TW201514541A - Projection optical system, adjusting method thereof, exposing device and method, and device manufacturing method - Google Patents

Abstract

A purpose of the invention is to provide a projection optical system, which can adjust wavefront aberration generated due to, for example, light illumination. The projection optical system forms an image of a first surface on a second surface. The projection optical system includes: a first imaging optical unit disposed in an optical path between the first surface and the second surface, and including a first concave reflective mirror having a transformative reflective surface; and a second imaging optical unit disposed in an optical path between the first imaging optical unit and the second surface, and including a second concave reflective mirror having a transformative reflective surface.

Description

Projection optical system, adjustment method of projection optical system, exposure apparatus, exposure method, and component manufacturing method

The present invention relates to a projection optical system, an adjustment method of a projection optical system, an exposure apparatus, an exposure method, and a device manufacturing method.

In a photolithography step for manufacturing an element such as a semiconductor device, an exposure device is used which projects a pattern of a mask (reticle) via a projection optical system Exposure to a photosensitive substrate (wafer coated with a photo resist, etc.). In the exposure apparatus, as the mask pattern is advanced, the resolution (resolution) required for the projection optical system is increasing. In order to satisfy the requirements for the resolution of the projection optical system, it is necessary to shorten the wavelength λ of the illumination light (exposure light) and increase the image side numerical aperture NA of the projection optical system.

Therefore, there is known a liquid immersion technique in which a medium having a high refractive index is filled into an optical path between a projection optical system and a photosensitive substrate. The numerical aperture of the image side is increased. In general, in a projection optical system having a large numerical aperture on the image side, it is not limited to a liquid immersion system, and even in a drying system, in consideration of the fact that the Petzval condition is established to obtain flatness of an image, It is also desirable to use a catadioptric optical system. Conventionally, various types of catadioptric optical systems suitable for a projection optical system of an exposure apparatus have been proposed (for example, see Patent Document 1).

Prior art literature

Patent literature

[Patent Document 1] U.S. Patent No. 7,301,605

In the projection optical system mounted in the exposure apparatus, the optical characteristics are affected by the irradiation energy of the light passing through the optical system during exposure. Specifically, the optical surface of the lens changes due to light irradiation, or the refractive index distribution of the lens changes. Further, the interval of the lens changes due to deformation of the lens barrel due to light irradiation or the like, or the density distribution (refractive index distribution) of the environment changes due to light irradiation. The variation in optical characteristics deteriorates the wavefront aberration of the projection optical system, and even the imaging performance such as the resolution of the projection optical system is degraded.

The present invention has been made in view of the above problems, and an object thereof is to provide a projection optical system having, for example, high imaging performance. Further, an object of the present invention is to provide an exposure apparatus capable of projecting and exposing a fine pattern onto a photosensitive substrate with high precision using a projection optical system having high imaging performance.

In order to solve the above-described problems, in a first aspect, a projection optical system is provided, wherein an image of a first surface is formed on a second surface, and the first imaging optical portion is disposed on the first surface and the first surface The optical path between the second surfaces includes a first concave mirror to form an intermediate image of the first surface, and a second imaging optical portion disposed in the first imaging optical unit and the first The optical path between the two faces includes a second concave mirror to form an image of the intermediate image, and at least one of the first concave mirror and the second concave mirror has a deformable reflective surface . According to a second aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical unit is disposed between the first surface and the second surface And a first concave mirror including a deformable reflecting surface; and a second imaging optical unit disposed in the optical path between the first imaging optical unit and the second surface, and including The second concave mirror of the deformable reflecting surface.

According to a third aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical unit is disposed between the first surface and the second surface The optical path includes a first concave mirror, and mutually different surfaces are optically conjugated; and the second imaging optical unit is disposed in the first imaging optical unit and the second The optical path between the surfaces includes a second concave mirror, and the mutually different surfaces are optically conjugated, and the first concave mirror is disposed in the optical path of the first imaging optical unit. The position of the first surface is optically in a first pupil position of the Fourier transform relationship to the first surface side, and the second concave mirror is disposed in the optical path of the second imaging optical unit and the The position of the first surface is optically in the second pupil position of the Fourier transform relationship to the second surface side.

According to a fourth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical unit is disposed between the first surface and the second surface The optical path includes a first concave mirror, and mutually different surfaces are optically conjugated; and the second imaging optical unit is disposed between the first imaging optical unit and the second surface The optical path between the second concave mirror includes a second concave mirror, and the mutually different surfaces are optically conjugated, and the first concave mirror is disposed in the optical path of the first imaging optical unit and The position of the first surface is optically in the first pupil position of the Fourier transform relationship to the second surface side, and the second concave mirror is disposed in the optical path of the second imaging optical unit and the first surface The position of the surface is optically in the second pupil position of the Fourier transform relationship to the first surface side.

According to a fifth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical unit is disposed between the first surface and the second surface The optical path includes a first concave mirror, and mutually different surfaces are optically conjugated; and the second imaging optical unit is disposed between the first imaging optical unit and the second surface The optical path between the second concave mirror includes a second concave mirror, and the mutually different surfaces are optically conjugated, and the first concave mirror is disposed in the optical path of the first imaging optical unit and The position of the first surface is optically in the first pupil position of the Fourier transform relationship, and the second concave mirror is disposed in the optical path of the second imaging optical unit and is optically positioned at the position of the first surface The second pupil position of the Fourier transform relationship is on the first surface side or the second surface side.

According to a sixth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical unit is disposed between the first surface and the second surface The optical path includes a first concave mirror, and mutually different surfaces are optically conjugated; the second imaging optical unit is disposed between the first imaging optical unit and the second surface The optical path includes a second concave mirror, and the mutually different surfaces are optically conjugated. The first concave mirror is disposed in a first pupil position of the optical path of the first imaging optical unit that is optically Fourier-transformed to a position of the first surface to the first surface side or the On the second surface side, the second concave mirror is disposed at a second pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the second imaging optical unit.

According to a seventh aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical unit is disposed between the first surface and the second surface The optical path includes a first concave mirror, and mutually different surfaces are optically conjugated; the second imaging optical unit is disposed between the first imaging optical unit and the second surface The optical path includes a second concave mirror, and the mutually different surfaces are optically conjugated, and the first concave mirror is disposed in the optical path of the first imaging optical unit and the first The position of one surface is optically in the first pupil position of the Fourier transform relationship, and the position of the second concave mirror disposed in the optical path of the second imaging optical unit and the position of the first surface is optically Fourier The second pupil position of the transformation relationship.

According to an eighth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the method includes the following: The first imaging optical system is configured such that a first intermediate image of the first surface is formed in an optical path between the first surface and the second surface, and a second imaging optical system is disposed in the first imaging The optical path between the optical system and the second surface includes a first concave mirror to form a second intermediate image which is an image of the first intermediate image, and a third imaging optical system is disposed in the second imaging optical The optical path between the system and the second surface includes a second concave mirror, a third intermediate image that forms an image of the second intermediate image, and a fourth imaging optical system that is disposed in the third imaging optical An image of the third intermediate image is formed on the second surface of the optical path between the system and the second surface, and the second imaging optical system includes the first intermediate image and the first concave surface A plurality of positive lenses in the optical path between the mirrors, the third imaging optical system including a plurality of positive lenses disposed in an optical path between the second intermediate image and the second concave mirror.

According to a ninth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical system is disposed between the first surface and the second surface The first intermediate image of the first surface is formed in the optical path, and the second imaging optical system includes a first concave mirror disposed in the optical path between the first imaging optical system and the second surface. a second intermediate image that forms an image of the first intermediate image; and a third imaging optical system that is disposed in the second imaging optical system and the second image The optical path between the surfaces includes a second concave mirror to form a third intermediate image which is an image of the second intermediate image, and a fourth imaging optical system that is disposed in the third imaging optical system and the second In the optical path between the surfaces, the image of the third intermediate image is formed on the second surface, and the fourth imaging optical system includes a positive lens disposed on the side closest to the third intermediate image and The convex surface faces the second surface side.

According to a tenth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical system is disposed between the first surface and the second surface The first intermediate image of the first surface is formed in the optical path, and the second imaging optical system includes a first concave mirror disposed in the optical path between the first imaging optical system and the second surface. a second intermediate image that forms an image of the first intermediate image, and a third imaging optical system that is disposed between the optical path between the second imaging optical system and the second surface, and includes a second concave mirror. The third intermediate image which is the image of the second intermediate image, and the fourth imaging optical system are disposed in the optical path between the third imaging optical system and the second surface, and the second surface is formed on the second surface In the image of the third intermediate image, the second imaging optical system includes a positive meniscus lens, and the positive meniscus lens is disposed on the side closest to the first intermediate image and has a convex surface facing the first intermediate image side.

According to an eleventh aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and is characterized by comprising: The first imaging optical system is configured such that a first intermediate image of the first surface is formed in an optical path between the first surface and the second surface, and a second imaging optical system is disposed in the first imaging The optical path between the optical system and the second surface includes a first concave mirror to form a second intermediate image which is an image of the first intermediate image, and a third imaging optical system is disposed in the second imaging optical The optical path between the system and the second surface includes a second concave mirror, a third intermediate image that forms an image of the second intermediate image, and a fourth imaging optical system that is disposed in the third imaging optical In the optical path between the system and the second surface, an image of the third intermediate image is formed on the second surface, the second imaging optical system includes a lens, and the lens is disposed in the first middle The image side is disposed adjacent to the first concave mirror.

According to a twelfth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical system is disposed between the first surface and the second surface The first intermediate image of the first surface is formed in the optical path, and the second imaging optical system includes a first concave mirror disposed in the optical path between the first imaging optical system and the second surface. a second intermediate image that forms an image of the first intermediate image, and a third imaging optical system that is disposed between the optical path between the second imaging optical system and the second surface, and includes a second concave mirror. a third intermediate image that is an image of the second intermediate image; The fourth imaging optical system is disposed in an optical path between the third imaging optical system and the second surface, and forms an image of the third intermediate image on the second surface, wherein the second imaging optical system includes In the positive meniscus lens, the positive meniscus lens is disposed on the side closest to the first intermediate image, and the convex surface faces the first intermediate image side.

According to a thirteenth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical system is disposed between the first surface and the second surface The first intermediate image of the first surface is formed in the optical path, and the second imaging optical system includes a first concave mirror disposed in the optical path between the first imaging optical system and the second surface. a second intermediate image that forms an image of the first intermediate image, and a third imaging optical system that is disposed between the optical path between the second imaging optical system and the second surface, and includes a second concave mirror. The third intermediate image which is the image of the second intermediate image, and the fourth imaging optical system are disposed in the optical path between the third imaging optical system and the second surface, and the second surface is formed on the second surface In the image of the third intermediate image, the second imaging optical system includes a lens disposed on the side closest to the first intermediate image and disposed adjacent to the first concave mirror.

According to a fourteenth aspect, a projection optical system is provided, wherein the image of the first surface is formed on the second surface, and the first imaging optical system is disposed between the first surface and the second surface Forming a first intermediate image of the first surface in the optical path; The second imaging optical system includes a first concave mirror disposed in an optical path between the first imaging optical system and the second surface, and forms a second intermediate image which is an image of the first intermediate image; The imaging optical system includes an optical path between the second imaging optical system and the second surface, and includes a second concave mirror, and forms a third intermediate image which is an image of the second intermediate image; The imaging optical system is disposed in an optical path between the third imaging optical system and the second surface, and forms an image of the third intermediate image on the second surface; and the first deflecting mirror is disposed in the first 1 in an optical path between the imaging optical system and the second imaging optical system; and a second deflecting mirror disposed between the third imaging optical system and the fourth imaging optical system.

According to a fifteenth aspect, the adjustment method of the projection optical system according to any one of the first aspect to the seventh aspect, wherein the adjustment method includes the step of: for the first concave mirror The reflection surface and the reflection surface of the second concave mirror are provided with distortions displayed by the same function, thereby adjusting the wavefront aberration of the projection optical system.

According to a sixteenth aspect, there is provided an exposure apparatus according to any one of the first aspect to the fourteenth aspect, wherein the projection optical system is based on light from a predetermined pattern provided on the first surface. The predetermined pattern is projected onto a substrate provided on the second surface.

In a seventeenth aspect, there is provided an exposure method characterized by comprising a step of: guiding the light from the predetermined pattern provided on the first surface to the projection optical system to project the predetermined pattern onto the substrate provided on the second surface; and using the adjustment method of the fifteenth aspect To adjust the projection optical system.

According to a thirteenth aspect, a method of manufacturing a device, comprising: exposing the predetermined pattern to the substrate using an exposure apparatus of a sixteenth aspect or an exposure method of a seventeenth aspect; The substrate of the predetermined pattern is developed to form a mask layer having a shape corresponding to the predetermined pattern on a surface of the substrate; and the surface of the substrate is processed via the mask layer.

1‧‧‧Lighting optical system

9‧‧‧Z stage

10‧‧‧XY stage

11‧‧‧Base

12m, 12w‧‧‧ moving mirror

13m‧‧‧mask laser interferometer

13w‧‧‧Watt laser interferometer

14‧‧‧Main control system

15‧‧‧ Wafer Stage Drive System

21‧‧‧Water supply and drainage mechanism

A‧‧‧ distance

AC‧‧‧ actuator

ACa‧‧‧ points of action

AD‧‧‧Active deformation department

AS‧‧‧ aperture diaphragm

AX‧‧‧ optical axis

CM1, CM2‧‧‧ concave mirror

CM1a, CM2a‧‧‧ reflective surface

ER‧‧‧effective imaging area

ERa‧‧‧ central location

ERb‧‧‧1st surrounding location

ERc‧‧‧2nd surrounding location

FR‧‧‧effective field of view

FRa‧‧‧ Center Point

FRb‧‧‧The highest point of interest

FM1, FM2‧‧‧ plane mirror

G1, G2‧‧‧ indicators

IF‧‧‧like field

IL‧‧‧Exposure light (exposure beam)

IM‧‧‧face

K1, K2, K3, K4‧‧‧ imaging optical unit

L11~L114, L21~L23, L31~L33, L41~L413, L415‧‧ lens

L414, L416‧‧‧ Plano-convex lens

Lb‧‧‧ boundary lens

Lm‧‧‧Liquid

LX, LY‧‧ size

M‧‧‧ mask

MD1, MD2‧‧‧ Correction Mechanism

MST‧‧‧mask stage

OB‧‧‧ object surface

P1‧‧‧ parallel flat panel

PL‧‧‧Projection Optical System

PG‧‧‧ round

PP‧‧‧Light position

PSa, PSb‧‧‧ local points

Ra‧‧‧ Axial amount of still exposure area

Rb‧‧‧ radius of the image circle on the wafer

RCa, RCb‧‧‧ rectangle

Center position of RCac, RCbc‧‧‧ rectangle

Re‧‧‧ Radius

S40~S48, S50~S56‧‧‧ steps

W‧‧‧ wafer

WH‧‧‧Wafer Holder

Z05, Z10, Z12, Z17, Z26, Z28‧‧‧ aberration components

X, Y, Z‧‧ Direction

Fig. 1 is a view schematically showing a configuration of a projection optical system according to an embodiment of the present invention.

Fig. 2 is a view schematically showing an effective imaging area on the image plane of the projection optical system.

3 is a view schematically showing an effective field of view area on an object surface of a projection optical system.

4 is a view schematically showing an active deformation portion including a plurality of actuators provided on the back side of the concave mirror.

Fig. 5 is a view schematically showing a distribution of points of action of a plurality of actuators.

Figure 6 is a definition of an index G indicating the positional relationship between the optical surface and the pupil position. A diagram for explanation.

Fig. 7 is a first view for explaining adjustment of wavefront aberration in the projection optical system of the embodiment.

FIG. 8 is a second view for explaining adjustment of wavefront aberration in the projection optical system of the embodiment.

FIG. 9 is a view showing an appropriate range of the index G when the deformation according to the function FZ ₁₇ is given.

FIG. 10 is a view showing an appropriate range of the index G when the deformation according to the function FZ ₂₈ is given.

Fig. 11 is a view schematically showing the configuration of an exposure apparatus of the embodiment.

Fig. 12 is a view schematically showing a configuration between a boundary lens and a wafer in each embodiment of the embodiment.

Fig. 13 is a view showing a lens configuration of a projection optical system according to a first embodiment of the embodiment.

Fig. 14 (a) shows the aberration component generated when the first concave mirror CM1 is deformed according to the function FZ ₁₇ in the first embodiment, and Fig. 14 (b) shows the second concave reflection in the first embodiment. The mirror CM2 gives an aberration component which is generated when the first concave mirror CM1 is deformed in the same manner.

Fig. 15 (a) shows a case where the 0th-order aberration component is mainly generated in the first embodiment, and Fig. 15 (b) shows a case where the primary aberration component is mainly generated in the first embodiment.

Figure 16 is a view showing a lens of a projection optical system according to a second embodiment of the present embodiment. A diagram of the structure.

Fig. 17 is a view showing a lens configuration of a projection optical system according to a third embodiment of the embodiment.

Fig. 18 is a view showing a lens configuration of a projection optical system according to a fourth embodiment of the embodiment.

Fig. 19 is a flow chart showing a manufacturing procedure of a semiconductor element.

Fig. 20 is a flow chart showing a manufacturing procedure of a liquid crystal element such as a liquid crystal display device.

Hereinafter, embodiments will be described based on the drawings. Fig. 1 is a view schematically showing a configuration of a projection optical system according to an embodiment of the present invention. In the present embodiment, as an example of a projection optical system mounted in an exposure apparatus, a four-time imaging type catadioptric optical system PL including four imaging optical units K1, K2, K3, and K4 shown in FIG. 1 is assumed. In FIG. 1, the Z axis is set along the normal direction of the transfer surface (exposure surface) of the wafer W on which the photosensitive substrate is written, and the Y axis is set in the direction parallel to the paper surface of FIG. 1 in the transfer surface of the wafer W. The X-axis is set along the direction perpendicular to the paper surface of FIG. 1 in the transfer surface of the wafer W.

When applied to an exposure apparatus, the projection optical system PL of the present embodiment faces the image plane (second surface) of the exposure surface on which the wafer W is placed in accordance with the object surface (first surface) OB from which the pattern surface of the mask M is provided. The incident order of the light includes: a first imaging optical unit K1 as a refractive optical system; a first planar mirror FM1 as a deflecting mirror; the optical path is bent; and the second imaging optical unit K2 as a catadioptric optical system Including a first concave mirror CM1; as a catadioptric optical system The third imaging optical unit K3 includes a second concave mirror CM2, a second planar mirror FM2 as a deflection mirror, and an optical path, and a fourth imaging optical unit K4 as a refractive optical system. In each of the embodiments of the present embodiment, the first plane mirror FM1 and the second plane mirror FM2 are integrally formed as an optical member. Further, the first plane mirror FM1 and the second plane mirror FM2 may be independent optical members. In the present embodiment, the imaging optical unit may employ an imaging optical system that forms an image of a predetermined surface on the imaging surface. Further, in the present embodiment, the imaging optical unit may employ an imaging optical system in which the predetermined surfaces different from each other are optically conjugated. Further, in the present embodiment, the first imaging optical unit K1 and the second imaging optical unit K2 can be regarded as the first imaging optical portion that forms the intermediate image of the object plane (first surface) OB, and the third imaging optical unit can be used. K3 and the fourth imaging optical unit K4 are regarded as a second imaging optical portion that forms an image of the intermediate image on the image plane (second surface).

At this time, as shown in FIG. 2, the effective imaging region ER on the image plane IM of the projection optical system PL becomes a region away from the optical axis AX of the projection optical system PL. Specifically, the effective imaging region ER is a rectangular region in which the distance Ra is along the Y direction from the optical axis AX in an image field IF having a radius Rb centered on the optical axis AX, that is, along the A rectangular region having a long side (dimension LX) in the X direction and a short side (size LY) along the Y direction. Therefore, as shown in FIG. 3, the effective view region FR on the object plane OB of the projection optical system PL is a rectangular region that is separated from the optical axis AX of the projection optical system PL in the Y direction. Further, the effective imaging region ER may be a region in which the region of the image plane IM of the projection optical system PL is guided with light from the object plane OB and the aberration is substantially corrected. and, The effective imaging area ER may also be an area in which the image plane IM of the projection optical system PL is guided with light from the object plane OB.

In the present embodiment, the reflecting surface of the first concave reflecting mirror CM1 and the reflecting surface of the second concave reflecting mirror CM2 are deformably configured, and the first active deforming portion actively deforms the reflecting surface of the first concave reflecting mirror CM1. The active deformation portion actively deforms the reflection surface of the second concave reflecting mirror CM2. As an example, as shown in FIG. 4, an active deformation portion AD including a plurality of actuators AC provided on the back side of the concave mirror CM1 (CM2) can be used. For example, as shown in FIG. 5, the plurality of actuators AC are arranged such that their acting points ACa are radially distributed. Further, the plurality of actuators AC may be arranged such that their acting points ACa are distributed in a two-dimensional matrix.

The active deformation portion AD pushes the reflection surface CM1a (CM2a) of the concave mirror CM1 (CM2) from the back side by a plurality of actuators AC, thereby deforming the reflection surface CM1a (CM2a) into a desired surface shape. For the specific structure and function of the active deformation portion AD, reference is made to U.S. Patent No. 6,842,277. For the arrangement of the action points ACa of the plurality of actuators AC in the active deformation portion AD, reference is made to U.S. Patent No. 6,842,277. Further, as the active deformation portion, U.S. Patent No. 5,115,351, U.S. Patent No. 6,398,373, U.S. Patent No. 6,411,426, U.S. Patent No. 6,803,994, U.S. Patent No. 6,880,942, or U.S. Patent Publication No. 2010/0033704 A1, etc. Revealing the deformation mechanism. Further, the reflecting surface CM1a (CM2a) of at least one of the concave reflecting mirrors CM1 (CM2) may be deformable.

In the first embodiment of the present embodiment, as will be described later, the position of the first concave mirror CM1 with respect to the object plane OB in the optical path of the second imaging optical unit K2 is described. It is placed at the first pupil position optically in the Fourier transform relationship, and is placed on the image plane IM side. Further, the second concave reflecting mirror CM2 is optically placed at the second pupil position of the Fourier-transformed relationship with respect to the position of the object plane OB in the optical path of the third imaging optical unit K3, and is disposed on the object plane OB side.

In the second embodiment, the first concave reflecting mirror CM1 is disposed on the object plane OB side with respect to the first pupil position, and the second concave reflecting mirror CM2 is disposed on the image plane IM side with respect to the second pupil position. In the third embodiment, the first concave reflecting mirror CM1 is disposed on the image plane IM side with respect to the first pupil position, and the second concave reflecting mirror CM2 is disposed at a position substantially coincident with the second pupil position. In the fourth embodiment, the first concave reflecting mirror CM1 is disposed at a position substantially coincident with the position of the first aperture, and the second concave reflecting mirror CM2 is disposed at a position substantially coincident with the position of the second aperture.

Further, in the present embodiment and the embodiment, the pupil position can be set to a position that is optically Fourier-transformed with respect to the position of the object plane OB or the position of the image plane IM.

Further, in the present embodiment and the embodiment, the pupil position can be set to a position optically conjugate with an entrance pupil of the catadioptric optical system PL which can be regarded as a projection optical system, and an exit pupil optical with the catadioptric optical system PL. At least one of the conjugated positions.

In the present embodiment, an index G indicating the positional relationship between the arbitrary optical surfaces (for example, the reflecting surfaces CM1a and CM2a of the concave reflecting mirrors CM1 and CM2) and the pupil position closest to the arbitrary optical surface is defined. Specifically, the index G is defined by the following formula (a).

G=A/Re (a)

In the formula (a), as shown in FIG. 6, Re is the radius of the circle PG which is at the arbitrary optical surface when the light beam from each point in the effective field of view region FR on the object plane OB reaches an arbitrary optical surface. A collection of circumscribed circles of local spots. Here, the local point refers to a region occupied by the arbitrary optical surface when the light beam emitted from each point in the effective field of view region FR reaches the arbitrary optical surface at an aperture angle corresponding to the maximum numerical aperture.

A is a distance as described below, that is, a local point occupied by the light beam from the center point FRa (refer to FIG. 3) from the effective field of view area FR when it reaches an arbitrary optical surface. A PSa circumscribed quadrangular shape having a center position RCac of a rectangular RCA on one side in a direction corresponding to one side of the effective view region FR, and a light beam FRb (refer to FIG. 3) from a maximum object height in the effective view region FR The distance from the center point PSb occluded in the arbitrary optical surface to the arbitrary optical surface and the center position RCbc of the rectangular RCb having one side in the direction corresponding to one side of the effective view region FR on any optical surface . Further, the center point FRa of the effective view region FR can be set as the center of gravity of the effective view region FR.

Therefore, when the index G1 relating to the reflection surface CM1a of the first concave mirror CM1, that is, the index G1 indicating the positional relationship of the first pupil position in the optical path of the reflection surface CM1a and the second imaging optical unit K2 is 0, Reflective surface CM1a bit At the first pupil position, as the index G1 becomes larger, the distance of the reflecting surface CM1a from the first pupil position becomes larger. Similarly, the index G2 related to the reflection surface CM2a of the second concave mirror CM2, that is, the index G2 indicating the positional relationship between the reflection surface CM2a and the second aperture position in the optical path of the third imaging optical unit K3 is 0. The reflecting surface CM2a is located at the second pupil position, and as the index G2 becomes larger, the distance of the reflecting surface CM2a from the second pupil position becomes larger.

Next, the adjustment of the wavefront aberration in the projection optical system PL of the present embodiment will be described with reference to Fig. 7 . The imaging optical system shown in Fig. 7 is a model in which the projection optical system of the present embodiment is modeled (modeled) into a simple imaging optical system. Hereinafter, the adjustment of the wavefront aberration in the modeled imaging optical system of FIG. 7 will be described for convenience of explanation.

The modeled imaging optical system shown in FIG. 7 is a primary imaging type refractive optical system in which the object plane OB and the image plane IM are optically conjugated, and optical is disposed on the object plane OB side of the pupil position PP. The surface correction mechanism MD1 has an optical surface correction mechanism MD2 disposed on the image surface IM side of the pupil position PP. The action of the correction mechanisms MD1 and MD2 corresponds to the action of the concave mirrors CM1 and CM2 when the reflection surfaces CM1a and CM2a are deformed in the projection optical system PL of the present embodiment. In other words, the correction mechanisms MD1, MD2 have the effect of giving the given wavefront aberration components to the light beams passing through the respective optical surfaces.

In the present embodiment, the reflection surface CM1a of the first concave reflecting mirror CM1 and the reflecting surface CM2a of the second concave reflecting mirror CM2 are deformed in accordance with the same function. Hereinafter, as an example, a case will be considered in which a deformation of the function FZ ₁₇ : ρ ⁴ cos4θ according to the 17th item in the Zernike polynomial using the polar coordinate system is given. Here, ρ is a normalized radius when the radius of the effective reflection region of the circular shape of the reflection surfaces CM1a and CM2a is normalized to 1, and θ is the radial angle of the polar coordinate.

First, the role of one of the correction mechanisms MD1 is examined. Correcting effect corresponding to the action mechanism MD1 concave mirror CM1 when the reflecting surface according to function FZ deformation imparted CM1a _17. At this time, as the wavefront aberration associated with the center position ERa (see FIG. 2) of the effective imaging region ER, the fourth-order rotationally symmetric aberration component Z17 displayed in accordance with the function FZ ₁₇ is generated. This can be easily understood by the fact that the light beam reaching the center position ERa of the effective imaging region ER passes through the correction mechanism MD1 and passes through the region centered on the optical axis.

By the action of the correction mechanism MD1, the wavefront aberration associated with the first peripheral position ERb (see FIG. 2) in the +X direction from the center position ERa of the effective imaging region ER is as shown in FIG. The fourth-order rotationally symmetric aberration component Z17 displayed by the function FZ ₁₇ and the third-order rotationally symmetric aberration component Z10(+) displayed in accordance with the function FZ ₁₀ : ρ ³ cos3θ according to the tenth term. This is because the light beam that has reached the first peripheral position ERb of the effective imaging region ER passes through the correction mechanism MD1 and passes through a region that is eccentric from the optical axis in the -X direction.

By the action of the correction mechanism MD1, the wavefront aberration associated with the second peripheral position ERc (see FIG. 2) in the -X direction from the center position ERa of the effective imaging region ER is as shown in FIG. The fourth-order rotationally symmetric aberration component Z17 displayed by the function FZ ₁₇ and the three-time rotationally symmetric aberration component Z10(-) displayed in accordance with the function FZ _{10 of} the tenth term. This is because the light beam that has reached the second peripheral position ERc of the effective imaging region ER passes through the correction mechanism MD1 and passes through a region that is eccentric from the optical axis toward the +X direction.

Here, the sign indicating the coefficient of the function FZ ₁₇ of the aberration component Z17 is not the same depending on the position in the X direction in the effective imaging region ER, and the magnitude of the coefficient does not depend on the position in the X direction in the effective imaging region ER. And it is roughly fixed. On the other hand, the sign indicating the coefficient of the function FZ ₁₀ of the aberration component Z10 is opposite to the first peripheral position ERb and the second peripheral position ERc, and the magnitude of the coefficient does not depend on the position in the X direction in the effective imaging region ER. It is roughly fixed.

In order to understand the synergy between the pair of correction mechanism MD1 and the correction mechanism MD2, as the simplest example, it is assumed that the imaging optical system shown in FIG. 7 is symmetrically configured with respect to the pupil position PP, and the correction mechanism MD1 and the correction mechanism MD2 are related to light. The 瞳 position PP is symmetrically arranged. Further, assume the role of correcting mechanism MD1, MD2 corresponding to the reflecting surface having the same surface shape CM1a each other, cm2a same amount to impart to each other at the concave mirror CM1 function FZ ₁₇ according to the modification, the action of CM2.

At this time, as described above, as the wave front aberration for each point on the straight line passing through the effective center position of the imaging region ER ERa and extending in the X direction generated by the action of correcting means MD1 is generated based on the function FZ ₁₇ 4 show rotational symmetry aberration component of Z17, and three rotationally symmetric aberration component based on the display function FZ ₁₀ and Z10 (1). Similarly, as the wave front aberration for each point on the straight line passing through the effective center position of the imaging region ER ERa and extending in the X direction generated by the action of the correcting means MD2, generating four basis functions displayed by FZ ₁₇ rotationally symmetrical aberration component Z17, and three rotationally symmetric aberration component based on the displayed function FZ ₁₀ Z10 (2).

When the correction mechanism MD1 and the correction mechanism MD2 are symmetrically arranged with respect to the pupil position PP, and the actions of the correction mechanisms MD1, MD2 correspond to the action of the concave mirrors CM1, CM2 when the same amount of deformation is given to each other, the image is represented. The sign and size of the coefficients of the function FZ ₁₇ of the difference component Z17 are the same in the correction mechanism MD1 and the correction mechanism MD2, and the sign and magnitude of the coefficient of the function FZ ₁₀ indicating the aberration component Z10 are reversed in the correction mechanism MD1 and the correction mechanism MD2. turn. The sign and the size of the coefficient representing the function FZ ₁₀ of the aberration component Z10 are inverted in the correction mechanism MD1 and the correction mechanism MD2, and can be easily understood by the fact that the light beam passing through the correction target is passed at one point of the effective imaging region ER. The area of the MD1 and the area passing through the correction mechanism MD2 are eccentric toward each other with respect to the optical axis.

Therefore, when the correction mechanism MD1 and the correction mechanism MD2 are symmetrically arranged with respect to the pupil position PP, and the actions of the correction mechanisms MD1, MD2 correspond to the action of the concave mirrors CM1, CM2 when the signed and the same size are applied, By the synergistic action of the correction mechanism MD1 and the correction mechanism MD2, the aberration component Z10 is cancelled, and only the multiplied aberration component Z17 is generated as the wavefront aberration. In other words, by the synergistic action of the correction mechanism MD1 and the correction mechanism MD2, it is possible to generate the aberration component which is the same as the aberration component in the X-direction in the effective imaging region ER on the image plane IM, even The 0th-order aberration component of the wavefront aberration can be adjusted.

On the other hand, when the correction mechanism MD1 and the correction mechanism MD2 are about the pupil The position PP is symmetrically arranged, and the action of the correction mechanisms MD1, MD2 corresponds to the action of the concave mirrors CM1, CM2 when the signs are different and the same size is deformed, and the synergy between the correction mechanism MD1 and the correction mechanism MD2 The aberration component Z17 is cancelled, and only the multiplied aberration component Z17 is generated as the wavefront aberration. This is because if the sign of the distortion to be applied is reversed, the aberration component Z17 and the aberration component Z10 are also inverted. In other words, by the synergistic action of the correction mechanism MD1 and the correction mechanism MD2, it is possible to generate an aberration component which is a linear component which changes linearly in each point along the X direction in the effective imaging region ER, and can even adjust the wavefront. The aberration component of the aberration.

This means that even if the correction mechanism MD1 and the correction mechanism MD2 are arranged symmetrically with respect to the pupil position PP, if they are arranged with the pupil position PP interposed therebetween, the deformations given to the correction mechanism MD1 and the correction mechanism MD2 are appropriately set and expressed. The sign and size of the coefficients of the function FZ ₁₇ (or as long as the sign and size of the coefficients of the function FZ ₁₇ are changed), 0 aberrations can be independently generated for each point along the X direction in the effective imaging region ER. The component and the first-order aberration component can adjust the 0th-order aberration component and the 1st-order aberration component of the wavefront aberration independently.

Further, when the correction mechanism MD1 is disposed away from the aperture position PP by a required distance and the correction mechanism MD2 is disposed at the position of the pupil position PP, the aberration component Z17 and the aberration component Z10 are generated by the action of the correction mechanism MD1. Only the aberration component Z17 is generated by the action of the correction mechanism MD2. This means that when one of the correction mechanisms is disposed from the aperture position PP by a desired distance and the other correction mechanism is disposed at or near the position of the pupil position PP, the appropriate setting expression is given to the correction mechanism MD1 and the correction mechanism MD2. The sign and size of the coefficients of the deformed function FZ ₁₇ (or the sign and size of the coefficients of the function FZ ₁₇ ) may be independent to some extent for points along the X direction within the effective imaging region ER. The 0th-order aberration component and the 1st-order aberration component are generated, and the 0th-order aberration component and the 1st-order aberration component of the wavefront aberration can be adjusted independently to some extent.

Further, when both the correction mechanism MD1 and the correction mechanism MD2 are disposed at or near the position of the pupil position PP, only the aberration component Z17 is generated by the action of the correction mechanism MD1, and only the image is generated by the action of the correction mechanism MD2. The difference component is Z17. This means that when both correction mechanisms are disposed at or near the position of the pupil position PP, the sign and size of the coefficient expressing the function FZ ₁₇ given to the correction mechanism MD1 and the correction mechanism MD2 are appropriately set (or The sign and the size of the coefficient of the function FZ ₁₇ are changed), and only a desired amount of the 0th-order aberration component can be generated for each point along the X direction in the effective imaging region ER, and even the wavefront aberration can be adjusted only. 0th aberration component.

Based on the above investigation, in the first embodiment and the second embodiment of the present embodiment, the index G1 related to the reflection surface CM1a of the first concave reflecting mirror CM1 and the reflecting surface CM2a of the second concave reflecting mirror CM2 are associated with each other. The index G2 satisfies the following conditional expressions (1) and (2), and the first concave mirror CM1 is disposed at the pupil position (first aperture position) in the optical path of the second imaging optical unit K2 to The second concave mirror CM2 is disposed at the pupil position (second aperture position) in the optical path of the third imaging optical unit K3 to the object plane OB side (or the position of the image plane IM side (or the object plane OB side) (or ) The position of the image side IM side.

0.02<G1<0.07 (1)

0.02<G2<0.07 (2)

In the same configuration as in the case where the correction mechanism MD1 and the correction mechanism MD2 are disposed with the pupil position PP in FIG. 7, the reflection surface CM1a and the second concave surface of the first concave mirror CM1 are appropriately set and expressed. The sign and size of the coefficient of the function FZ ₁₇ of the deformation imparted by the reflecting surface CM2a of the mirror CM2 (or the sign and size of the coefficient of the function FZ ₁₇ ) may be along the X direction in the effective imaging region ER. Each of the points independently generates the 0th-order aberration component and the 1st-order aberration component, and the 0th-order aberration component and the 1st-order aberration component of the wavefront aberration of the projection optical system PL can be adjusted independently.

When the lower limit value of the conditional expression (1) or the conditional expression (2) is exceeded, the concave mirrors CM1 and CM2 are too close to the pupil position, and the generation of the aberration component Z10 becomes small, and the wave of the projection optical system PL is caused. The adjustment of the first-order aberration component of the pre-aberration becomes difficult. When the upper limit value of the conditional expression (1) or the conditional expression (2) is exceeded, the concave mirrors CM1 and CM2 are too far away from the pupil position, and not only the generation of the aberration component Z17 is small but also an uncontrollable unnecessary image is caused. The generation of the difference component becomes large. In order to exhibit the effect of the embodiment more satisfactorily, the lower limit value of the conditional expression (1) and the conditional expression (2) can be set to 0.03. Further, in order to more effectively exhibit the effect of the embodiment, the upper limit value of the conditional expression (1) and the conditional expression (2) can be set to 0.05.

Specifically, when the deformation surface CM1a of the first concave reflecting mirror CM1 (or the reflecting surface CM2a of the second concave reflecting mirror CM2) is given a deformation according to the function FZ ₁₇ , attention is paid to the peripheral position in the effective imaging region ER. The wavefront aberration associated with ERb and ERc (refer to FIG. 2) corresponds to the change of the index G1 (or the index G2 related to the reflection surface CM2a) associated with the reflection surface CM1a, and the aberration is generated as shown in FIG. Composition Z05, Z10, Z17. In FIG. 9, the horizontal axis represents the value of the index G1 (G2), and the vertical axis represents the amount of generation of each aberration component (the normalized amount of aberration generation when the maximum value of the aberration component Z17 is normalized to 1).

The aberration component Z05 is a second-order rotationally symmetric aberration component displayed in accordance with the function FZ ₅ : ρ ² cos2θ according to the fifth term, and is an unintended aberration component that is uncontrollable. Referring to Fig. 9, when the value of the index G1 (G2) reaches 0.07 or more, the generation of the unnecessary aberration component Z05 becomes large. Further, it is understood that when the value of the index G1 (G2) is 0.02 or less, the aberration component Z10 required for the adjustment of the first-order aberration component of the wavefront aberration cannot be sufficiently generated.

In Fig. 9, the case where the deformation of the function FZ ₁₇ according to the seventeenth item is given has been described. However, in the case of giving a deformation according to another suitable function, for example, the function FZ ₂₈ :(6ρ ⁶ -5ρ ⁴ )cos4θ related to the 28th item, as shown in FIG. 10, the appropriate range for the index G1 (G2) It can be said to be the same. In other words, FIG. 10 shows a case where the deformation surface CM1a of the first concave reflecting mirror CM1 (or the reflecting surface CM2a of the second concave reflecting mirror CM2) is deformed according to the function FZ ₂₈ , corresponding to the index G1 (G2). The change produces aberration components Z10, Z12, Z17, Z26, and Z28 of the wavefront aberration associated with the peripheral positions ERb, ERc in the effective imaging region ER, respectively. In FIG. 10, the horizontal axis represents the value of the index G1 (G2), and the vertical axis represents the amount of generation of each aberration component (the normalized amount of aberration generation when the maximum value of the aberration component Z28 is normalized to 1).

The aberration component Z12 is a second-order rotationally symmetric aberration component displayed in accordance with the function FZ ₁₂ :(4ρ ² -3)ρ ² cos2θ according to the twelfth term. The aberration component Z26 is a fifth-order rotationally symmetric aberration component displayed in accordance with the function FZ ₂₆ : ρ ⁵ cos5θ according to the twenty-sixth item. The aberration component Z28 is a fourth-order rotationally symmetric aberration component displayed in accordance with the function FZ _{28 of the} twenty-eighthth aspect. Referring to Fig. 10, when the value of the index G1 (G2) reaches 0.07 or more, the generation of the unnecessary aberration component Z10 and the unnecessary aberration component Z12 which are uncontrollable becomes large. In addition, when the value of the index G1 (G2) is 0.02 or less, the aberration component Z17 and the aberration component Z26 required for the adjustment of the primary aberration component of the wavefront aberration cannot be sufficiently generated.

In the third embodiment of the present embodiment, the index G1 related to the reflection surface CM1a of the first concave mirror CM1 and the index G2 related to the reflection surface CM2a of the second concave mirror CM2 satisfy the following conditional expression (1). In the conditional expression (3), the first concave reflecting mirror CM1 is disposed at a position from the first pupil position to the image plane IM side, and the second concave reflecting mirror CM2 is disposed substantially in line with the second pupil position. position.

0.02<G1<0.07 (1)

0<G2<0.02 (3)

In this configuration, similarly to the case where one of the correction mechanisms is disposed at a desired distance from the aperture position PP in FIG. 7 and the other correction mechanism is disposed at or near the position of the pupil position PP, The sign and the size of the coefficient expressing the function FZ ₁₇ which is the deformation of the reflection surface CM1a of the first concave mirror CM1 and the reflection surface CM2a of the second concave mirror CM2 (or the symbol and size of the coefficient of the function FZ ₁₇ are set) A change occurs, so that the 0th-order aberration component and the 1st-order aberration component can be independently generated to some extent in the X-direction in the effective imaging region ER, and the projection optics can be adjusted independently to some extent. The 0th-order aberration component and the first-order aberration component of the wavefront aberration of the system PL.

In the third embodiment, the first concave reflecting mirror CM1 is disposed at the position from the first pupil position to the image plane IM side, but the first concave reflecting mirror CM1 is disposed at the first pupil position to the object plane OB. The same effect as in the third embodiment can also be obtained on the side. In addition, although the detailed description is omitted, the index G1 related to the reflection surface CM1a of the first concave mirror CM1 and the index G2 related to the reflection surface CM2a of the second concave mirror CM2 may satisfy the following conditional expression (4) and In the conditional expression (2), the first concave reflecting mirror CM1 is disposed at a position substantially coincident with the first pupil position, and the second concave reflecting mirror CM2 is disposed at the second pupil position to the image plane IM side (or an object) The position of the face OB side). At this time, the same effects as those of the third embodiment can be obtained.

0<G1<0.02 (4)

0.02<G2<0.07 (2)

In the fourth embodiment of the present embodiment, the index G1 related to the reflection surface CM1a of the first concave reflecting mirror CM1 and the index G2 related to the reflecting surface CM2a of the second concave reflecting mirror CM2 satisfy the following conditional expression (4). In the conditional expression (3), the first concave reflecting mirror CM1 is disposed at a position substantially coincident with the position of the first aperture, and the second concave reflecting mirror CM2 is disposed at a position substantially coincident with the position of the second aperture.

0<G1<0.02 (4)

0<G2<0.02 (3)

In this configuration, similarly to the case where both of the correction mechanisms are disposed at or near the position of the pupil position PP in FIG. 7, the reflection surface CM1a and the second surface of the first concave mirror CM1 are appropriately set and expressed. The sign and size of the coefficient of the function FZ ₁₇ of the deformation imparted by the reflecting surface CM2a of the concave mirror CM2 (or the sign and size of the coefficient of the function FZ ₁₇ ), so that it can be along the X in the effective imaging region ER Each point in the direction produces only the required amount of the 0th-order aberration component, and it is possible to adjust only the 0th-order aberration component of the wavefront aberration of the projection optical system PL.

In each of the embodiments of the present embodiment, the power Pw (unit: mm ^-1 ) of the partial optical system including the plurality of optical devices satisfies the following conditional expression (5), and the plurality of optical devices are disposed in the fourth The position of the image optical unit K4 in the optical path of the imaging optical unit K4 is optically in a Fourier-transform relationship (position where the aperture stop AS is disposed) and the image plane IM. Further, in the case where the optical power Pw of the partial optical system is calculated and the optical pupil position exists inside the optical device, it is assumed that the optical device is included in a part of the optical system.

Pw≧0.0100 (5)

If the lower limit value of the conditional expression (5) is exceeded, the lens diameter required to ensure the required image side numerical aperture becomes excessive, and the projection optical system PL is enlarged in the radial direction. In order to exhibit the effect of the embodiment more satisfactorily, the lower limit value of the conditional expression (5) can be set to 0.011.

Further, in each of the embodiments of the present embodiment, the following conditional expression (6) is satisfied. In the conditional expression (6), Rb is the maximum image height of the effective imaging region ER on the image plane IM (refer to FIG. 2), and Rm is the maximum lens effective radius in the fourth imaging optical unit K4.

Rm/Rb≧9.0 (6)

When the value is below the lower limit of the conditional expression (6), the power loss of the lens becomes excessive, and the design of the projection optical system PL becomes difficult. In order to exhibit the effect of the embodiment more satisfactorily, the lower limit value of the conditional expression (6) can be set to 10.0.

Fig. 11 is a view schematically showing the configuration of an exposure apparatus of the embodiment. In the same manner as in the case of FIG. 1, the Z axis is set along the normal direction of the transfer surface (exposure surface) of the wafer W on which the photosensitive substrate is applied, and the transfer along the wafer W is also performed in FIG. The Y-axis is set in the plane parallel to the paper surface of FIG. 11, and the X-axis is set along the direction perpendicular to the paper surface of FIG. 11 in the transfer surface of the wafer W.

As shown in FIG. 11, the exposure apparatus of the present embodiment includes, for example, an illumination optical system 1 including an optical integrator (homogenizer), a field stop, a condenser lens, and the like. An exposure light (exposure beam) IL containing ultraviolet pulse light having a wavelength of 193 nm emitted from an ArF excimer laser light source as an exposure light source passes through the illumination optical system 1 to the mask (network cable) ) M for illumination. In the mask M, a pattern to be transferred is formed, and a rectangular (slit) pattern region having a long side in the X direction and a short side in the Y direction is received in the entire pattern region. illumination.

The light after the mask M is formed into a mask pattern at a predetermined projection magnification on the exposed region on the photoresist (photosensitive substrate) W by the liquid immersion type and the catadioptric projection optical system PL. . That is, a rectangular still exposure region having a long side along the X direction and a short side along the Y direction on the wafer W so as to optically correspond to the rectangular illumination region on the mask M (effective) The exposed area; the effective imaging area) forms a pattern image.

The mask M is held in parallel with the XY plane on the mask stage MST, and a mechanism for slightly moving the mask M in the X direction, the Y direction, and the rotation direction is incorporated in the mask stage MST. The mask stage MST measures and controls the positions in the X direction, the Y direction, and the rotation direction in real time by using the mask laser interferometer 13m of the moving mirror 12m provided on the mask stage MST. The wafer W is fixed in parallel with the XY plane via a wafer holder WH On the Z stage 9.

Further, the Z stage 9 is fixed to the XY stage 10 that moves along the XY plane substantially parallel to the image plane of the projection optical system PL to control the focus position of the wafer W (the position in the Z direction) ) and the tilt angle. The Z stage 9 instantaneously measures and controls the positions in the X direction, the Y direction, and the rotational direction by using the wafer laser interferometer 13w of the moving mirror 12w provided on the Z stage 9. Further, the XY stage 10 is placed on a base 11 to control the X direction, the Y direction, and the rotation direction of the wafer W.

On the other hand, the main control system 14 provided in the exposure apparatus of the present embodiment performs position adjustment of the mask M in the X direction, the Y direction, and the rotation direction based on the measurement value measured by the mask laser interferometer 13m. . That is, the main control system 14 transmits a control signal to the mechanism incorporated in the mask stage MST, and the mask stage MST is slightly moved, thereby adjusting the position of the mask M. Moreover, the main control system 14 performs the focus position (position in the Z direction) and the tilt angle of the wafer W by an auto focus method and an auto leveling method to apply the wafer W. The surface is aligned with the image plane of the projection optical system PL.

That is, the main control system 14 transmits a control signal to the wafer stage driving system 15, and the Z stage 9 is driven by the wafer stage driving system 15, whereby the focus position and the tilt angle of the wafer W are adjusted. Further, the main control system 14 adjusts the position of the wafer W in the X direction, the Y direction, and the rotation direction based on the measured value measured by the wafer laser interferometer 13w. That is, the main control system 14 sends a control signal to the wafer stage drive system 15 to drive the XY by the wafer stage drive system 15. The stage 10 adjusts the position of the wafer W in the X direction, the Y direction, and the rotation direction.

At the time of exposure, the main control system 14 transmits a control signal to the mechanism incorporated in the mask stage MST, and transmits a control signal to the wafer stage driving system 15 at a speed ratio corresponding to the projection magnification of the projection optical system PL. The mask stage MST and the XY stage 10 are driven, and the pattern image of the mask M is projected and exposed onto a predetermined shot area on the wafer W. Subsequently, the main control system 14 sends a control signal to the wafer stage drive system 15 to drive the XY stage 10 by the wafer stage drive system 15 to step move the other projection areas on the wafer W to the exposure position.

In this manner, the operation of scanning and exposing the pattern image of the mask M onto the wafer W by a step and scan method is repeated. In other words, in the present embodiment, the position control of the mask M and the wafer W is performed while using the wafer stage drive system 15 and the wafer laser interferometer 13w, and the rectangular still exposure area and the stationary illumination area are along the rectangular shape. The short side direction, that is, the Y direction, causes the mask stage MST and the XY stage 10, and even the mask M and the wafer W to be synchronously moved (scanned), whereby the pair has a static exposure area on the wafer W. The area in which the long side LX is equal in width and has a length corresponding to the scanning amount (movement amount) of the wafer W is scanned and exposed to the mask pattern.

Fig. 12 is a view schematically showing a configuration between a boundary lens and a wafer in each embodiment of the embodiment. In the present embodiment, as shown in FIG. 12, the optical path between the boundary lens Lb and the wafer W is greater than 1.5 with respect to the exposure light. The refractive index of the liquid Lm is filled. The boundary lens Lb is a positive lens whose convex surface faces the mask M side and whose plane faces the wafer W side. In the present embodiment, as shown in FIG. 11, the water supply and drainage mechanism 21 is used to circulate the liquid Lm in the optical path between the boundary lens Lb and the wafer W.

In the step-and-scan type exposure apparatus that relatively moves the wafer W with respect to the projection optical system PL and performs scanning exposure, the boundary lens Lb and the wafer W that continue to the projection optical system PL are continued from the start to the end of the scanning exposure. The optical path between the inks is filled with the liquid Lm, for example, the technique disclosed in the specification of the U.S. Patent Application Publication No. 2007/242247, or the technique disclosed in Japanese Patent Laid-Open No. Hei 10-303114 or U.S. Patent No. 6,191,429. Wait. In the technique disclosed in the specification of the U.S. Patent Application Publication No. 2007/242247, the liquid supply device supplies the optical path between the boundary lens Lb and the wafer W via the supply pipe and the nozzle (nozzle). The liquid is adjusted to a predetermined temperature, and the liquid is recovered from the wafer W via the recovery pipe and the inflow nozzle by the liquid supply device.

On the other hand, in the technique disclosed in Japanese Laid-Open Patent Publication No. Hei 10-303114 or U.S. Patent No. 6,191,429, the wafer holder table is formed into a container shape so as to accommodate a liquid, and the bottom portion thereof is formed therein. The center (in the liquid) is positioned to hold the wafer W by vacuum adsorption. Further, the lens barrel front end portion of the projection optical system PL reaches the liquid, and even the optical surface on the wafer side of the boundary lens Lb reaches the liquid. In this way, by circulating the liquid as the immersion liquid at a minute flow rate, it is possible to prevent deterioration of the liquid by effects such as corrosion prevention and mildew resistance. And can Prevent aberration fluctuation caused by heat absorption of exposure light. Further, reference is made to U.S. Patent Application Publication No. 2007/242,247, U.S. Patent No. 6,191,429, and Japanese Patent Application No. Hei No. 10-303114.

In each of the embodiments of the present embodiment, the height of the aspherical surface in the direction perpendicular to the optical axis is y, and the edge from the tangent plane at the vertex of the aspheric surface to the position on the aspheric surface at the height y The distance (sag amount) of the optical axis is set to z, the radius of curvature of the vertex is set to r, the conic coefficient is set to κ, and when the aspherical coefficient of n times is C _n , the aspheric surface is It is represented by the following formula (a). In the tables (1) to (4) to be described later, the symbol surface formed on the right side of the surface number is attached to the lens surface formed in an aspherical shape.

z=(y ² /r)/[1+{1-(1+κ). y ² /r ² } ^1/2 ]+C ₄ . y ⁴ +C ₆ . y ⁶ +C ₈ . y ⁸ +C ₁₀ . y ¹⁰ +C ₁₂ . y ¹² +C ₁₄ . y ¹⁴ +C ₁₆ . y ¹⁶ +C ₁₈ . y ¹⁸ +C ₂₀ . y ²⁰ (a)

In the projection optical system PL of each of the embodiments, the light from the mask M forms a first intermediate image of the mask pattern at a position deviated from the optical axis in the vicinity of the first plane mirror FM1 via the first imaging optical system K1. The light from the first intermediate image forms a second intermediate image of the mask pattern at a position deviated from the optical axis via the second imaging optical system K2. The light from the second intermediate image forms a third intermediate image of the mask pattern at a position deviating from the optical axis in the vicinity of the second plane mirror FM2 via the third imaging optical system K3. The light from the third intermediate image forms a final image of the mask pattern on the wafer W at a position deviated from the optical axis via the fourth imaging optical system K4. Furthermore, in each of the embodiments, the position of the intermediate image forming the mask pattern may be referred to as optically conjugate with the object plane or the image plane. Conjugate position. In each of the embodiments, the first plane mirror M1 and the second plane mirror M2 are integrally formed as one optical member. In each of the embodiments, the optical axis of the first imaging optical system K1 and the optical axis of the fourth imaging optical system K4 are parallel to each other, and the amount of the first planar mirror M1 and the second planar mirror M2 are spaced apart in the Y direction. And eccentric. Here, the first plane mirror which is the first deflecting mirror that deflects the light from the first imaging optical system K1 and faces the second imaging optical system K2 has the first plane reflecting surface along the first plane, and The second planar mirror that is deflected toward the second deflecting mirror of the fourth imaging optical system K4 by the light of the third imaging optical system K3 has a second planar reflecting surface along the second plane. The first plane and the second plane are parallel to each other. Further, the optical axis of the first imaging optical system K1 and the optical axis of the second imaging optical system K2 intersect on the first plane, and the optical axis of the third imaging optical system K3 and the optical axis of the fourth imaging optical system K4 are second. Cross on the plane. The optical axis of the second imaging optical system K2 and the optical axis of the third imaging optical system K3 are coaxial with each other. In other words, the second imaging optical system K2 and the third imaging optical system K3 have a common optical axis. Further, in each of the embodiments, the projection optical system PL is configured to be substantially telecentric on both the object side and the image side.

[First Embodiment]

Fig. 13 is a view showing a lens configuration of a projection optical system according to a first embodiment of the embodiment. In the projection optical system PL of the first embodiment, the first imaging optical system K1 includes the parallel plane plate P1 and the eleven lenses L11 to L111 in this order from the mask side. An aperture stop AS1 (not shown) is disposed in the optical path between the lens L15 and the lens L16 of the first imaging optical system K1. 2nd imaging optical system K2 along The traveling path of the light, from the incident side of the light, sequentially includes three lenses L21 to L23 and a concave mirror CM1 that faces the incident side of the light toward the light.

The third imaging optical system K3 sequentially includes three lenses L31 to L33 and a concave mirror CM2 that faces the incident side of the light from the incident side of the light. The fourth imaging optical system K4 sequentially includes 13 lenses L41 to L413 and a plano-convex lens L414 (boundary lens Lb) that faces the wafer side from the incident side of the light. In the fourth imaging optical system K4, an aperture stop AS is disposed in the optical path between the lens L410 and the lens L411. Further, in the first to third imaging optical systems K1 to K3, a position that is optically conjugate with the position at which the aperture stop AS is disposed can be referred to as a pupil position of each imaging optical system.

In each of the embodiments, the optical path between the boundary lens Lb and the wafer W is filled with the refractive index of 1.435876 with respect to the use light (exposure light), that is, ArF excimer laser light (center wavelength λ = 193.306 nm). Liquid (eg water) Lm. All of the light transmissive members including the parallel flat plate P1 and the boundary lens Lb are formed of an optical material (for example, quartz glass (SiO ₂ )) having a refractive index of 1.5603261 with respect to the center wavelength of the used light.

The values of the parameters of the projection optical system PL of the first embodiment are disclosed in the following Table (1). In the column of the main parameters of Table (1), λ represents the center wavelength of the light for exposure, β represents the magnitude (absolute value) of the projection magnification (the imaging magnification of the entire system), and NA represents the numerical aperture of the image side (wafer side). Rb represents the radius of the image circle IF on the wafer W, that is, the maximum image height of the effective imaging area ER on the image plane IM, Ra represents the off-axis amount of the still exposure area ER, and LX represents the static exposure area ER. The size along the X direction (the size of the long side), LY indicates the size (the size of the short side) of the still exposure region ER along the Y direction.

Further, in the column of the optical member parameters of Table (1), the surface number indicates the path along which the light travels from the object surface (first surface), that is, the mask surface toward the image surface (second surface), that is, the wafer surface. The order of the faces counted on the mask side, r represents the radius of curvature of each face (in the case of an aspherical surface, the radius of curvature of the vertex: mm), and d represents the on-axis spacing of each face, that is, the face spacing (mm), and n indicates the relative The refractive index at the center wavelength. The sign of the face spacing d changes each time the light is reflected. In other words, the sign of the plane spacing d is negative in the optical path from the first plane mirror FM1 toward the first concave mirror CM1 and in the optical path from the second concave mirror CM2 toward the second plane mirror FM2. It is positive in other light paths.

In the first imaging optical system K1, the radius of curvature of the convex surface is set to be positive toward the mask side (incident side of light), and the radius of curvature of the concave surface is made negative toward the mask side. In the second imaging optical system K2, the radius of curvature of the convex surface is set to be negative along the incident side of the light toward the light, and the radius of curvature of the concave surface is set to be positive toward the incident side of the light. In the third imaging optical system K3, the radius of curvature of the concave surface is set to be negative along the incident side of the light toward the light, and the radius of curvature of the convex surface is set to be positive toward the incident side of the light. In the fourth imaging optical system K4, the radius of curvature of the convex surface is set to be positive toward the incident side of the light, and the radius of curvature of the concave surface is made negative toward the incident side of the light. In addition, the description in Table (1) is also the same in Table (2), Table (3), and Table (4) which will be described later.

Table (1) (main parameters)

(a) of FIG. 14 shows an aberration component Z17 and an aberration component Z10 which are generated when the reflection surface CM1a of the first concave reflecting mirror CM1 is deformed according to the function FZ ₁₇ in the first embodiment. (b) of FIG. 14 shows an aberration component Z17 and an aberration component Z10 which are generated when the reflection surface CM2a of the second concave reflecting mirror CM2 is deformed in the same manner as the first concave reflecting mirror CM1 in the first embodiment.

Fig. 15 (a) shows a case in which, in the first embodiment, the first concave mirror CM1 and the second concave mirror CM2 cooperate, that is, by appropriately setting the expression to the first concave mirror The sign and the size of the coefficient of the function FZ ₁₇ of the deformation of the reflection surface CM1a of the CM1 and the reflection surface CM2a of the second concave mirror CM2 mainly cause the 0th-order aberration component (Z17) to be generated. (b) of FIG. 15 shows a case where the first-order aberration component (Z10) is mainly generated by the synergistic action of the first concave mirror CM1 and the second concave mirror CM2 in the first embodiment.

The projection optical system according to the first embodiment includes a first imaging optical unit, and includes an optical path between the first surface and the second surface, and includes a first concave mirror and optical surfaces different from each other. And a second conjugate optical unit, wherein the second imaging optical unit is disposed in the optical path between the first imaging optical unit and the second surface, and includes a second concave mirror, and mutually different surfaces are optically conjugated In the relationship between the optical path of the first imaging optical unit and the optical path of the first imaging optical unit, the position of the first surface is optically Fourier-converted from the first pupil position to the second surface side, and the second concave mirror is disposed on the first surface. (2) The position of the optical path of the imaging optical unit and the position of the first surface are optically in the Fourth order position of the Fourier transform relationship to the first surface side, so that excellent imaging performance can be achieved.

In FIGS. 14(a) and 14(b) and FIGS. 15(a) and 15(b), the horizontal axis indicates the positions ERa, ERb, and ERc (see FIG. 2) connecting the effective imaging regions ER. The position of the straight line in the X direction, and the vertical axis is the Nikon coefficient of the aberration component (unit: center wavelength λ of the light for exposure). That is, Figure 14 (a), Figure 14 (b) And FIGS. 15(a) and 15(b), focusing on the wavefront aberration associated with the position in the X direction of the middle region along Y=5.3 mm (=Ra+LY/2) in the effective imaging region ER. Various aberration components.

[Second Embodiment]

Fig. 16 is a view showing a lens configuration of a projection optical system according to a second embodiment of the embodiment. In the projection optical system PL of the second embodiment, the first imaging optical system K1 includes the parallel plane plate P1 and the twelve lenses L11 to L112 in this order from the mask side. The second imaging optical system K2 includes, in order from the incident side of the light, the two lenses L21 and L22, and the concave mirror CM1 that faces the incident side of the light toward the light.

The third imaging optical system K3 includes, in order from the incident side of the light, two lenses L31 and L32, and a concave mirror CM2 that faces the incident side of the light toward the light. The fourth imaging optical system K4 sequentially includes 13 lenses L41 to L413 and a plano-convex lens L414 (boundary lens Lb) that faces the wafer side from the incident side of the light. In the fourth imaging optical system K4, an aperture stop AS is disposed in the optical path between the lens L410 and the lens L411. The value of the parameter of the projection optical system PL of the second embodiment is disclosed in the following Table (2).

The projection optical system according to the second embodiment includes a first imaging optical unit, and includes an optical path between the first surface and the second surface, and includes a first concave mirror and optical surfaces different from each other. And a second conjugate optical unit, wherein the second imaging optical unit is disposed in the optical path between the first imaging optical unit and the second surface, and includes a second concave mirror, and mutually different surfaces are optically conjugated In the first optical path of the first imaging optical unit, the first concave mirror is disposed in the first pupil position in which the position of the first surface is optically Fourier-transformed to the first surface side, and the second concave mirror is disposed on the first surface. 2 The optical path of the imaging optical unit and the position of the first surface are in the light Since the second pupil position in the Fourier transform relationship is learned to the second surface side, good imaging performance can be achieved.

[Third embodiment]

Fig. 17 is a view showing a lens configuration of a projection optical system according to a third embodiment of the embodiment. In the projection optical system PL of the third embodiment, the first imaging optical system K1 includes the parallel plane plate P1 and the 14 lenses L11 to L114 in this order from the mask side. The second imaging optical system K2 sequentially includes one lens L21 and a concave mirror CM1 that faces the incident side of the light along the incident side of the light from the incident side of the light.

The third imaging optical system K3 sequentially includes three lenses L31 to L33 and a concave mirror CM2 that faces the incident side of the light from the incident side of the light. The fourth imaging optical system K4 includes, in order from the incident side of the light, 15 lenses L41 to L415 and a plano-convex lens L416 (boundary lens Lb) which faces the wafer side. In the fourth imaging optical system K4, an aperture stop AS is disposed in the optical path between the lens L412 and the lens L413. The value of the parameter of the projection optical system PL of the third embodiment is disclosed in the following Table (3).

