WO2000017924A2 - Method and device for buried chips - Google Patents
Method and device for buried chips Download PDFInfo
- Publication number
- WO2000017924A2 WO2000017924A2 PCT/SE1999/001643 SE9901643W WO0017924A2 WO 2000017924 A2 WO2000017924 A2 WO 2000017924A2 SE 9901643 W SE9901643 W SE 9901643W WO 0017924 A2 WO0017924 A2 WO 0017924A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- connecting means
- carrier
- dielectric layer
- main surface
- contact points
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/13—Mountings, e.g. non-detachable insulating substrates characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
- H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
- H01L23/24—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device solid or gel at the normal operating temperature of the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/19—Manufacturing methods of high density interconnect preforms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L24/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/12105—Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/241—Disposition
- H01L2224/24151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/24221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/24225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/24227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the HDI interconnect not connecting to the same level of the item at which the semiconductor or solid-state body is mounted, e.g. the semiconductor or solid-state body being mounted in a cavity or on a protrusion of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73267—Layer and HDI connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01039—Yttrium [Y]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15153—Shape the die mounting substrate comprising a recess for hosting the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/15165—Monolayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30105—Capacitance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Definitions
- the present invention relates to a method and device for buried electronic components, for example semi-conductor chips and passive networks such as resistor arrays or capacitance arrays, providing a simplified connection of the contacts of the component after installation of the electronic component in a substrate or carrier.
- semi-conductor chips and passive networks such as resistor arrays or capacitance arrays
- Most electronic constructions comprise electronic components which are installed on a carrier.
- the purpose of the carrier is among other things to provide mechanical support for the components.
- Common materials for the carrier include glass epoxy material or ceramic material. Examples of common materials are FR-4 or G-10.
- a known way of arranging an electronic component, for example a so-called "bare" chip on a carrier is that the chip is placed in a cavity in the carrier.
- US 5 353 498, US 5 497 033 describe a solution for fixing an electronic component in a cavity in a carrier.
- the device in this document secures the component in a cavity in the carrier by a dielectric surface layer being applied over the carrier and component, after which electrical connections are made from the contact points on the component to contact points on the surface layer.
- the electrical connections consist of metal plating in vias or holes drilled through the surface layer to the contact points on the component. As these vias are drilied after the component and the carrier have been covered by the surface layer, relatively high precision is required when drilling the holes with regard to finding the correct position to drill.
- Another obvious disadvantage of this device is the difficulty in plating inside the holes.
- the thickness of the plating at the bottom of the hole and on the sides of the hole is governed by the depth of the hole at the same time as the plating of circuit paths, etc., on the upper side of the surface layer will be about 20% thicker than the thickness of the plating in the hole.
- This means that the dimension of the circuit paths will be governed by the hole dimension, and it will thus be difficult to obtain a higher density of circuits as a fine pattern cannot be achieved at the same time as satisfactory plating in narrow holes.
- There are in addition certain absolute requirements concerning the hole dimension for which reason the width dimensions of the circuit paths cannot be varied arbitrarily.
- difficulties arise in locating components prior to cutting holes without using expensive and/or complicated methods such as X-rays or index positioning.
- UK Patent application GB 2 313 713 discloses another typical example of the backgrourfd art, which utilizes a chip located in an aperture in a carrier, the chip exhibiting a plurality of bumps.
- the chip, including the bumps, are covered in an insulating layer, and the bumps are subsequently exposed using a laser to drill holes in the covering insulating layer.
- a drawback of this design is the above- mentioned need for high precision in locating the correct positions for the laser.
- the abstract of Japanese patent document JP57-7147 discloses a method of placing a chip provided with connecting bumps in an aperture in a substrate, and subsequently covering the chip and the bumps in a mound of resin. The bumps are then exposed by lapping along with a smooth surface of the substrate, leaving resin only in the aperture.
- Drawbacks of this method are that due to the lapping along with the surface, the bumps cannot protrude out of the aperture above the surface of the substrate, thus degrading the degree of contact possible between the bumps and subsequent circuit patterns or other connections.
