WO2005098358A2 - Rotations-drehratensensor mit mechanisch entkoppelten schwingungsmoden - Google Patents
Rotations-drehratensensor mit mechanisch entkoppelten schwingungsmoden Download PDFInfo
- Publication number
- WO2005098358A2 WO2005098358A2 PCT/EP2005/003670 EP2005003670W WO2005098358A2 WO 2005098358 A2 WO2005098358 A2 WO 2005098358A2 EP 2005003670 W EP2005003670 W EP 2005003670W WO 2005098358 A2 WO2005098358 A2 WO 2005098358A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vibration
- oscillation
- detection
- radial
- rotational
- Prior art date
Links
- 230000010355 oscillation Effects 0.000 title claims abstract description 88
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims description 89
- 230000005284 excitation Effects 0.000 claims description 40
- 238000013016 damping Methods 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5705—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
- G01C19/5712—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure
Definitions
- the present invention relates to a rotation rate sensor, in particular a micromechanical rotation rate sensor for detecting a rotary movement using the Coriolis force induced by this movement.
- Micromechanical rotation rate sensors are known. For some time now, they have been able to be built on a silicon wafer using classic etching techniques. They can comprise a first element arranged in an xy plane (primary oscillator, drive element), which is excited to an oscillating oscillation, and a second element, used for the detection (secondary oscillator, output element), which is connected to the first element via connecting links connected is.
- the Coriolis force acts with 2m v r xu on the mass points of the body in rotational oscillation; This force is transmitted to the detection element by suitable measures, such that it is deflected out of the xy plane.
- suitable means for example capacitive electrodes.
- EP 0906557 B1 describes a rotation rate sensor with decoupled orthogonal primary and secondary vibrations.
- the primary oscillator is fastened in the middle of the substrate via a primary oscillation suspension and holds a secondary oscillator located in the same plane and provided as a detection element via torsion springs, the torsion springs inducing the induced oscillation
- Vibration of the primary vibrator is rigidly transmitted to the secondary vibrator.
- the Coriolis force acts on both elements.
- the secondary oscillator is thereby tilted out of its plane, the primary oscillator remains in this plane because, on the one hand, it is anchored to the substrate in such a way that tilting out of this plane is not possible and, on the other hand, the torsion springs retransfer the r to the secondary oscillator prevent Coriolis force acting on the primary transducer.
- Vibration element which is excited to a radial vibration, arranged in a circle around a tiltable sensor element, which is attached to the substrate via two anchors.
- Torsion springs connect the vibration element to the sensor element, and these are designed such that they neither transmit the vibration of the vibration element to the sensor element nor transmit the tilting movement of the sensor element caused by Coriolis force back to the vibration element.
- the two aforementioned rotation rate sensors are designed in such a way that they are able to detect a rotary movement that is perpendicular to the axis of the excited rotary vibration.
- the detection of the rotary movement is therefore always carried out by deflecting the detection element out of the plane of the excitation vibration; the detection element tilts on one side in the direction of the substrate on which the structure of vibration and
- Detection element is anchored. If there are gas molecules between the substrate and the detection element, they can have a damping or distorting effect. It is therefore necessary that such rotation rate sensors are sealed in a well-evacuated housing.
- the vibration modes of the vibration element and the detection element of the aforementioned rotation rate sensors are not decoupled in the vibration plane of the vibration element. They are therefore not able to detect a rotary movement that takes place around the same axis in which the excitation element also vibrates.
- US Pat. No. 6,308,567 B1 proposes a rotation rate sensor in which two pairs of masses lying opposite one another are excited to a torsional vibration in the opposite direction to one another. Due to this vibration, of course, a radially outward centrifugal force acts on all these masses. If a rotational movement (to be detected) is impressed on this system from outside, the vector of the resulting Coriolis force acts radially outwards for one pair of masses and inwards for the other. The factually measured force of the one mass pair is then subtracted from that of the other mass pair by an arithmetic operation, whereby the centrifugal force is shortened from the overall equation, while the absolute values of the Coriolis force add up positively.
- the object of the present invention is to provide a rotation rate sensor which overcomes this disadvantage.
- VD, VD * excitation (drive) oscillation
- reference oscillation fo fo frequency of VD
- VD * f 1 resonance frequency of this oscillation system
- f2 is approximately equal to f1.
- fMD modulation frequency for recording the reference vibration
- fMS modulation frequency for recording the measurement vibration
- Figure 1 shows a schematic plan view of a specific embodiment of the rotation rate sensor according to the invention.
- FIG. Figure 3 shows schematically the structure of a rotation rate sensor according to the invention in section through an xz or yz plane and a possible manufacturing technique for such sensors.
- FIG. 4 shows how the resonance frequencies of reference oscillation f 1
- the frequency of the centrifugal force (2 x reference vibration) lies in the strongly damped range.
- the frequencies (1) and (2) can be set geometrically.
- Figure 5 shows a possible evaluation electronics for the invention
- Rotation rate sensor in a simplified form. This is a so-called high modulation method, which is often used in the evaluation of capacitive sensors.
- Two synchronous demodulators (combinations of multiplier / low-pass filter) extract the amplitude values of the desired frequency components (first those of the modulation signal fMS, then those of the excitation oscillation fo) step by step from the total signal.
- FIG. 6 shows a specific embodiment of a rotation rate sensor according to the invention in the rest position.
- FIG. 7 shows the sensor of FIG. 6 in the deflected position with respect to the applied rotational vibration according to a first embodiment of the invention.
- the position of the sensor shown in FIG. 9 results from the action of a rotary movement to be detected either on the rotationally vibrating sensor according to the first embodiment of the invention as shown in FIG. 7 or on the sensor vibrating in the radial direction according to the second embodiment of the invention as in FIG 8 shown.
- the rotation rate sensor according to the invention differs from the previously known rotation rate sensors in that it has one or more detection element (s) whose vibration mode is / are mechanically decoupled from the vibration mode of the vibration element (s), although both vibration element (s) and Swing the detection element (s) in the same plane.
- This decoupling is achieved by providing connecting elements between vibration element (s) and detection element (s), which on the one hand transmit rotational vibrations (excitation vibration v D , detection vibration vs) stiffly between the vibration element and the detection element, but on the other hand are designed so that a radial vibration of the vibration element or the detection element does not affect the each other element is transferred.
- These connecting elements can be designed as radially vibratable springs, the resonance frequency f2 of which is the same as the resonance frequency f 1 of the excitation vibration VD or the resonance frequency f1 * of the detection vibration vs. If the oscillation element is excited to a rotational oscillation, its oscillation mode acts on the detection element at twice the frequency due to the centrifugal force which is always directed radially outwards from the anchor point. If the oscillation element is excited to a radial oscillation, the detection element gets into a rotation oscillation due to the Coriolis force due to an external rotational movement of the sensor, and here the oscillation mode of the detection element acts on the oscillation element with twice the frequency for the same reason.
- the decoupling between the two oscillation modes results as follows: a) If the drive oscillation is a rotational oscillation, due to the fact that the rotation rate acts on the detection element in such a way that the Coriolis force causes it to be set into a radial oscillation with the frequency of the excitation oscillation fo; (The interference signal with the frequency 2 * f D , which is generated by the centrifugal force, can be separated from the useful signal with the frequency f, which is generated by the rotation rate-dependent Coriolis force, using suitable filter electronics; e.g.
- the drive oscillation is a radial oscillation, in that the rotation rate acts on the detection element in such a way that the Coriolis force causes it to be set into a rotational oscillation which has the same frequency as the excitation oscillation fo *;
- the interference signal can be separated from the excitation vibration as described under a)) or c) by operating the arrangement in such a way (e.g. under vacuum) that mechanical, radial vibrations with frequencies beyond the resonance frequency of the excitation vibration, such as the interference signal the frequency 2 * fo, are strongly attenuated; or d) by a combination of a) and c) or e) by a combination of b) and c).
- FIG. 3 schematically shows how the yaw rate sensors according to the invention can be constructed on average through an x-z or y-z axis and how they can be manufactured.
