WO2001095361A2 - Method of producing rib plasma for display panel substrate - Google Patents
Method of producing rib plasma for display panel substrate Download PDFInfo
- Publication number
- WO2001095361A2 WO2001095361A2 PCT/US2001/018209 US0118209W WO0195361A2 WO 2001095361 A2 WO2001095361 A2 WO 2001095361A2 US 0118209 W US0118209 W US 0118209W WO 0195361 A2 WO0195361 A2 WO 0195361A2
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- WO
- WIPO (PCT)
- Prior art keywords
- glass
- rib
- photosensitive
- paste
- ceramic paste
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/241—Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
- H01J9/242—Spacers between faceplate and backplate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
- C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/36—Spacers, barriers, ribs, partitions or the like
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/335—Reverse coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/36—Spacers, barriers, ribs, partitions or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
- H01J2211/444—Means for improving contrast or colour purity, e.g. black matrix or light shielding means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Definitions
- the present invention relates to a method of producing a plasma display panel (hereinafter also referred to as "PDP", merely) substrate and, more particularly, to a method of producing a rib for PDP substrate, capable of providing an image having high brightness and high contrast to PDP.
- PDP plasma display panel
- PDP is equipped with a PDP substrate and the PDP substrate is composed of a pair of glass flat panels (glass bases) facing each other at a distance via ribs each having a predetermined dimension (also referred to as a barrier rib, bulkhead or barrier).
- a barrier rib also referred to as a barrier rib, bulkhead or barrier.
- space between a pair of glass panels is partitioned in an air-tight manner to form a plurality of discharge display cells capable of containing a gas such as neon, helium or xenone as a discharge gas.
- a panel at the displayed image place side is referred to as a "front panel”, while a panel at the opposite side is referred to as a “back panel”, generally.
- front panel and back panel • are generically referred to as a "base”.
- Unexamined Patent Publication (Kokai) No. 10-321143 has suggested a structure wherein colored patterns for respective luminescent colors are formed on a front panel at the position corresponding to the luminescent colors and black strips are provided at the position on the front panel made in contact with rib top portions as a boundary of the colored patterns.
- the steps are complicated, because the black strips etc. with high size-accuracy must be formed on the front panel and ribs of the front panel and those of the back panel must be positioned accurately.
- Unexamined Patent Publication (Kokai) No. 10-172442 discloses a substrate for plasma display panel comprising a glass base and a rib (bulkhead) formed on the glass base, wherein the rib top portion is black and the rib bottom portion is white or transparent. That is, lowering of the contrast is prevented by inhibiting external light reflection from the rib top portion and lowering of the brightness due to absorption of emitted light is inhibited by whitening the bottom portion.
- a screen printing method and photolithography method are employed as a method of forming a bulkhead of such a substrate for plasma display. These methods have such drawbacks that a drying step is required before coating the next layer on the coated layer and the time loss is large.
- the screen printing method had such a problem that the size and shape accuracy are poor, while the photolithograpy methods has such a problem that a developing step is required for patterning, as well as plural coating and exposure steps.
- An object of the present invention is to provide a method of forming a rib having an effective structure to realize PDP having high brightness and high contrast on a glass base in a manner which is more simple and accurate than conventional manners.
- a method of producing a rib for a plasma display panel substrate which comprises the steps of:
- Such a method does not require any drying step and can conduct a production process within a very short time because the first paste with which the mold was filled can be solidified by curing. Since the rib is formed by partially filling the groove portion of the mold previously with the first photosensitive paste and filling the same mold with the second paste, the accuracy of the size and shape of the rib is as high as on formation of the rib with a single color. Furthermore, since the groove portion of the mold is partially filled with the first photosensitive paste, previously, and then the same mold is filled with the second paste, neither positioning of the rib white portion with rib black portion, nor positioning of the rib white portion with black portion colored on the front panel, which was required in the prior art, is required.
- the rib for PDP substrate with high brightness and high contrast can be obtained in a simple and accurate manner.
- the glass flat pate at the display surface side of the PDP substrate is referred to as a "front panel”, while the glass panel at the opposite side is referred to as a "back panel”.
- these front panel and back panel are generically referred to as a "base” or a "glass base”.
- the rib in the present invention can be formed by sintering a rib precursor molded article obtained by curing a photosensitive glass-ceramic paste capable of curing by radiation (for example, ultraviolet light, electron beam or visible light).
- the rib precursor molded article is composed of two layers, e.g. a layer of a cured photosensitive black glass-ceramic paste and a layer of cured photosensitive white glass-ceramic paste.
- the rib composed of two black and white layers obtained by sintering is formed in the form of a base with a rib, which is integrally attached to one of bases of the back panel and front panel.
- the rib formed by the present invention is composed of a black layer as a top layer and a white layer as a bottom layer.
- the rib is composed of a white layer as a top layer and a black layer as a bottom layer. That is, the PDP substrate comprises a black layer at the display surface side and a white layer at the back panel side.
- the photosensitive glass-ceramic paste basically contains a ceramic component, a glass component and a curable binder component.
- the ceramic component serves to afford a predetermined shape to the rib and is a powdered or granular inorganic oxide or a mixture thereof.
- the glass component is usually in a powdered or granular form, and basically serves to fill the space between the ceramic components thereby to afford a dense structure to the rib and to further enhance the strength of the rib.
- the black and white photosensitive glass-ceramic pastes are not specifically limited as far as they can form a rib composed of black and white layers after sintering. For example, black and white ceramic components or glass components are selected.
- the component having a white color includes, but is not limited to, alumina, titania and, low-melting glass fiber.
- the component having a black color includes oxides of metals such as ruthenium (Ru), manganese (Mn), nickel (Ni), chromium (Cr), iron (Fe), cobalt (Co) and copper (Cu).
- the commercially available glass-ceramic component for forming the black paste includes RFB-030 manufactured by Asahi Glass Co., Ltd. as a mixed powder of lead glass and ceramic (copper oxide and chromium oxide), while the commercially available glass-ceramic component for forming the white paste includes RFW-030 manufactured by Asahi Glass Co., Ltd. as a mixed powder of lead glass and ceramic (alumina and titania).
- the glass component may be any glass suited for rib formation. Examples thereof include low-melting glass containing lead oxide as a principal component. However, such a glass generally has a large refractive index. Therefore, it is difficult to cure the photosensitive glass-ceramic paste by radiation.
- the glass component preferably has the same thermal expansion coefficient as that of a conventional glass base at the sintering temperature so as not to cause defects such as crack, breakage and chap on sintering.
- a glass component comprising 70 to 95 wt% of phosphorous oxide (P 2 O 5 ) and zinc oxide (ZnO), as a principal component, and further comprising 0.3 to 10 mol% of aluminum oxide (Al 2 O 3 ), 0 to 5 mol% of barium oxide (BaO), 0 to 3 mol% of iron oxide (Fe 2 O 3 ), 40 to 55 mol% of phosphorous oxide (P 2 O 5 ), 0 to 5 mol% of silicon oxide (SiO 2 ), 30 to 55 mol% of zinc oxide (ZnO), 0 to 3 mol% of tin oxide (S11O), 0 to 5 mol% of calcium oxide (CaO), 0 to 5 mol% of magnesium oxide (MgO), 0 to 5 mol% of strontium oxide (SrO), 0 to 5mol% of boron oxide (B 2 O 3 ), and 0 to 5 mol% of sodium oxide (Na 2 O).
- Al 2 O 3 aluminum oxide
- the glass component having such a composition has a softening point of 450 to 570 °C, which is lower than that of a soda-lime glass having an annealing point of 550 ° C and that of a high-distortion point glass having an annealing point of 620 °C. Further, refractive index of the glass component is no more than 1.6, which is relatively low. As a result, radiation curing of the paste is easy. Further, even when this glass component flows by being heated together with the glass flat panel, to fill the space between the ceramic components, thermal deformation of the glass flat panel is prevented.
- the ceramic component is usually an inorganic oxide or a mixture thereof, and suitable inorganic oxide component includes, for example, aluminum oxide (alumina), silicon dioxide, titanium oxide (titania) and wollastonite.
