WO2002097405A3 - Ortsaufgelöstes ellipsometrie-verfahren zur quantitativen und/oder qualitativen bestimmung von probenänderungen, biochip und messanordnung - Google Patents

Ortsaufgelöstes ellipsometrie-verfahren zur quantitativen und/oder qualitativen bestimmung von probenänderungen, biochip und messanordnung Download PDF

Info

Publication number
WO2002097405A3
WO2002097405A3 PCT/EP2002/005895 EP0205895W WO02097405A3 WO 2002097405 A3 WO2002097405 A3 WO 2002097405A3 EP 0205895 W EP0205895 W EP 0205895W WO 02097405 A3 WO02097405 A3 WO 02097405A3
Authority
WO
WIPO (PCT)
Prior art keywords
sample
quantitative
resolution
qualitative analysis
biochip
Prior art date
Application number
PCT/EP2002/005895
Other languages
English (en)
French (fr)
Other versions
WO2002097405A2 (de
Inventor
Peter Westphal
Matthias Eberhardt
Original Assignee
Inst Mikrotechnik Mainz Gmbh
Peter Westphal
Matthias Eberhardt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inst Mikrotechnik Mainz Gmbh, Peter Westphal, Matthias Eberhardt filed Critical Inst Mikrotechnik Mainz Gmbh
Priority to AU2002304653A priority Critical patent/AU2002304653A1/en
Priority to US10/478,574 priority patent/US20040142482A1/en
Publication of WO2002097405A2 publication Critical patent/WO2002097405A2/de
Publication of WO2002097405A3 publication Critical patent/WO2002097405A3/de

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/251Colorimeters; Construction thereof
    • G01N21/253Colorimeters; Construction thereof for batch operation, i.e. multisample apparatus
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • G01N21/553Attenuated total reflection and using surface plasmons

Abstract

Es wird ein ortsaufgelöstes Ellipsometrieverfahren zur quantitativen und/oder qualitativen Bestimmung von Probenänderungen beschrieben. Die Probe befindet sich auf einem mit mindestens einer Metallschicht versehenen Probenträger. Mittels der ellipsometrischen Messung werden die Parameter Ψ und Δ ermittelt, wobei der Einfallswinkel und/oder die Frequenz der für die ellipsometrischen Messungen verwendeten elektromagnetischen Strahlung derart eingestellt wird, dass in der Metallschicht eine gedämpfte Oberflächenplasmonenresonanz angeregt wird. Die Detektionsempfindlichkeit (δcosΔ)/(Einheit der Probenänderung) wird über die Dicke der Metallschicht eingestellt. Die elektromagnetische Strahlung wird auf der der Probe abgewandten Seite des Probenträgers flächig eingestrahlt und bei mindestens einem Einfallswinkel und mindestens einer Frequenz werden mindestens zwei zeitlich versetzte, simultane, ortsaufgelöste ellipsometrische Messungen an der Probe/den Proben durchgeführt und wenigstens die jeweils dazugehörigen Δ bzw. cosΔ-Werte zur Ermittlung der Probenänderung ausgewertet.
PCT/EP2002/005895 2001-05-30 2002-05-29 Ortsaufgelöstes ellipsometrie-verfahren zur quantitativen und/oder qualitativen bestimmung von probenänderungen, biochip und messanordnung WO2002097405A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2002304653A AU2002304653A1 (en) 2001-05-30 2002-05-29 High-resolution ellipsometry method for quantitative or qualitative analysis of sample variations, biochip and measuring device
US10/478,574 US20040142482A1 (en) 2001-05-30 2002-05-29 High-resolution ellipsometry method for quantitative or qualitative analysis of sample variations, biochip and measuring device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10126152A DE10126152C2 (de) 2001-05-30 2001-05-30 Ortsaufgelöstes Ellipsometrie-Verfahren zur quantitativen und/oder qualitativen Bestimmung von Probenänderungen, Biochip und Meßanordnung
DE10126152.7 2001-05-30

Publications (2)

