WO2001065244A1 - Microwave plasma monitoring system for real-time elemental analysis - Google Patents

Microwave plasma monitoring system for real-time elemental analysis Download PDF

Info

Publication number
WO2001065244A1
WO2001065244A1 PCT/US2001/005092 US0105092W WO0165244A1 WO 2001065244 A1 WO2001065244 A1 WO 2001065244A1 US 0105092 W US0105092 W US 0105092W WO 0165244 A1 WO0165244 A1 WO 0165244A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
gas
sample gas
recited
conduit
Prior art date
Application number
PCT/US2001/005092
Other languages
French (fr)
Other versions
WO2001065244A9 (en
Inventor
Yixiang Duan
Original Assignee
The Regents Of The University Of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/580,100 external-priority patent/US6429935B1/en
Application filed by The Regents Of The University Of California filed Critical The Regents Of The University Of California
Priority to AU2001241527A priority Critical patent/AU2001241527A1/en
Publication of WO2001065244A1 publication Critical patent/WO2001065244A1/en
Publication of WO2001065244A9 publication Critical patent/WO2001065244A9/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Definitions

  • This invention relates to a method and apparatus for elemental analysis.
  • invention relates more particularly to a method and apparatus with microwave plasma
  • transition metals rare earth elements, actinides, or alkali and alkaline earth elements.
  • beryllium is extracted from beryl ore and converted to
  • the filters can be taken off location for ranges of time from minutes to hours.
  • Inductive plasma spectrometry has been used to analyze elements from a plasma
  • Microwave plasmas have been used for trace element monitoring. Microwave
  • inductively coupled plasma source atomic emission spectrometers for analysis.
  • invention has a concentric arrangement of plasma gas and sample gas conduits so as to
  • the multiple conduit apparatus of the invention comprises:
  • the microwave plasma torch can either be contained within a sealed housing or
  • the microwave plasma torch of this invention can be operated in ambient air at ambient pressures.
  • the microwave plasma torch of this invention can be operated continuously for
  • transition metals rare earth elements, actinides, and alkali and alkaline earth elements.
  • the invention apparatus can also be used to monitor for the presence of halogens, sulfur
  • the invention apparatuses and methods are more particularly useful for
  • Figure 1 is a schematic of an example invention device wherein no additional carrier gas is needed for transport of the sample to the plasma region;
  • Figure 2 is a schematic of an example of an invention device having three
  • Figure 3 is a flow chart showing process flow for use of the invention to monitor a
  • transition metals rare earth elements, actinides, or alkali and alkaline earth elements
  • sample gas generally ambient air
  • microwave plasma torch can be operated in either an
  • Figure 1 is a schematic drawing of an apparatus which can be used to analyze air
  • a plasma torch 10 is
  • sealed housing L2 is useful when the sample gas (the air or other gas containing the sample gas).
  • analyte to be monitored is to be sucked or drawn through the microwave plasma torch K
  • a pump j_8 is
  • a sealed housing 2 can also be useful if the invention apparatus is to be used in a
  • any combination thereof is positioned downstream or upstream of the plasma torch, any combination thereof.
  • the sample gas to be tested is circulated through the sample gas conduit 20 into the plasma torch K).
  • the sample gas conduit 20 has an open upper end 22 where, in the
  • the negative pressure in the sealed housing L2 causes the sample gas to circulate upward into the plasma region 16.
  • the sample gas conduit 20 does not necessarily have to be made of an electrically
  • Suitable materials include, but are not limited to, copper, brass, aluminum, alumina,
  • the flow rate of the sample gas can be controlled by any suitable means such as a
  • sample gas and the plasma gas can be introduced
  • sample gas to be monitored or tested can be pretreated as needed.
  • sample gas conduit 20 to dry the sample gas before introduction of the sample gas into
  • sample gas conduit 20 so that the sample gas to be tested is circulated through the
  • membraneous conduit 24 The membraneous conduit 24 is encased in a larger conduit 26
  • dryers in series in the sample gas conduit can be employed as needed.
  • Any suitable means for delivering the plasma gas into the plasma formation area is any suitable means for delivering the plasma gas into the plasma formation area
  • Pressurized plasma gas can be released into the plasma gas conduit, or
  • plasma gas can be pumped into the plasma gas conduit.
  • the flow rate of the plasma gas can be controlled by any suitable means such as a
  • a flowmeter in the conduit transporting the plasma gas into the plasma torch is used.
  • a flow rate in the range from about 0.1 liter per minute to about 10 liters per minute can be used,
  • plasma gas flow rate in the range from about 0.05 liter per minute to about 4.0 liters per
  • sample gas and the plasma gas can be
  • the plasma gas is
  • sample gas and plasma gas conduits can be any convenient length from only
  • plasma gas has a smaller diameter than the sample gas conduit and coaxially positioned
  • the outermost conduit (which is the plasma gas conduit 30 in Figure 1 or the
  • the one with the smaller diameter must be made of an electrically conductive material
  • Suitable materials include, but
  • the innermost conduit (the sample gas conduit 20 in Figure 1 or the plasma gas
  • conduit can be made of any suitable conducting or nonconducting material, including,
  • Ceramic materials are useful as acous mixtures or alloys thereof, or quartz or ceramic materials. Ceramic materials are useful as acous mixtures or alloys thereof, or quartz or ceramic materials. Ceramic materials are useful as acous mixtures or alloys thereof, or quartz or ceramic materials. Ceramic materials are useful as acous mixtures or alloys thereof, or quartz or ceramic materials. Ceramic materials are useful
  • argon include, but are not limited to, argon, helium, nitrogen, or air, depending upon the sensitivity of monitoring needed and upon which analytes are being monitored in the
  • argon is generally
  • the plasma gas can be pumped through the plasma gas conduit inlet 36 into the
  • the plasma 'gas is introduced into the plasma gas conduit 30 from a
  • one hole (not shown) near the base of the sample gas conduit 20 can be used to allow a
  • sample gas pressure if greater than the sample gas pressure, can be used to accomplish intermingling of the plasma gas with the sample gas. Otherwise, pressure of the sample
  • conduit 20 by a Venturi effect.
  • a collar 40 of electrically conductive material is positioned
  • One or more refractory spacers are positioned between
  • the collar 40 needs to be close enough to the
