WO2004114378A1 - Clean unit, clean unit system, functional unit, functional unit system, material treatment method, element manufacturing method, cell line culturing method, and plant body culturing method - Google Patents

Abstract

A clean unit system formed by connecting, to each other, a plurality of clean units in which connection parts are installed at at least one of the rear part, upper part, and lower part and at least one of the side parts thereof of a working chamber allowed to maintain in clean environment in a broken line-like arrangement or a loop-like arrangement according to a process to be performed. A small process device and a small observation device are installed on each clean unit.

Description

 Clean unit, clean unit system, functional unit, functional unit system, material processing method, element manufacturing method, cell line growing method and plant growing method

Technical field

 The present invention relates to a clean unit, a clean unit system, and a functional description.

Units, functional unit systems, material processing methods, element manufacturing methods, cell-based cultivation methods, and plant cultivation methods

It is suitable for the production of various types of functional elements and the modification of plant factories or plant traits.

Background art

 Conventionally, electronic devices such as semiconductor LSIs and liquid crystal displays. Clean rooms for manufacturing electronic devices, clean rooms for biotechnology and food, and plant factories that use artificial light sources used large box-shaped spaces as a whole. As a result, there were problems such as large-scale, high-cost, expensive equipment, ineffective turning, and unoptimized plant growth.

For example, the production of high-performance devices such as semiconductor devices represented by super LSIs begins with material input, film formation, photolithography using UV (ultraviolet) or EUV (extreme ultraviolet), and electron beam lithography. There is a need for an integrated process that leads to product output through various processes such as lithography, etching, and heat treatment. This manufacturing process has traditionally included a film deposition system, a lithography system, an etching system, and a heat treatment system that were placed in a large, highly controlled clean room. It has been realized by transferring substrates between any large, expensive and highly precise manufacturing equipment. Therefore, the conventional production of high-performance devices not only requires constructing a huge building on a vast land, but also is based on the equipment industry that produces various types of manufacturing equipment. Similar problems also arise in the bioclean and food processing cleanrooms if the above manufacturing equipment is replaced with equipment related to biotechnology and food processing.

 For these reasons, in general, manufacturing ventures, such as nanotech benches and bio ventures, require heavier capital expenditures, such as fixed assets, than IT ventures, resulting in a higher break-even point, and a rise in corporate profitability. The probability of success was not high. This has generally been deeply concerned as the "death valley" lying between basic research and industrialization. · '

 In other words, in the conventional industry that manufactures high-performance devices, the burden of capital investment and maintenance of fixed assets is large compared to the IT industry, especially the software industry, and it is difficult for the manufacturing industry benchmarker that mainly engages in nanotechnology to emerge. It can be said that there is a situation.

 From the paradigm that nanotechnology should be able to open its true potential, the giant precision infrastructure and equipment are required for the advancement of element miniaturization, as represented by Moore's law for LSI. It is necessary to break away.

However, as described below, inexpensive, small-scale, small-scale manufacturing equipment or mini-fabrication systems that enable the creation of hardware benchers that have a low burden of maintaining fixed assets as well as software benchers There are no known, particularly effective proposals for production equipment that does not require a clean room. Technologies that provide a clean work space without using a clean room have been proposed.

 For example, as a work table that enables work in a clean environment, a work table that takes in outside air from an opening in the work space, filters this air through a filter, and blows out the work space from the top of the work space, A communication path is provided on the side or the back of the work space for communicating the work space with the outside, an object storage space is formed in the communication path, and opening and closing means for separating the outside and the work space are provided on both sides of the object space. It has been proposed (Japanese Unexamined Patent Application Publication No. 2-15984 (Reference 1)).

 In addition, there has been proposed a clean bench that operates in a dust-free state, in which an opening having a chucking mechanism is provided on a side surface to enable connection of a plurality of clean benches (Japanese Patent Application Laid-Open No. H11-1716). No. 46 (Reference 2)). ,

 In addition, this is a box that can be moved with a clean environment inside.This box is equipped with a plurality of filters and a blower.A coarse filter and a high collection filter are provided in the upper part, and a lower part is provided in the lower part. A scouring plate and a lower filter are provided, an opening / closing lid is provided on one side for inserting and removing a workpiece, a glove is provided on the other side, and the blower is provided between the coarse filter and the high collection filter. There has been proposed a portable clean box provided with a portable telephone (Japanese Unexamined Patent Publication No. 2-107384 (Reference 3)).

 In clean bottas for processing and handling infectious pathogens, a clean box with a heat sterilizer is proposed, which has multiple heating tubes for sterilization and means for forcibly sending air from the work box into the heating tubes. (Japanese Utility Model Application Publication No. 51-156692 (Reference 4)).

In addition, an outlet is formed on one side of the box-shaped casing, and special inlets are formed on at least two sides of the other side. A gas purifier having a fan that discharges from the outlet and a filter that purifies gas discharged from the outlet in the casing, and a fixture for a lid for selectively closing each of the inlets. A unit has been proposed (Japanese Utility Model Laid-Open No. 61-145240 (Reference 5)).

 Further, a production apparatus for a production line of clean space technology in which a plurality of compartments are connected has been proposed (Japanese Patent Application Laid-Open No. 3-7838 (Reference 6)).

 In addition, a so-called clean tunnel, in which a number of clean modules are connected to form a clean space, has been proposed (Patent No. 2517112 (Patent Document 7)). This is a device designed to minimize the destruction of the clean environment by inserting dividers between clean modules to minimize external opening.

 In addition, a plurality of clean venturites are airtightly connected by a connecting means, and a work space in each clean venturi is connected so that an airtight passage having a clean room environment is formed in a lengthwise adjustable manner. One bench module system has been proposed (Japanese Patent Application Laid-Open No. 5-157302 (reference 8)).

In addition, Japanese Patent Application Laid-Open No. Hei 6-267806 (Reference 9) describes a multi-chamber apparatus composed of modules. The specification of Japanese Patent No. 3116675 (Reference 10) describes a semiconductor laser, and is a summary of the research of 83rd FY2001, p. 1-26, Kanagawa Academy of Science and Technology. , Published on July 10, 2004 (Reference 11), describes a microchemical reactor Yuichi. Also, MR Schroeder, Fractal s, cnaos, power laws: minutes irom an in finite te paradi se ", WH Freeman and Company, NY., 1990, p. 11 (Reference 1 2) describes a Hilbert curve.

 Some of the clean units, such as the workbench, clean bench, clean box, and glove box, proposed in References 1 to 8 above can provide a class 10 clean environment. It was necessary for the unit itself to be placed in a certain degree of clean environment (approximately class 1000), and these single clean units could only complete closed work inside.

 Literatures 1, 2, 6, 7, and 8 above propose to connect multiple clean units in order to perform multiple processes while maintaining a clean environment. Only a single linear arrangement connecting the left and right directions. For this reason, connecting as many cleanunits as necessary for a complete series of processes requires a long installation space in that direction, and the length of the building containing this cleanunit system is correspondingly long. I had to get bigger.

 The multi-chamber device described in the above-mentioned Reference 9 can only connect in one direction for each module, and is poor in scalability and flexibility in connection between modules.

Also, during the entire series of processes, from the most upstream process to the most downstream process, for example, processes such as resist coating, mask alignment, exposure, development, and etching are repeated with other processes interposed Often appear. In such a case, if a number of clean units that perform these processes are connected in the single linear arrangement described above, the number of clean units that constitute the clean unit system becomes enormous. However, the same manufacturing equipment can be reused, which is advantageous. You can't escape the spell of capital investment.

 In addition, while maintaining a single linear clean unit arrangement, if we try to perform the same clean unit over and over again for the same kind of process, the above-mentioned single linear unit In the arrangement of the clean unit in this area, it is necessary to move back and forth between the upstream clean unit and the downstream clean unit many times, and the work efficiency is not significantly reduced. In addition, an unexpected accident such as dropping may occur when transferring an object such as a substrate through the connection between the clean units, and the yield may be reduced.

 Therefore, the problem to be solved by the present invention is, in view of the above-mentioned situation, a large-scale and ineffective turn as in the past, without using a huge clean room that requires huge capital investment and fixed asset burden. Clean environment can be obtained easily, and the inefficient use of space of the conventional clean unit, which can be connected only in a straight line, is solved. In addition, it can maximize the effective use of the room area, and can easily execute the process with high flexibility and low cost, corresponding to a total series of process flows according to the purpose. It is an object of the present invention to provide a clean unit system capable of performing the above and a clean unit suitable for use in the clean unit system. The problem to be solved by the present invention is, more generally, the above-mentioned clean unit system as a subset of the above, so that a wider range of internal environmental parameters (eg, temperature, humidity, gas components, lighting It is an object of the present invention to provide a function unit system capable of controlling the operation of a vehicle, and a function unit suitable for use in the system.

Another problem to be solved by the present invention is that a complete series of technologies covering fields such as nanotechnology, biotechnology, and plant factory technology. An object of the present invention is to provide a material processing method capable of easily executing a material processing process at a low cost with high flexibility in accordance with a process flow.

 Still another object of the present invention is to provide a device manufacturing method capable of easily performing a device manufacturing process with high flexibility at a low cost in accordance with a total series of process flows. It is in.

 Still another problem to be solved by the present invention is a cell system capable of easily performing a cell system cultivation process with high flexibility at a low cost in accordance with a total series of process flows. The aim is to provide a training method.

 Still another object of the present invention is to provide a plant cultivation method that can easily perform a plant cultivation process with high flexibility at a low cost in accordance with a total series of process flows. It is to provide a method.

 The final problem to be solved by this invention is to integrate technologies in each field, such as nanotechnology, biotechnology, and plant factories, which were conventionally performed in completely separate buildings and rooms, on a single integrated platform. An object of the present invention is to provide an environment that can be integrally processed.

 The above and other objects will become apparent from the following description of the present specification with reference to the accompanying drawings. Disclosure of the invention

 In order to solve the above problems, the first invention is:

 A work room that can maintain a clean environment,

At least one of the rear, upper and lower parts of the A clean unit characterized by having at least one connecting portion provided on each side.

