WO2001061400A3 - Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels - Google Patents

Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels Download PDF

Info

Publication number
WO2001061400A3
WO2001061400A3 PCT/US2001/005309 US0105309W WO0161400A3 WO 2001061400 A3 WO2001061400 A3 WO 2001061400A3 US 0105309 W US0105309 W US 0105309W WO 0161400 A3 WO0161400 A3 WO 0161400A3
Authority
WO
WIPO (PCT)
Prior art keywords
deflection
micro
sensor
dimensional micro
conical
Prior art date
Application number
PCT/US2001/005309
Other languages
English (en)
Other versions
WO2001061400A2 (fr
WO2001061400A9 (fr
Inventor
Timothy G Slater
Armand P Neukermans
Sateesh S Bajikar
James P Downing
Marc R Schuman
Sam Calmes
Alexander B Romansovsky
John Green
Original Assignee
Xros Inc Nortel Networks
Timothy G Slater
Armand P Neukermans
Sateesh S Bajikar
James P Downing
Marc R Schuman
Sam Calmes
Alexander B Romansovsky
John Green
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xros Inc Nortel Networks, Timothy G Slater, Armand P Neukermans, Sateesh S Bajikar, James P Downing, Marc R Schuman, Sam Calmes, Alexander B Romansovsky, John Green filed Critical Xros Inc Nortel Networks
Priority to CA002400294A priority Critical patent/CA2400294A1/fr
Priority to EP01934837A priority patent/EP1342121A2/fr
Priority to AU2001260986A priority patent/AU2001260986A1/en
Publication of WO2001061400A2 publication Critical patent/WO2001061400A2/fr
Publication of WO2001061400A9 publication Critical patent/WO2001061400A9/fr
Publication of WO2001061400A3 publication Critical patent/WO2001061400A3/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

L'invention concerne un ensemble ruban de micromiroirs qui comprend plusieurs structures de micromiroirs bidimensionnelles présentant des caractéristiques de déviation et autres améliorées. Dans les structures de micromiroirs, des électrodes de déviation électrostatique sont disposées en entités coniques ou quasi coniques usinées, fixées ou moulées dans un substrat. Les électrodes sont disposées en quartiers approximativement parallèles ou décalés de 45 degrés relativement à des axes de rotation afin de former des quadrants. Des détecteurs à torsion sont disposés les long des axes de rotation pour contrôler la déviation des électrodes de déviation à quadrants.
PCT/US2001/005309 2000-02-17 2001-02-16 Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels WO2001061400A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CA002400294A CA2400294A1 (fr) 2000-02-17 2001-02-16 Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels
EP01934837A EP1342121A2 (fr) 2000-02-17 2001-02-16 Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels
AU2001260986A AU2001260986A1 (en) 2000-02-17 2001-02-16 Two-dimensional micro-mirror array enhancements

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US18311700P 2000-02-17 2000-02-17
US18324600P 2000-02-17 2000-02-17
US60/183,117 2000-02-17
US60/183,246 2000-02-17
US20361700P 2000-05-11 2000-05-11
US60/203,617 2000-05-11
US20775200P 2000-05-30 2000-05-30
US60/207,752 2000-05-30
US71594500A 2000-11-16 2000-11-16
US09/715,945 2000-11-16

Publications (3)

Publication Number Publication Date
WO2001061400A2 WO2001061400A2 (fr) 2001-08-23
WO2001061400A9 WO2001061400A9 (fr) 2002-10-10
WO2001061400A3 true WO2001061400A3 (fr) 2003-07-10

Family

ID=27539092

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/005309 WO2001061400A2 (fr) 2000-02-17 2001-02-16 Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels

Country Status (4)

Country Link
EP (1) EP1342121A2 (fr)
AU (1) AU2001260986A1 (fr)
CA (1) CA2400294A1 (fr)
WO (1) WO2001061400A2 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6788981B2 (en) 2001-02-07 2004-09-07 Movaz Networks, Inc. Multiplexed analog control system for electrostatic actuator array
ATE393409T1 (de) 2001-10-19 2008-05-15 Ion Geophysical Corp Digitale optische schaltvorrichtung und prozess zu ihrer herstellung
EP1518822A3 (fr) * 2001-12-06 2007-02-28 Microfabrica Inc. Microdispositifs et appareils complexes et leur procédé de fabrication.
CA2429508C (fr) 2002-05-28 2013-01-08 Jds Uniphase Inc. Miroir microelectromecanique a clavier
US7110637B2 (en) 2002-05-28 2006-09-19 Jds Uniphase Inc. Two-step electrode for MEMs micromirrors
US7110635B2 (en) 2002-05-28 2006-09-19 Jds Uniphase Inc. Electrical x-talk shield for MEMS micromirrors
US6968101B2 (en) 2002-05-28 2005-11-22 Jds Uniphase Inc. Electrode configuration for piano MEMs micromirror
US7302131B2 (en) 2002-05-28 2007-11-27 Jds Uniphase Inc. Sunken electrode configuration for MEMs Micromirror
EP1479647B1 (fr) * 2003-05-23 2009-02-25 JDS Uniphase Inc. Blindage électrique à faible diaphonie pour MEMS micro-miroirs
EP1656815B1 (fr) 2003-07-28 2007-12-05 Olympus Corporation Commutateur optique et procede de commande de commutateur optique

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5629790A (en) * 1993-10-18 1997-05-13 Neukermans; Armand P. Micromachined torsional scanner
US5648618A (en) * 1993-10-18 1997-07-15 Armand P. Neukermans Micromachined hinge having an integral torsion sensor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5629790A (en) * 1993-10-18 1997-05-13 Neukermans; Armand P. Micromachined torsional scanner
US5648618A (en) * 1993-10-18 1997-07-15 Armand P. Neukermans Micromachined hinge having an integral torsion sensor

Also Published As

Publication number Publication date
WO2001061400A2 (fr) 2001-08-23
AU2001260986A1 (en) 2001-08-27
EP1342121A2 (fr) 2003-09-10
CA2400294A1 (fr) 2001-08-23
WO2001061400A9 (fr) 2002-10-10

Similar Documents

Publication Publication Date Title
US4328441A (en) Output circuit for piezoelectric polymer pressure sensor
WO2001061400A3 (fr) Ameliorations se rapportant a une mosaique de micromiroirs bidimensionnels
CA2314125A1 (fr) Ecran tactile et son procede de fabrication
DK0820585T3 (da) Sensor-opstillinger til påvisning af analytter i fluiden
CA2051556A1 (fr) Senseur de gaz
EP0501359A3 (en) Semiconductor sensor of electrostatic capacitance type
JP2004527752A5 (fr)
WO1997023897A3 (fr) Capteur optoelectronique
AU2001264429A1 (en) Sensor unit, especially for fingerprint sensors
EP1046917A3 (fr) Procédé de fabrication d'un capteur pour la détection d'une force exterieure
FI950715A (fi) Pintamikromekaaninen, symmetrinen paine-eroanturi
EP0611967A4 (fr) Capteur d'acceleration.
EP0721225A3 (fr) Améliorations à ou concernant des senseurs thermiques
US5991990A (en) Method for fabricating a tunneling sensor with linear force rebalance
WO2001025474A8 (fr) Sonde permettant de mesurer un bioanalyte tel que du lactate
EP0366566A3 (fr) Electrode de référence, capteur d'ions et procédé de fabrication des mêmes
WO1997019463A3 (fr) Module de puce
EP0388312A3 (fr) Support de chip à flexibilité améliorée
SE9502063L (sv) Anordning för inläsning och behandling av bildinformation
NO963719L (no) Elektromekanisk föleranordning og fremgangsmåte for fremstilling av denne
FR2646309B1 (fr) Procede de fabrication d'un capteur acoustique et capteur acoustique ainsi obtenu, a couche de protection indecollable
JPS5774720A (en) Optoelectronic element
JPS5713784A (en) Bimorph piezoelectric element
EP0999431B1 (fr) Procede de production d'un capteur et d'un element de resistance
EP0338711A3 (fr) Elément pyro-électrique

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CR CU CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US US US US US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2400294

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: 2001934837

Country of ref document: EP

AK Designated states

Kind code of ref document: C2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CR CU CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US US US US US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: C2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

COP Corrected version of pamphlet

Free format text: PAGES 1/35-35/35, DRAWINGS, REPLACED BY NEW PAGES 1/31-31/31

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

WWP Wipo information: published in national office

Ref document number: 2001934837

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Ref document number: 2001934837

Country of ref document: EP