WO2002052550A1 - Substrates for hard disks and hard disks - Google Patents

Substrates for hard disks and hard disks Download PDF

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Publication number
WO2002052550A1
WO2002052550A1 PCT/JP2001/010847 JP0110847W WO02052550A1 WO 2002052550 A1 WO2002052550 A1 WO 2002052550A1 JP 0110847 W JP0110847 W JP 0110847W WO 02052550 A1 WO02052550 A1 WO 02052550A1
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Prior art keywords
hard disk
disk substrate
resin
substrate according
component
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PCT/JP2001/010847
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French (fr)
Japanese (ja)
Inventor
Etsuro Matsui
Nobuo Tanaka
Original Assignee
Teijin-Bayer Polytec Limited
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Application filed by Teijin-Bayer Polytec Limited filed Critical Teijin-Bayer Polytec Limited
Priority to JP2002553765A priority Critical patent/JPWO2002052550A1/en
Publication of WO2002052550A1 publication Critical patent/WO2002052550A1/en

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73923Organic polymer substrates
    • G11B5/73937Substrates having an organic polymer comprising a ring structure

Definitions

  • the present invention relates to a hard disk substrate. More specifically, the present invention relates to a substrate formed of a thermoplastic resin suitable for magnetic recording media such as magnetic disks and digital video disks. In particular, the present invention relates to a digital video device having an extremely large recording capacity.
  • Japanese Patent Application Laid-Open No. Hei 5-65535 describes a plastic substrate for a hard disk using a polycarbonate resin and an acrylic resin.
  • the resin allows sector one and zone bit signals to be molded from a mold.
  • Japanese Patent Application Laid-Open No. 7-150630 describes a plastic substrate for a hard disk using a thermoplastic norpolenene resin.
  • the resin has low hygroscopicity, that is, a small change in shape, and has a high resonance frequency, that is, easy to read a radio mark, and thus enables higher density recording.
  • a substrate formed of norpolenene resin has insufficient physical strength, particularly a flexural modulus, and therefore requires a relatively thick disk substrate. For this reason, a substrate using this resin does not sufficiently exhibit the advantage of weight reduction using the resin.
  • a first object of the present invention is to provide a lightweight resin substrate having a certain level of physical strength, particularly a flexural modulus and specific gravity, which is suitable for a single-disk substrate.
  • a second object of the present invention is to provide a resin substrate having other physical properties such as a coefficient of linear expansion and a water content suitable for an 81-disk substrate.
  • a third object of the present invention is to provide a resin substrate having excellent flatness and smoothness of a magnetic film forming surface on a hard disk substrate.
  • Another object of the present invention is to provide a hard disk substrate formed of an aromatic polycarbonate resin capable of exhibiting the various characteristics described above.
  • Still another object of the present invention is to provide a hard disk substrate having a high density and a high function suitable for a hard disk substrate for video, particularly a video hard disk substrate, etc., and easily formed by melting. Is to do. Means for solving the problem
  • thermoplastic resin formed substantially from a thermoplastic resin
  • (A) It is characterized by being formed of a resin having a specific gravity of 0.95 to 1.25 and (B) a flexural modulus of 2,200 to 3,500 OMPa. And a hard disk having a magnetic film formed on the surface of the substrate.
  • the hard disk substrate of the present invention (A) has a specific gravity of 0.95 to 1.25, preferably 1.0 to 1.15, and a flexural modulus of 2,200 to 3,500 MP. a, preferably a thermoplastic resin having physical properties of 2,300 to 3,400 MPa, particularly preferably 2,400 to 3,0 MPa.
  • Such physical properties are values that cannot be achieved by conventional thermoplastic norpolene resin or polyphenol resin from bisphenol A, and are valuable values as physical properties of the hard disk substrate as described later.
  • a hard disk substrate having excellent physical properties as well as surface characteristics on a magnetic film forming surface. That is, the surface on which the magnetic film is formed has excellent smoothness and excellent flatness (flatness).
  • the center line average roughness (Ra) on the magnetic film forming surface of the hard disk substrate is 2 nm or less, preferably 1 nm or less.
  • the flatness in the circumferential direction of the magnetic film forming surface of the hard disk substrate is 1 Om or less, preferably 7 m or less.
  • the hard disk substrate of the present invention has substantially no coarse projections having a height of 25 nm or more on the surface on which the magnetic film is formed. For that purpose, as described later, it is necessary to prevent large undissolved particles from being mixed in the resin or to remove large particles with a filter.
  • the hard disk substrate of the present invention preferably has a linear expansion coefficient and water absorption It also has excellent physical properties. That is, the linear expansion coefficient 6. 5X 10 "5 deg- 1 or less, preferably 5. 5 ⁇ 6. 3 X 10- 5 deg- 1.
  • the water absorption is 0.18 wt% or less, preferably 0 17% by weight or less, particularly preferably 0.15% by weight or less.
  • the resin forming the hard disk substrate of the present invention may contain chlorine depending on the manufacturing process. If the chlorine content is high, the molding die is corroded, the thermal stability of the resin is reduced, and the magnetic film of the hard disk is corroded, which is not desirable. It is therefore recommended that the chlorine content be less than 10 ppm, preferably less than 7 ppm, particularly preferably less than 5 ppm.
  • chlorine content as used herein means a value obtained by measuring the resin by a combustion method using a total organic halogen analyzer TOX10 manufactured by Mitsubishi Iridaku.
  • Examples of the resin that achieves the physical properties of the above-mentioned substrate include an aromatic polycarbonate resin.
  • an aromatic polycarbonate resin in which at least 30% of a wholly aromatic dihydroxy component is 1,1-bis (4-hydroxyphenyl) -1,3,3,5-trimethylcyclohexane.
  • bisphenol TMC 1,1-bis (hydroxyphenyl) -3,3,5-trimethylcyclohexane
  • One-ponate resin is known from US Pat. No. 4,982,014 (JP-A-2-88634).
  • a representative example disclosed in this publication is an aromatic polycarbonate using bisphenol TMC in an amount of 100 to 2 mol% of the total dihydroxy component. Specifically, bisphenol TMC was used in an amount of 100 to 30 mol%. It is a homo- or co-polycarbonate.
  • the advantages and applications of the aromatic resin obtained are excellent in high heat resistance compared to conventional polycarbonate resins. It is described for use in the field of coating and glazing.
  • the use of optical discs is described as a polyphenol resin of 65 mol% of bisphenol A and 55 mol% of bisphenol TM C, but this resin is compared with the conventional resin from bisphenol A. It just shows that the heat resistance has been improved. Further, the above publication has no suggestion to use the obtained aromatic polycarbonate for a hard disk substrate.
  • aromatic polycarbonate resin from bisphenol TM C alone is not suitable as a hard disk substrate.
  • the specific copolymer described in the above-mentioned publication that is, a copolymer polystyrene resin from bisphenol TMC and bisphenol A is similarly hardened regardless of the copolymerization ratio. It was found that the disk substrate was not particularly excellent as compared with the conventional poly-polycarbonate resin substrate from bisphenol A, except that it had improved heat resistance.
  • aromatic polystyrene obtained by using a specific terminal modifier for bisphenol TM C and / or copolymerizing a certain proportion of a dihydroxy compound having a specific structure is used. It has been found that the force component resin has a high flexural modulus, a low coefficient of linear expansion, a low specific gravity, an extremely low water absorption, and a substrate having a small warpage as a hard disk substrate.
  • the aromatic polycarbonate resin advantageously used as the material of the hard disk substrate of the present invention is 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane represented by the following formula: (Bisphenol TMC) is a polycarbonate resin composed of at least 30 mol% based on the total aromatic dihydroxy component.
  • the aromatic polycarbonate resin uses the bisphenol TM C in an amount of at least 30 mol%, preferably at least 40 mol%, of the total aromatic dihydroxy component.
  • the ratio of this bisphenol TMC is less than 30 mol%, the obtained hard disk substrate or hard disk is unsatisfactory in any of heat resistance, mechanical properties, water absorption, transferability or warpage or surface properties.
  • a hard disk substrate or a hard disk satisfying these characteristics cannot be obtained.
  • Bisphenol TMC may be 100 mol%, but it tends to have a high water absorption or poor fluidity. Therefore, when bisphenol TMC is in such a high proportion, a specific amount of bisphenol TMC will be used as described later. It is desirable to modify the terminal with a terminal modifier.
  • the aromatic polycarbonate resin it is necessary to use the bisphenol TMC as an aromatic dihydroxy component in a certain ratio, and the aromatic polycarbonate resin is roughly classified to have desired characteristics, particularly, a water absorption of 0.18% by weight or less.
  • Two means are employed. One is to combine a specific dihydroxy component with the bisphenol TMC to form a copolymerized polycarbonate resin, and the other means is to introduce a terminal modifier having a specific structure into the terminal group. It is. These two means may be used alone or in combination.
  • the aromatic polycarbonate resin has a bisphenol TMC ratio of 30 to 70 mol% in a wholly aromatic dihydroxy component constituting the resin, but preferably 40 to 60 mol%. Is particularly preferred.
  • the copolymerized polycarbonate resin comprises (a) bisphenol TM C (this is referred to as component a) and (b) 4,4 ′-(m-phenylenediisopropylidene) diphenol (hereinafter referred to as “bisphenol M”).
  • component b Z or 2,2-bis (3-methyl-4-hydroxyphenyl) propane (hereinafter sometimes abbreviated as "bisphenol C”) [these are referred to as component b] are wholly aromatic At least 90 mol% of the dihydroxy component, and the ratio of component a to component b is 30:70 Polycarbonate resin having a thickness of up to 70:30, preferably 40:60 to 60:40 is particularly preferred as a hard disk substrate.
  • One preferred embodiment of the copolymerized polycarbonate resin is a combination in which the component a is bisphenol TM C and the component b is bisphenol M, in which case the ratio of the component a to the component b is a molar ratio. It is preferable that the ratio be in the range of 40:60 to 60:40, and more preferably in the range of 45:55 to 55:45.
  • component (a) and the component (b) occupy at least 90 mol%, preferably at least 95 mol%, of the total aromatic dihydroxy component in the aromatic polysiloxane resin.
  • Component C may be contained in an amount of 10 mol% or less, preferably 5 mol% or less, based on the total aromatic dihydroxy component.
  • the component C may be any component other than the component a and the component b, which are usually used as the dihydroxy component of the aromatic polycarbonate, such as hydroquinone, resorcinol,, 4, -biphenol, 1,1-bis ( 4-Hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxyphenyl) butane, 1,1-bis (4-hydroxyphenyl) 1-1-phenylethane 1,1,1-bis (4-hydroxyphenyl) cyclohexane, 2,2-bis (4-hydroxyphenyl) pentane, 4,4,1- (p-phenylenediisopropylidene) diphenol, 9,9 1-bis (4-hydroxyphenyl) fluorene, 1,1-bis (4-hydroxyphenyl) -14 before it can be used as a hard disk substrate
  • the aromatic polycarbonate resin is a reaction means known per se for producing a normal aromatic polycarbonate resin, for example, by reacting an
  • the reaction is usually performed in the presence of an acid binder and a solvent.
  • the acid binder include sodium hydroxide, Alkali metal hydroxides such as hydroxylated lime or amine compounds such as pyridine are used.
  • the solvent for example, a halogenated hydrocarbon such as methylene chloride or chlorobenzene is used.
  • a catalyst such as a tertiary amine or a quaternary ammonium salt can be used to promote the reaction.
  • the reaction temperature is usually 0 to 40 ° C, and the reaction time is several minutes to 5 hours. '
  • a predetermined ratio of an aromatic dihydroxy component is stirred with carbonic acid diester while heating under an inert gas atmosphere to distill off the generated alcohol or phenols. It is done by the method of making it.
  • the reaction temperature varies depending on the boiling point of the alcohol or phenols to be formed, but is usually in the range of 120 to 330 ° C.
  • the reaction is completed under reduced pressure from the beginning while distilling off the alcohol or phenols formed.
  • a catalyst usually used in a transesterification reaction to promote the reaction can also be used.
  • Examples of the carbonic acid diester used in the transesterification reaction include diphenyl carbonate, dinaphthyl carbonate, bis (diphenyl) carbonate, dimethyl carbonate, getyl carbonate, dibutyl carbonate and the like. Of these, diphenyl alcohol is particularly preferred.
  • the aromatic polycarbonate of the present invention uses bisphenol TM C or a mixture of bisphenol TM C and another aromatic dihydroxy component as the aromatic dihydroxy component as described above, It can be prepared according to the reaction of polycarbonate formation.
  • monofunctional phenols which are usually used as a terminal terminator can be used.
  • monofunctional phenols are generally used as a terminator for controlling the molecular weight, and the resulting aromatic polycarbonate resin has Since it is blocked by a group based on monofunctional phenols, it has better thermal stability than those not.
  • any one may be used as long as it is used as a terminal terminator for an aromatic polycarbonate resin.
  • phenol or lower alkyl is used.
  • A represents a hydrogen atom or an aliphatic hydrocarbon group having 1 to 9, preferably 1 to 8 carbon atoms, and r represents an integer of 1 to 5, preferably 1 to 3.
  • monofunctional phenols include, for example, phenol, p_tert_butylbutylphenol, p-cumylphenol and isooctylphenol. These monofunctional phenols are desirably introduced into at least 5 mol%, preferably at least 10 mol%, of the terminals of the obtained aromatic polycarbonate resin.
  • phenols having long-chain alkyl groups or aliphatic polyester groups as substituents or benzoic acid chlorides or long-chain alkyl carboxylic chlorides to terminate the terminal groups of the aromatic polycarboxylic acid resin.
  • the blocking not only functions as a terminal terminator or a molecular weight regulator as in the case of the above-mentioned monofunctional phenols, but also serves to modify the obtained aromatic polycarbonate resin.
  • phenols having a long-chain alkyl group or aliphatic polyester group as a substituent or benzoic acid chlorides or long-chain alkyl sulfonic acid chlorides (hereinafter, these are distinguished from the monofunctional phenols) Is sometimes abbreviated as "terminal modifier").
  • terminal modifier phenols having a long-chain alkyl group or aliphatic polyester group as a substituent
  • the water absorption of the obtained resin exceeds 0.18 wt%.
  • the terminal modifier is, of course, a monofunctional conjugate, it also has a function as a terminal stopper or a molecular weight regulator.
  • the proportion of the powerful terminal modifier is not constant, but it is used so as to bind at least 5 mol%, preferably at least 10 mol%, to all terminals. Is done. Terminal modifiers can be used in combination with the monofunctional phenols.
  • compounds represented by the following general formulas [Ia] to [Ih] can be used.
  • X is one R— ⁇ —, —R—CO—O— or —R— ⁇ —CO—, wherein R is a single bond or a group having 1 to 10, preferably 1 to 5 carbon atoms.
  • T represents a divalent aliphatic hydrocarbon group, T represents a single bond or a bond similar to the above X, and n represents an integer of 10 to 50.
  • Q represents a halogen atom or a monovalent aliphatic hydrocarbon group having 1 to 10, preferably 1 to 5 carbon atoms; p represents an integer of 0 to 4; Y represents 1 to 10 carbon atoms, preferably shows a 1-5 divalent aliphatic hydrocarbon group, W 1 is a hydrogen atom, -CO-R one CO- O-R 2 or R 3, where RR 2 and R 3 are each A monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 8 carbon atoms, preferably 5 to 6 carbon atoms or 6 to 15 carbon atoms, preferably Represents a monovalent aromatic hydrocarbon group of 6 to 12.
  • t represents an integer of ⁇ 20, preferably 5-10
  • m represents an integer of 1-100, preferably 3-60, particularly preferably 4-50
  • Z represents a single bond or carbon number 1-10, It preferably represents a divalent aliphatic hydrocarbon group having 1 to 5;
  • W 2 represents a hydrogen atom; a monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, preferably 5 to 6 carbon atoms; And preferably a monovalent alicyclic hydrocarbon group of 5 to 6 or a monovalent aromatic hydrocarbon group of 6 to 15, preferably 1 to 12 carbon atoms.
  • substituted phenols of [I_a] and [I_b] preferred are substituted phenols of [I_a] and [I_b].
  • substituted phenols of [Ia] those having n of 10 to 30, particularly preferably 10 to 26 are preferable. Specific examples thereof include decyl phenol, dodecyl phenol and tetradecyl phenol. Hexadecylphenol, octadecylphenol, eicosylphenol, docosylphenol and triacontylphenol.
  • substituted phenols represented by [Ib] compounds in which X is -R-C ⁇ -0- and R is a single bond are suitable, and n is 10 to 30, especially 10 to 26.
  • decyl hydroxybenzoate dodecyl hydroxybenzoate, tetradecyl hydroxybenzoate, hexadecyl hydroxybenzoate, eicosyl hydroxybenzoate, docosyl hydroxybenzoate and tricontyl hydroxybenzoate.
  • the position of the substituent is generally preferably the p-position or the o-position, and a mixture of both is preferable. preferable.
  • [Ia] and [Ib] among the above-mentioned terminal modifiers are particularly excellent.
  • the reason for this, as described above, is that when these are introduced as terminal groups into the aromatic polycarbonate resin, not only the melt fluidity thereof is improved but also the effect of lowering the water absorption is reduced.
  • Wholly aromatic diphenyls constituting the aromatic polycarbonate resin When the ratio of bisphenol TMC in the droxy component is high, for example, 80 mol% or more, especially 90 mol% or more, the water absorption of the resin may exceed 0.18% by weight. It is possible to reduce the water absorption to 0.18% by weight or less by using the terminal modifiers [I-a] and [I-b] described above.
  • the aromatic polysiloxane resin of the present invention may use the above-mentioned terminal modifier as long as the proportion of bisphenol TMC is at least 30 mol%, preferably at least 40 mol%. Not even.
  • the aromatic polycarbonate resin is obtained by dissolving 0.7 g of the resin in 10 Oml of methylene chloride and having a specific viscosity measured at 20 ° C. in the range of 0.2 to 0.5. It is in the range of 0.25 to 0.4. If the specific viscosity is less than 0.2, the molded product becomes brittle. If the specific viscosity is higher than 0.5, the melt fluidity is poor and molding failure occurs, and it is difficult to obtain a good disk substrate for a hard disk.
  • the hard disk substrate of the present invention can be obtained by molding the aromatic polycarbonate resin by any method such as an injection molding method, a compression molding method, an extrusion molding method, and a solution casting method.
  • the hard disk substrate obtained by the injection molding method is preferable.
  • the polyacrylonitrile resin of the present invention has a water absorption of 0.18% by weight or less, preferably 0.17% by weight or less, as measured by ASTM D-0570. When the water absorption exceeds 0.18% by weight, a hard disk having a metal film formed on the surface of the hard disk substrate is liable to be warped by water absorption and to cause a tracking error, which is preferable. Absent. A particularly preferred water absorption is 0.15% by weight or less.
  • the hard disk substrate of the present invention is preferably formed from an aromatic polycarbonate resin having a flexural modulus of 2,200 to 3,500 MPa, preferably 2,300 to 3,40 OMPa. Particularly preferred flexural modulus is from 2,400 to 3,000 OMPa. If the flexural modulus is lower than 2,20 OMPa, it becomes unsuitable as a hard disk substrate. On the other hand, to obtain a resin having a flexural modulus exceeding 3,40 OMPa, it is necessary to increase the degree of polymerization, in which case molding becomes difficult.
  • the hard disk substrate of the present invention the linear expansion coefficient of 6.
  • 5X 10- 5 deg one 1 it is advantageous to be formed from an aromatic polycarbonate resin having preferably 5.5 to 6.3 ⁇ 10 5 deg- 1 . If the linear expansion coefficient is to use a polycarbonate resin of greater than 6. 5X 10- 5 deg one 1 as a hard disk, which may hinder the reading of the recording by the use condition.
  • aromatic polycarbonate resin used for the hard disk substrate of the present invention those having a specific gravity of 0.95 to 1.25, preferably 1.0 to 1.15 are advantageously used. Resins having a specific gravity in this range are light in weight and have little value in the operation and operation of the disk, and thus have value in themselves.
  • the chlorine content be less than 10 ppm, preferably less than 7 ppm, particularly preferably less than 5 ppm.
  • the chlorine content as referred to herein means a value obtained by measuring the aromatic polycarbonate resin by a combustion method using a total organic octogen analyzer TOX10 manufactured by Mitsubishi Chemical Corporation.
  • an aromatic polysiloxane resin having an oligomer content of 10% or less, preferably 6% or less, particularly preferably 4% or less is used.
  • the value of the oligomer content is a value measured using the following method and column. That is, TSKge1 manufactured by Tosouichi Co., Ltd., one each of G2000HXL and G3000HXL columns, connected in series, using a chromate form as eluent, and diverted to 0.7 ml Z minutes after diversion.
  • the oligomer content is the ratio of the total area of the oligomer peaks after the retention time of the GPC chart measured by a method of injecting the chloroform solution of the polycarbonate resin of 19 minutes to the total peak area. Oligomer—If the content exceeds 10%, the mold surface may be contaminated during molding, which is undesirable, and the contamination tends to be more pronounced as the oligomer content increases. On the other hand, the oligomers are produced during the production of aromatic polycarbonate resin, Cannot be zero (0).
  • the content of the oligomer may be not more than the above-mentioned content, and as long as the value is satisfied, the content of the oligomer may be small.
  • the oligomer is present in a small proportion of 0.1% or more, preferably 0.15% or more, the melt flowability is improved as compared with the oligomer having a small content. Therefore, the oligomer content is particularly preferably in the range of 0.15 to 4%.
  • oligomer content in the aromatic polycarbonate resin In order to control the oligomer content in the aromatic polycarbonate resin within the above range, it is necessary to complete the polymerization sufficiently so that a large amount of oligomer is not contained in the resin, and the catalyst and polymerization conditions are appropriately adjusted. A choice is required. If the oligomer content exceeds the above range, a treatment for removing the oligomer by means such as extraction is employed.
  • This extraction is performed by dropping a solution of the aromatic polycarbonate resin (for example, a methylene chloride solution) into a poor solvent or a non-solvent (for example, acetone or methanol), or removing the resin from the poor solvent or It can be carried out by a method such as a method of extracting the oligomer by immersion in a non-solvent.
  • a solution of the aromatic polycarbonate resin for example, a methylene chloride solution
  • a non-solvent for example, acetone or methanol
  • the aromatic polycarbonate resin is used as a hard disk substrate, particularly a video hard disk substrate, the amount of undissolved particles therein should be controlled to a certain fixed amount or less.
  • the polycarbonate resin was prepared by dissolving 20 g of the solution in 1 L of methylene chloride.
  • the number of undissolved particles having a diameter of 0.5 m or more and the number of undissolved particles having a diameter of 1 m or more is not more than 1,200 per gram of the polycarbonate resin. Desirably. If the undissolved particles of 0.5 im or more exceed the force of 12, 000 particles or the undissolved particles of 1 m or more exceed the force of 200 particles, the information written on the disc will be adversely affected and the error rate will be reduced. It is not preferable because it becomes large. More preferably, the number of undissolved particles of 0.5 m or more is 100,000 or less, and the number of undissolved particles of 1 m or more is 100 or less.
  • Undissolved particles of 1 O ⁇ m or more should not be substantially present.
  • a means for preventing the undissolved particles from being mixed in or removing the particles during the polymerization process and the granulation process should be adopted.
  • Such means include, for example, performing the operation in a clean room, and using a granulator equipped with a device for removing undissolved particles (specific examples include a bearing unit used in Example 1 described later).
  • granulation is performed using an apparatus (eg, a spray dryer type granulator) that does not allow resin particles to touch the sliding part.
  • the hard disk substrate of the present invention is required for its purpose to have an extremely smooth magnetic film forming surface. It is desirable that the smoothness be 2 nm or less, preferably 1 nm or less, particularly preferably 0.5 nm or less, as expressed by the center line surface roughness (Ra). If the surface roughness (Ra) exceeds 2 nm, it will affect the smoothness of the surface of the magnetic film formed on the surface, which will hinder recording and removal.
  • the center line average roughness (R a) is a value defined in JISB0601, and the standard length L (measurement length) is sampled.
  • the average line of the sampled portion is X-axis, and the direction of the vertical magnification is Y
  • the hard disk substrate of the present invention has excellent flatness.
  • the flatness is 1 or less, preferably 7 m or less in the circumferential direction on the surface on which the magnetic film is formed, as flatness. Actually, it is desirable that the flatness in the radial direction is also approximately the same.
  • the hard disk substrate of the present invention has a height of 25 nm on the magnetic film formation surface. It is important that the above-mentioned coarse projections do not substantially exist. For this purpose, it is necessary to prevent large undissolved particles from entering as described above, or to remove large particles with a filter.
  • the glass transition point of the aromatic polycarboxylic acid resin is preferably 120 ° C. or higher, more preferably 130 ° C. or higher, and even more preferably 144 ° C. or higher. If the glass transition point is low, the heat resistance of the disk substrate will be insufficient.
  • the fluidity of the aromatic polycarbonate resin is preferably 25 g / 10 minutes or more, more preferably 30 g / 10 minutes or more, and more preferably 45 gZ10 minutes or more in terms of MFR. More preferred. If the fluidity is low, the moldability is inferior and a desired disk substrate cannot be obtained.
  • a phosphorus-based heat stabilizer can be added to the aromatic polycarbonate resin as needed.
  • phosphites and phosphates are preferably used.
  • the phosphite include triphenyl phosphite, trisnonyl phenyl phosphite, tris (2,4-DG tert-butyl phenyl) phosphite, tridecyl phosphite, trioctyl phosphite, trioctadecyl phosphite Phyto, didecyl monophenyl phosphite, dioctyl monophenyl phosphite, diisopropyl monophenyl phosphite, monobutyi diphenyl phosphite, monodecyl diphenyl phosphite, monooctyl diphenyl phosphite, bis (2,
  • phosphate esters used as heat stabilizers include, for example, triptyl phosphate, trimethyl phosphate, tricresylyl phosphate, Triphosphate, trichlorophenyl phosphate, triethyl phosphate, diphenyl cresyl phosphate, diphenyl monoorthoxenyl phosphate, tributoxyshethyl phosphate, dibutyl phosphate, octyl phosphate, Examples thereof include diisopropyl phosphate, and among them, triphenyl phosphate and trimethyl phosphate are preferable.
  • the phosphorus-based heat stabilizers may be used alone or in combination of two or more.
  • the phosphorus-based heat stabilizer is suitably used in the range of 0.001 to 0.05% by weight based on the aromatic polycarboxylic acid resin.
  • antioxidants commonly known for the purpose of preventing oxidation can be added to the aromatic polycarbonate resin.
  • examples thereof include phenolic antioxidants, and specifically, for example, triethylene glycol-bis (3- (3-tert-butyl-15-methyl-14-hydroxyphenyl) propionate), 6-Hexanediol-bis (3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate, pentaerythritol-tetrakis (3- (3,5-di-tert-butyl-1-hydroxyphenyl) ) Propionate), octadecyl-3_ (3,5-ditert-butyl-4-hydroxyphenyl) propionate, 1,3,5_trimethyl-1,2,4,6_tris (3,5-ditert) -Butyl-4-hydroxybenzyl) benzene, N, N-hexamethylenepis (3,5-zy tert-butyl-4-hydroxy-monohydroc
  • a higher fatty acid ester of a polyhydric alcohol can be added to the aromatic polycarboxylic acid resin if necessary.
  • the higher fatty acid ester is preferably a partial ester or a total ester of a polyhydric alcohol having 2 to 5 carbon atoms and a saturated fatty acid having 10 to 30 carbon atoms.
  • the polyhydric alcohols include glycols, glycerol or Penis Ellis!
  • the higher fatty acid ester is added in the range of 0.005 to 2% by weight, preferably in the range of 0.02 to 0.1% by weight, based on the aromatic poly-carbonate tree JI. Is appropriate. If the amount is less than 0.01% by weight, the above effect cannot be obtained. On the other hand, if the amount exceeds 2% by weight, it is not preferable because it causes stains on the mold surface.
  • Additives such as a coloring agent, an antistatic agent, and a lubricant can be further added to the aromatic polycarbonate resin as long as the transparency is not impaired. Further, other polycarbonate resins and thermoplastic resins can be added in a small proportion as long as the object of the present invention is not impaired.
  • a hard disk in the hard disk substrate of the present invention, can be obtained by forming a metal thin film as a magnetic film on the surface thereof.
  • This metal includes Fe, Co, Cr and the like, and Co 28 Pt 12 Cri. Is suitable.
  • the thin film can be formed by means such as sputtering and vapor deposition. Means for forming these metal thin films can be performed by a method known per se.
  • MFR Fluidity
  • Oligomer content A solution prepared by dissolving 50 mg of a sample in 5 m 1 of Clos-form while using Tosoh's GPC columns TSKg e 1 G2000HXL and T SKg e 1 G3000HXL with eluent flowing at 0.7 m 1 Z min.
  • the retention time of the GPC chart obtained by the method of injecting 201 into the sample was shown as a percentage of the total peak area of the peak area of one component after 19 minutes.
  • Undissolved particles of methylene chloride A solution obtained by dissolving 20 g of the polycarbonate resin in 1 L of methylene chloride is converted into scattered light of latex particles by a laser sensor method using a liquid particle carrier model 1 100 manufactured by Hyattcroico. The conversion method was used.
  • Warp After leaving the hard disk substrate in a constant temperature and humidity machine of 8 O and 85% RH for 1,000 hours, the warpage of the substrate was measured using an LM-1200 optical disk inspection device manufactured by Ono Sokki.
  • the inclination of the substrate was calculated and obtained.
  • the flatness in the circumferential direction was measured at a point 40 mm from the center in the radial direction.
  • DLD-3000 manufactured by Japan II Chem was used for the measurement.
  • the measurement of coarse projections having a height of 25 nm or more was performed as follows.
  • the specific viscosity of this polymer was 0.284, the oligomer content was 2.4%, the chlorine content was 1.3 ppm, 146 was 146, and MFR was 80 gZ for 10 minutes.
  • the water absorption was 0.15% by weight.
  • To this polymer was added 0.03% of tris (nonylphenyl) phosphate, 0.005% of trimethyl phosphate, and 0.004% of monoglyceride stearate, and the mixture was pelletized using a Sumitomo Heavy Industries DI SK5M111, 90 ⁇ , 1.2 It was injection molded into a disk having a thickness of mm.
  • the undissolved particles of methylene chloride were 10,000 Zg at 0.5 / am or more, and 90 / g at 1 m or more.
  • Example 2 The 1,1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane of Example 1 was added to 23'.4 parts, 4,4,1- (m-phenylenedisopropylidene). 88.2 parts of a polymer having a molar ratio of bisphenol TMC to bisphenol M of 30:70 was obtained in the same manner as in Example 1 except that the diphenol was changed to 60.9 parts (yield). 97%). The specific viscosity of this polymer was 0.291, the oligomer content was 2.7%, the chlorine content was 1.5 ppm, and the temperature was 132 ° (: MFI ⁇ 3 ⁇ 493 g / 10 min. 0.13% by weight.
  • This polymer was molded in the same manner as in Example 1 and evaluated in the same manner as in Example 1.
  • the undissolved particles of the methylene chloride salt were 10,000 Zg for 0.5 m or more and 80 Zg for 1 m or more. / g.
  • the flexural modulus is 2,850 MPa
  • the linear expansion coefficient is 6.1 X 10-5 deg- 1
  • the specific gravity is 1.13
  • the warpage is 0.10 mm
  • the surface roughness (Ra) is It was 0.88 nm.
  • the flatness was 6 m. No coarse protrusions with a height of 25 nm or more were present on the surface on which the magnetic film was formed.
  • 1,1_bis (4-hydroxyphenyl) 13,3,5-trimethylcyclohexane of Example 1 54.7 parts, 4,4,-(m-phenylenediisopropylidene) diphenol was carried out in the same manner as in Example 1 except that the ratio of bisphenol TM C to bisphenol M was 70:30 in a molar ratio of 70:30. Obtained.
  • the specific viscosity of this polymer was 0.286, the oligomer content was 2.8%, the chlorine content was 1.5 ppm, the temperature was 155 ° ⁇ 0, and the MFR was 66 g / 10 min. The water absorption was 0.16% by weight.
  • the number of undissolved methylene chloride particles was 10,000 particles / g at 0.5 m or more and 85 particles / g at 1 m or more.
  • the flatness was 5. No coarse protrusions with a height of 25 nm or more were present on the magnetic film formation surface.
  • Substrate molding and evaluation were performed in the same manner as in Example 1 except that the polymer solution of Example 1 was used and granulation was performed using a binder without a separation chamber having a foreign substance outlet at the bearing portion.
  • the number of undissolved methylene particles was as large as 86,00 Oiei / g for 0.5 111 or more and 2,700 Zg for 1.0 m or more.
  • the surface roughness (Ra) was 9.5 nm on the surface on which the magnetic film was formed, which was unsuitable for a hard disk substrate.
  • a hard disk substrate formed of a resin having excellent physical properties can be obtained, and thus is suitably used as a hard disk, particularly a video hard disk.

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Abstract

Substrates for hard disks, characterized by being substantially made of a thermoplastic resin having (A) a specific gravity of 0.95 to 1.25 and (B) a flexural modulus of 2,200 to 3,500 MPa; and hard disks produced by forming a magnetic film on the surface of the substrate. In particular, a substrate for hard disks, characterized by being substantially made of an aromatic polycarbonate resin in which 1,1-bis(4-hydroxy- phenyl)-3,3,5-trimethylcyclohexane accounts for at least 30 mole % of the whole aromatic dihydroxyl component and which satisfies the requirements (A') and (B'): (A') a solution of 0.7 g of the resin in 100 ml of methylene chloride exhibits a specific viscosity ranging from 0.2 to 0.5 at 20°C and (B') the water absorption as defined in the description is 0.18 wt% or below; and hard disks produced by using the substrate. This invention provides substrates for hard disks which are made of thermoplastic resins, particularly a polycarbonate resin having a specific structure, and are excellent in physical characteristics, and hard disks produced by using the substrates.

Description

ハードディスク基板およびハ一ドディスク  Hard disk board and hard disk
発明の詳細な説明 Detailed description of the invention
本発明は、 ハードディスク基板に関する。 さらに詳しくは、 磁気ディスクおよ びデジタルビデオディスク等の磁気記録媒体用途に適した熱可塑性樹脂より形成 された基板に関する。 特に本発明は、 記録容量が極めて大きいデジタルビデオデ 明  The present invention relates to a hard disk substrate. More specifically, the present invention relates to a substrate formed of a thermoplastic resin suitable for magnetic recording media such as magnetic disks and digital video disks. In particular, the present invention relates to a digital video device having an extremely large recording capacity.