The location of the workroom connections at the rear, top, bottom and two sides depends on how the clean unit is arranged in two dimensions (planar) or three dimensions (stereo). It is appropriately determined according to the situation. For example, if the clean unit is located in a horizontal plane, the connections should preferably be located at the rear and both sides of the work chamber to increase the degree of freedom of the connection and to increase the flexibility of the clean unit system. Each is provided. In this case, it is possible to connect a total of three clean units to the rear and both sides for one clean unit. In addition, when the clean unit is placed in a vertical plane, the connecting unit is preferably provided at the upper or lower part of the work room and in order to increase the degree of freedom of connection and increase the flexibility of the clean unit system. It is provided on each side. In this case, one clean unit can be connected to a total of three clean units at the top or bottom and both sides. The connecting portion generally has an opening provided in the wall of the working room and a blocking plate provided to open and close the opening. This blocking plate may be basically any type as long as it can be opened and closed, but is typically a sliding door or a door. The opening and closing of the shut-off plate may be performed manually, or a sensor such as an optical sensor may be installed inside the work room, and a shut-off plate opening / closing mechanism shall be provided so that when an operator's hand or sample approaches the shut-off plate It may be opened and closed automatically. In the case where a transfer mechanism such as a belt conveyor is provided in the work room and the sample is transferred between the entrance and the exit by this transfer mechanism, when the sample is transferred to the vicinity of the exit by the transfer mechanism, This may be detected by a sensor and the blocking plate may be opened and closed by an opening and closing mechanism. In the shut-off plate or work room A seal member such as a packing may be provided on the wall surface to enhance airtightness at the time of shutoff.

The working room depends on what kind of work (or process) is performed in it, but it is typically used when performing chemical processes, chemical reactions, crystal growth, bioprocesses, etc. in a clean environment. Has an exhaust duct and a passive dust filter with no blast power. These exhaust ducts and dust filters are typically installed at the top of the work room. In this case, the clean unit is generally a closed type, but is not limited to this. In contrast, when performing non-chemical processes (eg, physical measurement with a surface probe microscope, inspection, or assembling (assembly) work) in the work room, the work room is typically used for pressure control. It has an active dust filter that has ventilation holes and ventilation power (for example, HEPA filter and ULPA filter). Typically, the dustproof filter is provided at the upper part of the work room, and the ventilation hole is provided at the lower part of the side wall of the work room. In this case, in general, the clean unit is an open system type in which the internal pressure of the working room is controlled by a ventilation hole, but is not limited to this. A work room may be provided with one or more holes for the purpose of passing wiring, etc., in addition to ventilation holes for pressure control. The effluent from the work chamber is configured so that after passing through the adsorber and / or abatement device, it enters the inlet of the active dust filter and, preferably, to the adsorber and / or abatement device. By providing an exhaust duct connected to the outside world, harmful particles and the like contained in the gas are adsorbed, or harmful gas is detoxified before being discharged to the outside, so that harmful particles and toxic gas Bioprocesses involving development of cells (such as cell culture, cell fusion, genetic modification, plant growth, Etc.) and chemical processes. In addition, by configuring the gas flowing out from the ventilation holes to enter the entrance of the active dustproof filter, it is possible to significantly improve the cleanliness of the work room while using the same dustproof filter. From the viewpoint of improving the cleanliness of the working room, most preferably, all (100%) of the gas flowing out from the ventilation holes of the working room is configured to enter the entrance of the active dustproof filter. However, it is not always necessary to do so, and an effect can be obtained simply by configuring so that a part of the gas flowing out enters the entrance of the active dust filter. Typically, a gas-tight tube directly connected to the working room is connected to the entrance of the active dust-proof filter so that the gas is circulated and air-tight. The work room has work gloves as needed, which are usually provided at the front of the work room.

 The clean unit is, for example, a nanotechnology-process unit or a biotechnology-process unit, and can be used for various processes.

 Clean units include, but are not limited to, drafts, clean benches, glove boxes, and the like.

The shape of the work room of the clean unit may be various shapes and is selected according to needs. It may have a body shape, a cylindrical shape, or the like. The size of the interior of the working room is basically determined appropriately by design according to the purpose of use, etc. In order to be able to carry out work (such as performing processes and performing maintenance such as cleaning), it is necessary to insert a hand from outside into the work room. It is desirable to have a size that can cover almost the entire work space. Generally, the width, height, and depth are all selected within lm. On the other hand, if the size of the working room is too small, it may hinder the work, so it is generally selected to be about 30 cm or more. When it is not necessary to work inside the working room from outside, for example, to automate the work, the size of the working room can be made smaller.

 The working room may be made of a plate-shaped hard member, or may be made of a balloon or balloon-shaped soft material.

 Compact equipment can be housed inside the clean unit according to the purpose of use. Specifically, this apparatus includes, for example, various types of process equipment, lapping equipment, and analysis equipment (for example, scanning microscopes such as an optical microscope, a scanning electron microscope (SEM), and an atomic force microscope (AFM)). Probe microscope (SPM), reaction equipment, micro chemical system, micro chemical reactor, exposure equipment, etching equipment, growth equipment, processing equipment, sterilization equipment, particle size filter, artificial light source, bio equipment, food processing equipment, inspection Devices, driving devices, etc. As an artificial light source, when growing a cell line or a plant, a light emitting diode or a semiconductor laser having a spectral half width of 30 nm or less, particularly a pulse-driven semiconductor laser is preferably used. .

 The second invention is

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, at least one of the plurality of clean units is provided with:

 A work room that can maintain a clean environment,

At least one of the rear, upper and lower parts of the At least one connecting portion is provided on each side.

 The multiple clean units have a working room, all of which can be maintained in a clean environment, and at least one and at least one of the rear, upper and lower parts of the working room, respectively. It may be a clean unit having a provided connecting portion, or may be a mixture of this clean unit and a conventional clean unit that can be connected only in the left-right direction.

 The clean unit system may be, for example, a clean unit in a non-single linear arrangement, a bent-line arrangement in the left / right direction or up / down or front / back direction, a branch arrangement, a loop arrangement, or an arrangement in which two or more thereof are mixed. May include connected parts, and may be in their entirety in a non-single linear arrangement, a polygonal arrangement, a branch arrangement, a loop arrangement or a mixed arrangement. Here, the polygonal arrangement has at least one bend, but preferably has two or more bends. An example with one bend is an L-shape. The term “bend” used herein includes not only a non-continuous turn, such as a right-angle turn, but also a continuous or smooth turn. Therefore, for example, a case having two bends also includes a case where a U-shaped bend is formed. The above description regarding the polygonal arrangement is the same in the following.

 The above-mentioned clean unit having a working room capable of maintaining a clean environment, and at least one of a rear part, an upper part and a lower part of the working chamber, and at least a connecting part provided on at least one side, respectively. What is stated in relation to the first invention holds.

 The third invention is

Multiple clinics with working rooms that can maintain a clean environment A clean unit system in which run units are connected to each other, wherein the clean unit system includes a portion in which the clean units are connected in a non-single linear arrangement or a broken line arrangement.

 The fourth invention is

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, at least one of the plurality of clean units is connected to a plurality of connecting units. Wherein the plurality of connecting portions include at least two connecting portions in which directions in which the sample passes through the connecting portions are non-parallel to each other or orthogonal to each other.

 The fifth invention is

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, at least one set of adjacent clean units among the plurality of clean units has one side. The direction in which the sample passes through the outlet of the clean unit and the direction in which the sample passes through the inlet of the other clean unit are non-parallel or orthogonal to each other. The sixth invention is

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, the clean units are connected in a polygonal arrangement so as to fit in a predetermined limited area. It is assumed that.

 The seventh invention is

In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, the clean unit includes a portion in which the clean units are connected in a loop configuration. It is a sign.

 The eighth invention is

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, the plurality of clean units may include a plurality of types of clean units connected in a mosaic arrangement. It is a feature.

 Here, the plurality of clean units include, for example, a draft, a clean bench, a glove box, and the like. Looking at the processes to be performed, the multiple clean units include chemical process units, non-chemical process units, and bioprocess units. The plurality of clean units may include, for example, a portion where the clean units are connected in a loop configuration.

 The ninth invention is:

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, a process of the same type that appears multiple times in a total series of process flows can be replaced by a plurality of clean units. It is characterized by being able to be executed in the same clean unit by providing a portion where the clean unit is connected in a loop-like arrangement.

 The tenth invention is

 In a material processing method for processing a material using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

The plurality of clean units include a portion in which a plurality of clean units each having a compact device of a different type are connected in a broken line arrangement or a loop arrangement. The feature is that all or a major part of a series of work flows is executed consistently.

 Here, the material processing includes various processes such as heat treatment, film formation, doping, modification, sterilization, and antibacterial treatment, in addition to processing such as etching. The material may be of various types, including inorganic materials, organic materials, organic / organic composite materials, and biomaterials.

 The eleventh invention is

 In a device manufacturing method for manufacturing a device using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

 The plurality of clean units include a plurality of clean units, each having a compact device of a different type therein, connected in a polygonal or loop arrangement, and in this portion, a total series of process flows is performed. It is characterized in that all or main parts are executed consistently.

 Here, the device includes various electronic devices such as a semiconductor device, as well as a bio device and a bioelectronics device.

 The first invention is

 In a cell line cultivation method for culturing a cell line using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

The plurality of clean units include a plurality of clean units, each having a compact device of a different type therein, connected in a broken line or loop arrangement, and in this portion, a total series of process flows is performed. It is characterized in that all or main parts are executed consistently. Here, the cultivation of a cell line includes almost anything that involves the cultivation of cells, and cell culture is one example.

 The thirteenth invention is

 A plant growing method for growing a plant-object using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment is connected,

 The plurality of clean units include portions in which a plurality of clean units each having a compact device of a different type are connected in a polygonal arrangement or a loop arrangement.In this portion, a total series of process flows is performed. It is characterized in that all or main parts are executed consistently.

 Here, the artificial light source described above is preferably used for growing the plant, but is not limited thereto.