  • reflector 42 is moveably, or more particularly, slidably, connected to the plasma gas
  • the conductance tube between the collar 40 and the microwave reflector 42 can be any conductance tube between the collar 40 and the microwave reflector 42.
  • the torch can be operated successfully with a conductance tube length equal to
  • One-quarter wavelength conductance tube lengths are presently preferred for enabling smaller
  • microwave reflector 42 Any suitable device or method can be used to move the microwave reflector 42
  • a microwave transmitter 48 through which microwave energy can be transmitted
  • the microwave transmitter 48 can be either a coaxial cable, waveguide, or other
  • sources include, but are not limited to, microwave oscillators, magnetrons, or klystron
  • microwave source Presently preferred as a microwave source is a magnetron because of the
  • the invention apparatus can be operated using low levels of microwave energy
  • source can be operated in pulsed or continuous wave mode. Energy levels in the range from about 20 to about 300 Watts can be used. Generally presently preferred are energy
  • An electrical semiconductor cooling chip or other suitable cooling device can be any suitable cooling device.
  • Microwaves in the range from about 1000 MHz to about 10,000 MHz can be used
  • microwaves in the range from
  • the plasma is initiated by contact of the plasma gas in the plasma region 16 with
  • plasma can be accomplished by any suitable means such as contacting the plasma gas in
  • the plasma region ⁇ 6 with energy from a tesla coil, a laser, UV radiation, or an electrical
  • the plasma initiator 54 has connected thereto an initiator energy
  • conductor can be simply an electrically conductive wire, or any other suitable means of
  • the plasma region L6 is generally in a naturally occurring flame shape or toroidal
  • microwave energy is highly focused there.
  • a chimney 58 may be used to shield the plasma region J_6 from air currents or
  • the chimney 58 may be made of any material
  • the chimney may be made of
  • quartz, glass or gallium can be used to shield the metal screen
  • the light in the plasma region ⁇ 6 is focused and collected by any suitable
  • focusing lenses optical filters, waveguides, and/or optical fibers can be employed.
  • optical filters optical filters, waveguides, and/or optical fibers
  • a collimating lens can be used to direct light from a side-on view of the plasma region into an optical fiber.
  • Any of several types of transmitter can be used to transmit signals from the
  • analytical equipment are focusing lens and fiber optic lines.
  • a light pipe Alternatively, a light pipe
  • a single signal transmitting line is usually sufficient, particularly when sampling
  • a plurality of transmission lines or other devices for transmission are provided.
  • the light from the plasma region ⁇ 6 is analyzed by any suitable means, depending on
  • CCD CCD
  • mass spectrometer Generally presently preferred when analyzing
  • CCD detector or a monochronometer with a photomultiplier tube detector.
  • element pixels is used for instantaneous measurements of analyte signals.
  • resistance also could be used for signal analysis.
  • instruments 60, 62, and 64 receive signals from the plasma region 16 through three fiber
  • optic lines 66, 68, and 70 which each have one end proximate to the quartz glass chimney
  • each of the signal transmitting lines are positioned proximate to
  • Portable computing devices are
  • sampling frequency DAQ-700 card can be used to show a real time spectrum on its screen
  • a CBL-2-NI interface cable can be used to make a connection between
  • the invention device can be operated continuously for as long a period of time as
  • Any suitable carrier gas which is stable in monoatomic form and has potential for the plasma is any suitable carrier gas which is stable in monoatomic form and has potential for the plasma.
  • argon, helium, neon, xenon and krypton can be used.
  • diatomic nitrogen can also be used as the carrier gas.
  • a mixture of different carrier gases can also be used as the carrier gas.
  • sample gas introduction of the sample gas into the sample gas conduit.
  • carrier gas selected will depend upon the plasma gas used, analyte concentration, and the
  • a centermost first conduit 100 transports plasma gas to the center 102 of a plasma
  • sample gas conduit 106 positioned with respect to the centermost first conduit 100 so as to form an anulus 108 between the first conduit 100 and the second (sample gas) conduit 106.
  • conduit 106 is generally longer than the centermost, first conduit 100, with the end of the
  • sample gas conduit 106 extending upward beyond the end of the first conduit 100.
  • carrying plasma gas can have a plurality of openings 109 arranged about the
  • the second (sample gas) conduit 106 is in turn surrounded by a third (plasma)
  • conduit 110 which is larger in diameter than the second conduit 106 and coaxially
  • third conduit 110 is generally the same length as the second conduit 106 so that the upper
  • a second portion of plasma gas is
  • the triple-conduit plasma torch T8 of this embodiment of the invention can be
  • inventions are set up and operated. Any suitable conventional microwave power
  • a microwave source 120 is connected to a conductive collar 122 using a microwave transmitter 124 or
  • the conductive collar 122 is positioned on the outer wall of
  • the sample gas conduit 106 is not
  • Microwaves from the microwave power source 120 are reflected by a
  • microwave reflector 126 located near the lower end of the three conduits at a distance
  • the microwave reflector 126 is
  • Instrumentation 136 for analyzing signals from the plasma region 104 is
  • a sample portion of the liquid is nebulized and/or desolvated to
  • the aerosol or gas sample is obtained.
  • the aerosol or gas sample is obtained.
  • FIG. 3 is a flow chart for one particular example of use of the invention to
  • nebulizers or from streams are transported into a nebulizer using a peristaltic or other suitable pump
  • the liquid sample is first nebulized in any convenient nebulizer
  • the ultrasonic nebulizer can be any suitable ultrasonic nebulizer to produce an aerosol.
  • the ultrasonic nebulizer can be
  • the aerosol is desolvated in a two-step desolvation process with
  • the sample is then transported to the plasma torch which is configured and
  • the nebulized sample can be transported with a carrier gas directly to the
  • plasma gas is combined with the nebulized sample as a carrier gas prior to further drying
  • the invention device is portable and can be operated in a continuous operation
  • Carrier gases although not necessary for air monitoring, can be used as needed
  • samples which can be air or gas samples, including aerosols, and airborne
  • Low power microwave plasmas can be used.
  • the invention instrument is less complex than other presently used air monitoring
  • metals rare earth elements, actinides, and alkali and alkaline earth elements.

