WO2004100143A1 - Dispositif et procede d'estampage - Google Patents

Dispositif et procede d'estampage Download PDF

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Publication number
WO2004100143A1
WO2004100143A1 PCT/JP2004/006227 JP2004006227W WO2004100143A1 WO 2004100143 A1 WO2004100143 A1 WO 2004100143A1 JP 2004006227 W JP2004006227 W JP 2004006227W WO 2004100143 A1 WO2004100143 A1 WO 2004100143A1
Authority
WO
WIPO (PCT)
Prior art keywords
stamper
pressing
range
imprint apparatus
pressed
Prior art date
Application number
PCT/JP2004/006227
Other languages
English (en)
Japanese (ja)
Inventor
Mitsuru Takai
Kazuhiro Hattori
Minoru Fujita
Original Assignee
Tdk Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2003131631A external-priority patent/JP2004330680A/ja
Priority claimed from JP2003131652A external-priority patent/JP4155511B2/ja
Application filed by Tdk Corporation filed Critical Tdk Corporation
Publication of WO2004100143A1 publication Critical patent/WO2004100143A1/fr

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/10—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/10—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies
    • B29C43/12—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies using bags surrounding the moulding material or using membranes contacting the moulding material

Definitions

  • the present invention relates to an imprint apparatus and an imprint method for pressing an uneven portion on a resin layer on a base material by pressing another surface of a stamper having an uneven portion formed on one surface to transfer the uneven shape. It is. Background art
  • a stamper (a mold plate: mold) having an uneven portion is pressed by a press machine or the like.
  • An imprint lithography method (hereinafter, also referred to as an “imprint method”) in which an uneven shape is transferred by pressing the resin onto a resin layer by using a conventional method has been known.
  • a resin layer for example, a layer in which a resist material is applied in a thin film shape
  • a base material for example, a layer in which a resist material is applied in a thin film shape
  • a stamper made of metal material with an uneven part formed on one surface is set on the stamper holder and attached to the clamp of the press machine, and the base material is placed on the press machine bed with the resin layer formation surface facing upward. Place.
  • the press is operated to lower the clamp, and the concave and convex portions of the stamper are pressed against the resin layer.
  • the protruding portions of the concavo-convex portions of the stamper are pressed into the resin layer, and the concavo-convex shape is transferred to the resin layer.
  • the stamper is pressed against the resin layer in a state where the stamper is inclined due to the inclination of the clamp with respect to the bed on which the substrate is placed (that is, the inclination of the stamper with respect to the substrate).
  • the amount of protrusion of the protrusion of the stamper into the resin layer may not be uniform over the entire area of the base material. Accordingly, various imprinting methods have been devised to uniformly press the entire area of the stamper so that the amount of protrusion of the convex portion (that is, the depth of the concave portion) into the resin layer is uniform. ing.
  • an apparatus disclosed in International Publication WOO 1/42858 pamphlet uses, for example, a flexible film (flexible membrane 9: rubber film) via a template (template: stamper).
  • the structure is adopted in which the entire area of the template (10) is pressed with a uniform force against the base material (substrate 5) by directly transmitting the hydraulic pressure and the like to the entire area of the substrate.
  • this imprint apparatus has a first main part 1 on which a base material (5) is set and a second main part (second main part) on which a template (10) is set. parts 3). Further, the first main part (1) is configured such that the base material (5) supported by the support plate (support plate 4) can be placed thereon.
  • the base material (5) is formed in a flat plate shape of, for example, silicon or the like, and a resin layer is formed on the surface (5a).
  • the second main part (3) is attached to the second horizontal base plate (13) and the second horizontal base plate (13), and its bottom opening is formed by the membrane (9).
  • a closed box constitutes a cavity (cavity 6) in which hydraulic oil (hydraulic oil) is supplied via an injection path (inlet plate 12) by an oil pump (not shown).
  • the template (10) has a fine irregular pattern of nanometer size formed on its surface (10a) and is attached to the membrane (9).
  • the template is moved along with the lowering of the second main part (3).
  • the film (9) is deformed. Therefore, it is possible to bring the template (10) into planar contact with the substrate (5).
  • hydraulic oil supplied to the cavity (6) is applied to the entire area of the template (10) through the membrane (9). Pressure is evenly applied. Therefore, it is possible to make the pushing amount of the convex portion of the template (10) into the base material (5) uniform over the entire area of the base material (5). Disclosure of the invention
  • the present invention has been made to solve the above-described problems, and provides an imprint apparatus and an imprint method capable of transferring a convex shape having a concave portion having a uniform depth over the entire resin layer. Its main purpose is to:
  • an uneven portion is formed on one surface and the other surface of the flexible stamper is pressed to press the concave and convex portion against the resin layer on the base material to form the uneven shape. From the state in which a predetermined part of the other surface of the stamper is pressed against the pressing means, the pressing range of the pressing means by the pressing means, and the pressing means. And a pressing operation control mechanism for gradually expanding any range of the pressing completion range by the pressing means in multiple steps or steplessly.
  • the resin layer on the base material is formed by pressing the other surface of the flexible stamper while forming the uneven portion on one surface thereof.
  • pressing the concave and convex portions to transfer the concave and convex shape to the resin layer a state in which a predetermined part of the other surface of the stamper is pressed, a pressing range for the stamper, and a completion of pressing for the stamper
  • the V of the range, the range of the deviation is gradually expanded in multiple steps or steplessly.
  • the pressing operation control mechanism causes the pressing means to press a predetermined part of the other surface of the stamper from one of the pressing range and the pressing completion range.
  • the pressing operation control mechanism includes: a pressing range adjusting unit that adjusts the pressing range of the stamper by the pressing unit; and a control unit that controls the pressing range adjusting unit so as to gradually expand the pressing range to increase the pressing range. And a control unit for pressing the entire area of the other surface in the above.
  • the pressing range adjusting means gradually expands the pressing range from a state in which the pressing means presses a predetermined portion on the other surface of the stamper under the control of the control unit, and the pressing range is gradually increased.
  • the convex portion in the resin layer can be formed to have a large thickness. Therefore, for example, the substrate is etched using this resin layer as a mask. In the case where the masking treatment is performed, the concave portion can be formed in one surface of the base material in a short time, and the one surface of the base material to be protected by the mask (resin layer) can be surely protected.
  • the pressing means is formed in a bag shape which can be expanded by supplying a gas or a liquid to an internal space thereof, and has an elastic deformation portion which can press the other surface of the stamper when inflated. It is preferred that With such a configuration, the pressing range on the stamper can be surely expanded in a stepless (or multi-step) manner while having a relatively simple configuration. Therefore, as a result of reducing the manufacturing cost of the pressing means in the present invention, it is possible to sufficiently reduce the cost required for transferring the uneven shape.
  • the pressing range adjusting means includes a diaphragm mechanism having a plurality of diaphragm blades for adjusting an amount of expansion of the elastically deforming portion
  • the pressing range adjusting means includes a diaphragm mechanism having a plurality of diaphragm blades.
