WO2001011665A1 - Dispositif optique d'illumination, dispositif d'exposition, contenant d'element optique, procede d'assemblage de dispositif d'exposition, procede d'evaluation de materiau, et procede et dispositif d'evaluation de filtre - Google Patents

Dispositif optique d'illumination, dispositif d'exposition, contenant d'element optique, procede d'assemblage de dispositif d'exposition, procede d'evaluation de materiau, et procede et dispositif d'evaluation de filtre Download PDF

Info

Publication number
WO2001011665A1
WO2001011665A1 PCT/JP2000/005245 JP0005245W WO0111665A1 WO 2001011665 A1 WO2001011665 A1 WO 2001011665A1 JP 0005245 W JP0005245 W JP 0005245W WO 0111665 A1 WO0111665 A1 WO 0111665A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical
space
chamber
gas
exposure apparatus
Prior art date
Application number
PCT/JP2000/005245
Other languages
English (en)
Japanese (ja)
Inventor
Satoru Oshikawa
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to AU64719/00A priority Critical patent/AU6471900A/en
Publication of WO2001011665A1 publication Critical patent/WO2001011665A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un dispositif optique d'illumination comprenant un premier espace (SP1) qui entoure le trajet optique d'un faisceau d'énergie visant à illuminer un objet, un deuxième espace (SP2) qui entoure le premier espace (SP1), et un troisième espace (SP3) qui entoure le deuxième espace (SP2). Les premier et troisième espaces (SP1, SP2, SP3) sont commandés de manière à présenter différentes concentrations de dopage de cible. Une source de contamination du type actionneur peut donc être isolée dans le but de maintenir chimiquement propre l'espace entourant le trajet optique.
PCT/JP2000/005245 1999-08-05 2000-08-04 Dispositif optique d'illumination, dispositif d'exposition, contenant d'element optique, procede d'assemblage de dispositif d'exposition, procede d'evaluation de materiau, et procede et dispositif d'evaluation de filtre WO2001011665A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU64719/00A AU6471900A (en) 1999-08-05 2000-08-04 Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method anddevice for evaluating filter

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22314299 1999-08-05
JP11/223142 1999-08-05

Publications (1)

Publication Number Publication Date
WO2001011665A1 true WO2001011665A1 (fr) 2001-02-15

Family

ID=16793457

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2000/005245 WO2001011665A1 (fr) 1999-08-05 2000-08-04 Dispositif optique d'illumination, dispositif d'exposition, contenant d'element optique, procede d'assemblage de dispositif d'exposition, procede d'evaluation de materiau, et procede et dispositif d'evaluation de filtre

Country Status (2)

Country Link
AU (1) AU6471900A (fr)
WO (1) WO2001011665A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002071457A1 (fr) * 2001-03-07 2002-09-12 Nikon Corporation Barillet d'objectif, dispositif d'exposition et procede de fabrication du dispositif
JP2003203859A (ja) * 2001-12-18 2003-07-18 Jenoptik Laser Optik Systeme Gmbh 少なくとも１つの光学要素を保管し搬送するための装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04198740A (ja) * 1990-11-28 1992-07-20 Seiko Epson Corp ペリクルの透過率測定方法
JPH05304068A (ja) * 1992-04-27 1993-11-16 Shin Etsu Chem Co Ltd 防塵収納ケース
JPH0737783A (ja) * 1993-07-20 1995-02-07 Fujitsu Ltd 露光装置
JPH09275055A (ja) * 1996-04-03 1997-10-21 Nikon Corp 露光装置
EP0867774A2 (fr) * 1997-03-27 1998-09-30 Nikon Corporation Appareil d'exposition
JPH11202498A (ja) * 1998-01-20 1999-07-30 Canon Inc 露光装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04198740A (ja) * 1990-11-28 1992-07-20 Seiko Epson Corp ペリクルの透過率測定方法
JPH05304068A (ja) * 1992-04-27 1993-11-16 Shin Etsu Chem Co Ltd 防塵収納ケース
JPH0737783A (ja) * 1993-07-20 1995-02-07 Fujitsu Ltd 露光装置
JPH09275055A (ja) * 1996-04-03 1997-10-21 Nikon Corp 露光装置
EP0867774A2 (fr) * 1997-03-27 1998-09-30 Nikon Corporation Appareil d'exposition
JPH11202498A (ja) * 1998-01-20 1999-07-30 Canon Inc 露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002071457A1 (fr) * 2001-03-07 2002-09-12 Nikon Corporation Barillet d'objectif, dispositif d'exposition et procede de fabrication du dispositif
JP2003203859A (ja) * 2001-12-18 2003-07-18 Jenoptik Laser Optik Systeme Gmbh 少なくとも１つの光学要素を保管し搬送するための装置

Also Published As

Publication number Publication date
AU6471900A (en) 2001-03-05

Similar Documents

Publication Publication Date Title
JP3913976B2 (ja) リソグラフ投影装置に用いる洗浄ガスシステム
US6614504B2 (en) Exposure apparatus, exposure method, and device manufacturing method
KR100695988B1 (ko) 리소그래피 투영 장치에 사용되는 정화 가스 시스템
JP4816080B2 (ja) フィルタ装置及び露光システム並びにデバイスの製造方法
US6727981B2 (en) Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
EP1229573A1 (fr) Procede et systeme d'exposition
TW490731B (en) Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method
WO1998057213A1 (fr) Dispositif optique, son procede de nettoyage, dispositif d'alignement de projection et son procede de fabrication
WO2003085708A1 (fr) Procede d'exposition, dispositif d'exposition et procede de fabrication dudit dispositif
US6961113B1 (en) Exposure method and apparatus
JPWO2004050266A1 (ja) 汚染物質除去方法及び装置、並びに露光方法及び装置
JP2002158170A (ja) 露光装置及びデバイス製造方法
JP4081813B2 (ja) 光学装置、露光装置、及びデバイス製造方法
JPWO2002101804A1 (ja) 露光装置及びデバイス製造方法、並びに温度安定化流路装置
WO2000048237A1 (fr) Procede et appareil d'exposition
US6654095B1 (en) Exposure apparatus, exposure method, and device manufacturing method
JPWO2005038887A1 (ja) 環境制御装置、デバイス製造装置、デバイス製造方法、露光装置
WO2003105203A1 (fr) Systeme d'exposition, et procede correspondant
WO2001011665A1 (fr) Dispositif optique d'illumination, dispositif d'exposition, contenant d'element optique, procede d'assemblage de dispositif d'exposition, procede d'evaluation de materiau, et procede et dispositif d'evaluation de filtre
JP2001068400A (ja) 吸光物質検出方法、並びに露光方法及び装置
JP2002033258A (ja) 露光装置、マスク装置及びパターン保護装置、並びにデバイス製造方法
TW200307979A (en) Gas purging method and exposure system, and device production method
JP2003257826A (ja) 光学装置及び露光装置
JP2003257822A (ja) 光学装置及び露光装置
JP2003257821A (ja) 光学装置及び露光装置

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CR CU CZ DE DK DM DZ EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase