WO2003036361A1 - Systeme optique de projection et appareil d'exposition possedant ledit systeme - Google Patents
Systeme optique de projection et appareil d'exposition possedant ledit systeme Download PDFInfo
- Publication number
- WO2003036361A1 WO2003036361A1 PCT/JP2002/010454 JP0210454W WO03036361A1 WO 2003036361 A1 WO2003036361 A1 WO 2003036361A1 JP 0210454 W JP0210454 W JP 0210454W WO 03036361 A1 WO03036361 A1 WO 03036361A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical system
- projection optical
- transparent
- crystal
- transparent members
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003538800A JPWO2003036361A1 (ja) | 2001-10-19 | 2002-10-08 | 投影光学系および該投影光学系を備えた露光装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001-321463 | 2001-10-19 | ||
JP2001321463 | 2001-10-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003036361A1 true WO2003036361A1 (fr) | 2003-05-01 |
Family
ID=19138675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/010454 WO2003036361A1 (fr) | 2001-10-19 | 2002-10-08 | Systeme optique de projection et appareil d'exposition possedant ledit systeme |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2003036361A1 (fr) |
TW (1) | TW559885B (fr) |
WO (1) | WO2003036361A1 (fr) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004025349A1 (fr) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Objectif de projection catadioptrique et procede de compensation de la birefringence intrinseque dans un tel objectif |
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
US7006304B2 (en) | 2001-05-22 | 2006-02-28 | Carl Zeiss Smt Ag | Catadioptric reduction lens |
US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
US7239450B2 (en) | 2004-11-22 | 2007-07-03 | Carl Zeiss Smt Ag | Method of determining lens materials for a projection exposure apparatus |
USRE40743E1 (en) | 2000-02-05 | 2009-06-16 | Carl Zeiss Smt Ag | Projection exposure system having a reflective reticle |
US7697198B2 (en) | 2004-10-15 | 2010-04-13 | Carl Zeiss Smt Ag | Catadioptric projection objective |
EP2189848A2 (fr) | 2004-07-14 | 2010-05-26 | Carl Zeiss SMT AG | Objectif de projection catadioptrique |
US7738188B2 (en) | 2006-03-28 | 2010-06-15 | Carl Zeiss Smt Ag | Projection objective and projection exposure apparatus including the same |
US7848016B2 (en) | 2006-05-05 | 2010-12-07 | Carl Zeiss Smt Ag | High-NA projection objective |
US7920338B2 (en) | 2006-03-28 | 2011-04-05 | Carl Zeiss Smt Gmbh | Reduction projection objective and projection exposure apparatus including the same |
US8107162B2 (en) | 2004-05-17 | 2012-01-31 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
JP2012185503A (ja) * | 2009-08-13 | 2012-09-27 | Carl Zeiss Smt Gmbh | 反射屈折投影対物系 |
US8908269B2 (en) | 2004-01-14 | 2014-12-09 | Carl Zeiss Smt Gmbh | Immersion catadioptric projection objective having two intermediate images |
US9772478B2 (en) | 2004-01-14 | 2017-09-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with parallel, offset optical axes |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772393A (ja) * | 1993-09-06 | 1995-03-17 | Nikon Corp | 反射縮小投影光学系 |
JPH1121197A (ja) * | 1997-07-02 | 1999-01-26 | Canon Inc | 結晶成長用の種結晶及びフッ化物結晶 |
EP0942297A2 (fr) * | 1998-03-12 | 1999-09-15 | Nikon Corporation | Elément optique formé d'un monocristal de fluorure et procédé de fabrication de cet élément |
JP2000128696A (ja) * | 1998-10-16 | 2000-05-09 | Nikon Corp | フッ化物単結晶からなる光学素子作製用素材とその製造方法 |
EP1063684A1 (fr) * | 1999-01-06 | 2000-12-27 | Nikon Corporation | Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme |
EP1115019A2 (fr) * | 1999-12-29 | 2001-07-11 | Carl Zeiss | Objectif de projection avec des éléments asphériques |
EP1114802A1 (fr) * | 1999-04-21 | 2001-07-11 | Nikon Corporation | Element en verre de silice, procede de production et aligneur de projection l'utilisant |
-
2002
- 2002-08-02 TW TW091117440A patent/TW559885B/zh active
- 2002-10-08 JP JP2003538800A patent/JPWO2003036361A1/ja not_active Withdrawn
- 2002-10-08 WO PCT/JP2002/010454 patent/WO2003036361A1/fr active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772393A (ja) * | 1993-09-06 | 1995-03-17 | Nikon Corp | 反射縮小投影光学系 |
JPH1121197A (ja) * | 1997-07-02 | 1999-01-26 | Canon Inc | 結晶成長用の種結晶及びフッ化物結晶 |
EP0942297A2 (fr) * | 1998-03-12 | 1999-09-15 | Nikon Corporation | Elément optique formé d'un monocristal de fluorure et procédé de fabrication de cet élément |
JP2000128696A (ja) * | 1998-10-16 | 2000-05-09 | Nikon Corp | フッ化物単結晶からなる光学素子作製用素材とその製造方法 |
EP1063684A1 (fr) * | 1999-01-06 | 2000-12-27 | Nikon Corporation | Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme |
EP1114802A1 (fr) * | 1999-04-21 | 2001-07-11 | Nikon Corporation | Element en verre de silice, procede de production et aligneur de projection l'utilisant |
EP1115019A2 (fr) * | 1999-12-29 | 2001-07-11 | Carl Zeiss | Objectif de projection avec des éléments asphériques |
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
US7426082B2 (en) | 1999-12-29 | 2008-09-16 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
USRE40743E1 (en) | 2000-02-05 | 2009-06-16 | Carl Zeiss Smt Ag | Projection exposure system having a reflective reticle |
US7006304B2 (en) | 2001-05-22 | 2006-02-28 | Carl Zeiss Smt Ag | Catadioptric reduction lens |
US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
US7382540B2 (en) | 2002-03-01 | 2008-06-03 | Carl Zeiss Smt Ag | Refractive projection objective |
WO2004025349A1 (fr) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Objectif de projection catadioptrique et procede de compensation de la birefringence intrinseque dans un tel objectif |
US8908269B2 (en) | 2004-01-14 | 2014-12-09 | Carl Zeiss Smt Gmbh | Immersion catadioptric projection objective having two intermediate images |
US9772478B2 (en) | 2004-01-14 | 2017-09-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with parallel, offset optical axes |
US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US9726979B2 (en) | 2004-05-17 | 2017-08-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US9134618B2 (en) | 2004-05-17 | 2015-09-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US8107162B2 (en) | 2004-05-17 | 2012-01-31 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
EP2189848A2 (fr) | 2004-07-14 | 2010-05-26 | Carl Zeiss SMT AG | Objectif de projection catadioptrique |
US7697198B2 (en) | 2004-10-15 | 2010-04-13 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US7239450B2 (en) | 2004-11-22 | 2007-07-03 | Carl Zeiss Smt Ag | Method of determining lens materials for a projection exposure apparatus |
US7965453B2 (en) | 2006-03-28 | 2011-06-21 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus including the same |
US7738188B2 (en) | 2006-03-28 | 2010-06-15 | Carl Zeiss Smt Ag | Projection objective and projection exposure apparatus including the same |
US7920338B2 (en) | 2006-03-28 | 2011-04-05 | Carl Zeiss Smt Gmbh | Reduction projection objective and projection exposure apparatus including the same |
US7848016B2 (en) | 2006-05-05 | 2010-12-07 | Carl Zeiss Smt Ag | High-NA projection objective |
US8873137B2 (en) | 2009-08-13 | 2014-10-28 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
JP2012185503A (ja) * | 2009-08-13 | 2012-09-27 | Carl Zeiss Smt Gmbh | 反射屈折投影対物系 |
US9279969B2 (en) | 2009-08-13 | 2016-03-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US9726870B2 (en) | 2009-08-13 | 2017-08-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US10042146B2 (en) | 2009-08-13 | 2018-08-07 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
Also Published As
Publication number | Publication date |
---|---|
JPWO2003036361A1 (ja) | 2005-02-17 |
TW559885B (en) | 2003-11-01 |
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