イスクに適し且つ熱可塑性樹脂より形成されたハードディスク基板およびその基 田 Hard disk substrate suitable for disk and formed of thermoplastic resin, and base thereof
板を使用したハードディスクに関する。 Related to hard disks using boards.
従来の技術 Conventional technology
従来、 ハードディスク用基板に使用される代表的な素材としては、 ガラスおよ びアルミ二ゥムが知られており、 剛直性および平滑性を有することからハ一ドデ イスクの基板の素材としても広く用いられている。 しかしながら、 ピットおよび グループの成形が出来ないという欠点があり、 この改善が求められている。 またピットおよびグループの成形により記録密度を高めるためには、 より転写 性のよい樹脂が求められている。 また一方では反りが少なく耐久性のよい樹脂も 求められているが、 これらの要求を満足するハードディスク用基板はまだない。 一方、 米国特許第 5 6 3 3 0 6 0号 (特開平 8— 2 9 3 1 2 8号公報) には、 特定構造のジヒドロキシジフエ二ルアルカンおよびそれからの新規な芳香族ポリ カーボネートについて記載されている。 この公報に開示されている樹 組成は、  Conventionally, glass and aluminum have been known as typical materials used for hard disk substrates, and since they have rigidity and smoothness, they are also used as materials for hard disk substrates. Widely used. However, there is a drawback that pits and groups cannot be formed, and this improvement is required. In order to increase the recording density by forming pits and groups, a resin having better transferability is required. On the other hand, there is also a demand for a resin having low warpage and good durability, but there is still no hard disk substrate that satisfies these requirements. On the other hand, U.S. Pat. No. 5,633,600 (Japanese Patent Application Laid-Open No. 8-293218) describes a dihydroxydiphenylalkane having a specific structure and a novel aromatic polycarbonate derived therefrom. ing. The tree composition disclosed in this publication is
( a) 1 , 1一ビス (4—ヒドロキシフエニル) 一 3, 3, 5 _トリメチルシク 口へキサン (成分 a) および、 (a) 1,1,1-bis (4-hydroxyphenyl) -1,3,3,5-trimethylcyclium hexane (component a) and
( b ) 4, 4, 一 (m—フエ二レンジイソプロピリデン) ジフエノールおよび Z または 2, 2—ビス (3—メチル一4—ヒドロキシフエニル) プロパン (成分 b ) を全芳香族ジヒドロキシ成分の少なくとも 8 0モル%とし、 且つ成分 aと成 分 bの割合がモル比で 2 0 : 8 0〜8 0 : 2 0である。 上記明細書には、 得られた前記芳香族ポリ力一ポネートは、 複屈折率が小さく、 反りも小さい光ディスク基板を提供し、 記憶容量が極めて大きい光ディスクに適 することが記載されている。 (b) 4,4,1- (m-phenylenediisopropylidene) diphenol and Z or 2,2-bis (3-methyl-14-hydroxyphenyl) propane (component b) as at least one of the wholly aromatic dihydroxy components 80 mol%, and the ratio of component a to component b is 20:80 to 80:20 in molar ratio. In the above specification, it is described that the obtained aromatic polycarbonate provides an optical disk substrate having a small birefringence and a small warpage and is suitable for an optical disk having an extremely large storage capacity.
一方、 特開平 5— 6 5 3 5号公報には、 ポリ力一ポネート樹脂およびアクリル 樹脂を使用したハードディスク用のプラスチック基板に付いて記載されている。 該樹脂は、 セクタ一およびゾーンビット信号を金型よりの成形することを可能に する。  On the other hand, Japanese Patent Application Laid-Open No. Hei 5-65535 describes a plastic substrate for a hard disk using a polycarbonate resin and an acrylic resin. The resin allows sector one and zone bit signals to be molded from a mold.
さらに、 特開平 7— 1 5 3 0 6 0号公報には、 熱可塑性ノルポルネン樹脂を使 用したハードディスク用のプラスチック基板に付いて記載されている。 該榭脂は、 吸湿性が低く、 すなわち形状変化の小さい、 また、 共振周波数の高いすなわちサ ーポマークの読み取りが容易な、 従って、 より高密度の記録を可能にする。  Further, Japanese Patent Application Laid-Open No. 7-150630 describes a plastic substrate for a hard disk using a thermoplastic norpolenene resin. The resin has low hygroscopicity, that is, a small change in shape, and has a high resonance frequency, that is, easy to read a radio mark, and thus enables higher density recording.
しかしノルポルネン樹脂から形成された基板は、 物理的強度、 殊に曲げ弾性率 が不充分であり、 そのためディスク基板は比較的厚くすることが要求される。 こ のためこの樹脂を使用した基板は、 樹脂を使用した軽量化のメリットが充分に発 揮されたものではない。 発明が解決しょうとする課題  However, a substrate formed of norpolenene resin has insufficient physical strength, particularly a flexural modulus, and therefore requires a relatively thick disk substrate. For this reason, a substrate using this resin does not sufficiently exhibit the advantage of weight reduction using the resin. Problems to be solved by the invention
本発明の第 1の目的は、 物理的強度、 殊に曲げ弾性率および比重がノ、一ドディ スク基板として適した一定水準を有する軽量の樹脂基板を提供することにある。 本発明の第 2の目的は、 他の物性、 例えば線膨張係数、 水率が八一ドデイス ク基板として適した値を有する樹脂基板を提供することにある。  A first object of the present invention is to provide a lightweight resin substrate having a certain level of physical strength, particularly a flexural modulus and specific gravity, which is suitable for a single-disk substrate. A second object of the present invention is to provide a resin substrate having other physical properties such as a coefficient of linear expansion and a water content suitable for an 81-disk substrate.
本発明の第 3の目的は、 ハードディスク基板における磁性膜形成面の平面性お よび平滑性が優れた樹脂基板を提供することにある。  A third object of the present invention is to provide a resin substrate having excellent flatness and smoothness of a magnetic film forming surface on a hard disk substrate.
本発明の他の目的は、 前記種々の特性を発現しうる芳香族ポリカーボネート榭 脂より形成されたハードディスク基板を提供することにある。  Another object of the present invention is to provide a hard disk substrate formed of an aromatic polycarbonate resin capable of exhibiting the various characteristics described above.
本発明のさらに他の目的は、 高密度の記録容量を有するハードディスク基板、 殊にビデオ用ハ一ドディスク基板等に適した高機能を有し、 且つ溶融形成容易な ハ一ドディスク基板を提供することにある。 課題を解決するための手段 Still another object of the present invention is to provide a hard disk substrate having a high density and a high function suitable for a hard disk substrate for video, particularly a video hard disk substrate, etc., and easily formed by melting. Is to do. Means for solving the problem
本発明者らの研究によれば、 熱可塑性樹脂より実質的に形成され、 該樹脂は According to the study of the present inventors, it is formed substantially from a thermoplastic resin,
(A) 比重が 0 . 9 5〜1 . 2 5であり、 且つ (B) 曲げ弾性率が 2 , 2 0 0〜 3, 5 0 O MP aを満足する樹脂により形成されていることを特徴とするハード ディスク基板およびその基板の表面に磁性膜を形成させたハードディスクが提供 される。 (A) It is characterized by being formed of a resin having a specific gravity of 0.95 to 1.25 and (B) a flexural modulus of 2,200 to 3,500 OMPa. And a hard disk having a magnetic film formed on the surface of the substrate.
本発明のハードディスク基板は (A) 比重が 0 . 9 5〜1 . 2 5、 好ましくは 1 . 0〜1 . 1 5であり且つ曲げ弾性率が 2, 2 0 0〜3, 5 0 0 M P a、 好ま しくは 2, 3 0 0〜3 , 4 0 O MP a、 特に好ましくは 2 , 4 0 0〜3 , 0 0 0 MP aの物性を有する熱可塑性樹脂より形成されている。  The hard disk substrate of the present invention (A) has a specific gravity of 0.95 to 1.25, preferably 1.0 to 1.15, and a flexural modulus of 2,200 to 3,500 MP. a, preferably a thermoplastic resin having physical properties of 2,300 to 3,400 MPa, particularly preferably 2,400 to 3,0 MPa.
かかる物性は、 従来の熱可塑性ノルポルネン樹脂や、 ビスフエノール Aからの ポリ力一ポネ一ト樹脂では達成されない値であり、 後述するようにハードディス ク基板の物性として価値ある値である。  Such physical properties are values that cannot be achieved by conventional thermoplastic norpolene resin or polyphenol resin from bisphenol A, and are valuable values as physical properties of the hard disk substrate as described later.
本発明によれば、 前記物性と共に磁性膜形成面における表面特性が優れたハ一 ドディスク基板が提供される。 すなわち、 磁性膜形成面は、 表面が平滑性に優れ、 しかも平面性 (平坦性) にも優れている。 ハードディスク基板の磁性膜形成面に おいて中心線平均粗さ (R a) は、 2 nm以下、 好ましくは 1 nm以下である。 またハードディスク基板の磁性膜形成面において、 円周方向の平面度が 1 O m 以下、 好ましくは 7 m以下である。 このような平滑性および平面性を有する基 板の表面に対して磁性膜を形成させることによって、 ハードディスクへの情報の + 記録化および読み取りの操作においていずれも支障なく、 高度の信頼性を有する ハードディスクが得られる。  According to the present invention, there is provided a hard disk substrate having excellent physical properties as well as surface characteristics on a magnetic film forming surface. That is, the surface on which the magnetic film is formed has excellent smoothness and excellent flatness (flatness). The center line average roughness (Ra) on the magnetic film forming surface of the hard disk substrate is 2 nm or less, preferably 1 nm or less. The flatness in the circumferential direction of the magnetic film forming surface of the hard disk substrate is 1 Om or less, preferably 7 m or less. By forming a magnetic film on the surface of the substrate having such smoothness and flatness, the hard disk has a high degree of reliability without any trouble in the operation of recording and reading information on the hard disk. Is obtained.
また本発明のハードディスク基板は、 磁性膜形成面において、 高さが 2 5 nm 以上の粗大突起が実質的に存在しないものが肝要である。 そのためには後述する ように樹脂中に大きい未溶解粒子が混入しないようにするかあるいはフィルター で大きな粒子を除去することが必要である。  It is important that the hard disk substrate of the present invention has substantially no coarse projections having a height of 25 nm or more on the surface on which the magnetic film is formed. For that purpose, as described later, it is necessary to prevent large undissolved particles from being mixed in the resin or to remove large particles with a filter.
本発明のハードディスク基板は、 好ましい態様として、 線膨張係数および吸水 率にも優れた物性を有している。 すなわち、 線膨張係数は 6. 5X 10"5d e g—1以下、 好ましくは 5. 5〜6. 3 X 10— 5d e g—1である。 また吸水率は 0. 18重量%以下、 好ましくは 0. 17重量%以下、 特に好ましくは 0. 15 重量%以下である。 線膨張係数および吸水率が前記範囲以下を満足することによ り、 熱や温度に対して基板の変形や反りが極めて少なくなり、 ハードディスクの 信頼性を高めることになる。 The hard disk substrate of the present invention preferably has a linear expansion coefficient and water absorption It also has excellent physical properties. That is, the linear expansion coefficient 6. 5X 10 "5 deg- 1 or less, preferably 5. 5~6. 3 X 10- 5 deg- 1. The water absorption is 0.18 wt% or less, preferably 0 17% by weight or less, particularly preferably 0.15% by weight or less When the coefficient of linear expansion and water absorption satisfy the above ranges, deformation and warping of the substrate with respect to heat and temperature are extremely small. This increases the reliability of the hard disk.
本発明のハードディスク基板を形成する樹脂は、 その製造過程により塩素を含 有していることがある。 この塩素の含有量が多いと成形金型が腐蝕したり、 樹脂 の熱安定性が低下したり、 またハードディスクの磁性膜の腐蝕が起こつたりする ので望ましくない。 従つて、 塩素の含量は 10 p p m以下、 好ましくは 7 p p m 以下、 特に好ましくは 5 ppm以下であるのが推奨される。 ここで云う塩素含量 とは、 樹脂を三菱ィ匕学製全有機ハロゲン分析装置 TOX10型を用いて燃焼法に より測定された値を意味する。  The resin forming the hard disk substrate of the present invention may contain chlorine depending on the manufacturing process. If the chlorine content is high, the molding die is corroded, the thermal stability of the resin is reduced, and the magnetic film of the hard disk is corroded, which is not desirable. It is therefore recommended that the chlorine content be less than 10 ppm, preferably less than 7 ppm, particularly preferably less than 5 ppm. The term "chlorine content" as used herein means a value obtained by measuring the resin by a combustion method using a total organic halogen analyzer TOX10 manufactured by Mitsubishi Iridaku.
前記した基板としての物性を達成する樹脂としては、 芳香族ポリカーボネート 樹脂が挙げられる。  Examples of the resin that achieves the physical properties of the above-mentioned substrate include an aromatic polycarbonate resin.
すなわち、 かかる芳香族ポリ力一ポネート樹脂として、 全芳香族ジヒドロキシ 成分の少なくとも 30%が 1, 1 -ビス (4—ヒドロキシフエニル) 一 3, 3, 5—トリメチルシクロへキサンである芳香族ポリカーポネ一ト樹脂が挙げられる。 前記芳香族ポリ力一ポネート樹脂を形成する芳香族ジヒドロキシ成分としての 1, 1_ビス (ヒドロキシフエニル) —3, 3, 5—トリメチルシクロへキサン (ビスフエノール TMC) およびそれからの芳香族ポリ力一ポネート樹脂は、 米 国特許第 4, 982, 014号 (特開平 2— 88634号公報) により公知であ る。 この公報に開示された代表例は、 ビスフエノール TMCを全ジヒドロキシ成 分の 100〜 2モル%使用した芳香族ポリカーボネートであり、 具体的にはビス フエノール TMCを 100〜30モル%の割合で使用したホモ ·またはコ ·ポリ カーボネートである。  That is, as such an aromatic polycarboxylic acid resin, an aromatic polycarbonate resin in which at least 30% of a wholly aromatic dihydroxy component is 1,1-bis (4-hydroxyphenyl) -1,3,3,5-trimethylcyclohexane. Resin. 1,1-bis (hydroxyphenyl) -3,3,5-trimethylcyclohexane (bisphenol TMC) as aromatic dihydroxy component forming aromatic resin and aromatic poly force from it One-ponate resin is known from US Pat. No. 4,982,014 (JP-A-2-88634). A representative example disclosed in this publication is an aromatic polycarbonate using bisphenol TMC in an amount of 100 to 2 mol% of the total dihydroxy component. Specifically, bisphenol TMC was used in an amount of 100 to 30 mol%. It is a homo- or co-polycarbonate.
上記公報には、 得られた芳香族ポリ力一ポネ一ト樹脂の利点および用途として、 従来のポリカーボネート樹脂に対して高い耐熱性において優れ、 例えば電気分野、 被覆および透明板ガラスの分野に使用されることが記載されている。 また光ディ スクの用途としてビスフエノール A 6 5モル%およびビスフエノール TM C 3 5 モル%のポリ力一ポネート樹脂が記載されているが、 この樹脂は、 従来のビスフ ェノール Aからの樹脂に比べて耐熱性が改良されていることを示しているに過ぎ ない。 また前記公報には、 得られた芳香族ポリカーボネート删 をハードデイス ク基板へ利用することについて何らの示唆もない。 According to the above publication, the advantages and applications of the aromatic resin obtained are excellent in high heat resistance compared to conventional polycarbonate resins. It is described for use in the field of coating and glazing. The use of optical discs is described as a polyphenol resin of 65 mol% of bisphenol A and 55 mol% of bisphenol TM C, but this resin is compared with the conventional resin from bisphenol A. It just shows that the heat resistance has been improved. Further, the above publication has no suggestion to use the obtained aromatic polycarbonate for a hard disk substrate.
本発明者の研究によればビスフエノール TM C単独からの芳香族ポリカーポネ —ト樹脂は、 ハードディスク基板としては不適当であることが判った。 また、 前 記公報に記載された具体的な共重合体、 つまりビスフエノール TMCとビスフエ ノ一ル Aとからの共重合体ポリ力一ポネート樹脂も、 共重合割合に関係なく同様 にハ一ドディスク基板としては、 ビスフエノ一ル Aからの従来のポリ力一ポネー ト樹脂基板に比べて、 耐熱性が改良されていること以外、 特に優れているものと は云えないことが判った。  According to the study of the present inventor, it has been found that aromatic polycarbonate resin from bisphenol TM C alone is not suitable as a hard disk substrate. Further, the specific copolymer described in the above-mentioned publication, that is, a copolymer polystyrene resin from bisphenol TMC and bisphenol A is similarly hardened regardless of the copolymerization ratio. It was found that the disk substrate was not particularly excellent as compared with the conventional poly-polycarbonate resin substrate from bisphenol A, except that it had improved heat resistance.
