WO2005010961A1

WO2005010961A1 - Exposure apparatus

Info

Publication number: WO2005010961A1
Application number: PCT/JP2004/010864
Authority: WO
Inventors: Takeshi Inoue
Original assignee: Nikon Corporation
Priority date: 2003-07-25
Filing date: 2004-07-23
Publication date: 2005-02-03
Also published as: TW200507066A; JPWO2005010961A1

Abstract

A scanning exposure apparatus for exposing a pattern of a reticle on a substrate by synchronously moving the reticle and the substrate. The apparatus has a light source emitting exposure light for illuminating the reticle, a movable reticle blind provided between the light source and the reticle and moving while following the movement of the reticle, a first illumination system housing where the movable reticle blind is placed, and a vibration isolation device for suppressing or eliminating vibration transmitted by the movement of the movable reticle blind to the first illumination system housing.

Description

Description Exposure equipment Technical field

The present invention relates to an exposure apparatus that exposes a pattern of a mask onto a substrate by synchronously moving the mask and the substrate.

This application claims the priority of Japanese Patent Application No. 2003-2797926 filed on July 25, 2003, the content of which is incorporated herein by reference. Background art

Microdevices such as semiconductor devices are manufactured by a so-called photolithography method in which a pattern formed on a mask or reticle (hereinafter collectively referred to as “reticle”) is transferred onto a photosensitive substrate such as a wafer. . An exposure apparatus used in the photolithography process has a reticle stage for supporting a reticle and a substrate stage for supporting a substrate, and projects a pattern formed on the reticle while sequentially moving the reticle stage and the substrate stage. It is transferred to a substrate via an optical system. The exposure system includes a batch exposure system that simultaneously transfers the entire reticle pattern onto the substrate, and a scanning exposure system that continuously transfers the reticle pattern onto the substrate while synchronizing the reticle stage and the substrate stage. Two types are mainly known: the device and the device. In a scanning exposure apparatus, a slit-shaped (rectangular) illumination area on a reticle is illuminated with exposure light while a reticle and a substrate are moved synchronously, and a reticle pattern is exposed on the substrate. In order to prevent the exposure of unnecessary parts other than the reticle, for example, as shown in the pamphlet of International Publication No. WO 99/63585, the illumination area on the reticle is controlled by moving the blade member synchronously with the reticle. Some have a light shielding device called a movable reticle blind.

By the way, from the viewpoint of improving the throughput of the exposure processing, etc., it is required to move the reticle stage and the substrate stage at a high speed and at a high acceleration. Accordingly, the moving of the blade member of the movable reticle blind is also performed at a high speed. Need to be accelerated The However, vibrations are generated as the blade members are accelerated and accelerated, and, for example, the illumination optical system and the gantry supporting the illumination optical system are vibrated, which causes a problem that the exposure accuracy is affected. Have been. Disclosure of the invention

The present invention has been made in view of such circumstances, and has an influence on exposure accuracy even when vibration is generated due to movement of a movable body such as a movable reticle blind disposed between a light source and a reticle (mask). An object of the present invention is to provide an exposure apparatus capable of suppressing the exposure. In order to solve the above problem, the present invention employs the following configuration corresponding to FIGS. 1 to 13 shown in the embodiment.

A first aspect of the present invention is an exposure apparatus (EX) for exposing a pattern of a mask (R) to a substrate (P) by synchronously moving a mask (R) and a substrate (P). The moving object (50, 5) is installed between the light source (1) that emits the illumination light (EL) for illuminating the mask (R) and the mask (R), and moves following the movement of the mask (R). 2, 5 4), the first base (6, 59) on which the moving body (50, 52, 54) is arranged, and the first body (50, 52, 54) due to the movement of the moving body (50, 52, 54). 1 A vibration isolator (20) for suppressing or eliminating vibration transmitted to the frame (6, 59) is provided.

According to this aspect, since the vibration isolator for suppressing or eliminating the vibration transmitted to the first gantry by the movement of the moving body disposed between the light source and the mask is provided, the vibration of the first gantry is provided. Deterioration of exposure accuracy caused by the exposure can be suppressed, and accurate exposure processing can be performed. In addition, since the movement of the moving body can be accelerated and accelerated by suppressing the vibration, the throughput of the exposure processing can be improved.

Further, a second aspect of the present invention is an exposure apparatus for moving a mask and a substrate to expose a pattern of the mask on the substrate, wherein the exposure apparatus defines an illumination area of the mask and is movable. A first moving body; and a second moving body that moves in a direction opposite to a moving direction of the first moving body in accordance with the movement of the first moving body.

Further, a third aspect of the present invention is an illuminating device for illuminating a mask on which a pattern is formed, wherein the illuminating area of the mask is defined, and the movable first movable body and the first movable body are provided. The second moving body in the direction opposite to the moving direction of the first moving body in accordance with the movement of the first moving body. Equipped with a moving object

Brief Description of Drawings

FIG. 1 is a schematic configuration diagram showing an embodiment of the exposure apparatus of the present invention.

FIG. 2 is a plan view schematically showing a movable reticle blind.

FIG. 3 is a side view schematically showing a movable reticle blind.

FIG. 4 is a plan view showing an embodiment of the vibration isolator according to the present invention.

FIG. 5 is a diagram schematically showing a fixed reticle blind.

FIG. 6 is a schematic diagram showing a relationship between a mask and an illumination area set by a movable reticle blind and a fixed reticle blind.

FIG. 7 is a side view showing another embodiment of the vibration isolator according to the present invention.

FIG. 8 is a plan view of FIG.

FIG. 9 is a diagram illustrating an embodiment of a measurement device that forms a part of the adjustment device. FIG. 10 is a side view showing another embodiment of the vibration isolator according to the present invention.

