WO2004061889A2 - Magnet assembly for sputter ion pump - Google Patents
Magnet assembly for sputter ion pump Download PDFInfo
- Publication number
- WO2004061889A2 WO2004061889A2 PCT/US2003/037878 US0337878W WO2004061889A2 WO 2004061889 A2 WO2004061889 A2 WO 2004061889A2 US 0337878 W US0337878 W US 0337878W WO 2004061889 A2 WO2004061889 A2 WO 2004061889A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- magnets
- anode
- magnet
- cells
- primary
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
Definitions
- Fig. 3 is a simplified schematic diagram of a sputter ion pump in accordance with an embodiment of the invention.
- Fig. 5 is a top view of the sputter ion pump shown in Fig. 4;
- FIG. 3 A simplified schematic diagram of a sputter ion pump in accordance with an embodiment of the invention is shown in Fig. 3.
- Anode cells 120a, 120b, ... 120n are located between and are spaced from cathode plates 124 and 126.
- the ion pump may include one or more anode cells.
- Each anode cell may have a cylindrical configuration and may be fabricated of stainless steel.
- the anode cells 120a, 120b, ... 120n are oriented with their axes parallel to each other and perpendicular to cathode plates 124, 126.
- Cathode plates 124 and 126 may be fabricated of titanium or tantalum, for example.
- primary magnet 142 is affixed to an inner surface of end 150a of magnet yoke 150
- primary magnet 144 is affixed to an inner surface of end 150b of magnet yoke 150
- Secondary magnets 160 and 162 are affixed to an inner surface of side 150c of magnet yoke 150
- secondary magnets 164 and 166 are affixed to an inner surface of side 150d of magnet yoke 150.
- magnets 160 and 162 of opposite polarities are located on side 150c of magnet yoke 150
- secondary magnets 164 and 166 of opposite polarities are located on side 150d of magnet yoke 150.
- Each of the secondary magnets 160, 162, 164 and 166 is located adj acent to a primary magnet of like polarity.
Landscapes
- Electron Tubes For Measurement (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004565119A JP2006511921A (en) | 2002-12-18 | 2003-11-25 | Magnet assembly for sputter ion pump |
DE60313888T DE60313888T2 (en) | 2002-12-18 | 2003-11-25 | Sputtering ion pump with improved magnet arrangement |
EP03796479A EP1573773B1 (en) | 2002-12-18 | 2003-11-25 | Sputter ion pump comprising an improved magnet assembly |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/322,991 US6835048B2 (en) | 2002-12-18 | 2002-12-18 | Ion pump having secondary magnetic field |
US10/322,991 | 2002-12-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004061889A2 true WO2004061889A2 (en) | 2004-07-22 |
WO2004061889A3 WO2004061889A3 (en) | 2004-09-30 |
Family
ID=32593082
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/037878 WO2004061889A2 (en) | 2002-12-18 | 2003-11-25 | Magnet assembly for sputter ion pump |
Country Status (7)
Country | Link |
---|---|
US (1) | US6835048B2 (en) |
EP (1) | EP1573773B1 (en) |
JP (1) | JP2006511921A (en) |
CN (1) | CN100369178C (en) |
DE (1) | DE60313888T2 (en) |
ES (1) | ES2282728T3 (en) |
WO (1) | WO2004061889A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1863068A1 (en) * | 2006-06-01 | 2007-12-05 | VARIAN S.p.A. | Magnet assembly for a sputter ion pump |
EP2151849A1 (en) | 2008-08-08 | 2010-02-10 | VARIAN S.p.A. | Vacuum pumping system comprising a plurality of sputter ion pumps |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070286738A1 (en) * | 2006-06-12 | 2007-12-13 | Varian, Inc. | Vacuum ion-getter pump with cryogenically cooled cathode |
US7850432B2 (en) * | 2006-09-14 | 2010-12-14 | Gamma Vacuum, Llc | Ion pump having emission containment |
WO2008099612A1 (en) * | 2007-02-16 | 2008-08-21 | National Institute Of Information And Communications Technology | Vacuum conveyance system |
EP2249373B1 (en) * | 2008-02-14 | 2017-08-02 | National Institute of Information and Communications Technology | Ion pump system and electromagnetic field generator |
US8153997B2 (en) * | 2009-05-05 | 2012-04-10 | General Electric Company | Isotope production system and cyclotron |
US8374306B2 (en) | 2009-06-26 | 2013-02-12 | General Electric Company | Isotope production system with separated shielding |
US8453493B2 (en) | 2010-11-02 | 2013-06-04 | Agilent Technologies, Inc. | Trace gas sensing apparatus and methods for leak detection |
CN104952685B (en) * | 2015-01-19 | 2017-11-21 | 中国航天员科研训练中心 | The big pumping speed ionic pump of lightweight |
US10665437B2 (en) * | 2015-02-10 | 2020-05-26 | Hamilton Sundstrand Corporation | System and method for enhanced ion pump lifespan |
US10550829B2 (en) * | 2016-09-08 | 2020-02-04 | Edwards Vacuum Llc | Ion trajectory manipulation architecture in an ion pump |
CN110491764B (en) * | 2019-09-02 | 2022-03-29 | 北京卫星环境工程研究所 | Magnetic yoke assembly of sputtering ion pump |
EP4357860A1 (en) * | 2021-06-14 | 2024-04-24 | National Institute Of Advanced Industrial Science and Technology | Plasma source, and atomic clock employing said plasma source |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994625A (en) * | 1975-02-18 | 1976-11-30 | Varian Associates | Sputter-ion pump having improved cooling and improved magnetic circuitry |
EP0161782A1 (en) * | 1984-04-11 | 1985-11-21 | Sumitomo Special Metal Co., Ltd. | Magnetic field generating device for NMR-CT |
US4937545A (en) * | 1987-03-03 | 1990-06-26 | Commissariat A L'energie Atomique | System of permanent magnets for an intense magnetic field |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3091717A (en) * | 1957-07-24 | 1963-05-28 | Varian Associates | Cathodes for magnetically-confined glow discharge devices |
GB883214A (en) * | 1958-06-16 | 1961-11-29 | Varian Associates | Electrical vacuum pump apparatus |
NL111475C (en) * | 1958-10-15 | |||
US3416722A (en) * | 1967-04-05 | 1968-12-17 | Varian Associates | High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator |
US4334829A (en) * | 1980-02-15 | 1982-06-15 | Rca Corporation | Sputter-ion pump for use with electron tubes having thoriated tungsten cathodes |
JPS58193557U (en) * | 1982-06-18 | 1983-12-23 | 三菱製鋼磁材株式会社 | Magnet device for ion pump |
JPS61218120A (en) * | 1985-03-23 | 1986-09-27 | Sumitomo Special Metals Co Ltd | Magnetic field generator |
JPH079845B2 (en) * | 1986-01-31 | 1995-02-01 | 富士電機株式会社 | Permanent magnet type uniform magnetic field magnet |
US5262028A (en) * | 1992-06-01 | 1993-11-16 | Sierra Applied Sciences, Inc. | Planar magnetron sputtering magnet assembly |
JPH0822803A (en) * | 1994-07-08 | 1996-01-23 | Ulvac Japan Ltd | Sputter ion pump |
JPH0927294A (en) * | 1995-07-12 | 1997-01-28 | Ebara Corp | Ion pump |
CN1166811C (en) * | 1996-01-05 | 2004-09-15 | 日本真空技术株式会社 | Sputter-ion pump |
US6004104A (en) * | 1997-07-14 | 1999-12-21 | Duniway Stockroom Corp. | Cathode structure for sputter ion pump |
US6616417B2 (en) * | 2000-03-13 | 2003-09-09 | Ulvac, Inc. | Spatter ion pump |
-
2002
- 2002-12-18 US US10/322,991 patent/US6835048B2/en not_active Expired - Lifetime
-
2003
- 2003-11-25 WO PCT/US2003/037878 patent/WO2004061889A2/en active IP Right Grant
- 2003-11-25 CN CNB2003801002428A patent/CN100369178C/en not_active Expired - Fee Related
- 2003-11-25 EP EP03796479A patent/EP1573773B1/en not_active Expired - Lifetime
- 2003-11-25 DE DE60313888T patent/DE60313888T2/en not_active Expired - Lifetime
- 2003-11-25 ES ES03796479T patent/ES2282728T3/en not_active Expired - Lifetime
- 2003-11-25 JP JP2004565119A patent/JP2006511921A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994625A (en) * | 1975-02-18 | 1976-11-30 | Varian Associates | Sputter-ion pump having improved cooling and improved magnetic circuitry |
EP0161782A1 (en) * | 1984-04-11 | 1985-11-21 | Sumitomo Special Metal Co., Ltd. | Magnetic field generating device for NMR-CT |
US4937545A (en) * | 1987-03-03 | 1990-06-26 | Commissariat A L'energie Atomique | System of permanent magnets for an intense magnetic field |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1863068A1 (en) * | 2006-06-01 | 2007-12-05 | VARIAN S.p.A. | Magnet assembly for a sputter ion pump |
EP2151849A1 (en) | 2008-08-08 | 2010-02-10 | VARIAN S.p.A. | Vacuum pumping system comprising a plurality of sputter ion pumps |
Also Published As
Publication number | Publication date |
---|---|
US6835048B2 (en) | 2004-12-28 |
CN100369178C (en) | 2008-02-13 |
JP2006511921A (en) | 2006-04-06 |
WO2004061889A3 (en) | 2004-09-30 |
CN1708822A (en) | 2005-12-14 |
DE60313888D1 (en) | 2007-06-28 |
EP1573773B1 (en) | 2007-05-16 |
ES2282728T3 (en) | 2007-10-16 |
EP1573773A2 (en) | 2005-09-14 |
DE60313888T2 (en) | 2008-01-17 |
US20040120826A1 (en) | 2004-06-24 |
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