AU2001241527A1 - Microwave plasma monitoring system for real-time elemental analysis - Google Patents

Microwave plasma monitoring system for real-time elemental analysis

Info

Publication number
AU2001241527A1
AU2001241527A1 AU2001241527A AU4152701A AU2001241527A1 AU 2001241527 A1 AU2001241527 A1 AU 2001241527A1 AU 2001241527 A AU2001241527 A AU 2001241527A AU 4152701 A AU4152701 A AU 4152701A AU 2001241527 A1 AU2001241527 A1 AU 2001241527A1
Authority
AU
Australia
Prior art keywords
real
monitoring system
elemental analysis
microwave plasma
plasma monitoring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001241527A
Inventor
Yixiang Duan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
Original Assignee
University of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/580,100 external-priority patent/US6429935B1/en
Application filed by University of California filed Critical University of California
Publication of AU2001241527A1 publication Critical patent/AU2001241527A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
AU2001241527A 2000-03-02 2001-02-15 Microwave plasma monitoring system for real-time elemental analysis Abandoned AU2001241527A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US18642800P 2000-03-02 2000-03-02
US60/186,428 2000-03-02
US09/580,100 2000-05-26
US09/580,100 US6429935B1 (en) 2000-03-02 2000-05-26 Microwave plasma monitoring system for real-time elemental analysis
PCT/US2001/005092 WO2001065244A1 (en) 2000-03-02 2001-02-15 Microwave plasma monitoring system for real-time elemental analysis

Publications (1)

Publication Number Publication Date
AU2001241527A1 true AU2001241527A1 (en) 2001-09-12

Family

ID=26882078

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001241527A Abandoned AU2001241527A1 (en) 2000-03-02 2001-02-15 Microwave plasma monitoring system for real-time elemental analysis

Country Status (2)

Country Link
AU (1) AU2001241527A1 (en)
WO (1) WO2001065244A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104792768B (en) * 2015-04-25 2017-07-25 浙江大学 Solid sample direct injected device for microwave plasma torch spectrometer
CN116936329B (en) * 2023-09-15 2023-12-15 武汉市飞瓴光电科技有限公司 Normal pressure microwave plasma double waveguide coupling device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5671045A (en) * 1993-10-22 1997-09-23 Masachusetts Institute Of Technology Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

Also Published As

Publication number Publication date
WO2001065244A1 (en) 2001-09-07
WO2001065244A9 (en) 2002-10-17

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