Abstract

Ambient air is analyzed in a microwave induced palsma without use of an additional carrier gas. An apparatus is disclosed for analyzing ambient air, other sample gas, or nebulized and desolvated liquids wherein the arrangement of plasma gas and sample gas conduits (100, 106, 110) is used to enhance dependability of the plasma. The plasma torch (118) has a concentric arrangement of plasma gas and sample gas conduits (100, 106, 110) so as to provide a sheath of plasma gas both within and surrounding the flow of analyte into the plasma region (104). The microwave plasma torch (118) can either be contained within a sealed housing or can be operated in ambient air at ambient pressures. The microwave plasma torch (118) is portable and can be operated continuously for real-time analysis of air.

Description

MICROWAVE PLASMA MONITORING SYSTEM
FOR REAL-TIME ELEMENTAL ANALYSIS
This application claims the benefit of U.S. Provisional Application No. 60/186,428,
filed March 2, 2000, and U.S. Provisional Application No. 60/186,458, filed March 2,
2000.
TECHNICAL FIELD
This invention relates to a method and apparatus for elemental analysis. This
invention relates more particularly to a method and apparatus with microwave plasma
source for monitoring of air and liquid streams for elemental contaminants including
transition metals, rare earth elements, actinides, or alkali and alkaline earth elements.
This invention was made with government support under Contract No. W-7405-
ENG-36 awarded by the U.S. Department of Energy. The government has certain rights
in the invention.
BACKGROUND ART
Because of increasing global efforts to protect the environment and increasing
concerns for worker safety, there is increasing need for capability for real-time
monitoring of air and liquid streams for the presence of transition metals, rare earth elements, actinides, or alkali and alkaline earth elements. There is a continuing and
increasing need for sensitive, real-time, portable monitoring devices for detection of the
presence of elements in industrial waste streams.
In one particular example, beryllium is extracted from beryl ore and converted to
beryllium hydroxide for the production of metal alloys, oxides, ceramics, and pure
beryllium for use in various industries and military applications. Because of increased
regulatory activity and awareness of health hazards during extraction and production of
beryllium and during industrial and commercial use of beryllium products, it is important
to be able to accurately evaluate workplace explosures in a timely manner.
Several methods of monitoring air for the presence of beryllium or other trace
elements have been developed.
High volumes of air for 'sampling can be drawn through filters at high flow rates.
After ranges of time from minutes to hours, the filters can be taken off location for
laboratory analysis.
Inductive plasma spectrometry has been used to analyze elements from a plasma
produced by application of an electromagnetic field to a plasma gas; see e.g., U.S. Patent
4,844,612 (Durr and Rozain, July 4, 1989).
Microwave plasmas have been used for trace element monitoring. Microwave
plasmas sustained in a portion of an undiluted furnace exhaust flow have been used for
continuous emission monitoring for trace metals in furnace exhaust by atomic emission spectroscopy. These waveguide devices are constructed of refractory materials
compatible with high-temperature environments and are mountable inside the furnace
exhaust ducts. See, e.g., U.S. Patent 5,671,045 (Woskov, et al., September 23, 1997)
which is a continuation of U.S. Patent 5,479,254.
Fused quartz fiber optics in close proximity to a plasma flame have been used to
transmit UV through visible emissions to three spectrometers for simultaneous
monitoring of several metals. This is disclosed in Woskov, P. P., D. Y. Rhee, P. Thomas
and D. R. Cohn, "Microwave plasma continuous emissions monitor for trace-metals in
furnace exhaust," Rev. Sci. Instrum., 67 (10), October 1996, American Institute of
Physics).
Several methods of monitoring liquid streams have been disclosed in the
literature. These include introduction of vapors generated from liquids to be sampled into
inductively coupled plasma source atomic emission spectrometers for analysis.
However, there is still a need for sensitive, real-time, portable monitoring devices
for detection of the presence of elements in ambient air and liquid streams and a need for
economical, energy-efficient monitoring devices.
Therefore, it is an object of this invention to provide an apparatus and method for
analysis of air or liquid streams for presence of various elements. It is another object of this invention to provide such an apparatus and method
particularly for sensitive, real-time, on-site monitoring of air for the presence of
beryllium.
It is a further object of this invention to provide a reliable, low-energy microwave
plasma monitoring apparatus and method.
Additional objects, advantages and novel features of the invention will be set forth
in part in the description which follows, and in part will become apparent to those skilled
in the art upon examination of the following or may be learned by practice of the
invention. The objects and advantages of the invention may be realized and attained by
means of the instrumentalities and combinations particularly pointed out in the appended
claims which are intended to cover all changes and modifications within the spirit and
scope thereof. '
DISCLOSURE OF INVENTION
To achieve the foregoing and other objects, and in accordance with the purposes
of the present invention, as embodied and broadly described herein, there has been
invented a process for analyzing ambient air or other gas samples, in a microwave
powered plasma torch without use of an additional carrier gas. There has also been
invented an apparatus for analyzing ambient air, other gas samples, or nebulized and
desolvated liquids wherein a novel arrangement of plasma gas and sample gas conduits is used to enhance dependability of the plasma. This apparatus embodiment of the
invention has a concentric arrangement of plasma gas and sample gas conduits so as to
provide a sheath of plasma gas both within and on the outside of the flow of sample air
into the plasma region.
The multiple conduit apparatus of the invention comprises:
(a) a sample gas conduit positioned to conduct a flow of a sample gas to a
plasma region;
(b) a first plasma gas conduit coaxially positioned within the sample gas
conduit;
(c) a second plasma gas conduit positioned such that the sample gas conduit is
within the second plasma gas conduit;
(d) a microwave energy source sufficient to generate a plasma in the plasma
region;
(e) a microwave transmitter connecting said microwave energy source to the
second plasma gas conduit; and
(f) analytical instrumentation connected to receive signals from the plasma
region.
The microwave plasma torch can either be contained within a sealed housing or
can be operated in ambient air at ambient pressures. The microwave plasma torch of this invention can be operated continuously for
real-time analysis of air.
The apparatuses and methods of the present invention can be used wherever there
is a need for monitoring air for the presence of minor amounts of elements, particularly
transition metals, rare earth elements, actinides, and alkali and alkaline earth elements.
The invention apparatus can also be used to monitor for the presence of halogens, sulfur
and silicon. The invention apparatuses and methods are more particularly useful for
monitoring air for the presence of beryllium.
BRIEF DESCRIPTION OF THE DRAWINGS
The accompanying drawings, which are incorporated in and form a part of the
specification, illustrate embodiments of the present invention and, together with the
description, serve to explain the principles of the invention. In the drawings:
Figure 1 is a schematic of an example invention device wherein no additional carrier gas is needed for transport of the sample to the plasma region; and
Figure 2 is a schematic of an example of an invention device having three
concentrically arranged conduits to permit the sample gas flow into the plasma region to
be sheathed by two plasma gas flows.
Figure 3 is a flow chart showing process flow for use of the invention to monitor a
liquid stream. BEST MODES FOR CARRYING OUT THE INVENTION
It has been discovered that ambient air can be sampled and analyzed for presence
of transition metals, rare earth elements, actinides, or alkali and alkaline earth elements
without use of additional sample carrier gases. This can be done using a microwave
powered plasma torch with appropriately arranged conduits for the plasma gas and
sample gas (generally ambient air) using equipment small enough to be easily portable.
It is understood that the microwave plasma torch can be operated in either an
upright position with the plasma region above the gas conduits, in a sideways position
with the plasma region laterally positioned with respect to the gas conduits, or in an
upside down position with the plasma region below the gas conduits. An upright position
is generally presently preferred, and for convenience of description, the invention
appratus is shown in the drawings and described as being in the upright position, with