- the structure shown is particularly favorable, since it is formed from only a few components and enables an integral structure of armature, vibration element, connecting elements (springs) and detection elements: a substrate, e.g. a silicon wafer, is covered with a structured sacrificial layer, e.g. an oxide that can be redissolved with a suitable solvent.
- a structurable layer of a material, e.g. Polysilicon applied, from which the vibration element, the anchor structure, the connecting elements and the detection elements are to be formed (Fig. 3a).
- the structurable layer is connected directly to the substrate at the location of the later anchor. It can only be two-dimensional, e.g. be structured by suitable measures such as exposure through a shadow mask and subsequent removal of the unexposed, non-crosslinked areas (FIG. 3b). The sacrificial layer is then dissolved and removed.
- the rotation rate sensor according to the invention can be operated in various ways.
- at least one oscillation element can be excited to a rotation oscillation, and the Coriolis force occurring during a rotational movement of the sensor is measured as a radial oscillation.
- the centrifugal force caused by the excitation oscillation does not interfere with the measurement.
- at least one oscillation element can be excited to produce a radial oscillation, and in this case the Coriolis force that occurs when the sensor rotates is detected as a rotational oscillation.
- the occurrence of centrifugal force (caused by the rotational vibration) does not directly affect the detection of the Coriolis force, care must be taken here that the centrifugal force does not disturb the radial excitation vibration.
- rotation rate sensor can have the same design for both variants, the individual parts function differently. Therefore, both variants will be described below with reference to figures in which the same parts are identified with the same reference numerals. Because of the different Functions of these parts are named differently in the corresponding explanations.
- FIGS 1 and 6 show two embodiments of the rotation rate sensor according to the invention, which can be operated in the two ways described.
- the sensor has a vibration element 1, which physically represents a freely moving mass.
- the shape of this element can be chosen freely depending on the other spatial conditions of the sensor structure.
- the vibration element is connected to the base or substrate via a central anchor structure 3, which is provided with springs in the illustrated embodiments.
- the number of springs is four in all examples; however, it should be clear that a different number of springs can also be used.
- Masses 5, which function as detection elements, are fastened to the vibration element 1 via connecting elements 4 designed as springs.
- the configuration of the connecting elements as springs is exemplary, as is the number of springs and the associated detection elements.
- FIG. 6 shows a mirror-symmetrical embodiment variant with two detection elements, each of which is arranged in a recess of the vibration element via two springs.
- Capacitive electrodes or the like e.g. designed as interdigital structures that
- Vibrating elements (reference number 6 in the first variant) and measure their position (reference number 7 in the first variant), and the radial position of the detection element is detected by electrode structures (reference numbers 8 and 9 in the first variant), which are also e.g. can be interdigital electrodes.
- the vibration element 1 is set into a rotational vibration, ie excitation vibration VD with a constant frequency (fo) and amplitude around the anchor point (the z-axis) and parallel to the substrate plane (xy plane) (see FIG. 7).
- the excitation of the rotational oscillation can take place according to known methods and using known elements, for example by attaching interdigital structures to which an AC voltage with the frequency fo is applied. In principle, such structures are already used in other micro rotation rate sensors, see, for example, the two publications mentioned above. Such structures can also be used to record the rotational vibration for monitoring purposes.
- the detection elements 5 Since the springs 4 are stiff with respect to the rotational vibration, the detection elements 5 connected to them follow this vibration with the same frequency. Spin accelerations do not cause any bending vibration in the direction of rotation. Due to the oscillating rotation, the detection elements 5 are exposed to a centrifugal acceleration a z , which is directed radially outwards with each half-wave of the rotational vibration. The masses are thus excited with a centrifugal force F z (see FIG. 2) whose frequency f z is twice as great as the resonance frequency of the rotary oscillation. f z is therefore equal to 2xf D (indicated by the double arrow).
- the springs 4 between the vibration element and the detection elements are designed in such a way that a radial vibration that occurs with respect to the anchor element 3 through the detection elements 5 has the same resonance frequency f 2 as the rotational vibration of the vibration element 1 (ie f
- f 2 ).
- the Coriolis force F c acting on the detection elements 5 excites them to a radially directed vibration (see FIG. 9).
- the rate of rotation is modulated in the amplitude of this vibration.
- a radial vibration is impressed on the sensors, as shown in the sequence of figures 6, 8 and 9. Accordingly, the elements have different functions:
- the element 1, which functions as a vibration element in the first operating mode, is in this way a detection element, the rotational vibration of which is detected via the interdigital structures 6, 7.
- the elements 5, which function as detection elements in the first mode of operation, are provided as vibration elements in the second mode of operation, which are excited with the aid of the excitation electrodes 8 to produce a radial vibration which is monitored via the electrodes 9.
- the detection element is connected to the base or substrate via the central anchor structure 3 and the springs 2.
- the springs 4 connect the excitation elements 5 to the detection element 6.
- the vibration elements 5 are set into a radial excitation vibration VD * with constant frequency (fo *) and amplitude in any direction parallel to the substrate plane (x-y plane) (see FIG. 8).
- Radial vibration can be carried out using the same methods and using the same elements, as described above for the first operating mode.
- FIGS. 6 and 8 these are elements 8 and 9.
- Rotational vibration is directed radially outwards.
- the masses of the excitation element are thus excited with a centrifugal force F z , the frequency f z of which is twice as great as the resonance frequency of the rotational vibration.
- f z is 2xf D here .
- the detection of the radial vibration (s) of the detection element (s) can be carried out according to known methods, for example capacitively via interdigital structures.
- connection elements can also be realized by structures other than the springs described here, provided that they have the functional features described above.
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- General Physics & Mathematics (AREA)
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Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/578,024 US7520169B2 (en) | 2004-04-08 | 2005-04-07 | Angular rate sensor featuring mechanically decoupled oscillation modes |
EP05716556A EP1735589A2 (de) | 2004-04-08 | 2005-04-07 | Rotations-drehratensensor mit mechanisch entkoppelten schwingungsmoden |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004017480A DE102004017480B4 (de) | 2004-04-08 | 2004-04-08 | Rotations-Drehratensensor mit mechanisch entkoppelten Schwingungsmoden |
DE102004017480.6 | 2004-04-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005098358A2 true WO2005098358A2 (de) | 2005-10-20 |
WO2005098358A3 WO2005098358A3 (de) | 2005-12-22 |
Family
ID=34963203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2005/003670 WO2005098358A2 (de) | 2004-04-08 | 2005-04-07 | Rotations-drehratensensor mit mechanisch entkoppelten schwingungsmoden |
Country Status (4)
Country | Link |
---|---|
US (1) | US7520169B2 (de) |
EP (1) | EP1735589A2 (de) |
DE (1) | DE102004017480B4 (de) |
WO (1) | WO2005098358A2 (de) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007271611A (ja) * | 2006-03-10 | 2007-10-18 | Stmicroelectronics Srl | 回転駆動運動を用いる微小電気機械集積センサ構造 |
WO2008043831A1 (de) * | 2006-10-12 | 2008-04-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Sensor zur erfassung von beschleunigungen |
WO2009156485A1 (de) * | 2008-06-27 | 2009-12-30 | Sensordynamics Ag | Mikro-gyroskop |
DE102012224081A1 (de) * | 2012-12-20 | 2014-06-26 | Continental Teves Ag & Co. Ohg | Sensor zum Erfassen einer Drehrate eines Objektes |
WO2020075437A1 (ja) | 2018-10-12 | 2020-04-16 | ソニー株式会社 | 支持構造および表示装置 |
