WO1999021038A1 - Multiplexeur de longueurs d'onde a groupement a dephasage - Google Patents

Multiplexeur de longueurs d'onde a groupement a dephasage Download PDF

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Publication number
WO1999021038A1
WO1999021038A1 PCT/EP1998/007006 EP9807006W WO9921038A1 WO 1999021038 A1 WO1999021038 A1 WO 1999021038A1 EP 9807006 W EP9807006 W EP 9807006W WO 9921038 A1 WO9921038 A1 WO 9921038A1
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WO
WIPO (PCT)
Prior art keywords
cladding
core
phased array
waveguides
refractive index
Prior art date
Application number
PCT/EP1998/007006
Other languages
English (en)
Inventor
Martinus Bernhardus Johannes Diemeer
Tsjerk Hans Hoekstra
Original Assignee
Akzo Nobel N.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akzo Nobel N.V. filed Critical Akzo Nobel N.V.
Priority to AU12326/99A priority Critical patent/AU1232699A/en
Publication of WO1999021038A1 publication Critical patent/WO1999021038A1/fr

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12026Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the temperature dependence
    • G02B6/12028Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the temperature dependence based on a combination of materials having a different refractive index temperature dependence, i.e. the materials are used for transmitting light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12023Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the polarisation dependence, e.g. reduced birefringence

