WO1999013490A1 - Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen - Google Patents
Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen Download PDFInfo
- Publication number
- WO1999013490A1 WO1999013490A1 PCT/DE1998/002596 DE9802596W WO9913490A1 WO 1999013490 A1 WO1999013490 A1 WO 1999013490A1 DE 9802596 W DE9802596 W DE 9802596W WO 9913490 A1 WO9913490 A1 WO 9913490A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- order
- axial
- error
- image
- hexapoles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
Definitions
- the invention relates to methods for eliminating first, second and third order axial image errors when correcting the third order opening error in electron-optical systems with hexapoles.
- correction of the third-order opening error occurs, among other things, adjustment errors which impair the resolution, which are primarily the first, second and third-order axial image errors, the elimination of which is necessary to achieve the optimum resolution.
- the axial image errors that occur as adjustment errors when correcting the third-order opening error are as follows:
- the previous methods are characterized in that the adjustment errors are eliminated successively with each imaging element of the electron-optical system and progressively in the direction of the beam spread.
- the invention has set itself the task of creating adjustment methods by means of which the first, second and third order axial image defects can be eliminated.
- Correction methods are explained below as a solution, which give a teaching of the manner in which individual axial image errors of the second and third order can be corrected; on the other hand, an adjustment method for eliminating all axial image errors of the first as well as the second and the third order is specified with a corrective for eliminating the spherical aberration of the third order.
- the sizes 7 ⁇ , and ⁇ denote the complex conjugate sizes. The correction of the individual image errors in connection with the description of the adjustment method is explained in more detail below.
- the first step as a prerequisite for eliminating the adjustment errors is determining the size of the respective error coefficients.
- a decisive difference compared to the method known from the prior art is that the image errors behind the overall system, which generally consists of several lenses, are measured precisely in the image plane, so that the errors are only recorded in their entirety and in mutual superimposition become.
- images are taken with beam paths tilted against the optical axis, the individual images being compared to one another
- the number of images is so large that the system of equations at least is determined.
- the evaluation is carried out in such a way that a diffractogram is produced, either in an analogous manner by diffraction or by a Fourier transformation in a mathematical way.
- the image errors C- j , A- can be determined from the diffraction images by a known method. We refer to the contribution by F. Zemlin et al., Ultramicroscopy 3 (1978) 49.
- the other four complex adjustment errors and the real opening error can be determined using a system of equations derived from the eikonal (see Zemlin loc. Cit.) . In the case of the five image errors mentioned above, a system of equations consisting of nine real equations must be derived and solved. In this way, the error coefficients to be eliminated are determined.
- Influencing and eliminating defocusing and first order twofold axial astigmatism are trivial; they are done by changing the focus (in the case of C-,) and by superimposing a quadrupole field (in the case of A.,).
- the second-order errors that is to say the axial coma B 2 and the threefold axial astigmatism A 2 are to be corrected next, since only then is it possible to determine the third-order image errors with sufficient accuracy and consequently also to correct them .
- the removal can be done by a so-called coma stigmator.
- a quadrupole field of the same strength is superimposed on a pair of hexapoles in the corrective system, the product of the sign of the hexapole field and that of the associated quadrupole field being antisymmetric, that is to say opposite to one another. This condition ensures that no 1st order astigmatism is produced.
- the strength and the orientation of these quadrupole fields is determined by the measured coma.
- Another possibility of generating the quadrupole fields can be by moving the optical axis parallel to the axis of the hexapole.
- the correction is done by an additional hexapole field, its strength and direction also is determined by the determined error coefficient.
- the realization takes place by generating such a hexapole field.
- Another way of generating fields is to virtually rotate the corrective hexapoles against each other, which also creates a three-digit field.
- the implementation is carried out by arranging a magnetic round lens between the two hexapoles or using the existing ones. The advantage of this method is that it saves the otherwise necessary way of using a twelve-pole lens to generate a hexapole field of any size and orientation.