  • the center of the other surface of the stamper is pressed as the predetermined part, and in this state, the diaphragm blade is slid and the diameter of the opening is gradually increased to expand the elastically deformable portion. It is preferable that the pressing range by the elastically deforming portion is gradually expanded in the outer edge direction of the stamper.
  • the pressing range of the elastically deformable portion against the stamper can be reliably and easily adjusted while having a relatively simple configuration. Further, by gradually expanding the pressing range from the center of the stamper to the outer edge, the thickness of the resin layer can be surely made uniform at a position where the radial distance from the center of the base material is equal. Therefore, a concavo-convex pattern suitable for manufacturing an information recording medium that is a rotating body such as a magnetic disk, an optical disk, and a magneto-optical disk can be formed.
  • the pressing range adjusting means includes a pair of expansion restricting portions for interposing the elastic deformation portion and restricting the expansion thereof, wherein the elastic deformation portion is sandwiched between the two expansion restriction portions. Part of the outer edge of the other surface of the stamper is In this state, one of the expansion restricting portions is slid to gradually expand the gap between the two expansion restricting portions, thereby expanding the elastically deforming portion and pressing the elastically deforming portion. It is preferable that the range is gradually expanded from a part of the outer edge. With this configuration, the protrusions of the stamper can be reliably and sufficiently pressed into the resin layer without trapping air between the stamper and the resist layer during the transfer of the uneven shape. Therefore, the same effects as those of the above imprint apparatus can be obtained.
  • the pressing operation control mechanism may include a control unit. With this configuration, under the control of the control unit, the moving mechanism moves at least one of the pressing unit and the base material from the state where the pressing unit presses the predetermined part against the pressing unit, and the moving unit presses the pressing unit against the stamper.
  • the moving unit presses the pressing unit against the stamper.
  • the recesses in the resin layer on the base material can be formed to have a smaller thickness as compared with the recesses formed by the conventional imprinting method, and can be compared with the protrusions formed by the conventional imprinting method.
  • the protrusions in the resin layer can be formed to have a large thickness. Therefore, for example, when the base material is etched using the resin layer as a mask, a concave portion can be formed in one surface of the base material in a short time, and the one surface of the base material to be protected by the mask (resin layer) can be reliably formed. Can be easily protected.
  • the pressing means includes a nozzle for injecting one of a gas and a liquid toward the other surface of the stamper, and the other means of the stamper is ejected from the nozzle toward the stamper. Said predetermined part of the surface It is preferable to be able to press the minute. With this configuration, the pressing unit that presses the stamper can be configured relatively easily. Therefore, as a result of reducing the manufacturing cost of the pressing means, it is possible to sufficiently reduce the cost required for transferring the uneven shape.
  • the moving mechanism may move at least one of the pressing unit and the base member from a state in which a center of the other surface of the stamper is pressed against the pressing unit as the predetermined part. It is preferable that a portion pressed by the pressing means be spirally movable toward the outer edge of the stamper. With this configuration, the thickness of the resin layer can be reliably made uniform at a portion where the radial distance from the center of the base material is equal. Therefore, a concavo-convex pattern suitable for manufacturing a rotating information recording medium such as a magnetic disk, an optical disk, and a magneto-optical disk can be formed.
  • the moving mechanism presses the pressing unit from a state in which a linear range from the center of the other surface of the stamper to the outer edge of the other surface of the stamper is pressed as the predetermined part. It is preferable that at least one of the means and the base material is moved so that a portion pressed by the pressing means can be moved.
  • the moving mechanism is provided with a rotating mechanism for rotating the base material, and the linear range from the center of rotation by the rotating mechanism on the other surface of the stamper to the outer edge of the stamper is defined as the linear range.
  • the pressing means can be configured to be pressable as a predetermined part.
  • the protrusions of the stamper can be reliably and sufficiently pressed into the resin layer without trapping air between the stamper and the resin layer during the transfer of the uneven shape. Therefore, an effect similar to that of the above-described imprint apparatus can be obtained.
  • FIG. 1 is a block diagram showing a configuration of the imprint apparatus 1.
  • FIG. 2 is a side cross-sectional view showing the configuration of the imprint apparatus 1.
  • FIG. 3 shows the elasticity corresponding to the sliding state of the aperture blades 6a, 6a 'in the aperture mechanism 6 (the opening state of the aperture holes) and the sliding state of the aperture blades 6a, 6a in the left side.
  • FIG. 6 is a plan view showing a pressing range of a stamper 61 by a deforming portion 4.
  • FIG. 4 is a side cross-sectional view showing a state where the center of the stamper 61 is pressed by the elastically deformable portion 4.
  • FIG. 5 is a cross-sectional view of the stamper 61, the resist layer 52, and the disk-shaped substrate 51 in the pressing range A1.
  • FIG. 6 is a cross-sectional view of the stamper 61, the resist layer 52, and the disk-shaped substrate 51 in the non-pressing range A2a.
  • FIG. 7 is a side sectional view showing a state where the pressing range A1 of the stamper 61 by the elastically deformable portion 4 is enlarged from the state shown in FIG. 4 toward the outer edge.
  • FIG. 8 is a side cross-sectional view of the state where the pressing range A1 of the stamper 61 by the elastic deformation portion 4 is further enlarged toward the outer edge of the force shown in FIG.
  • FIG. 9 is a side cross-sectional view showing a state where the pressing range A1 by the elastic deformation portion 4 is further enlarged and the entire area of the stamper 61 is pressed.
  • FIG. 10 is a distribution diagram showing the relationship between each measurement position in the resist layer 52 and the thickness T1 of the concave portion at the measurement position, and the solid line indicates that the transfer of the uneven shape is completed by applying the present invention. The relationship with respect to the state is shown, and the broken line indicates the relationship with respect to the state in which the transfer of the uneven shape is completed by applying the conventional imprint method.
  • FIG. 11 is a distribution diagram showing the relationship between each measurement position in the resist layer 52 and the thickness T2 of the convex portion at the measurement position, and the solid line indicates that the transfer of the uneven shape is completed by applying the present invention.
  • the broken line indicates the conventional imprint method. The relationship of the state in which the transfer of the concave and convex shape is completed by application is shown.
  • FIG. 12 is a side sectional view showing the configuration of the imprint apparatus 1A.
  • FIG. 13 is a plan view showing a relationship between a sliding state of the slide plate 16 in the imprint apparatus 1A and a pressing range of the stamper 61 by the elastic deformation portion 4.
  • FIG. FIG. 14 is a side cross-sectional view showing a state in which the pressing range A1 by the elastic deformation portion 4 in the imprint apparatus 1A is enlarged and the entire area of the stamper 61 is pressed.
  • FIG. 15 is a block diagram showing the configuration of the imprint apparatus 101. As shown in FIG.
  • FIG. 16 is a side sectional view showing the configuration of the imprint apparatus 101.