Definitions

  • the invention pertains to a phased array wavelength multiplexer/ demultiplexer comprising a cladding and a core having a refractive index higher than that of the cladding, the core comprising an input star coupler with N inputs and an output star coupler with M outputs, N and M being natural numbers greater than or equal to 1 , which couplers are optically connected by means of an array of optical waveguides each differing from its neighbour or neighbours in optical path length, usually by a constant, predetermined amount.
  • Wavelength division multiplexing has become a powerful technique for exploiting the bandwidth of optical fibres used in telecommunications.
  • WDM offers the opportunity of flexible routing schemes without substantial intrinsic splitting losses.
  • Various components can be used to separate the different wavelengths propagating in an input channel, but in view of the comparatively simple fabrication process, low loss, and compactness, the phased array, also denoted as, e.g., "phasar,” “array waveguide multiplexer,” “arrayed waveguide grating,” or “waveguide grating router,” has become a key component for multiplexing and demultiplexing in WDM networks.
  • phased array is, for example, disclosed in Y.P. Li, et al. "Silica-based optical integrated circuits," IEE Proc- Optoelectron., Vol. 143, No. 5 (October 1996), pages 263-280, which publication also describes the theoretical background of wavelength division (de)multiplexing (WDM).
  • the phased array disclosed in Li consists of two focusing slab waveguides (which are an example of so-called star couplers) connected by an array of waveguides acting like a dispersive element, both the slab waveguides and the array being integrated on the same silicon substrate.
  • the slab waveguides and the waveguides in the array are manufactured of P-doped silica and embedded in a cladding of P,B-doped silica having a lower refractive index than said P-doped silica.
  • the array of waveguides has a constant length difference (AL) between adjacent waveguides, and the two slabs are mirror images of each other except that the number of inputs (N) and outputs (M) can be different.
  • the principle of the phased array can be described as follows: a lightwave from an input waveguide is coupled equally into the array of waveguides by means of the input slab. If there were no differential phase shift in the array, the lightwave propagation in the output slab would look like the reciprocal of the propagation in the input slab.
  • the input lightwave would thus be imaged at the interface (focal plane) between the output slab and the output waveguides, and the input lightwave would be coupled to one of the output waveguides.
  • the linear length difference in the array results in a wavelength-dependent tilt of the wave front of the lightwave in the waveguides of the array, and thus shifts the input lightwave image to a wavelength-dependent position.
  • the input lightwave image shifts across and couples light into different output waveguides, thus allowing the division (de)multiplexing of a wave or signal into its constituent wavelengths.
  • Phased arrays in which both the waveguides and the cladding are manufactured of a polymeric material are known from, for instance, M.B.J. Diemeer et al., "Polymeric phased array wavelength multiplexer operating around 1550 nm,” Electronic Letters, 6th June 1996, Vol. 32, No. 12. Polymeric phased arrays offer the potential of fibre compatibility combined with low cost.
  • silica-on-siiicon and polymeric phased arrays are rather sensitive to changes in temperature, which cause changes in the effective refractive index of the waveguides in the array, which in turn cause the image on the focal plane of the output coupler to shift and result in the divided wavelength peaks no longer being coupled to the appropriate outputs (i.e., the transmission characteristics of the phasar deteriorate unacceptably).
  • known phasars suffer from stress-induced birefringence due to a so-called photo-elastic effect which is caused mainly by the properties of the materials used, by a difference in the thermal expansion coefficients of the silicon substrate and the waveguide layer, and by the high deposition and annealing temperatures of the waveguide and cladding layers.
  • This birefringence results in polarisation-dependent transmission characteristics that cannot be tolerated in modern, high-grade fibre-optic transmission systems.
  • temperature sensitivity can be suppressed by providing temperature control means and a power supply for the means, but such measures are expensive and may impair the reliability and the service life of the phasar.
  • temperature control has proved to be a considerable obstacle to the widespread use of phased arrays.
  • other problems outlined above viz., birefringence and ageing are not solved by the inclusion of temperature control.
  • thermo-optical coefficient of at least a substantial part of the cladding of the array waveguides is opposite to the sign of the thermo-optical coefficient of the core.
  • the so-called centre wavelength is a suitable entity to illustrate the way in which the invention works, since it determines the relative position of the image on the focal plane of the output coupler.
  • the centre wavelength ( ⁇ 0 ) is defined as: ⁇ n eff *AL)lm, wherein n eff is the effective refractive index of the waveguides in the array and m is an integer representing the defraction order of the array.
  • the centre wavelength is the pass wavelength for the route from the centre input waveguide to the centre output waveguide.
  • the effective refractive index of a waveguide is the refractive index sensed by a specific mode in that waveguide and depends mainly on the refractive index of the core of the waveguide, through which the main part of the mode propagates, and on the refractive index of the cladding, through which the rest (i.e., the evanescent part) of the mode propagates. If, for instance, the refractive index of the cladding decreases and the refractive index of the core increase, the contrast between the core and the cladding increases, but the effective refractive index remains substantially constant and, accordingly, the centre wavelength and the transmission characteristics of the phased array remain substantially constant.
  • the core and cladding should be selected to ensure that for a specific mode (i.e., the mode for which the phasar is designed) the sum of 1) the fraction of the optical power of the mode in the core multiplied by the thermo-optical coefficient of the core material and 2) the fraction of optical power of the mode in the cladding multiplied by the thermo-optical coefficient of the cladding material is approximately zero and preferably smaller than 10 "6 /°C.
  • thermo-optical coefficient of the core and the cladding are selected to ensure a temperature stability of the effective refractive index of the waveguides building the array of less than or equal to 10 "4 over a temperature range from -30 to +70 °C.
  • the phased array is planar, i.e., the essential components of the phased array, such as the array of waveguides, the couplers, and the inputs and the outputs, are integrated on the same substrate, which is made, e.g., of silicon or glass.
  • Waveguiding structures like the phasars according to the invention can be provided with a pattern of light paths in various manners. Methods to achieve this are known in the art. For example, it is possible to introduce such a pattern by removing portions of the layer of the core material, e.g., by means of wet-chemical or dry etching techniques (reactive ion etching, laser ablation), and to optionally fill the gaps formed with a material having a lower index of refraction. Or, e.g., photosensitive material that can be developed after irradiation may be used. A negative photosensitive material is resistant to the developer after irradiation, and the portions of the material that were not subjected to irradiation can be removed.
  • wet-chemical or dry etching techniques reactive ion etching, laser ablation
  • a positive photosensitive material it is preferred to use a positive photosensitive material, and to define the channels by means of an irradiation mask covering the waveguide portions that will form the channels.
  • the irradiated material then is removed using developer, after which a material of lower refractive index is applied.
  • At least part of the cladding is made of a polymeric material.
  • Optical polymers are known, and the person of ordinary skill in the art will be able to choose polymers having the appropriate refractive indices, or to adapt the refractive indices of polymers by chemical modification, e.g., by introducing monomeric units that affect the refractive index.
  • any polymer having sufficient transparency for the wavelength used can be employed in the cladding of the phased array.
  • Particularly suitable optical polymers include polyacrylates, polycarbonates, polyimides, polyurethanes, polysiloxanes, and polyarylates. At any rate, it is preferred that the birefrigence of the polymer in the (top) cladding layer is smaller than or equal to 5.10 "3 (measured via the commonly known prism coupling technique).
  • the variations in the refractive index of the core, and preferably also of the cladding is smaller than 5.10 "4 , preferably smaller than 1.10 4 (again, measured via the commonly known prism coupling technique), because phased arrays comprising such a core (and cladding) need not be tuned to the required wavelength grid after production and, more importantly, are less sensitive to other variations in the manufacturing process.
  • the cladding comprises two or more regions or layers, it is preferred that the variations in the refractive index of each of the individual layers or regions are within said ranges.
  • Phased arrays of which the cladding comprises a bottom cladding layer consisting of an inorganic material and, for the greater part, of a top cladding made of a polymer are especially advantageous because they can be manufactured in comparatively few process steps using existing and proven technologies.
  • a bottom cladding layer (preferably) of silica can be deposited on the substrate by means of, e.g., chemical vapour deposition (CVD), plasma enhanced chemical vapour deposition (PECVD), or flame hydrolysis deposition (FHD).
  • the refractive index of the bottom cladding can be varied by changing the dopant and/or its concentration during deposition.
  • the core layer of the phased array which preferably is made of an inorganic material such as silica (quartz glass) can be deposited by the same methods used for the bottom cladding layer.
  • the waveguide core of the phased array can be defined by means of, e.g., laser ablation or RIE, or by diffusion or ion-exchange of a dopant into substrate.
  • the bottom cladding layer can be made by diffusion of a first dopant into the substrate, optionally followed by definition of the core by diffusion of a second dopant into the bottom cladding layer. Parts of the bottom cladding layer can be removed either prior to of just after diffusion of said optional second dopant.
  • At least the core and the bottom cladding are monolithic and/or that the core and the bottom cladding comprise doped silica. It is also possible that the core, the bottom cladding, and the substrate are monolithic.
  • the planar hybrid phasars preferably comprise a cladding of a material having an E-modulus which is at least an order of magnitude (i.e., a factor 10) lower than the E-modulus of the material in the core. It was found that the birefringence in phased arrays is primarily caused by two entities. Firstly, by stress in the cladding and core which results from a difference in the thermal expansion coefficients of the cladding(s), the substrate, and the core layer. Secondly, by the stress-optical coefficient exhibited by most optical materials. In the component which is most sensitive to birefringe, viz.
  • the stress is considerably reduced by the fact that the waveguide cores are physically separated from the rest of the layer by means of (etched) grooves, which effectively act as stress relieve grooves. Covering the array of waveguides and filling the grooves with a cladding will undo said reduction, except in those cases where the E- modulus of the cladding is an order of magnitude lower than the E-modulus of the waveguides in the array.
  • the waveguides in the array are substantially not birefringent and polarisation compensation techniques, such as the insertion of a so-called half-waveplate (see Y. Inoue et al.), are not required.
  • the present invention further pertains to a process for the manufacture of the phased arrays described above wherein the refractive index of at least part of the core, preferably at least the array, is adjusted through ion- exchange.
  • Ion-exchange allows very precise tuning of the refractive index of the core material and, more importantly, allows the production of a core with a very homogeneous refractive index throughout the core.
  • the transmission characteristics of the phased array can be predicted with great accuracy, and tuning of the phased array will not be necessary.
  • a 8x8 phased array was manufactured by: 0 providing a standard 4-inch silicon wafer as a substrate
  • a bottom cladding layer (thickness: 10 ⁇ m) of doped SiO 2 (with the variations in the refractive index ( ⁇ n) being smaller than 10 "3 ) having a thermo-optical coefficient (dn/dT) of +10- 5 /°C, 0 depositing on the bottom cladding layer, by means of PECVD, a core layer (thickness: 4.5 ⁇ m) of doped SiO 2> the core having a refractive index (n) 0.01 higher than that of the bottom cladding and a thermo- optical coefficient (dn/dT) of +10 "5 /°C, 0 defining the inputs, the outputs, the slab waveguides, and 56 waveguides in the array (width: 6 ⁇ m etch depth 2.5 ⁇ m) by means of RIE in the core layer,
  • the top cladding layer (thickness: 12 ⁇ m) having a refractive index (n) equal to that of the bottom cladding and a thermo-optical coefficient (dn/dT) of -KrV°C.
  • the temperature stability of the refractive index of the waveguides in the array was better (i.e., smaller) than 10 "4 in a temperature range which allows practical use (ourdoors).

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

(Dé)multiplexeur de longueurs d'onde à groupement à déphasage qui comporte une gaine et une partie centrale ayant un indice de réfraction supérieur à celui de la gaine. La partie centrale comprend un coupleur d'entrée en étoile à N entrées et un coupleur de sortie en étoile à M sorties, N et M étant des entiers naturels supérieurs ou égaux à 1. Ces coupleurs sont optiquement connectés à l'aide d'un groupement de guides d'onde optiques dont chacun possède une longueur de trajet optique différente du ou des guide(s) d'onde voisin(s), le signe du coefficient thermo-optique d'au moins une partie substantielle de la gaine des guides d'onde du groupement étant opposé à celui du coefficient thermo-optique de la partie centrale. Le groupement à déphasage selon la présente invention est absolument insensible aux changements de température (athermique) et au vieillissement et possède une biréfringence considérablement réduite.
PCT/EP1998/007006 1997-10-17 1998-10-19 Multiplexeur de longueurs d'onde a groupement a dephasage WO1999021038A1 (fr)

Priority Applications (1)

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AU12326/99A AU1232699A (en) 1997-10-17 1998-10-19 Phased array wavelength multiplexer

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EP97203239 1997-10-17
EP97203239.5 1997-10-17

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1116973A1 (fr) * 2000-01-11 2001-07-18 Corning Incorporated Dispositifs à guides d'onde optique intégrés athermalisés
WO2002018988A2 (fr) * 2000-09-01 2002-03-07 Alcatel Optronics Uk Limited Dispositif optique de dispersion
US6421472B1 (en) 2000-04-14 2002-07-16 Corning Incorporated Athermalized polymer overclad integrated planar optical waveguide device and method
US6466707B1 (en) 2000-08-21 2002-10-15 Corning Incorporated Phasar athermalization using a slab waveguide
EP1626297A1 (fr) * 2001-03-13 2006-02-15 Schott AG Coupleur à réseaux à guides d'ondes et système de communication
GB2423829A (en) * 2005-03-04 2006-09-06 Gemfire Corp Athermalised optical apparatus eg arrayed waveguide grating
US8873910B2 (en) 2010-03-19 2014-10-28 Gemfire Corporation Optical device with athermal slots for temperature dependence curvature reduction

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
BUCHOLD B ET AL: "POLARISATION INSENSITIVE ARRAYED-WAVEGUIDE GRATING MULTIPLEXERS WITH ION-EXCHANGED WAVEGUIDES IN GLASS", ELECTRONICS LETTERS, vol. 32, no. 24, 21 November 1996 (1996-11-21), pages 2248 - 2250, XP000683728 *
DIEMEER M B J ET AL: "POLYMERIC PHASED ARRAY WAVELENGTH MULTIPLEXER OPERATING AROUND 1550NM", ELECTRONICS LETTERS, vol. 32, no. 12, 6 June 1996 (1996-06-06), pages 1132/1133, XP000620719 *
KOKUBUN Y ET AL: "ATHERMAL WAVEGUIDES FOR TEMPERATURE-INDEPENDENT LIGHTWAVE DEVICES", IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 5, no. 11, November 1993 (1993-11-01), pages 1297 - 1300, XP000416799 *
MESTRIC R ET AL: "1.31-1.55-MUM PHASED-ARRAY DEMULTIPLEXER ON INP", IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 8, no. 5, 1 May 1996 (1996-05-01), pages 638 - 640, XP000589261 *
UETSUKA H ET AL: "NOVEL 1 X N GUIDED-WAVE MULTI/DEMULTIPLEXER FOR FDM", OFC 95 TECHNICAL DIGEST, 26 February 1995 (1995-02-26), pages 76/77, XP002039226 *
Y.INOUE ET.AL.: "Athermalsilica-based arrayed-waveguide grating(AWG)multiplexer", EROPEAN CONFERENCE ON OPTICAL COMMUNICATIONS (ECOC 97), 22 September 1997 (1997-09-22) - 25 September 1997 (1997-09-25), EDINBURGH,UK, pages 33 - 36, XP002058688 *

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1116973A1 (fr) * 2000-01-11 2001-07-18 Corning Incorporated Dispositifs à guides d'onde optique intégrés athermalisés
US6519380B2 (en) 2000-01-11 2003-02-11 Corning Incorporated Athermalized integrated optical waveguide devices
US6421472B1 (en) 2000-04-14 2002-07-16 Corning Incorporated Athermalized polymer overclad integrated planar optical waveguide device and method
US6466707B1 (en) 2000-08-21 2002-10-15 Corning Incorporated Phasar athermalization using a slab waveguide
WO2002018988A2 (fr) * 2000-09-01 2002-03-07 Alcatel Optronics Uk Limited Dispositif optique de dispersion
WO2002018988A3 (fr) * 2000-09-01 2002-06-06 Alcatel Optronics Uk Ltd Dispositif optique de dispersion
EP1626297A1 (fr) * 2001-03-13 2006-02-15 Schott AG Coupleur à réseaux à guides d'ondes et système de communication
GB2423829A (en) * 2005-03-04 2006-09-06 Gemfire Corp Athermalised optical apparatus eg arrayed waveguide grating
GB2423829B (en) * 2005-03-04 2008-03-05 Gemfire Corp Optical device with reduced temperature dependence
US7397986B2 (en) 2005-03-04 2008-07-08 Gemfire Corporation Optical device with reduced temperature dependence
US8873910B2 (en) 2010-03-19 2014-10-28 Gemfire Corporation Optical device with athermal slots for temperature dependence curvature reduction

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Publication number Publication date
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