- suitable inorganic oxide component includes, for example, aluminum oxide (alumina), silicon dioxide, titanium oxide (titania) and wollastonite.
- Such an inorganic oxide component can afford a high strength to the resulting rib because of its high hardness.
- an attention must be paid so that the paste is not excessively whitened by the above inorganic oxide.
- Preferred curable binder component for forming the photosensitive paste includes, but is not limited, to bisphenol A diglycidyl ether (meth)acrylic acid adduct, Epolite 1600 acrylic acid adduct, Epolite 3002 acrylic acid adduct, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate or triethylene glycol dimethacrylate, or a mixture thereof.
- These binder components are cured by irradiating with radiations such as ultraviolet light, electron beam and visible light, thereby making it possible to form a polymer compound having a network, and the ceramic component is uniformly contained and retained in the network.
- a curing initiator is usually used to cure the binder component.
- the binder component is made of a mixture of a bisphenol A diglycidyl ether methacrylic acid adduct and triethylene glycol dimethacrylate, it is possible to afford a sufficient strength to a rib precursor molded article after curing and to remove the resulting molded article without causing chap on sintering.
- a network which contains and retains the ceramic component, can be formed by silicon dioxide having a comparatively high melting point after sintering. Such a network is substantially maintained even when heated unless the temperature reaches the melting point of silicon dioxide. Accordingly, a change in volume of the rib does not occur substantially before and after sintering and the degree of the change is small, if any.
- Preferred binder component of the silane coupling agent includes, for example, ⁇ -methacryloxypropylmethyltrimethoxysilane, ⁇ - methacryloxypropylmethyldimethoxysilane, ⁇ -methacryloxypropyltriethoxysilane and ⁇ - methacryloxypropylmethyldiethoxysilane in view of availability, each of which has a molecular weight of 232 to 290.
- mineral acids such as hydrochloric acid and nitric acid may be further contained, if necessary. The mineral acid contributes to hydrolysis of the silane coupling agent, thereby making it possible to convert this composition into a sol.
- the composition converted into the sol is not gelled by drying, thereby making it possible to disperse the ceramic component and glass component.
- the binder component used in the present invention is not limited to those described above, and may be those which are not sensitive to radiations, such as cellulose-based polymer, polystyrene, butadiene-styrene copolymer, polyamide or polyether. Such a binder component is usually used in the state of being dissolved in a volatile solvent.
- the binder component preferably has a burn-off temperature lower than the softening point of the glass component.
- an oxidizing catalyst is further contained in the photosensitive paste containing the above-described binder component.
- Such an oxidizing catalyst is usually made of oxides, salts or complexes of chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), indium (In), tin (Sn), ruthenium (Ru), rhodium (Rh), palladium (Pd), silver (Ag), iridium (Ir), platinum (Pt), gold (Au) or cerium (Ce), and can reduce energy (temperature) required to burn-off of the binder component.
- sintering temperature must be higher than the burn-off temperature of the binder component.
- a temperature required for sintering is lowered.
- thermal deformation e.g. warpage, deflection or shrinkage
- the selectivity of a glass component is wider.
- an attention must be paid so that the paste is not excessively colored by the above oxidizing catalyst.
- the composition for forming a rib contains the above-described silane coupling agent as the binder component
- mineral acids such as hydrochloric acid and nitric acid may be further contained.
- the mineral acid can convert the composition into a sol by hydrolysis of the silane coupling agent.
- the sol is not gelled even if this composition is dried, thereby making it possible to disperse the inorganic component composed of the ceramic component and glass component.
- the viscosity does not depend on the amount of water.
- the glass base can be a base used generally in a PDP substrate and is preferably made of a commercially available soda-lime glass.
- Fig. 1 is a flow sheet showing the steps of producing the substrate for PDP in order.
- the embodiment wherein the glass base is a back panel will be described below, but the glass base can also be a front panel.
- the following photosensitive black glass-ceramic paste is replaced by the photosensitive white glass- ceramic paste, while the photosensitive white glass-ceramic paste is replaced by the photosensitive black glass-ceramic paste.