ところが本発明者の研究によれば、 ビスフエノール TM Cに対して特定の末端 改質剤を使用するか、 および/または特定構造のジヒドロキシ化合物を一定割合 共重合することによって得られた芳香族ポリ力一ポネ一ト樹脂は、 曲げ弾性率が 高く、 線膨張係数が低く、 比重が低く、 吸水率が極めて小さく、 ハードディスク 基板として反りが少ない基板が得られることが見出された。  However, according to the study of the present inventors, it has been found that aromatic polystyrene obtained by using a specific terminal modifier for bisphenol TM C and / or copolymerizing a certain proportion of a dihydroxy compound having a specific structure is used. It has been found that the force component resin has a high flexural modulus, a low coefficient of linear expansion, a low specific gravity, an extremely low water absorption, and a substrate having a small warpage as a hard disk substrate.
以下前記芳香族ポリ力一ポネ一ト樹脂について説明する。 本発明のハードディ スク基板の素材として有利に使用される芳香族ポリカーボネート樹脂は、 下記式 で表される 1, 1—ビス ( 4—ヒドロキシフエニル) —3, 3, 5—卜リメチル シクロへキサン (ビスフエノール TMC) が全芳香族ジヒドロキシ成分当り、 少 なくとも 3 0モル%の割合で構成されたポリカーボネート樹脂である。  Hereinafter, the aromatic polystyrene resin will be described. The aromatic polycarbonate resin advantageously used as the material of the hard disk substrate of the present invention is 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane represented by the following formula: (Bisphenol TMC) is a polycarbonate resin composed of at least 30 mol% based on the total aromatic dihydroxy component.
Figure imgf000007_0001
.この芳香族ポリカーボネート樹脂は、 前記ビスフエノール TM Cを全芳香族ジ ヒドロキシ成分の少なくとも 3 0モル%、 好ましくは少なくとも 4 0モル%使用 している。 このビスフエノール TMCの割合が 3 0モル%未満の場合、 得られた ハードディズク基板またはハードディスクは、 耐熱性、 機械的物性、 吸水率、 転 写性あるいは反りあるいは表面特性のいずれかの性質が不満足となり、 これら特 性を満足するハ一ドディスク基板またはハードディスクは得られない。 ビスフエ ノール TMCは、 1 0 0モル%でもよいが吸水率が高くなるまたは流動性が悪く なる傾向になるので、 ビスフエノール TM Cの割合がこのように高い場合には、 後述するように特定の末端改質剤で末端を変性することが望ましい。
Figure imgf000007_0001
The aromatic polycarbonate resin uses the bisphenol TM C in an amount of at least 30 mol%, preferably at least 40 mol%, of the total aromatic dihydroxy component. When the ratio of this bisphenol TMC is less than 30 mol%, the obtained hard disk substrate or hard disk is unsatisfactory in any of heat resistance, mechanical properties, water absorption, transferability or warpage or surface properties. Thus, a hard disk substrate or a hard disk satisfying these characteristics cannot be obtained. Bisphenol TMC may be 100 mol%, but it tends to have a high water absorption or poor fluidity. Therefore, when bisphenol TMC is in such a high proportion, a specific amount of bisphenol TMC will be used as described later. It is desirable to modify the terminal with a terminal modifier.
前記芳香族ポリカーボネート樹脂は、 芳香族ジヒドロキシ成分として前記ビス フエノール TMCを一定割合使用することが必要であり、 所望の特性、 殊に吸水 率を 0 . 1 8重量%以下とするために、 大別して 2つの手段が採用される。 その 1つは、 前記ビスフエノール TMCに対して特定のジヒドロキシ成分を組 合わせて共重合ポリカーボネート樹脂とすることであり、 他の手段は末端基に或 る特定構造の末端改質剤を導入することである。 これら 2つの手段はそれぞれ単 独でもよく、 また組合わせてもよい。  In the aromatic polycarbonate resin, it is necessary to use the bisphenol TMC as an aromatic dihydroxy component in a certain ratio, and the aromatic polycarbonate resin is roughly classified to have desired characteristics, particularly, a water absorption of 0.18% by weight or less. Two means are employed. One is to combine a specific dihydroxy component with the bisphenol TMC to form a copolymerized polycarbonate resin, and the other means is to introduce a terminal modifier having a specific structure into the terminal group. It is. These two means may be used alone or in combination.
' 前記芳香族ポリカーボネート樹脂は、 それを構成する全芳香族ジヒドロキシ成 分中のビスフエノール TMCの割合が 3 0〜7 0モル%の範囲であるが好ましぐ 4 0〜6 0モル%の範囲であるのが特に好ましい。 ′ The aromatic polycarbonate resin has a bisphenol TMC ratio of 30 to 70 mol% in a wholly aromatic dihydroxy component constituting the resin, but preferably 40 to 60 mol%. Is particularly preferred.
本発明者の研究によれば、 前記ビスフエノール TM Cに対して、 或る特定のジ ヒドロキシ成分を組合わせて得られた共重合ポリカーボネート榭脂は、 ハードデ イスク基板として特に適していることが見出された。 すなわち、 共重合ポリカー ポネート樹脂は、 (a ) ビスフエノール TM C (これを成分 aという) および ( b ) 4, 4 ' 一 (m—フエ二レンジイソプロピリデン) ジフエノール (以下 "ビスフエノール M" と省略することがある) および Zまたは 2, 2—ビス (3 ーメチルー 4ーヒドロキシフエニル) プロパン (以下 "ビスフエノール C" と省 略することがある) [これらを成分 bという] を全芳香族ジヒドロキシ成分の少 なくとも 9 0モル%とし、 且つ成分 aと成分 bとの割合がモル比で、 3 0 : 7 0 〜7 0 : 3 0、 好ましくは 4 0 : 6 0〜6 0 : 4 0であるポリカーボネ一ト樹脂 はハ一ドディスク基板として特に好ましい。 According to the study of the present inventors, it has been found that a copolymer polycarbonate resin obtained by combining a specific dihydroxy component with the bisphenol TM C is particularly suitable as a hard disk substrate. Was issued. That is, the copolymerized polycarbonate resin comprises (a) bisphenol TM C (this is referred to as component a) and (b) 4,4 ′-(m-phenylenediisopropylidene) diphenol (hereinafter referred to as “bisphenol M”). And Z or 2,2-bis (3-methyl-4-hydroxyphenyl) propane (hereinafter sometimes abbreviated as "bisphenol C") [these are referred to as component b] are wholly aromatic At least 90 mol% of the dihydroxy component, and the ratio of component a to component b is 30:70 Polycarbonate resin having a thickness of up to 70:30, preferably 40:60 to 60:40 is particularly preferred as a hard disk substrate.
前記共重合ポリカーボネート樹脂の好ましい態様の 1つは、 成分 aがビスフエ ノール TM Cであり、 且つ成分 bがビスフエノール Mである組合わせであり、 そ の場合成分 a:成分 bの割合がモル比で、 4 0 : 6 0〜6 0 : 4 0の範囲、 さら には 4 5 : 5 5〜5 5 : 4 5の範囲であるのがー層好ましい。  One preferred embodiment of the copolymerized polycarbonate resin is a combination in which the component a is bisphenol TM C and the component b is bisphenol M, in which case the ratio of the component a to the component b is a molar ratio. It is preferable that the ratio be in the range of 40:60 to 60:40, and more preferably in the range of 45:55 to 55:45.
前記芳香族ポリ力一ポネート榭脂において、 成分 aおよび成分 bが全芳香族ジ ヒドロキシ成分の少なくとも 9 0モル%、 好ましくは少なくとも 9 5モル%を占 めることが望ましいが、 他のジヒドロキシ成分 (成分 C) を全芳香族ジヒドロキ シ成分当り 1 0モル%以下、 好ましくは 5モル%以下含有していても特に差支え ない。  It is desirable that the component (a) and the component (b) occupy at least 90 mol%, preferably at least 95 mol%, of the total aromatic dihydroxy component in the aromatic polysiloxane resin. (Component C) may be contained in an amount of 10 mol% or less, preferably 5 mol% or less, based on the total aromatic dihydroxy component.
かかる成分 Cとしては、 通常芳香族ポリカーボネートのジヒドロキシ成分とし て使用されている、 成分 aおよび成分 b以外の成分であればよく、 たとえばハイ ドロキノン、 レゾルシノール、 , 4, ービフエノール、 1 , 1一ビス ( 4ーヒ ドロキシフエニル) ェタン、 2, 2—ビス ( 4ーヒドロキシフエニル) プロパン、 2 , 2 -ビス ( 4—ヒドロキシフエニル) ブタン、 1 , 1一ビス (4—ヒドロキ シフエニル) 一 1一フエニルェタン、 1 , 1一ビス (4ーヒドロキシフエニル) シクロへキサン、 2, 2—ビス ( 4ーヒドロキシフエニル) ペンタン、 4, 4, 一 ( p—フエ二レンジイソプロピリデン) ジフエノール、 9, 9一ビス ( 4—ヒ ドロキシフエニル) フルオレン、 1 , 1一ビス (4—ヒドロキシフエニル) 一4 ハードディスク基板として用いることができる前記芳香族ポリカーポネ一ト樹 脂は、 通常の芳香族ポリ力一ポネート榭脂を製造するそれ自体公知の反応手段、 例えば芳香族ジヒドロキシ成分にホスゲンや炭酸ジエステル等のカーポネ一ト前 駆物質を反応させる方法により製造される。 次にこれらの製造方法について基本 的な手段を簡単に説明する。  The component C may be any component other than the component a and the component b, which are usually used as the dihydroxy component of the aromatic polycarbonate, such as hydroquinone, resorcinol,, 4, -biphenol, 1,1-bis ( 4-Hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxyphenyl) butane, 1,1-bis (4-hydroxyphenyl) 1-1-phenylethane 1,1,1-bis (4-hydroxyphenyl) cyclohexane, 2,2-bis (4-hydroxyphenyl) pentane, 4,4,1- (p-phenylenediisopropylidene) diphenol, 9,9 1-bis (4-hydroxyphenyl) fluorene, 1,1-bis (4-hydroxyphenyl) -14 before it can be used as a hard disk substrate The aromatic polycarbonate resin is a reaction means known per se for producing a normal aromatic polycarbonate resin, for example, by reacting an aromatic dihydroxy component with a carbonate precursor such as phosgene or carbonic acid diester. It is manufactured by a method. Next, the basic means of these manufacturing methods will be briefly described.
力一ポネート前駆物質として例えばホスゲンを使用する反応では、 通常酸結合 剤および溶媒の存在下に反応を行う。 酸結合剤としては例えば水酸化ナトリゥム、 水酸化力リゥム等のアル力リ金属水酸化物またはピリジン等のアミン化合物が用 いられる。 溶媒としては例えば塩化メチレン、 クロ口ベンゼン等のハロゲン化炭 化水素が用いられる。 また反応促進のために例えば第三級ァミンまたは第四級ァ ンモニゥム塩等の触媒を用いることもできる。 その際、 反応温度は通常 0〜4 0 °Cであり、 反応時間は数分〜 5時間である。 ' In a reaction using, for example, phosgene as a forceponate precursor, the reaction is usually performed in the presence of an acid binder and a solvent. Examples of the acid binder include sodium hydroxide, Alkali metal hydroxides such as hydroxylated lime or amine compounds such as pyridine are used. As the solvent, for example, a halogenated hydrocarbon such as methylene chloride or chlorobenzene is used. Further, a catalyst such as a tertiary amine or a quaternary ammonium salt can be used to promote the reaction. At that time, the reaction temperature is usually 0 to 40 ° C, and the reaction time is several minutes to 5 hours. '
力一ポネ一ト前駆物質として炭酸ジエステルを用いるエステル交換反応は、 不 活性ガス雰囲気下所定割合の芳香族ジヒドロキシ成分を炭酸ジエステルと加熱し ながら攪拌して、 生成するアルコールまたはフエノール類を留出させる方法によ り行われる。 反応温度は生成するアルコールまたはフエノール類の沸点等により 異なるが、 通常 1 2 0〜3 3 0 °Cの範囲である。 反応はその初期から減圧にして 生成するアルコールまたはフエノール類を留出させながら反応を完結させる。 ま た反応を促進するために通常エステル交換反応に使用される触媒を使用すること もできる。 前記エステル交換反応に使用される炭酸ジエステルとしては、 例えば ジフエ二ルカーポネート、 ジナフチルカーボネート、 ビス (ジフエニル) カーボ ネート、 ジメチルカ一ポネート、 ジェチルカーポネート、 ジブチルカーボネート 等が挙げられる。 これらのうち特にジフエ二ルカ一ポネ一トが好ましい。 · 本発明の芳香族ポリカーボネート測旨は、 前途したように芳香族ジヒドロキシ 成分として、 ビスフエノ—ル TM Cあるいはビスフエノ一ル TM Cと他の芳香族 ジヒドロキシ成分との混合物を使用し、 それ自体公知のポリカーボネート形成の 反応に従つて製造することができる。  In the transesterification reaction using carbonic acid diester as a force component precursor, a predetermined ratio of an aromatic dihydroxy component is stirred with carbonic acid diester while heating under an inert gas atmosphere to distill off the generated alcohol or phenols. It is done by the method of making it. The reaction temperature varies depending on the boiling point of the alcohol or phenols to be formed, but is usually in the range of 120 to 330 ° C. The reaction is completed under reduced pressure from the beginning while distilling off the alcohol or phenols formed. Further, a catalyst usually used in a transesterification reaction to promote the reaction can also be used. Examples of the carbonic acid diester used in the transesterification reaction include diphenyl carbonate, dinaphthyl carbonate, bis (diphenyl) carbonate, dimethyl carbonate, getyl carbonate, dibutyl carbonate and the like. Of these, diphenyl alcohol is particularly preferred. · The aromatic polycarbonate of the present invention uses bisphenol TM C or a mixture of bisphenol TM C and another aromatic dihydroxy component as the aromatic dihydroxy component as described above, It can be prepared according to the reaction of polycarbonate formation.
その重合反応において、 末端停止剤として通常使用される単官能フェノール類 を使用することができる。 殊に力一ポネート前駆物質としてホスゲンを使用する 反応の場合、 単官能フエノ一ル類は末端停止剤として分子量調節のために一般的 に使用され、 また得られた芳香族ポリカーボネート樹脂は、 末端が単官能フエノ ール類に基づく基によって封鎖されているので、 そうでないものと比べて熱安定 性に優れている。  In the polymerization reaction, monofunctional phenols which are usually used as a terminal terminator can be used. In particular, in the case of reactions using phosgene as the precursor of the monoponate, monofunctional phenols are generally used as a terminator for controlling the molecular weight, and the resulting aromatic polycarbonate resin has Since it is blocked by a group based on monofunctional phenols, it has better thermal stability than those not.
かかる単官能フエノール類としては、 芳香族ポリカーポネ一ト樹脂の末端停止 剤として使用されるものであればよく、 一般にはフェノ一ルぁるいは低級アルキ ル置換フェノ一ルであつて、 下記一般式で表される単官能フエノ一ル類を示す; とができる。
Figure imgf000011_0001
As such monofunctional phenols, any one may be used as long as it is used as a terminal terminator for an aromatic polycarbonate resin. Generally, phenol or lower alkyl is used. A monofunctional phenol represented by the following general formula:
Figure imgf000011_0001
[式中、 Aは水素原子または炭素数 1〜9、 好ましくは 1〜8の脂肪族炭化水 素基を示し、 rは 1〜5、 好ましくは 1〜3の整数を示す。] [In the formula, A represents a hydrogen atom or an aliphatic hydrocarbon group having 1 to 9, preferably 1 to 8 carbon atoms, and r represents an integer of 1 to 5, preferably 1 to 3. ]
前記単官能フエノール類の具体例としては、 例えばフエノール、 p _ t e r t _ ブチルフエノール、 p—クミルフエノールおよびイソォクチルフエノールが挙げ られる。 これら単官能フエノールは、 得られた芳香族ポリカーボネート樹脂の全 末端に対して少なくとも 5モル%、 好ましくは少なくとも 1 0モル%末端に導入 されることが望ましい。 Specific examples of the monofunctional phenols include, for example, phenol, p_tert_butylbutylphenol, p-cumylphenol and isooctylphenol. These monofunctional phenols are desirably introduced into at least 5 mol%, preferably at least 10 mol%, of the terminals of the obtained aromatic polycarbonate resin.
長鎖のアルキル基あるいは脂肪族ポリエステル基を置換基として有するフエノ ール類、 または安息香酸クロライド類もしくは長鎖のアルキルカルボン類クロラ ィドを使用して芳香族ポリ力一ポネート樹脂の末端基を封鎖することは前記単官 能フエノ一ル類と同様に末端停止剤または分子量調節剤として機能するのみなら ず、 さらに得られた芳香族ポリカーボネート樹脂の改質にも役立つ。  Using phenols having long-chain alkyl groups or aliphatic polyester groups as substituents, or benzoic acid chlorides or long-chain alkyl carboxylic chlorides to terminate the terminal groups of the aromatic polycarboxylic acid resin. The blocking not only functions as a terminal terminator or a molecular weight regulator as in the case of the above-mentioned monofunctional phenols, but also serves to modify the obtained aromatic polycarbonate resin.