- the values of the third order image errors namely the 4-fold axial astigmatism A 3 and the 2-fold star error S 3 , can be determined in the manner described above.
- the correction of these axial image errors follows a common general principle proposed by the invention for the first time.
- the same off-axis image error of a higher order is used to correct the axial image error and by shifting or tilting the optical errors
- equality of the image error means the same behavior, that is to say the same dependence on the complex aperture angle C and its complex conjugate OC.
- the power of the image coordinate corresponds to the difference between the order of the correction used off-axis error and the order of the axial image error to be corrected.
- the off-axis error with linear dependency on '/ ' will be used.
- an axial component one would have, for example, ⁇ 6 n , where the associated off-axis component - assuming the linearity - then reads ⁇ C n>' •
- the 3rd order axial star error there is a (X-, so that the off-axis and in ⁇ linear 4th-order star errors OO 3 /
- the off-axis a-3rd order astigmatism is used.
- the off-axis error can be influenced, so that mutual compensation d. H. the axial error component is eliminated with the aid of the off-axis image error associated in the sense explained above.
- Figure 2 The correction principle of the triple axial astigmatism of the second order A 2
- Figure 3 The correction of the axial astigmatism and the star error of the third order.
- the optical axis shown in dashed lines runs horizontally.
- the hexapoles 1 and 2 limit the system formed by the two round lenses 3 and 4 to the outside.
- a quadrupole field is superimposed in the two hexapoles 1 and 2, which is opposed to one another.
- an anti-symmetry results, by means of which the generation of a first-order astigmatism is avoided.
- the strength and direction of the quadrupole fields must be set to the value of the measured coma.
- such a field can be produced in an elegant manner by displacing the optical axis parallel to the axis of the hexapole, as a result of which a quadrupole field is additionally generated depending on the displacement path.
- Figure 2 deals in principle with the correction of the triple axial astigmatism of the second order.
- a hexapole field is generated according to the strength and direction of the error value to be corrected.
- a magnetic circular lens system 3 4, by means of which the imaging beam path is rotated by Larmor and thus generates a virtual rotation of the two hexapoles 1, 2 relative to one another.
- a hexapole field 3 that can be adjusted in size can also be generated.
- FIG. 3 also shows two hexapoles, with two round lenses 3, 4 arranged therein, between which an intermediate image 5 is generated.
- the same off-axis, higher-order image errors can be brought into effect and used for compensation by an offset in the plane of the intermediate image.
- the next-order off-axis error will be used with a linear nT or for this.
- the fourth-order off-axis star error CT is therefore used and, in the case of third order four-fold axial astigmatism, the fourth order fourth-order off-axis astigmatism.
- the corrections of individual axial image errors shown in the figures are used, among other things, in adjustment methods for eliminating first, second and third order axial image errors when correcting the third order opening error in electronic systems.