- a mold 1 having a groove portion 6 corresponding to the shape of a rib of a PDP substrate is prepared.
- the mold 1 is preferably obtained by molding a curable component, for example, an acrylic monomer or oligomer such as urethane acrylate, polyester acrylate or polyether acrylate, or a monomer or oligomer of styrene, and radiation polymerizing in the presence of a curing initiator.
- the resulting mold 1 does not require cutting on production thereof.
- the above-described radiation polymerization proceeds comparatively quickly.
- the groove portion 6 of the mold 1 is partially filled with the photosensitive black glass-ceramic paste 2, and then the paste is cured by irradiation of radiation.
- the photosensitive white glass-ceramic paste is supplied on the back panel 12 on which an address electrode 20 has previously been formed in a stripe form, and then the mold 1 and back panel 12 are laminated with each other through the paste 3 after accurate positioning to form a laminate.
- the mold 1 is made of a curable component as described above, the pliability is imparted.
- the mold 1 can be made contact with the paste 3 from one end of the back panel 12 by deflecting the mold 1. Accordingly, an air between the back panel 12 and paste 3 is efficiently removed out of the exterior and infiltration of the air into the paste 3 is also avoided.
- the protruding portions of the mold 1 and back panel 12 are preferably laminated each other at a fixed distance. Consequently, a dielectric layer is formed on the address electrode 20 and the address electrode 20 is coated, thereby making it possible to prolong lifetime of PDP due to inhibition of sputtering of the address electrode 20.
- the white paste 3 is irradiated with light (hv), thereby to cure the binder component due to polymerization.
- a rib precursor molded article 4 is obtained.
- the polymerization is basically conducted only by radiation and does not require heat management whose control is difficult, in principle.
- the mold 1 is made of the above-described curable component, it becomes transparent. Accordingly, irradiation can be conducted simultaneously via not only the back panel 12 but also the mold 1. That is, irradiation with light can be conducted from both surfaces. In such case, the black paste 2, which exists in the depths of the groove portion 6, is cured more certainly and the uncured binder component is not remained at the free end of the rib precursor molded article 4. Furthermore, substantially uniform mechanical strength is afforded to the rib precursor molded article 4.
- the mold 1 is removed from the back panel 12 and rib precursor molded article 4 and the rib precursor molded article 4 is removed from the mold 1 while transferring the rib precursor molded article 4 integrally to the back panel 12.
- the mold 1 is made of the curable component as described above, the mold has a lower hardness than that of general glass or ceramic.
- breakage of the rib and base can be avoided. As a result, the mold 1 can be used repeatedly without being washed.
- both of the rib precursor molded article 4 and back panel 12 are put in a sintering oven (not shown) and sintered at 350 to 600 °C to obtain a back panel with a rib.
- the rib and back panel 12 are then cooled.
- degree of shrinkage is not the same and, therefore, defects such as crack are introduced into the rib 16 or the back panel 12 is bent in the protruding form.
- the oxidizing catalyst is contained in the paste as described above, it becomes possible to sintering the molded article 4 at a comparatively low temperature.
- a transparent front panel on which a bus electrode has previously been formed, can be disposed to face with the back panel via a rib a fluorescent layer after a fluorescent layer was formed between ribs on the back panel.
- the peripheral portions of the front panel and back panel may be sealed in an air-tight manner by using a sealing material, thereby forming a discharge display cell between the front panel and back panel.
- a discharge gas may be introduced into the discharge cell to make a PDP substrate.
- the curing initiator of the above-described mold 1 is not specifically limited, but preferably has an absorption edge at a wavelength shorter than that of the curing initiator to be added in the binder component.
- the curing initiator in the mold 1 can not absorb radiation having a wavelength longer than that of the absorption edge.
- the curing agent of the binder component can absorb such radiation.
- absorption edge refers to a portion of wavelength wherein an absorbency in a continuous absorption spectrum of radiation rapidly decreases when the wavelength becomes longer than said wavelength, resulting in substantially transparent state.
- the mold 1 may be subjected to antistatic finish to reduce the surface resistance. In such case, even if dusts charged on the periphery of the mold 1 float, its adhesion can be inhibited. As a result, defects to be introduced into the rib can be reduced. It becomes unnecessary to prevent dusts from adhering by specially storing the mold 1 in a clean room. It substantially becomes unnecessary to remove dusts from the mold before use of the mold 1. That is, handling of the mold becomes simple, which leads to an improvement in productivity.
- the antistatic finish of the mold 1 can be accomplished, for example, by dispersing a colorless medium of propylene carbonate, lactone or ethylene glycol or a derivative thereof, and an ionic conductive substance which can be ionized by dissolution into the medium, such as lithium perchlorate.
- FIG. 2 A partially exploded perspective view of Fig. 2 schematically shows one embodiment of the PDP substrate produced by using the rib formed by the method according to the present invention.
- a PDP substrate 10 is used for so-called a.c. PDP substrate, but is also applied to a d.c. PDP substrate.
- the PDP substrate 10 is equipped with transparent glass flat panels which are facing each other at a distance, i.e. a back panel 12 and a front panel 14.
- the back panel 12 and front panel 14 are preferably made of easily available soda-lime glass.
- plural ribs 16 having a predetermined size are provided to partition the space between them, thereby making it possible to form a plurality of discharge display cells 18.
- an address electrode 20 is provided on the back panel 12 along the rib 16.
- a transparent bus electrode 22 made of an indium tin oxide (ITO) is provided vertically to the rib 16.
- a discharge gas such as neon, helium, xenone or the like is contained between the address electrode 20 and bus electrode 22, thereby making it possible to emit light by discharge.
- a dielectric layer 21 made as described above is provided on the back panel 12 and address electrode 20, a dielectric layer 21 made as described above is provided.
- a fluorescent layer 24 is provided in a predetermined order, thereby making it possible to perform color display.
- a transparent dielectric layer 26 is provided, if necessary.
- the address electrode 20 and bus electrode 22 are coated with the dielectric layers 21 and 26, thereby making it possible to prolong lifetime of PDP by inhibition of sputtering of the address electrode 20 and bus electrode 22.
- This solution was cured by irradiation with UN having a wavelength of 200 to 450 nm for 30 seconds, using a UN light source manufactured by Ushio Co., Ltd. to make a mold.
- a black photosensitive glass-ceramic paste was prepared by mixing a mixture of 10 g of a bisphenol A glycidyl ether methacrylic acid adduct (manufactured by Kyoeisha Chemical Co., Ltd.) and 10 g of triethylene glycol dimethacrylate (manufactured by Wako Pure Chemical Industries, Ltd.) as a curable resin, 20 g of 1,3-butanediol (manufactured by Wako Pure Chemical Industries, Ltd.) and 10 g of acetone (manufactured by Wako Pure Chemical Industries, Ltd.) as a diluent, 0.1 g of Irgacure 819 [bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, manufactured by Ciba-Gigy Co.] as a curing initiator, 0.2 g of so-called POCA (phosphate propoxylalkyl polyol) as a surfactant, and 150
- a white photosensitive glass-ceramic paste was prepared by mixing a mixture of 10 g of a bisphenol A glycidyl ether methacrylic acid adduct (manufactured by Kyoeisha Chemical Co., Ltd.) and 10 g of triethylene glycol dimethacrylate (manufactured by Wako Pure Chemical Industries, Ltd.) as a curable resin, 20 g of 1,3-butanediol (manufactured by Wako Pure Chemical Industries, Ltd.) as a diluent, 0.1 g of Irgacure 819 [bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, manufactured by Ciba-Gigy Co.] as a curing initiator, 0.2 g of so-called POCA (phosphate propoxylalkyl polyol) as a surfactant, and 150 g of a mixed powder of lead glass and ceramic (PFB-030, manufactured by Asahi
- the groove portion of the mold was partially filled with the black photosensitive glass-ceramic paste.
- a soft paper was used to wipe off excess paste.
- the mold filled with the black paste was cured by irradiated with light having a wavelength of 400 to 500 nm (fluorescent lamp manufactured by Philip Co.) for one minute.