  • FIG. 17 is a plan view of the stamper 61 for explaining the moving direction of the nozzle 104 by the moving mechanism 103.
  • FIG. 17 is a plan view of the stamper 61 for explaining the moving direction of the nozzle 104 by the moving mechanism 103.
  • FIG. 18 is a plan view of the stamper 61 for explaining the pressing completion range A11 that expands with the movement of the knurling 104.
  • FIG. 18 is a plan view of the stamper 61 for explaining the pressing completion range A11 that expands with the movement of the knurling 104.
  • FIG. 19 is a side cross-sectional view in a state where the center of the stamper 61 is pressed against the resist layer 52 by the compressed air injected from the nozzle 104.
  • FIG. 20 is a cross-sectional view of the stamper 61, the resist layer 52, and the disk-shaped substrate 51 in the pressing completion range A11.
  • FIG. 21 is a cross-sectional view of the stamper 61, the resist layer 52, and the disk-shaped substrate 51 in the non-pressing completion range A12a.
  • FIG. 22 is a side sectional view showing a state where the nozzle 104 has been moved toward the outer edge of the stamper 61 from the state shown in FIG.
  • FIG. 23 is a side cross-sectional view showing a state where the nozzle 104 is further moved toward the outer edge of the stamper 61 from the state shown in FIG.
  • FIG. 24 is a side cross-sectional view showing a state in which the blade 104 is moved above the outer edge of the stamper 61.
  • FIG. 25 is a block diagram illustrating a configuration of the imprint apparatus 101A.
  • FIG. 26 is a side sectional view showing the configuration of the imprint apparatus 101A.
  • FIG. 27 is a plan view showing a state where the nozzle 104 A is positioned above the stamper 61.
  • Fig. 28 shows the rotation of the substrate holder 102 (disk-shaped substrate 51 and stamper 6).
  • FIG. 3 is a plan view for explaining a pressing completion range A 1 1 which expands along with (1 rotation).
  • the imprint apparatus 1 shown in FIG. 1 forms, for example, a fine irregular pattern of nanometer size on the surface of a disk-shaped substrate 51 for an information recording medium (for example, for a discrete track type recording medium).
  • a mask for forming a concavo-convex pattern (for example, a mask made of a photoresist material) can be formed on the disk-shaped substrate 51.
  • the imprint apparatus 1 includes a substrate holder 2, a moving mechanism 3, an elastic deformation unit 4, an air pump 5, a throttle mechanism 6, and a control unit 7.
  • the disk-shaped substrate 51 is constituted by a glass disk having a diameter of 2.5 inches as an example. As shown in FIG.
  • a positive resist is applied to the surface by, for example, a spin coating method.
  • a resist layer 52 (resin layer in the present invention) having a thickness of about 75 nm is formed.
  • the stamper 61 for forming an uneven pattern on the resist layer 52 is, for example, a nickel stamper having a thickness of about 300 xm having an uneven portion formed on one surface thereof (a lower surface in the figure).
  • the base material holder 2 is formed in a box having an upper surface opening, and is configured so that the disk-shaped base material 51 can be placed on the inner bottom surface thereof.
  • a flexible film 21 (for example, a sheet made of silicone rubber) is attached to the upper surface opening of the substrate holder 2.
  • a stamper 61 is attached to the lower surface of the film 21 (the surface facing the disk-shaped substrate 51 in the substrate holder 2) with the uneven portion facing downward.
  • the substrate holder 2 includes a heater 2 a for heating the disk-shaped substrate 51 under the control of the control unit 7.
  • the moving mechanism 3 moves the elastic deformation unit 4 and the throttle mechanism 6 in the vertical direction under the control of the control unit 7.
  • the elastically deforming portion 4 constitutes a pressing means in the present invention in combination with the air pump 5, and as shown in FIG. 2, as an example, is formed in a bag shape by silicone rubber and is formed in the internal space by the air pump 5. It is configured to be inflatable by supplying air (an example of a gas in the present invention). Further, the elastic deformation portion 4 is moved downward by the moving mechanism 3 in the expanded state, and presses the other surface (the upper surface in FIG. 3) of the stamper 61 via the film 21.
  • the air pump 5 supplies air (compressed air) to the internal space of the elastic deformation section 4 under the control of the control section 7.
  • the gas supplied to the elastic deformation section 4 is not limited to air, and various gases such as industrial nitrogen can be adopted. Further, by providing an oil pump instead of the air pump 5, a configuration in which a liquid such as a hydraulic oil is supplied to the elastic deformation section 4 instead of the gas can be adopted.
  • the aperture mechanism 6 corresponds to the pressing range adjusting means of the present invention, and includes a plurality of aperture blades 6a, 6a '.
  • the aperture mechanism 6 constitutes a pressing operation control mechanism according to the present invention in cooperation with the control unit 7, and as shown in the left diagram of FIG. 3, the aperture blades 6a, 6a under the control of the control unit 7.
  • the hole diameter of the opening hole 6b can be adjusted by sliding ⁇ .
  • the diaphragm blades 6 a, 6 a ⁇ ′ restrict the degree of expansion of the intermediate portion (hereinafter, also simply referred to as “elastic deformation portion 4”) in the elastic deformation portion 4. .
  • the control unit 7 controls the heating of the disk-shaped substrate 51 by the heater 2a, and controls the operation of the moving mechanism 3 to move the elastic deformation unit 4 and the like.
  • the control unit 7 controls the supply of air to the elastic deformation unit 4 by the air pump 5 and controls the sliding state of the diaphragm blades 6 a and 6 a-of the diaphragm mechanism 6 to control the expansion state of the elastic deformation unit 4. To control the adjustment.
  • the stamper 61 is attached to the lower surface of the film 21 with the concave and convex portions facing downward, and the disc-shaped substrate 51 is attached to the substrate holder 2 with the surface on which the resist layer 52 is formed facing upward. Place on the bottom plate. At this time, a gap is formed between the lower surface of the stamper 6 1 (the surface on which the uneven portions are formed) and the surface of the resist layer 52 on the disk-shaped substrate 51.
  • the aperture mechanism 6 has aperture blades 6a and 6a ⁇ 'positioned so that the aperture 6b has the smallest diameter.
  • the control unit 7 operates the air pump 5 to supply air to the internal space of the elastic deformation unit 4.
  • the air pump 5 appropriately adjusts the amount of air supplied so as to keep the supply pressure of air to the elastically deformable portion 4 constant. Further, as shown in FIG. 2, expansion of the elastically deformable portion 4 to which the air is supplied by the air pump 5 is restricted such that the lower end side is throttled by the aperture blades 6a and 6a- '.
  • the control section 7 causes the heater 2a to heat the disk-shaped substrate 51. At this time, as an example, the heater 2a heats the disc-shaped substrate 51 so that the resist layer 52 has a force of about S170 ° C. (a temperature equal to or higher than the glass transition point).
  • the control unit 7 moves the elastic deformation unit 4 and the squeezing mechanism 6 downward with respect to the moving mechanism 3 toward the base material holder 2 so that the lower end of the elastic deformation unit 4 is moved as shown in FIG.
  • the part is pressed against the center part (“predetermined part” in the present invention) of the stamper 61 via the film 21.
  • the stamper 6 1 to via film 2 1 is pressed by the elastic deformation portion 4, its central portion is brought into curved so as to protrude downward.
  • the center of the stamper 61 is pressed against the resist layer 52 on the disk-shaped substrate 51.
  • a range in which the stamper 61 is pressed against the resist layer 52 by the elastically deforming portion 4 is also referred to as a pressing range A1.
  • a range in which the stamper 61 is not pressed against the resist layer 52 without being pressed by the elastically deforming portion 4 is also referred to as a non-pressed range A2.
  • the pressing range A 1 Stan par 61 is attached pushes against the resist layer 5 2 example in 1 7 0 kgf Z cm 2 about force.
  • the convex portion of the concave and convex portion of the stamper 61 is pushed into the resist layer 52, and a concave portion is formed in the resist layer 52.
  • the resist material (the resist material forming the resist layer 52) existing at the portion where the protrusion of the stamper 61 is pressed is moved into the recess of the stamper 61.
  • the thickness T2 of the resist layer 52 in the concave portion (that is, the thickness of the convex portion in the resist layer 52) is, for example, about 150 nm. Further, as shown in FIG.
  • non-pressing range A2a a predetermined range of the non-pressing range A2 near the pressing range A1 (hereinafter, also referred to as “non-pressing range A2a”), the stamper 61 The tip of the projection is slightly pushed into the resist layer 52.
  • the non-pressing range A2a there is a sufficient gap between the concave portion of the stamper 61 and the surface of the resist layer 52.
  • the air that is about to be trapped between the dist layer 52 and the dist layer 52 easily moves from the pressed area A1 to the non-pressed area A2 around the pressed area A1. Therefore, the air that is about to be confined in the pressing area A 1 is smoothly pressed from the pressing area A 1 to the non-pressing area A 2, and the air between the stamper 6 1 and the resist layer 52 is removed. Is prevented from being trapped.
  • the controller 7 slides the aperture blades 6a, 6a,... With respect to the aperture mechanism 6 to gradually increase the diameter of the opening 6b in a stepless manner.
  • the control unit 7 slides the aperture blades 6a, 6a, so that the diameter expansion rate of the opening hole 6b is about 1 mm / min, for example.
  • the diameter of the aperture 6b of the aperture mechanism 6 gradually increases.
  • the diameter expansion rate of the opening 6b is not limited to this.
  • the air pump 5 supplies air to the elastic deformation section 4 under the control of the control section 7 so that the pressure becomes constant. Along with this, as shown in FIGS. 7 and 8, the elastically deformable portion 4 is gradually expanded (expansion is allowed).
  • the pressing range A1 in which the stamper 61 is pressed against the resist layer 52 by the elastic deformation portion 4 is gradually enlarged.
  • the convex portions of the stamper 61 are sequentially pushed into the resist layer 52, and the forming range of the concave portions of the resist layer 52 (the range in which the transfer of the concave and convex shapes is completed) is gradually increased. Expanding. Further, the air that is almost trapped between the stamper 61 and the resist layer 52 is pushed away from the pressing range A 1, and finally, the outer edge of the stamper 61 and the resist layer 52 is removed. Can be avoided by being pushed out (discharged).
  • the controller 7 reduces the degree of heating of the disk-shaped substrate 51 with respect to the heater 2a while maintaining the state shown in FIG. 9 for the moving mechanism 3, the air pump 5, and the throttle mechanism 6. For example, the temperature of the resist layer 52 is kept at about 50 ° C. Thereby, the resist material is cured.
  • the resist layer By peeling off the stamper 61 from the 52, a mask made of a resist material (the resist layer 52 with the transferred irregularities) is formed on one surface of the disk-shaped base material 51. Thereafter, the mask is formed on the disk-shaped base material 51. By etching the disk-shaped base material 51 using the mask thus formed, a fine rounded pattern having a nanometer size is formed on one surface of the disk-shaped base material 51. Since the etching process is a known technique, a detailed description thereof will be omitted.
  • the resist layer 52 has a concave portion having a thickness T1 within the range of 2.5 nm or more and 5.0 nm or less over the entire area of the disc-shaped substrate 51. It is formed to a degree that varies within a very narrow range.
  • the resin layer on the base material (5) is formed with the thickness T1 of the concave portion varied within a very wide range from 15 nm to 24 nm in each part of the base material. Is done. For this reason, when the base material (5) is etched using the resin layer on which the concavo-convex pattern is formed as a mask by the conventional imprint apparatus, the base thickness of the resin layer due to the variation in the thickness T1 is reduced.
  • the disk-shaped base material 51 is etched by the imprint apparatus 1 to which the present invention is applied using the resist layer 52 on which the concavo-convex pattern is formed as a mask, the thickness T 1 of the concave portion in the resist layer 52 is reduced. Since it is substantially uniform over the entire area of the disk-shaped substrate 51, a concave portion having a uniform depth is formed over the entire area of the disk-shaped substrate 51.
  • the stamper 61 extends from the center to the outer edge. Since the pressing range A1 is gradually expanded to press the stamper 61 against the resist layer 52, the air that is almost trapped between the stamper 61 and the resist layer 52 can be smoothly pressed. Therefore, the protrusions of the stamper 61 are reliably and sufficiently pressed into the resist layer 52, and as a result, the thickness T1 of the recess formed in the resist layer 52 is equal to or greater than 2.5 nm over the entire area of the disk-shaped base material 51. The thickness is within the range of 0 nm or less.
  • the substrate (5) and the template (10) are pressed.
  • the air between the mold (10) and the mold (10) is stored in the recess of the mold (10), so that it is difficult to sufficiently push the protrusion of the mold (10) into the substrate (5).
  • the thickness T1 of the concave portion formed in the resin layer on the material (5) is 15 nm or more over the entire base material.
  • the substrate (5) is etched using the resin layer on which the concavo-convex pattern is formed by the conventional imprinting device as a mask, it is unnecessary to etch the resin layer with a thickness T1 of 15 nm or more. It takes a lot of work time.
  • the disk-shaped substrate 51 is etched using the resist layer 52 having the concavo-convex pattern formed by the imprint apparatus 1 to which the present invention is applied as a mask, etching of the concave portion in the resist layer 52 is conventionally performed. The process is completed in an extremely short time, and the disk-shaped substrate 51 can be etched quickly.
  • the protrusions of the stamper 61 are sufficiently and uniformly pressed into the resist layer 52, and therefore, as shown by a solid line in FIG.
  • the thickness T2 of the projections of 52 is almost uniform in the range of 145 nm or more and 150 nm or less over the entire area of the disc-shaped substrate 51.
  • the convex portion of the mold (10) is not sufficiently pressed into the resin layer, and moreover, each portion of the substrate (5) Since the amount of indentation varies, as shown by the broken line in the figure, the thickness T2 of the convex portion of the resin layer varies over a wide range from 115 nm to 140 ⁇ m in each part of the base material. It is uniform. Therefore, the conventional imp When the etching process is performed using a mask (resin layer) formed by a lint device, the thickness T2 of the resin layer is reduced before the formation of the concave portion in the base material (5) is completed.
  • the layer that disappears as a mask disappears in a short time, resulting in the inconvenience that one side of the substrate (5) that should be protected by the mask is etched. appear.
  • the etching process is performed using the mask (resist layer 52) formed by the imprint apparatus 1 to which the present invention is applied, the mask remains until the formation of the concave portion in the disk-shaped base material 51 is completed. The site to be protected is sufficiently protected.
  • the pressing range A1 is not changed from the state in which the aperture mechanism 6 presses the center of the other surface of the stamper 61 against the elastically deformable portion 4.
  • the stamper 61 can be pressed against the resist layer 52 with a sufficient pressing force without enclosing the air between the stamper 61 and the resist layer 52.
  • the protrusions of the stamper 61 can be reliably and sufficiently pressed into the resist layer 52, and consequently the uneven shape having a recess having a uniform depth over the entire area of the disk-shaped substrate 51 is transferred.
  • Forming a concavo-convex pattern Therefore, for example, when the disk-shaped substrate 51 is etched using the resist layer 52 as a mask, a concave portion having a uniform depth can be formed on one surface of the disk-shaped substrate 51.
  • the recesses in the resist layer 52 on the disk-shaped substrate 51 can be formed to have a smaller thickness T1 as compared with the recesses formed by the conventional imprint method, and can be formed by the conventional imprint method.
  • the protrusions in the resist layer 52 can be formed to have a thicker thickness T2 as compared to the protrusions formed.
  • a concave portion can be formed on one surface of the disc-shaped base material 51 in a short time, and the disc-shaped base material 51 to be protected by the mask (the resist layer 52). Can surely be protected.
  • the air pump 5 supplies air to the internal space to form an inflatable bag-like shape, and at the same time presses the other surface of the stamper 61 when inflated. Since the pressing means of the present invention is provided with the deformable portion 4, the pressing range A1 on the stamper 61 can be reliably increased steplessly (or in multiple steps) while having a relatively simple configuration. . Therefore, as a result of reducing the manufacturing cost of the pressing means in the present invention, it is possible to sufficiently reduce the cost required for transferring the uneven shape.
  • each of the aperture blades 6a, 6a- ' is slid to increase the diameter of the opening 6b, so that the pressing range A1 is increased in the outer edge direction of the stamper 61.
  • the drawing mechanism 6 By configuring the drawing mechanism 6 in such a manner, the pressing range A 1 of the elastically deformable portion 4 on the stamper 6 1 can be reliably and easily adjusted while having a relatively simple configuration.
  • the thickness of the resist layer 52 at a position where the radial distance from the center of the disk-shaped base material 51 is equal is obtained.
  • T 1 and T 2 can be reliably made uniform. Therefore, a concavo-convex pattern suitable for manufacturing an information recording medium that is a rotating body such as a magnetic disk, an optical disk, and a magneto-optical disk can be formed.
  • the configuration and method for gradually expanding the pressing range A1 and transferring the uneven shape of the stamper 61 to the resist layer 52 are not limited to the above configuration and method.
  • a flat slide plate 16 (a "pair of expansion restricting portions" in the present invention) is used.
  • the side wall 2 b of the substrate holder 2 (the other of the pair of expansion restricting portions in the present invention) to sandwich the elastic deforming portion 4 and regulate the expansion of the elastic deforming portion 4.
  • a configuration for controlling the pressure can be adopted.
  • the slide plate 16 slides in the direction of the arrow B1 with respect to the base material holder 2 in a state where the elastic deformation portion 4 presses a part of the outer edge of the stamper 61. Let me do. At this time, as the slide plate 16 slides, the gap 16a between the tip end of the slide plate 16 and the side wall 2b of the substrate holder 2 gradually increases. As a result, the elastically deformable portion 4 gradually expands, and as shown in FIG.
  • the pressing range of the stamper 61 by the elastically deforming portion 4 becomes the pressing range A1-1-1, A1-2, A1-3. It gradually expands like.
  • the entire area of the stamper 61 is pressed against the resist layer 52, and the uneven shape of the stamper 61 is transferred to the resist layer 52.
  • the imprint apparatus 1A similarly to the above-described imprint apparatus 1, the convexities of the stamper 61 are not enclosed between the stamper 61 and the resist layer 52 during the transfer of the uneven shape. The portion can be reliably and sufficiently pressed into the resist layer 52. Therefore, the same effect as that of the imprint apparatus 1 can be obtained.
  • the pressing range A1 of the stamper 61 by the elastic deformation portion 4 is gradually expanded steplessly by expanding the diameter of the opening hole 6b steplessly.
  • 6a, 6a- ' is slid stepwise to increase the diameter of the opening 6b in multiple steps to gradually expand the pressing range A1 of the stamper 61 by the elastic deformation part 4 in multiple steps.
  • a force is employed in which the elastically deforming portion 4 presses the stamper 61 via the film 21.
  • the present invention is not limited to this. 6 1 It is possible to adopt a configuration in which the upper surface (the other surface in the present invention) is directly pressed.
  • the present invention is not limited to this. Not limited.
  • the pressing range A1 expands, A configuration in which the pressure of the air supplied from the pump 5 is gradually increased can be adopted.
  • the imprint apparatuses 1 and 1A can be used upside down. In this case, by disposing means for holding the disk-shaped substrate 51 (for example, a suction portion for sucking the disk-shaped substrate 51) in the substrate holder 2, the disk-shaped substrate 51 can be prevented from dropping. .
  • the imprint apparatus 101 shown in FIG. 15 forms, for example, a fine uneven pattern of nanometer size on the surface of a disk-shaped base material 51 for an information recording medium (for example, for a discrete track type recording medium).
  • a mask for forming a concavo-convex pattern (for example, a mask made of a photoresist material) can be formed on the disk-shaped substrate 51.
  • the imprint apparatus 101 includes a substrate holder 102, a moving mechanism 103, a nozzle 104, an air pump 105, and a control unit 106.
  • the disc-shaped base material 51, the resist layer 52, and the stamper 61 are the same as those used for imprinting by the imprint apparatus 1, 1A described above. A duplicate description will be omitted.
  • the base material holder 102 is formed in a box having an upper surface opening, and is configured such that the disk-shaped base material 51 can be placed on its bottom surface.
  • a flexible film 121 (for example, a sheet made of silicone rubber) is attached to the upper surface opening of the substrate holder 102, and a lower surface (the substrate holder) of the film 122 is attached.
  • a stamper 61 is attached to the surface of the die 102 opposite to the disk-shaped substrate 51) with the concave and convex portions facing downward.
  • the substrate holder 102 is provided with a heater 102a for heating the disk-shaped substrate 51 under the control of the control unit 106.
  • the moving mechanism 103 constitutes a pressing operation control mechanism according to the present invention in cooperation with the controller 106, and controls the nozzle 104 to control the stamper 6 under the control of the controller 106. Move on one.
  • the moving mechanism 103 is indicated by an arrow B2 from the state where the nozzle 104 is positioned at the center of the stamper 61 toward the outer edge of the stamper 61.
  • the nozzle 104 is moved so as to draw a spiral locus as described above.
  • the nozzle 104 together with the air pump 105, constitutes a pressing means in the present invention, and is attached to the moving mechanism 103, and is supplied with compressed air supplied by the air pump 105 (gas of the present invention). Is directed toward the other surface of the stamper 6 1 (in this case, the other surface of the stamper 6 1 via the film 12 1 on which the stamper 6 1 is mounted), so that the Then, the other surface (the upper surface in FIG. 16) of the stamper 61 is partially pressed (a predetermined portion in the present invention). In this case, the nozzle 104 is moved by the moving mechanism 103 so as to draw a spiral trajectory while injecting compressed air.
  • the range in which the stamper 61 is pressed by the compressed air (the range in which the stamper 61 has been pressed: hereinafter also referred to as the “pressing completed range”) is, as shown in FIG. Pressing complete range at the center of the stamper 61 where the nozzle 104 was located at the beginning of the press A 1 1-1 Force to the outer edge of the stamper 61 and press complete range A 1 1-2 , A ll- 3 ⁇ ⁇ , A 1 1-5 gradually expands (hereinafter referred to as “pressing completion range A 11 1” when no distinction is made).
  • the air pump 105 supplies air (compressed air) to the nozzle 104 under the control of the control unit 106.
  • the gas supplied to the nozzle 104 is not limited to air, and various gases such as industrial nitrogen can be used. Further, by disposing an oil pump instead of the air pump 105, it is also possible to adopt a configuration in which a liquid such as hydraulic oil is supplied to the nozzle 04 and injected instead of gas.
  • the stamper 61 is mounted on the lower surface of the film 121 with the concave and convex portions facing downward, and the disc-shaped substrate 51 is formed with the surface on which the resist layer 52 is formed facing upward. Place on the bottom plate of the material holder 102. At this time, a gap is formed between the lower surface of the stamper 61 (the surface on which the uneven portions are formed) and the surface of the resist layer 52 on the disk-shaped substrate 51. Further, the nozzle 104 is positioned above the center of the stamper 61 by the moving mechanism 103. Next, the controller 106 heats the disk-shaped substrate 51 with the heater 102a.
  • the heater 102a heats the disk-shaped substrate 51 so that the resist layer 52 has a force of about S170 ° C. (a temperature not lower than the glass transition point).
  • the control unit 106 operates the air pump 105 to start supplying air to the nozzle 104.
  • the air pump 105 appropriately adjusts the supply amount of the compressed air to the nozzle 104 so as to keep the supply pressure constant until the transfer of the uneven shape is completed.
  • compressed air is sprayed from the nozzle 104 supplied with air by the air pump 105 toward the other surface of the stamper 61 (in this case, the surface of the film 121).
  • the center of the stamper 61 (the “predetermined part” in the present invention) is pressed by the compressed air injected from the nozzle 104, and The portion is curved so as to project downward. As a result, the center of the stamper 61 is pressed against the resist layer 52 on the disk-shaped substrate 51.
  • the pressing completion range A 1 1 the stamper 61 is pressed at 1 7 0 kgf Z cm 2 force of about For example the resist layer 5 2.
  • the convex portion of the concave and convex portion of the stamper 61 is pushed into the resist layer 52, and a concave portion is formed in the resist layer 52. You.
  • the distance between the convex portion of the stamper 61 and one surface of the disk-shaped base material 51 (that is, the concave portion formed in the resist layer 52).
  • Thickness of the bottom part in T 1 1) ⁇ As an example, it is about 5 nm.
  • the resist material (the resist material forming the resist layer 52) existing at the portion where the protrusion of the stamper 61 is pressed is moved into the recess of the stamper 61, and as a result,
  • the thickness T12 of the resist layer 52 in the concave portion (that is, the thickness of the convex portion in the resist layer 52) is, for example, about 150 nm.
  • a range where the pressing of the stamper 61 against the resist layer 52 is not completed without being pressed by the compressed air (hereinafter, also referred to as a “non-pressing completed range A 1 2”).
  • the tip of the convex portion of the stamper 6 1 is slightly in the resist layer 52. It will be in the pressed state.
  • the non-pressing completion range A12a there is a sufficient gap between the concave portion of the stamper 61 and the surface of the resist layer 52.
  • the air that is about to be trapped between the layer 52 and the layer 52 easily moves from the pressing completion area A11 to the non-pressing completion area A12 around the pressing completion area A11. Therefore, the air that is about to be confined in the pressing completion range A 11 is smoothly pressed from the pressing completion range A 1 1 to the non-pressing completion range A 12, and the stamper 6 1 and the resist layer 5 2 The situation in which air is trapped during the period is avoided.
  • the control unit 106 moves the nozzle 104 so as to draw a spiral trajectory with respect to the moving mechanism 103.
  • the nozzle 104 is moved toward the outer edge of the stamper 61, and is pressed by the compressed air injected from the nozzle 104.
  • the pressed completion range A 11 is gradually enlarged toward the outer edge of the stamper 61.
  • the protrusions of the stamper 6 1 are sequentially pushed into the resist layer 52, and the formation area of the M portion of the resist layer 52 (the area where the transfer of the uneven shape is completed) Gradually expands.
  • the air that is about to be trapped between the stamper 61 and the resist layer 52 is prevented from being pushed from the pressing completion range A 11, and finally the stamper 61 and It can be avoided (discharged) by pushing to the outside through the outer edge of the resist layer 52.
  • the pressing completion range A11 is expanded to the entire area of the stamper 61, the transfer of the concavo-convex shape of the stamper 61 to the resist layer 52 (formation of the concavo-convex pattern) is completed.
  • the control unit 106 stops the supply of the compressed air to the air pump 105 and moves the knurling 104 to the center of the stamper 61 with respect to the moving mechanism 103.
  • control unit 106 lowers the degree of heating of the disk-shaped substrate 51 with respect to the heater 102a, and keeps the temperature of the resist layer 52 at about 50 ° C. as an example. Thereby, the resist material is cured. By removing the stamper 61 from the resist layer 52 in this state, a mask made of the resist material (the resist layer 52 with the transferred irregularities) is formed on one surface of the disk-shaped substrate 51.
  • the disk-shaped base material 51 is etched using a mask formed on the disk-shaped base material 51, thereby forming a nanometer-sized fine uneven pattern on one surface of the disk-shaped base material 51. Since the etching process is a known technique, a detailed description thereof is omitted.
  • the thickness Tl1 of the concave portion of the resist layer 52 is in the range of 2.5 nm or more and 5.0 nm or less over the entire area of the disk-shaped substrate 51.
  • Air is trapped between the material (5) and the template (10).
  • the resin layer on the base material (5) is formed such that the thickness T11 of the concave portion varies in an extremely wide range (for example, in a range of 15 nm or more and 24 nm or less) in each part of the base material. Therefore, using a resin layer on which a concavo-convex pattern is formed by a conventional ), It is difficult to form a concave portion having a uniform depth over the entire area of the base material due to a variation in the thickness T11 of the concave portion in the resin layer.
  • the thickness T 11 of the concave portion in the resist layer 52 was obtained. Is substantially uniform over the entire area of the disk-shaped substrate 51, so that a concave portion having a uniform depth is formed over the entire area of the disk-shaped substrate 51.
  • the pressing completion range A11 is gradually enlarged from the center of the stamper 61 toward the outer edge, and the stamper 61 is pressed against the resist layer 52.
  • the air that has been trapped in between can be pushed smoothly and avoided. Therefore, the protrusions of the stamper 61 are securely and positively pressed into the resist layer 52, and as a result, the thickness Tl 1 of the recess formed in the resist layer 52 is 2.5 nm over the entire area of the disk-shaped substrate 51.
  • the thickness is in the range of 5.0 nm or less.
  • the substrate (5) and the template (10) are pressed.
  • the thickness Tl1 of the four portions formed on the upper resin layer is 15 nm or more over the entire base material. Therefore, when the substrate (5) was etched using the resin layer on which the concavo-convex pattern was formed by a conventional imprinting device as a mask, only the amount of etching the resin layer with a thickness of 15 ⁇ m or more ⁇ 11 Unnecessary work time is required.
  • the disk-shaped substrate 51 is etched by the imprint apparatus 101 to which the present invention is applied using the resist layer 52 on which the concavo-convex pattern is formed as a mask, the recesses in the resist layer 52 are etched. The process is completed in a much shorter time than before, and the disk-shaped substrate 51 can be rapidly etched. Further, when the concavo-convex pattern is formed by the imprint apparatus 101, the convex portions of the stamper 61 are sufficiently and uniformly pressed into the resist layer 52, so that the convex portions of the resist layer 52 are formed.
  • the thickness T12 is substantially uniform within the range of not less than 144 nm and not more than 150 nm over the entire area of the disc-shaped substrate 51.
  • the concavo-convex pattern is formed by the conventional imprinting apparatus
  • the convex portions of the mold (10) are not sufficiently pushed into the resin layer, and the respective portions of the base material (5) Therefore, the thickness T12 of the convex portion of the resin layer varies in a wide range from 115 nm to 140 nm in each part of the base material, resulting in unevenness. Therefore, when etching is performed using a mask (resin layer) formed by a conventional imprint apparatus, the thickness T12 of the resin layer is reduced before the formation of the concave portion in the base material (5) is completed.
  • the resin layer serving as a mask disappears in a short time at the portion (the portion of about 115 nm in the above example), so that one surface of the base material (5), which should be protected by the mask, is etched.
  • the inconvenient situation occurs.
  • etching is performed using a mask (resist layer 52) formed by the imprint apparatus 101 to which the present invention is applied, formation of a concave portion in the disk-shaped base material 51 is not achieved. Until completion, the area to be protected by the mask is well protected.
  • the moving mechanism 103 causes the nozzle 104 to emit compressed air toward the center of the stamper 61, thereby causing the stamper 61 to emit compressed air.
  • the pressing completion range A11 to the stamper is gradually expanded, so that air is released between the stamper 61 and the resist layer 52.
  • the stamper 61 can be pressed against the resist layer 52 with a sufficient pressing force without sealing.
  • the protrusions of the stamper 61 can be reliably and sufficiently pressed into the resist layer 52, and as a result, a concave-convex shape having a recess having a uniform depth over the entire area of the disk-shaped substrate 51 is transferred. (Forming a concavo-convex pattern). Therefore, for example When the disk-shaped substrate 51 is etched using the resist layer 52 as a mask, a concave portion having a uniform depth can be formed on one surface of the disk-shaped substrate 51. By gradually enlarging 1, air between the stamper 6 1 and the resist layer 52 can be smoothly pushed and avoided, thereby avoiding the situation where air is stored in the recess of the stamper 6 1.
  • the protrusion can be sufficiently pressed into the resist layer 52.
  • the concave portion in the resist layer 52 on the disk-shaped substrate 51 can be formed to have a smaller thickness T11 as compared with the concave portion formed by the conventional imprint method, and the conventional imprint method can be used.
  • the projections in the resist layer 52 can be formed to have a thicker thickness T12. Therefore, for example, when the disk-shaped substrate 51 is etched using the resist layer 52 as a mask, a concave portion can be formed on one surface of the disk-shaped substrate 51 in a short time, and the mask (resist layer 5 2) can surely protect one surface of the disk-shaped substrate 51 to be protected.
  • the nozzle 104 configured to be able to press the other surface by injecting gas (in this case, compressed air) toward the other surface of the stamper 61 is provided.
  • gas in this case, compressed air
  • the moving mechanism 103 presses the nozzle 104 by injecting compressed air with the center of the other surface of the stamper 61 as a predetermined part.
  • the disk-shaped substrate 5 The thicknesses T 11 and T 12 of the resist layer 52 at the positions where the radial distance from the center of The uniformity can be ensured. Therefore, a concavo-convex pattern suitable for manufacturing a rotating information recording medium such as a magnetic disk, an optical disk, and a magneto-optical disk can be formed.
  • a configuration method for gradually expanding the pressing completion range A11 and transferring the uneven shape of the stamper 61 to the resist layer 52 is not limited to the above configuration method.
  • a rotating mechanism 103A for rotating the base material holder 102 is provided, and the imprint apparatus The imprint apparatus 101A can be configured by disposing a nozzle 104A having a slit-shaped aperture in place of the nozzle 104 in 101.
  • the same components as those of the imprint apparatus 101 are denoted by the same reference numerals, and description thereof will be omitted.
  • the imprint apparatus 101A as shown in FIG.
  • the nozzle 104A has a slit-shaped injection port, and the center of the stamper 61 (the rotation mechanism by the rotation mechanism 103A). Compressed air can be blown over a linear range (linear range) from the center to the outer edge. Also, unlike the above-described imprint apparatus 101, the nozzle 104A has one end in the width direction located above the center of the stamper 61 as shown in FIG. The other end in the width direction is fixed so as to be located above the outer edge of the stamper 61. On the other hand, the rotating mechanism 103 A is configured to be able to rotate the substrate holder 102 on which the disk-shaped substrate 51 is placed.
  • the range in which the stamper 61 was pressed against the resist layer 52 by the compressed air jetted from the nozzle 104 A was the pressing completion range A 1 1-1 1, A ll—1 2 ⁇ A ll—15
  • the pressing of the entire area of the stamper 61 against the resist layer 52 is completed, and the uneven shape of the stamper 61 is transferred to the resist layer 52.
