WO2005043593A8 - System for processing a workpiece - Google Patents
System for processing a workpieceInfo
- Publication number
- WO2005043593A8 WO2005043593A8 PCT/US2004/034895 US2004034895W WO2005043593A8 WO 2005043593 A8 WO2005043593 A8 WO 2005043593A8 US 2004034895 W US2004034895 W US 2004034895W WO 2005043593 A8 WO2005043593 A8 WO 2005043593A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- workpiece
- processing
- base
- rotor
- process chamber
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006536790A JP4685022B2 (en) | 2003-10-21 | 2004-10-21 | System for processing workpieces |
EP04795977A EP1676312A2 (en) | 2003-10-21 | 2004-10-21 | System for processing a workpiece |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/690,864 | 2003-10-21 | ||
US10/690,864 US6930046B2 (en) | 1999-01-22 | 2003-10-21 | Single workpiece processing system |
US10/693,668 | 2003-10-24 | ||
US10/693,668 US6969682B2 (en) | 1999-01-22 | 2003-10-24 | Single workpiece processing system |
US10/867,458 | 2004-06-14 | ||
US10/867,458 US7217325B2 (en) | 1999-01-22 | 2004-06-14 | System for processing a workpiece |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2005043593A2 WO2005043593A2 (en) | 2005-05-12 |
WO2005043593A8 true WO2005043593A8 (en) | 2006-06-22 |
WO2005043593A3 WO2005043593A3 (en) | 2006-08-10 |
Family
ID=34557426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/034895 WO2005043593A2 (en) | 2003-10-21 | 2004-10-21 | System for processing a workpiece |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1676312A2 (en) |
JP (1) | JP4685022B2 (en) |
KR (1) | KR20060123174A (en) |
TW (1) | TWI355676B (en) |
WO (1) | WO2005043593A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9309604B2 (en) | 2008-11-07 | 2016-04-12 | Novellus Systems, Inc. | Method and apparatus for electroplating |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9822461B2 (en) | 2006-08-16 | 2017-11-21 | Novellus Systems, Inc. | Dynamic current distribution control apparatus and method for wafer electroplating |
TWI550139B (en) | 2011-04-04 | 2016-09-21 | 諾菲勒斯系統公司 | Electroplating apparatus for tailored uniformity profile |
US9909228B2 (en) | 2012-11-27 | 2018-03-06 | Lam Research Corporation | Method and apparatus for dynamic current distribution control during electroplating |
US9670588B2 (en) | 2013-05-01 | 2017-06-06 | Lam Research Corporation | Anisotropic high resistance ionic current source (AHRICS) |
US9752248B2 (en) | 2014-12-19 | 2017-09-05 | Lam Research Corporation | Methods and apparatuses for dynamically tunable wafer-edge electroplating |
US9567685B2 (en) | 2015-01-22 | 2017-02-14 | Lam Research Corporation | Apparatus and method for dynamic control of plated uniformity with the use of remote electric current |
US9816194B2 (en) | 2015-03-19 | 2017-11-14 | Lam Research Corporation | Control of electrolyte flow dynamics for uniform electroplating |
US10014170B2 (en) | 2015-05-14 | 2018-07-03 | Lam Research Corporation | Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09232269A (en) * | 1996-02-22 | 1997-09-05 | Dainippon Screen Mfg Co Ltd | Rotary substrate treatment device |
JP3555724B2 (en) * | 1997-09-04 | 2004-08-18 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JP3133735B2 (en) * | 1999-02-08 | 2001-02-13 | 大日本スクリーン製造株式会社 | Rotary coating device |
DE19906398B4 (en) * | 1999-02-16 | 2004-04-29 | Steag Hamatech Ag | Method and device for treating substrates |
US6213855B1 (en) * | 1999-07-26 | 2001-04-10 | Speedfam-Ipec Corporation | Self-powered carrier for polishing or planarizing wafers |
JP4369022B2 (en) * | 2000-06-21 | 2009-11-18 | 芝浦メカトロニクス株式会社 | Spin processing equipment |
JP2002164314A (en) * | 2000-11-27 | 2002-06-07 | Dainippon Screen Mfg Co Ltd | Rotary support plate and substrate treatment apparatus using the rotary support plate |
JP2002368066A (en) * | 2001-06-06 | 2002-12-20 | Tokyo Electron Ltd | Processing device |
US6899765B2 (en) * | 2002-03-29 | 2005-05-31 | Applied Materials Israel, Ltd. | Chamber elements defining a movable internal chamber |
US7306728B2 (en) * | 2004-03-23 | 2007-12-11 | Zenergy International Limited | Rotor and methods of use |
-
2004
- 2004-10-21 JP JP2006536790A patent/JP4685022B2/en not_active Expired - Fee Related
- 2004-10-21 TW TW093132009A patent/TWI355676B/en not_active IP Right Cessation
- 2004-10-21 KR KR1020067009785A patent/KR20060123174A/en not_active Application Discontinuation
- 2004-10-21 EP EP04795977A patent/EP1676312A2/en not_active Withdrawn
- 2004-10-21 WO PCT/US2004/034895 patent/WO2005043593A2/en active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9309604B2 (en) | 2008-11-07 | 2016-04-12 | Novellus Systems, Inc. | Method and apparatus for electroplating |
Also Published As
Publication number | Publication date |
---|---|
TW200523992A (en) | 2005-07-16 |
EP1676312A2 (en) | 2006-07-05 |
TWI355676B (en) | 2012-01-01 |
WO2005043593A2 (en) | 2005-05-12 |
WO2005043593A3 (en) | 2006-08-10 |
JP4685022B2 (en) | 2011-05-18 |
JP2007535126A (en) | 2007-11-29 |
KR20060123174A (en) | 2006-12-01 |
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