differences in equipment or arrangement of elements for other positions described when a
different position of the microwave plasma torch would make a difference. The terms
"above", "below", "upper", "lower", "at the top" and "at the bottom" will be used with the
understanding that an upright position has been selected merely for convenience of
description, not as a limitation. Figure 1 is a schematic drawing of an apparatus which can be used to analyze air
for the presence of elemental contaminants in a microwave powered plasma torch without
use of additional sample carrier gas. With reference to Figure 1, a plasma torch 10 is
positioned within a sealed housing 12 with a seal housing outlet conduit \Λ. Use of a
sealed housing L2 is useful when the sample gas (the air or other gas containing the
analyte to be monitored) is to be sucked or drawn through the microwave plasma torch K)
from the bottom to the top where the plasma region _16 is located. A pump j_8 is
positioned on a sealed housing outlet conduit 14 so as to provide a negative pressure
within the sealed housing 2 sufficient to draw the sample gas or plasma gas or both
through the device.
A sealed housing 2 can also be useful if the invention apparatus is to be used in a
harsh environment. Generally, *when a positive pressure of sample gas and plasma gas is
to be pumped through the apparatus from below, a sealed housing is not necessary.
Whether the pump is positioned downstream or upstream of the plasma torch, any
pump capable of maintaining the desired flow rates and which does not impede or
interfere with transport of the elements or particles contained within the sample gas can
be used.
The sample gas to be tested is circulated through the sample gas conduit 20 into the plasma torch K). The sample gas conduit 20 has an open upper end 22 where, in the
embodiment of the invention depicted in Figure 1 , the negative pressure in the sealed housing L2 causes the sample gas to circulate upward into the plasma region 16.
The sample gas conduit 20 does not necessarily have to be made of an electrically
conductive material, but it should be relatively inert to the air or other gas to be sampled.
Suitable materials include, but are not limited to, copper, brass, aluminum, alumina,
stainless steel, silver, gold, and mixtures and alloys thereof, and quartz and ceramic
materials.
The flow rate of the sample gas can be controlled by any suitable means such as a
flowmeter in the sealed housing outlet conduit j4 or, in the case of a positive pressure of
sample gas being introduced at the bottom of the plasma torch, a flowmeter in the conduit
20 through which the sample gas is being transported to the plasma torch 10. A flow rate
in the range from greater than 0 to about 10 liters per minute can be used, depending upon
the shape of the plasma desired, the kind of plasma gas employed, the size of the
conduits, the sensitivity desired, and the particle density in the sample gas. A sample gas
flow rate in the range from about 0.05 liter per minute to about 4.0 liters per minute is
generally presently preferred. The sample gas and the plasma gas can be introduced
simultaneously at different rates according to which flow rate ratios maximize stability of
the plasma and provide the amount of sample gas needed for accurate measurement of
elements therein. If desired, the sample gas to be monitored or tested can be pretreated as needed.
The example in Figure 1 depicts a dessicating system which can be incorporated in the
sample gas conduit 20 to dry the sample gas before introduction of the sample gas into
the plasma region |6. As shown in Figure 1, a membraneous conduit 24 is put into the
sample gas conduit 20 so that the sample gas to be tested is circulated through the
membraneous conduit 24. The membraneous conduit 24 is encased in a larger conduit 26
or molecular sieve which is filled with particles of a dessicant 28 such as calcium
carbonate, copper sulfate, or any suitable commercially available dessicant such as
Dryrite™.
Other methods of drying the sample gas, such as placing two or more commercial
dryers in series in the sample gas conduit, can be employed as needed.
If there is a very low concentration of the element to be monitored in the sample
gas, then it may be desired to concentrate the sample gas by using impact, electrostatic or
ultrasonic concentrators to obtain more accurate detection and measurement of the
element in the sample gas.
Any suitable means for delivering the plasma gas into the plasma formation area
can be used. Pressurized plasma gas can be released into the plasma gas conduit, or
plasma gas can be pumped into the plasma gas conduit.
The flow rate of the plasma gas can be controlled by any suitable means such as a
flowmeter in the conduit transporting the plasma gas into the plasma torch. A flow rate in the range from about 0.1 liter per minute to about 10 liters per minute can be used,
depending upon the shape of the plasma desired, the kind of plasma gas employed, the
size of the conduits, the sensitivity desired, and the analyte density in the sample gas. A
plasma gas flow rate in the range from about 0.05 liter per minute to about 4.0 liters per
minute is generally presently preferred. The sample gas and the plasma gas can be
introduced simultaneously at different rates according to which flow rate adjustments
maximize stability of the plasma and provide the amount of sample gas needed for
accurate measurement of elements therein.
In the embodiment of the invention shown in Figure 1, the plasma gas is
introduced into a plasma gas conduit 30 which is larger than and coaxially positioned
with respect to the portion of the sample gas conduit 20 in the plasma torch 10 so as to
provide a plasma gas cavity or anulus 34 between the outer wall of the sample gas
conduit 20 and the inner wall of the plasma gas conduit 30. The plasma gas conduit 30
has an inlet end 36 into which the plasma gas is introduced and an open upper outlet end
38 through which the plasma gas exits the plasma gas conduit 30 and enters the plasma
region 16.
The sample gas and plasma gas conduits can be any convenient length from only
2 cm long to as much as 200 cm long, depending upon space within which the plasma
torch is to be operated and the extent of portability desired. Generally, for operating the
plasma torch at 1/4 or 3/4 wavelength, a length from about 5 cm to about 15 cm is useful. Alternatively, in another embodiment of the invention, a conduit transporting the
plasma gas has a smaller diameter than the sample gas conduit and coaxially positioned
with respect to the sample gas conduit so as to form a sample gas cavity in the annulus
between the outer wall of the plasma gas conduit and the inner wall of the sample gas conduit.
The outermost conduit (which is the plasma gas conduit 30 in Figure 1 or the
sample gas conduit in the alternative in which the conduit transporting the plasma gas is
the one with the smaller diameter) must be made of an electrically conductive material
which is compatible with microwave energy transmission. Suitable materials include, but
are not limited to, copper, brass, alumina, stainless steel, silver, gold, and mixtures and
alloys thereof.
The innermost conduit (the sample gas conduit 20 in Figure 1 or the plasma gas
conduit in the alternative in which the plasma gas conduit is inside the sample gas
conduit) can be made of any suitable conducting or nonconducting material, including,
but not limited to, copper, brass, aluminum, alumina, stainless steel, silver, gold, and
mixtures or alloys thereof, or quartz or ceramic materials. Ceramic materials are useful
for withstanding erosion by sample gases.
Any gas which will form a plasma when excited by microwave energy, ignited,
then sustained by microwave energy, can be used as the plasma gas. Useful plasma gases
include, but are not limited to, argon, helium, nitrogen, or air, depending upon the sensitivity of monitoring needed and upon which analytes are being monitored in the
sample gas. Depending upon what kinds of analyzing or monitoring instruments are
used, it is desirable to select a plasma gas which will not produce background signals that
will make the analyte signals difficult to detect or read. For example, argon is generally
most useful when the sample gas is air which is being monitored for trace amounts of
beryllium because of the plasma temperatures and helium is generally most useful as a
plasma gas when the sample gas is air which is being monitored for trace amounts of
silicon because helium provides very high excitation energies.
The plasma gas can be pumped through the plasma gas conduit inlet 36 into the
plasma gas anulus 34 with a pump pushing it into or by simply relying upon the negative
pressure created in the sealed housing 2 to pull the plasma gas into the plasma region _16.
However, generally the plasma 'gas is introduced into the plasma gas conduit 30 from a
pressurized cylinder (not shown) and thus is under positive pressure as it enters the
plasma gas conduit 30 through the plasma gas conduit inlet 36.
In an alternative to the embodiment of the invention shown in Figure 1, at least
one hole (not shown) near the base of the sample gas conduit 20 can be used to allow a
portion of the plasma gas from the plasma gas conduit 30 to be admitted to the sample
gas conduit 20 so as to mix with the sample gas for transport up the sample gas conduit