  • the imprint apparatus 101A similarly to the above-described imprint apparatus 101, the stamper is not sealed between the stamper 61 and the resist layer 52 during the transfer of the uneven shape, and the stamper is not used. 6 1 can be reliably and sufficiently pressed into the resist layer 52. Therefore, the same effect as that of the imprint apparatus 101 can be obtained.
  • a printing mechanism which has a moving mechanism for rotating the nosepiece 104A on the stamper 61 with the center of the stamper 61 as a rotation center.
  • An apparatus can also be configured, and even when this configuration is employed, the same effect as that of the imprint apparatus 101A can be obtained.
  • the present invention is not limited to this, and the nozzle 104 is moved to a predetermined position.
  • the disk-shaped base material 51 is moved by moving the base material holder 102 along a spiral trajectory by the moving mechanism, and the pressing completion range A 1 1 is moved to the outer edge of the stamper 6 1. It is possible to adopt a configuration that can be expanded toward the part.
  • the stamper 161 is pressed via the film 121 by the compressed air jetted from the nozzles 104 and 104A.
  • the present invention is not limited to this, and a configuration in which compressed air or the like is directly blown onto the upper surface (the other surface in the present invention) of the stamper 61 to press the stamper 61 may be employed. it can. Furthermore, a configuration has been described in which the air pump 105 supplies compressed air to the nozzle 104 so that the supply pressure is kept constant when the stamper 61 is pressed, but the present invention is not limited to this. Also, The imprint apparatus 101 and 101A can be used upside down. In this case, the means for holding the disk-shaped substrate 51 (for example, a suction portion for sucking the disk-shaped substrate 51) is disposed in the substrate holder 102 to prevent the disk-shaped substrate 51 from dropping. Is done.
  • the present invention is not limited to the above configuration and method.
  • the resin layer in the present invention is not limited to a layer made of a resist material, and can be formed by applying various resin materials on a base material in a thin film form.
  • the disk-shaped substrate 51 is not limited to a substrate for an information recording medium, and the substrate in the present invention includes a substrate for manufacturing a semiconductor element.
  • the resin layer for transferring the uneven shape is not limited to the above-described resin layer for forming a mask (resist layer 52), but may be used for forming a base for so-called lift-off or a base for forming a nickel stamper.
  • the resin layer (resist layer) and the like are included in the resin layer in the present invention.
  • the pressing operation control mechanism changes one of the pressing range and the pressing completion range from the state in which the pressing means presses a predetermined part on the other surface of the stamper.
  • the stamper can be pressed against the resin layer without confining air between the stamper and the resin layer.
  • the protrusions of the stamper can be reliably and sufficiently pressed into the resin layer, and as a result, an uneven shape having a concave portion having a uniform depth over the entire area of the base material is transferred (forming an uneven pattern).

Abstract

L'invention porte sur un dispositif d'estampage comportant: une section à déformation élastique (4) comprimant l'autre face d'une matrice (61) dont une surface en creux et en bosses est pressée contre une couche de réserve (52) disposée sur un matériau (51) de base en forme de disque pour y imprimer la forme de ses parties en creux et bosses; un mécanisme de compression (6) permettant d'ajuster la plage des pressions exercées par la matrice au moyen de la section à déformation élastique (4). Ledit mécanisme (6) élargit par paliers ou graduellement, à l'aide de la section à déformation élastique (4), la zone de pression en partant de la zone centrale de l'autre surface de la matrice (61) et en aboutissant à la totalité de la surface de l'autre côté de la matrice.
PCT/JP2004/006227 2003-05-09 2004-04-28 Dispositif et procede d'estampage WO2004100143A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003-131652 2003-05-09
JP2003-131631 2003-05-09
JP2003131631A JP2004330680A (ja) 2003-05-09 2003-05-09 インプリント装置およびインプリント方法
JP2003131652A JP4155511B2 (ja) 2003-05-09 2003-05-09 インプリント装置およびインプリント方法

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Publication Number Publication Date
WO2004100143A1 true WO2004100143A1 (fr) 2004-11-18

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7500431B2 (en) 2006-01-12 2009-03-10 Tsai-Wei Wu System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure
JP2010225254A (ja) * 2009-03-25 2010-10-07 Victor Co Of Japan Ltd 光ディスク製造方法及び光ディスク製造装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0270412A (ja) * 1988-09-07 1990-03-09 Hitachi Ltd 合成樹脂成形品の製造用スタンパ
JPH02126434A (ja) * 1988-11-05 1990-05-15 Mitsubishi Electric Corp 光デイスク基板成形方法
JPH02305612A (ja) * 1989-03-13 1990-12-19 Nippon Sheet Glass Co Ltd 微細パターン付き基板の製造方法
JPH08106655A (ja) * 1992-02-29 1996-04-23 Takeda Giken Kogyo:Kk ディスクの製造方法及びディスクプレス装置
JPH0944915A (ja) * 1995-07-25 1997-02-14 Sony Corp 光ディスクの製造方法及び製造装置
JP2002269853A (ja) * 2001-03-06 2002-09-20 Sony Corp 光ディスクの製造方法および光ディスクの製造装置
JP2002304773A (ja) * 2001-04-10 2002-10-18 Sony Corp 加圧接合方法とその装置
JP2002367235A (ja) * 2001-06-08 2002-12-20 Hitachi Ltd 多層構造ディスクの製造方法と製造装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0270412A (ja) * 1988-09-07 1990-03-09 Hitachi Ltd 合成樹脂成形品の製造用スタンパ
JPH02126434A (ja) * 1988-11-05 1990-05-15 Mitsubishi Electric Corp 光デイスク基板成形方法
JPH02305612A (ja) * 1989-03-13 1990-12-19 Nippon Sheet Glass Co Ltd 微細パターン付き基板の製造方法
JPH08106655A (ja) * 1992-02-29 1996-04-23 Takeda Giken Kogyo:Kk ディスクの製造方法及びディスクプレス装置
JPH0944915A (ja) * 1995-07-25 1997-02-14 Sony Corp 光ディスクの製造方法及び製造装置
JP2002269853A (ja) * 2001-03-06 2002-09-20 Sony Corp 光ディスクの製造方法および光ディスクの製造装置
JP2002304773A (ja) * 2001-04-10 2002-10-18 Sony Corp 加圧接合方法とその装置
JP2002367235A (ja) * 2001-06-08 2002-12-20 Hitachi Ltd 多層構造ディスクの製造方法と製造装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7500431B2 (en) 2006-01-12 2009-03-10 Tsai-Wei Wu System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure
US7617769B2 (en) 2006-01-12 2009-11-17 Hitachi Global Storage Technologies Netherlands B.V. System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure
JP2010225254A (ja) * 2009-03-25 2010-10-07 Victor Co Of Japan Ltd 光ディスク製造方法及び光ディスク製造装置

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