FIG. 11 is a plan view showing another embodiment of the vibration isolator according to the present invention.

FIG. 12 is a side view showing another embodiment of the vibration isolator according to the present invention. FIG. 13 is a flowchart illustrating an example of a semiconductor device manufacturing process. BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, an exposure apparatus of the present invention will be described with reference to the drawings. However, the present invention is not limited to the following embodiments, and for example, the components of these embodiments may be appropriately combined.

In FIG. 1, an exposure apparatus EX includes a reticle stage RST supporting a reticle (mask) R, a substrate stage PST supporting a photosensitive substrate P, and a light source 1 for emitting a light beam for illuminating the reticle R; The luminous flux from the light source 1 is converted into the exposure light EL, and the reticle R supported by the reticle stage RST is illuminated with the exposure light EL.The illumination optical system IOP and the pattern image of the reticle R illuminated with the exposure light EL substrate A projection optical system PL for projecting onto the substrate P supported by the stage PST, and a control device CONT for controlling the overall operation of the exposure apparatus EX are provided. The second partial illumination optical system IOP2, which is a part of the illumination optical system IOP, which constitutes the main body section S that exposes the substrate P with the exposure light EL via the reticle R, the reticle stage RST, the projection optical system PL, The substrate stage PST and the like are supported by the main body column (second stand) 10. In the present embodiment, the exposure apparatus EX is a scanning type exposure apparatus that exposes the pattern formed on the reticle R to the substrate P while synchronously moving the reticle R and the substrate P in different directions (opposite directions) in the scanning direction. An example in which an apparatus (a so-called scanning stepper) is used will be described.

In the following description, the synchronous movement direction (running direction) of the reticle R and the substrate P in the horizontal plane is the Y-axis direction, and the direction orthogonal to the Y-axis direction (the non-scanning direction) in the horizontal plane is the X-axis direction. The direction orthogonal to the axis and the Y axis is defined as the Z axis. The directions around the X, Y, and Z axes are defined as 0 °, Θ and Ύ directions, respectively. Here, the “substrate” includes a semiconductor wafer or a glass plate coated with a resist.

As the light source 1, an ArF excimer laser light source that outputs pulsed ultraviolet light narrowed so as to avoid the oxygen absorption band between the wavelengths of 192 and 194 nm is used. The main body of the light source 1 is installed on a floor FD in a clean room of a semiconductor manufacturing plant via an anti-vibration unit 1A. The light source, as 1, may be used F ₂ laser light source for outputting a K r F excimer laser light source or the wavelength 1 5 7 nm pulsed ultraviolet light and outputs the pulse ultraviolet light having a wavelength of 2 4 8 nm. The light source 1 may be installed in another room (service room) having a lower degree of cleanliness than the clean room, or in a utility space provided under the floor of the clean room.

The illumination optical system IOP is composed of two parts, a first partial illumination optical system IOP1 and a second partial illumination optical system IOP2 provided between the light source 1 and the reticle stage RST (reticle R). ing. The first partial illumination optical system I OP 1 has a first illumination system housing (first frame) 6, and the second partial illumination optical system I OP 2 has a second illumination system housing (second frame) 8 have. Here, the first and second lighting system housings 6, 8 are Includes a housing for housing the partial illumination optical system and a lens barrel.

The first illumination system housing 6 of the first partial illumination optical system IOP 1 is installed via a vibration isolating unit 5 on a base plate (frame caster) BP that serves as a reference for a device mounted horizontally on the floor FD. I have. The second partial illumination optical system IOP 2 (second illumination system housing 8) is supported from below by a second support column 14 constituting the main body column 10.

The light source 1 is connected to one end (incident end) of the beam matching unit BMU via a light-blocking bellows and a pipe, and the other end (exit end) of the beam matching unit BMU is internally connected to a relay. It is connected to the first partial illumination optical system IOP 1 of the illumination optical system IOP via a pipe 2 having a built-in optical system. The beam matching unit BMU is equipped with a relay optical system and a plurality of movable reflecting mirrors, etc., and the narrow band pulsed ultraviolet light (A r) incident from the light source 1 using these movable reflecting mirrors and the like. The optical path of F excimer laser light) is positionally matched with the first partial illumination optical system IOP1.

First partial illumination optical system In the first illumination system housing 6 of the IOP 1, a variable attenuator, beam shaping optical system, optical integrator, condensing optical system, relay lens system, etc. are arranged in a predetermined positional relationship. ing. When the pulsed ultraviolet light from the light source 1 enters the first partial illumination optical system IOP 1 via the beam matching unit BMU and the relay optical system, the pulsed ultraviolet light is supplied to a predetermined part by the ND filter of the variable attenuator. After being adjusted to the peak intensity, the cross-sectional shape is shaped by the beam shaping optics so as to efficiently enter the optical integrator. Next, when this pulse ultraviolet light is incident on the optical integrator, a surface light source, that is, a secondary light source composed of a large number of light source images (point light sources) is formed on the emission end side. The pulsed ultraviolet light diverging from each of these many point light sources reaches the movable reticle brand 50 as exposure light EL.

The movable reticle blind (moving body) 50 includes movable blades (movable light-blocking members, moving bodies) 52 and 54 that regulate the illumination area of the exposure light EL to the reticle R. (Moving body housing unit) 59 The movable reticle blind 50 and the blind housing part 59 accommodating the movable reticle blind 50, It is mounted near the exit end of the first illumination system housing 6. The movable blades 52, 54 of the movable reticle plant 50 are arranged at positions substantially conjugate with the pattern forming surface (pattern surface) of the reticle R. Further, an anti-vibration device 20 is provided between the first illumination system housing 6 and the blind housing portion 59.

FIG. 2 is a plan view of the movable reticle blind 50 viewed from the + Z side, and FIG. 3 is a new side view.

The movable reticle blind 50 is arranged on the first illumination system housing 6 at intervals in the X direction, and extends in the X direction, and a pair of Y guides 51 extending in the Y direction, which is the scanning direction. A movable blade (movable light-blocking member) 52 whose one end is movable in the Y direction along the Y guide 51 is provided at both ends of the Y guide 51 in the Y-axis direction, and extends in the X-axis direction. A pair of existing X guides 53 and an X movable blade (movable light shielding member) 54 extending in the Y-axis direction and having one end movable in the X direction along the X guide 53 are provided. An air bearing 53 A, which is a non-contact bearing, is provided on the guide surface of the X guide 53, and the X movable blade 54 is non-contact supported by the X guide 53 by the air bearing 53A. ing. Further, at one end of the X movable blade 54, a mover 56A constituting a part of the linear motor 56 is provided, and corresponding to the mover 56A, a position aligned with the X guide 53 is provided. Is provided with a stator 56B extending in the X-axis direction. Here, the linear motor 56 may be a so-called moving magnet type linear motor in which the mover 56 A is a magnet unit and the stator 56 B is a coil cut, or the mover 56 A is a coil unit and the stator is A moving coil type linear motor using 56 B as a magnet unit may be used. Similarly, a non-contact air bearing 51 A is provided on the guide surface of the Y guide 51, and the Y movable blade 52 is supported by the air bearing 51 A in a non-contact manner with respect to the Y guide 51. Have been. At one end of the Y movable blade 52, a mover 55A that constitutes a part of the linear motor 55 is provided, and at a position aligned with the Y guide 51 corresponding to the mover 55A. A stator 55B extending in the Y-axis direction is provided. In the present embodiment, the stators 55B, 56B and the guides 51, 53 of the linear motors 55, 56 are fixed to the inner wall surface 59B of the blind housing portion 59. An encoder (not shown) is provided in the blind housing section 59, The linear scales provided on the moving blades 52 and 54 are read to detect the position and output to the control device CONT. The controller CONT drives the movable blades 52, 54 via the linear motors 55, 56 to adjust the size of the rectangular opening K that regulates the optical path through which the exposure light EL passes. Further, during scanning exposure, the controller CONT moves the Y movable blade 52 following the movement of the reticle R based on a detection signal of a reticle laser interferometer described later to regulate the illumination area on the reticle R. The reticle R is moved.

During scanning exposure, the movable blade driven is mainly the Y movable blade 52, which is a scan blade, and the X movable blade 54, which is a non-scan blade, is in the non-scanning direction (X-axis direction). In order to set the size of the illuminated area according to the width of the pattern forming area of the reticle R, it is only driven prior to scanning exposure. Therefore, in order to drive the X movable blade 54, a linear motor may be used, and an actuator having a stationary holding force such as an ultrasonic motor may be used. In addition, both the X movable blade 54 and the Y movable blade 52 drive the two blades on separate guides.However, a linear motor is placed on a common guide to drive the two blades. You may comprise.

The anti-vibration device 20 is disposed between a blind housing part 59 for accommodating the movable reticle blind 50 and the first illumination system housing 6. In the present embodiment, the vibration isolator 20 includes an air pad (air mount) 21 that is a cushioning material. As shown in FIG. 4, the air pad 21 is arranged annularly along the upper end surface 6A of the first lighting system housing 6. In the present embodiment, the internal space (optical path of the exposure light EL) 6B of the first illumination system housing 6 is formed in a rectangular shape, but may be in a circular shape. A pressure regulator 21 A is connected to the air pad 21, and the controller CONT can regulate the internal pressure of the air pad 21 by controlling the pressure regulator 21 A. By providing an air pad 21 as a cushioning material between the blind housing part 59 containing the movable reticle blind 50 and the first lighting system housing 6, the movable blades 52, 54 can be moved. The transmission of the vibration generated by the first illumination system housing 6 can be suppressed. That is, the reaction force accompanying the movement of the movable blades 52 and 54 is generated by the air pad 21 and the first lighting Transmission to the system housing 6 can be suppressed. It should be noted that an elastic body such as rubber may be arranged instead of the air pad 21 as a cushioning material constituting the vibration isolator 20. Alternatively, the air pad 21 and an elastic body such as rubber may be arranged in combination.

The second partial illumination optical system IOP 2 is a fixed reticle blind (fixed field stop) 80 housed in a predetermined positional relationship within the second illumination system housing 8, a lens, a mirror, a relay lens system, and a condenser lens system. Etc. are provided. The fixed reticle blind 80 is arranged on a surface slightly defocused from a conjugate plane with respect to the pattern forming surface of the reticle R near the incident end of the second illumination system housing 8, and defines an illumination area on the reticle R. It has a rectangular (slit-shaped) opening 81. As described above, the second partial illumination optical system IOP 2 constitutes a part of the main body S, and is arranged on the reticle R side of the movable reticle blind 50.

FIG. 5 is a plan view of a fixed reticle blind (fixed field stop) 80. FIG. The fixed reticle blind 80 is a slit extending linearly in the X-axis direction orthogonal to the moving direction of the reticle R during exposure (Y-axis direction) at the center in the circular field of view of the projection optical system PL. (Rectangular) opening 81. Note that instead of the fixed reticle blind 80, a variable slit device having a rectangular opening and capable of adjusting the shape of the opening to an arbitrary shape may be provided.

It should be noted that the defocusing of the fixed reticle blind 80 on the plane on which the reticle R is arranged slightly from the conjugate plane with respect to the pattern forming surface of the reticle R is performed in a scanning type exposure apparatus, particularly an apparatus using pulsed light as the exposure light EL in the scanning direction. The illuminance distribution in the illumination area on the reticle R of the pulsed UV light is trapezoidal (that is, a shape having slopes at both ends), and the distribution of the integrated light amount in each shot area on the substrate P during scanning exposure is In order to reduce the influence of the fixed reticle blind 80, the edges may be partially missing or not accurately formed straight. This is for appropriately blurring the periphery of the illumination area on the pattern formation area of the reticle R.

The pulsed ultraviolet light that has passed through the rectangular opening K formed by the movable blades 52, 54 of the movable reticle blind 50 passes through the opening 81 of the fixed reticle blind 80. Illumination with various intensity distributions. The pulsed ultraviolet light that has passed through the opening 81 of the fixed reticle blind 80 passes through a lens, mirror, relay lens system, condenser lens system, etc., and passes through a predetermined area on the reticle R held on the reticle stage RST. The illumination area (slit or rectangular illumination area extending linearly in the X-axis direction) is illuminated with a uniform illuminance distribution.

Returning to FIG. 1, the first illumination system housing 6 and the blind housing section 59 of the first partial illumination optical system IOP 1 and the second illumination system housing 8 and the main body column 1 of the second partial illumination optical system IOP 2 0 is independent with respect to vibration. In the present embodiment, the blind housing 59 and the second illumination system housing 8 are physically separated from each other with a slight separation. In addition, between the blind housing part 59 and the second lighting system housing 8, expansion and contraction as a connecting member that enables relative displacement between the two and allows the inside to be in an airtight state with respect to the outside air. It can be joined via a flexible bellows member. In this way, the vibration generated in the blind housing section 59 during the exposure operation due to the driving of the movable reticle blind 50 is transmitted to the second partial illumination optical system IOP 2 supported by the main body column 10. Can be prevented. The main body column 10 is composed of a plurality (four in this case) of support members 11 A to 1 ID provided on the base plate BP (however, the support columns 11 C and 11 D on the back side of the drawing are not shown) and The anti-vibration units 13 A to 13 D fixed on the upper parts of these support members 11 A to 11 D, respectively (However, in FIG. 1, the anti-vibration units 13 C and 13 D on the back side of the paper are (Not shown), a lens barrel base 16 supported substantially horizontally, a hanging column 18 hung downward from the lower surface of the lens barrel base 16, and a lens barrel base 16 First and second support columns 12 and 14 provided above are provided.

The lens barrel base 16 is made of an object or the like, and has a circular opening in a plan view at the center thereof, into which the projection optical system PL is inserted from above with its optical axis direction as the Z axis direction. Have been. A flange FLG integrated with the lens barrel is provided on the outer periphery of the lens barrel of the projection optical system PL. The material of the flange FLG is a material having a low thermal expansion, such as Inper (Inver; a low-expansion alloy composed of 36% nickel, 0.25% manganese, and iron containing trace amounts of carbon and other elements). The flange FLG is used to connect the projection optical system PL to the barrel The so-called kinematic support mount is supported at three points through the kinematics. The suspension column 18 includes a substrate base plate 60 and four suspension members 61 for suspending and supporting the substrate base plate 60 almost horizontally. The first support column 12 includes four legs 65 (surrounded by the projection optical system PL) on the top surface of the lens barrel base 16 (the legs on the far side of the drawing are not shown). The reticle base plate 63 is supported substantially horizontally by the legs 65 of the reticle. Similarly, the second support column 14 has four supports 62 provided on the upper surface of the lens barrel base 16 so as to surround the first support column 12 (the support on the back side of the paper is shown. (Omitted) and a top plate 64 supported almost horizontally by these four columns 62. The second partial illumination optical system IOP 2 described above is supported by the top plate 64 of the second support column 14.

The reticle stage R ST is arranged on a reticle base base 63 that forms the first support column 12 that forms the main body column 14. The reticle stage RST is driven by a reticle stage drive system including, for example, a magnetic levitation type two-dimensional linear actuator, and linearly drives the reticle R on the reticle base surface plate 63 with a large stroke in the Y-axis direction. At the same time, it has a configuration that enables micro drive in the X-axis direction and the ΘZ direction.

A moving mirror 71 that reflects a length measurement beam from a reticle laser interferometer 70 that is a position detecting device for measuring the position and the amount of movement of the reticle stage RST is attached to a part of the reticle stage RST. Reticle laser interferometer 70 is fixed to reticle base surface plate 63, and is fixed to reticle stage RST (that is, reticle R) with reference to fixed mirror 72 fixed to the side of the upper end of projection optical system PL. Detects the position in the XY plane including rotation.

Position information (or speed information) of reticle stage R ST (reticle R) measured by reticle laser interferometer 70 is output to control device CONT. The controller CONT controls the position information (or speed information) output from the reticle laser interferometer 70 so that it matches the command value (target position, target speed) (specifically, it follows the substrate stage PST). Control the reticle stage drive system.

Here, as the projection optical system PL, here, the object plane (reticle R) side and the image plane (substrate P) Both sides are telecentric, have a circular projection field, and are composed of only refractive optical elements (lens elements) made of quartz or fluorite as optical materials. 1/4, 1/5, or 1/6 reduction magnification Is used. For this reason, when the reticle R is irradiated with the pulsed ultraviolet light, the image forming light flux from the portion of the pattern formation area on the reticle R illuminated by the pulsed ultraviolet light enters the projection optical system PL, and the pattern portion The inverted image is limited to a rectangular shape (slit shape) at the center of the circular field on the image plane side of the projection optical system PL at each pulse irradiation of the pulsed ultraviolet light, and is formed. As a result, the partial inverted image of the projected pattern is reduced and transferred to the resist layer on the surface of one of the plurality of shot areas on the substrate P arranged on the imaging plane of the projection optical system PL. .

The substrate stage PST is arranged on the substrate base platen 60 constituting the above-mentioned hanging column 18 and is moved in the XY plane by a substrate stage drive system composed of, for example, a magnetic levitation type two-dimensional linear actuator. It is designed to be driven freely. The substrate stage PST holds the substrate P by vacuum suction or the like via the substrate holder PH. The XY position and the amount of rotation (the amount of rolling, the amount of pitching, and the amount of pitching) of the substrate stage PST are determined based on the reference mirror 75 fixed to the lower end of the barrel of the projection optical system PL. The measurement is performed in real time at a predetermined resolution by a substrate laser interferometer 73 that measures a change in the position of a movable mirror 74 fixed to a part. The measurement value of the substrate laser interferometer 73 is output to the control device CONT. The control device CONT controls the substrate stage drive system based on the measurement result of the substrate laser interferometer 73.

Next, the operation of the exposure apparatus EX having the above-described configuration will be described.

When the substrate P is transported onto the substrate stage PST and the focus adjustment is completed, positioning (alignment) between the reticle R and the substrate P is performed using an alignment system (not shown). In this way, when the preparatory operation for exposure of the substrate P is completed, the controller CONT controls the substrate stage drive system while monitoring the measurement value of the substrate laser interferometer 73 based on the alignment result, and controls the substrate stage drive system. The substrate stage PST is moved to a running start position for exposing the shot area set on P.

And the control device CONT is a reticle stage drive system and substrate stage drive The scanning of the reticle stage RST and the substrate stage PST in the Y-axis direction is started via the system. When the two stages RST and PST reach their respective target scanning speeds, the controller CONT starts illuminating the reticle R pattern formation region with the exposure light EL that is pulsed ultraviolet light.

Prior to the start of the scanning exposure, light emission of the light source 1 has been started, but as shown in the schematic diagram of FIG. 6, the controller CONT controls each movable blade 52 (54) of the movable reticle blind 50. Since the opening K (illumination area IA) is moved synchronously with respect to the reticle stage RST (that is, the reticle R) by moving, the irradiation of the exposure light EL outside the pattern formation area PA on the reticle R is prevented. It is shaded. In the example shown in FIG. 6, a light-shielding band MB is provided around the pattern forming area PA of the reticle R, and the illumination area IA set by the opening K of the movable reticle blind 50 has a size corresponding to the light-shielding band MB. The illumination area IB set by the opening 81 of the fixed reticle blind 80 has a slit shape extending in the X-axis direction.

The controller CONT operates such that the moving speed of the reticle stage RST in the Y-axis direction and the moving speed of the substrate stage PST in the Y-axis direction during the scanning exposure are maintained at a speed ratio corresponding to the projection magnification of the projection optical system PL. The reticle stage RST and the substrate stage PST are moved synchronously via the reticle stage drive system and wafer stage drive system. Even during the running exposure, the control device CONT drives the movable blade 52 of the movable reticle blind 50 to move the opening (illumination area IA) so as to follow the reticle R. Even if the movable blade 52 moves and generates vibration, the first lighting unit is provided by the air pad 21 serving as a cushioning material between the blind housing part 59 and the first lighting system housing 6. Transmission of vibration to the system housing 6 is suppressed. Then, the pattern formation area PA of the reticle R is sequentially illuminated with the exposure light E, and the illumination of the entire pattern formation area PA is completed, thereby completing the scanning exposure on the shot area on the substrate P.

As described above, the vibration transmitted to the first illumination system housing 6 by the movement of the movable blade 52 (54) arranged in the illumination optical system IOP is suppressed by the air pad 21 which is a cushioning material. As a result, it is possible to prevent exposure accuracy from deteriorating due to vibration of the first illumination system housing 6 (first partial illumination optical system IOP 1). And By suppressing the vibration, the movement of the movable blade 52 (54) can be accelerated and accelerated, and the scanning movement speed and acceleration of the reticle stage RST and substrate stage PST can be improved. Can be improved. Further, by forming the vibration isolator 20 from an air pad 21 or an elastic body such as rubber, vibration transmitted to the first illumination system housing 6 can be suppressed with a simple and inexpensive configuration.

In addition, since the blind housing part 59 is held so as to be finely movable in the YX direction with respect to the first illumination system housing 6, the movable element 5 connected to the movable blade 52 (54) according to the law of conservation of momentum. In accordance with the movement of 6 A in the + X direction (or one X direction), the whole of the stator 56B and the blind housing part 59 slightly move in the one X direction (or the + X direction). The reaction of the movable blade 52 (54) is offset by the movement of the stator 56B and the entire blind housing portion 59. That is, in the present embodiment, the stator 56 B and the entire blind housing portion 59 are counter masses that receive a reaction force when the movable blade 52 (54) moves. If the movement of the stator 56B and the entire blind housing portion 59 causes a small amount of error in the position of the movable blade 52 (54), the position is determined in advance and the movable blade drive command is issued. What is necessary is just to feed the signal.

In the present embodiment, the first illumination system housing 6 has been described as the first gantry. However, when a gantry supporting the first illumination system housing 6 is provided, the vibration isolator 20 Can be suppressed or eliminated.

In the above embodiment, the air pads 21 are provided in a ring shape (endless shape). However, a plurality of air pads 21 are formed in an island shape between the first lighting system housing 6 and the blind housing portion 59 (see FIG. (Discretely). In this way, by adjusting the internal pressure of each of the plurality of air pads 21 individually, the positional relationship between the blind housing 59 and the first lighting system housing 6 (the blind housing relative to the first lighting system housing 6). Part 59) can be adjusted. In the above embodiment, the description has been made such that the Y movable blade 52 moves in the Y axis direction and the X movable blade 54 moves in the X axis direction. (0 Z direction). Also, fixed retic The opening portion 81 of the blinds 80 may be rotatable in the θZ direction. Accordingly, even when the reticle R is misaligned during the scanning exposure, the opening K and the opening 81 can be accurately moved to follow the reticle R.

In the above embodiment, the moving body is not limited to the movable reticle blind 50. For example, during scanning exposure, the filter device may be driven (moved) to adjust the illuminance of the exposure light EL to the reticle R or to adjust the optical characteristics of the illumination optical system IOP. The present invention can be applied to suppress or eliminate vibration transmitted to the housing. That is, the present invention is applicable to all vibrations generated due to the movement of the moving body provided between the light source 1 and the reticle R.

Hereinafter, another embodiment of the present invention will be described with reference to FIGS. In the following description, the same reference numerals are given to the same or equivalent components as those in the above-described embodiment, and the description thereof will be simplified or omitted.

As shown in FIGS. 7 and 8, the vibration isolator 20 includes a plurality of (four) piezo elements provided at predetermined positions between the first illumination system housing 6 and the blind housing part 59. 22 and a plurality of air pads 21 provided between the plurality of piezo elements 22. In addition, vibration sensors (acceleration sensors) 23 are attached to a plurality of predetermined positions of the blind housing portion 59. The role of the vibration sensor 23 will be described below. For example, vibrations transmitted from the floor FD to the blind housing unit 59 via the first illumination system housing 6 and signals for driving the movable blades 52, 54 are transmitted to the linear motors 55, 56. The ideal thrust may not be given to the movable blades 52 and 54 depending on the tension of the given signal cable. For example, when the thrust is too large, the blind housing portion 59 vibrates to a predetermined value or more. The vibration sensor 23 detects such a vibration having a predetermined value or more and sends a signal to the control device CONT. The control device CONT applies a driving voltage based on the detection result of the vibration sensor to each of the piezo elements 22 when the vibration sensor 23 detects the vibration that is equal to or more than a predetermined allowable value. The piezo element 22 is displaced. As a result, a desired thrust is applied to the movable blades 52, 54, and the movable blades 52, 54 are driven with high precision. It becomes possible.

Although the piezo element 22 is used here, it is a matter of course that any vibration-reducing actuator other than the piezo element 22 can be used. Although four piezo elements 22 are provided here, at least three piezo elements 22 may be provided.

Further, as shown in FIG. 9, a measuring device 100 for measuring the position of the blind housing portion 59 with respect to the first illumination system housing 6 can be provided. The measuring device 100 is a surface on the + X side of the blind housing part 59, on the one Z side of the L-shaped member 163 protruding outward (this surface is a surface substantially parallel to the XY plane). OA and the metal plate 16 fixed to the + X side of the L-shaped member 16 3 (this surface is almost parallel to the YZ plane) 0 B and L-shaped mounting members 16 2 projecting outward on the + X side of the first lighting system housing 6 so as to face these metal plates 16 0 A and 16 0 B, respectively. It has two eddy current displacement sensors 16 1 A and 16 1 B attached. In the eddy current displacement sensors 16 A and 16 B, an AC voltage is applied to a coil wound on an insulator, and when the sensor is brought close to a measuring object made of a conductor (in this case, a metal plate), the coil is operated by the coil. An eddy current is generated in the conductor by the applied alternating magnetic field. The magnetic field generated by this eddy current is in the opposite direction to the magnetic field created by the coil current, and these two magnetic fields overlap and affect the output of the coil, and the intensity and phase of the current flowing through the coil change. Change. This change becomes larger as the measurement target is closer to the coil and becomes smaller as the measurement target is farther from it. Conversely, the position and displacement of the measurement target can be known by extracting electric signals from the coil. Therefore, if the eddy current displacement sensors 161A and 161B are used, the position and displacement of the measurement target can be measured even when both are stationary, that is, the absolute distance can be measured.

The control device CONT drives the piezo element 22 based on the measurement result of the measuring device 100. By doing so, the movable blades 52, 54 can be driven with high accuracy without the movement accuracy of the movable blades 52, 54 being deteriorated by disturbance. That is, when only the air pad 21 is disposed between the first lighting system housing 6 and the blind housing part 59, it is not possible to suppress the vibration transmitted from the blind housing part 59 to the first lighting system housing 6. Possible, but not affected by disturbances Therefore, the position (posture) of the movable reticle blind 50 may be displaced. In this case, there is a possibility that the illumination area on the reticle R cannot be defined in a desired state. However, by using a piezo element (actuator) 22 to eliminate the excessive vibration of the blind housing section 59, the influence of disturbance is suppressed, and the illumination area is defined on the reticle R in a desired state. be able to.

In the present embodiment, the control device CONT measures the position of the blind housing portion 59 with respect to the first illumination system housing 6 with the measuring device 100, and drives the piezo element 22 based on the measurement result. However, the position of the second illumination system housing 8 with respect to the blind housing part 59 (the first illumination system housing 6) is measured by the measuring device 100, and the piezo element 22 is driven based on the measurement result. You can do it.

The control device CONT detects a displacement of the blind housing part 59 with respect to the base plate BP and the second illumination system housing 8 based on detection signals of the vibration sensor 23 and the measuring device 100, and detects the displacement. The result may be fed back to the position control of the movable blade 52 (54). Thereby, even if the first illumination system housing 6 is displaced from the second illumination system housing 8, the movable blade 52 (54) can follow the reticle R with high accuracy. In addition, a measuring device for directly measuring the displacement of the first lighting system housing 6 with respect to the second lighting system housing 8 is provided separately, and a detection signal from this measuring device is used to control the position of the movable blade 52 (54). You may give feedback.

FIG. 10 is a diagram showing another embodiment of the present invention. In this embodiment, the air pad 21 is not provided, the blind housing part 59 is connected to the first lighting system housing 6, and the blind housing part 59 is a part of the first lighting system housing 6. Is composed. The stator 56B (55B) of the linear motor 56 (55) that drives the movable blade 54 (52) is connected to the blind housing by the air bearing 25, which is a non-contact bearing. It is supported in a non-contact manner with the inner wall surface 59 B of 59. Therefore, the stator 56B moves in the −X direction (+ X direction) in accordance with the movement of the mover 56A connected to the movable blade 54 in the + X direction (or one X direction) according to the law of conservation of momentum. Moving. The movable blade 5 is moved by the movement of the stator 5 6 B. The reaction force accompanying the movement of 4 is offset. That is, in the present embodiment, the stator 56B is a counter mass that receives a reaction force when the movable blade 54 moves. Thus, the vibration transmitted to the first illumination system housing 6 (blind housing part 59) due to the movement of the movable blade 54 can be suppressed.

By using the stator 56B (55B) as a counter mass, even if the air pad (absorbing material) 21 and the piezo element 22 for active vibration isolation are not provided, the vibration isolation effect can be obtained. However, it is also possible to combine a counter mass with an air pad (or piezo element). Further, the stator 55B is also supported in a non-contact manner with respect to the inner wall surface 59B, and has a function as a counter mass.

FIG. 11 is a schematic view showing another embodiment of the present invention.

In FIG. 11, the same members as those shown in FIG. 2 are denoted by the same reference numerals. This embodiment is different from the embodiment shown in FIG. 2 in that two balancers 90 having a function of a counter mass receiving a reaction force when the movable blade moves are added. As shown in FIG. 11, the balancer 90 is provided on a linear motor 91 extending in the Y direction, and can move on the linear motor 91. The two linear motors 91 are arranged at the same distance from the pair of linear motors 55. The driving of the dancer 90 is controlled by the control device C ON T, and moves in the direction opposite to the moving direction with the movement of the movable blade 52. When the weight of the balancer 90 is set to be four times the weight of the movable blade 52, the travel distance of the balancer 90 can be set to 1 Z 4 with respect to the travel distance of the movable blade 52. Since the balancer 90 and the linear motor 91 are provided in the blind housing section 59, respectively, the reaction force accompanying the movement of the movable blade 52 is offset in the blind housing section 59, and the first lighting Transmission to the system housing 6 can be suppressed.

In addition, due to the space in the blind housing portion 59, for example, one linear motor 91 can be brought closer to the linear motor 55 along the X direction. In this case, the thrust of the closer balancer 90 needs to be increased in proportion to the distance from the linear motor 55.

If the weight of the balancer 90 cannot be changed, the balancer 90 is activated to change the acceleration of the balancer 90 and cancel the reaction force of the movable plate 52. Adjust the thrust to be generated.

In the embodiment shown in FIG. 11, the Y guide 51 and the linear motor 55 are provided for each of the two movable plates 52, but the stator 55 of the Y guide 51 and the linear motor 55 is shared. Is also good. Specifically, the upper Y guide 51 and the stator 55B in FIG. 11 are omitted, and the two movable blades 52 are guided by the lower Y guide 51 and the two movable plates 52 are driven. In this case, the stator 55B of the lower linear motor in FIG. 11 may be shared. In this case, the thrust applied to the upper balancer 90 in FIG. 11 may be reduced in proportion to the distance from the lower linear motor 55.

FIG. 12 is a schematic diagram showing another embodiment of the present invention. In FIG. 12, the stator 56B (55B) of the linear motor 56 (55) is separated from the inner wall surface 59B of the blind housing part 59, and the floor FD (or Supported by base plate BP). That is, the blind housing part 59 and the first illumination system housing 6 connected thereto and the support member 28 supporting the stator 56B are separated (independent) with respect to vibration, and are connected to the movable blade 54. The reaction force accompanying the movement of the mover 56A is transmitted to the floor FD (base plate BP). In this way, the reaction force caused by the movement of the movable blade 54 (52) is released to the floor FD, which is vibrated and separated from the first illumination system housing 6 (blind housing portion 59), so that the first illumination Vibration can be prevented from being transmitted to the system housing 6. Here, since the first illumination system housing 6 is supported on the base plate BP via the vibration isolating unit 5, vibrations released to the floor FD (or the base plate BP) via the support member 28 are not affected. 1 Not transmitted to lighting system housing 6.

In each of the above embodiments, the use of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing semiconductors or an exposure apparatus for liquid crystal for exposing a liquid crystal display element pattern on a square glass plate. It is widely applicable to exposure equipment for manufacturing heads.

As projection optical system PL, using a material which transmits far ultraviolet rays such as quartz and fluorite as the glass material when using a far ultraviolet ray such as an excimer laser, use of F ₂ laser and X-ray If it is, use a catadioptric or refractive optical system (use a reflective type mask as the mask), and if an electron beam is used, use an electron optical system consisting of an electron lens and a deflector as the optical system. Good. It goes without saying that the optical path through which the electron beam passes is in a vacuum state.

When a linear motor is used for the substrate stage PST and the mask stage MS, either an air levitation type using an air bearing or a magnetic levitation type using Lorentz force or reactance force may be used. The stage may be of a type that moves along a guide or a guideless type that does not have a guide.