The projection optical system according to the third embodiment includes a first imaging optical unit, and includes an optical path between the first surface and the second surface, and includes a first concave mirror and optical surfaces different from each other. a conjugate relationship; and a second imaging optical unit disposed in the optical path between the first imaging optical unit and the second surface, including the second In the concave mirror, the surfaces different from each other are optically conjugated, and the first concave mirror is disposed in the optical path of the first imaging optical unit and optically in a Fourier transform relationship with the position of the first surface. The first concave mirror is disposed on the first surface side or the second surface side, and the second concave mirror is disposed at a second pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the second imaging optical unit. Therefore, good imaging performance can be achieved.

[Fourth embodiment]

Fig. 18 is a view showing a lens configuration of a projection optical system according to a fourth embodiment of the embodiment. In the projection optical system PL of the fourth embodiment, the first imaging optical system K1 includes the parallel plane plate P1 and the ten lenses L11 to L110 in this order from the mask side. The second imaging optical system K2 sequentially includes two lenses L21 and L22 along the incident side of the light from the incident side of the light, and a concave mirror CM1 that faces the incident side of the light toward the light.

The third imaging optical system K3 includes two lenses L31 and L32 in this order from the incident side of the light, and a concave mirror CM2 that faces the incident side of the light toward the light. The fourth imaging optical system K4 sequentially includes twelve lenses L41 to L412 and a plano-convex lens L413 (boundary lens Lb) that faces the wafer side from the incident side of the light. In the fourth imaging optical system K4, an aperture stop AS is disposed in the optical path between the lens L410 and the lens L411. The value of the parameter of the projection optical system PL of the fourth embodiment is disclosed in the following Table (4).

Table (4) (main parameters)

The projection optical system according to the fourth embodiment includes a first imaging optical unit that includes a first concave mirror disposed in an optical path between the first surface and the second surface. And the mutually different surfaces are optically conjugated; and the second imaging optical unit is disposed in the optical path between the first imaging optical unit and the second surface, and includes a second concave mirror and is mutually The different surfaces are optically conjugated, and the first concave mirror is disposed at the first pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the first imaging optical unit, and the second The concave mirror is disposed in the optical path of the second imaging optical unit and is optically Fourier-converted from the second pupil position to the first surface side or the second surface side in the optical path of the second imaging optical unit, so that good imaging performance can be achieved. .

In the projection optical system PL of the embodiment, the required conditional expression is satisfied. Therefore, the deformation imparted to the reflection surface CM1a of the first concave mirror CM1 and the reflection surface CM2a of the second concave mirror CM2 is appropriately set. ₁₇ FZ function coefficients and the size of the symbols (or FZ the function coefficients and the size of the symbol ₁₇ is changed), adjust the projection optical system PL wave front aberration of the aberration component and the zero-order aberration component 1 At least one of them. In general, it is not limited to the specific function FZ ₁₇ , and the deformation of the reflection surface CM1a of the first concave mirror CM1 and the reflection surface CM2a of the second concave mirror CM2 can be adjusted by the same function. Wavefront aberration of the projection optical system PL.

In the above-described embodiment and the embodiment, the reflection surface CM1a of the first concave reflecting mirror CM1 and the reflecting surface CM2a of the second concave reflecting mirror CM2 are deformed by the Nicholas polynomial, but the function of the deformation is expressed. It is not limited to the Nicho polynomial, and may be a polynomial such as a power series. Further, in the above-described embodiments and examples, the reflecting surface CM1a of the first concave reflecting mirror CM1 is made And both of the reflection surface CM2a of the second concave mirror CM2 are deformed, but by adjusting the shape of the other reflection surface with respect to the shape of one of the reflection surfaces, the wavefront aberration of the projection optical system PL can be adjusted, so At least one of the reflection surface CM1a of the concave mirror CM1 and the reflection surface CM2a of the second concave mirror CM2 may be deformable.

In other words, in the projection optical system PL of the present embodiment, for example, wavefront aberration caused by light irradiation can be actively adjusted. As a result, in the exposure apparatus of the present embodiment, the projection optical system PL capable of actively adjusting the wavefront aberration can be used, and the fine pattern of the mask M can be projected onto the wafer W with high precision, and a good device can be manufactured.

Further, in each of the above-described embodiments, the projection optical system PL is configured as a four-stage imaging optical system including four imaging optical units K1, K2, K3, and K4. However, the present invention is not limited thereto, and a projection optical system including a first imaging optical unit including a first concave mirror and a second imaging optical unit including a second concave mirror, for example, US Pat. No. 4,812,028, US Patent The present invention can be applied to a projection optical system disclosed in Japanese Patent No. 7, 306, 673, and the like.

Further, in each of the above-described embodiments, the effective imaging region ER and the effective visual field region FR are set to be rectangular regions that are offset from the optical axis AX of the projection optical system PL. However, the present invention is not limited thereto, and the positional relationship between the effective imaging region and the effective visual field region and the optical axis of the projection optical system, and the shapes of the effective imaging region and the effective visual field region may be various forms. For example, the effective imaging area ER and effective The field of view FR may be a polygonal shape such as an arc shape or a parallelogram shape, a trapezoidal shape, or a hexagonal shape.

In each of the above embodiments, the optical axis of the first imaging optical system K1 or the optical axis of the fourth imaging optical system K4 and the optical axes of the second imaging optical system K2 and the third imaging optical system K3 are orthogonal to each other, but Not limited to this configuration. For example, the optical axes of the second imaging optical system K2 and the third imaging optical system K3 may be inclined by a predetermined angle with respect to the Y axis.

Further, in each of the above-described embodiments, the reflecting surface CM1a of the first concave reflecting mirror CM1 and the reflecting surface CM2a of the second concave reflecting mirror CM2 are deformed to control the aberration of the projection optical system, but An aberration control mechanism that imparts a desired temperature distribution to the light transmitting members constituting the projection optical system may be provided. As such an aberration control mechanism for imparting a desired temperature distribution to the light-transmitting member, reference is made to U.S. Patent No. 6,198,579 or U.S. Patent No. 6,781,668, U.S. Patent No. 7,817,249, U.S. Patent Publication No. 2008/123066 Bulletin. Further, an aberration control mechanism that changes the position and posture of the optical member constituting the projection optical system to control the aberration of the projection optical system may be provided.

In the above-described embodiment, a variable pattern forming device that forms a predetermined pattern based on predetermined electronic data may be used instead of the mask. Further, as the variable pattern forming device, for example, a spatial light modulation device including a plurality of reflecting devices driven based on predetermined electronic data may be used. An exposure apparatus using a spatial light modulation device, for example, in US Patent Publication No. It is disclosed in the publication No. 2007/0296936. Further, in addition to the non-light-emitting reflective spatial light modulator described above, a transmissive spatial light modulator may be used, and a self-luminous type image display device may also be used.

The exposure apparatus according to the above-described embodiment is manufactured by using various subsystems including the respective constituent elements listed in the scope of the patent application of the present application to maintain predetermined mechanical precision, electrical precision, and optical precision. The way to assemble. In order to ensure the various precisions, various optical systems are used to adjust the optical precision before and after the assembly, and various mechanical systems are used to achieve mechanical precision adjustment, and various electrical systems are used to achieve electrical precision adjustment. . The assembly steps of assembling the various exposure systems into various types of subsystems include mechanical connection of various subsystems, wiring connection of electrical circuits, piping connection of pneumatic circuits, and the like. Of course, prior to the assembly steps of assembling the various subsystems into an exposure apparatus, there are also individual assembly steps for each subsystem. After the assembly steps of the various subsystems assembled into the exposure apparatus are completed, comprehensive adjustment is performed to ensure various precisions of the entire exposure apparatus. Furthermore, the manufacture of the exposure apparatus can also be carried out in a clean room in which temperature and cleanliness are managed.

Next, a method of manufacturing an element using the exposure apparatus of the above embodiment will be described. Fig. 19 is a flow chart showing a manufacturing procedure of a semiconductor element. As shown in FIG. 19, in the manufacturing process of a semiconductor element, a metal film is vapor-deposited to the wafer W which becomes a board|substrate of a semiconductor element (step S40), and the photoresist which is a photosensitive material is apply|coated on this vapor- On the metal film (step S42). Then, using the exposure apparatus of the embodiment, the pattern formed on the mask (mesh) M is transferred onto the wafer W. Each of the projection regions (step S44: exposure step) develops the wafer W whose transfer has been completed, that is, develops the photoresist to which the pattern has been transferred (step S46: development step).

Subsequently, the photoresist pattern generated on the surface of the wafer W in step S46 is used as a mask, and the surface of the wafer W is subjected to etching or the like (step S48: processing step). Here, the photoresist pattern refers to a photoresist layer in which irregularities are formed, and a concave portion penetrates the photoresist layer, and the shape of the unevenness corresponds to that transferred by the exposure device of the embodiment. pattern. In step S48, the surface of the wafer W is processed via the photoresist pattern. In the processing performed in step S48, for example, at least one of etching of the surface of the wafer W or film formation of a metal film or the like is included. Furthermore, in step S44, the exposure apparatus of the above embodiment transfers the pattern by using the wafer W coated with the photoresist as a photosensitive substrate.

FIG. 20 is a flowchart showing a manufacturing procedure of a liquid crystal element such as a liquid crystal display element. As shown in FIG. 20, in the manufacturing step of the liquid crystal element, the pattern forming step (step S50), the color filter forming step (step S52), and the cell assembly step (step S54) are sequentially performed. And a module assembly step (step S56). In the pattern forming step of step S50, a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with the photoresist as the plate P by using the exposure apparatus of the above-described embodiment. The pattern forming step includes: an exposing step of transferring the pattern to the photoresist layer using the exposure apparatus of the embodiment; and a developing step of developing the pattern-transferred sheet P, that is, on the glass substrate The photoresist layer is developed to generate light of a shape corresponding to the pattern a resist layer; and a processing step of processing the surface of the glass substrate via the developed photoresist layer.

In the color filter forming step of step S52, a color filter is formed which is arranged in a matrix shape with red (Red, R), green (Green), blue (Blue). , B) a plurality of groups corresponding to three points, or a plurality of groups of three strip filters of R, G, and B arranged in the horizontal scanning direction. In the component assembly step of step S54, a liquid crystal panel (liquid crystal module) is assembled using a glass substrate having a predetermined pattern formed in step S50 and a color filter formed in step S52. Specifically, for example, a liquid crystal panel is formed by injecting liquid crystal between a glass substrate and a color filter. In the module assembly step of step S56, various components such as an electric circuit and a backlight that perform display operation of the liquid crystal panel are attached to the liquid crystal panel assembled in step S54.

Further, the present invention is not limited to an exposure apparatus suitable for manufacturing a semiconductor element, and can be widely applied, for example, to an exposure for a liquid crystal display element formed on a square glass plate or a display device such as a plasma display. Device, or for manufacturing a photographic device (Charge Coupled Device (CCD), etc.), a micromachine, a thin film magnetic head, and a Deoxyribonucleic Acid (DNA) wafer ( An exposure device for various components such as chip). Further, the present invention is also applicable to an exposure step (exposure device) which is a mask (photo mask) in which a mask pattern of various elements is formed using a photolithography step. Exposure step (exposure device) when, network cable, etc.).

Further, in the above-described embodiment, an ArF excimer laser light source is used. However, the present invention is not limited thereto, and other suitable light sources such as a KrF excimer laser light source for supplying laser light having a wavelength of 248 nm and a supply wavelength can be used. An F ₂ laser light source of 157 nm laser light, a Kr ₂ laser light source that supplies laser light having a wavelength of 146 nm, an Ar ₂ laser light source that supplies laser light having a wavelength of 126 nm, and the like. Further, a continuous wave (CW) light source such as an ultrahigh pressure mercury lamp that emits a bright line such as a g line (wavelength 436 nm) or an i line (wavelength 365 nm) may be used. Further, a high harmonic generating device of a YAG laser or the like can also be used. In addition to this, for example, as disclosed in the specification of U.S. Patent No. 7,023,610, as a vacuum ultraviolet light, a high harmonic as described below, that is, a laser beam from a DFB semiconductor or a fiber laser is used. The resulting single-field laser light in the infrared or visible region is amplified by, for example, a fiber amplifier doped with germanium (or both germanium and germanium) and converted to a wavelength using nonlinear optical crystallization. Ultraviolet light.

Further, in the above-described embodiment, the present invention is applied to a scanning type exposure apparatus. However, the present invention is not limited thereto, and the present invention may be applied to a state in which a mask and a wafer (photosensitive substrate) are stationary. A uniform exposure type exposure apparatus that performs projection exposure on a projection optical system.

Further, in the above-described embodiment, the present invention is applied to a liquid immersion type projection optical system mounted in an exposure apparatus. However, the present invention is not limited to the liquid immersion system, and the present invention can also be applied to a dry type projection optical system. In general, the present invention can be applied to an imaging optical system in which an image of a first surface is formed on a second surface.

AS‧‧‧ aperture diaphragm

CM1, CM2‧‧‧ concave mirror

FM1, FM2‧‧‧ plane mirror

IM‧‧‧face

K1, K2, K3, K4‧‧‧ imaging optical unit

M‧‧‧ mask

OB‧‧‧ object surface

PL‧‧‧Projection Optical System

W‧‧‧ wafer

X, Y, Z‧‧ Direction

Claims (65)

A projection optical system including an image on a first surface on a second surface, wherein the first imaging optical portion includes an optical path disposed between the first surface and the second surface a concave mirror that forms an intermediate image of the first surface; and a second imaging optical portion that includes a second concave mirror disposed in an optical path between the first imaging optical unit and the second surface. An image of the intermediate image is formed, and at least one of the first concave mirror and the second concave mirror has a deformable reflective surface. The projection optical system according to claim 1, wherein the first concave mirror and the second concave mirror each have a deformable reflecting surface. The projection optical system according to claim 1 or 2, wherein the first imaging optical portion includes a first imaging optical unit, and the first imaging optical unit includes the first concave mirror and The mutually different surfaces are optically conjugated, and the second imaging optical portion includes a second imaging optical unit, and the second imaging optical unit includes the second mirror and faces different from each other They are set to be optically conjugated to each other. A projection optical system including an image on a first surface on a second surface, comprising: a first imaging optical unit disposed in an optical path between the first surface and the second surface, and including a first concave mirror having a deformable reflecting surface; and a second imaging optical unit disposed in the optical path between the first imaging optical unit and the second surface and including a deformable reflecting surface The second concave mirror. The projection optical system according to claim 3, wherein the projection optical system is a four-stage imaging type optical system including four imaging optical units. The projection optical system according to any one of claims 3 to 5, further comprising: a front side refractive imaging optical unit, an optical path disposed between the first surface and the first imaging optical unit And a rear side refractive imaging optical unit disposed in the optical path between the second imaging optical unit and the second surface. The projection optical system according to any one of claims 3 to 6, wherein the effective imaging area on the second surface is a region away from an optical axis of the projection optical system. The projection optical system according to any one of the preceding claims, wherein the first concave mirror is disposed in a position of the optical path of the first imaging optical unit and the first surface The first pupil position optically in the Fourier transform relationship Positioned on the first surface side or the second surface side, the second concave mirror is disposed in the optical path of the second imaging optical unit and optically has a Fourier transform relationship with the position of the first surface The second aperture position is on the second surface side or the first surface side. The projection optical system according to claim 8, wherein the first concave mirror is disposed at the first pupil position to the first surface side, and the second concave mirror is disposed at the The second aperture position is on the second surface side. The projection optical system according to claim 8, wherein the first concave mirror is disposed at the first pupil position to the second surface side, and the second concave mirror is disposed in the The second aperture position is on the first surface side. The projection optical system according to any one of claims 8 to 10, wherein the light beam from each point in the effective field of view of the first surface is occupied by an arbitrary optical surface The radius of the set of circumscribed circles of the local points is set to Re, and the quadrilateral which is circumscribed by the local point occupied by the light beam from the center point of the effective field of view area in the arbitrary optical plane is effective a central position of a rectangle having one side in a direction corresponding to one side of the field of view region, and a quadrilateral shape circumscribed by a local point occupied by a light beam from a point of the maximum object height in the effective view region and The distance between the center position of the rectangle having one side in the direction corresponding to one side of the effective field of view area on the arbitrary optical surface is A, and the position of the pupil closest to the arbitrary optical surface and the arbitrary When the index G of the positional relationship of the optical surface is defined by G=A/Re, The index G1 relating to the reflecting surface of the first concave mirror and the index G2 relating to the reflecting surface of the second concave mirror satisfy the following conditions: 0.02 < G1 < 0.07, 0.02 < G2 < 0.07. The projection optical system according to any one of the preceding claims, wherein the first concave mirror is disposed in a position of the optical path of the first imaging optical unit and the first surface a first pupil position optically in a Fourier transform relationship, wherein the second concave mirror is disposed in an optical path of the second imaging optical unit and optically in a Fourier transform relationship with a position of the first surface The pupil position is on the first surface side or the second surface side. The projection optical system according to claim 12, wherein a circle circumscribed with a set of local points occupied by light beams from respective points in the effective field of view of the first surface in an arbitrary optical surface is obtained. The radius is set to Re, and a beam that is circumscribed at a local point occupied by the light beam from the center point of the effective field of view in the arbitrary optical surface and in a direction corresponding to one side of the effective field of view area a central position of a rectangle having one side, and a quadrilateral circumscribed by a local point occupied by a light beam from a point of maximum object height within the effective field of view area, and in a region with the effective field of view The distance between the center position of the rectangle having one side in the corresponding direction on the arbitrary optical surface is set to A, and The index G of the positional relationship between the pupil position closest to the arbitrary optical surface and the arbitrary optical surface is defined by G=A/Re, and the index G1 related to the reflection surface of the first concave mirror and The index G2 related to the reflection surface of the second concave mirror satisfies the following conditions: 0 < G1 < 0.02, 0.02 < G2 < 0.07. The projection optical system according to any one of the preceding claims, wherein the first concave mirror is disposed in a position of the optical path of the first imaging optical unit and the first surface a first concave mirror that is optically in a Fourier transform relationship to the first surface side or the second surface side, wherein the second concave mirror is disposed in an optical path of the second imaging optical unit The position of the first surface is optically at the second pupil position of the Fourier transform relationship. The projection optical system according to claim 14, wherein a circle circumscribed with a set of local points occupied by light beams from respective points in the effective field of view of the first surface in an arbitrary optical surface is obtained. The radius is set to Re, and a beam that is circumscribed at a local point occupied by the light beam from the center point of the effective field of view in the arbitrary optical surface and in a direction corresponding to one side of the effective field of view area The central position of the rectangle having one side and the local point of the light beam occupying the point of the largest object from the effective field of view in the arbitrary optical plane The distance between the center position of the rectangle having one side in the direction corresponding to one side of the effective field of view area on the arbitrary optical surface is A, and the position of the pupil closest to the arbitrary optical surface is When the index G of the positional relationship of the arbitrary optical surface is defined by G=A/Re, the index G1 related to the reflection surface of the first concave mirror and the reflection surface of the second concave mirror are related. The index G2 satisfies the following condition: 0.02 < G1 < 0.07 0 < G2 < 0.02. The projection optical system according to any one of the preceding claims, wherein the first concave mirror is disposed in a position of the optical path of the first imaging optical unit and the first surface a first pupil position optically in a Fourier transform relationship, wherein the second concave mirror is disposed in an optical path of the second imaging optical unit and optically in a Fourier transform relationship with a position of the first surface 2 light position. The projection optical system according to claim 16, wherein a circle circumscribed from a set of local points occupied by light beams from respective points in the effective field of view of the first surface in an arbitrary optical surface is obtained. The radius is set to Re, and a square circumscribed by a local point occupied by the light beam from the center point of the effective field of view in the arbitrary optical surface and a side corresponding to one side of the effective field of view area a central portion of the rectangle having one side upward, and a quadrilateral circumscribed by the local point occupied by the light beam from the point of the maximum object height in the effective field of view region, and in the effective view region The distance between the center position of the rectangle having one side in the direction corresponding to one side on the arbitrary optical surface is A, and the index indicating the positional relationship between the pupil position closest to the arbitrary optical surface and the arbitrary optical surface When G is defined by G=A/Re, the index G1 related to the reflection surface of the first concave mirror and the index G2 related to the reflection surface of the second concave mirror satisfy the following condition: 0<G1 <0.02 0<G2<0.02. The projection optical system according to any one of claims 6 to 17, wherein a partial optical system including a plurality of optical devices has a power of 0.0100 (mm ^-1 ) or more, the plurality of opticals The device is disposed between the fourth pupil position in the Fourier-transformed relationship between the position of the second surface and the second surface in the optical path of the rear-side refractive imaging optical unit, and is in the fourth In the case where the pupil position exists inside the optical device, the optical device is included in the partial optical system. The projection optical system according to any one of claims 6 to 18, wherein a maximum image height of the effective imaging region on the second surface is set to Rb, and the rear side refraction is imaged When the maximum lens effective radius in the optical unit is set to Rm, full The following conditions are sufficient: Rm/Rb ≧ 9.0. The projection optical system according to any one of claims 8 to 19, wherein the effective field of view area on the first surface is rectangular. The projection optical system according to any one of claims 2 to 20, further comprising: a first active deformation portion that actively deforms the reflection surface of the first concave mirror; and a second The active deformation portion actively deforms the reflection surface of the second concave mirror. The projection optical system according to claim 21, wherein the first active deformation portion and the second active deformation portion are opposite to a reflection surface of the first concave mirror and the second concave mirror The reflecting surface is given a deformation displayed according to the same function as each other, thereby adjusting the wavefront aberration of the projection optical system. The projection optical system according to claim 22, wherein the first active deformation portion and the second active deformation portion adjust each of the effective imaging regions on the second surface along a predetermined direction The point is the same 0th-order aberration component and at least one of the first-order aberration components that linearly change for each point along the predetermined direction. A projection optical system for forming an image of a first surface on a second surface, comprising: The first imaging optical unit includes a first concave mirror disposed in an optical path between the first surface and the second surface, and mutually different surfaces are optically conjugated; The imaging optical unit includes an optical path between the first imaging optical unit and the second surface, and includes a second concave mirror, and mutually different surfaces are optically conjugated. The first concave mirror is disposed in a first pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the first imaging optical unit to the first surface side, and the first surface The concave mirror is disposed on the second pupil side of the optical path of the second imaging optical unit that is optically Fourier-transformed to the position of the first surface to the second surface side. A projection optical system comprising: a first imaging optical unit disposed on an optical path between the first surface and the second surface, wherein the image of the first surface is formed on the second surface a concave mirror having optically conjugated surfaces different from each other; and a second imaging optical unit disposed in an optical path between the first imaging optical unit and the second surface The second concave mirror has an optically conjugate relationship between mutually different surfaces, and the first concave mirror is disposed in the optical path of the first imaging optical unit at a position on the first surface Optically in the first optical position of the Fourier transform relationship Positioned on the second surface side, the second concave mirror is disposed in a second pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the second imaging optical unit The first surface side. The projection optical system according to claim 24 or claim 25, wherein the collection of local points occupied by the light beams from the respective points in the effective field of view of the first surface in an arbitrary optical plane The radius of the circumscribed circle is set to Re, and the light beam from the center point of the effective field of view area is circumscribed by the local point occupied by the arbitrary optical surface and on one side of the effective field of view a central position of a rectangle having one side in a corresponding direction, and a quadrilateral circumscribed by a local point occupied by a light beam from a point of the maximum object height in the effective field of view area, and in the The distance between the center position of the rectangle having one side in the direction corresponding to one side of the effective field of view area on the arbitrary optical surface is A, and the position of the pupil closest to the arbitrary optical surface and the position of the arbitrary optical surface When the index G of the relationship is defined by G=A/Re, the index G1 related to the reflection surface of the first concave mirror and the index G2 related to the reflection surface of the second concave mirror satisfy the following conditions: 0 .02<G1<0.07, 0.02<G2<0.07. A projection optical system in which an image of a first surface is formed on a second surface The first imaging optical unit includes a first concave mirror and an optically conjugated surface that is disposed between the first surface and the second surface. And a second imaging optical unit, wherein the optical path between the first imaging optical unit and the second surface includes a second concave mirror, and mutually different surfaces are optically conjugated In the relationship between the first concave mirror and the optical path of the first imaging optical unit, the position of the first surface is optically Fourier-converted, and the second concave reflection The mirror is disposed in a second pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the second imaging optical unit to the first surface side or the second surface side. The projection optical system according to claim 27, wherein a circle circumscribed with a set of local points occupied by light beams from respective points in the effective field of view of the first surface in an arbitrary optical surface is used. The radius is set to Re, and a beam that is circumscribed at a local point occupied by the light beam from the center point of the effective field of view in the arbitrary optical surface and in a direction corresponding to one side of the effective field of view area a central position of a rectangle having one side, and a quadrilateral circumscribed by a local point occupied by a light beam from a point of maximum object height within the effective field of view area, and in a region with the effective field of view The distance between the center position of the rectangle having one side in the corresponding direction on the arbitrary optical surface is set to A, and The index G of the positional relationship between the pupil position closest to the arbitrary optical surface and the arbitrary optical surface is defined by G=A/Re, and the index G1 related to the reflection surface of the first concave mirror and The index G2 related to the reflection surface of the second concave mirror satisfies the following conditions: 0 < G1 < 0.02, 0.02 < G2 < 0.07. A projection optical system comprising: a first imaging optical unit disposed on an optical path between the first surface and the second surface, wherein the image of the first surface is formed on the second surface a concave mirror having optically conjugated surfaces different from each other; and a second imaging optical unit disposed in the optical path between the first imaging optical unit and the second surface, including a concave mirror having optically conjugated surfaces that are different from each other, wherein the first concave mirror is disposed in an optical path of the first imaging optical unit and is optically positioned at a position on the first surface The first pupil position in the Fourier transform relationship is on the first surface side or the second surface side, and the second concave mirror is disposed in the optical path of the second imaging optical unit and the first The position of the face is optically in the second pupil position of the Fourier transform relationship. The projection optical system of claim 29, wherein Setting a radius of a circle circumscribed by a set of local points occupied by light beams from respective points in the effective field of view on the first surface on an arbitrary optical surface as Re, and from the effective field of view a center point of the light beam at a local point occupied by the arbitrary optical surface, and a central position of the rectangle having one side in a direction corresponding to one side of the effective view area, and from the effective field of view a light beam at a point of the maximum object height in the region is a circumscribed quadrilateral at a local point occupied by the arbitrary optical surface, and a central position of a rectangle having one side in a direction corresponding to one side of the effective view region is The distance on the arbitrary optical surface is A, and the index G indicating the positional relationship between the pupil position closest to the arbitrary optical surface and the arbitrary optical surface is defined by G=A/Re, and the The index G1 related to the reflection surface of the concave mirror and the index G2 relating to the reflection surface of the second concave mirror satisfy the following conditions: 0.02 < G1 < 0.07, 0 < G2 < 0.02. A projection optical system comprising: a first imaging optical unit disposed on an optical path between the first surface and the second surface, wherein the image of the first surface is formed on the second surface a concave mirror having optically conjugated surfaces different from each other; and a second imaging optical unit disposed in the optical path between the first imaging optical unit and the second surface, including 2 concave mirrors, and different faces from each other In the optical conjugate relationship, the first concave mirror is disposed at a first pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the first imaging optical unit. The second concave mirror is disposed at a second pupil position in which the position of the first surface is optically Fourier-transformed in the optical path of the second imaging optical unit. The projection optical system according to claim 31, wherein a circle circumscribed with a set of local points occupied by light beams from respective points in the effective field of view of the first surface in an arbitrary optical surface is used. The radius is set to Re, and a beam that is circumscribed at a local point occupied by the light beam from the center point of the effective field of view in the arbitrary optical surface and in a direction corresponding to one side of the effective field of view area a central position of a rectangle having one side, and a quadrilateral circumscribed by a local point occupied by a light beam from a point of maximum object height within the effective field of view area, and in a region with the effective field of view The distance between the center position of the rectangle having one side in the corresponding direction on the arbitrary optical surface is A, and the index G indicating the positional relationship between the pupil position closest to the arbitrary optical surface and the arbitrary optical surface When G=A/Re is defined, the index G1 related to the reflection surface of the first concave mirror and the index G2 related to the reflection surface of the second concave mirror satisfy the following condition: 0<G1< 0.02, 0<G2<0.02. The projection optical system according to any one of claims 24 to 32, further comprising: a front side refractive imaging optical unit, an optical path disposed between the first surface and the first imaging optical unit And a rear side refractive imaging optical unit disposed in the optical path between the second imaging optical unit and the second surface. The projection optical system according to claim 33, wherein a partial optical system including a plurality of optical devices has a power of 0.0100 (mm ^-1 ) or more, and the plurality of optical devices are disposed on the rear side of the refractive system. The position of the second surface of the optical path of the imaging optical unit is optically in a Fourier-transformed relationship between the fourth pupil position and the second surface, and is present in the optical device at the fourth pupil position. In the case, the optical device is included in the partial optical system. The projection optical system according to claim 33, wherein the maximum image height of the effective imaging region on the second surface is set to Rb, and the rear side is refracted in the imaging optical unit. When the maximum lens effective radius is set to Rm, the following condition is satisfied: Rm/Rb ≧ 9.0. The projection optical system according to any one of claims 24 to 35, wherein the effective imaging region on the second surface is a region away from an optical axis of the projection optical system. The projection optical system according to any one of claims 24 to 36, wherein the effective field of view area on the first surface is rectangular. A projection optical system in which an image of a first surface is formed on a second surface, comprising: a first imaging optical system disposed in an optical path between the first surface and the second surface; a first intermediate image of the first surface; and a second imaging optical system, wherein the optical path between the first imaging optical system and the second surface includes a first concave mirror, and the first intermediate mirror is formed The second intermediate image of the image; the third imaging optical system is disposed in the optical path between the second imaging optical system and the second surface, and includes a second concave mirror to form the second intermediate image The third intermediate image, and the fourth imaging optical system, disposed in the optical path between the third imaging optical system and the second surface, forms an image of the third intermediate image on the second surface The second imaging optical system includes a plurality of positive lenses disposed in an optical path between the first intermediate image and the first concave mirror, and the third imaging optical system includes the second imaging optical system a plurality of positive lenses in the optical path between the intermediate image and the second concave mirror. The projection optical system according to claim 38, wherein the plurality of positive lenses of the third imaging optical system comprise a positive meniscus lens, and the positive meniscus lens is disposed at the middle of the second The image side faces the concave surface toward the second intermediate image. The projection optical system according to claim 38, wherein the fourth imaging optical system includes a positive lens disposed on a side closest to the third intermediate image and having a convex surface facing The second side is described. The projection optical system according to claim 40, wherein the fourth imaging optical system includes a positive lens adjacent to the second surface of the positive lens of the fourth imaging optical system It is disposed on the side and has a convex surface facing the third intermediate image side. The projection optical system according to claim 41, wherein the fourth imaging optical system includes a negative lens adjacent to the positive lens that has a convex surface toward the third intermediate image side. The second surface side is disposed, and the concave surface faces the third intermediate image side. The projection optical system according to claim 41, wherein the fourth imaging optical system includes a plurality of negative lenses adjacent to the positive side facing the third intermediate image side The second surface side of the lens is disposed, and the concave surface faces the third intermediate image side. A projection optical system in which an image of a first surface is formed on a second surface, comprising: a first imaging optical system disposed in an optical path between the first surface and the second surface; a first intermediate image of the first surface; and a second imaging optical system, wherein the optical path between the first imaging optical system and the second surface includes a first concave mirror, and the first intermediate mirror is formed The image of the image is the second intermediate image; The third imaging optical system includes a second concave mirror that is disposed between the second imaging optical system and the second surface, and forms a third intermediate image that is an image of the second intermediate image; In the fourth imaging optical system, an image of the third intermediate image is formed on the second surface of the optical path between the third imaging optical system and the second surface, and the fourth imaging optical system includes In the positive lens, the positive lens is disposed on the side closest to the third intermediate image and has a convex surface facing the second surface side. The projection optical system according to claim 44, wherein the fourth imaging optical system includes a positive lens adjacent to the second surface of the positive lens of the fourth imaging optical system It is disposed on the side and has a convex surface facing the third intermediate image side. The projection optical system according to claim 45, wherein the fourth imaging optical system includes a negative lens adjacent to the positive lens that has a convex surface toward the third intermediate image side. The second surface side is disposed, and the concave surface faces the third intermediate image side. The projection optical system according to claim 45, wherein the fourth imaging optical system includes a plurality of negative lenses adjacent to the positive side facing the third intermediate image side The second surface side of the lens is disposed, and the concave surface faces the third intermediate image side. A projection optical system including an image on a first surface on a second surface, comprising: a first imaging optical system disposed between the first surface and the second surface The first intermediate image of the first surface is formed in the optical path, and the second imaging optical system is disposed in the optical path between the first imaging optical system and the second surface, and includes a first concave mirror. The second intermediate image, which is the image of the first intermediate image, and the third imaging optical system, which is disposed in the optical path between the second imaging optical system and the second surface, includes a second concave mirror, and is formed by the second concave mirror. a third intermediate image which is an image of the second intermediate image; and a fourth imaging optical system that is disposed on the optical path between the third imaging optical system and the second surface, and forms the second surface In the image of the intermediate image, the second imaging optical system includes a positive meniscus lens, and the positive meniscus lens is disposed on the side closest to the first intermediate image and has a convex surface facing the first intermediate image side. The projection optical system according to claim 48, wherein the second imaging optical system includes a negative meniscus lens, and the negative meniscus lens is disposed such that the convex surface faces the first intermediate image side Between the meniscus lens and the first concave mirror, the concave surface is oriented such that the convex surface faces the positive meniscus lens side on the first intermediate image side. The projection optical system according to claim 49, wherein the first concave mirror and the negative meniscus lens are disposed adjacent to each other. The projection optical system according to claim 50, wherein the negative meniscus lens and the positive meniscus lens are disposed adjacent to each other. A projection optical system for forming an image of a first surface on a second surface, comprising: The first imaging optical system is configured such that a first intermediate image of the first surface is formed in an optical path between the first surface and the second surface, and a second imaging optical system is disposed in the first imaging The optical path between the optical system and the second surface includes a first concave mirror to form a second intermediate image which is an image of the first intermediate image, and a third imaging optical system is disposed in the second imaging optical The optical path between the system and the second surface includes a second concave mirror, a third intermediate image that forms an image of the second intermediate image, and a fourth imaging optical system that is disposed in the third imaging optical In the optical path between the system and the second surface, an image of the third intermediate image is formed on the second surface, the second imaging optical system includes a lens, and the lens is disposed in the first middle The image side is disposed adjacent to the first concave mirror. A projection optical system in which an image of a first surface is formed on a second surface, comprising: a first imaging optical system disposed in an optical path between the first surface and the second surface; a first intermediate image of the first surface; and a second imaging optical system, wherein the optical path between the first imaging optical system and the second surface includes a first concave mirror, and the first intermediate mirror is formed The second intermediate image of the image; the third imaging optical system is disposed in the optical path between the second imaging optical system and the second surface, and includes a second concave mirror to form the second intermediate image The image of the third intermediate image; The fourth imaging optical system is disposed in an optical path between the third imaging optical system and the second surface, and forms an image of the third intermediate image on the second surface; the first deflecting mirror is disposed in the optical path The optical path between the first imaging optical system and the second imaging optical system; and the second deflecting mirror are disposed between the third imaging optical system and the fourth imaging optical system. The projection optical system according to claim 53, wherein the second imaging optical system and the third imaging optical system are coaxial with each other. The projection optical system according to claim 53, wherein the optical axis of the first imaging optical system and the optical axis of the fourth imaging optical system are parallel to each other. The projection optical system according to any one of claims 53 to 55, wherein the first deflecting mirror has a first planar reflecting surface along a first plane, and the second deflecting mirror has an edge The second planar reflecting surface of the second plane, the first plane and the second plane being parallel to each other. The projection optical system according to any one of claims 53 to 56, wherein the first deflecting mirror has a first planar reflecting surface along a first plane, and the second deflecting mirror has an edge a second planar reflecting surface of the second plane, wherein an optical axis of the first imaging optical system intersects with an optical axis of the second imaging optical system on the first plane The optical axis of the third imaging optical system intersects with the optical axis of the fourth imaging optical system on the second plane. The method of adjusting the projection optical system according to any one of the preceding claims, comprising the step of: reflecting a reflecting surface of the first concave mirror and the The reflection surface of the second concave mirror is given a deformation displayed by the same function, thereby adjusting the wavefront aberration of the projection optical system. The adjustment method of claim 58, wherein the step of adjusting the wavefront aberration comprises the step of adjusting the points along the predetermined direction in the effective imaging region on the second surface At least one of the zero-order aberration component and the first-order aberration component that changes linearly with respect to each point along the predetermined direction. An adjustment method for adjusting a projection optical system in which an image of a first surface is formed on a second surface, comprising the step of deforming a first concave mirror of the first imaging optical unit, The first imaging optical unit is disposed in an optical path between the first surface and the second surface; and deforms a second concave mirror in the second imaging optical unit, wherein the second imaging optical unit is disposed In the optical path between the first imaging optical unit and the second surface, the reflection surface of the first concave mirror and the reflection surface of the second concave mirror are provided with the same function display. Deformation, thereby adjusting the place The wavefront aberration of the projection optical system. The adjustment method according to claim 60, wherein the zero-order aberration component that is the same for each point along the predetermined direction in the effective imaging region on the second surface is adjusted, and Each point in the predetermined direction is at least one of linear aberration components that are linearly changed to adjust the wavefront aberration. An exposure apparatus according to any one of claims 1 to 57, which is based on light from a predetermined pattern provided on the first surface, The predetermined pattern is projected onto a substrate provided on the second surface. An exposure method comprising the steps of: directing light from a predetermined pattern disposed on the first surface to a projection optical system to project the predetermined pattern onto a substrate disposed on the second surface; And adjusting the projection optical system using an adjustment method as described in any one of claims 58 to 61. A method of manufacturing a device, comprising the steps of: exposing the predetermined pattern to the substrate using an exposure apparatus according to claim 62; performing the substrate on which the predetermined pattern is transferred Developing a mask layer having a shape corresponding to the predetermined pattern on a surface of the substrate; and processing a surface of the substrate via the mask layer. A method of manufacturing a component, comprising the steps of: using the exposure method according to claim 63 of the patent application, the specification chart Exposing the substrate to the substrate; developing the substrate on which the predetermined pattern is transferred to form a mask layer having a shape corresponding to the predetermined pattern on a surface of the substrate; and passing through the mask layer The surface of the substrate is processed.