WO2003005123A3 - Verfahren für die erzeugung von mikro- und nanostrukturen mit der imprintlithographie - Google Patents

Verfahren für die erzeugung von mikro- und nanostrukturen mit der imprintlithographie Download PDF

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Publication number
WO2003005123A3
WO2003005123A3 PCT/DE2002/002435 DE0202435W WO03005123A3 WO 2003005123 A3 WO2003005123 A3 WO 2003005123A3 DE 0202435 W DE0202435 W DE 0202435W WO 03005123 A3 WO03005123 A3 WO 03005123A3
Authority
WO
WIPO (PCT)
Prior art keywords
nanostructures
microstructures
production
imprint lithography
structures
Prior art date
Application number
PCT/DE2002/002435
Other languages
English (en)
French (fr)
Other versions
WO2003005123A2 (de
Inventor
Karl Pfeiffer
Gisela Ahrens
Gabi Gruetzner
Freimuth Reuther
Original Assignee
Micro Resist Technology Gmbh
Karl Pfeiffer
Gisela Ahrens
Gabi Gruetzner
Freimuth Reuther
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micro Resist Technology Gmbh, Karl Pfeiffer, Gisela Ahrens, Gabi Gruetzner, Freimuth Reuther filed Critical Micro Resist Technology Gmbh
Priority to EP02748607A priority Critical patent/EP1402317A2/de
Priority to US10/433,589 priority patent/US20040079730A1/en
Publication of WO2003005123A2 publication Critical patent/WO2003005123A2/de
Publication of WO2003005123A3 publication Critical patent/WO2003005123A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

Die Erfindung betrifft die Herstellung von Mikro- und Nanostrukturen durch Heissprägen, dadurch gekennzeichnet, dass zur Abformung lithographisch erzeugte Strukturen verwendert werden, die aus härtbaren Materialien, vorzugsweise auf der Basis photoreaktiver Epoxyharze bestehen und deren Strukturübertragung bevorzugt in dünnen Schichten erfolgt.
PCT/DE2002/002435 2001-07-05 2002-06-28 Verfahren für die erzeugung von mikro- und nanostrukturen mit der imprintlithographie WO2003005123A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP02748607A EP1402317A2 (de) 2001-07-05 2002-06-28 Verfahren fur die erzeugung von mikro- und nanostrukturen mit der imprintlithographie
US10/433,589 US20040079730A1 (en) 2001-07-05 2002-06-28 Plastic male mold for fabricating microstructures and nanostructures using imprint lithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10134763.4 2001-07-05
DE10134763A DE10134763A1 (de) 2001-07-05 2001-07-05 Kunststoffstempel für die Erzeugung von Mikro- und Nanostrukturen mit der Imprintlithographie

Publications (2)

Publication Number Publication Date
WO2003005123A2 WO2003005123A2 (de) 2003-01-16
WO2003005123A3 true WO2003005123A3 (de) 2003-07-31

Family

ID=7692114

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/002435 WO2003005123A2 (de) 2001-07-05 2002-06-28 Verfahren für die erzeugung von mikro- und nanostrukturen mit der imprintlithographie

Country Status (4)

Country Link
US (1) US20040079730A1 (de)
EP (1) EP1402317A2 (de)
DE (1) DE10134763A1 (de)
WO (1) WO2003005123A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1538482B1 (de) * 2003-12-05 2016-02-17 Obducat AB Gerät und Methode für grossflÀ¤chige Lithographie
EP1594001B1 (de) * 2004-05-07 2015-12-30 Obducat AB Gerät und Verfahren für die Imprint-Lithographie
WO2007046110A1 (en) * 2005-10-19 2007-04-26 Indian Institute Of Technology, Kanpur A method and apparatus for the formation of patterns on surfaces and an assembly and alignment of the structure thereof
US8846551B2 (en) 2005-12-21 2014-09-30 University Of Virginia Patent Foundation Systems and methods of laser texturing of material surfaces and their applications
US8874251B2 (en) * 2006-07-06 2014-10-28 Airway Technologies, Llc System and method for forming a custom medical mask from a three-dimensional electronic model
US10131086B2 (en) 2011-06-30 2018-11-20 University Of Virginia Patent Foundation Micro-structure and nano-structure replication methods and article of manufacture
DE102019101346A1 (de) 2019-01-18 2020-07-23 Osram Opto Semiconductors Gmbh Nanostempelverfahren und nanooptisches bauteil

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10030015A1 (de) * 2000-06-17 2002-01-24 Micro Resist Technology Gmbh Härtbare Materialien zur Erzeugung von Nanostrukturen in dünner Schicht durch Nanoimprintlithographie

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JP3650216B2 (ja) * 1996-05-30 2005-05-18 Ｊｓｒ株式会社 成型法に用いられる樹脂製型の製造方法
EP1072954A3 (de) * 1999-07-28 2002-05-22 Lucent Technologies Inc. Lithographisches Verfahren

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10030015A1 (de) * 2000-06-17 2002-01-24 Micro Resist Technology Gmbh Härtbare Materialien zur Erzeugung von Nanostrukturen in dünner Schicht durch Nanoimprintlithographie

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CHOU S Y ET AL: "Sub-10 nm imprint lithography and applications", 41ST INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAMS TECHNOLOGY AND NANOFABRICATION, DANA POINT, CA, USA, 27-30 MAY 1997, vol. 15, no. 6, Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Nov.-Dec. 1997, AIP for American Vacuum Soc, USA, pages 2897 - 2904, XP002229961, ISSN: 0734-211X *
PFEIFFER K ET AL: "Novel Linear and Crosslinking Polymers for Nanoimprinting with High Etch Resistance", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 53, no. 1-4, June 2000 (2000-06-01), pages 411 - 414, XP004237802, ISSN: 0167-9317 *
SCHULZ H ET AL: "Master replication into thermosetting polymers for nanoimprinting", 44TH INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION, RANCHO MIRAGE, CA, USA, 30 MAY-2 JUNE 2000, vol. 18, no. 6, Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures), Nov. 2000, AIP for American Vacuum Soc, USA, pages 3582 - 3585, XP002229960, ISSN: 0734-211X *

Also Published As

Publication number Publication date
DE10134763A1 (de) 2003-01-16
US20040079730A1 (en) 2004-04-29
EP1402317A2 (de) 2004-03-31
WO2003005123A2 (de) 2003-01-16

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