- the lapping of two or more materials at the same time may cause contamination between the different materials, thus causing short-circuits, and may also deform the bumps.
- a solid via as in the invention is also mechanically stronger than a via in the form of a hole and provides better cooling of the electronic component on account of its better heat conductivity. It is also possible to have dummy connecting means which only have a cooling function for the component. The contact between via and circuit path during the plating operation is also improved.
- connection of the component by means of connecting means takes place directly on the component by which a better contact is achieved between the connecting means and the contact surface of the component.
- Fig. 1 is a diagrammatic longitudinal section through a device according to
- Fig. 2a is a diagrammatic longitudinal section through a device according to the invention, where a chip is placed in an aperture in a carrier,
- Fig. 2b is a longitudinal section corresponding to Fig. 2a, where a dielectric layer is applied onto the device, and
- Fig. 2c is a longitudinal section corresponding to Figs 2a and 2b, where the circuit paths are applied onto the dielectric layer after exposure of the contact points of the component
- Figs 3a is a longitudinal section corresponding to fig 2b, of an alternative embodiment of the invention
- Fig 3b is a longitudinal section corresponding to fig 2b, of another alternative embodiment of an the invention.
- the method and the device according to the invention make possible the arranging of one or more electronic components 100 on a component carrier 200.
- an electronic component 100 has a number of contact points 110 arranged on a first surface 120 of the electronic component.
- the carrier 200 has a second main surface 210 and a third main surface 220 which are essentially parallel with each other.
- One or more first apertures 230 are arranged in the carrier 200, the depth of the apertures extending from the second main surface 210 towards the third main surface 220.
- the method according to the invention comprises the following stages:
- the connecting means 130 each have a first end 140 connected to one of the contact points 110 and a second end 150 at a distance from the contact point 110.
- the connecting means 130 can consist of already known so-called bumps, whereby chips according to industry standard (flip-chip) can be used.
- the connecting means 130 are to have a suitable diameter or cross-sectional dimension for the contact points and are to have a length which corresponds to stage 3) below.
- the connecting means 130 are to have a length which is such that the thickness of the dielectric layer 300 is slightly less than the total distance from the bottom surface of the aperture 230 to the second end 150 of the connecting means 130.
- the connecting means 130 will thus still protrude beyond the dielectric layer which covers the second main surface 210 of the carrier 200, while the second end 150 of the connecting means will still have been covered by a layer of dielectric material during the covering process.
- the dielectric layer 300 can be applied in liquid form or as a soft laminate.
- the connecting means 130 must not be deformed during application to such an extent that the connection of the second end 150 to the circuit paths 310 cannot be carried out in the required way, that is the connecting means must not be displaced from the required position preventing a good contact from being obtained between the connecting means and the circuit paths.
- Exposure of the second end 150 of the connecting means 130 in the dielectric layer is preferably carried out by means of a surface removing method such as for example grinding, etching or the like, of the surface of the dielectric layer 300.
- the connecting means for example bumps or the like, usually have a pointy second end 150, for which reason the majority of the dielectric material applied to the second end of the connecting means 130 will flow off, leaving a thinner layer of dielectric material than on the second main surface 210 of the carrier.
- the same amount of surface removing that will expose the metal of the second end 150 of the connecting means 130 will leave a layer of dielectric material on the second main surface 210 of the carrier.
- the second end 150 of t ⁇ j , connecting means 130 may be given a sloped or rounded surface, as shown in figs 3a and 3b respectively.
- connection of the second end 150 of the connecting means 130 to circuit paths 310 arranged on the free surface of the dielectric layer 300 This can be carried out by sputtering, plating, wire-bonding or the like.
- Figs 2a to 2c show three different stages in the method described above.
- Fig. 2a shows the electronic component 100 in position in the aperture 230 in the carrier 200.
- Fig. 2b shows the device after the dielectric layer 300 has been applied.
- the dielectric layer can consist, for example, of non-reinforced epoxy with a thickness to suit the size of the connecting means 130, that is either a required layer thickness is chosen and the dimensions of the connecting means 130 are adjusted to suit this dimension or a required size is selected for the connecting means 130 and the thickness of the dielectric layer 300 is adjusted to suit this thickness.
- Fig. 1 shows the electronic component 100 in position in the aperture 230 in the carrier 200.
- Fig. 2b shows the device after the dielectric layer 300 has been applied.
- the dielectric layer can consist, for example, of non-reinforced epoxy with a thickness to suit the size of the connecting means 130, that is either a required layer thickness is chosen and the dimensions of the connecting means 130 are adjusted to suit this dimension or a required size
- 2c shows the device after the second end 150 of the connecting means 130 has been exposed, for example by plasma etching, pumicing or chemical etching, making the second end exposed bright metal after which it can be connected to the circuit paths 310 on the free surface of the dielectric layer 300. Further surface treatment can be carried out on the second end of the connecting means during this stage if necessary, for example nickel plating of gold surfaces on the connecting means before applying copper plating (circuits or de-oxidation, etc).
- the method and device according to the invention have the advantages that no holes need to be made in the dielectric layer and no plating needs to be carried out in holes, i.e. the manufacturing operations are simpler and cheaper.
- the dimensions of the dielectric layer 300 can be varied as desired to alter the impedance of the circuit paths to suit the required application since a thickness can be selected that makes it possible to obtain circuit paths with dimensions which provide the required impedance.
- a layer which can be, in principle, any thickness is thus desirable for impedance-controlled circuit paths.
- the second end of the connecting means is visible for visual positioning after the stage of exposure, which makes the connection to the circuit paths easier during jmanufacture.
- the electronic components can consist of an individual chip and the carrier can consist of a chip housing, whereby the method and device according to the invention can be applied to the manufacture of chips.
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU63799/99A AU6379999A (en) | 1998-09-21 | 1999-09-21 | Method and device for buried chips |
EP99951342A EP1116268A2 (en) | 1998-09-21 | 1999-09-21 | Method and device for buried chips |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9803204A SE514529C2 (en) | 1998-09-21 | 1998-09-21 | Method and apparatus for buried electronics components |
SE9803204-8 | 1998-09-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000017924A2 true WO2000017924A2 (en) | 2000-03-30 |
WO2000017924A3 WO2000017924A3 (en) | 2000-08-17 |
Family
ID=20412669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/SE1999/001643 WO2000017924A2 (en) | 1998-09-21 | 1999-09-21 | Method and device for buried chips |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1116268A2 (en) |
AU (1) | AU6379999A (en) |
SE (1) | SE514529C2 (en) |
WO (1) | WO2000017924A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6690583B1 (en) | 1999-05-19 | 2004-02-10 | Telefonaktiebolaget Lm Ericsson (Publ) | Carrier for electronic components |
WO2012011933A1 (en) | 2010-07-23 | 2012-01-26 | Tessera, Inc. | Microelectronic elements with post-assembly planarization |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS577147A (en) * | 1980-06-17 | 1982-01-14 | Citizen Watch Co Ltd | Mounting construction of semiconductor device |
GB2313713A (en) * | 1996-05-31 | 1997-12-03 | Nec Corp | High-density mounting method for and structure of electronic circuit board |
US5745984A (en) * | 1995-07-10 | 1998-05-05 | Martin Marietta Corporation | Method for making an electronic module |
-
1998
- 1998-09-21 SE SE9803204A patent/SE514529C2/en not_active IP Right Cessation
-
1999
- 1999-09-21 EP EP99951342A patent/EP1116268A2/en not_active Withdrawn
- 1999-09-21 AU AU63799/99A patent/AU6379999A/en not_active Abandoned
- 1999-09-21 WO PCT/SE1999/001643 patent/WO2000017924A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS577147A (en) * | 1980-06-17 | 1982-01-14 | Citizen Watch Co Ltd | Mounting construction of semiconductor device |