Publication Number Publication Date
WO2002097405A2 WO2002097405A2 (de) 2002-12-05
WO2002097405A3 true WO2002097405A3 (de) 2003-11-20

Family

ID=7686528

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/005895 WO2002097405A2 (de) 2001-05-30 2002-05-29 Ortsaufgelöstes ellipsometrie-verfahren zur quantitativen und/oder qualitativen bestimmung von probenänderungen, biochip und messanordnung

Country Status (4)

Country Link
US (1) US20040142482A1 (de)
AU (1) AU2002304653A1 (de)
DE (1) DE10126152C2 (de)
WO (1) WO2002097405A2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6937341B1 (en) * 1998-09-29 2005-08-30 J. A. Woollam Co. Inc. System and method enabling simultaneous investigation of sample with two beams of electromagnetic radiation
DE10335533A1 (de) * 2003-07-31 2005-02-17 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Berührungsloser Dehnungssensor
DE10362349B3 (de) * 2003-08-12 2014-05-08 Sick Ag Verfahren zur Herstellung eines Sensors für optische Strahlung
DE10337040B4 (de) * 2003-08-12 2013-01-17 Sick Ag Vorrichtung zur Untersuchung einer Oberfläche oder einer Schicht
FR2860872A1 (fr) 2003-10-09 2005-04-15 Commissariat Energie Atomique Micro-capteurs et nano-capteurs d'especes chimiques et biologiques a plasmons de surface
EP1584914A1 (de) * 2004-04-08 2005-10-12 Sony Deutschland GmbH Ellipsometrie-Verfahren zum Nachweis eines Substrat-gebundenden Hybrids aus mindestens zwei Spezies
DE102004027957A1 (de) * 2004-06-08 2005-12-29 Carl Zeiss Jena Gmbh Verfahren und Anordnung zur Untersuchung der Wechselwirkung von Biomolekülen
US7365855B2 (en) * 2005-07-08 2008-04-29 The Chinese University Of Hong Kong Optical sensing devices with SPR sensors based on differential phase interrogation and measuring method using the same
CN100347546C (zh) * 2005-09-02 2007-11-07 清华大学 蛋白质芯片的传感方法及其检测系统
KR100787046B1 (ko) 2006-02-09 2007-12-21 연세대학교 산학협력단 나노 크기의 정렬된 금속 구조체들을 사용하는 국소 표면플라즈몬 센서
DE102006012022A1 (de) * 2006-03-14 2007-09-20 Betriebsforschungsinstitut VDEh - Institut für angewandte Forschung GmbH Verfahren zur Bestimmung der Auflage auf einem bewegten Metallband
WO2009040721A1 (en) * 2007-09-28 2009-04-02 Koninklijke Philips Electronics N.V. A microelectronic sensor device comprising a carrier with electrical conductors
GB0721482D0 (en) * 2007-11-01 2007-12-12 Univ Exeter Plasmon resonance based sensor
JP2009145189A (ja) * 2007-12-13 2009-07-02 Fujifilm Corp バイオセンサー
JP5291378B2 (ja) * 2008-05-15 2013-09-18 スタンレー電気株式会社 フォトカソード装置
KR101012056B1 (ko) 2008-11-28 2011-02-01 한국표준과학연구원 다채널 타원계측 표면 플라즈몬 공명 측정장치
KR101029473B1 (ko) 2008-11-28 2011-04-18 한국표준과학연구원 초점타원계측 표면 플라즈몬 공명 측정장치
US9110021B2 (en) * 2009-03-10 2015-08-18 Universita Degli Studi Di Padova Sensitivity enhancement in grating coupled surface plasmon resonance by azimuthal control
KR101127210B1 (ko) 2009-10-12 2012-03-29 한국표준과학연구원 표면 플라즈몬 공명 결상 타원 계측기 및 표면 플라즈몬 공명 결상 타원 계측방법
KR101105328B1 (ko) 2009-11-23 2012-01-16 한국표준과학연구원 분자 흡착 및 해리 동특성 측정장치 및 측정방법
WO2011106057A2 (en) * 2009-12-04 2011-09-01 Trustees Of Boston University Nanostructure biosensors and systems and methods of use thereof
JP2013181753A (ja) * 2012-02-29 2013-09-12 Nitto Denko Corp Sprセンサセルおよびsprセンサ
KR101383652B1 (ko) * 2012-10-15 2014-04-09 한국표준과학연구원 분자접합특성 및 완충용액 굴절률 동시 측정장치 및 측정방법
TWI498540B (zh) * 2013-05-30 2015-09-01 Univ Nat Cheng Kung 具不對稱粒子形狀之定域化表面電漿共振檢測系統
TWI498541B (zh) 2013-05-30 2015-09-01 Univ Nat Cheng Kung 具不對稱週期粒子排列之定域化表面電漿共振檢測系統
KR102103077B1 (ko) * 2018-08-20 2020-04-22 한국표준과학연구원 고소광계수 표지자와 유전체기판을 이용한 고감도 바이오센서칩, 측정시스템 및 측정방법
CN114371159B (zh) * 2021-05-19 2023-11-07 南京医科大学第二附属医院 一种rna生物芯片及其制备方法与应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19814811C1 (de) * 1998-04-02 1999-08-05 Inst Physikalische Hochtech Ev Anordnung für die Oberflächenplasmonen-Resonanz-Spektroskopie

