conoort, magnesium, manganese, molybdenum, indium, lead, palladium, titanium, tungsten, aluminum, gold, platinum, silver, and alloys or alloy steels combining two or more of these.
- Ceramic materials such as silicon nitride, silicon carbide, and alumina, aramide resin, aramide nonwoven reinforced epoxy resin, aramide nonwoven reinforced polyimide resin, aramide nonwoven reinforced bismaleimide triazine resin, etc. Fatty materials.
- the material constituting the frame plate 15 has a linear thermal expansion coefficient of the linear thermal expansion coefficient of the material constituting the wafer to be inspected. It is preferable to use one that is equivalent or approximate to the expansion coefficient.
- the material constituting the wafer is silicon, a coefficient of linear thermal expansion 1. 5 X 10 ZK less, in particular, be used as a 3 X 10- 6 ⁇ 8 X 10- 6 ⁇
- Specific examples that are preferred are Invar-type alloys such as Invar, Elinvar-type alloys such as Elinvar, metal materials such as Super Invar, Kovar, 42 alloy, and non-woven fabric-reinforced organic resin materials such as Aramide. No.
- the thickness of the frame plate 15 is, for example, 0.02 to Lmm, and preferably 0.05 to 0.25 mm.
- the conductive material layer 10A formed in the step (a-l) is connected to the conductive material layer 10A via the ferromagnetic layers 52 and 57 in the anisotropic conductive sheet manufacturing mold.
- the conductive material layer 10A is guided to the conductive path forming portion.
- the conductive particles are aggregated and oriented so as to be arranged in the thickness direction of the conductive material layer 10A. More specifically, as shown in FIG. 6, an electromagnet device 60 having an upper electromagnet 61 and a lower electromagnet 65 and having the magnetic poles 62 and 66 opposed to each other is prepared.
- a mold for producing an anisotropic conductive sheet having a conductive material layer 10A formed in a cavity is arranged.
- the weak magnetic layer 53 of the upper die 50 is placed between the ferromagnetic layer 52 of the upper die 50 and the corresponding ferromagnetic layer 57 of the lower die 55.
- a stronger magnetic field is formed between the lower mold 55 and the weak magnetic layer 58 of the lower mold 55.
- a magnetic field having a greater intensity is applied to the conductive material layer 10A on the portion to be the conductive path forming portion, and thereby the conductive particles dispersed in the conductive material layer 10A are formed.
- P is collected in a portion to be a conductive path forming portion and is oriented so as to be arranged in the thickness direction of the conductive material layer 10A.
- the intensity of the magnetic field applied to the conductive material layer 10A has a magnitude of 0.02 to 2.5 Tesla on average.
- This step (b-1) is preferably performed under conditions that do not promote the curing of the conductive material layer 10A, for example, at room temperature.
- this step (b-1) the operation of the magnetic field on the conductive material layer 10A is temporarily stopped, and thereafter, the operation of applying the magnetic field on the conductive material layer 10A again (hereinafter, this operation is referred to as the operation).
- "Re-operating operation" is performed at least once. Specifically, this restarting operation is performed by stopping the operation of the electromagnet device 60 and then activating the electromagnet device 60 again.
- operation stop time the time from when the magnetic field is stopped applied to the conductive material layer 10A until when the magnetic field is applied again to the conductive material layer 10A (hereinafter referred to as “operation stop time”) ) Is appropriately set in consideration of the viscosity of the conductive material layer 10A, the ratio of the conductive particles in the conductive material layer 10A, the average particle size of the conductive particles, and the like, but may be 200 seconds or less. It is more preferably 60 seconds or less.
- the operation stop time is excessively long, the time required for the process (b-1) becomes too long, so that the production efficiency throughout the entire production process becomes extremely low and the liquid Since the curing of the secondary material forming material starts, the viscosity of the conductive material layer 10A changes, so that a sufficient effect may not be obtained.
- the magnetic field applied to the conductive material layer 10A again has the same direction as that of the magnetic field before the stop. May be in the direction opposite to the direction of the magnetic flux lines of the magnetic field before the stop, but may be in the direction opposite to the direction of the magnetic flux lines of the magnetic field before the stop in that the effect of the residual magnetic field is small. preferable.
- the strength of the magnetic field is preferably substantially equal to the strength of the magnetic field before the stop.
- the polarity of the magnetic poles 62 of the upper electromagnet 61 and the magnetic poles 66 of the lower electromagnet 65 in the electromagnet device 60 must be adjusted. Change the polarity!
- the electromagnet device 60 when a magnetic field is first applied to the conductive material layer 10A, for example, under the condition that the magnetic pole 62 of the upper electromagnet 61 is the N pole and the magnetic pole 66 of the lower electromagnet 65 is the S pole, Activate the electromagnet device 60.
- the ferromagnetic layer 52 of the upper mold 50 functions as the N pole and the ferromagnetic layer 57 of the lower mold 55 functions as the S pole, as shown in FIG.
- the direction of the magnetic flux lines in the acting magnetic field is the direction from the ferromagnetic layer 52 of the upper die 50 to the corresponding ferromagnetic layer 57 of the lower die 55, that is, from the top to the bottom.
- the operation of the electromagnet device 60 is temporarily stopped after a predetermined time has elapsed while the magnetic field is applied to the conductive material layer 10A. Thereafter, the electromagnet device 60 is operated again under the condition that the magnetic pole 62 of the upper electromagnet 61 becomes the S pole and the magnetic pole 66 of the lower electromagnet 65 becomes the N pole. In this state, the ferromagnetic layer 52 of the upper mold 50 functions as the S pole and the ferromagnetic layer 57 of the lower mold 55 functions as the N pole, so that it acts on the conductive material layer 10A as shown in FIG.
- the direction of the magnetic flux lines in the applied magnetic field is the direction from the ferromagnetic layer 57 of the lower die 55 to the corresponding ferromagnetic layer 52 of the upper die 50, that is, the direction of the upward force from below. According to such a method, when the operation of the electromagnet device 60 is stopped, even if a residual magnetic field is generated, it is demagnetized by operating the electromagnet device 60 again, so that the influence of the residual magnetic field is reduced.
- the restarting operation may be performed at least once in step (b-1). Specifically, it is preferable that the operation is performed repeatedly. More preferably, the number of restart operations is 5 or more, more preferably 10 to 500 times.
- the magnetic field is again applied to the conductive material layer, and then the operation of the magnetic field to the conductive material layer is stopped.
- reactivation time is appropriately determined in consideration of the viscosity of the conductive material layer 10A, the ratio of the conductive particles in the conductive material layer 10A, the average particle size of the conductive particles, and the like.
- the set force is preferably from 10 to 300 seconds, more preferably from 10 to 200 seconds.
- the reactivation time is too short, a high-intensity magnetic field is not formed, so that the conductive particles P in the conductive material layer 10A do not move sufficiently, and as a result, the conductive material layer 10A In some cases, it is difficult to form a chain of the conductive particles P in a direction more faithful to the thickness direction.
- the reactivation time is too long, the time required for the step (b-1) becomes too long, and the production efficiency throughout the entire production process becomes extremely low. As the curing of the conductive material starts, the viscosity of the conductive material layer 10A changes, so that a sufficient effect may not be obtained.
- step (bl) as shown in FIG. 9, the ferromagnetic layer 52 of the upper die 50 and the ferromagnetic layer 57 of the lower die 55 corresponding thereto are formed.
- a hardening treatment is performed on the conductive material layer 10A in which the conductive particles P are densely contained in a portion to be the conductive path forming portion in a state of being oriented in the thickness direction.
- the curing treatment of the conductive material layer 10A reduces the action of the magnetic field on the conductive material layer 10A. It may be performed after stopping, or may be performed while applying a magnetic field to the conductive material layer 10A, but is preferably performed while applying a magnetic field.
- the curing treatment of the conductive material layer 10A is usually performed by a heat treatment which varies depending on the material used.
- the specific heating temperature and heating time are appropriately set in consideration of the type of the polymer substance forming material constituting the conductive material layer 1OA.
- the anisotropic conductive sheet 10 shown in FIG. 1 and FIG. can get.
- the substrate 51 of the upper mold 50 and the substrate 56 of the lower mold 55 are each made of a weak magnetic material, when a magnetic field is applied to the conductive material layer 10A, the conductive material layer Since the strength of the magnetic field acting on the insulating portion at 10A can be sufficiently reduced, the conductive particles P present in the insulating portion surely gather in the conductive path forming portion. As a result, it is possible to form the insulating portion 12 having no or almost no conductive particles P, and to form the conductive path forming portion 11 containing a required amount of the conductive particles P. .
- the substrate 51 and 56 can be subjected to heat treatment for curing the conductive material layer 1OA. , 56, the anisotropic conductive sheet having high dimensional accuracy of the entire sheet and high positional accuracy of the conductive path forming portion can be manufactured.
- the formation of chains of conductive particles P in a direction inclined with respect to the thickness direction can be suppressed, so that even when pressed with a small pressing force, the electric resistance value is low and stable. Since the conductive particles P exhibit high conductivity and prevent the formation of a chain of conductive particles P that connects adjacent conductive path forming portions, the pitch of the conductive path forming portions 11 is small. In addition, it is possible to manufacture the anisotropic conductive sheet 10 that ensures the required insulation between the adjacent conductive path forming portions 11.
- the magnetic force prevents the substrate 51 of the upper die 50 and the substrate 56 of the lower die 55 from moving. Therefore, since there is no displacement between the upper mold 50 and the lower mold 55, the conductive path forming portion 11 extending in the direction faithful to the thickness direction can be formed.
- the anisotropic conductive sheet 10 having the conductive path forming portion 11 exhibiting the above-mentioned conductivity can be manufactured. Further, since air is prevented from entering the mold for producing an anisotropic conductive sheet, it is possible to suppress the occurrence of defective products due to bubbles.
- a mold for producing an anisotropic conductive sheet having the following specifications was produced.
- the upper mold (50) and the lower mold (55) are coated on the surface of a substrate material made of fluorophlogopite with a thickness of 6 mm, and a nickel film with a thickness of 3 ⁇ m and a copper film with a thickness of 5 ⁇ m,
- Each substrate (51, 56) has 2,000 rectangular ferromagnetic layers (52, 57) made of nickel-cobalt on the surface of each substrate (51, 56). Formed by!
- each of the ferromagnetic layers (52, 57) are 40 m (length) ⁇ 100 m (width) ⁇ 5 O / zm (thickness), and the arrangement pitch is 80 m.
- the dry film resist is hardened in areas other than the ferromagnetic layers (52, 57) on the surface of the substrate (51, 56).
- the processed weak magnetic layer (53, 58) is formed.
- the thickness of the portion where the cavity recesses (53a, 58a) are formed in the weak magnetic layer (53, 58) is 80 ⁇ m, and the thickness of the other portions is 90 ⁇ m.
- a frame plate having the following specifications was produced.
- the frame plate is made of S42 alloy material and has a rectangular shape of S250mm X 250mm X O. 03mm with dimensional force of 100mm. It is formed as follows.
- a conductive material was prepared by adding and mixing 140 parts by weight of conductive particles having an average particle diameter of 8.7 m to 100 parts by weight of an addition-type liquid silicone rubber, followed by defoaming under reduced pressure. .
- This conductive material is applied to the upper mold surface and the lower mold surface of the above-described anisotropic conductive sheet manufacturing mold by a screen printing method, and then the lower plate, the frame plate and the upper mold are placed on the lower mold. By overlapping in this order, a conductive material layer was formed in the cavity between the upper mold and the lower mold.
- nickel particles were used as the core particles, and the core particles were subjected to electroless gold plating (average coating amount: 25% by weight of the core particles).
- the addition-type liquid silicone rubber is a two-part type having a viscosity of liquid A of 250 Pa's and a viscosity of liquid B of 250 Pa's. 5%, the durometer A hardness of the cured product was 35, and the tear strength of the cured product was 25 kNZm.
- the viscosity at 23 ⁇ 2 ° C was measured by a B-type viscometer.
- An electromagnet device having an upper electromagnet and a lower electromagnet, and arranged such that their magnetic poles face each other, is provided between the magnetic pole of the upper electromagnet and the magnetic pole of the lower electromagnet in the electromagnet device.
- a mold for manufacturing an anisotropic conductive sheet on which a conductive material layer was formed was set.
- a magnetic field of 1.6 T was applied to the portion of the conductive material layer to be the conductive path forming portion, and a re-operation was performed for a total of 200 times.
- a magnetic field was applied to the portion to be the conductive path forming portion while performing the process.
- the conditions for the restart operation are as follows: the operation stop time is 5 seconds, the restart time is 15 seconds, the direction of the magnetic flux lines of the magnetic field applied again is opposite to the direction of the magnetic flux lines before the stop, Again, when a magnetic field is applied to the portion of the conductive material layer that becomes the conductive path forming portion, the strength of the magnetic field is 1.6 T in each case.
- Step (c1) By operating the electromagnet device with the anisotropic conductive sheet manufacturing mold set between the magnetic pole of the upper electromagnet and the magnetic pole of the lower electromagnet in the electromagnet device,
- the conductive material is cured at 100 ° C for 2 hours, and then room temperature is applied. After cooling, the anisotropic conductive sheet manufacturing die was taken out to produce an anisotropic conductive sheet in which a frame plate was integrally provided on the periphery of the insulating part.
- the conductive path forming part has a vertical and horizontal dimensional force of 0 mx 100 m and a thickness of 100 m.
- the projecting height from both sides of the insulating portion was 110 / ⁇ , and the thickness of the insulating portion was 50 / zm, respectively.
- the volume fraction was about 30% in all the conductive path forming portions.
- the upper mold (50) and the lower mold (55) are each formed of a 0-thick film formed by sputtering on a surface of a substrate material made of Pyrex (registered trademark) glass having a thickness of 6 mm.
- a substrate (51, 56) in which a 5 m copper film is laminated in this order.
- the layers (52, 57) are formed by electrolytic plating.
- each of the ferromagnetic layers (52, 57) are 40 / z m (length) X 100 / z m (width) ⁇ 50 / ⁇ ⁇ (thickness), and the arrangement pitch is 80 m.
- weak magnetic layers (53, 58) obtained by hardening a dry film resist are provided in regions other than the ferromagnetic layers (52, 57) on the surface of the substrate (51, 56).
- weak magnetic layers (53, 58) obtained by hardening a dry film resist are provided. Is formed.
- the thickness of the portion where the cavity recesses (53a, 58a) are formed in the weak magnetic layer (53, 58) is 80 ⁇ m, and the thickness of the other portions is 90 ⁇ m.
- An anisotropic conductive sheet was produced in the same manner as in Example 1, except that this mold for producing an anisotropic conductive sheet was used.
- the conductive path forming part has a vertical and horizontal dimensional force of 0 mx 100 m, a thickness of 100 m.
- the thickness of the insulating part was 30 / zm, the height of the protrusion from both sides of the insulating part was 30 / zm, and the thickness of the insulating part was 50 / zm.
- the volume fraction was about 30% in all the conductive path forming portions.
- the upper mold (50) and the lower mold (55) are formed by sputtering a nickel film with a thickness of 0.5 m and a copper film with a thickness of 5 / zm on the surface of a substrate material made of molybdenum with a thickness of 6 mm.
- 5 7) is formed by electrolytic plating.
- each of the ferromagnetic layers (52, 57) are 40 m (length) ⁇ 100 m (width) ⁇ 50 m (thickness), and the arrangement pitch is 80 ⁇ m.
- a weak magnetic layer (53, 58) obtained by hardening a dry film resist is provided on the surface of the substrate (51, 56) other than where the ferromagnetic layer (52, 57) is formed. Is formed.
- the thickness of the portion where the cavity recesses (53a, 58a) are formed in the weak magnetic layer (53, 58) is 80 ⁇ m, and the thickness of the other portions is 90 ⁇ m.
- An anisotropic conductive sheet was produced in the same manner as in Example 1 except that this mold for producing an anisotropic conductive sheet was used.
- the conductive path forming part has a vertical and horizontal dimensional force of 0 mx 100 m and a thickness of 100 m.
- the projecting height from both sides of the insulating portion was 110 / ⁇ , and the thickness of the insulating portion was 50 / zm, respectively.
- the volume fraction was about 30% in all the conductive path forming portions.
- a mold for producing an anisotropic conductive sheet having the same specifications as in Example 1 was prepared except that a substrate made of ferromagnetic material 42 alloy was used, and this mold for producing an anisotropic conductive sheet was used. Except for this, an anisotropic conductive sheet was produced in the same manner as in Example 1.
- 2000 rectangular conductive path forming portions are 80 m
- the conductive path forming part has a vertical and horizontal dimensional force of 0 mx 100 m, a thickness of 110 / ⁇ , and a protrusion height from both sides of the insulating part of 30 m each.
- the volume fraction was about 30% in all the conductive path forming portions.
- Insulation between conductive path forming parts Insulation between conductive path forming parts:
- the conductive path forming portion has a low electric resistance value and exhibits stable conductivity. And all that It was confirmed that an anisotropic conductive sheet having a required insulating property with respect to the adjacent conductive path forming portion can be obtained with respect to the conductive path forming portion.
- the anisotropic conductive sheet obtained in Comparative Example 1 has a small electrical resistance value with respect to a part of the conductive path forming part and an adjacent conductive path forming part. The difference between the anisotropically conductive sheets obtained in Examples 1 to 3 and the anisotropically conductive sheet obtained in Comparative Example 1 is obvious.
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- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
Claims
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JP2004118822 | 2004-04-14 | ||
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KR (1) | KR20070010012A (en) |
CN (1) | CN1943081A (en) |
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US20210359434A1 (en) * | 2018-10-11 | 2021-11-18 | Sekisui Polymatech Co., Ltd. | Electrical connection sheet and terminal-equipped glass plate structure |
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KR101038270B1 (en) * | 2009-07-24 | 2011-05-31 | (주)케미텍 | Anisotropic Conductive Connector And The Manufacturing Method Thereof |
JP5650611B2 (en) * | 2011-08-23 | 2015-01-07 | デクセリアルズ株式会社 | Anisotropic conductive film, method for manufacturing anisotropic conductive film, connection method, and joined body |
KR102180143B1 (en) * | 2017-12-29 | 2020-11-17 | 국도화학 주식회사 | Anisotropic conductive film, display device comprising the same and/or semiconductor device comprising the same |
CN111757670B (en) * | 2018-04-09 | 2022-10-14 | 大日本除虫菊株式会社 | Flying pest repellent product and flying pest repellent method |
KR102075669B1 (en) * | 2018-10-26 | 2020-02-10 | 오재숙 | Data signal transmission connector and manufacturing method for the same |
CN110343386B (en) * | 2019-05-13 | 2023-09-22 | 中国科学院宁波材料技术与工程研究所 | Stretchable composite force-sensitive material, preparation method thereof and stretchable pressure sensor |
KR102615617B1 (en) * | 2021-01-08 | 2023-12-20 | 리노공업주식회사 | Test socket and method for manufacturing the same |
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JPS5193393A (en) * | 1975-02-12 | 1976-08-16 | Erasuteitsuku kontakutoshiitonoseizohoho | |
JPS53147772A (en) * | 1977-05-31 | 1978-12-22 | Japan Synthetic Rubber Co Ltd | Manufacture of pressure-conductive elastomer |
JPS61250906A (en) * | 1985-04-26 | 1986-11-08 | ジェイエスアール株式会社 | Conductive elastomer sheet |
JPH11260518A (en) * | 1998-03-13 | 1999-09-24 | Jsr Corp | Manufacture of anisotropic conductive sheet and its manufacturing device |
JPH11283718A (en) * | 1998-03-27 | 1999-10-15 | Jsr Corp | Manufacture of and manufacturing device for anisotropic conductive sheet |
JP2000334742A (en) * | 1999-05-27 | 2000-12-05 | Jsr Corp | Mold, its manufacture, casting mold for manufacturing mold, and manufacture of anisotropic conductive sheet |
JP2002246428A (en) * | 2000-12-08 | 2002-08-30 | Jsr Corp | Anisotropic conductive sheet and wafer tester |
JP2004111930A (en) * | 2002-08-09 | 2004-04-08 | Jsr Corp | Anisotropically conductive connector, probe material member, wafer inspection apparatus, and wafer inspection method |
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2005
- 2005-04-11 CN CNA2005800112097A patent/CN1943081A/en active Pending
- 2005-04-11 KR KR1020067019845A patent/KR20070010012A/en not_active Application Discontinuation
- 2005-04-11 WO PCT/JP2005/007035 patent/WO2005101589A1/en active Application Filing
- 2005-04-13 TW TW094111733A patent/TW200603486A/en unknown
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JPS5193393A (en) * | 1975-02-12 | 1976-08-16 | Erasuteitsuku kontakutoshiitonoseizohoho | |
JPS53147772A (en) * | 1977-05-31 | 1978-12-22 | Japan Synthetic Rubber Co Ltd | Manufacture of pressure-conductive elastomer |
JPS61250906A (en) * | 1985-04-26 | 1986-11-08 | ジェイエスアール株式会社 | Conductive elastomer sheet |
JPH11260518A (en) * | 1998-03-13 | 1999-09-24 | Jsr Corp | Manufacture of anisotropic conductive sheet and its manufacturing device |
JPH11283718A (en) * | 1998-03-27 | 1999-10-15 | Jsr Corp | Manufacture of and manufacturing device for anisotropic conductive sheet |
JP2000334742A (en) * | 1999-05-27 | 2000-12-05 | Jsr Corp | Mold, its manufacture, casting mold for manufacturing mold, and manufacture of anisotropic conductive sheet |
JP2002246428A (en) * | 2000-12-08 | 2002-08-30 | Jsr Corp | Anisotropic conductive sheet and wafer tester |
JP2004111930A (en) * | 2002-08-09 | 2004-04-08 | Jsr Corp | Anisotropically conductive connector, probe material member, wafer inspection apparatus, and wafer inspection method |
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US20210359434A1 (en) * | 2018-10-11 | 2021-11-18 | Sekisui Polymatech Co., Ltd. | Electrical connection sheet and terminal-equipped glass plate structure |
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Publication number | Publication date |
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TW200603486A (en) | 2006-01-16 |
KR20070010012A (en) | 2007-01-19 |
CN1943081A (en) | 2007-04-04 |
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