WO2003071000A1 - Method and device for coating a substrate - Google Patents
Method and device for coating a substrate Download PDFInfo
- Publication number
- WO2003071000A1 WO2003071000A1 PCT/NL2003/000139 NL0300139W WO03071000A1 WO 2003071000 A1 WO2003071000 A1 WO 2003071000A1 NL 0300139 W NL0300139 W NL 0300139W WO 03071000 A1 WO03071000 A1 WO 03071000A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vaporized
- coil
- alternating
- electromagnetic field
- substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the invention relates to a method for coating a substrate with a layer of a material, such as a metal, in which a quantity of electrically conductive material is vaporized in a space with a low background pressure and energy is supplied to the material which is to be vaporized in order to vaporize this material.
- the invention also relates to a device for coating a substrate, and to a substrate obtained using the method or device.
- PVD physical vapour deposition
- This equilibrium vapour pressure is the most important parameter for the transfer rate of the coating material to the substrate on which the vapour is deposited.
- the equilibrium vapour pressure is dependent on the temperature of the coating material.
- the coating material generally has to be heated to high temperatures. These temperatures are often of the order of half the boiling point at atmospheric pressure or sometimes even higher.
- the temperatures for metals are between approximately 600°C for zinc and approximately 2200°C for niobium and rhenium.
- Metals such as tantalum, molybdenum and tungsten require such high temperatures that they are not used for PVD. Metals such as titanium, chromium, nickel, aluminium and the like are rarely used as the material transfer rates are low.
- PVD physical vapor deposition
- the transfer rates are limited primarily by the fact that the coating materials which have to be vaporized are always in the liquid state on account of the high process temperatures. Consequently, the material has to be in a crucible, which may be made, for example, from a ceramic material or from copper. In the latter case, intensive cooling with water is required, so that a thin film of solidified coating material covers the copper, with the result that the copper is prevented from melting or being vaporized as well and the copper is not affected.
- a disadvantageous consequence of cooling of a copper crucible is that a significant proportion of the heat supplied is lost as a result of the cooling.
- Another object of the invention is to provide a method and device of this type in which the transfer rate of the coating material is higher than has hitherto been possible.
- Yet another object of the invention is to provide a method and device of this type which in practice make it possible to use materials utilizing PVD as coating material where this has not hitherto been possible.
- one or more of these objects are achieved by a method for coating a substrate with a layer of a material, such as a metal, in which a quantity of electrically conductive material is vaporized in a space with a low background pressure and energy is supplied to the material which is to be vaporized in order to vaporize this material, in which method the material which is to be vaporized, while it is being vaporized, is kept floating, without support, in the space and is enclosed in an alternating electromagnetic field, and in which method the alternating electromagnetic field is generated with the aid of a high-frequency alternating current.
- a material such as a metal
- the material which is to be vaporized floating without support in the space means that it is no longer necessary to use a copper or ceramic crucible.
- it is possible to impart a higher temperature to the material which is to be vaporized since the crucible no longer forms the limiting factor. Therefore, the transfer rate of the vaporized material to the substrate can be increased. Since it is no longer necessary to use a crucible, it is also possible to vaporize materials which it has not hitherto been possible to use, on account of their ability to react with the material of the crucible.
- an electrically conductive material in an alternating electromagnetic field as a result of Lorentz forces, which are generated by the interaction between the external magnetic field and the eddy currents which are thereby induced in the electrically conductive material.
- the alternating electromagnetic field is generated with the aid of a high- frequency alternating current.
- a high-frequency alternating current is required so that it is possible to keep floating a sufficiently large mass of electrically conductive material for it to be possible for a quantity of electrically conductive material per minute which is sufficient for coating of the substrate on an industrial scale to be vaporized efficiently.
- levitation melting The process of floating and melting conducting materials in an alternating electromagnetic field is known under the name "levitation melting".
- a method and device for this purpose are described in EP 0751361 Bl; in this case, the melted material is used for precise casting. It should be noted that a water-cooled crucible, with which the molten material must not come into contact, is still always used.
- Levitation melting in an alternating electromagnetic field is also described in a number of articles by various authors in "3 rd International Symposium on Electromagnetic Processing of Materials, April 3-6 2000, Nagoya, Japan, pp 345-375. Hitherto, however, levitation melting has not been used in conjunction with physical vapour deposition; levitation melting followed by vaporization according to the invention is not known.