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE30780T1 (de) * 1981-06-22 1987-11-15 Battelle Memorial Institute Verfahren zum bestimmen bioaktiver substanzen.
DE3720387C1 (en) * 1987-06-19 1988-11-24 Benno Rothenhaeusler Method and device for examining the physical properties of thin layers by means of polarised light
GB8801807D0 (en) * 1988-01-27 1988-02-24 Amersham Int Plc Biological sensors
SE462408B (sv) * 1988-11-10 1990-06-18 Pharmacia Ab Optiskt biosensorsystem utnyttjande ytplasmonresonans foer detektering av en specific biomolekyl, saett att kalibrera sensoranordningen samt saett att korrigera foer baslinjedrift i systemet
GB9314991D0 (en) * 1993-07-20 1993-09-01 Sandoz Ltd Mechanical device
DE19629243A1 (de) * 1996-07-19 1998-01-29 Udo Dr Ris Verfahren zur quantitativen und/oder qualitativen Bestimmung von Atomen oder Molekülen
DE10006083B4 (de) * 2000-02-11 2004-01-22 INSTITUT FüR MIKROTECHNIK MAINZ GMBH Verfahren zur quantitativen und/oder qualitativen Bestimmung von Schichtdicken sowie ein Mikroreaktionsgefäß und eine Titerplatte

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19814811C1 (de) * 1998-04-02 1999-08-05 Inst Physikalische Hochtech Ev Anordnung für die Oberflächenplasmonen-Resonanz-Spektroskopie

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
BORKOVSKAYA O Y ET AL: "Characterization of thin metal films with overlayers by transparency and multiangle including surface plasmon excitation reflectance ellipsometry method", POLARIMETRY AND ELLIPSOMETRY, KAZIMIERZ DOLNY, POLAND, 20-23 MAY 1996, vol. 3094, Proceedings of the SPIE - The International Society for Optical Engineering, 1997, SPIE-Int. Soc. Opt. Eng, USA, pages 250 - 254, XP008009528, ISSN: 0277-786X *
BORTCHAGOVSKY E G: "POSSIBILITIES OF ELLIPSOMETRY WITH THE SURFACE PLASMON EXCITATION IN THE INVESTIGATION OF THIN FILMS IN COMPARISON WITH SEPARATED ELLIPSOMETRY AND SURFACE PLASMON SPECTROSCOPY", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3094, 1997, pages 239 - 249, XP001017834 *
F.ABELÈS: "Surface electromagnetic waves ellipsometry", SURFACE SCIENCE, vol. 56, 1976, pages 237 - 251, XP008009577 *
HARKE M ET AL: "DESCRIPTION OF A SINGLE MODULAR OPTICAL SETUP FOR ELLIPSOMETRY, SURFACE PLASMONS, WAVEGUIDE MODES, AND THEIR CORRESPONDING IMAGING TECHNIQUES INCLUDING BREWSTER ANGLE MICROSCOPY", REVIEW OF SCIENTIFIC INSTRUMENTS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 68, no. 8, 1 August 1997 (1997-08-01), pages 3130 - 3134, XP000723525, ISSN: 0034-6748 *
MEICHSNER J: "IN SITU CHARACTERISATION OF POLYMER SURFACES AND THIN ORGANIC FILMS IN PLASMA PROCESSING", CONTRIBUTIONS TO PLASMA PHYSICS, AKADEMIE VERLAG, BERLIN, DE, vol. 39, no. 5, 1999, pages 427 - 439, XP001018278, ISSN: 0863-1042 *
SCHILDKRAUT J S: "Limitations to the determination of the optical properties of a thin film by combined ellipsometric and surface plasmon resonance measurements", APPLIED OPTICS, 15 AUG. 1988, USA, vol. 27, no. 16, pages 3329 - 3333, XP002218620, ISSN: 0003-6935 *

Also Published As

Publication number Publication date
DE10126152C2 (de) 2003-12-24
AU2002304653A1 (en) 2002-12-09
WO2002097405A2 (de) 2002-12-05
DE10126152A1 (de) 2002-12-12
US20040142482A1 (en) 2004-07-22

Similar Documents

Publication Publication Date Title
WO2002097405A3 (de) Ortsaufgelöstes ellipsometrie-verfahren zur quantitativen und/oder qualitativen bestimmung von probenänderungen, biochip und messanordnung
EP0546061B1 (de) Vorrichtung zur oberflächenplasmonen-resonanz
Hilfiker et al. Survey of methods to characterize thin absorbing films with spectroscopic ellipsometry
US5381228A (en) Rapid estimation of the oxygen permeation rate of a thin film on a plastic container
Kurihara et al. Asymmetric SPR sensor response curve-fitting equation for the accurate determination of SPR resonance angle
Woollam et al. Spectroscopic ellipsometry studies of indium tin oxide and other flat panel display multilayer materials
US20120038920A2 (en) Method and Apparatus for Ellipsometry Measurement
EP2781911B1 (de) Sensorsystem und Verfahren zum Bestimmen der Papierblatt-Qualitätsparameter
EP0929094A3 (de) Gerät und Verfahren zur Messung der Tiefe einer vertieften Grenzschicht
CN111751314A (zh) 基于太赫兹的涂层厚度检测方法和装置
Korte et al. Infrared spectroscopic ellipsometry: a tool for characterizing nanometer layers
US7209234B2 (en) Combined use of oscillating means and ellipsometry to determine uncorrelated effective thickness and optical constants of material deposited from a fluid
Richter Application of the degree of polarization to film thickness gradients
US20140350868A1 (en) Method for sensor calibration
US7396684B2 (en) Method for quantitatively and/or qualitatively detecting layer thicknesses, a microreaction vessel and titre plate
US5894127A (en) Polarized specular reflectance infrared apparatus and method
Fen et al. Optical characterization of multi layer thin films using surface plasmon resonance method: From electromagnetic theory to sensor application
Vovk et al. Photoacoustic investigations of secondary chromatographic effects on TLC plates
Nikonenko et al. Measurement of the thickness of thin polymer layers by infrared frustrated total internal reflection spectroscopy
Beyerlein et al. Study of novel polymer architectures on solid surfaces by variable angle spectroscopic and imaging ellipsometry
Koçak et al. Some advances in Fourier transform infrared transflection analysis and potential applications in forensic chemistry
US8072616B2 (en) Application of crossed teflon diffuser to coatings on oriented surfaces
US7193709B1 (en) Ellipsometric investigation of thin films
US7349092B1 (en) System for reducing stress induced effects during determination of fluid optical constants
Cho et al. Enhancement of biomolecular detection sensitivity by surface plasmon resonance ellipsometry

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 10478574

Country of ref document: US

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP