WO2005040890A3 - Catadioptric projection objective with real intermediate images - Google Patents

Catadioptric projection objective with real intermediate images Download PDF

Info

Publication number
WO2005040890A3
WO2005040890A3 PCT/EP2004/011587 EP2004011587W WO2005040890A3 WO 2005040890 A3 WO2005040890 A3 WO 2005040890A3 EP 2004011587 W EP2004011587 W EP 2004011587W WO 2005040890 A3 WO2005040890 A3 WO 2005040890A3
Authority
WO
WIPO (PCT)
Prior art keywords
real intermediate
projection objective
objective
catadioptric projection
intermediate images
Prior art date
Application number
PCT/EP2004/011587
Other languages
French (fr)
Other versions
WO2005040890A2 (en
Inventor
David Shafer
Aurelian Dodoc
Alexander Epple
Wilhelm Ulrich
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
David Shafer
Aurelian Dodoc
Alexander Epple
Wilhelm Ulrich
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, David Shafer, Aurelian Dodoc, Alexander Epple, Wilhelm Ulrich, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Priority to US10/576,265 priority Critical patent/US7697198B2/en
Priority to JP2006534694A priority patent/JP2007508591A/en
Publication of WO2005040890A2 publication Critical patent/WO2005040890A2/en
Publication of WO2005040890A3 publication Critical patent/WO2005040890A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Stereoscopic And Panoramic Photography (AREA)

Abstract

A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
PCT/EP2004/011587 2003-10-17 2004-10-15 Catadioptric projection objective with real intermediate images WO2005040890A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/576,265 US7697198B2 (en) 2004-10-15 2004-10-15 Catadioptric projection objective
JP2006534694A JP2007508591A (en) 2003-10-17 2004-10-15 Catadioptric projection objective

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US51167303P 2003-10-17 2003-10-17
US60/511,673 2003-10-17

Publications (2)

Publication Number Publication Date
WO2005040890A2 WO2005040890A2 (en) 2005-05-06
WO2005040890A3 true WO2005040890A3 (en) 2005-06-30

Family

ID=34520032

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/011587 WO2005040890A2 (en) 2003-10-17 2004-10-15 Catadioptric projection objective with real intermediate images

Country Status (2)

Country Link
JP (1) JP2007508591A (en)
WO (1) WO2005040890A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (en) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Objective lens for microlithography projection with crystal elements
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
EP1746463A2 (en) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Method for correcting a lithographic projection objective and projection objective of such a kind
WO2007025643A1 (en) 2005-08-30 2007-03-08 Carl Zeiss Smt Ag High-na projection objective with aspheric lens surfaces
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
EP1852745A1 (en) 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
WO2008080534A1 (en) 2006-12-28 2008-07-10 Carl Zeiss Smt Ag Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
US7760425B2 (en) 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
US8705170B2 (en) 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
JP6028350B2 (en) * 2012-03-16 2016-11-16 株式会社ニコン Substrate processing apparatus, device manufacturing system, and device manufacturing method
TW201514541A (en) * 2013-09-19 2015-04-16 尼康股份有限公司 Projection optical system, adjusting method thereof, exposing device and method, and device manufacturing method
WO2016056148A1 (en) * 2014-10-08 2016-04-14 オリンパス株式会社 Image-forming optical system, illumination device, and observation device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3130239A1 (en) * 1980-11-03 1982-06-16 Jenoptik Jena Gmbh, Ddr 6900 Jena Device for retinal photography

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4780364B2 (en) * 2001-06-14 2011-09-28 株式会社ニコン Catadioptric optical system and exposure apparatus provided with the optical system
JP2005107362A (en) * 2003-10-01 2005-04-21 Canon Inc Projection optical system, aligner and manufacturing method of device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3130239A1 (en) * 1980-11-03 1982-06-16 Jenoptik Jena Gmbh, Ddr 6900 Jena Device for retinal photography

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images

Also Published As

Publication number Publication date
JP2007508591A (en) 2007-04-05
WO2005040890A2 (en) 2005-05-06

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