 In the third to thirteenth inventions, preferably, at least one of the plurality of clean units has a work room capable of maintaining a clean environment, and a rear and upper part of the work room. And at least one of the lower portions and a connecting portion provided on at least one side. All of the plurality of clean units may be such clean units. With regard to this clean unit, what has been described in relation to the first invention holds.

 The fourteenth invention is

 A work room that can maintain a clean environment,

 A clean unit characterized by having an exhaust duct and a passive dust filter provided in a work room.

Here, the clean unit is installed on at least one of the rear, upper and lower parts of the work chamber and on at least one side, respectively. It may or may not have a disconnected connection. In the former case, what is stated in relation to the first invention holds unless the property is violated. The same applies to the fifteenth invention described below. Work rooms typically have, but are not limited to, chemical process equipment.

 The fifteenth invention is

 In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected, at least one of the plurality of clean units is provided with:

 A work room that can maintain a clean environment,

 It is characterized by having an exhaust duct and a passive dust filter provided in a work room.

In the second to ninth and fifteenth inventions, the clean unit system can be used for various applications. For example, by using the nanotechnology process unit and the biotechnology process unit, the clean unit system can be used. It is possible to obtain various process systems such as a single process system and a biotechnology single process system.Furthermore, by combining the nanotechnology process unit and the biotechnology single process unit, a nano-bio fusion platform can be obtained. Can be realized. This applies to the following clean unit system. Specifically, this clean unit system is a material processing system (inorganic material processing system or organic material processing system), element manufacturing system, cell-based cultivation system, plant cultivation system, and the like. Fig. 1 schematically shows an example in which a clean unit is combined into a system for each application to form a system. In the second to thirteenth and fifteenth inventions, at least one of the plurality of clean units typically includes a compact process unit, an Equipment, reaction equipment, microchemical systems, microchemical reactors, exposure equipment, etching equipment, growth equipment, processing equipment, sterilization equipment, particle size filters, artificial light sources, bio equipment, food processing equipment, inspection equipment, drive equipment And the like inside.

 Process equipment, analysis equipment, reaction equipment, microchemical systems, microchemical reactors, exposure equipment, etching equipment, growth equipment, processing equipment, sterilization equipment, particle size filters, artificial light sources, biotechnology, etc. mounted on the above clean unit As a device, a food processing device, an inspection device, a drive device, etc., a sufficiently compact device that can be accommodated even in a small clean unit is suitably used. For example, when executing a complete series of processes from sample input to product output in a clean unit system, or when executing a series of processes that constitute the main part of the process, For the process equipment corresponding to various physical and chemical treatments appearing in the inside, a compact equipment group that can fit in this clean unit is used. These process devices may be installed in and out of the clean unit, or may be integrated with the clean unit.

For example, the production of high-performance devices such as semiconductor devices uses a consistent process from material input to product output, so lithography equipment and etching devices are placed in a large, highly controlled clean room. As described above, this has been realized by transferring substrates between high-precision devices such as equipment, but the present invention has been developed based on recent developments in various technologies. Replace the device, Reduce the size of the device. For example, transmission electron microscope observations and conventional scanning electron microscope observations (TEM and SEM observations) are used for tabletop scanning tunneling microscope observations, atomic force microscope observations (STM / AFM observations), or mini-scanning electron microscopes. Replace with a microscope (SEM). In an optical lithography apparatus, the exposure light source is replaced by a semiconductor laser (for example, reference 10) from a gas laser. Regarding thin film growth, the use of large-scale equipment such as molecular beam epitaxy (MBE) and metal organic chemical vapor deposition (MOCVD) will be discontinued, and microchemical reactors 1 (Ref. 11) will be used. For metallization, use a metal plating device or a desktop mini-deposition (film formation) device. In addition, a microphone opening CVD (chemical vapor deposition) system, a micro RIE (reactive ion etching) system, a mini-spinco, and a mini-baking system are used. ,

By making the above substitutions, a series of processes that essentially constitute the whole or a major part of the process from substrate input to lockout, such as substrate input to photolithography, electrode fabrication, and surface observation, in semiconductor and other processes. The flow is consistent within a clean unit connection that encloses a local, clean, closed space (typically a tabletop space) placed in a normal room without using a large clean room. Can be completed. In other words, the clean unit can be made small enough to be installed on the table by making the device compact by the above replacement, so that the connecting parts are provided at the rear of the work room and at least on one side, respectively. By connecting the above-mentioned clean unit with a broken line arrangement (for example, a folded arrangement) or a loop arrangement, only a small area is required for the entire clean unit system. And because there is no need for clean suits, air showers, clean mats, etc. Almost all work can be performed locally and in an extremely clean atmosphere, which is both human and environmentally friendly.

 The sixteenth invention is

 A work room that can control the internal environment,

 A functional unit characterized by having at least one of a rear part, an upper part, and a lower part of a working chamber and a connecting part provided at least on one side.

 Here, the functional unit is most typically a clean unit, but need not necessarily be a clean unit. That is, for example, when growing a plant, appropriate light is required, but cleanliness is not so important, so it does not need to be a clean unit.

The parameters of the working room's internal environment include, for example, cleanliness (generally the number of particles with a given particle size), temperature, humidity, gas components, light spectrum distribution, light intensity, light intensity time Dependence, phytonutrients, etc., at least one of which is controlled. Control means of the internal environment, temperature control device, the humidity control device, high cleanliness apparatus, C 0 ₂ gas component control device such as concentration, adsorption device, abatement system, specific wavelength illuminator (light source), a closed / At least one of the open environment selection mechanisms. Although the internal environment may be controlled manually, automatic control is possible by controlling it with a computer, and control can be performed accurately and easily. In this case, the control information may be downloaded to a computer via the Internet, and the internal environment may be controlled based on the control information. In this way, for example, it is possible to grow crops under the same environmental conditions as those in the world or specific regions in Japan.

In the sixteenth invention, what has been said in connection with the first invention holds unless it violates its nature. The seventeenth invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

 At least one of the plurality of function units has a working room capable of controlling the internal environment,

 It is characterized by having at least one of the rear, upper and lower parts of the working chamber and a connecting part provided at least on one side.

 The eighteenth invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

 It is characterized in that it includes a portion where the functional units are connected in a non-single linear arrangement or a broken line arrangement.

 The nineteenth invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

 At least one of the plurality of functional units has a plurality of connecting portions, and the directions at which the sample passes through the connecting portions are non-parallel or orthogonal to each other. It is characterized by including at least two connecting parts.

 The tenth invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

In at least one set of adjacent function units among the plurality of function units, the direction in which the sample passes through the exit of one function unit and the direction in which the sample passes through the entrance of the other function unit are described. Non-parallel to each other Alternatively, they are orthogonal to each other.

 The eleventh invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

 It is characterized in that the functional units are connected in a polygonal arrangement so as to fit in a predetermined finite area.

 The second invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

 It is characterized in that it includes a portion where the functional units are connected in a loop-like arrangement.

 The second invention is

 In a function unit system in which a plurality of function units each having a work room capable of controlling an internal environment are connected,

 The plurality of functional units are characterized by including a plurality of types of functional units connected in a mosaic arrangement.

 The twenty-fourth invention is

 In a function unit system in which a plurality of function units having a work room capable of controlling an internal environment are connected,

 The same type of process that appears multiple times in a total series of process flows can be executed in the same function unit by providing a plurality of function units with loops that connect the function units. The feature is that it is possible.

 In the seventeenth to twenty-fourth inventions, what has been said in relation to the first to sixteenth inventions is satisfied, as long as they do not contradict the nature thereof.

The functional unit system described above is, for example, a cell line cultivation system or Is a plant breeding system. In this case, the internal environment of the work room can be controlled based on the control information by a computer whose control information is down-loaded by the Internet.

 ADVANTAGE OF THE INVENTION According to this invention comprised as mentioned above, the connection part is provided in at least one and at least one side of the rear, upper part, and lower part of the work room of the clean unit. In addition, other clean units can be connected not only in the left and right directions but also in the rear or upper and lower portions, and the degree of freedom in connecting the clean units is greatly increased. For this reason, the clean units can be connected in a polygonal arrangement or loop arrangement, and it is possible to configure the clean unit system with the minimum area even with the optimal arrangement according to the process to be executed. . In particular, for example, at least one and / or at least one of the rear, upper and lower parts of the working unit of the clean unit is provided with a connecting part, and the working room is provided with ventilation holes. The provision of an active dust-proofing filter not only greatly increases the degree of freedom in connecting the clean unit, but also keeps the inside of the working room clean.

 In addition, the clean unit system can be implemented by including a portion where the clean unit is connected in a non-single linear arrangement, a polygonal arrangement, a branch arrangement, a loop arrangement, or a mixed arrangement of two or more thereof. It is possible to configure a clean unit system with the optimal layout and the minimum area according to the process.

In addition, at least one of the plurality of clean units has a plurality of connecting portions, and the plurality of connecting portions are such that the directions when the sample passes through the connecting portions are non-parallel to each other. Or, by including at least two connections that are orthogonal to each other, the freedom of connection of the clean unit The degree of production is greatly increased, and it is possible to configure a clean unit system with an optimal arrangement and a minimum area according to the process to be performed. Further, since the clean units are connected in a polygonal arrangement so as to fit in a predetermined finite area, a clean unit system according to a process to be executed can be configured with a minimum area.

 In addition, by including a plurality of types of clean units in which a plurality of clean units are connected in a mosaic arrangement, a clean unit system optimal for a process including a variety of processes can be configured.

 In addition, the same type of process that appears multiple times in a total series of process flows can be executed in the same clean unit by providing a portion where the clean units are connected in a loop configuration to multiple clean units. The potential for this can significantly reduce the number of clean units required for similar processes.

 In addition, a plurality of clean units include a plurality of clean units, each having therein a compact device of a different type, which are connected in a polygonal arrangement or a loop arrangement. By performing all or a major part of one process consistently, processes such as material processing, device manufacturing, cell line cultivation, and plant cultivation can be performed efficiently.