すなわち、 長鎖のアルキル基あるいは脂肪族ポリエステル基を置換基として有 するフエノール類、 または安息香酸クロライド類もしくは長鎖のアルキル力ルポ ン酸クロライド類 (以下これらを、 前記単官能フエノール類と区別するために "末端改質剤" と省略することがある) は、 芳香族ポリ力一ポネート樹脂の末端 に結合することによって、 樹脂の溶融流動性が改良され、 成形加工が容易となる ばかりでなく、 基板としての物性も改良される。 特に樹脂の吸水率を低くする効 果がある。  That is, phenols having a long-chain alkyl group or aliphatic polyester group as a substituent, or benzoic acid chlorides or long-chain alkyl sulfonic acid chlorides (hereinafter, these are distinguished from the monofunctional phenols) Is sometimes abbreviated as "terminal modifier"). By bonding to the terminal of the aromatic polyphenol resin, the melt flowability of the resin is improved and the molding process becomes easier. The physical properties of the substrate are also improved. In particular, it has the effect of lowering the water absorption of the resin.
従って、 ビスフエノール TM Cの割合が全芳香族ジヒドロキシ成分当り 8 0モ ル%以上、 殊に 9 0モル%以上の場合は、 得られた樹脂の吸水率が 0 . 1 8重 量%を超える場合があるが、 このような場合、 前記末端改質剤を使用することに より、 樹脂の吸水率を 0 . 1 8重量%以下に抑えることができる。 前記末端改質 剤は、 当然のことながら単官能性ィ匕合物であるから、 末端停止剤あるいは分子量 調節剤としての機能も有している。 力 る末端改質剤は、 芳香族ポリカーポネ一 ト樹脂の組成によってその割合は一定ではないが、 全末端に対して少なくとも 5 モル%、 好ましくは少なくとも 1 0モル%、 末端に結合するように使用される。 末端改質剤は前記単官能性フエノール類と組合わせて使用することができる。 前 記末端改質剤としては下記一般式 [ I一 a] 〜 [ I一 h] で表される化合物を使 用することができる。 Therefore, when the ratio of bisphenol TM C is at least 80 mol%, especially at least 90 mol%, based on the total aromatic dihydroxy component, the water absorption of the obtained resin exceeds 0.18 wt%. In such a case, in such a case, it is necessary to use the terminal modifier. Thus, the water absorption of the resin can be suppressed to 0.18% by weight or less. Since the terminal modifier is, of course, a monofunctional conjugate, it also has a function as a terminal stopper or a molecular weight regulator. Depending on the composition of the aromatic polycarbonate resin, the proportion of the powerful terminal modifier is not constant, but it is used so as to bind at least 5 mol%, preferably at least 10 mol%, to all terminals. Is done. Terminal modifiers can be used in combination with the monofunctional phenols. As the terminal modifier, compounds represented by the following general formulas [Ia] to [Ih] can be used.
Figure imgf000013_0001
Figure imgf000013_0001
T- -Cじn「H T- -C Ji n "H
...[l-c]  ... [l-c]
[i-g][i-g]
Figure imgf000013_0002
Figure imgf000013_0002
CI-C-CnH2n+1 -t'-h] CI-CC n H 2n + 1 -t'-h]
〔各式中、 Xは一 R—〇一, — R— CO— O—または— R—〇— CO—である、 ここで Rは単結合または炭素数 1〜10、 好ましくは 1〜 5の二価の脂肪族炭化 水素基を示し、 Tは単結合または上記 Xと同様の結合を示し、 nは 10〜50の 整数を示す。 Qはハロゲン原子または炭素数 1〜10、 好ましくは 1〜5の一価 の脂肪族炭化水素基を示し、 pは 0〜4の整数を示し、 Yは炭素数 1〜10、 好 ましくは 1〜5の二価の脂肪族炭化水素基を示し、 W1は水素原子、 -CO-R 一 CO— O— R2または R3である、 ここで R R2および R3は、 それぞれ 炭素数 1〜10、 好ましくは 1〜 5の一価の脂肪族炭化水素基、 炭素数 4〜 8、 好ましくは 5〜 6の一価の脂環族炭化水素基または炭素数 6〜 15、 好ましくは 6〜 12の一価の芳香族炭化水素基を示す。 tは:〜 20、 好ましくは 5〜 10 の整数を示し、 mは 1〜100、 好ましくは 3〜60、 特に好ましくは 4〜50 の整数を示し、 Zは単結合または炭素数 1〜10、 好ましくは 1〜5の二価の脂 肪族炭化水素基を示し、 W2は水素原子、 炭素数 1〜10、 好ましくは 5〜6の 一価の脂肪族炭化水素基、 炭素数 4〜8、 好ましくは 5〜 6の一価の脂環族炭化 水素基または炭素数 6〜15、 好ましくは 1〜 12の一価の芳香族炭化水素基を 示す。] [In each formula, X is one R—〇—, —R—CO—O— or —R—〇—CO—, wherein R is a single bond or a group having 1 to 10, preferably 1 to 5 carbon atoms. T represents a divalent aliphatic hydrocarbon group, T represents a single bond or a bond similar to the above X, and n represents an integer of 10 to 50. Q represents a halogen atom or a monovalent aliphatic hydrocarbon group having 1 to 10, preferably 1 to 5 carbon atoms; p represents an integer of 0 to 4; Y represents 1 to 10 carbon atoms, preferably shows a 1-5 divalent aliphatic hydrocarbon group, W 1 is a hydrogen atom, -CO-R one CO- O-R 2 or R 3, where RR 2 and R 3 are each A monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 8 carbon atoms, preferably 5 to 6 carbon atoms or 6 to 15 carbon atoms, preferably Represents a monovalent aromatic hydrocarbon group of 6 to 12. t represents an integer of ~ 20, preferably 5-10, m represents an integer of 1-100, preferably 3-60, particularly preferably 4-50, Z represents a single bond or carbon number 1-10, It preferably represents a divalent aliphatic hydrocarbon group having 1 to 5; W 2 represents a hydrogen atom; a monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, preferably 5 to 6 carbon atoms; And preferably a monovalent alicyclic hydrocarbon group of 5 to 6 or a monovalent aromatic hydrocarbon group of 6 to 15, preferably 1 to 12 carbon atoms. ]
前記した末端改質剤 [I一 a] 〜 [I— h] のうち好ましいのは、 [I _a] および [I _b] の置換フエノール類である。 この [I一 a] の置換フエノール 類としては、 nが 10〜30、 特に 10〜26のものが好ましく、 その具体例と しては、 例えばデシルフエノール、 ドデシルフエノ一ル、 テトラデシルフエノ一 ル、 へキサデシルフエノ一ル、 ォク夕デシルフエノ一ル、 エイコシルフェノール、 ドコシルフェノ一ルおよびトリアコンチルフェノ一ル等を挙げることができる。 また、 [I— b] の置換フエノール類としては Xがー R— C〇— 0—であり、 Rが単結合である化合物が適当であり、 nが 10〜30、 特に 10〜26のもの が好適であって、 その具体例としては、 例えばヒドロキシ安息香酸デシル、 ヒド ロキシ安息香酸ドデシル、 ヒドロキシ安息香酸テトラデシル、 ヒドロキシ安息香 酸へキサデシル、 ヒドロキシ安息香酸エイコシル、 ヒドロキシ安息香酸ドコシル およびヒドロキシ安息香酸トリアコンチルが挙げられる。  Among the above terminal modifiers [I-a] to [I-h], preferred are substituted phenols of [I_a] and [I_b]. As the substituted phenols of [Ia], those having n of 10 to 30, particularly preferably 10 to 26 are preferable. Specific examples thereof include decyl phenol, dodecyl phenol and tetradecyl phenol. Hexadecylphenol, octadecylphenol, eicosylphenol, docosylphenol and triacontylphenol. As the substituted phenols represented by [Ib], compounds in which X is -R-C〇-0- and R is a single bond are suitable, and n is 10 to 30, especially 10 to 26. Specific examples thereof include decyl hydroxybenzoate, dodecyl hydroxybenzoate, tetradecyl hydroxybenzoate, hexadecyl hydroxybenzoate, eicosyl hydroxybenzoate, docosyl hydroxybenzoate and tricontyl hydroxybenzoate. No.
前記一般式 [I一 a] 〜 [I— g] で示される置換フエノール類または置換安 息香酸クロライドにおいて置換基の位置は、 p位または o位が一般的に好ましく、 その両者の混合物が好ましい。  In the substituted phenols or substituted benzoyl chlorides represented by the above general formulas [Ia] to [Ig], the position of the substituent is generally preferably the p-position or the o-position, and a mixture of both is preferable. preferable.
前記した末端改質剤のうち [I— a] および [I— b] は特に優れている。 そ の理由は前述したとおり、 これらは芳香族ポリカーボネート樹脂中に末端基とし て導入されると、 その溶融流動性が改善されるばかりでなく、 吸水率を低下させ る効果もあるからである。 芳香族ポリカーボネート樹脂を構成する全芳香族ジヒ ドロキシ成分中のビスフエノール TMCの割合が高く、 例えば 80モル%以上、 特に 90モル%以上の場合には樹脂の吸水性が 0. 18重量%を超える場合があ るが、 そのような場合には前記 [I一 a] および [I一 b] の末端改質剤の使用 により、 0. 18重量%以下に吸水率を低下することが可能である。 しかし本発 明の芳香族ポリ力一ポネート樹脂は、 ビスフエノール TMCの割合が少なくとも 30モル%、 好ましくは少なくとも 40モル%である限り、 前述した末端改質剤 を使用しても良いことは云うまでもない。 [Ia] and [Ib] among the above-mentioned terminal modifiers are particularly excellent. The reason for this, as described above, is that when these are introduced as terminal groups into the aromatic polycarbonate resin, not only the melt fluidity thereof is improved but also the effect of lowering the water absorption is reduced. Wholly aromatic diphenyls constituting the aromatic polycarbonate resin When the ratio of bisphenol TMC in the droxy component is high, for example, 80 mol% or more, especially 90 mol% or more, the water absorption of the resin may exceed 0.18% by weight. It is possible to reduce the water absorption to 0.18% by weight or less by using the terminal modifiers [I-a] and [I-b] described above. However, it is to be noted that the aromatic polysiloxane resin of the present invention may use the above-mentioned terminal modifier as long as the proportion of bisphenol TMC is at least 30 mol%, preferably at least 40 mol%. Not even.
芳香族ポリカーボネート樹脂はその樹脂の 0. 7 gを 10 Omlの塩化メチレ ンに溶解し、 20°Cで測定した比粘度が 0. 2〜0. 5の範囲のものであり、 好 ましくは 0. 25〜0. 4の範囲のものである。 比粘度が 0. 2未満では成形品 が脆くなり、 0. 5より高くなると溶融流動性が悪く、 成形不良を生じ、 ハード ディスクに良好なディスク基板が得られ難くなる。  The aromatic polycarbonate resin is obtained by dissolving 0.7 g of the resin in 10 Oml of methylene chloride and having a specific viscosity measured at 20 ° C. in the range of 0.2 to 0.5. It is in the range of 0.25 to 0.4. If the specific viscosity is less than 0.2, the molded product becomes brittle. If the specific viscosity is higher than 0.5, the melt fluidity is poor and molding failure occurs, and it is difficult to obtain a good disk substrate for a hard disk.
本発明のハードディスク基板は、 前記芳香族ポリカーポネ一ト樹脂を、 例えば 射出成形法、 圧縮成形法、 押出成形法、 溶液キャスティング法等任意の方法で成 形することにより得ることができるが、 本発明のハードディスク基板は射出成形 法により得られたものが好適である。 また本発明のポリ力一ポネート樹脂は、 A STM D— 0570によって測定した吸水率が 0. 18重量%以下、 好ましく は 0. 17重量%以下であることが必要である。 吸水率が 0. 18重量%を超ぇ ると、 ハ一ドディスク基板表面上に金属膜を形成させたハ一ドディスクが吸水に よって反りを生じ易くなり、 トラッキングエラーを起こし易くなるので好ましく ない。 特に好ましい吸水率は 0. 15重量%以下である。  The hard disk substrate of the present invention can be obtained by molding the aromatic polycarbonate resin by any method such as an injection molding method, a compression molding method, an extrusion molding method, and a solution casting method. The hard disk substrate obtained by the injection molding method is preferable. Further, it is necessary that the polyacrylonitrile resin of the present invention has a water absorption of 0.18% by weight or less, preferably 0.17% by weight or less, as measured by ASTM D-0570. When the water absorption exceeds 0.18% by weight, a hard disk having a metal film formed on the surface of the hard disk substrate is liable to be warped by water absorption and to cause a tracking error, which is preferable. Absent. A particularly preferred water absorption is 0.15% by weight or less.
本発明のハードディスク基板は、 曲げ弾性率が 2, 200〜 3, 500MP a、 好ましくは 2, 300〜3, 40 OMP aを有する芳香族ポリカーボネート樹脂 力、ら形成されるのが望ましい。 特に好ましい曲げ弾性率は 2, 400〜3, 00 OMPaである。 曲げ弾性率が 2, 20 OMP aよりも低くなると、 ハードディ スク基板として不適当なものとなる。 一方曲げ弾性率が 3, 40 OMP aを超え る樹脂を得るためには重合度を高くする必要があり、 その場合成形が難しくなる。 また本発明のハードディスク基板は、 線膨張係数が 6. 5X 10— 5d e g一1 以下、 好ましくは 5. 5〜6. 3X 10_5d e g— 1を有する芳香族ポリ力一ボ ネート樹脂より形成されるのが有利である。 線膨張係数が 6. 5X 10— 5d e g一1を超えるポリカーボネート樹脂をハードディスクとして使用すると、 使用 条件によって記録の読み取りに支障を来すことがある。 The hard disk substrate of the present invention is preferably formed from an aromatic polycarbonate resin having a flexural modulus of 2,200 to 3,500 MPa, preferably 2,300 to 3,40 OMPa. Particularly preferred flexural modulus is from 2,400 to 3,000 OMPa. If the flexural modulus is lower than 2,20 OMPa, it becomes unsuitable as a hard disk substrate. On the other hand, to obtain a resin having a flexural modulus exceeding 3,40 OMPa, it is necessary to increase the degree of polymerization, in which case molding becomes difficult. The hard disk substrate of the present invention, the linear expansion coefficient of 6. 5X 10- 5 deg one 1 Hereinafter, it is advantageous to be formed from an aromatic polycarbonate resin having preferably 5.5 to 6.3 × 10 5 deg- 1 . If the linear expansion coefficient is to use a polycarbonate resin of greater than 6. 5X 10- 5 deg one 1 as a hard disk, which may hinder the reading of the recording by the use condition.
本発明のハードディスク基板に使用される芳香族ポリカーポネ一ト樹脂は、 そ の比重が 0. 95〜1. 25、 好ましくは 1. 0〜1. 15のものが有利に使用 される。 この範囲の比重を有する樹脂は、 軽量であり、 ディスクの作動、 操作に おける負荷が少なくなりそれ自体価値を有する。  As the aromatic polycarbonate resin used for the hard disk substrate of the present invention, those having a specific gravity of 0.95 to 1.25, preferably 1.0 to 1.15 are advantageously used. Resins having a specific gravity in this range are light in weight and have little value in the operation and operation of the disk, and thus have value in themselves.
芳香族ポリカーポネ一ト樹脂は、 カーポネ一ト前駆物質としてホスゲンを使用 し、 また溶媒として塩化メチレン等の塩素系溶媒を使用して製造した場合、 塩素 が少なからず残存している。 この塩素の含有量が多いと成形金型が腐蝕したり、 芳香族ポリカーボネート樹脂の熱安定性が低下したり、 またハードディスクの磁 性膜の腐蝕が起こったりするので望ましくない。 従って、 塩素の含量は 10 p p m以下、 好ましくは 7ppm以下、 特に好ましくは 5 p pm以下であるのが推奨 される。 ここで云う塩素含量とは、 芳香族ポリカーボネート樹脂を三菱化学製全 有機八ロゲン分析装置 TOX 10型を用いて燃焼法により測定された値を意味す る。  When an aromatic polycarbonate resin is produced using phosgene as a carbonate precursor and using a chlorine-based solvent such as methylene chloride as a solvent, a considerable amount of chlorine remains. If the chlorine content is large, the mold is corroded, the thermal stability of the aromatic polycarbonate resin is reduced, and the magnetic film of the hard disk is corroded, which is not desirable. It is therefore recommended that the chlorine content be less than 10 ppm, preferably less than 7 ppm, particularly preferably less than 5 ppm. The chlorine content as referred to herein means a value obtained by measuring the aromatic polycarbonate resin by a combustion method using a total organic octogen analyzer TOX10 manufactured by Mitsubishi Chemical Corporation.
ハードディスク基板は、 オリゴマー含量が 10%以下、 好ましくは 6%以下、 特に好ましくは 4%以下である芳香族ポリ力一ポネート樹脂が使用される。 この オリゴマ一含量の値は下記方法およびカラムを使用して測定された値である。 す なわち、 東ソ一 (株) 製、 TSKg e 1 G2000HXLと G3000HXL力 ラム各 1本づっ直列に繋いで溶離液としてクロ口ホルムを用い、 流用 0. 7 ml Z分で安定ィ匕した後、 該ポリカーボネート樹脂のクロロホルム溶液を注入する方 法で測定した G P Cチャートのリテンションタイムが 19分以降のォリゴマ一ピ —ク面積の合計の全ピーク面積に対する割合がオリゴマー含量である。 オリゴマ —含量が 10 %を超えると成形時の金型表面を汚染することがあるので望ましく なく、 その汚染はオリゴマー含量が多くなる程顕著になる傾向がある。 一方、 ォ リゴマ一は芳香族ポリカーボネート樹脂の製造過程で生じるものであり、 完全に 零 (0 ) にすることはできない。 For the hard disk substrate, an aromatic polysiloxane resin having an oligomer content of 10% or less, preferably 6% or less, particularly preferably 4% or less is used. The value of the oligomer content is a value measured using the following method and column. That is, TSKge1 manufactured by Tosouichi Co., Ltd., one each of G2000HXL and G3000HXL columns, connected in series, using a chromate form as eluent, and diverted to 0.7 ml Z minutes after diversion. The oligomer content is the ratio of the total area of the oligomer peaks after the retention time of the GPC chart measured by a method of injecting the chloroform solution of the polycarbonate resin of 19 minutes to the total peak area. Oligomer—If the content exceeds 10%, the mold surface may be contaminated during molding, which is undesirable, and the contamination tends to be more pronounced as the oligomer content increases. On the other hand, the oligomers are produced during the production of aromatic polycarbonate resin, Cannot be zero (0).
オリゴマーは、 前記した含量以下であればよく、 その値を満足する限り、 少割 合含有されていても差支えない。 0. 1 %以上、 好ましくは 0 . 1 5 %以上の少 割合の含量でオリゴマーが存在すると、 それ以下のものと比べて溶融流動性が向 上する。 そのため、 特に好ましくはオリゴマー含量は 0 . 1 5〜4 %の範囲であ る。  The content of the oligomer may be not more than the above-mentioned content, and as long as the value is satisfied, the content of the oligomer may be small. When the oligomer is present in a small proportion of 0.1% or more, preferably 0.15% or more, the melt flowability is improved as compared with the oligomer having a small content. Therefore, the oligomer content is particularly preferably in the range of 0.15 to 4%.
芳香族ポリカーポネ一ト樹脂中のオリゴマー含量を前記範囲に制御するには、 大量のォリゴマーが樹脂中に含まれないように重合を充分に完結することが必要 であり、 また触媒および重合条件を適宜選択することが要求される。 もしオリゴ マ一含量が前記範囲を超えている場合には、 例えばオリゴマーを抽出等の手段に より除去する処置が採用される。 この抽出は芳香族ポリカ一ポネート樹脂の溶液 (例えば塩化メチレン溶液) を、 その棚旨の貧溶剤または非溶剤 (例えばァセト ンまたはメタノール) 中に滴下する方法、 あるいはその樹脂を貧溶媒またはまた は非溶媒に浸漬して、 オリゴマーを抽出する方法等の手段によって実施すること ができる。  In order to control the oligomer content in the aromatic polycarbonate resin within the above range, it is necessary to complete the polymerization sufficiently so that a large amount of oligomer is not contained in the resin, and the catalyst and polymerization conditions are appropriately adjusted. A choice is required. If the oligomer content exceeds the above range, a treatment for removing the oligomer by means such as extraction is employed. This extraction is performed by dropping a solution of the aromatic polycarbonate resin (for example, a methylene chloride solution) into a poor solvent or a non-solvent (for example, acetone or methanol), or removing the resin from the poor solvent or It can be carried out by a method such as a method of extracting the oligomer by immersion in a non-solvent.
芳香族ポリカーボネート樹脂は、 ハードディスク基板、 殊にビデオ用ハードデ イスク基板として使用されるため、 その中の未溶解粒子が或る一定量以下に制御 すべきである。  Since the aromatic polycarbonate resin is used as a hard disk substrate, particularly a video hard disk substrate, the amount of undissolved particles therein should be controlled to a certain fixed amount or less.
すなわち、 ポリカーボネート樹脂はその 2 0 gを塩化メチレン 1 Lに溶解した 溶液をハイアックロイコ社製液体パーティクルカウンタ一モデル 4 1 0 0を用い たレーザーセンサ一法にて散乱光をラテツクス粒子の散乱光に換算する方法で求 めた径 0 . 5 m以上の未溶解粒子が該ポリカーボネート榭脂 1 g当り 1 2, 0 0 0個以下、 且つ 1 m以上の未溶解粒子が 2 0 0個以下であることが望ましい。 0 . 5 im以上の未溶解粒子が 1 2, 0 0 0個を超える力、 または 1 m以上の 未溶解粒子が 2 0 0個を超えるとディスクに書き込まれた情報に悪影響を及ぼし エラーレートが大きくなるので好ましくない。 さらに好ましくは、 0 . 5 m以 上の未溶解粒子が 1 0 , 0 0 0個以下、 且つ 1 m以上の未溶解粒子が 1 0 0個 以下である。 また、 1 O ^m以上の未溶解粒子は実質的に存在すべきではない。 芳香族ポリカーボネート樹脂中における未溶解粒子の量を前記範囲とするため には、 重合過程および造粒過程において未溶解粒子が混入しないかあるいは除去 し得る手段を採用すべきである。 そのような手段としては、 例えば操作をクリー ンルームで行うこと、 未溶解粒子の除去装置の付いた造粒装置を使用すること (具体的例としては、 後述する実施例 1で使用された軸受け部に異物取り出し口 を有する隔離室を設けた二一ダ一) あるいは摺動部分に樹脂粒子が触れない構造 の装置 (例えばスプレードライヤー形式の造粒機) で造粒すること等がある。 ま た、 未溶解粒子を除去する他の手段として、 樹脂の溶液を目開きの小さいフィル ター (0. 2— 0. m) によりろ過する方法あるいは樹脂を溶融して後、 金 属フィルター (5— 20 m) により固体粒子を除去する方法等が採用される。 本発明のハードディスク基板は、 その磁性膜形成面が極めて平滑性が優れてい ることが、 その目的のために要望される。 その平滑性は中心線表面粗さ (Ra) で表して 2 nm以下、 好ましくは l nm以下、 特に好ましくは 0. 5 nm以下で あることが望ましい。 表面粗さ (Ra) が 2 nmを超えると、 その面に形成され る磁性膜の表面の平滑性に影響を及ぼすことになり、 記録の付与および取り出し に支障を来すことになる。 That is, the polycarbonate resin was prepared by dissolving 20 g of the solution in 1 L of methylene chloride. The number of undissolved particles having a diameter of 0.5 m or more and the number of undissolved particles having a diameter of 1 m or more is not more than 1,200 per gram of the polycarbonate resin. Desirably. If the undissolved particles of 0.5 im or more exceed the force of 12, 000 particles or the undissolved particles of 1 m or more exceed the force of 200 particles, the information written on the disc will be adversely affected and the error rate will be reduced. It is not preferable because it becomes large. More preferably, the number of undissolved particles of 0.5 m or more is 100,000 or less, and the number of undissolved particles of 1 m or more is 100 or less. Undissolved particles of 1 O ^ m or more should not be substantially present. In order to keep the amount of the undissolved particles in the aromatic polycarbonate resin within the above range, a means for preventing the undissolved particles from being mixed in or removing the particles during the polymerization process and the granulation process should be adopted. Such means include, for example, performing the operation in a clean room, and using a granulator equipped with a device for removing undissolved particles (specific examples include a bearing unit used in Example 1 described later). In this case, granulation is performed using an apparatus (eg, a spray dryer type granulator) that does not allow resin particles to touch the sliding part. Another method for removing undissolved particles is to filter the resin solution with a small-opening filter (0.2-0.m) or to melt the resin and then use a metal filter (5 -20 m), a method for removing solid particles is adopted. The hard disk substrate of the present invention is required for its purpose to have an extremely smooth magnetic film forming surface. It is desirable that the smoothness be 2 nm or less, preferably 1 nm or less, particularly preferably 0.5 nm or less, as expressed by the center line surface roughness (Ra). If the surface roughness (Ra) exceeds 2 nm, it will affect the smoothness of the surface of the magnetic film formed on the surface, which will hinder recording and removal.
この中心線平均粗さ (R a) は、 J I S B 060 1で定義される値であり、 基準長さ L (測定長) を抜き取り、 この抜き取り部分の平均線を X軸、 縦倍率の 方向を Y軸として抽出曲線を y= f (x) で表したとき下記式で求められた値で ある。
Figure imgf000018_0001
本発明のハードディスク基板は、 平坦性にも優れている。 この平坦性は、 磁性 膜形成面において円周方向が平面度として 1 以下、 好ましくは 7 m以下 である。 実際には半径方向の平面度も同じ程度であることが望ましい。
The center line average roughness (R a) is a value defined in JISB0601, and the standard length L (measurement length) is sampled. The average line of the sampled portion is X-axis, and the direction of the vertical magnification is Y When the extraction curve is represented by y = f (x) as the axis, it is the value obtained by the following equation.
Figure imgf000018_0001
The hard disk substrate of the present invention has excellent flatness. The flatness is 1 or less, preferably 7 m or less in the circumferential direction on the surface on which the magnetic film is formed, as flatness. Actually, it is desirable that the flatness in the radial direction is also approximately the same.
また本発明のハードディスク基板は、 磁性膜形成面において、 高さが 2 5 nm 以上の粗大突起が実質的に存在しないものが肝要である。 そのためには前述した ように大きい未溶解粒子が混入しないようにするかあるいはフィルターで大きな 粒子を除去することが必要である。 Further, the hard disk substrate of the present invention has a height of 25 nm on the magnetic film formation surface. It is important that the above-mentioned coarse projections do not substantially exist. For this purpose, it is necessary to prevent large undissolved particles from entering as described above, or to remove large particles with a filter.
芳香族ポリ力一ポネート樹脂は、 そのガラス転移点が 1 2 0 °C以上が好ましく、 1 3 0 °C以上がより好ましく、 1 4 5 °C以上がさらに好ましい。 ガラス転移点が 低くなるとディスク基板としての耐熱性が不足する。 また芳香族ポリ力一ボネ一 ト樹脂の流動性は MF Rの値で 2 5 g/ 1 0分以上が好ましく、 3 0 g/ 1 0分 以上がより好ましく、 4 5 gZ l 0分以上がさらに好ましい。 流動性が低くなる と成形性に劣り所望のディスク基板が得られなくなる。  The glass transition point of the aromatic polycarboxylic acid resin is preferably 120 ° C. or higher, more preferably 130 ° C. or higher, and even more preferably 144 ° C. or higher. If the glass transition point is low, the heat resistance of the disk substrate will be insufficient. The fluidity of the aromatic polycarbonate resin is preferably 25 g / 10 minutes or more, more preferably 30 g / 10 minutes or more, and more preferably 45 gZ10 minutes or more in terms of MFR. More preferred. If the fluidity is low, the moldability is inferior and a desired disk substrate cannot be obtained.
芳香族ポリカーボネート樹脂には、 必要に応じて燐系熱安定剤を加えることが できる。 燐系熱安定剤としては、 亜燐酸エステルおよび燐酸エステルが好ましく 使用される。 亜燐酸エステルとしては、 例えばトリフエニルホスファイト、 トリ スノニルフエニルホスフアイト、 トリス ( 2 , 4ージー t e r t—ブチルフエ二 ル) ホスファイト、 トリデシルホスフアイト、 トリオクチルホスフアイト、 トリ ォクタデシルホスフアイト、 ジデシルモノフエニルホスフアイト、 ジォクチルモ ノフエニルホスフアイト、 ジイソプロピルモノフエニルホスフアイト、 モノブチ ルジフエニルホスファイト、 モノデシルジフエニルホスフアイト、 モノォクチル ジフエニルホスフアイト、 ビス (2, 6—ジー t e r t—ブチル一4ーメチルフ ェニル) ペン夕エリスリトールジホスファイト、 2 , 2—メチレンビス ( 4 , 6 ージ一 t e r t一ブチルフエニル) ォクチルホスフアイト、 ビス (ノエルフエ二 ル) ペンタエリスト一ルジホスフアイ卜、 ビス ( 2, 4—ジー t e r t—ブチル フエニル) ペンタエリストールジホスフアイ卜、 テトラキス ( 2 , 4ージ— t e r t—ブチルフエニル) - 4 , 4—ジフエ二レンホスホナイト等の亜燐酸のトリ エステル、 ジエステル、 モノエステルが挙げられる。 これらのうち、 トリスノニ ルフエニルホスフアイト、 ジステアリルペンタエリスト一ルジホスフアイトホス フアイ卜が好ましい。  A phosphorus-based heat stabilizer can be added to the aromatic polycarbonate resin as needed. As the phosphorus-based heat stabilizer, phosphites and phosphates are preferably used. Examples of the phosphite include triphenyl phosphite, trisnonyl phenyl phosphite, tris (2,4-DG tert-butyl phenyl) phosphite, tridecyl phosphite, trioctyl phosphite, trioctadecyl phosphite Phyto, didecyl monophenyl phosphite, dioctyl monophenyl phosphite, diisopropyl monophenyl phosphite, monobutyi diphenyl phosphite, monodecyl diphenyl phosphite, monooctyl diphenyl phosphite, bis (2,6-zy tert- Butyl-1-methylphenyl) pentaerythritol diphosphite, 2,2-methylenebis (4,6-di-tert-butylphenyl) octyl phosphite, bis (noerphenyl) pentaerythryl diphosphite Phosphorous acid such as iso-, bis (2,4-di-tert-butylphenyl) pentaerythritol diphosphite, tetrakis (2,4-di-tert-butylphenyl) -4,4-diphenylenephosphonite Examples include triesters, diesters, and monoesters. Of these, tris nonylphenyl phosphite and distearyl pentaerythryl diphosphite phosphite are preferred.
一方、 熱安定剤として使用される燐酸エステルとしては、 例えばトリプチルホ スフェート、 卜リメチルホスフェート、 トリクレジリレホスフェート、 トリフエ二 ルホスフエ一卜、 トリクロルフエニルホスフエ一ト、 トリェチルホスフェート、 ジフエ二ルクレジルホスフェート、 ジフエニルモノオルソキセニルホスフエ一卜、 トリブトキシェチルホスフェート、 ジブチルホスフェート、 ジォクチルホスフエ ート、 ジイソプロピルホスフェート等が挙げられ、 なかでもトリフエニルホスフ エート、 トリメチルホスフェートが好ましい。 On the other hand, phosphate esters used as heat stabilizers include, for example, triptyl phosphate, trimethyl phosphate, tricresylyl phosphate, Triphosphate, trichlorophenyl phosphate, triethyl phosphate, diphenyl cresyl phosphate, diphenyl monoorthoxenyl phosphate, tributoxyshethyl phosphate, dibutyl phosphate, octyl phosphate, Examples thereof include diisopropyl phosphate, and among them, triphenyl phosphate and trimethyl phosphate are preferable.
前記燐系熱安定剤は、 単独で使用してもよく、 また二種以上を組合わせて使用 しても良い。 燐系熱安定剤は、 芳香族ポリ力一ポネート樹脂に基づいて 0. 00 01〜0. 05重量%の範囲で使用するのが適当である。  The phosphorus-based heat stabilizers may be used alone or in combination of two or more. The phosphorus-based heat stabilizer is suitably used in the range of 0.001 to 0.05% by weight based on the aromatic polycarboxylic acid resin.
芳香族ポリカーボネート樹脂には、 酸化防止の目的で通常知られた酸化防止剤 を添加することができる。 その例としてはフエノール系酸化防止剤を示すことが でき、 具体的には例えばトリエチレングリコール—ビス (3- (3- t e r t - ブチル一 5—メチル一4ーヒドロキシフエニル) プロピオネート)、 1, 6—へ キサンジオール一ビス (3— (3, 5—ジー t e r t—ブチル— 4—ヒドロキシ フエニル) プロピオネート、 ペンタエリスリトールーテトラキス (3— (3, 5 ージ _ t e r t—ブチル一4ーヒドロキシフエニル) プロピオネート)、 ォクタ デシルー 3_ (3, 5—ジー t e r t—ブチル _4ーヒドロキシフエニル) プロ ピオネー卜、 1, 3, 5_トリメチル一2, 4, 6 _卜リス ( 3, 5—ジ一 t e r tーブチルー 4ーヒドロキシベンジル) ベンゼン、 N, N—へキサメチレンピ ス (3, 5ージー t e r t—ブチル— 4—ヒドロキシ一ヒドロシンナマイド)、 3, 5—ジ— t e 1- t—ヒドロキシ一べンジルホスホネート—ジェチルエステル、 トリス (3, 5—ジー t e r t—プチレー 4—ヒドロキシベンジル) イソシァヌ レー卜、 3, 9一ビス {1, 1ージメチル— 2— ίβ - (3— t e r t—ブチル 一 4ーヒドロキシー 5—メチルフ: ニル) プロピオニルォキシ] ェチル } 一 2, 4, 8, 10—テトラオキサスピロ (5, 5) ゥンデカン等が挙げられる。 これ ら酸ィ匕防止剤の好ましい添加量の範囲は芳香族ポリ力一ポネート測旨に対して、 0. 0001〜0. 05重量%である。  An antioxidant commonly known for the purpose of preventing oxidation can be added to the aromatic polycarbonate resin. Examples thereof include phenolic antioxidants, and specifically, for example, triethylene glycol-bis (3- (3-tert-butyl-15-methyl-14-hydroxyphenyl) propionate), 6-Hexanediol-bis (3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate, pentaerythritol-tetrakis (3- (3,5-di-tert-butyl-1-hydroxyphenyl) ) Propionate), octadecyl-3_ (3,5-ditert-butyl-4-hydroxyphenyl) propionate, 1,3,5_trimethyl-1,2,4,6_tris (3,5-ditert) -Butyl-4-hydroxybenzyl) benzene, N, N-hexamethylenepis (3,5-zy tert-butyl-4-hydroxy-monohydrocinnamide), 3,5-di-te 1-t Hydroxy monobenzyl phosphonate-getyl ester, tris (3,5-di-tert-butyl 4-hydroxybenzyl) isocyanurate, 3,9-bis {1,1-dimethyl-2-ίβ-(3-tert- Butyl-1,4-hydroxy-5-methylph: nyl) propionyloxy] ethyl} 1,2,4,8,10-tetraoxaspiro (5,5) indecan, etc. Preferred amounts of these antioxidants Is in the range of 0.0001 to 0.05% by weight based on the weight of the aromatic polyphenol.
さらに芳香族ポリ力一ポネート樹脂には、 必要に応じて多価アルコールの高級 脂肪酸エステルを加えることもできる。 この高級 ]3皆肪酸エステルを加えることに よって、 芳香族ポリ力一ポネ一ト樹脂の熱安定性が向上し、 成形時の樹脂の流動 性が良くなり、 さらに成形後の金型からの基板の離型性が改良されて離型不良に よるディスク基板の変形が防止できる。 かかる高級脂肪酸エステルとしては、 炭 素数 2〜 5の多価アルコールと炭素数 10〜30の飽和脂肪酸との部分エステル、 または全エステルであるのが好ましい。 この多価アルコールとしては、 グリコー ル類、 グリセロールまたはペン夕エリス! ^一ルが挙げられる。 Further, a higher fatty acid ester of a polyhydric alcohol can be added to the aromatic polycarboxylic acid resin if necessary. To add this high-grade] 3 fatty acid ester As a result, the thermal stability of the aromatic polycarbonate resin is improved, the fluidity of the resin during molding is improved, and the mold releasability of the substrate from the mold after molding is improved, thereby releasing the mold. The deformation of the disk substrate due to the defect can be prevented. The higher fatty acid ester is preferably a partial ester or a total ester of a polyhydric alcohol having 2 to 5 carbon atoms and a saturated fatty acid having 10 to 30 carbon atoms. The polyhydric alcohols include glycols, glycerol or Penis Ellis!
前記高級脂肪酸エステ^ま、 芳香族ポリ力一ポネ一ト樹 JI旨に対して、 0. 00 5〜2重量%の範囲、 好ましくは 0. 02〜0. 1重量%の範囲で添加されるの が適当である。 添加量が 0. 01重量%未満では、 上記効果が得られず、 一方 2 重量%を超えると金型表面の汚れの原因となるので好ましくない。  The higher fatty acid ester is added in the range of 0.005 to 2% by weight, preferably in the range of 0.02 to 0.1% by weight, based on the aromatic poly-carbonate tree JI. Is appropriate. If the amount is less than 0.01% by weight, the above effect cannot be obtained. On the other hand, if the amount exceeds 2% by weight, it is not preferable because it causes stains on the mold surface.
芳香族ポリカーボネート樹脂には、 さらに着色剤、 帯電防止剤、 滑剤等の添加 剤を透明性を損なわない範囲で加えることができる。 また、 他のポリカーポネ一 ト樹脂、 熱可塑性樹脂を本発明の目的を損なわない範囲で少割合添加することも できる。  Additives such as a coloring agent, an antistatic agent, and a lubricant can be further added to the aromatic polycarbonate resin as long as the transparency is not impaired. Further, other polycarbonate resins and thermoplastic resins can be added in a small proportion as long as the object of the present invention is not impaired.
本発明のハードディスク基板は、 その表面に磁性膜としての金属薄膜を形成さ せることにより、 ハードディスクが得られる。 この金属としては、 Fe、 Co、 Cr等があり、 Co28P t 12C r i。が適している。 また薄膜は、 スパッタリン グ、 蒸着等の手段で形成させることができる。 これらの金属薄膜の形成手段は、 それ自体知られた方法で行うことができる。 実施例 In the hard disk substrate of the present invention, a hard disk can be obtained by forming a metal thin film as a magnetic film on the surface thereof. This metal includes Fe, Co, Cr and the like, and Co 28 Pt 12 Cri. Is suitable. The thin film can be formed by means such as sputtering and vapor deposition. Means for forming these metal thin films can be performed by a method known per se. Example
以下に実施例を挙げて本発明をさらに説明する。 なお実施例中の部は重量部で あり、 %は重量%である。 なお、 評価は下記の方法によった。  Hereinafter, the present invention will be further described with reference to examples. Parts in Examples are parts by weight, and% is% by weight. The evaluation was performed by the following method.
比粘度 : ポリマー 0. 7 gを 10 Omlの塩ィ匕メチレンに溶解し 20°Cの温 度で測定した。 Specific viscosity: 0.7 g of the polymer was dissolved in 10 Oml of methylene chloride and measured at a temperature of 20 ° C.
ガラス転移点 (Tg) : デュポン社製 910型 DSCにより測定した。 Glass transition point (Tg): Measured by DuPont Model 910 DSC.
流動性 (MFR) : J I S K一 7210に準拠して、 東洋精機製セミオ一 トメルトインデクサ一を用いて、 280 、 荷重 2. 16 kgで 10分間に流出 したポリマー量 (g) で示した。 Fluidity (MFR): In accordance with JISK-7210, using Toyo Seiki Semi-Olt Melt Indexer, 280 at a load of 2.16 kg for 10 minutes It is shown by the amount of polymer (g).
オリゴマー含量 : 東ソー製 GPCカラム TSKg e 1 G2000HXLと T SKg e 1 G3000HXLを用い、 溶離液としてクロ口ホルムを流量 0. 7m 1 Z分で流しながら試料 50mgをクロ口ホルム 5 m 1に溶解した溶液を 20 1注入する方法で求めた G PCチャートのリテンションタイムが 19分以降のォ リゴマ一成分のピーク面積の全ピーク面積に対する割合を%で示した。 Oligomer content: A solution prepared by dissolving 50 mg of a sample in 5 m 1 of Clos-form while using Tosoh's GPC columns TSKg e 1 G2000HXL and T SKg e 1 G3000HXL with eluent flowing at 0.7 m 1 Z min. The retention time of the GPC chart obtained by the method of injecting 201 into the sample was shown as a percentage of the total peak area of the peak area of one component after 19 minutes.
吸水率 : ASTM D— 0570によって測定した。 Water absorption: Measured according to ASTM D-0570.
塩化メチレン未溶解粒子 : 該ポリカーボネート樹脂 20 gを塩化メチレン 1 Lに溶解した溶液をハイアツクロィコ社製液体パーティクルカゥン夕一モデル 4 100を用いたレーザーセンサー法にて散乱光をラテックス粒子の散乱光に換算 する方法で求めた。 Undissolved particles of methylene chloride: A solution obtained by dissolving 20 g of the polycarbonate resin in 1 L of methylene chloride is converted into scattered light of latex particles by a laser sensor method using a liquid particle carrier model 1 100 manufactured by Hyattcroico. The conversion method was used.
曲げ弾性率 : ASTM D— 790によって測定した。 Flexural modulus: Measured according to ASTM D-790.
: ASTM D— 696によって測定した。  : Measured according to ASTM D-696.
J I S K-7112によって測定した。  It was measured by JIS K-7112.
中心線平均粗さ (Ra) : J I S B 0601によって測定した。 Center line average roughness (Ra): Measured according to JIS B0601.
反り : 8 O , 85 %RHの恒温恒湿機中に、 ハードディスク基板を 1, 0 00時間放置した後、 小野測器製 LM— 1200光ディスク検査装置を用いて基 板の反りを測定した。 Warp: After leaving the hard disk substrate in a constant temperature and humidity machine of 8 O and 85% RH for 1,000 hours, the warpage of the substrate was measured using an LM-1200 optical disk inspection device manufactured by Ono Sokki.
平面度 Flatness
基板にレーザー光を照射し、 そのレーザー光の戻り角を測定することにより、 基板の傾きを算出して求めた。 測定個所は代表して、 半径方向に中心から 40m mの箇所の円周方向の平面度を測定した。 測定にはジャパン ·ィー ·ェム製 D LD- 3000を使用した。  By irradiating the substrate with laser light and measuring the return angle of the laser light, the inclination of the substrate was calculated and obtained. As a representative, the flatness in the circumferential direction was measured at a point 40 mm from the center in the radial direction. For the measurement, DLD-3000 manufactured by Japan II Chem was used.
粗大突起 Coarse projection
高さが 25 nm以上の粗大突起の測定は次のようにして行った。  The measurement of coarse projections having a height of 25 nm or more was performed as follows.
基板の半径方向に中心から 15mm、 28 mmおよび 4 Ommの箇所における 円周方向に各々 8箇所の合計 24箇所において、 1箇所当たり 100 m角で 5 点測定し、 25 以上の突起の有無を測定した。 測定には、 原子間力顕微鏡 (セイコーィンスツルメンッ製 SP I -3800N) を使用した。 Measured at 5 points at a 100 m square at each of 15 points, 15 mm, 28 mm, and 4 Omm from the center in the radial direction, 8 points each in the circumferential direction, 24 points in total, measuring the presence or absence of 25 or more protrusions did. Atomic force microscope for measurement (SPI-3800N manufactured by Seiko Instruments Inc.) was used.
実施例 1 Example 1
温度計、 攪拌機、 還流冷却器付き反応器にイオン交換水 929. 2部、 48% カセイソーダ水溶液 61. 3部を入れ、 1, 1一ビス (4ーヒドロキシフエ二 ル) ー3, 3, 5—トリメチルシクロへキサン 35. 1部、 4, 4, - (m—フ ェニレンジイソプロピリデン) ジフエノール 48. 0部およびハイドロサルファ イト 0. 17部を溶解した後、 p— t e r t—ブチルフエノール 1. 51部と塩 化メチレン 637. 9部を加えトリェチルァミン 0. 09部を添加した後攪拌下 15〜25ででホスゲン 32. 4部を 40分要して吹き込んだ。 ホスゲン吹き込 み終了後、 48%カセイソーダ水溶液 15. 6部を加え、 28〜33でで1時間 攙拌して反応を終了した。 反応終了後、 目開きの小さい (0. 2 m) フィルタ —でろ過し生成物を塩化メチレンで希釈して水洗したのち塩酸酸性にして水洗し、 水相の導電率がィォン交換水と殆ど同じになったところで、 軸.受け部に異物取り 出し口を有する隔離室を設けたニーダ一にて塩化メチレンを蒸発して、 ビスフエ ノール TMCとビスフエノール Mの比がモル比で 45 : 55である無色のポリマ — 88. 1部を得た (収率 98%)。  In a reactor equipped with a thermometer, stirrer and reflux condenser, 929.2 parts of ion-exchanged water and 61.3 parts of a 48% aqueous caustic soda solution were charged, and 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethyl was added. Cyclohexane 35.1 1 part, 4,4,-(m-phenylenediisopropylidene) diphenol 48.0 parts and hydrosulfite 0.17 parts are dissolved, and then p-tert-butylphenol 1.51 Then, 63.9 parts of methylene chloride and 0.09 part of triethylamine were added, and then 32.4 parts of phosgene was blown in under stirring at 15 to 25 for 40 minutes. After the injection of phosgene was completed, 15.6 parts of a 48% aqueous sodium hydroxide solution was added, and the mixture was stirred at 28 to 33 for 1 hour to complete the reaction. After the reaction is completed, the product is filtered through a filter (0.2 m) with a small opening, the product is diluted with methylene chloride, washed with water, acidified with hydrochloric acid, and washed with water. The conductivity of the aqueous phase is almost the same as that of ion-exchanged water. Then, the methylene chloride was evaporated in a kneader provided with an isolation chamber having a foreign-matter extraction port on the shaft receiving portion, and the molar ratio of bisphenol TMC to bisphenol M was 45:55. Colorless polymer—88.1 parts obtained (98% yield).
このポリマーの比粘度は 0. 284、 オリゴマー含量は 2. 4 %、 塩素含有量 は 1. 3ppm、 丁^は146 、 MF Rは 80 gZ 10分であった。 また吸水 率は 0. 15重量%であった。 このポリマーにトリス (ノニルフエニル) ホスフ アイトを 0. 03%、 トリメチルホスフェートを 0. 005%、 ステアリン酸モ ノグリセリドを 0. 04%加えてペレット化し、 住友重機製 D I SK5M111 を用いて 90ηιπιΦ、 1. 2 mm厚みのディスクに射出成形した。 このものの塩 化メチレン未溶解粒子は 0. 5 /a m以上が 10, 000個 Z g、 1 m以上が 9 0個/ であった。 また曲げ弾性率は 2, 80 OMP a、 線膨張係数は 6. 1 X 10— 5d e g—1、 比重 1. 13、 反りは 0. 15 mm、 表面粗さ (R a) は、 磁性膜形成面で 0. 86 nmであった。 また平面度は 5 mであった。 磁性膜形 成面において高さ 25 nm以上の粗大突起は存在しなかった。 The specific viscosity of this polymer was 0.284, the oligomer content was 2.4%, the chlorine content was 1.3 ppm, 146 was 146, and MFR was 80 gZ for 10 minutes. The water absorption was 0.15% by weight. To this polymer was added 0.03% of tris (nonylphenyl) phosphate, 0.005% of trimethyl phosphate, and 0.004% of monoglyceride stearate, and the mixture was pelletized using a Sumitomo Heavy Industries DI SK5M111, 90ηιπιΦ, 1.2 It was injection molded into a disk having a thickness of mm. The undissolved particles of methylene chloride were 10,000 Zg at 0.5 / am or more, and 90 / g at 1 m or more. The flexural modulus 2, 80 OMP a, coefficient of linear expansion 6. 1 X 10- 5 deg- 1, specific gravity 1.13, warpage 0. 15 mm, the surface roughness (R a), the magnetic film is formed It was 0.86 nm in the plane. The flatness was 5 m. No coarse protrusions with a height of 25 nm or more were present on the magnetic film formation surface.
実施例 2 実施例 1の 1, 1一ビス (4—ヒドロキシフエニル) —3, 3, 5—トリメチ ルシクロへキサンを 23'. 4部、 4, 4, 一 (m—フエ二レンジィソプロピリデ ン) ジフエノールを 60. 9部とした以外は実施例 1と同様にして、 ビスフエノ —ル TMCとビスフエノール Mの比がモル比で 30 : 70であるポリマー 88. 2部を得た (収率 97%)。 このポリマーの比粘度は 0. 291、 オリゴマー含 量は 2. 7%、 塩素含有量は 1. 5ppm、 丁8は132°(:、 MFI^¾93 g/ 10分であった。 また吸水率は 0. 13重量%であった。 Example 2 The 1,1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane of Example 1 was added to 23'.4 parts, 4,4,1- (m-phenylenedisopropylidene). 88.2 parts of a polymer having a molar ratio of bisphenol TMC to bisphenol M of 30:70 was obtained in the same manner as in Example 1 except that the diphenol was changed to 60.9 parts (yield). 97%). The specific viscosity of this polymer was 0.291, the oligomer content was 2.7%, the chlorine content was 1.5 ppm, and the temperature was 132 ° (: MFI ^ ¾93 g / 10 min. 0.13% by weight.
このポリマーを実施例 1と同様に成形し実施例 1と同様に評価したところ、 こ のものの塩ィ匕メチレン未溶解粒子は 0. 5 m以上が 10, 000個 Zg、 1 m以上が 80個/ gであった。 また曲げ弾性率は 2, 850MP a、 線膨張係数 は 6. 1 X 10- 5 d e g-1、 比重 1. 13、 反りは 0. 10mm、 表面粗さ (Ra) は、 磁性膜形成面で 0. 88 nmであった。 また平面度は 6 mであつ た。 磁性膜形成面において高さ 25 nm以上の粗大突起は存在しなかった。 This polymer was molded in the same manner as in Example 1 and evaluated in the same manner as in Example 1. The undissolved particles of the methylene chloride salt were 10,000 Zg for 0.5 m or more and 80 Zg for 1 m or more. / g. The flexural modulus is 2,850 MPa, the linear expansion coefficient is 6.1 X 10-5 deg- 1 , the specific gravity is 1.13, the warpage is 0.10 mm, and the surface roughness (Ra) is It was 0.88 nm. The flatness was 6 m. No coarse protrusions with a height of 25 nm or more were present on the surface on which the magnetic film was formed.
実施例 3 Example 3
実施例 1の 1 , 1 _ビス (4—ヒドロキシフエニル) 一 3, 3, 5—卜リメチ ルシクロへキサンを 54. 7部、 4, 4, - ( m—フエ二レンジイソプロピリデ ン) ジフエノールを 26. 1部とした以外は実施例 1と同様にして、 ビスフエノ —ル TM Cとビスフエノール Mの比がモル比で 70 : 30であるボリマ一 87. 4部 (収率 97%) を得た。  1,1_bis (4-hydroxyphenyl) 13,3,5-trimethylcyclohexane of Example 1 54.7 parts, 4,4,-(m-phenylenediisopropylidene) diphenol Was carried out in the same manner as in Example 1 except that the ratio of bisphenol TM C to bisphenol M was 70:30 in a molar ratio of 70:30. Obtained.
このポリマーの比粘度は 0. 286、 オリゴマー含量は 2. 8 %、 塩素含有量 は 1. 5ppm、 丁 は155°<0、 MF Rは 66 g/ 10分であった。 また吸水 率は 0. 16重量%であった。 このポリマーを実施例 1と同様に評価したところ、 塩化メチレン未溶解粒子は 0. 5 m以上が 10, 000個/ g、 1 m以上が 85個/ gであった。 また曲げ弾性率は 2, 900MPa、 線膨張係数は 6. 2 X 10— 5d e g— 比重 1. 13、 反りは 0. 10mm、 表面粗さ (Ra) は、 磁性膜形成面で 0. 86 nmであった。 また平面度は 5 であった。 磁性膜形 成面において高さ 25 nm以上の粗大突起は存在しなかった。 The specific viscosity of this polymer was 0.286, the oligomer content was 2.8%, the chlorine content was 1.5 ppm, the temperature was 155 ° <0, and the MFR was 66 g / 10 min. The water absorption was 0.16% by weight. When this polymer was evaluated in the same manner as in Example 1, the number of undissolved methylene chloride particles was 10,000 particles / g at 0.5 m or more and 85 particles / g at 1 m or more. The flexural modulus 2, 900 MPa, the linear expansion coefficient of 6. 2 X 10- 5 deg- specific gravity 1.13, warpage 0. 10 mm, surface roughness (Ra), 0. 86 nm in the magnetic film forming surface Met. The flatness was 5. No coarse protrusions with a height of 25 nm or more were present on the magnetic film formation surface.
比較例 1 実施例 1の 1, 1—ビス (4—ヒドロキシフエニル) 一 3, 3, 5—トリメチ ルシクロへキサンを 78部として、 4, 4- (m—フエ二レンジィソプロピリデ ン) ジフエノールを用いない以外は、 実施例 1と同様にしてビスフエノール TM Cのホモポリマ一 80. 3部 (収率 95%) を得た。 このポリマ一の比粘度は 0. 290、 Tgは 232°C、 また吸水率は 0. 3重量%であった。 このポリマーを 実施例 1と同様にして射出成形により基板を得ようとしたが、 溶融流動性が悪く、 成形できなかった。 Comparative Example 1 1,4-bis (4-hydroxyphenyl) -1,3,5-trimethylcyclohexane of Example 1, 78 parts of 4,4- (m-phenylenediisopropylidene) diphenol 80.3 parts (95% yield) of a homopolymer of bisphenol TM C was obtained in the same manner as in Example 1 except that phenol was not used. The specific viscosity of this polymer was 0.290, Tg was 232 ° C, and the water absorption was 0.3% by weight. An attempt was made to obtain a substrate of this polymer by injection molding in the same manner as in Example 1, but the melt fluidity was poor and molding was not possible.
比較例 2 Comparative Example 2
実施例 1の 1, 1一ビス (4—ヒドロキシフエニル) —3, 3, 5_トリメチ ルシクロへキサンを 15. 6部、 4, 4— (m—フエ二レンジイソプロピリデ ン) ジフエノールを 69. 7部とした以外は、 実施例 1と同様にしてビスフエノ ール T M Cとビスフエノ一ル Mの比がモル比で 20 : 80であるポリマー 89. 3部を得た (収率 96%)。 このポリマ一の比粘度は 0. 288、 Tgは 11 7°C, MFRは 95 gZl 0分であった。 また吸水率は 0. 13重量%であった。 このポリマーを実施例 1と同様にして評価したところ、 この基板は、 Tgが 11 7 と低く、 ハードディスク用途としての耐熱性が不足していた。  15.6 parts of 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane of Example 1 and 69 parts of 4,4- (m-phenylenediisopropylidene) diphenol were added. 89.3 parts of a polymer having a molar ratio of bisphenol TMC to bisphenol M of 20:80 was obtained in the same manner as in Example 1 except that the amount was changed to 7 parts (96% yield). The specific viscosity of this polymer was 0.288, Tg was 117 ° C., and MFR was 95 gZl 0 min. The water absorption was 0.13% by weight. When this polymer was evaluated in the same manner as in Example 1, this substrate had a low Tg of 117 and was insufficient in heat resistance for hard disk applications.
比較例 3 Comparative Example 3
実施例 1のポリマ一溶液を用い、 軸受け部に異物出し口を有する隔離室のない 二—ダーを使用して造粒した以外は、 実施例 1と同様にして基板成形、 評価した ところ、 塩化メチレン未溶解粒子は 0. 5 111以上が86, 00 Oiei/g, 1. 0 m以上が 2, 700個 Zgと多くなつた。 実施例 1と同様にして評価した ところ、 表面粗さ .(R a) は、 磁性膜形成面で 9. 5 nmでハードディスク基板 として不適であった。  Substrate molding and evaluation were performed in the same manner as in Example 1 except that the polymer solution of Example 1 was used and granulation was performed using a binder without a separation chamber having a foreign substance outlet at the bearing portion. The number of undissolved methylene particles was as large as 86,00 Oiei / g for 0.5 111 or more and 2,700 Zg for 1.0 m or more. When evaluated in the same manner as in Example 1, the surface roughness (Ra) was 9.5 nm on the surface on which the magnetic film was formed, which was unsuitable for a hard disk substrate.
発明の効果 The invention's effect
本発明の方法によれば、 優れた物理的特性を有する樹脂より形成されたハ一ド ディスク基板が得られるので、 ハードディスク、 特にビデオ用ハードディスクと して好適に用いられる。  According to the method of the present invention, a hard disk substrate formed of a resin having excellent physical properties can be obtained, and thus is suitably used as a hard disk, particularly a video hard disk.

Claims

請 求 の 範 囲 The scope of the claims
1. 熱可塑性棚皆より実質的に形成され、 該樹脂は (A) 比重が 0. 95〜1. 25であり、 且つ (B) 曲げ弾性率が 2, 200〜3, 500MPaを満足する 樹脂により形成されていることを特徴とするハ一ドディスク基板。 1. Substantially formed of thermoplastic shelves, the resin satisfies (A) a specific gravity of 0.95 to 1.25 and (B) a flexural modulus of 2,200 to 3,500 MPa. A hard disk substrate formed of:
2. 磁性膜形成面における中心線平均粗さ (Ra) が 2 nm以下である請求項 1 記載のハードディスク基板。 2. The hard disk substrate according to claim 1, wherein a center line average roughness (Ra) on a surface on which the magnetic film is formed is 2 nm or less.
3. 磁性膜形成面における円周方向の平面度が、 10 m以下である請求項 1記 載のハードディスク基板。 3. The hard disk substrate according to claim 1, wherein a flatness in a circumferential direction on a magnetic film forming surface is 10 m or less.
4. 磁性膜形成面において、 高さ 25 nm以上の粗大突起が実質的に存在しない 請求項 1記載のハードディスク基板。 4. The hard disk substrate according to claim 1, wherein substantially no coarse protrusions having a height of 25 nm or more are present on the surface on which the magnetic film is formed.
5. 該樹脂は、 線膨張係数が 6. 5X 10— 5d e g 1以下である請求項 1記載 のハードディスク基板。 5. The resin, hard disk substrate of claim 1 wherein the linear expansion coefficient is 6. 5X 10- 5 deg 1 below.
6. 該樹脂は、 吸水率が 0. 18重量%以下である請求項 1記載のハードデイス ク基板。 6. The hard disk substrate according to claim 1, wherein the resin has a water absorption of 0.18% by weight or less.
7. 該樹脂は、 塩素含有量が 10 p pm以下である請求項 1記載のハードディス ク基板。 7. The hard disk substrate according to claim 1, wherein the resin has a chlorine content of 10 ppm or less.
8. 該樹脂は、 芳香族ポリカーボネート觀旨である請求項 1記載のハードデイス ク基板。 8. The hard disk substrate according to claim 1, wherein the resin is an aromatic polycarbonate.
9. 該芳香族ポリカーボネート樹脂は、 塩ィヒメチレン溶液中で測定された未溶解 粒子がポリカーボネート樹脂 1 g当たり、 粒子換算直径 0. 5 m以上のものが 12, 000個以下且つ 1 m以上のものが 200個以下である請求項 8記載の ハードディスク基板。 9. The aromatic polycarbonate resin is undissolved as measured in dimethyl chloride solution. 9. The hard disk substrate according to claim 8, wherein 12,000 or less particles having a particle equivalent diameter of 0.5 m or more and 200 or less particles having a particle equivalent diameter of 1 m or more per 1 g of the polycarbonate resin.
10. 該芳香族ポリカーボネー卜樹脂は、 本文に定義された方法によって測定さ れたオリゴマ一含量が 10 %以下である請求項 8記載のハ一ドディスク基板。 10. The hard disk substrate according to claim 8, wherein the aromatic polycarbonate resin has an oligomer content of 10% or less as measured by the method defined herein.
11. 該芳香族ポリ力一ポネート樹脂は、 その 0. 7 gを塩化メチレン 100m 1に溶解した溶液において測定された比粘度が 0. 2〜0. 5の範囲である請求 項 8記載のハードディスク基板。 11. The hard disk according to claim 8, wherein the aromatic polysiloxane resin has a specific viscosity measured in a solution obtained by dissolving 0.7 g of the resin in 100 ml of methylene chloride in a range of 0.2 to 0.5. substrate.
12. 該芳香族ポリカーポネ一卜樹脂は、 全芳香族ジヒドロキシ成分の少なくと も 30モル%が 1, 1—ビス (4ーヒドロキシフエニル) _3, 3, 5—トリメ チルシクロへキサンである請求項 8記載のハードディスク基板。 12. In the aromatic polycarbonate resin, at least 30 mol% of the total aromatic dihydroxy component is 1,1-bis (4-hydroxyphenyl) _3,3,5-trimethylcyclohexane. The hard disk substrate described in 8.
13. 該芳香族ポリ力一ポネート棚旨は、 全芳香族ジヒドロキシ成分の 30〜 7 0モル%が、 1, 1 _ビス (4—ヒドロキシフエニル) -3, 3, 5—トリメチ ルシク口へキサンである請求項 8記載のハ一ドディスク基板。 13. The aromatic polystyrene salt means that 30 to 70 mol% of the total aromatic dihydroxy component is transferred to the 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylsilicone mouth. 9. The hard disk substrate according to claim 8, which is xane.
14. 該芳香族ポリカーボネート樹脂は、 14. The aromatic polycarbonate resin,
(a) 1, 1—ビス (4—ヒドロキシフエニル) _3, 3, 5—トリメチルシク 口へキサン (成分 a) および  (a) 1,1-bis (4-hydroxyphenyl) _3,3,5-trimethylcycline hexane (component a) and
(b) 4, 4, ― (m—フエ二レンジイソプロピリデン) ジフエノールおよび Z または 2, 2—ビス (3—メチル一4ーヒドロキシフエニル) プロパン (成分 b) を全芳香族ジヒドロキシ成分の少なくとも 90モル%とし、 且つ成分 aと成 分 bの割合がモル比で 30 : 70〜70 : 30である請求項 8記載のハードディ スク基板。 (b) 4,4,-(m-phenylenediisopropylidene) diphenol and Z or 2,2-bis (3-methyl-1-hydroxyphenyl) propane (component b) at least 9. The hard disk substrate according to claim 8, wherein the mole ratio is 90 mol%, and the ratio of component a to component b is 30:70 to 70:30 in molar ratio.
15. 該成分 bが、 4, 4' - (m—フエ二レンジイソプロピリデン) ジフエノ ールである請求項 14記載のハードディスク基板, 15. The hard disk substrate according to claim 14, wherein the component b is 4,4 '-(m-phenylenediisopropylidene) diphenol.
16. 成分 a:成分 bの割合がモル比で 40 : 60〜60 : 40である請求項 1 4記載のハ一ドディスク基板。 16. The hard disk substrate according to claim 14, wherein the ratio of component a: component b is 40:60 to 60:40 in molar ratio.
17. 請求項 1記載のハ 基板の表面に、 磁性膜を形成させたハード ディスク。 17. A hard disk according to claim 1, wherein a magnetic film is formed on a surface of the substrate.
18. 請求項 1記載のハードディスク基板の表面に、 磁性膜を形成させたビデオ 用ハードディスク。 18. A video hard disk having a magnetic film formed on the surface of the hard disk substrate according to claim 1.
19. 全芳香族ジヒドロキシ成分の 30〜70モル%が 1, 1—ビス (4ーヒド ロキシフエニル) -3, 3, 5—トリメチルシクロへキサンである芳香族ポリ力 ーポネート樹脂より実質的に形成され、 該ポリカーボネート樹脂は (A) その 0.19. 30-70 mol% of the wholly aromatic dihydroxy component is formed substantially from the aromatic polycarboxylic acid resin which is 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane; The polycarbonate resin is (A) the 0.
7 gを塩化メチレン 100mlに溶解した溶液の 20°Cにおいて測定された比粘 度が 0. 2〜0. 5の範囲であり且つ (B) 本文に定義された吸水率が 0. 18 重量%以下である、 ことを満足する樹脂により形成されていることを特徴とする ハードディスク基板。 A solution of 7 g in 100 ml of methylene chloride has a specific viscosity in the range of 0.2 to 0.5 measured at 20 ° C and (B) a water absorption of 0.18% by weight as defined in the text. A hard disk substrate formed of a resin satisfying the following.
20. 該芳香族ポリ力一ポネー卜樹脂は、 20. The aromatic polycarbonate resin is:
(a) 1, 1一ビス (4ーヒドロキシフエニル) 一 3, 3, 5—トリメチルシク 口へキサン (成分 a) および  (a) 1,1-bis (4-hydroxyphenyl) -1,3,3,5-trimethylcycline hexane (component a) and
(b) 4, 4, - (m—フエ二レンジィソプロピリデン) ジフエノールおよび Z または 2, 2—ビス (3—メチル一4ーヒドロキシフエニル) プロパン (成分 b) を全芳香族ジヒドロキシ成分の少なくとも 90モル%とし、 且つ成分 aと成 分 bの割合がモル比で 30 : 70〜70 : 30である請求項 19記載のハードデ イスク基板。 (b) 4,4,-(m-phenylenediisopropylidene) diphenol and Z or 2,2-bis (3-methyl-1-hydroxyphenyl) propane (component b) as a wholly aromatic dihydroxy component 20. The hard disk substrate according to claim 19, wherein at least 90 mol% of the component (a) and component (b) are in a molar ratio of 30:70 to 70:30.
21. 該成分 が、 4, 4, - (m—フエ二レンジイソプロピリデン) ジフエノ —ルである請求項 20記載のハードディスク基板。 21. The hard disk substrate according to claim 20, wherein the component is 4,4,-(m-phenylenediisopropylidene) diphenol.
22. 成分 a:成分 bの割合がモル比で 40 : 60〜60 : 40である請求項 2 0記載のハードディスク基板。 22. The hard disk substrate according to claim 20, wherein the ratio of component a: component b is 40:60 to 60:40 in molar ratio.
23. 該芳香族ポリカーボネート樹脂は、 (A) 比重が 0. 95〜1. 25であ り且つ (B) 曲げ弾性率が、 2, 200〜 3, 500 MP aである請求項 19記 載のハードディスク基板。 23. The aromatic polycarbonate resin according to claim 19, wherein (A) the specific gravity is 0.95 to 1.25 and (B) the flexural modulus is 2,200 to 3,500 MPa. Hard disk board.
24. 磁性膜形成面における中心線平均粗さ (Ra) が 2 nm以下である請求項 19記載のハードディスク基板。 24. The hard disk substrate according to claim 19, wherein the center line average roughness (Ra) on the surface on which the magnetic film is formed is 2 nm or less.
25. 磁性膜形成面における円周方向の平面度が、 10 m以下である請求項 1 9記載のハードディスク基板。 25. The hard disk substrate according to claim 19, wherein a flatness in a circumferential direction on a magnetic film forming surface is 10 m or less.
26. 磁性膜形成面において、 高さ 25 nm以上の粗大突起が実質的に存在しな い請求項 19記載のハードディスク基板。 26. The hard disk substrate according to claim 19, wherein substantially no coarse protrusions having a height of 25 nm or more are present on the surface on which the magnetic film is formed.
27. 該樹脂は、 線膨張係数が 6. 5X 10_5d e g 1以下である請求項 19 記載のハードディスク基板。 27. The hard disk substrate according to claim 19, wherein the resin has a linear expansion coefficient of 6.5 × 10 5 deg 1 or less.
28. 該榭脂は、 塩素含有量が 10 ppm以下である請求項 19記載のハードデ イスク基板。 28. The hard disk substrate according to claim 19, wherein the resin has a chlorine content of 10 ppm or less.
29. 請求項 19記載のハードディスク基板の表面に磁性膜を形成させたハード ディスク。 29. A hard disk having a magnetic film formed on a surface of the hard disk substrate according to claim 19.
3 0 . 請求項 1 9記載のハードディスク基板の表面に磁性膜を形成させたビデオ 用ハ一ドディスク。 30. A video hard disk in which a magnetic film is formed on the surface of the hard disk substrate according to claim 19.
PCT/JP2001/010847 2000-12-26 2001-12-11 Substrates for hard disks and hard disks WO2002052550A1 (en)

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JPS61281114A (en) * 1984-12-14 1986-12-11 Toray Ind Inc Resin for information recording material and production thereof
JPS6397627A (en) * 1986-10-14 1988-04-28 Sony Corp Optical information recording medium
JPH0288634A (en) * 1988-08-12 1990-03-28 Bayer Ag Dihydroxydiphenylcycloalkane
JPH06267060A (en) * 1993-03-16 1994-09-22 Konica Corp Magnetic recording medium
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JPH0827370A (en) * 1994-07-12 1996-01-30 Teijin Chem Ltd Aromatic polycarbonate composition
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