When a planar motor is used as the stage drive, either the magnet unit (permanent magnet) or the armature unit is connected to the stage, and the other of the magnet unit and the armature unit is placed on the moving surface side (base) of the stage. It may be provided.

The reaction force generated by the movement of the substrate stage PST, even if it is mechanically released to the floor (ground) using a frame member, as described in JP-A-8-166475 Good. The present invention is also applicable to an exposure apparatus having such a structure.

The reaction force generated by the movement of the mask stage MST, even if it is mechanically released to the floor (ground) using a frame member, as described in JP-A-8-330224. Good. The present invention is also applicable to an exposure apparatus having such a structure.

The exposure apparatus EX of the present embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done. To ensure these various precisions, before and after this assembly, adjustments to achieve optical precision for various optical systems, adjustments to achieve mechanical precision for various mechanical systems, various Electric systems will be adjusted to achieve electrical accuracy.

The process of assembling the exposure apparatus from various subsystems includes mechanical connections, wiring connections of electric circuits, and piping connections of pneumatic circuits among the various subsystems. It goes without saying that there is an individual assembly process for each subsystem before the assembly process from these various subsystems to the exposure apparatus. Assembling various subsystems into exposure equipment When the process is completed, the overall adjustment is performed, and various precisions of the entire exposure apparatus are secured. It is desirable that the exposure apparatus be manufactured in a clean room where the temperature and cleanliness are controlled.

As shown in Figure 13.3, a semiconductor device has a step 201 for designing the function and performance of the device, a step 202 for manufacturing a mask (reticle) based on this design step, and a device base. Manufacturing substrate (wafer, glass plate) as substrate Step 203, substrate processing step 204 for exposing mask pattern onto photosensitive substrate P using the exposure apparatus of the above-described embodiment, device assembly step (dicing) (Including process, bonding process, package process) 205, inspection step 206, etc. Industrial potential

The present invention is an exposure apparatus for exposing a pattern of the mask onto the substrate by synchronously moving the mask and the substrate, wherein a light source that emits illumination light for illuminating the mask is disposed between the light source and the mask. A moving body that moves following the movement of the mask; a first gantry on which the moving body is arranged; and a prevention mechanism that suppresses or eliminates vibration transmitted to the first gantry by the movement of the moving body. Since it is provided with a vibration device, accurate exposure processing can be realized. Further, by suppressing the vibration, the movement of the moving body can be accelerated and the acceleration can be increased, so that the throughput of the exposure processing can be improved.

Claims

The scope of the claims

1. An exposure apparatus that synchronously moves a mask and a substrate to expose the pattern of the mask to the substrate,

A moving body that is provided between a light source that emits illumination light for illuminating the mask and the mask, and that moves following the movement of the mask;

A first gantry on which the moving body is arranged;

A vibration isolator that suppresses or eliminates vibration transmitted to the first gantry due to movement of the moving body.

2. The exposure apparatus according to claim 1, wherein

The moving body is a movable light shielding member that regulates an illumination area of the illumination light.

3. The exposure apparatus according to claim 2, wherein

The movable light shielding member is arranged at a position substantially conjugate with the pattern surface of the mask.

4. The exposure apparatus according to claim 1, wherein

The anti-vibration device includes a cushioning member disposed between a moving body housing for accommodating the moving body and the first gantry.

5. The exposure apparatus according to claim 4, wherein

The cushioning material includes an air pad.

6. The exposure apparatus according to claim 4, wherein

The cushioning material includes an elastic body.

7. The exposure apparatus according to claim 4, wherein

An adjusting device is provided between the moving body housing and the first frame, and adjusts a positional relationship between the moving body housing and the first frame.

8. The exposure apparatus according to claim 1, wherein

The anti-vibration device has a counter mass that receives a reaction force when the moving body moves.

9. The exposure apparatus according to claim 8, wherein

The moving body is held in non-contact with the moving body housing part, and the counter mass includes the moving body housing part.

10. The exposure apparatus according to claim 1, wherein

A main body for exposing the substrate with the illumination light through the mask,

A second frame on which the main body is disposed,

The first mount and the second mount are independent with respect to vibration.

11. The exposure apparatus according to claim 10, wherein

The main body has a fixed field stop that defines an illumination area of the illumination light.

12. The exposure apparatus according to claim 10, wherein

The main body has a projection optical system that projects the illumination light through the mask onto the substrate.

13. The exposure apparatus according to claim 1, wherein

An illumination optical system that illuminates the mask with the illumination light,

The moving body is arranged in the illumination optical system.

14. The exposure apparatus according to claim 10, wherein

The moving body is disposed in the illumination optical system,

A part of the illumination optical system disposed on the mask side of the moving body is the main body. Is provided in the department

15. An exposure apparatus that moves a mask and a substrate to expose the pattern of the mask onto the substrate,

A movable first movable body that defines an illumination area of the mask;

A second moving body that moves in a direction opposite to a moving direction of the first moving body in accordance with the movement of the first moving body.

16. The exposure apparatus according to claim 15, wherein

The weight of the second moving body is larger than the weight of the first moving body.

17. The exposure apparatus according to claim 15, wherein

The first moving body and the second moving body are supported by a common gantry.

18. The exposure apparatus according to claim 15, wherein

A driving device for driving the second moving body.

1 9. A lighting device for illuminating a mask on which a pattern is formed,

A movable first movable body that defines an illumination area of the mask;

20. The lighting device according to claim 19, wherein

21. The exposure apparatus according to claim 19, wherein

22. The exposure apparatus according to claim 19, wherein A driving device for driving the second moving body.