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE59814013T DE59814013D1 (de) | 1997-09-08 | 1998-08-29 | Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen |
| EP98951265A EP1012866B1 (de) | 1997-09-08 | 1998-08-29 | Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen |
| US09/508,239 US6646267B1 (en) | 1997-09-08 | 1998-08-29 | Method for eliminating first, second and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems |
| JP2000511180A JP2001516139A (ja) | 1997-09-08 | 1998-08-29 | 電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19739290.3 | 1997-09-08 | ||
| DE19739290A DE19739290A1 (de) | 1997-09-08 | 1997-09-08 | Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1999013490A1 true WO1999013490A1 (de) | 1999-03-18 |
Family
ID=7841589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE1998/002596 Ceased WO1999013490A1 (de) | 1997-09-08 | 1998-08-29 | Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6646267B1 (https=) |
| EP (1) | EP1012866B1 (https=) |
| JP (2) | JP2001516139A (https=) |
| DE (2) | DE19739290A1 (https=) |
| WO (1) | WO1999013490A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8866078B2 (en) | 2010-07-05 | 2014-10-21 | Hitachi High-Technologies Corporation | Scanning transmission type electron microscope |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10001277A1 (de) * | 2000-01-14 | 2001-07-19 | Harald Rose | Elektronenoptischer Korrektor zur Beseitigung der Bildfehler dritter Ordnung |
| DE10003127A1 (de) | 2000-01-26 | 2001-08-02 | Ceos Gmbh | Verfahren zur Ermittlung geometrisch optischer Abbildungsfehler |
| DE10231426B4 (de) * | 2001-07-13 | 2015-08-06 | Jeol Ltd. | Korrektureinrichtung zur Korrektur der sphärischen Aberration |
| DE10136190A1 (de) * | 2001-07-25 | 2003-02-06 | Ceos Gmbh | Schlitzlinsenanordnung für Teilchenstrahlen |
| JP3968334B2 (ja) | 2002-09-11 | 2007-08-29 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び荷電粒子線照射方法 |
| JP4328192B2 (ja) * | 2003-12-12 | 2009-09-09 | 日本電子株式会社 | 荷電粒子光学系における多極場発生装置および収差補正装置 |
| JP4607558B2 (ja) * | 2004-11-22 | 2011-01-05 | 日本電子株式会社 | 荷電粒子光学装置及び収差補正方法 |
| DE102006017686A1 (de) * | 2006-04-15 | 2007-10-18 | Ceos Corrected Electron Optical Systems Gmbh | Elektronenoptischer Korrektor für aplanatische Abbildungssysteme |
| JP4851268B2 (ja) | 2006-08-31 | 2012-01-11 | 日本電子株式会社 | 収差補正方法および電子線装置 |
| JP4922883B2 (ja) * | 2006-10-20 | 2012-04-25 | 日本電子株式会社 | 荷電粒子線装置 |
| EP1914786A3 (en) * | 2006-10-20 | 2010-08-04 | JEOL Ltd. | Charged particle beam system |
| DE102007058443B4 (de) * | 2007-12-05 | 2010-05-06 | Ceos Corrected Electron Optical Systems Gmbh | Korrektor für axialen und außeraxialen Strahlengang und TEM damit |
| US7659505B2 (en) | 2008-02-01 | 2010-02-09 | Ionics Mass Spectrometry Group Inc. | Ion source vessel and methods |
| JP5623719B2 (ja) * | 2008-10-06 | 2014-11-12 | 日本電子株式会社 | 荷電粒子線装置の色収差補正装置及びその補正方法 |
| DE102009052392A1 (de) * | 2009-11-09 | 2011-12-15 | Carl Zeiss Nts Gmbh | SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens |
| JP5743698B2 (ja) * | 2011-05-09 | 2015-07-01 | 株式会社日立ハイテクノロジーズ | 3次寄生収差の補正方法および荷電粒子線装置 |
| JP5758728B2 (ja) | 2011-07-26 | 2015-08-05 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9275817B2 (en) | 2012-04-09 | 2016-03-01 | Frederick Wight Martin | Particle-beam column corrected for both chromatic and spherical aberration |
| EP2722868B2 (en) * | 2012-10-16 | 2025-03-26 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Octopole device and method for spot size improvement |
| US10319558B2 (en) | 2013-09-30 | 2019-06-11 | Hitachi High-Technologies Corporation | Charged particle beam device |
| JP7017985B2 (ja) | 2018-06-05 | 2022-02-09 | 株式会社日立製作所 | システム及び処理条件の決定方法 |
| CN112098438B (zh) * | 2020-07-23 | 2021-11-19 | 西安交通大学 | 一种高分辨大扫描场系统的二阶像差补偿方法 |
| JP7838283B2 (ja) | 2022-01-24 | 2026-04-01 | 富士フイルムビジネスイノベーション株式会社 | 画像形成装置 |
| JP7702044B2 (ja) * | 2022-06-27 | 2025-07-02 | 株式会社日立ハイテク | 収差補正装置および収差補正方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4414474A (en) * | 1982-02-17 | 1983-11-08 | University Patents, Inc. | Corrector for axial aberrations in electron optic instruments |
| EP0451370A1 (en) * | 1990-04-12 | 1991-10-16 | Koninklijke Philips Electronics N.V. | Correction system for a charged-particle beam apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07220669A (ja) * | 1994-01-31 | 1995-08-18 | Jeol Ltd | 非点・入射軸補正装置を備えた電子顕微鏡 |
| WO1997044811A1 (en) * | 1996-05-21 | 1997-11-27 | Philips Electronics N.V. | Correction device for the correction of lens aberrations in particle-optical apparatus |
| US5659083A (en) * | 1996-05-30 | 1997-08-19 | Sanofi | Process of preparing 2,2'-(1-methyl-1,2-ethanediylidene) bis[hydrazinecarboximidamide] |
| EP0960429A1 (en) * | 1997-12-11 | 1999-12-01 | Philips Electron Optics B.V. | Correction device for correcting the spherical aberration in particle-optical apparatus |
-
1997
- 1997-09-08 DE DE19739290A patent/DE19739290A1/de not_active Ceased
-
1998
- 1998-08-29 WO PCT/DE1998/002596 patent/WO1999013490A1/de not_active Ceased
- 1998-08-29 US US09/508,239 patent/US6646267B1/en not_active Expired - Lifetime
- 1998-08-29 JP JP2000511180A patent/JP2001516139A/ja active Pending
- 1998-08-29 EP EP98951265A patent/EP1012866B1/de not_active Expired - Lifetime
- 1998-08-29 DE DE59814013T patent/DE59814013D1/de not_active Expired - Lifetime
-
2007
- 2007-07-11 JP JP2007182485A patent/JP2007266008A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4414474A (en) * | 1982-02-17 | 1983-11-08 | University Patents, Inc. | Corrector for axial aberrations in electron optic instruments |
| EP0451370A1 (en) * | 1990-04-12 | 1991-10-16 | Koninklijke Philips Electronics N.V. | Correction system for a charged-particle beam apparatus |
Non-Patent Citations (4)
| Title |
|---|
| BECK V D: "Method for Producing Optical Aberrations of Variable Magnitude. November 1980.", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 23, no. 6, November 1980 (1980-11-01), New York, US, pages 2586 - 2589, XP002090287 * |
| ROSE H: "Correction of aperture aberrations in magnetic systems with threefold symmetry", PROCEEDINGS OF THE 1ST CONFERENCE ON CHARGED PARTICLE OPTICS, GIESSEN, WEST GERMANY, 8-11 SEPT. 1980, vol. 187, no. 1, ISSN 0167-5087, Nuclear Instruments and Methods in Physics Research, 1 Aug. 1981, Netherlands, pages 187 - 199, XP002090289 * |
| ZACH J ET AL: "Correction of spherical and chromatic aberration in a low voltage SEM", OPTIK, JAN. 1995, GERMANY, vol. 98, no. 3, ISSN 0030-4026, pages 112 - 118, XP002090288 * |
| ZEMLIN F ET AL: "Coma-free alignment of high resolution electron microscopes with the aid of optical diffractograms", ULTRAMICROSCOPY, 1978, NETHERLANDS, vol. 3, no. 2, ISSN 0304-3991, pages 49 - 60, XP002090290 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8866078B2 (en) | 2010-07-05 | 2014-10-21 | Hitachi High-Technologies Corporation | Scanning transmission type electron microscope |
Also Published As
| Publication number | Publication date |
|---|---|
| DE59814013D1 (de) | 2007-07-05 |
| EP1012866A1 (de) | 2000-06-28 |
| JP2001516139A (ja) | 2001-09-25 |
| US6646267B1 (en) | 2003-11-11 |
| DE19739290A1 (de) | 1999-03-11 |
| EP1012866B1 (de) | 2007-05-23 |
| JP2007266008A (ja) | 2007-10-11 |
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