US5745984A (en) * | 1995-07-10 | 1998-05-05 | Martin Marietta Corporation | Method for making an electronic module |
GB2313713A (en) * | 1996-05-31 | 1997-12-03 | Nec Corp | High-density mounting method for and structure of electronic circuit board |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN & JP 57 007 147 A (CITIZEN WATCH CO LTD) 14 January 1982 * |
See also references of EP1116268A2 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6690583B1 (en) | 1999-05-19 | 2004-02-10 | Telefonaktiebolaget Lm Ericsson (Publ) | Carrier for electronic components |
WO2012011933A1 (en) | 2010-07-23 | 2012-01-26 | Tessera, Inc. | Microelectronic elements with post-assembly planarization |
US9659812B2 (en) | 2010-07-23 | 2017-05-23 | Tessera, Inc. | Microelectronic elements with post-assembly planarization |
EP2596689A4 (en) * | 2010-07-23 | 2017-07-26 | Tessera, Inc. | Microelectronic elements with post-assembly planarization |
US9966303B2 (en) | 2010-07-23 | 2018-05-08 | Tessera, Inc. | Microelectronic elements with post-assembly planarization |
US10559494B2 (en) | 2010-07-23 | 2020-02-11 | Tessera, Inc. | Microelectronic elements with post-assembly planarization |
Also Published As
Publication number | Publication date |
---|---|
SE9803204L (en) | 2000-03-22 |
AU6379999A (en) | 2000-04-10 |
SE9803204D0 (en) | 1998-09-21 |
EP1116268A2 (en) | 2001-07-18 |
WO2000017924A3 (en) | 2000-08-17 |
SE514529C2 (en) | 2001-03-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7256490B2 (en) | Test carrier for semiconductor components having conductors defined by grooves | |
US4472876A (en) | Area-bonding tape | |
US5875100A (en) | High-density mounting method and structure for electronic circuit board | |
US5527741A (en) | Fabrication and structures of circuit modules with flexible interconnect layers | |
US8491772B2 (en) | Redox method of forming a coaxial probe structure of elongated electrical conductors projecting from a support structure | |
KR100537243B1 (en) | Semiconductor device and method for manufacturing the same | |
US8754666B2 (en) | Probe structure having a plurality of discrete insulated probe tips projecting from a support surface, apparatus for use thereof and methods of fabrication thereof | |
KR100284781B1 (en) | Semiconductor device mounting board, method of manufacturing the board, semiconductor device and manufacturing method thereof | |
US6242279B1 (en) | High density wire bond BGA | |
US5724727A (en) | Method of forming electronic component | |
KR100499003B1 (en) | A package substrate for electrolytic leadless plating, and its manufacturing method | |
EP0139431B1 (en) | Method of mounting a carrier for a microelectronic silicon chip | |
US5637925A (en) | Uses of uniaxially electrically conductive articles | |
KR930002909B1 (en) | Area-bonding tape | |
EP0483408A1 (en) | Removable VLSI package | |
EP0327399A1 (en) | Method of manufacturing an uniaxially electrically conductive article | |
US7252514B2 (en) | High density space transformer and method of fabricating same | |
KR100455499B1 (en) | Probe for inspecting semiconductor device and method of manufacturing the same | |
US4965700A (en) | Thin film package for mixed bonding of chips | |
WO2000017924A2 (en) | Method and device for buried chips | |
KR20010021782A (en) | Semiconductor device and method for making the device | |
KR100593211B1 (en) | Method for manufacturing through hole electrode for wafer | |
JPH0831976A (en) | Silicon double-sided packaging substrate and its manufacturing method | |
US6510606B2 (en) | Multichip module | |
EP1118120A1 (en) | Package for providing improved electrical contact and methods for forming the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ENP | Entry into the national phase in: |
Ref country code: AU Ref document number: 1999 63799 Kind code of ref document: A Format of ref document f/p: F |
|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG UZ VN YU ZA ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
AK | Designated states |
Kind code of ref document: A3 Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG UZ VN YU ZA ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A3 Designated state(s): GH GM KE LS MW SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1999951342 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1999951342 Country of ref document: EP |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |