Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
  • H01J37/32192—Microwave generated discharge
  • H01J37/32211—Means for coupling power to the plasma
  • H01J37/32247—Resonators
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
  • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/26—Plasma torches
  • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
  • H05H1/00—Generating plasma; Handling plasma
  • H05H1/24—Generating plasma
  • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

• the present invention pertains to plasma technology, or more specifi ⁇
• the microwave plasma generation devices contain a micro ⁇
• waveguide can be used as such volume.
• Such devices require special means to initiate a plasma arc, e.g. re-
• an initiator is disposed in the plasma gen ⁇
• odic element is identified in the discharge pattern.
• the plasma-generating zone has a shape identical to that of the periodic
• ric shape of the initiator is chosen to coincide with the discharge pattern.
• the initiator Besides, once a gas or the gas pressure are changed, the initiator
• the main goal of the invention is to ensure a stable and reliable dis ⁇
• a low-power microwave source are utilizing the intensity of the
• This method to generate plasma is according an apparatus compris ⁇
• the apparatus is complemented by a cavity resonator and the initiator is
• crowave magnetron being disposed inside of the cavity resonator.
• end of the initiator disposed in the resonator is oriented parallel to the di-
• the initiator can be made in such way that the end of the
• initiator disposed in the resonator is either connected or not connected with
• the length of the initiator satisfies the following equation:
• L - is the total length of the initiator
• ⁇ - is the microwave length in a free space
• the initiator can be of virtually any shape but for the sake of
• the metal initiator can also be constructed as two connected perpen ⁇
• the initiator can be made in the form of a tube. Disposed in the reso ⁇
• nator cavity is the one end of the tube while the other end is brought out
• the discharge chamber can be made as a
• the resonator is connected with
• the initiator is disposed in the antinodes of the
• a microwave magnetron is used as a microwave source.
• sources are used for plasma generation.
• the field intensity should be raised to a required level prior to
• a cavity resonator can be used for
• a cavity resonator can be utilized to tune and stabilize a magnetron
• the oscillations are excited at the resonant frequency of the mag ⁇
• microwave magnetron element being located in the resonator.
• the initiator is disposed in the plasma generation area.
• the initiator is therefore disposed both in the
• This working mode can be sustained if there is a high quality factor
• the cavity resonator and a standing wave is formed with the maxim and
• nodes is much higher than the magnetron field intensity in a free space.
• the initiator being located in the resonator and discharge
• chamber cavities ensures that there is virtually no microwave radiation
• the shape and dimensions of the discharge chamber determine the shape and dimensions of the discharge chamber
• the microwave magnetron tunes itself onto a frequency correspond ⁇
• the magnetron tunes to this frequency.
• the microwave energy is transferred to the plasma-burning zone
• the apparatus work as a whole.
• the discharge is automatically initialized
• the discharge can be obtained in the air at atmospheric pressure and does not
• Fig. 1 shows the ap ⁇
• Fig.3 shows the apparatus version where the initiator is made as
• Fig.4 shows the appa-
• Fig.5 shows the apparatus version
• the apparatus contains a microwave magnetron 1 , with a radiating
• the end of the initiator 5 is located in a discharge
• the apparatus works in the following way.
• 300 tiator 4 - discharge chamber 6 system is set within a very short time ( ⁇ 10 ⁇ 8
• a discharge sets in the vicinity 5 of the initiator 4 and devel ⁇
• oping plasma absorbs the energy radiated by the radiating element 3 of the
• the nozzle 7 and the dielectric tube 8 along with the gas supply system form a plasma jet. If the discharge extinguishes the initi ⁇
• L is the total length of the initiator
• ⁇ is the length of the microwave in free space
• n 1 , 2, 3 ...
• the initiator can be made as a linear conductor parallel to the electric
• electric field antinode parallel to electric field vector is ⁇ /4.
• the metal initiator can be made as a tube one end of the tube electri ⁇
• ⁇ 0 - is the microwave radiation angular frequency
• V is the resonator volume, chosen to be V ⁇ ⁇ " '
• the electric field strength will be E () - 160 kV/cm.
• the discharge chamber was constructed as a cylinder coaxial sur-
• the plasma jet temperature reached a 4500°C level.
• the apparatus works very stable, and in case of a plasma extinguish ⁇
• plasmatron can operate from normal mains.
• the apparatus is very compact and simple; there are no me-
• this device is relatively small and makes it

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• Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
• Chemical & Material Sciences (AREA)
• Analytical Chemistry (AREA)
• Electromagnetism (AREA)
• Spectroscopy & Molecular Physics (AREA)
• Physical Or Chemical Processes And Apparatus (AREA)
• Plasma Technology (AREA)

Priority Applications (1)

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Publications (1)

Family

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Family Applications (1)

Country Status (3)

Cited By (7)

Families Citing this family (4)

Citations (4)

• 1999
  • 1999-05-25 RU RU99110864A patent/RU2171554C2/ru active
  • 1999-11-11 AU AU13013/00A patent/AU1301300A/en not_active Abandoned
  • 1999-11-11 WO PCT/RU1999/000428 patent/WO2000060910A1/en active Application Filing

Patent Citations (4)

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