- the frequency of the alternating current is preferably 10 kHz or higher, more preferably 50 kHz or higher, even more preferably 250 kHz or higher, yet more preferably 1 MHz or higher, and still more preferably 1.5 MHz or higher.
- the level of the frequency is related to the quantity of material which is to be vaporized per unit time, for example if a substrate is to be coated continuously. This requires a certain vaporizing surface area at a selected temperature of the floating material. This quantity of floating material requires a minimum eddy current in the surface layer of the floating material and therefore a minimum frequency of the alternating current.
- the alternating electromagnetic field is generated with the aid of an alternating current passing through a coil with a current intensity of 200 A or more, preferably with a current intensity of 500 A or more, more preferably with a current intensity of 1 kA or more, and even more preferably with a current intensity of 4 kA or more.
- the intensity of the alternating current must be selected as a function of the level of the frequency of the alternating current in order to obtain a sufficient heating capacity.
- the power which is dissipated in the floating material is at least 2 kW, preferably at least 5 kW, and more preferably at least 10 kW. This is desirable because the vaporization of the floating material increases as the dissipated power becomes greater.
- the material which is to be vaporized is heated with the aid of electromagnetic induction heating. In this way, the material which is to be vaporized can be heated to the desired high temperature.
- the material which is to be vaporized can be heated with the aid of laser beams and/or electron bombardment and/or an inductively coupled plasma and/or resistance heating. All these methods of heating can readily by employed to heat floating material.
- the material which is being vaporized is preferably topped up by the alternating electromagnetic field drawing in additional quantities of material which is to be vaporized over the course of time.
- the action of the alternating electromagnetic field of drawing in material makes it easy to top up the quantity of material which is to be vaporized, which decreases as a result of the vaporization, continuously or in steps.
- the alternating electromagnetic field of the coil is shaped in such a manner that a separate section of the alternating field draws in the material to be vaporized. If the material which is to be vaporized is drawn in in a separate section of the alternating field, the section of the alternating field where the material is being vaporized is not disturbed or is disturbed to a lesser extent.
- the material which is to be drawn in preferably does not float freely in the space. It is then easy for the material which is to be drawn in to be moved to a location in the space from which it is then drawn in by the alternating electromagnetic field.
- the separate section of the alternating field is obtained by means of an auxiliary coil which is separate from the coil.
- the above method is preferably used to vaporize titanium, magnesium, tin, zinc, chromium, nickel or aluminium or a mixture of one of these metals with one or more other materials, including these or other metals, since these are commercially important coating materials.
- some materials may react with a reactive gas, such as oxygen or nitrogen, with the result that nonconductive oxide or nitrides are formed. This reaction may take place during the vapour phase or immediately after the condensation on the substrate.
- the substrate is continuously coated with a layer of material.
- this will mean that a substrate is passed through the vacuum chamber in the form of a strip, and during the residence time of a section of the strip in the chamber sufficient material must be vaporized to coat that section of the strip. Hitherto, this was not possible on account of the low transfer rates; however, with the aid of the method as described above, it is possible to vaporize sufficient material sufficiently quickly and therefore to coat a substrate such as a strip on an industrial scale.
- a second aspect of the invention provides a device for coating a substrate with a layer of a material, such as a metal, by vaporization of an electrically conductive material, comprising a chamber provided with means for producing a low background pressure in the chamber, means for receiving the material to be vaporized, and means for heating the material to be vaporized, in which device, according to the invention, the means for receiving the material to be vaporized comprise a coil which can be used to generate an alternating electromagnetic field in order to enable the material which is to be vaporized to float without support.
- the provision of the coil makes it possible to make the material which is to be vaporized float, so that there is no longer any need for a crucible, with the result that the method as described above can be carried out with the aid of this device.
- the coil is preferably designed to generate the alternating electromagnetic field by means of a high-frequency alternating current. Since the coil makes use of a high- frequency alternating current, an alternating electromagnetic field is formed, in which the Lorentz forces can keep the material which is to be vaporized floating.
- the means for heating the material comprise an electromagnetic induction coil. Consequently, the material which is to be heated can easily be heated to a high temperature without making contact with the material which is to be heated.
- the coil in the device it is preferably possible to generate the abovementioned high-frequency alternating currents, and preferably also the above- mentioned intensities of the alternating current.
- the means for heating the material comprise a laser and/or an electron source. These means too can be used to heat the material which is to be vaporized, albeit to a slightly lesser extent.
- the isolating means are preferably made from ceramic material, since ceramic is resistant to high temperatures and to coolants.
- the isolating means comprise, for example, a ceramic tube, since this is easy to produce and to use.
- the isolating means for the coil also provides the advantage that conductive material which condenses on the isolating materials as a result of eddy currents which are generated by the coil melts or is vaporized, so that it either returns to the floating material as molten material or is used as vapour to coat the substrate.
- the isolated coil is therefore self-cleaning.
- feed means for supplying the material which is to be vaporized in wire form in order to top up the material which vaporizes during use.
- the material which is to be vaporized has to be constantly topped up on account of the fact that a section of the material is evaporated per unit time; for this purpose, the feed means must be designed in such a manner that the vacuum chamber remains under a vacuum.
- Measuring equipment is preferably arranged in the chamber. This measuring equipment is used to control the process.
- the measuring equipment is preferably suitable, inter alia, for measuring temperature, for example by means of optical pyrometry.
- a third aspect of the invention relates to a substrate provided with a layer of electrically conductive material, produced with the aid of the method as described above and/or the device as described above, in which the electrically conductive material is preferably a metal, more preferably titanium, magnesium, tin, zinc, chromium, nickel or aluminium or a mixture of one of these metals and one or more other materials, including these or other metals.
- the electrically conductive material is preferably a metal, more preferably titanium, magnesium, tin, zinc, chromium, nickel or aluminium or a mixture of one of these metals and one or more other materials, including these or other metals.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
Description
Claims
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BR0307800A BR0307800B1 (en) | 2002-02-21 | 2003-02-21 | method and device for coating a substrate. |
CA 2476855 CA2476855C (en) | 2002-02-21 | 2003-02-21 | Method and device for coating a substrate |
KR1020047012566A KR100956491B1 (en) | 2002-02-21 | 2003-02-21 | Method and device for coating a substrate |
DE60321893T DE60321893D1 (en) | 2002-02-21 | 2003-02-21 | METHOD AND DEVICE FOR COATING A SUBSTRATE |
JP2003569889A JP4522709B2 (en) | 2002-02-21 | 2003-02-21 | Method and apparatus for coating a substrate |
EP03710534A EP1483425B1 (en) | 2002-02-21 | 2003-02-21 | Method and device for coating a substrate |
AU2003221458A AU2003221458A1 (en) | 2002-02-21 | 2003-02-21 | Method and device for coating a substrate |
US10/923,505 US7323229B2 (en) | 2002-02-21 | 2004-08-23 | Method and device for coating a substrate |
HK05110333A HK1078616A1 (en) | 2002-02-21 | 2005-11-18 | Method and device for coating a substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1020059A NL1020059C2 (en) | 2002-02-21 | 2002-02-21 | Method and device for coating a substrate. |
NL1020059 | 2002-02-21 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/923,505 Continuation-In-Part US7323229B2 (en) | 2002-02-21 | 2004-08-23 | Method and device for coating a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003071000A1 true WO2003071000A1 (en) | 2003-08-28 |
Family
ID=27752086
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/NL2003/000139 WO2003071000A1 (en) | 2002-02-21 | 2003-02-21 | Method and device for coating a substrate |
Country Status (15)
Country | Link |
---|---|
US (1) | US7323229B2 (en) |
EP (1) | EP1483425B1 (en) |
JP (1) | JP4522709B2 (en) |
KR (1) | KR100956491B1 (en) |
CN (1) | CN100545299C (en) |
AT (1) | ATE399889T1 (en) |
AU (1) | AU2003221458A1 (en) |
BR (1) | BR0307800B1 (en) |
CA (1) | CA2476855C (en) |
DE (1) | DE60321893D1 (en) |
ES (1) | ES2309305T3 (en) |
HK (1) | HK1078616A1 (en) |
NL (1) | NL1020059C2 (en) |
RU (1) | RU2316611C2 (en) |
WO (1) | WO2003071000A1 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004080640A1 (en) * | 2003-03-14 | 2004-09-23 | Hille & Müller GMBH | Aluminium layered brazing product and method of its manufacture |
WO2006021245A1 (en) * | 2004-08-23 | 2006-03-02 | Corus Technology Bv | Apparatus and method for levitation of an amount of conductive material |
JP2008542537A (en) * | 2005-05-31 | 2008-11-27 | コラス、テクノロジー、ベスローテン、フェンノートシャップ | Apparatus and method for coating a substrate |
EP2085492A1 (en) * | 2007-12-28 | 2009-08-05 | Posco | Zinc alloy coated steel sheet having good sealer adhesion and corrosion resistance and process of manufacturing the same |
US7973267B2 (en) | 2004-08-23 | 2011-07-05 | Tata Steel Nederland Technology Bv | Apparatus and method for levitation of an amount of conductive material |
RU2522666C2 (en) * | 2012-06-27 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) | Device for levitation of certain amount of material |
US9732423B2 (en) | 2010-12-27 | 2017-08-15 | Posco | Dry coating apparatus |
RU2693852C2 (en) * | 2017-11-07 | 2019-07-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) | Device for levitation of certain amount of material |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7524385B2 (en) * | 2006-10-03 | 2009-04-28 | Elemetric, Llc | Controlled phase transition of metals |
KR101639813B1 (en) * | 2009-10-08 | 2016-07-15 | 주식회사 포스코 | Continuous Coating Apparatus |
JP5797275B2 (en) * | 2010-12-13 | 2015-10-21 | ポスコ | Continuous coating equipment |
KR101355817B1 (en) * | 2012-07-09 | 2014-02-05 | 한국표준과학연구원 | Electromagnetic Levitation Metal Thin Film Deposition Apparatus and Electromagnetic Levitation Metal Thin Film Deposition Method |
KR102098455B1 (en) * | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | Continuous Vapor Deposition Device and Continuous Deposition Method |
CN109518133A (en) * | 2018-10-23 | 2019-03-26 | 集美大学 | A kind of PVD equipment and its production technology of electromagnetic heating |
CN112760608A (en) * | 2020-12-14 | 2021-05-07 | 兰州空间技术物理研究所 | Method for preventing interlayer air bleeding in carbon fiber composite material surface film deposition process |
Citations (7)
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US2664852A (en) * | 1950-04-27 | 1954-01-05 | Nat Res Corp | Vapor coating apparatus |
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
GB1217443A (en) * | 1968-04-05 | 1970-12-31 | Euratom | Apparatus for evaporation by levitation in an ultra-vacuum |
US3554739A (en) * | 1966-09-07 | 1971-01-12 | Technology Uk | Alloys and processes for their manufacture |
US4385080A (en) * | 1979-08-22 | 1983-05-24 | Rudnay Andre De | Method for evaporating large quantities of metals and semiconductors by electromagnetic levitation |
JPH08104981A (en) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd device |
US5736073A (en) * | 1996-07-08 | 1998-04-07 | University Of Virginia Patent Foundation | Production of nanometer particles by directed vapor deposition of electron beam evaporant |
Family Cites Families (9)
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JPS621863A (en) * | 1985-06-28 | 1987-01-07 | Ishikawajima Harima Heavy Ind Co Ltd | Apparatus for vaporizing metal |
JP3563083B2 (en) * | 1992-09-11 | 2004-09-08 | 真空冶金株式会社 | Method and apparatus for gas deposition of ultrafine particles |
JPH07252639A (en) * | 1994-03-15 | 1995-10-03 | Kao Corp | Production of metallic thin film |
US5534314A (en) * | 1994-08-31 | 1996-07-09 | University Of Virginia Patent Foundation | Directed vapor deposition of electron beam evaporant |
JP2783193B2 (en) | 1995-06-26 | 1998-08-06 | 大同特殊鋼株式会社 | Levitation melting method and levitating melting and casting equipment |
DE19811816A1 (en) * | 1997-03-24 | 1998-10-01 | Fuji Electric Co Ltd | Vacuum circuit breaker electrode material production |
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JPH1171605A (en) * | 1997-08-29 | 1999-03-16 | Ishikawajima Harima Heavy Ind Co Ltd | Manufacture of fine particle, and manufacturing device therefor |
EP1321545A1 (en) * | 2001-12-20 | 2003-06-25 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for producing particles with diamond structure |
-
2002
- 2002-02-21 NL NL1020059A patent/NL1020059C2/en not_active IP Right Cessation
-
2003
- 2003-02-21 KR KR1020047012566A patent/KR100956491B1/en active IP Right Grant
- 2003-02-21 CN CNB038043181A patent/CN100545299C/en not_active Expired - Fee Related
- 2003-02-21 AT AT03710534T patent/ATE399889T1/en active
- 2003-02-21 EP EP03710534A patent/EP1483425B1/en not_active Expired - Lifetime
- 2003-02-21 BR BR0307800A patent/BR0307800B1/en not_active IP Right Cessation
- 2003-02-21 WO PCT/NL2003/000139 patent/WO2003071000A1/en active Application Filing
- 2003-02-21 ES ES03710534T patent/ES2309305T3/en not_active Expired - Lifetime
- 2003-02-21 AU AU2003221458A patent/AU2003221458A1/en not_active Abandoned
- 2003-02-21 CA CA 2476855 patent/CA2476855C/en not_active Expired - Fee Related
- 2003-02-21 DE DE60321893T patent/DE60321893D1/en not_active Expired - Lifetime
- 2003-02-21 RU RU2004128083A patent/RU2316611C2/en not_active IP Right Cessation
- 2003-02-21 JP JP2003569889A patent/JP4522709B2/en not_active Expired - Fee Related
-
2004
- 2004-08-23 US US10/923,505 patent/US7323229B2/en not_active Expired - Fee Related
-
2005
- 2005-11-18 HK HK05110333A patent/HK1078616A1/en not_active IP Right Cessation
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US2664852A (en) * | 1950-04-27 | 1954-01-05 | Nat Res Corp | Vapor coating apparatus |
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
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JPH08104981A (en) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd device |
US5736073A (en) * | 1996-07-08 | 1998-04-07 | University Of Virginia Patent Foundation | Production of nanometer particles by directed vapor deposition of electron beam evaporant |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004080640A1 (en) * | 2003-03-14 | 2004-09-23 | Hille & Müller GMBH | Aluminium layered brazing product and method of its manufacture |
WO2006021245A1 (en) * | 2004-08-23 | 2006-03-02 | Corus Technology Bv | Apparatus and method for levitation of an amount of conductive material |
AU2005276729B2 (en) * | 2004-08-23 | 2010-08-26 | Tata Steel Nederland Technology B.V. | Apparatus and method for levitation of an amount of conductive material |
US7973267B2 (en) | 2004-08-23 | 2011-07-05 | Tata Steel Nederland Technology Bv | Apparatus and method for levitation of an amount of conductive material |
JP2008542537A (en) * | 2005-05-31 | 2008-11-27 | コラス、テクノロジー、ベスローテン、フェンノートシャップ | Apparatus and method for coating a substrate |
KR101235457B1 (en) * | 2005-05-31 | 2013-02-20 | 타타 스틸 네덜란드 테크날러지 베.뷔. | Apparatus and method for coating a substrate |
US8435352B2 (en) | 2005-05-31 | 2013-05-07 | Tata Steel Nederland Technology Bv | Apparatus and method for coating a substrate |
EP2085492A1 (en) * | 2007-12-28 | 2009-08-05 | Posco | Zinc alloy coated steel sheet having good sealer adhesion and corrosion resistance and process of manufacturing the same |
US9732423B2 (en) | 2010-12-27 | 2017-08-15 | Posco | Dry coating apparatus |
RU2522666C2 (en) * | 2012-06-27 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) | Device for levitation of certain amount of material |
RU2693852C2 (en) * | 2017-11-07 | 2019-07-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) | Device for levitation of certain amount of material |
Also Published As
Publication number | Publication date |
---|---|
JP4522709B2 (en) | 2010-08-11 |
ATE399889T1 (en) | 2008-07-15 |
US20050064110A1 (en) | 2005-03-24 |
RU2004128083A (en) | 2005-06-10 |
CN100545299C (en) | 2009-09-30 |
EP1483425B1 (en) | 2008-07-02 |
CA2476855A1 (en) | 2003-08-28 |
JP2005523381A (en) | 2005-08-04 |
AU2003221458A1 (en) | 2003-09-09 |
BR0307800A (en) | 2004-12-14 |
US7323229B2 (en) | 2008-01-29 |
BR0307800B1 (en) | 2012-09-04 |
KR20040085192A (en) | 2004-10-07 |
DE60321893D1 (en) | 2008-08-14 |
CN1636077A (en) | 2005-07-06 |
NL1020059C2 (en) | 2003-08-25 |
RU2316611C2 (en) | 2008-02-10 |
ES2309305T3 (en) | 2008-12-16 |
EP1483425A1 (en) | 2004-12-08 |
HK1078616A1 (en) | 2006-03-17 |
KR100956491B1 (en) | 2010-05-07 |
CA2476855C (en) | 2009-12-22 |
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