20 to the plasma region. The positive pressure of the plasma gas from a pressurized
container, if greater than the sample gas pressure, can be used to accomplish intermingling of the plasma gas with the sample gas. Otherwise, pressure of the sample
gas flowing upward in the sample gas conduit 20 can pull plasma gas into the sample gas
conduit 20 by a Venturi effect.
Proximate to the upper end 22 of the sample gas conduit 20 and the upper end 38
of the plasma gas conduit 30, a collar 40 of electrically conductive material is positioned
around the plasma gas conduit 30. One or more refractory spacers are positioned between
the collar 40 and plasma gas conduit 30. The collar 40 needs to be close enough to the
upper end 22 of the plasma gas conduit 30 to permit effective delivery of microwave
energy to the plasma region 16 and to avoid setting up interferences in the microwaves
traveling longitudinally in the plasma torch 10.
In the embodiment of the invention shown in Figure 1, the plasma gas conduit 30
serves as the conductance tube for the microwave energy. A moveable microwave
reflector 42 is moveably, or more particularly, slidably, connected to the plasma gas
conduit 30, proximate to the lower end of the plasma gas conduit 30 so that the length of
the conductance tube between the collar 40 and the microwave reflector 42 can be
adjusted to a length equal to an odd number of quarter fractions of the wavelength. For
example, the torch can be operated successfully with a conductance tube length equal to
one fourth, three fourths, one and a fourth, one and three fourths, . . . of the wavelength of
microwave energy being used. It is generally presently preferred to use conductance tube
lengths precisely at the selected wave-length increments for better performance. One- quarter wavelength conductance tube lengths are presently preferred for enabling smaller
instrument size.
Any suitable device or method can be used to move the microwave reflector 42
along the length of the plasma gas conduit 30; for example, as shown in Figure 1, a screw
44 mounted on a base 46 can be used.
A microwave transmitter 48 through which microwave energy can be transmitted
connects a microwave source 50 to the conductive collar 40. The transmitter passes
through an opening 52 in the housing if housing is used.
The microwave transmitter 48 can be either a coaxial cable, waveguide, or other
suitable equipment for transmitting the microwaves from the microwave source 50 to the
collar 40.
Any suitable microwave1 source which can provide microwave energy in the
appropriate range can be used in the invention apparatuses. Generally useful microwave
sources include, but are not limited to, microwave oscillators, magnetrons, or klystron
generators. Presently preferred as a microwave source is a magnetron because of the
wide range of amounts of power which can be produced.
The invention apparatus can be operated using low levels of microwave energy,
depending upon what degree of sensitivity is needed, selected flow rates of plasma and
sample gases, choice of plasma gas and kind of analyte being monitored. The energy
source can be operated in pulsed or continuous wave mode. Energy levels in the range from about 20 to about 300 Watts can be used. Generally presently preferred are energy
levels in the range from about 100 to about 300 Watts when air is being monitored for
beryllium and argon is used as the plasma gas. Monitoring of samples from liquid
streams which have been nebulized and entrained in carrier gas has been successfully
conducted operating the plasma torch in the range from about 50W to about 200 W.
Appropriate adjustment of power to the torch can minimize reflected power, which is
typically less than 10W during operation.
An electrical semiconductor cooling chip or other suitable cooling device can be
used to take heat away from the plasma torch, thereby enabling operation at either high or
low power levels.
Microwaves in the range from about 1000 MHz to about 10,000 MHz can be used
to activate and sustain the plasma. Presently preferred are microwaves in the range from
about 2000 MHz to about 3000 MHz, and presently most preferred is a 2450 MHz
frequency.
The plasma is initiated by contact of the plasma gas in the plasma region 16 with
a sufficient amount of ignition energy to provide a seed electron. The initiation of the
plasma can be accomplished by any suitable means such as contacting the plasma gas in
the plasma region \6 with energy from a tesla coil, a laser, UV radiation, or an electrical
spark. In Figure 1 , the plasma initiator 54 has connected thereto an initiator energy
conductor 56 which extends through the wall of the sealed housing 2 into the plasma
region 16. Depending upon the type of plasma initiator used, the initiator energy
conductor can be simply an electrically conductive wire, or any other suitable means of
getting energy into the plasma region.
The plasma region L6 is generally in a naturally occurring flame shape or toroidal
shape situated above the upper aperture of the plasma gas conduit 30 because the
microwave energy is highly focused there.
A chimney 58 may be used to shield the plasma region J_6 from air currents or
outside gas and to contain and stabilize the plasma. The chimney 58 may be made of any
material which can withstand the plasma temperature and is transparent to the spectral
wavelength of the analytes being monitored. For example, the chimney may be made of
quartz, glass or gallium. Alternatively, if desired, a metal screen can be used to shield the
plasma.
The light in the plasma region \6 is focused and collected by any suitable
system, depending upon the system set up, what type of signal transmitter is used, and
what analysis equipment is used. Various combinations and configurations of optical
focusing lenses, optical filters, waveguides, and/or optical fibers can be employed. For
example, a collimating lens can be used to direct light from a side-on view of the plasma region into an optical fiber. In a presently preferred arrangement, a double lens focusing
is used to enlarge the beam collection angle.
Any of several types of transmitter can be used to transmit signals from the
plasma region to the analysis instrument. What is the most suitable transmitting
equipment will depend upon the choice of analytical instrumentation and the type,
wavelengths and intensity of the signal to be transmitted.
Generally useful for transmitting signals from the plasma region to an atomic
emission spectrometer, monochronometer with a photomultiplier detector or other
analytical equipment are focusing lens and fiber optic lines. Alternatively, a light pipe
can be used for directing light into a spectrometer. Electrically conductive wires
connected to electrodes on either side of the plasma region can be used for transmitting a
signal from the plasma region to a potentiometer.
A single signal transmitting line is usually sufficient, particularly when sampling
for only a single element or when sequential sampling capability is desired. However, in
some particular cases, a plurality of transmission lines or other devices for transmission
of the signals from the plasma region to the analyzing equipment can be used if needed
for a particular monitoring application. For example, atomic and ionic spectral lines have
different optimum observation heights and need to be monitored at different positions.
Also, elements with significant differences in chemical and physical properties may need
to be monitored using different equipment. The light from the plasma region \6 is analyzed by any suitable means, depending
upon the spectral wavelengths of the analytes and the desired speed of analysis. An
atomic emission spectrometer with a photomultiplier tube or a charge-coupled detector
(CCD) or mass spectrometer can be used. Generally presently preferred when analyzing
air for presence of trace amounts of beryllium is an integrated small spectrometer with a
CCD detector or a monochronometer with a photomultiplier tube detector. In another
generally presently preferred embodiment, when using argon plasma gas to monitor a
liquid stream for presence of beryllium, a dual channel spectrometer is used for optical
beam dispersal and signal measurement and a linear CCD array detector with 2048
element pixels is used for instantaneous measurements of analyte signals.
When it is already known what the analytes are and it is desired simply to
measure concentrations on a production basis, a potentiometer which measures electrical
resistance also could be used for signal analysis.
In the example embodiment of the invention shown in Figure 1, three analytical
instruments 60, 62, and 64 receive signals from the plasma region 16 through three fiber
optic lines 66, 68, and 70 which each have one end proximate to the quartz glass chimney
58 and are each connected by a distal end to one of the instruments 60, 62, and 64. Or, if
no chimney 58 is used, each of the signal transmitting lines are positioned proximate to
the plasma region _16. Any suitable computer control systems can be used for flow meter controls and
for processing data from the analytical instruments. Portable computing devices are
particularly useful when the invention apparatus is to be used for in-situ sampling or to be
transported to multiple sites.
Commercially available software can be used. For example, an OOIBAS 32-bit
software package can be used for all data acquisition and control and to provide a real¬
time interface to the signal processing function. A notebook computer with a 100 kHz
sampling frequency DAQ-700 card can be used to show a real time spectrum on its screen
and to store data. A CBL-2-NI interface cable can be used to make a connection between
the spectrometer and the computer.
The invention device can be operated continuously for as long a period of time as
desired with continuous readouts or recording of elements and amounts thereof in the
sample gas being circulated through the plasma torch.
It is generally sometimes preferred to not use a carrier gas for the sample to be
tested because use of the carrier gas would dilute the concentration of the analytes in the
air or other sample gas. However, a carrier gas can be used. This is sometimes done in
the embodiment of the invention in which the sample gas is sheathed by a plasma
envelope in order to maintain the energy density in the plasma region and to help stabilize
the plasma. Any suitable carrier gas which is stable in monoatomic form and has potential for
high energy in a plasma such as argon, helium, neon, xenon and krypton can be used.
Also, diatomic nitrogen can also be used as the carrier gas. A mixture of different carrier
gases can be used.
Generally it is better to use the same gas used as the plasma gas as a carrier gas
because the spectrum is simpler than that obtained with multiple gases.
When a carrier gas is used, it is mixed with the sample gas prior to or during
introduction of the sample gas into the sample gas conduit. The ratio of sample gas to
carrier gas selected will depend upon the plasma gas used, analyte concentration, and the
sensitivity required.
In another embodiment of the invention, a flow of the gas (usually air) to be tested
or monitored is conducted through the apparatus in such a manner as to be shielded or
enveloped by an active plasma on two sides of the sample gas entering the plasma region.
This can be done, for example, using three co-axially arranged tubes or conduits as shown
in Figure 2.
A centermost first conduit 100 transports plasma gas to the center 102 of a plasma
region 104 where it is in intimate contact with the air or gas to be sampled. The air or
other gas to be sampled is transported to the plasma region 104 through a second conduit 106 having a larger diameter than the centermost first conduit 100 and coaxially
positioned with respect to the centermost first conduit 100 so as to form an anulus 108 between the first conduit 100 and the second (sample gas) conduit 106. The sample gas
conduit 106 is generally longer than the centermost, first conduit 100, with the end of the
sample gas conduit 106 extending upward beyond the end of the first conduit 100. When
the sample gas conduit 106 longer than the first plasma gas conduit 100, there is some
mixing of the plasma gas from the first conduit 100 with the sample gas from the sample
gas conduit 106 prior to entry of the plasma gas and sample gas into the plasma region
104.
In an alternative embodiment, if desired, the innermost central conduit 100
carrying plasma gas can have a plurality of openings 109 arranged about the
circumference near the lower end of the conduit 100 for the purpose of allowing plasma
gas from the conduit 100 to be mixed with the sample gas in the sample gas conduit 106.
The second (sample gas) conduit 106 is in turn surrounded by a third (plasma)
conduit 110, which is larger in diameter than the second conduit 106 and coaxially
arranged with respect to the second conduit 106 so as to form an anulus 112 between the
outer wall of the second conduit 106 and the inner wall of the third conduit 110. The
third conduit 110 is generally the same length as the second conduit 106 so that the upper
ends of both are at approximately the same level. A second portion of plasma gas is
transported through the annulus 112 to the plasma region 104 where it forms an outer
sheath 114 about the air or other sample gas flow 116 into the plasma region 104. The triple-conduit plasma torch T8 of this embodiment of the invention can be
otherwise set up and operated in a manner similar to that in which the above-described
embodiments are set up and operated. Any suitable conventional microwave power
source 120 is connected to a conductive collar 122 using a microwave transmitter 124 or
any other suitable connector. The conductive collar 122 is positioned on the outer wall of
the outermost third conduit 110 near enough the upper ends of the three conduits to
permit excitation of the plasma proximate to the end where the plasma region 104 is to
form. There is a refractory spacer between the conductive collar 122 and the outer wall
of the third conduit 110. As in the other embodiments of this invention, it is generally
advantageous to have the upper ends of the plasma gas conduits 106 and 110 aligned
(extending to the same height) with each other. The sample gas conduit 106 is not
necessarily aligned with the plasma gas conduits 106 and 110, and is generally somewhat
longer than the plasma gas conduits 106 and 1]0 to allow some mixing of the sample gas
and plasma gas. Microwaves from the microwave power source 120 are reflected by a
microwave reflector 126 located near the lower end of the three conduits at a distance
from the conductive collar 122 equal to an odd number of quarters of the wavelength
being used for effective microwave energy resonance. The microwave reflector 126 is
mounted upon a base 128, such as, for example, a screw 130, in such a manner as to
permit adjustment of the distance between the collar 122 and the microwave reflector 126
by moving the microwave reflector 126 longitudinally on the three conduits. The plasma is initiated as described for other embodiments of the invention using
an initiator energy source 132 and an initiator energy conductor 134 which extends into
the plasma region 104.
Instrumentation 136 for analyzing signals from the plasma region 104 is
positioned so as to receive signals through, in this particular example, a fiber optic cable
138.
Choices of microwave power and wavelengths, plasma gas, plasma and sample
gas flow rates, and analytical instrumentation of the types described for the first
embodiments of the invention are used with this multiple-plasma-gas conduit
embodiment of the invention.
When it is desired to use any of the invention embodiments for monitoring and
analysis of liquid streams, a sample portion of the liquid is nebulized and/or desolvated to
obtain an aerosol or gas sample. For monitoring and testing, the aerosol or gas sample is
then processed in the manner described above.
Figure 3 is a flow chart for one particular example of use of the invention to
monitor and analyze a liquid stream. Samplings from standard solutions for calibration
or from streams are transported into a nebulizer using a peristaltic or other suitable pump
or a flow injection valve. The liquid sample is first nebulized in any convenient nebulizer
such as an ultrasonic nebulizer to produce an aerosol. The ultrasonic nebulizer can be
cooled using semiconductor chips rather than traditional water chiller methods. Then, in a second subsequent step, the aerosol is desolvated in a two-step desolvation process with
a membrane desolvator as a first stage and a sieve sorbent device as the second to further
dry the sample. The effectiveness of desolvation steps can be enhanced by "pre-heating
the aerosal. The sample is then transported to the plasma torch which is configured and
operated in accordance with any of the above-described invention embodiments.
Alternatively, the nebulized sample can be transported with a carrier gas directly to the
plasma torch without further drying.
In the particular example depicted in the flow chart of Figure 3, a portion of
plasma gas is combined with the nebulized sample as a carrier gas prior to further drying
of the sample gas. That provides for an intimate mixture of sample gas and plasma gas in
the plasma region.
The invention device is portable and can be operated in a continuous operation
mode, with a microwave plasma which can be sustained at approximately atmospheric
pressure. Carrier gases, although not necessary for air monitoring, can be used as needed
to deliver the samples, which can be air or gas samples, including aerosols, and airborne
particulates, through the sample gas conduit into the microwave plasma where they can
be analyzed in any of a variety of ways. Low power microwave plasmas can be used.
The invention instrument is less complex than other presently used air monitoring
systems, and can be more compact and convenient for on-site, real-time analysis. While the apparatuses and methods of this invention have been described in detail
for the purpose of illustration, the inventive apparatuses and methods are not to be
construed as limited thereby. This patent is intended to cover all changes and
modifications within the spirit and scope thereof.
INDUSTRIAL APPLICABILITY
The apparatus and method of this invention can be used wherever there is a need
for monitoring air for presence of minor amounts of elements, particularly transition
metals, rare earth elements, actinides, and alkali and alkaline earth elements.

