WO2003010807A1 - Method of manufacturing semiconductor integrated circuit device - Google Patents
Method of manufacturing semiconductor integrated circuit device Download PDFInfo
- Publication number
- WO2003010807A1 WO2003010807A1 PCT/JP2002/007445 JP0207445W WO03010807A1 WO 2003010807 A1 WO2003010807 A1 WO 2003010807A1 JP 0207445 W JP0207445 W JP 0207445W WO 03010807 A1 WO03010807 A1 WO 03010807A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- integrated circuit
- semiconductor integrated
- circuit device
- manufacturing semiconductor
- wafer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000005498 polishing Methods 0.000 abstract 3
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Semiconductor Memories (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Element Separation (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
A method of manufacturing a semiconductor integrated circuit device, comprising the step of detecting that a scratch occurs on the polished surface of a wafer (7) by a polishing processing by detecting vibration generated from the wafer (7) during polishing by a vibration monitor (9) installed in a polishing head (3).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001222695A JP2003037090A (en) | 2001-07-24 | 2001-07-24 | Method for manufacturing semiconductor integrated circuit device |
JP2001-222695 | 2001-07-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003010807A1 true WO2003010807A1 (en) | 2003-02-06 |
Family
ID=19056135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/007445 WO2003010807A1 (en) | 2001-07-24 | 2002-07-23 | Method of manufacturing semiconductor integrated circuit device |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2003037090A (en) |
WO (1) | WO2003010807A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6030041B2 (en) * | 2013-11-01 | 2016-11-24 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
US9878421B2 (en) * | 2014-06-16 | 2018-01-30 | Applied Materials, Inc. | Chemical mechanical polishing retaining ring with integrated sensor |
JP6739899B2 (en) * | 2015-01-16 | 2020-08-12 | キオクシア株式会社 | Semiconductor device manufacturing method and semiconductor manufacturing device |
JP6400620B2 (en) | 2016-03-11 | 2018-10-03 | 東芝メモリ株式会社 | Control device and control method for semiconductor manufacturing apparatus |
JP6860727B2 (en) * | 2020-04-24 | 2021-04-21 | キオクシア株式会社 | Semiconductor manufacturing method and semiconductor manufacturing equipment |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0739687A2 (en) * | 1995-04-26 | 1996-10-30 | Fujitsu Limited | Polishing apparatus and polishing method |
JPH11254304A (en) * | 1998-03-10 | 1999-09-21 | Super Silicon Kenkyusho:Kk | Surface plate with built-in sensor |
JP2001096455A (en) * | 1999-09-28 | 2001-04-10 | Ebara Corp | Polishing device |
JP2002160154A (en) * | 2000-09-18 | 2002-06-04 | Stmicroelectronics Inc | Usage of acoustic spectral analysis to cmp processing monitor/control |
-
2001
- 2001-07-24 JP JP2001222695A patent/JP2003037090A/en active Pending
-
2002
- 2002-07-23 WO PCT/JP2002/007445 patent/WO2003010807A1/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0739687A2 (en) * | 1995-04-26 | 1996-10-30 | Fujitsu Limited | Polishing apparatus and polishing method |
JPH11254304A (en) * | 1998-03-10 | 1999-09-21 | Super Silicon Kenkyusho:Kk | Surface plate with built-in sensor |
JP2001096455A (en) * | 1999-09-28 | 2001-04-10 | Ebara Corp | Polishing device |
JP2002160154A (en) * | 2000-09-18 | 2002-06-04 | Stmicroelectronics Inc | Usage of acoustic spectral analysis to cmp processing monitor/control |
Also Published As
Publication number | Publication date |
---|---|
JP2003037090A (en) | 2003-02-07 |
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