WO2004039132A3 - Procede destine au traitement de surface par micro-ondes et par le plasma a vide utilisant la resonance electronique cyclotronique - Google Patents

Procede destine au traitement de surface par micro-ondes et par le plasma a vide utilisant la resonance electronique cyclotronique Download PDF

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Publication number
WO2004039132A3
WO2004039132A3 PCT/RU2003/000425 RU0300425W WO2004039132A3 WO 2004039132 A3 WO2004039132 A3 WO 2004039132A3 RU 0300425 W RU0300425 W RU 0300425W WO 2004039132 A3 WO2004039132 A3 WO 2004039132A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
surface processing
magnetic
ion
electron
Prior art date
Application number
PCT/RU2003/000425
Other languages
English (en)
French (fr)
Other versions
WO2004039132A2 (fr
Inventor
Valery Viktorovich Koshkin
Original Assignee
Valery Viktorovich Koshkin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Valery Viktorovich Koshkin filed Critical Valery Viktorovich Koshkin
Publication of WO2004039132A2 publication Critical patent/WO2004039132A2/ru
Publication of WO2004039132A3 publication Critical patent/WO2004039132A3/ru

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
PCT/RU2003/000425 2002-10-18 2003-10-01 Procede destine au traitement de surface par micro-ondes et par le plasma a vide utilisant la resonance electronique cyclotronique WO2004039132A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU2002127839/15A RU2223570C1 (ru) 2002-10-18 2002-10-18 Устройство для микроволновой вакуумно-плазменной с электронно-циклотронным резонансом обработки поверхности
RU2002127839 2002-10-18

Publications (2)

Publication Number Publication Date
WO2004039132A2 WO2004039132A2 (fr) 2004-05-06
WO2004039132A3 true WO2004039132A3 (fr) 2004-07-01

Family

ID=32173370

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/RU2003/000425 WO2004039132A2 (fr) 2002-10-18 2003-10-01 Procede destine au traitement de surface par micro-ondes et par le plasma a vide utilisant la resonance electronique cyclotronique

Country Status (2)

Country Link
RU (1) RU2223570C1 (ru)
WO (1) WO2004039132A2 (ru)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9136794B2 (en) 2011-06-22 2015-09-15 Research Triangle Institute, International Bipolar microelectronic device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3921844A1 (de) * 1988-07-05 1990-01-11 Mitsubishi Electric Corp Vorrichtung zur behandlung von halbleiterwafern
US5399830A (en) * 1993-01-25 1995-03-21 Mitsubishi Denki Kabushiki Kaisha Plasma treatment apparatus
RU2106716C1 (ru) * 1992-04-27 1998-03-10 Равиль Кяшшафович Яфаров Установка для микроволновой вакуумно-плазменной обработки конденсированных сред
RU2120681C1 (ru) * 1996-04-16 1998-10-20 Равиль Кяшшафович Яфаров Устройство для микроволновой вакуумно-плазменной с электронно-циклотронным резонансом обработки конденсированных сред

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3921844A1 (de) * 1988-07-05 1990-01-11 Mitsubishi Electric Corp Vorrichtung zur behandlung von halbleiterwafern
RU2106716C1 (ru) * 1992-04-27 1998-03-10 Равиль Кяшшафович Яфаров Установка для микроволновой вакуумно-плазменной обработки конденсированных сред
US5399830A (en) * 1993-01-25 1995-03-21 Mitsubishi Denki Kabushiki Kaisha Plasma treatment apparatus
RU2120681C1 (ru) * 1996-04-16 1998-10-20 Равиль Кяшшафович Яфаров Устройство для микроволновой вакуумно-плазменной с электронно-циклотронным резонансом обработки конденсированных сред

Also Published As

Publication number Publication date
WO2004039132A2 (fr) 2004-05-06
RU2223570C1 (ru) 2004-02-10

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