 In addition, since the exhaust duct and the passive dust filter are provided in the working room of the clean unit, the inside of the working room can be maintained in a clean environment without using the blowing power.

In addition, by using a function unit that can control the internal environment, internal environment parameters other than cleanliness, such as temperature, humidity, light spectrum distribution, and light intensity, can be set as desired. Easy to set It can realize the optimal environmental conditions for various applications and can be applied to various processes. BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a schematic diagram showing an example of a system configuration using a combination of clean units according to the present invention, and FIGS. 2A, 2B and 2C are diagrams showing a clean unit according to a first embodiment of the present invention. FIGS. 3A, 3B and 3C are top views showing a transfer box mounted on a clean unit according to the first embodiment of the present invention. FIG. 4A and FIG. 4B are a side view and a front view for explaining the connection between the clean unit and the transfer box according to the first embodiment of the present invention. FIGS.A and 5B are a side view and a front view showing a loading / unloading pox to be attached to the clean unit according to the first embodiment of the present invention. FIGS. First embodiment of the invention FIGS. 7A, 7B and 7C are side views and a front view for explaining a method of shutting off a connection opening not using a clean unit according to the second embodiment of the present invention. A top view, a front view and a side view showing a clean unit according to a form, FIGS. 8A and 8B show a clean unit system according to a third embodiment of the present invention and a conventional clean unit system for comparison. FIG. 9 is a schematic diagram illustrating a clean unit system according to a fourth embodiment of the present invention, and FIG. 9 is a schematic diagram illustrating a clean unit system according to a fifth embodiment of the present invention. FIG. 11 is a schematic diagram showing a clean unit system according to a sixth embodiment of the present invention, and FIG. 12 is a schematic diagram showing a clean unit according to a seventh embodiment of the present invention. Show system Diagram, the first 3 figures Hilbert curve FIGS. 14A, 14B, and 14C are top, front, and side views, respectively, showing a clean unit according to an eighth embodiment of the present invention. 15A, 15B and 15C are a top view, a front view and a side view showing a clean unit according to a ninth embodiment of the present invention, and FIG. FIG. 17 is a front view showing a clean unit according to the tenth embodiment of the present invention, FIG. 17 is a schematic diagram showing a result of measuring cleanliness obtained by the clean unit shown in FIG. 16, and FIG. FIG. 16 is a schematic diagram showing a time change of cleanliness obtained by the clean unit shown in FIG. 16, FIG. 19 is a perspective view showing the clean unit system according to the first embodiment of the present invention, and FIG. FIG. 1 is a perspective view showing a clean unit system according to a first embodiment of the present invention, and FIG. FIG. 21 is a perspective view showing a clean unit according to the thirteenth embodiment of the present invention, and FIG. 22 is a perspective view showing a plant trait modification and growing unit according to the fourteenth embodiment of the present invention. FIG. BEST MODE FOR CARRYING OUT THE INVENTION

 Hereinafter, embodiments of the present invention will be described with reference to the drawings. 2A, 2B, and 2C show a clean unit according to the first embodiment of the present invention. FIG. 2A is a top view, FIG. 2B is a front view, and FIG. Is a side view. This clean unit mainly performs, but is not limited to, chemical processes involving gas generation and the use of organic solvents.

As shown in FIG. 2A, FIG. 2B and FIG. 2C, this clean unit has a hexahedral box-shaped work chamber 11. The sides of this work room 11 are parallel to each other, the top and bottom sides are also parallel to each other, the sides and the top, bottom, front and back are perpendicular to each other, but the front is It is non-parallel and its upper part is inclined at an angle 0 (for example, 70 to 80 °) so as to approach the back. The transfer boxes 12, 13, and 14, which also serve as connectors between clean units and transfer paths, are detachably provided on the rear surface and both side surfaces of the work room 11, respectively. Although not shown in FIGS. 2A, 2B and 2C, the work room 11 where the transfer boxes 12, 13, 14 are installed An opening is provided in the wall. These transfer boxes 12, 13, 14 can be used to connect other clean units from three directions on the rear and both sides, and these transfer boxes 12, 1, 1 The sample can be transported through 3 and 14. Two circular openings are provided in the front wall of the work room 11, and a pair of manual gloves 15 are attached to these openings. Then, the operator can put his / her hands into these hand-operated gloves 15 to perform necessary work in the work room 11. An exhaust duct 16 and a passive dust filter 17 which does not have a blowing power per se are mounted on the upper surface of the work room 11 so that the inside of the work room 11 is, for example, a class 10 or a class 10. It is possible to maintain a clean environment of about 100. As the passive dust-proof filter 17, for example, a passive HEPA filter can be used.

 The front of the work room 11 is removable so that necessary devices such as process equipment and observation equipment can be inserted into the work room with the front removed.

The size of the work room 11 can accommodate the necessary process equipment and the like, and the operator 1 can put both hands on the gloves 15 for manual work. It is selected to be large enough to carry out necessary work in the work room 11. A specific example of the dimensions of the work room 11 is as follows: in Fig. 2A, Fig. 2B and Fig. 2C, depth 3-50 to 70 0111, width 13 = 70 to 90 cm. The height h = 50-100 cm. Further, as a material constituting the working chamber 11, a transparent material, for example, an acrylic resin plate is preferably used so that the inside can be seen from the outside. This acryl resin plate may be attached to a metal frame for mechanical reinforcement.

 The dimension c of the transfer boxes 12, 13, 14 is, for example, c = 15-20 cm.

 FIGS. 3A, 3B, and 3C show examples of the configuration of the transfer boxes 12, 13, and 14. FIG. 3A is a top view, FIG. 3B is a front view, and FIG. Figure C is a side view.

 As shown in FIG. 3A, FIG. 3B and FIG. 3C, the transfer boxes 12, 13, and 14 are provided at both ends of the tube 18 having a rectangular cross section and one turn around the tube 18. It has a large frame-shaped flange (flange) 19. In this case, the inner circumference of the collar 19 coincides with the inner circumference of the cylinder 18.

Next, how to connect the work room 11 to the transfer boxes 12, 13, and 14 will be described. Here, as an example, the case where the transfer box 14 is connected to the right side surface of the work room 11 will be described, but the connection method of the other transfer boxes 12 and 13 is also the same. As shown in FIG. 4A and FIG. 4B, a rectangular opening 20a is provided in the wall 20 partitioning the inside and outside of the work room 11 where the transfer box 14 is to be mounted. . In addition, on the outer surface of the wall 20, a stop extending horizontally is located just below the opening 20 a. A pair of guides 21 is provided, and a pair of guide rails 22 extending in the vertical direction are provided on both ends of the stopper 21 in parallel to each other. The clearance between these guide rails 22 and the wall 20 is chosen to be slightly larger than the thickness of the collar 19 of the transfer box 14. Then, both sides of the flange 19 of the transfer box 14 are inserted from above into this gap, and the sliding is performed along the guide rail 2. When the lower end of the collar 19 comes into contact with the stopper 21, the collar 19, the guide rails 12 and the wall 20 are almost in close contact with each other, and the mounting of the transfer box 14 is completed.

 Also, on the inner surface of the wall 20, there is provided a stopper 23 extending horizontally in a position immediately below the opening 20 a, and a vertical stopper is provided on both ends of the stopper 13. A pair of guide rails 24 extending in parallel to each other are provided in parallel with each other. Then, both sides of a rectangular sliding door 25 slightly larger than the opening 20 a are inserted into the gap between the guide rail 24 and the wall 20, and slide along the guide rail 24. When the lower end of the sliding door 25 comes into contact with the stopper 13, the sliding door 25 almost adheres to the guide rail 24 and the wall 20, and the inside and outside of the wall 20 are shut off. The gap between the guide rail 24 and the wall 20 is chosen to be slightly larger than the thickness of the sliding door 25. The sliding door 25 has a handle 26. The bow I door 25 can be opened and closed by holding the handle 26 and moving the sliding door 25 up and down. . By opening and closing the sliding door 25 in this manner, communication / non-communication between the inside of the work room 11 and the transfer box 14 can be controlled.

When expanding the clean unit system, with the inner sliding door 25 closed, place the transfer box outside the opening 20a in the wall 20. After the work room 11 of the next clean unit connected to the transfer box 14 is connected to the other end of the transfer box 14 and the sliding door 25 inside is opened, the work room 11 is opened. A clean area (space) can be expanded to the left, right, and in the depth direction while maintaining a clean environment within 1.

Next, how to put and remove samples into and from the clean unit will be described. As shown in Fig. 5A and Fig. 5B, the loading / unloading box 27 is installed in the clean unit work room 11 instead of connecting the next clean unit to the sample inlet and outlet. Attach. The loading / unloading box 27 has substantially the same configuration as the transfer boxes 12, 13, and 14. In other words, the loading / unloading box 27 is made of a cylinder 28 having a rectangular cross section and a frame-like flange (flange portion) 19 which is slightly larger than the cylinder 28 at both ends. A stopper 30 is attached to a lower portion of 29, and a pair of guide rails 31 extending in the vertical direction are provided on both ends of the stopper 30 in parallel to face each other. The inner circumference of the collar 29 coincides with the inner circumference of the cylinder 28. Then, both sides of a rectangular sealed shut-off plate 32 slightly larger than the cylinder 28 are inserted into the gap between the guide rail 31 and the brim-29, and slide along the guide rail 31. When the lower end of the sealing block 32 contacts the stopper 30, the sealing block 32 almost adheres to the guide rail 31 and brim 29, and the inside and outside of the loading / unloading box 17 are shut off. . The clearance between the guide rail 31 and the collar 29 is selected to be slightly larger than the thickness of the sealing block 32. The closed shut-off plate 3 2 is provided with a handle 3 3, and the closed shut-off plate 3 can be opened and closed by holding the handle 3 3 and moving the closed shut-off plate 3 up and down. ing. And like this Opening / closing of the sealed shut-off plate 32 allows the loading / unloading box

The communication / non-communication between the inside and outside of 27 can be controlled. The mounting method of the loading / unloading box 27 to the clean unit is the same as the mounting method of the transfer boxes 12, 13 and 14, and the description is omitted.

 Next, of the three connector parts of the clean unit, especially the connector part that does not insert or remove the sample and does not connect other clean units, as shown in Fig. 6A and Fig. 6B, An opening / closing mechanism is provided on the outside of 20 as well as on the inside. That is, a stopper 34 and a pair of guide rails 35 are attached to the wall 20 of the work room 11, and a rectangle once larger than the opening 20 a is formed in a gap between the guide rail 35 and the wall 20. Insert both sides of the airtight shut-off plate 36 and slide it along the guide rail 35. When the lower end of the sealing block 36 comes into contact with the stopper 34, the sealing block 36, the guide rail 35 and the wall 20 are almost in close contact, and the inside and outside of the wall 20 are shut off. The gap between the guide rail 35 and the wall 20 is selected to be slightly larger than the thickness of the sealing block 36. The closed shut-off plate 3 6 has a handle 3 7. By holding the handle 3 7 and moving the closed shut-off plate 36 up and down,

36 can be opened and closed. By opening and closing the closed / closed plate 36 in this way, communication / non-communication between the inside and the outside of the clean unit can be controlled. In this case, since a similar opening / closing structure is provided inside the wall 20, a double hermetic structure is provided on both sides of the wall 20 of the connector part. In this way, when there is no connection with another clean unit and the transfer box is not connected, the clean unit can be efficiently shut off from the outside air inside the work room 11. FIGS. 7A, 7B and 7C show a clean unit according to a second embodiment of the present invention. FIG. 7A is a top view, FIG. 7B is a front view, and FIG. C is a side view. The clean unit mainly performs, but is not limited to, non-chemical processes that do not require local exhaust, such as various measurements such as surface observation, inspection and assembly.

As shown in Figures 7A, 7B and 7C, this clean unit is similar to the clean unit work chamber 11 shown in Figures 2A, 2B and 2C. The work room 51 has a simple configuration. At the back and rain side of the work room 51, transfer boxes 52, 53, and 54 are provided, which also serve as connectors between the clean units and the transport path. These transfer boxes 52, 53 are provided. , 54 can be used to connect other clean units from the three directions of the rear and both sides, and transfer of samples etc. through these transfer boxes 52, 53, 54. Can be performed. Further, two circular openings are provided on the front surface of the work room 51, and a pair of manual gloves 55 are mounted on these openings. An active dust filter 56 having its own blowing power is attached to the upper surface of the work room 51, and the inside of the work room 51 is set to a clean environment of, for example, class 10 or class 100. Can be maintained. In this case, no exhaust duct is provided. Instead, exhaust vent holes 57 are provided in the lower corners of both sides of the working chamber 51. The exhaust ventilation hole 57 is for exhausting the air sent from the active dustproof filter 56 to the outside of the work chamber 51 and adjusting the positive pressure applied by the operation of the active dustproof filter. As the active dust filter 56, for example, an active HEPA filter can be used. In addition, for example, When this clean unit is used as a substitute for a bio-clean room, an ion sterilizer may be added in series with the active dust filter 56.

 The configuration other than the above is the same as the configuration of the screen unit shown in FIG. 2A, FIG. 2B and FIG. 2C.

 As with the clean unit shown in Fig. A, Fig. B and Fig. C, the connection area of the transfer boxes 52, 53, and 54 must be open air when other clean units are not connected. It is also possible to attach a sealed shut-off plate or shut-off door.

 Next, a clean unit system according to a third embodiment of the present invention will be described.

 Fig. 8A shows this clean unit system. FIG. 8B shows a conventional clean unit system for comparison with the clean unit system.

 As shown in Fig. 8A, platens 61, 62, 63, and 64 are installed in the room with sufficient space between them to allow the operator to work. I have. The clean units 65 are placed on the surface plate 61, the clean units 66, 67 are placed on the surface plate 62, and the clean units 68, 69, 70 are placed on the surface plate 63. On the surface plate 64, clean units 71, 72, and 73 are installed, respectively. These clean units 65 to 73 are connected by a transfer box 74, and are in a zigzag arrangement repeatedly bent.

In this case, as the clean units 65 to 73, the clean units according to the first or second embodiment which can be connected in three directions are used. Therefore, as described above, the clean units 65 to 73 are used. It is possible to arrange 73 in a zigzag shape. However, as the clean unit 65, 69, 72, 73, a conventional clean unit that can be connected only in the left and right directions may be used. Elemental processes such as pretreatment, resist coating, baking, exposure, development, post baking, etching (etching), thin film growth, surface observation, assembly, etc., are performed by compact equipment due to recent technological advances. It is basically possible to use either the clean unit according to the first embodiment (hereinafter referred to as “Type A”) or the clean unit according to the second embodiment (hereinafter referred to as “Type B”). It is possible to put it inside. Therefore, clean units 65-73 include small process equipment (chemical processing equipment such as growth equipment and etching equipment or non-chemical processing equipment such as lithography equipment and bake furnace) suitable for the process to be performed. Observation equipment (AFM, STM, optical microscope, SEM, etc.) will be installed. For example, a small growth device is installed in the clean unit 70. In this case, the power supply 75 and the oscilloscope 76 of the growth apparatus are installed near the clean unit 70.

When performing processes, observations, measurements, and the like using this clean unit system, for example, the following is performed. That is, first, the operator stands in front of the clean unit 65 and loads a substrate (not shown) from the sample loading / unloading section. Then, after performing a predetermined process or the like in the clean unit 65, the substrate is transferred to the next clean unit 66 through the transfer box 74 using a working glove (not shown). Next, the operator moves in front of the clean unit 66 and executes a predetermined process in the clean unit 66. In this way, the process is sequentially performed while the substrates are transferred between the clean units 65 to 73. Then, after the process Take out the substrate from lean unit 73.

 As described above, according to the third embodiment, the clean units 65 to 73 can be arranged in a zigzag manner, so that the area occupied by the clean unit system can be made closer to a square. However, the burden on the design of the room in which the clean unit system is installed can be reduced, and the space in the room can be effectively used.

 In other words, as shown in Fig. 8B, the length of the conventional clean unit system in which the clean units 81 to 88 that can be connected only in the horizontal direction are connected in a single linear arrangement in the horizontal direction is extremely long. As a result, the installation space becomes longer and the efficiency of using the room space is poor. Therefore, the advantage of the clean unit system according to the third embodiment is clear. In FIG. 8B, reference numerals 89 to 92 denote a surface plate, and 93 denotes a connecting portion. . ·

 Next, a clean unit system according to a fourth embodiment of the present invention will be described.

 Fig. 9 shows this clean unit system. As shown in Fig. 9, in this clean unit system, type A or type B three-way connectable clean units 101 to 106 are arranged in a loop via a transfer box 107. Are connected by The transfer box 107 which is not used for connection is shut off by a closed shut-off plate.

According to the fourth embodiment, the following advantages can be obtained. In other words, in general, the same process is often repeated in a series of total processes.However, in the past, a clean linear unit that can be connected only in the left-right direction has a single linear arrangement connected in the left-right direction. In the clean unit system, when the same process is repeated, Since the sample must be returned to the upstream clean unit, the work efficiency is extremely poor. On the other hand, according to the fourth embodiment, since the clean units 101 to 106 can be connected in three directions, the clean units 101 to 106 can be optimally arranged along the process flow. A loop-like connection is made possible, and the series of processes can be repeated as many times as necessary without wasting samples. Therefore, a series of processes can be performed efficiently.

 Next, a clean unit system according to a fifth embodiment of the present invention will be described.

 FIG. 10 shows this clean unit system. As shown in FIG. 10, in this clean unit system, type A or type B clean units 101 to 106 are connected in a loop configuration via transfer boxes 107. This is the same as the fourth embodiment, but in this case, the clean unit 102 and the clean unit 105 further connect the transfer box 107 and the relay box 108. Directly connected via In this case, in Fig. 1A, Fig. 2B and Fig. 2C or Fig. 7A, Fig. 7B and Fig. 7C, the depth of the working chamber a, the size of the transfer bolt c By designing the distance X from the right side of the rear transfer box toward X = (a-c) / 2, only the clean unit 101 to 106 with a single structural specification can be used. The connection as shown in FIG. 10 can be performed by using.

As described above, according to the fifth embodiment, the clean units 101 to 106 are connected in a loop-like arrangement, and the clean unit 102 and the clean unit 105 are connected to the transfer unit. By being directly linked by Box 107 and Relay Pox 108, In addition to the same advantages as those of the embodiment, it is possible to execute a process with a smaller turn, such as a branch or a small loop accompanying the condition judgment. Specifically, besides transferring the substrates between the clean units 101 to 106 and executing the process, for example, starting from the clean unit 101, the process is performed at the clean unit 102. After execution, the process can proceed to clean unit 105.

 Next, a clean unit system according to a sixth embodiment of the present invention will be described.

 Fig. 11 shows this clean unit system. As shown in Fig. 11, in this clean unit system, three-way connectable clean units 121 to 128 of type A or type B are connected via a transfer box 1229. ing. In this case, the clean nits 122 to 127 are connected in the same loop arrangement as in the fifth embodiment.

 For example, type A is used for clean units 122, 123, 125, and 126, and type B is used for clean units 121, 124, and 127. .

The work performed at each clean unit 121 to 128 is, for example, as follows. First, the clean unit 12 1 is a storage unit in which a sample storage (for example, a wafer cassette 130 containing substrates) is installed, and a transfer box 1 2 on the right side that is not used for connection. 9 is the sample inlet, and the transfer box 1 2 9 on the back, which is also not used for connection, is the emergency sample outlet. Clean unit 1 2 2 is a chemical unit, and a chemical pretreatment system 13 1 is installed to perform chemical pretreatment. The clean unit 123 is a resist process unit in which a spin coater 132 and a developing unit 133 are installed. Coating and development are performed. The clean unit 124 is a lithography unit. The exposure unit 134 is installed. The transfer box 128 on the right side, which is not used for connection, is an emergency sample outlet. Clean unit 125 is a growth / measurement unit, equipped with an electrochemical device 135 and a microreactor system 135, and a transfer box 128 on the right side that is not used for connection. When the sample is taken out. The clean unit 126 is an etching unit, and an etching unit 133 is installed. The transfer box 129 on the back of the clean unit 126 is connected to the transfer box 129 on the back of the clean unit 123 via a relay box 138. The clean unit 127 is an assembly unit, equipped with a microscope 13 9 and a prober 140. Clean unit 1.28 is a scanning probe microscope (SPM) observation unit, on which tabletop STM141 and tabletop AFM142 are installed, and the transfer box 129 on the right side that is not used for connection is the sample. The transfer pox 129 on the back, which is also not used for connection, is an emergency sample outlet. Clean unit 1 2 3 spin coater 1 3 2, clean unit 1 2 4 exposure unit 1 3 4, clean unit 1 2 5 electrochemical unit 1 3 5 and microreactor system 1 3 6, clean unit The etching device 1337 of the unit 126 and the prober 140 of the clean unit 127 are connected to the power source 144 so that power is supplied. The electrochemical device 135 of the clean unit 125 is connected to the electrochemical device controller 144 by a signal cable 144, and is controlled by the electrochemical device controller 144. It is supposed to be. In addition, the microscope 1319 of the clean unit 127 and the desktop STM of the clean unit 128 The images observed by the AFM 14 and the desktop AFM 14 can be displayed on the LCD monitor 14.

 According to the sixth embodiment, the following many advantages can be obtained. That is, chemical pretreatment, resist coating, exposure, development, growth / metallization, etching, probing, surface observation, etc. are usually performed by using equipment installed in a huge clean room. All processes can be implemented simply and compactly in a normal laboratory-scale room without using a clean room by adopting a loop-like arrangement in a clean unit system that connects clean units surrounding a clean local space. be able to.

 Generally, as shown in Fig. 11, a so-called “mosaic” consisting of A and B (or a modified form thereof) is used, as shown in Fig. 11, due to the nature of the process equipment contained in the above-mentioned type A and B clean units. A clean unit arrangement pattern in the shape of "" is formed, thereby completing the entire process or a series of steps of the main part (for example, a step which may lower the yield if exposed to a dusty atmosphere on the way). It is possible to carry out the process up to the stage where it can be easily separated even if the dust atmosphere is acceptable.

Also, when a certain total or major series of process flows is given, the connection (mosaic pattern) of one-dimensional clean units corresponding to them is determined, but the clean units of types A and B above are determined. By using the same procedure, the same processing (group) is repeated so as to satisfy the constraints such as performing the same clean unit (group) (that is, it is possible to determine where and where in this mosaic will be most efficient). Judgment), it is possible to realize a loop-like arrangement of clean units. At that time, the scalability is high due to the increase in the number of necessary processes and the number of work steps. In addition, an integrated process system can be set up in an extremely flexible manner.

 Next, a clean unit system according to a seventh embodiment of the present invention will be described.

Fig. 12 shows this clean unit system. As shown in Fig. 11 ■ As shown in Fig. 11, in this clean unit system, the type A or type B three-way connectable clean units 151 to 171 are connected via the transfer box 172. Are linked. In this case, the clean units 160 to 165 are connected in the same loop arrangement as in the fourth embodiment, and the clean units 166 to 171 are connected in the same loop configuration as the fifth embodiment. They are connected by arrangement. The transfer box 172 on the back of the clean unit 15 5 and the transfer box 17 2 on the right side of the clean unit 16 are connected via a relay box 17 3. The transfer box 172 on the back of the clean unit 158 and the transfer box 172 on the right side of the clean unit 165 are connected via a relay box 173. Further, the transfer box 172 on the back of the clean unit 1667 and the transfer box 172 on the back of the clean unit 170 are connected via a relay box 173. The clean units 160 to 165 are equipped with process equipment and observation equipment necessary for processes executed using this clean unit system. According to the seventh embodiment, the following advantages can be obtained. In other words, a series of process flows from the first stage to the last stage consist of a programming flow chart (including the condition judgment to repeat the process again if a defect is found during the measurement and the subsequent processing). Although it can be identified, according to the seventh embodiment, By adapting the processing including the subroutine part 174 in the programming, and the branch 175 based on the condition judgment, the arrangement including the three-way connection enables extremely flexible adaptation. In other words, by performing computer control including opening and closing the transfer box 172 and transporting the substrate (including jumping to another step in the process based on loops and condition judgment), all process steps or a major series Can be automatically executed under programming and computer control.

 In addition, since the clean unit system has a loop, the same processing can be performed on the substrate over and over with a minimum moving distance by moving the substrate between clean units. This is a very advantageous point in the case of the conventional linear arrangement of the clean unit because it is necessary to transport a substrate over a long distance to a far clean unit when performing the same processing. This is generalized as follows. In other words, the surface is filled in a shape similar to the Peano curve or the Hilbert curve shown in Fig. 13 (Reference 12), which is advantageous in terms of improving the space (area) occupancy. In particular, similar to the Hilbert curve, while riding on a series of lines, at the same time, it is located in a remote place on this line, but it is a kind of process space by three-way connection using the remaining one dimension In addition, it is an advantage that another process can be applied to the substrate (sample). This is a function that is homologous to the process of successfully reading out the blueprints scattered throughout the one-dimensional sequence of DNA during protein synthesis, making it possible to use one process line for multiple purposes. It realizes the nature.

Next, a clean unit according to an eighth embodiment of the present invention will be described. FIGS. 14A, 14B and 14C show the clean unit according to the eighth embodiment, wherein FIG. 14A is a top view, FIG. 14B is a front view, Figure 14C is a side view.

 As shown in FIGS. 14A, 14B and 14C, this clean tub is provided with transfer boxes 12 on the back and both sides of a hexahedral box-shaped work chamber 11 respectively. , 13 and 14 are detachably provided, and transfer boxes 201 and 202 are detachably provided on the upper and lower surfaces of the work chamber 11, respectively. I have. The structures of these transfer boxes 201 and 202 are similar to those of the transfer boxes 12, 13 and 14.

 Except for the above, the second embodiment is the same as the first embodiment, and a description thereof will not be repeated.

 The clinic according to the eighth embodiment is hereinafter referred to as type C.

 Next, a clean unit according to a ninth embodiment of the present invention will be described.

 FIGS. 15A, 15B and 15C show the clean unit according to the ninth embodiment, wherein FIG. 15A is a top view, FIG. 15B is a front view, Figure 15C is a side view.

As shown in FIGS. 15A, 15B, and 15C, the clean unit is provided with transfer boxes 52 on the back and both sides of a hexahedral box-shaped work chamber 51. , 53, 54 are detachably provided, and transfer boxes 203, 204 are detachably provided on the upper and lower surfaces of the work chamber 51, respectively. I have. The structure of the transfer boxes 203, 204 is the same as that of the transfer boxes 12, 13, 14. Except for the above, the second embodiment is the same as the second embodiment, and a description thereof will be omitted.

 The clean unit according to the ninth embodiment is hereinafter referred to as type D.

 Next, a clean unit according to a tenth embodiment of the present invention will be described.

 FIG. 16 is a front view showing the clean unit according to the tenth embodiment.

 As shown in FIG. 16, in this clean unit, an exhaust ventilation hole (not shown) at the lower corner of the left side surface of the working chamber 51 is closed by a lid or the like (not shown). An airtight pipe 25 1 is connected between the exhaust ventilation hole at the lower corner on the right side and the entrance of the active dust filter 56. Then, all of the gas exhausted from the exhaust vent holes passes through the pipe 251, and enters the inlet of the active dustproof filter 156. By doing so, the gas circulates like the active dust filter 56 → work chamber 51 → exhaust ventilation hole-pipe 2 51 → active dust filter 56. The degree can be greatly improved.

 Although illustration and description of the details of the working chamber 51 are omitted, it is the same as in the second or ninth embodiment.

 The clean unit according to the tenth embodiment is hereinafter referred to as “E”.

Fig. 17 shows the results of measuring the cleanliness in the work room 51 when this type E clean unit was placed in a normal office environment and the active dust filter 56 was operated, and the horizontal axis is The particle size (m) of the fine particles, and the vertical axis indicates the number of fine particles (particles / m ³ ) equal to or larger than the particle size on the horizontal axis. Also, the first eighteenth The figure shows how the number of particulates decreases over time after the operation of the active dust filter 56 starts. However, the working room 51 of the clean unit used for this measurement had a rectangular parallelepiped shape, a size of 80 cm in width, 55 cm in depth, and 80 cm in height. As an active dust-proofing filter, HAZUNIT GK-0775-7-0-1 (model number 25S) 0.3 mm by Azun Co., Ltd. was used. Further, the measurement was performed after a lapse of 20 minutes or 30 minutes from the start of the operation of the active dust filter 56, and after a stable state was reached. According to Fig. 17, the average value and the maximum value of the cleanliness of this circulating clean unit are equal to or higher than those of Class 10. In addition, as shown in Fig. 18, the time required to reach the cleanliness of the class 10 is extremely short, about 20 minutes or 30 minutes after the start of the operation of the active dust-proof filter 156. The above facts indicate that it is an extremely effective method to obtain high cleanliness by circulating all the gas exhausted from the exhaust vent through the pipe 25 1 into the inlet of the active dust filter 56. It is shown that.

 Next, a clean unit system according to a first embodiment of the present invention will be described.

FIG. 19 is a perspective view showing a clean unit system according to the eleventh embodiment. As shown in FIG. 19, in this clean unit system, clean units 301 to 316 of types A to E are connected in a three-dimensional arrangement via transfer boxes 317. I have. In this case, the clean unit 302 is connected to the clean unit 301, and the clean units 303 to 305 are sequentially connected to the clean unit 302 in a horizontal plane in a row. ing. The clean units 303 to 308 are arranged in parallel in a row in parallel with the clean units 303 to 300 and at the same height as the clean units. this The clean units 303 to 308 are connected to the clean units 303 to 305, respectively, back to back. The clean unit 309 is connected to the clean unit 306 below the clean unit 306, and the clean unit 310 to 313 is connected to the clean unit 309 in a horizontal plane. They are sequentially connected in a line in a direction orthogonal to the arrangement direction of 08. The clean unit 313 is connected to the clean unit 308 below the clean unit 308, and the clean units 314, 315 are connected to the clean unit 310 in a horizontal plane. 308 are sequentially connected in a line in a direction orthogonal to the arrangement direction. The clean unit 316 is connected between the clean unit 315 and the clean unit 313.

 The clean unit system configured as described above can be used for various applications. For example, it can be used as a nano / bio / plant factory fusion platform. Specifically, there are the following usage methods. First, clean units 301, 302, 304, and 305 are used for one nanotechnology process. The sample can be loaded from the clean unit 301 or the clean unit 304. In addition, clean unit 306 to 308 is used for one biotechnology process. The sample can be introduced from the clean unit 308. Clean units 313 and 314 are used for one nanotechnology process. Cleanunits 315 and 316 are used for biotechnology processes. The clean units 310 to 312 are used for the spot growth process.

 As a specific example of the use of this nano-bio-plant factory fusion platform, a method for mass production of plants will be described.

First, the parent plant (eg, rice) was injected into Greenunit 308. Callus is induced from the parent plant in this clean unit 308. Next, this callus is transferred to Cleanunit 307, and a large amount of callus is cultured in a culture tank (reactor). Next, the callus cultured in a large amount in this manner is transferred to a clean unit 106 and cultured in a regeneration tank. Next, the regenerated plant thus obtained is transferred to a clean unit 309 to select the regenerated plant. Next, the regenerated plant thus selected is transferred to Cleanunit 310 for acclimation. Next, the plants that have been conditioned in this way are transferred to a clean unit 311, and the half width of the pulse laser light or spectrum obtained by pulse driving a blue, green or red semiconductor laser is obtained. The plant is irradiated with blue, green or red light emitting diode light of 3 O nm or less as artificial light. The plant thus grown is transferred to the clean unit 312 and taken out of the clean unit 312. According to this method, it is possible to obtain an advantage that a necessary amount of crop can be efficiently cultivated at a necessary time. In addition, for example, when growing plants in the clean unit 311, the environmental conditions such as sunshine conditions, temperature, and humidity in a desired region (for example, the Mediterranean region) are downloaded to the computer via the Internet. Based on these environmental conditions, the computer controls the irradiation conditions of pulsed laser light as artificial light, as well as the growth conditions such as temperature and humidity, so that it is possible to grow crops of similar quality to those grown locally. It becomes possible. In this case, a liquid fertilizer or the like can be used as the fertilizer.

The advantages of using laser light, especially pulse-driven laser light or light with a spectral half width of 30 nm or less due to a light emitting diode, for plant growth will be described. Conventionally, fluorescent lamps and sodium lamps have generally been used as artificial light sources, but these light sources convert electricity into photons. The external quantum efficiency is low and the energy utilization efficiency is low, whereas the semiconductor laser and the light emitting diode with extremely excellent monochromaticity have a high external quantum efficiency and greatly improve the energy utilization efficiency. For example, in the case of a red light source, A1GaAs-based light-emitting diodes have an external quantum efficiency of 20%, which is much higher than that of conventional lamp light sources, but A1GaInP In the system-based semiconductor laser, the external quantum efficiency is further improved to about 40%. The external quantum efficiency of a light emitting diode emitting blue light is about several percent to about 10%.

—By using pulse driving, the external quantum efficiency is improved to about 20% while the average output is the same. In particular, by using laser light, it becomes possible to follow the elementary process of photoreaction in plants in an energy-specific manner, and it is possible to dramatically increase the efficiency of trait modification. Become. Next, a clean unit system according to a 12th embodiment of the present invention will be described.

FIG. 20 shows this clean unit system. As shown in FIG. 20, in this clean unit system, type A to E clean units 401 to 405 are connected in a U-shaped arrangement via a transfer box 406. I have. In this case, since the clean units 402 to 404 are arranged in the U-shaped curved portion, the transfer box 406 between them has its central axis oriented in the direction along this curved portion. So that it is attached. Further, a belt conveyor 407 is provided so as to pass through the clean unit 401 to 405 and the transfer box 406. It can be sent to Cleanunit 401 to 405 sequentially. Here, this belt conveyor 407 is connected at the entrance and exit of each of the clean units 401 to 405. It is desirable to arrange them so that they can be opened and closed and open their sliding doors (not shown). In this case, the opening and closing of the sliding door can be performed by detecting the raw material conveyed by the belt conveyor 407 by the optical sensor 1 and driving a drive device (not shown) based on the detection result. It is desirable that the entrance and exit sliding doors of the clean units 401 to 405 not be opened simultaneously.

 Next, a method of using the clean unit system configured as described above will be described. Here, we consider the case where this clean unit system is used as a food processing platform for marine and agricultural products. First, after the raw materials are put into the clean unit 401, the raw materials are cut in the clean unit 401 by a power cutter or the like. Next, the raw material thus cut is conveyed to a clean unit 402 by a belt conveyor 410, and secondary processing is performed in the clean unit 402. Next, the secondary processed product is conveyed to a clean unit 403, and sterilized by a sterilizing device in the clean unit 403. Next, the sterilized secondary processed product is transported to the clean unit 404, and aseptic cleaning is performed in the clean unit 404. Next, the processed product that has been subjected to the aseptic clean processing in this way is transported to the clean unit 405, and the aseptic clean package is performed in the clean unit 405. Thereafter, the aseptic clean-packaged processed food is taken out from the clean unit 405.

 According to the first and second embodiments, the processes from the input of the raw materials to the aseptic clean packaging of the processed food can be performed consistently in an environment with a high degree of cleanliness. As a result, aseptic and highly safe processed foods can be provided.

Next, a clean unit according to a thirteenth embodiment of the present invention will be described. Will be explained. This clean unit is an example of a nanotechnology process unit and a chemical process unit.

 Figure 21 shows this clean unit. As shown in FIG. 21, in this clean unit, a compact chemical process device 501 is installed in a work room 11.

 The other points are the same as those of the clean unit according to the first embodiment, and the description is omitted.

 Next, a plant trait modification / cultivation unit according to the fourteenth embodiment of the present invention will be described.

 Fig. 22 shows this plant trait modification / growing unit. As shown in FIG. 12, in this plant trait modification / growing unit, transfer boxes 62 to 604 are attached to the back and both sides of the working room 61. The work room 60 1 is the same as the work room 11 or the work room 51, and the transfer boxes 62-604 are the same as the transfer boxes 12-14. A specific wavelength illuminating light source 605 is mounted on the upper surface of the working room 601. A transparent pollen particle size selection pollinator 606 is installed inside the working room 6001, and a transgenic plant 607 is put in the device.

 The other points are the same as those of the clean unit according to the first embodiment, and the description is omitted.

 In this plant trait modification / cultivation unit, the pollen discriminated by the pollen particle size selection pollination device 606 is pollinated by the trait-modified plant 607 therein. In this case, the pollination efficiency of the specific pollen can be improved. Then, the trait-modified plant 607 is irradiated with light 608 emitted from the specific wavelength illumination light source 605 to grow.

According to the fifteenth embodiment, the plant trait modification / growth unit is dense. Since it is closed, pollen does not scatter outside the unit and there is no risk of crossing with native species.

 Although the embodiments of the present invention have been specifically described above, the present invention is not limited to the above embodiments, and various modifications based on the technical concept of the present invention are possible.

 For example, the configurations, arrangements, shapes, numerical values, materials, and the like described in the above embodiments are merely examples, and different configurations, arrangements, shapes, numerical values, materials, and the like may be used as necessary.

 Specifically, for example, in the above-described embodiment, a clean unit system is configured by connecting five types of basic clean units in the same size in the evening A to E in a predetermined arrangement. The size of the clean unit may be different from each other between ~ E, a clean unit of the same type but different in size may be used, or a clean unit obtained by modifying types A ~ E may be used. Alternatively, three or more types of clean units may be used.

Further, in the clean unit systems according to the third to seventh embodiments, it is also possible to incorporate a partial three-dimensional connection by utilizing the degree of freedom in the vertical (vertical) direction. Further, a door-type door provided with a packing may be used as a sealing plate for sealing the transfer box. Some clean units and transfer boxes can be pressurized or depressurized, or can be vacuum-compatible. In this case, it is desirable to improve the tightness of the transfer box and to install a pressurizing device and a local exhaust device on its own. Further, the transfer box does not necessarily have to be straight, but may be bent in a dogleg shape, for example. Also, by providing the transfer box with three-way connectivity, the clean units can be arranged in a T-shape. Further Once the clean unit is connected, the sliding doors of all the transfer boxes are opened, and an automatic conveyor similar to the conveyor used for providing sushi at a conveyor belt sushi restaurant, for example, is passed through the clean unit system. It is also possible to provide it.

 As described above, according to the present invention, the degree of freedom of the connection of the clean unit (1) is large, and the clean units can be connected in various arrangements. Clean environment and advanced cultivation environment can be easily obtained without using huge clean rooms and plant factories that require capital investment and fixed asset burden, and have the conventional clean unit that can only be connected in a straight line. Resolves inefficiencies in space utilization and maximizes total performance in terms of investment, work efficiency, and effective use of room area, supporting a total series of process flows according to the purpose High-performance clean unit that can easily execute processes at low cost with high flexibility The system can be realized. In addition, since a clean unit system can be configured with a minimum number or a minimum number of clean units from the upstream to the downstream of the process, the efficiency of the process can be maximized. In addition, it is possible to easily realize a high process environment without reducing workability.

 In addition, rather than using a single large box, or a clean room, to fabricate nanotech devices or perform biotechnological processes, at least a portion from the entrance to the exit is replaced by a number of ultra-clean units. In this case, the space or area can be used more efficiently by replacing the loops with a loop-like arrangement or a connection in a vertical or horizontal zigzag arrangement.

In addition, by using multiple types of clean units, chemical processes, Operations such as non-chemical processes and bioprocesses can be performed in one high-performance clean unit system.

 In addition, it is possible to fabricate key structures and plant traits that will be responsible for the next generation, such as microstructures, by a low demand method with good cost performance.

 In addition, with respect to the growth of plants, it is possible to cultivate under desired local or regional environmental conditions by using artificial light sources, etc., and also to cultivate rapid-growing cultivation or cultivation of reinforced vegetables and herbs.

 Also, regardless of the performance of the room where the equipment is placed, an integrated process line can be constructed at low cost. This reduces the investment burden and makes it easier for ventures to enter the manufacturing field. In addition, small fixed assets are enough to enable small and medium-sized ventures to provide advanced nanotech products. The prosperity of IT software is now proliferating mainly by nanotech hands, and new industries can be created.

 Also, instead of replacing the manufacturing method for a device that is an extension of the conventional technology, a new nanotech device that has not existed in the past (rather than a method for manufacturing a high-tech device that is an extension of the conventional technology) has been improved in cost performance. It can be manufactured by a good re-demanding method. In a high-level environment, pre-treatment, resist coating, baking, exposure, development, post-baking, and the like are achieved by a clean unit system that connects clean units with high levels of cleanliness and harmlessness for each process element. Elemental processes such as etching, thin film growth, metallization, surface observation and assembly can be completed consistently.

In addition, the process is divided into elements, and the processing functions of this element process are assigned to each clean unit or each function unit. By linking a unit or function unit to form an entire system, not only can a high-efficiency nanotechnology platform or biotechnology platform be obtained, but also a nanotechnology process unit and a biotechnology process unit can be obtained. By hybridizing (connecting) them with the platform, a nano-bio fusion platform can be realized. In addition, it is possible to connect plant factory units.

 Also, as with programming, the process flow can be executed and executed without a clean room with the minimum number of clean units and the maximum efficiency by incorporating concepts such as subroutines and branches. In addition, the entire process from input to lockout, or a series of steps that constitute a major part of it, can be performed in a fully automated fashion, analogous to a computer program. ,

 Furthermore, it will be possible to provide a ubiquitous realization environment for nanotechnology and biotechnology.

Claims

The scope of the claims

1. A work room that can maintain a clean environment,

 A clean unit, characterized by having at least one of the rear, upper and lower parts of the working chamber and a connecting part provided at least on one side thereof.

 2. The clean unit according to claim 1, wherein the connection portions are provided at a rear portion and both side portions of the work chamber, respectively.

3. The connecting part according to claim 1 or 2, wherein the connecting part has an opening provided in a wall of the working chamber and a blocking plate provided to open and close the opening. Clean unit.

 4. The clean unit according to claim 3, wherein the blocking plate is a sliding door or a door. ,

 5. The clean unit according to claim 1, wherein the work chamber has an exhaust duct and a passive dust filter.

 6. The clean unit according to claim 5, wherein the clean unit is a chemical process unit.

 7. The clean unit according to claim 1, wherein the working chamber has a ventilation hole and an active dust filter.

 8. The clean unit according to claim 7, wherein a gas flowing out of the ventilation hole is configured to enter an entrance of the active dustproof filter.

 9. The clean unit according to claim 7, wherein all of the gas flowing out of the working chamber is configured to enter an entrance of the active dustproof filter.

10. An airtight tube directly connected to the working chamber is The clean unit according to claim 7, wherein the clean unit is configured to circulate gas by being connected to an inlet of the dustproof filter, and has airtightness.

 11. The clean unit according to claim 7, wherein the clean unit is a non-chemical process unit.

 12. The clean unit according to claim 7, wherein the clean unit is a nanotechnology process unit or a biotechnology process unit.

 13. The clean unit according to claim 1, wherein a work glove is provided at a front portion of the work chamber.

 14. The clean unit according to claim 1, wherein the clean unit is a draft, a clean bench or a glove box. . '

 15 5. The above clean unit is a compact process equipment, analysis equipment, reaction equipment, microchemical system, microchemical reactor, exposure equipment, etching equipment, growth equipment, processing equipment, sterilization equipment, particle size filter, 2. The clean unit according to claim 1, further comprising an artificial light source, a bio device, a food processing device, an inspection device, or a drive device therein.

 16. The clean unit according to claim 15, wherein the artificial light source is a light emitting diode or a semiconductor laser having a spectrum half width of 30 nm or less.

 17. The clean unit according to claim 16, wherein the semiconductor laser is a pulse-driven semiconductor laser.

18. The clean unit according to claim 15, wherein the artificial light source is for growing cell lines or growing plants.

19. The gas flowing out of the working chamber is configured to enter the entrance of the active dust filter after passing through an adsorption device and / or abatement device. Clean unit as described.

 20. The clean unit according to claim 7, wherein an exhaust duct connected to the outside world is provided in the adsorbing device and / or the abatement device.

 2 1. In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

 At least one of the plurality of clean units described above is

 A work room that can maintain a clean environment,

 A clean unit system comprising: at least one of a rear part, an upper part, and a lower part of the work chamber, and a connecting part provided at least on one side.

 22. A non-single linear arrangement, a broken line arrangement, a branch arrangement, a loop arrangement, or a mixed arrangement of two or more thereof, including a portion where the clean unit is connected. Clean unit system according to clause 21.

 2 3. In a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

At least one of the plurality of clean units has a plurality of connecting portions, and the plurality of connecting portions are such that directions in which the sample passes through the connecting portions are non-parallel or orthogonal to each other. At least The clean unit system also includes two connecting parts.

24. In a clean unit system in which a plurality of clean units are connected, each having a working room capable of maintaining a clean environment,

 A clean unit system comprising a portion where the above clean unit is connected in a loop arrangement.

 25. In a clean unit system in which a plurality of clean units are connected, each having a working room capable of maintaining a clean environment,

 Processes of the same type that appear multiple times in a total series of process flows can be performed in the same clean unit by providing a part where the clean units are connected in a loop-like arrangement to the plurality of clean units. A clean unit system characterized by being executable. .

26. The method according to any one of claims 21 to 25, wherein the plurality of clean units include a nanotechnology process unit and / or a biotechnology process unit. Clean unit system as described.

 27. In a material processing method for processing a material using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

The above-mentioned plurality of clean units include a portion in which a plurality of clean units each having a compact device of a different type therein are connected in a broken line or a loop shape. A material processing method characterized in that all or a major part of the work flow is executed consistently.

28. In an element manufacturing method for manufacturing an element using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

 The above-mentioned plurality of clean units include a portion in which a plurality of clean units each having a compact device of a different type therein are connected in a broken line or a loop shape. An element manufacturing method characterized in that all or a main part of a series of process flows is executed consistently.

 29. In a cell line cultivation method for culturing a cell line using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

 The above-mentioned plurality of clean units include a portion in which a plurality of clean units each having a compact device of a different type therein are connected in a polygonal line or a loop shape. A method for cultivating a cell line, characterized in that all or a main part of a series of process flows is executed consistently.

 30. In a plant growing method for growing plants using a clean unit system in which a plurality of clean units having a work room capable of maintaining a clean environment are connected,

 The above-mentioned plurality of clean units include a portion in which a plurality of clean units, each having a compact device of a different type therein, are connected in a broken line or a loop arrangement. A method for cultivating a plant, characterized in that all or a main part of the process flow of the present invention is executed consistently.

3 1. The clean unit system is a process system, material processing system, element manufacturing system, cell-based cultivation system or plant cultivation. Claims 21 and 23 to 35 characterized by being a system

25. A clean unit system according to any one of paragraphs 5 and 30.

 3 2. The above-mentioned process system is a nanotechnology process system or a biotechnology process system.

-The clean unit system according to paragraph 31 of the request.

 33. The clean unit system according to claim 31, wherein the material processing system is an inorganic material processing system or an organic material processing system.

 3 4. A working room that can control the internal environment,

 A functional unit, comprising: at least one of a rear portion, an upper portion, and a lower portion of the work chamber, and a connecting portion provided on at least one side. '·

 35. The function unit according to claim 34, wherein the parameter of the internal environment is cleanliness.

 36. The function unit according to claim 34, wherein the parameter of the internal environment is the number of particles having a predetermined particle size.

 37. The parameters of the internal environment are at least one of temperature, humidity, gas components, light spectrum distribution, light intensity, time dependence of light intensity, and plant nutrition components. The function unit according to claim 34.

 3 8. The control means of the internal environment of the above-mentioned work room are temperature control device, humidity control device, high cleanliness device, gas component control device, adsorption device, detoxification device, special wavelength illuminator and closed / open environment. The function unit according to claim 34, wherein at least one of the selection mechanisms is provided.

3 9. It is characterized that the internal environment of the above work room is controlled by computer. The function unit according to claim 34, wherein the function unit is a feature unit.

40. The function unit _{Q according} to claim 39, wherein the control information is downloaded to the computer via the Internet.

 4 1. In a function unit system in which a plurality of function units are connected with a work room that can control the internal environment,

 At least one of the plurality of function units has a work room capable of controlling the internal environment,

 A functional unit system, comprising: at least one of at least one of a rear part, an upper part, and a lower part of the work chamber, and a connecting part provided on at least one of the side parts.

 4 2. In a function unit system in which a plurality of function units having a work room capable of controlling the internal environment are connected,

 At least one of the plurality of functional units has a plurality of connecting portions, and the directions at which the sample passes through the connecting portions are non-parallel to each other or orthogonal to each other. A functional unit system comprising at least two connections.

 4 3. In a function unit system in which a plurality of function units having a work room capable of controlling the internal environment are connected,

 A functional unit system characterized by including a portion where the above functional unit is connected in a loop arrangement.

 4 4. In a function unit system in which a plurality of function units having a work room capable of controlling the internal environment are connected,

Processes of the same type that appear multiple times in a total series of process flows can be performed in the same function unit by providing a portion where the function units are connected in a loop-like arrangement to the function units. A functional unit system characterized by being executable.

 45. The functional unit system is a cell-based cultivation system or a plant cultivation system, and controls the internal environment of the work room based on the control information by a computer to which control information has been downloaded via the Internet. The functional unit system according to any one of claims 41 to 44, characterized by the claims.