Families Citing this family (16)
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DE102007057042A1 (de) * | 2007-09-10 | 2009-03-12 | Continental Teves Ag & Co. Ohg | Mikromechanischer Drehratensensor mit Kopplungsbalken und Aufhängungs-Federelementen zur Unterdrückung der Quadratur |
US8042396B2 (en) | 2007-09-11 | 2011-10-25 | Stmicroelectronics S.R.L. | Microelectromechanical sensor with improved mechanical decoupling of sensing and driving modes |
DE102008008237B4 (de) | 2008-02-08 | 2021-06-02 | Volkswagen Ag | Verfahren und System zur Erfassung der Drehbewegung eines Fahrzeugrades |
DE102008041757B4 (de) * | 2008-09-02 | 2019-01-03 | Robert Bosch Gmbh | Herstellungsverfahren für eine Rotationssensorvorrichtung und Rotationssensorvorrichtung |
DE102009001244A1 (de) * | 2009-02-27 | 2010-09-02 | Sensordynamics Ag | Mikro-Gyroskop zur Ermittlung von Rotationsbewegungen um eine x-, y- oder z-Achse |
DE102009001248B4 (de) * | 2009-02-27 | 2020-12-17 | Hanking Electronics, Ltd. | MEMS-Gyroskop zur Ermittlung von Rotationsbewegungen um eine x-, y- oder z-Achse |
DE102009002066A1 (de) * | 2009-03-31 | 2010-10-07 | Sensordynamics Ag | Verfahren zum Erfassen von Beschleunigungen und Drehraten sowie MEMS-Sensor |
US9097524B2 (en) | 2009-09-11 | 2015-08-04 | Invensense, Inc. | MEMS device with improved spring system |
US8534127B2 (en) * | 2009-09-11 | 2013-09-17 | Invensense, Inc. | Extension-mode angular velocity sensor |
JP6575129B2 (ja) | 2014-06-12 | 2019-09-18 | 株式会社デンソー | 振動型角速度センサ |
US9910061B2 (en) | 2014-06-26 | 2018-03-06 | Lumedyne Technologies Incorporated | Systems and methods for extracting system parameters from nonlinear periodic signals from sensors |
TWI676029B (zh) | 2015-05-20 | 2019-11-01 | 美商路梅戴尼科技公司 | 用於決定慣性參數之方法及系統 |
US20180031602A1 (en) * | 2016-07-27 | 2018-02-01 | Lumedyne Technologies Incorporated | Converting rotational motion to linear motion |
US10234477B2 (en) | 2016-07-27 | 2019-03-19 | Google Llc | Composite vibratory in-plane accelerometer |
JP6903610B2 (ja) * | 2018-08-27 | 2021-07-14 | 株式会社東芝 | 共振器およびそれを含む装置 |
CN112682054B (zh) * | 2020-12-03 | 2022-08-23 | 重庆文理学院 | 一种用于tbm施工监测的挖掘设备及其勘测方法 |
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- 2005-04-07 EP EP05716556A patent/EP1735589A2/de not_active Withdrawn
- 2005-04-07 US US11/578,024 patent/US7520169B2/en not_active Expired - Fee Related
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007271611A (ja) * | 2006-03-10 | 2007-10-18 | Stmicroelectronics Srl | 回転駆動運動を用いる微小電気機械集積センサ構造 |
WO2008043831A1 (de) * | 2006-10-12 | 2008-04-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Sensor zur erfassung von beschleunigungen |
US8549921B2 (en) | 2006-10-12 | 2013-10-08 | Fraunhofer-Gesellschaft Zur Foererung Der Angewandten Forschung E.V. | Sensor for detecting acceleration |
WO2009156485A1 (de) * | 2008-06-27 | 2009-12-30 | Sensordynamics Ag | Mikro-gyroskop |
DE102012224081A1 (de) * | 2012-12-20 | 2014-06-26 | Continental Teves Ag & Co. Ohg | Sensor zum Erfassen einer Drehrate eines Objektes |
US9689675B2 (en) | 2012-12-20 | 2017-06-27 | Continental Teves Ag & Co. Ohg | Sensor for detecting a rotation rate of an object |
WO2020075437A1 (ja) | 2018-10-12 | 2020-04-16 | ソニー株式会社 | 支持構造および表示装置 |
US11525540B2 (en) | 2018-10-12 | 2022-12-13 | Sony Group Corporation | Supporting structure and display apparatus |
Also Published As
Publication number | Publication date |
---|---|
US20070194857A1 (en) | 2007-08-23 |
DE102004017480B4 (de) | 2009-04-16 |
DE102004017480A1 (de) | 2005-10-27 |
EP1735589A2 (de) | 2006-12-27 |
WO2005098358A3 (de) | 2005-12-22 |
US7520169B2 (en) | 2009-04-21 |
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