Claims

WHAT IS CLAIMED IS:
1. An apparatus for elemental analysis comprising:
(a) a sample gas conduit positioned to conduct a flow of a sample gas
to a plasma region;
(b) a first plasma gas conduit coaxially positioned within said sample
gas conduit;
(c) a second plasma gas conduit positioned such that said sample gas
conduit is within said second plasma gas conduit;
(d) a microwave energy source sufficient to generate a plasma in the
plasma region;
(e) a micro Wave transmitter connecting said microwave energy source
to said second plasma gas conduit; and
(f) analytical instrumentation connected to receive signals from the
plasma region.
2. The apparatus recited in Claim 1 further comprising a sealed housing.
3. The apparatus recited in Claim 2 wherein said sealed housing has an outlet
conduit with a pump positioned thereon so as to provide a negative pressure within said
sealed housing.
4. The apparatus recited in Claim 1 wherein said sample gas conduit is made
from a material selected from the group of copper, brass, aluminum, alumina, stainless
steel, and mixtures and alloys thereof, and quartz and ceramic materials.
5. The apparatus recited in Claim 1 further comprising a flowmeter in said
sample gas conduit.
6. The apparatus recited in Claim 1 further comprising a flowmeter in said
first plasma gas conduit and a flowmeter in said second plasma gas conduit.
7. The apparatus recited in Claim 1 wherein each of said sample gas conduit,
said first plasma gas conduit and said second plasma gas conduit are in the range from
about 2 cm to 200 cm in length.
8. The apparatus recited in Claim 7 wherein said sample gas conduit is longer
than said first plasma gas conduit.
9. The apparatus recited in Claim 7 wherein said sample gas conduit is
substantially the same length as said second plasma gas conduit.
10. The apparatus recited in Claim 1 wherein said first plasma gas conduit is
made from a material selected from the group of copper, brass, aluminum, alumina,
stainless steel, silver, gold, and mixtures and alloys thereof, and quartz and ceramic
materials.
11. The apparatus recited in Claim 1 wherein said second plasma gas conduit is
made from a material selected from the group of copper, brass, aluminum, alumina,
stainless steel, silver, gold, and inixtures and alloys thereof, and quartz and ceramic
materials.
12. The apparatus recited in Claim 1 wherein said sample gas conduit has at
least one hole on its circumference near the base of said sample gas conduit connecting
said sample gas conduit with the annulus between said sample gas conduit and said
second plasma gas conduit.
13. The apparatus recited in Claim 1 wherein said first plasma gas conduit has
at least one hole on its circumference near the base of said first plasma gas conduit
connecting said first plasma gas conduit with the annulus between said first plasma gas
conduit and said sample gas conduit.
14. The apparatus recited in Claim 1 further comprising an electrically
conductive collar surrounding the outer surface of a first end of said second plasma gas
conduit, said collar connected to said microwave transmitter so as to direct microwaves
longitudinally in said second plasma gas conduit.
15. The apparatus recited in Claim 1 further comprising a moveable microwave
reflector moveably connected to said second plasma gas conduit proximate a second end
of said second plasma gas conduit.
16. The apparatus recited in Claim 1 wherein said microwave transmitter is a
coaxial cable.
17. The apparatus recited in Claim 1 wherein said microwave source is a
magnetron.
18. The apparatus recited in Claim 1 wherein said microwave source outputs
microwave energy in the range from about 20 to about 300 Watts.
19. The apparatus recited in Claim 1 wherein said microwave source outputs
microwave energy in the range from about 1000 MHz to about 10,000 MHz.
20. The apparatus recited in Claim 1 further comprising a plasma initiator and
an initiator energy conductor positioned so as to initiate a plasma in said plasma region.
21. The apparatus recited in Claim 1 further comprising a cooling device
positioned and connected so as to take heat away from said apparatus.
22. The apparatus recited in Claim 21 wherein said cooling device is an
electrical semiconductor cooling chip.
23. The apparatus recited in Claim 1 further comprising a chimney positioned
to shield said plasma region.
24. The apparatus recited in Claim 1 further comprising a metal screen
positioned to shield the plasma region.
25. The apparatus recited in Claim 1 further comprising a light collection
system positioned to receive light from the plasma region.
26. The apparatus recited in Claim 25 wherein said light collection system
comprises a collimating lens.
27. The apparatus recited in Claim 25 wherein said light collection system
comprises a double lens focusing apparatus.
28. The apparatus recited in Claim 1 wherein said analytical instrumentation is
selected from the group of: atomic emission spectrometers, monochronometers with
photomultiplier detectors and mass spectrometers.
29. The apparatus recited in Claim 1 wherein said analytical instrumentation
comprises a plurality of analytical instruments.
30. The apparatus recited in Claim 1 further comprising a nebulizer positioned
to process liquid samples before entry of the sample into said sample gas conduit.
31. The apparatus recited in Claim 30 further comprising a desolvation device
positioned to process sample aerosol output from said nebulizer and before entry of the
sample gas into said sample gas conduit.
32. A method of monitoring for presence of elements in a sample gas, said
method comprising:
(a) conducting a portion of said sample gas without an additional carrier gas
to a plasma region;
(b) conducting a portion of a plasma gas to said plasma region;
(c) energizing said plasma region to form a plasma; and
(d) analyzing spectral images emanating from said plasma.
33. The method recitedin Claim 32 wherein said plasma region is energized
using microwave energy.
34. A method of monitoring for presence of elements in a sample gas, said
method comprising:
(a) conducting a first portion of a plasma gas to a plasma region;
(b) conducting a portion of a sample gas to a location in said plasma
region outside said first portion of plasma gas; (c) conducting a second portion of a plasma gas to a location in said
plasma region outside said portion of said sample gas;
(d) energizing said plasma region to form a plasma; and
(e) analyzing spectral images emanating from said plasma.
35. The method recited in Claim 34 wherein said first portion of plasma gas
and said second portion of plasma gas are the same kind of gas.
36. The method recited in Claim 34 wherein said first portion of plasma gas
and said second portion of plasma gas are different kinds of gas.
37. The method recited in Claim 34 wherein said first portion of plasma gas
and said second portion of plasma gas are selected from the group of: argon, helium,
nitrogen and air.
38. The method recited in Claim 34 wherein said sample gas contains a
nebulized aerosol from a liquid solution.
39. The method recited in Claim 34 wherein said sample gas contains a
desolvated aerosol.
40. The method recited in Claim 34 wherein said sample gas is monitored for
an element or mixture of elements from the group of: transition metals, rare earth
elements, actinides, alkali eath elements, alkaline earth elements, sulfur, halogens,
silicon.
41. The method recited in Claim 40 wherein said sample gas is monitored for
beryllium.
42. The method recited in Claim 34 carried out in ambient air at ambient
pressures.
43. The method recited in Claim 34 carried out at a negative pressure.
44. The method recited in Claim 34 wherein said sample gas is conducted to
said plasma region at a rate in the range from greater than 0 to about 10 liters per minute.
45. The method recited in Claim 34 wherein said sample gas is conducted to
said plasma region at a rate in the range from about 0.005 liter per minute to about 4.0
liters per minute.
46. The method recited in Claim 34 wherein said first portion of said plasma
gas is conducted to said plasma region at a rate in the range from greater than 0 to about
10 liters per minute.
47. The method recited in Claim 34 wherein said first portion of said plasma
gas is conducted to said plasma region at a rate in the range from about 0.05 liter per
minute to about 4.0 liters per minute.
48. The method recited in Claim 44 wherein said sample gas is conducted to
said plasma region at a rate of flow different from the rate of flow of said first portion of
said plasma gas.
49. The method recited in Claim 44 wherein said sample gas is conducted to
said plasma region at a rate of flow different from the rate of flow of said second portion
of said plasma gas.
50. The method recited in Claim 46 wherein the rate of flow of said first
portion of said plasma gas is different from the rate of flow of said second portion of said
plasma gas.
51. The method recited in Claim 34 wherein said sample gas is mixed with a
portion of said first portion of said plasma gas prior to being conducted to said plasma
region.
52. The method recited in Claim 34 wherein said sample gas is mixed with a
portion of said second portion of said plasma gas prior to being conducted to said plasma
region.
53. The method recited in Claim 34 wherein said sample gas flow into said
plasma region is assisted with a carrier gas.
54. The method recited in Claim 53 wherein said carrier gas is one selected
from the group of: argon, helium, neon, xenon, krypton, nitrogen, and mixtures thereof.
55. The method recited in Claim 34 further comprising pretreating said sample
gas.
56. The method recited in Claim 55 wherein said sample gas is pretreated by
drying.
57. The method recited in Claim 56 wherein said sample gas is dried by a
series of more than one drying steps.
58. The method recited in Claim 55 wherein said sample gas is pretreated by
concentration of said sample gas.
59. The method recited in Claim 34 wherein said plasma region is energized
using microwave energy.
60. The method recited in Claim 59 wherein said microwave energy is in the
range from about 20 to about 300 Watts.
61. The method recited in Claim 59 wherein said microwave energy is in the
range from about 1000 MHz to about 10,000 MHz.
62. The method as recited in Claim 34 wherein said spectral images are
analyzed continuously in real-time contemporaneously with burning of sample gas in
plasma.
PCT/US2001/005092 2000-03-02 2001-02-15 Microwave plasma monitoring system for real-time elemental analysis WO2001065244A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001241527A AU2001241527A1 (en) 2000-03-02 2001-02-15 Microwave plasma monitoring system for real-time elemental analysis

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US18642800P 2000-03-02 2000-03-02
US60/186,428 2000-03-02
US09/580,100 2000-05-26
US09/580,100 US6429935B1 (en) 2000-03-02 2000-05-26 Microwave plasma monitoring system for real-time elemental analysis

Publications (2)

Publication Number Publication Date
WO2001065244A1 true WO2001065244A1 (en) 2001-09-07
WO2001065244A9 WO2001065244A9 (en) 2002-10-17

Family

ID=26882078

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/005092 WO2001065244A1 (en) 2000-03-02 2001-02-15 Microwave plasma monitoring system for real-time elemental analysis

Country Status (2)

Country Link
AU (1) AU2001241527A1 (en)
WO (1) WO2001065244A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104792768A (en) * 2015-04-25 2015-07-22 浙江大学 Solid sample direct introduction device of microwave plasma torch spectrometer
CN116936329B (en) * 2023-09-15 2023-12-15 武汉市飞瓴光电科技有限公司 Normal pressure microwave plasma double waveguide coupling device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5671045A (en) * 1993-10-22 1997-09-23 Masachusetts Institute Of Technology Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5671045A (en) * 1993-10-22 1997-09-23 Masachusetts Institute Of Technology Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DUAN, YIXIANG ET AL.: "A field-portable plasma source monitor for real-time air particulate monitoring", ANALYTICAL CHEMISTRY, vol. 72, no. 7, 2000, pages 1672 - 1679, XP002940887 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104792768A (en) * 2015-04-25 2015-07-22 浙江大学 Solid sample direct introduction device of microwave plasma torch spectrometer
CN116936329B (en) * 2023-09-15 2023-12-15 武汉市飞瓴光电科技有限公司 Normal pressure microwave plasma double waveguide coupling device

Also Published As

Publication number Publication date
AU2001241527A1 (en) 2001-09-12
WO2001065244A9 (en) 2002-10-17

Similar Documents

Publication Publication Date Title
US6429935B1 (en) Microwave plasma monitoring system for real-time elemental analysis
US5086255A (en) Microwave induced plasma source
US5671045A (en) Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams
EP0724720B1 (en) Continuous, real time microwave plasma element sensor
EP0825434A2 (en) The detection of a volatile substance
Yu et al. Iodine excitation in a dielectric barrier discharge micro-plasma and its determination by optical emission spectrometry
CN102269707A (en) Portable element spectrograph for online detection of liquid/gas phase sample
EP0015284B1 (en) Flameless emission spectroscope apparatus and sample introduction method for same
Patel et al. Tubular electrode torch for capacitatively coupled helium microwave plasma as a spectrochemical excitation source
Meyer et al. Analytical inductively coupled nitrogen and air plasmas
CN217542868U (en) Laser-induced desorption-plasma emission spectroscopy system
WO2001065244A1 (en) Microwave plasma monitoring system for real-time elemental analysis
Duan et al. Design and development of a highly sensitive, field portable plasma source instrument for on-line liquid stream monitoring and real-time sample analysis
CN206100590U (en) Device, non - induction type coupling plasma device, plasma , external member, instrument, reactor, oscillator, system and torch electrode combination piece
AU2022209881A1 (en) Inductively coupled plasma torches and methods and systems including same
CN112098395B (en) Dielectric barrier discharge plasma emission spectrometer based on online detection
CN111948193A (en) Emission spectrometer for plasma solid sample analysis
Matusiewicz A microwave plasma cavity assembly for atomic emission spectrometry
CN111044664A (en) Gas chromatography detection device based on dielectric barrier discharge emission spectrum
Woskov et al. Spectroscopic diagnostics of an atmospheric microwave plasma for monitoring metals pollution
RU111301U1 (en) DETECTOR FOR GAS CHROMATOGRAPHY
CN110793958B (en) Hydride generation-atmospheric pressure glow discharge atomic spectrum device
CN110487775A (en) A kind of portable spectral analysis device based on plasma
RU2085912C1 (en) Atomic-fluorescent analyzer without dispersion
CN114778507A (en) Atomic fluorescence spectrometer based on integrated all-angle excitation source and measurement method

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
AK Designated states

Kind code of ref document: C2

Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG UZ VN YU ZW

AL Designated countries for regional patents

Kind code of ref document: C2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

COP Corrected version of pamphlet

Free format text: PAGES 1/3-3/3, DRAWINGS, REPLACED BY NEW PAGES 1/3-3/3

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: JP