- the white photosensitive glass-ceramic paste was coated on a glass base, and then the mold filled with the cured black paste and glass base were laminated with each other.
- the resulting laminate was irradiated with light having a wavelength of 400 to 500 nm (fluorescent lamp manufactured by Philip Co.) for three minutes.
- the mold was removed from the glass base, thus making it possible to form a rib precursor molded article composed of a black upper portion and a white lower portion on the glass base. Furthermore, the rib precursor molded article was sintering with heating to 550 °C, thus making it possible to form a rib composed of a black upper portion and a white lower portion.
- the same mold for rib and glass-ceramic pastes as those in the example were used.
- a mold was filled with a black paste. After the mold with the paste was allowed to stand at room temperature for 15 minutes, a white paste was coated on a glass base, and then the mold and glass base were laminated with each other. After the resulting laminate was irradiated with light having a wavelength of 400 to 500 nm for three minutes, the mold was removed from the glass base. In this case, the black paste was mixed with the white paste, thus making it impossible to form a rib composed of a black upper portion and a white lower portion on the glass base.
- a rib for PDP substrate having high brightness and high contrast can be produced in a short time, and the size and shape of the resulting rib for PDP substrate have high accuracy.
- a complicated operation such as positioning of a rib white portion and a rib black portion is not required.
- Fig. 1 is a flow sheet showing the steps of producing the rib for PDP substrate in order.
- Fig. 2 is a partially exploded perspective view showing schematically one embodiment of a PDP substrate using the rib for PDP substrate according to the present invention.
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Abstract
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/258,684 US6821178B2 (en) | 2000-06-08 | 2001-06-06 | Method of producing barrier ribs for plasma display panel substrates |
KR1020027016159A KR100770230B1 (en) | 2000-06-08 | 2001-06-06 | Method of producing rib for plasma display panel substrate |
AU2001266724A AU2001266724A1 (en) | 2000-06-08 | 2001-06-06 | Method of producing rib plasma for display panel substrate |
EP01944298A EP1290710A2 (en) | 2000-06-08 | 2001-06-06 | Method of producing rib for plasma display panel substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-177174 | 2000-06-08 | ||
JP2000177174A JP3699336B2 (en) | 2000-06-08 | 2000-06-08 | Manufacturing method of rib for plasma display panel substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001095361A2 true WO2001095361A2 (en) | 2001-12-13 |
WO2001095361A3 WO2001095361A3 (en) | 2002-05-30 |
Family
ID=18678807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/018209 WO2001095361A2 (en) | 2000-06-08 | 2001-06-06 | Method of producing rib plasma for display panel substrate |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1290710A2 (en) |
JP (1) | JP3699336B2 (en) |
KR (1) | KR100770230B1 (en) |
AU (1) | AU2001266724A1 (en) |
WO (1) | WO2001095361A2 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001052299A2 (en) * | 2000-01-11 | 2001-07-19 | 3M Innovative Properties Company | Apparatus, mold and method for producing substrate for plasma display panel |
DE10200127A1 (en) * | 2002-01-04 | 2003-07-24 | Science Adventure Technology C | AC driven plasma display panel fabricating method, involves forming transparent and metal electrodes outside display panel and cutting groove on opposite of glass plate in parallel with each electrode to form discharge cell |
KR20030095617A (en) * | 2002-06-12 | 2003-12-24 | 삼성에스디아이 주식회사 | Rear plate for plasma display panel and method for fabricating thereof |
US6761607B2 (en) | 2000-01-11 | 2004-07-13 | 3M Innovative Properties Company | Apparatus, mold and method for producing substrate for plasma display panel |
WO2004066340A1 (en) | 2003-01-17 | 2004-08-05 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel |
WO2005019934A2 (en) * | 2003-08-22 | 2005-03-03 | 3M Innovative Properties Company | Precursor paste and method of producing the same |
US7033534B2 (en) | 2001-10-09 | 2006-04-25 | 3M Innovative Properties Company | Method for forming microstructures on a substrate using a mold |
EP1742246A2 (en) * | 2005-07-01 | 2007-01-10 | LG Electronics Inc. | Plasma display panel and method of manufacturing the same |
US7176492B2 (en) | 2001-10-09 | 2007-02-13 | 3M Innovative Properties Company | Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method |
EP1798747A2 (en) * | 2005-12-14 | 2007-06-20 | LG Electronics Inc. | Method for forming a dielectric layer in a plasma display panel |
EP1803692A1 (en) * | 2005-12-29 | 2007-07-04 | LG Electronics Inc. | Composition of paste, green sheet for barrier ribs of plasma display panel, and plasma display panel using the same |
EP1865532A2 (en) * | 2006-06-09 | 2007-12-12 | Lg Electronics Inc. | Plasma display apparatus |
US8298754B2 (en) * | 2003-11-25 | 2012-10-30 | Murata Manufacturing Co., Ltd. | Method for forming thick film pattern, method for manufacturing electronic component, and photolithography photosensitive paste |
CN115784606A (en) * | 2018-02-28 | 2023-03-14 | 旭硝子欧洲玻璃公司 | Glass composition with nickel to reduce energy consumption during its melting step |
Families Citing this family (6)
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JP4430898B2 (en) | 2003-07-24 | 2010-03-10 | パナソニック株式会社 | Partition transfer mold, plasma display panel, and transfer partition formation method |
JP2005259685A (en) * | 2004-02-09 | 2005-09-22 | Matsushita Electric Ind Co Ltd | Plasma display panel |
US20060238122A1 (en) * | 2004-02-09 | 2006-10-26 | Morio Fujitani | Plasma display panel |
TW200535901A (en) * | 2004-02-17 | 2005-11-01 | Tdk Corp | Method for producing spacer for flat panel display |
JP2006219660A (en) * | 2005-01-11 | 2006-08-24 | Jsr Corp | Inorganic powder-containing resin composition, transfer film, and method for producing plasma display panel |
KR100827381B1 (en) * | 2006-10-13 | 2008-05-07 | 엘지전자 주식회사 | Contrast ratio film of plasma display panel, plasma display panel using the same and manufacturing method thereof |
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EP0875915A2 (en) * | 1997-04-30 | 1998-11-04 | Kyocera Corporation | Method for manufacturing flat plate with precise bulkhead, flat plate with precise bulkhead, method for manufacturing plasma display unit substrate and plasma display unit substrate |
FR2763741A1 (en) * | 1997-05-22 | 1998-11-27 | Samsung Display Devices Co Ltd | Cover manufacture method for plasma display mechanism |
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JP3734337B2 (en) * | 1997-05-23 | 2006-01-11 | 大日本印刷株式会社 | Surface discharge AC plasma display panel |
JP2000040463A (en) * | 1998-07-23 | 2000-02-08 | Toray Ind Inc | Manufacture of display substrate |
JP2000090826A (en) * | 1998-09-17 | 2000-03-31 | Dainippon Printing Co Ltd | Method and device for forming barrier rib |
-
2000
- 2000-06-08 JP JP2000177174A patent/JP3699336B2/en not_active Expired - Fee Related
-
2001
- 2001-06-06 WO PCT/US2001/018209 patent/WO2001095361A2/en active Application Filing
- 2001-06-06 KR KR1020027016159A patent/KR100770230B1/en not_active IP Right Cessation
- 2001-06-06 EP EP01944298A patent/EP1290710A2/en active Pending
- 2001-06-06 AU AU2001266724A patent/AU2001266724A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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EP0875915A2 (en) * | 1997-04-30 | 1998-11-04 | Kyocera Corporation | Method for manufacturing flat plate with precise bulkhead, flat plate with precise bulkhead, method for manufacturing plasma display unit substrate and plasma display unit substrate |
FR2763741A1 (en) * | 1997-05-22 | 1998-11-27 | Samsung Display Devices Co Ltd | Cover manufacture method for plasma display mechanism |
Non-Patent Citations (1)
Title |
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PATENT ABSTRACTS OF JAPAN vol. 2000, no. 05, 14 September 2000 (2000-09-14) & JP 2000 040463 A (TORAY IND INC), 8 February 2000 (2000-02-08) * |
Cited By (23)
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WO2001052299A3 (en) * | 2000-01-11 | 2002-12-27 | 3M Innovative Properties Co | Apparatus, mold and method for producing substrate for plasma display panel |
US6761607B2 (en) | 2000-01-11 | 2004-07-13 | 3M Innovative Properties Company | Apparatus, mold and method for producing substrate for plasma display panel |
WO2001052299A2 (en) * | 2000-01-11 | 2001-07-19 | 3M Innovative Properties Company | Apparatus, mold and method for producing substrate for plasma display panel |
US7033534B2 (en) | 2001-10-09 | 2006-04-25 | 3M Innovative Properties Company | Method for forming microstructures on a substrate using a mold |
US7176492B2 (en) | 2001-10-09 | 2007-02-13 | 3M Innovative Properties Company | Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method |
DE10200127A1 (en) * | 2002-01-04 | 2003-07-24 | Science Adventure Technology C | AC driven plasma display panel fabricating method, involves forming transparent and metal electrodes outside display panel and cutting groove on opposite of glass plate in parallel with each electrode to form discharge cell |
KR20030095617A (en) * | 2002-06-12 | 2003-12-24 | 삼성에스디아이 주식회사 | Rear plate for plasma display panel and method for fabricating thereof |
EP1592038A1 (en) * | 2003-01-17 | 2005-11-02 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel |
WO2004066340A1 (en) | 2003-01-17 | 2004-08-05 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel |
EP1592038A4 (en) * | 2003-01-17 | 2008-08-27 | Matsushita Electric Ind Co Ltd | Plasma display panel |
WO2005019934A3 (en) * | 2003-08-22 | 2005-06-02 | 3M Innovative Properties Co | Precursor paste and method of producing the same |
WO2005019934A2 (en) * | 2003-08-22 | 2005-03-03 | 3M Innovative Properties Company | Precursor paste and method of producing the same |
US8298754B2 (en) * | 2003-11-25 | 2012-10-30 | Murata Manufacturing Co., Ltd. | Method for forming thick film pattern, method for manufacturing electronic component, and photolithography photosensitive paste |
EP1742246A2 (en) * | 2005-07-01 | 2007-01-10 | LG Electronics Inc. | Plasma display panel and method of manufacturing the same |
EP1879210A2 (en) * | 2005-07-01 | 2008-01-16 | LG Electronics, Inc. | Plasma display panel and method of manufacturing the same |
EP1879210A3 (en) * | 2005-07-01 | 2008-01-23 | LG Electronics, Inc. | Plasma display panel and method of manufacturing the same |
EP1742246A3 (en) * | 2005-07-01 | 2007-04-18 | LG Electronics Inc. | Plasma display panel and method of manufacturing the same |
EP1798747A3 (en) * | 2005-12-14 | 2008-08-20 | LG Electronics Inc. | Method for forming a dielectric layer in a plasma display panel |
EP1798747A2 (en) * | 2005-12-14 | 2007-06-20 | LG Electronics Inc. | Method for forming a dielectric layer in a plasma display panel |
EP1803692A1 (en) * | 2005-12-29 | 2007-07-04 | LG Electronics Inc. | Composition of paste, green sheet for barrier ribs of plasma display panel, and plasma display panel using the same |
EP1865532A2 (en) * | 2006-06-09 | 2007-12-12 | Lg Electronics Inc. | Plasma display apparatus |
EP1865532A3 (en) * | 2006-06-09 | 2009-08-26 | Lg Electronics Inc. | Plasma display apparatus |
CN115784606A (en) * | 2018-02-28 | 2023-03-14 | 旭硝子欧洲玻璃公司 | Glass composition with nickel to reduce energy consumption during its melting step |
Also Published As
Publication number | Publication date |
---|---|
WO2001095361A3 (en) | 2002-05-30 |
JP3699336B2 (en) | 2005-09-28 |
AU2001266724A1 (en) | 2001-12-17 |
EP1290710A2 (en) | 2003-03-12 |
JP2002008524A (en) | 2002-01-11 |
KR100770230B1 (en) | 2007-10-26 |
KR20030007743A (en) | 2003-01-23 |
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